JP7115637B2 - 半導体集積回路 - Google Patents
半導体集積回路 Download PDFInfo
- Publication number
- JP7115637B2 JP7115637B2 JP2021519298A JP2021519298A JP7115637B2 JP 7115637 B2 JP7115637 B2 JP 7115637B2 JP 2021519298 A JP2021519298 A JP 2021519298A JP 2021519298 A JP2021519298 A JP 2021519298A JP 7115637 B2 JP7115637 B2 JP 7115637B2
- Authority
- JP
- Japan
- Prior art keywords
- main terminal
- region
- terminal region
- well
- potential
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004065 semiconductor Substances 0.000 title claims description 110
- 239000000758 substrate Substances 0.000 claims description 32
- 239000012535 impurity Substances 0.000 claims description 29
- 230000015556 catabolic process Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 56
- 210000000746 body region Anatomy 0.000 description 13
- 108091006146 Channels Proteins 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 11
- 239000000463 material Substances 0.000 description 9
- 238000009792 diffusion process Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000006698 induction Effects 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 102000004129 N-Type Calcium Channels Human genes 0.000 description 1
- 108090000699 N-Type Calcium Channels Proteins 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/07—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
- H01L27/0705—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
- H01L27/0727—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with diodes, or capacitors or resistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0207—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/107—Substrate region of field-effect devices
- H01L29/1075—Substrate region of field-effect devices of field-effect transistors
- H01L29/1079—Substrate region of field-effect devices of field-effect transistors with insulated gate
- H01L29/1083—Substrate region of field-effect devices of field-effect transistors with insulated gate with an inactive supplementary region, e.g. for preventing punch-through, improving capacity effect or leakage current
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7813—Vertical DMOS transistors, i.e. VDMOS transistors with trench gate electrode, e.g. UMOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823892—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the wells or tubs, e.g. twin tubs, high energy well implants, buried implanted layers for lateral isolation [BILLI]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/0883—Combination of depletion and enhancement field effect transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
- H01L27/0922—Combination of complementary transistors having a different structure, e.g. stacked CMOS, high-voltage and low-voltage CMOS
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
Description
本発明の実施形態に係る半導体集積回路は、図1に示すように、同一の半導体チップに出力部100及び回路部200がモノリシックに集積されたハイサイド型パワーICである。図1では、半導体基体(1,2)が、高不純物濃度で第1導電型(n+型)の半導体基板(Siウェハ)からなる低比抵抗層1上に、低比抵抗層1よりも低不純物濃度で第1導電型(n-型)の高比抵抗層2がエピタキシャル成長された構造を例示する。実施形態に係る半導体集積回路では、半導体チップを構成する半導体基体(1,2)が、シリコン(Si)からなる半導体材料を母材とする場合を例示的に説明するが、母材はSiに限定されない。なお、高比抵抗層2となるn-型の半導体基板(Siウェハ)の下面に、n+型の不純物添加層からなる低比抵抗層1をイオン注入や熱拡散で形成することで半導体基体(1,2)を構成してもよい。
ここで、図5を参照して、比較例に係る半導体集積回路を説明する。図5では、図1に示した出力部100の図示を省略している。比較例に係る半導体集積回路では、図5に示すように、図1に示したエッジ構造201が無い点が、図1に示した半導体集積回路と異なる。nウェル9には、電位供給端子VNWが接続されている。電位供給端子VNWには、回路部200とは異なる領域に設けられた回路(図示省略)が接続されている。
図6は、比較例に係る半導体集積回路の25℃及び175℃のI-V特性のシミュレーション結果を示し、図7は、実施形態に係る半導体集積回路の25℃及び175℃のI-V特性のシミュレーション結果を示す。図6に示す比較例に係る半導体集積回路では、第2電位V2及び第3電位V3として0Vを印加した状態で、第1電位V1を変化させた。一方、図7に示す実施形態に係る半導体集積回路では、第2電位V2として0Vを印加し、第3電位V3として第2電位V2よりも大きい5Vを印加した状態で、第1電位V1を変化させた。図6に示す比較例に係る半導体集積回路では、175℃でリーク電流が増大し、パンチスルー耐圧が低下している。これに対して、図7に示す実施形態に係る半導体集積回路では、175℃でのリーク電流が抑制され、パンチスルー耐圧が改善していることが分かる。
実施形態の変形例に係る半導体集積回路は、図8及び図9に示すように、E型トランジスタT11の平面パターンが、nウェル9の周囲を取り囲むように枠状(環状)に設けられている点が、図1及び図2に示した実施形態に係る半導体集積回路と異なる。図8は、図9の平面図に示したA-A方向から見た断面図に相当する。E型トランジスタT11の平面パターンを枠状とすることにより、E型トランジスタT11のゲート幅を大きくすることができ、E型トランジスタT11に大電流を流れ易くすることができる。図8及び図9では、図1及び図2に示した第1回路素子T1は図示を省略しているが、例えばE型トランジスタT11の周囲を取り囲むpウェル8内に設けられる。
上記のように、本発明は実施形態によって記載したが、この開示の一部をなす論述及び図面は本発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施の形態、実施例及び運用技術が明らかとなろう。
2…高比抵抗層(第1主電極領域)
3…ボディ領域
4a,4b…第2主電極領域
5…ベースコンタクト領域
6a,6b,17,21,26…ゲート絶縁膜
7a,7b,13,18,22,27…ゲート電極
8…第1ウェル
9…第2ウェル(第1主端子領域)
10…第3主電極領域
11…第4主電極領域
14…基体コンタクト領域
15…第5主電極領域
16…第6主電極領域
19…第2主端子領域(第6主端子領域)
20…エッジコンタクト領域
23…第3主端子領域
24…第4主端子領域(第5主端子領域)
25…チャネル形成領域
28…ウェルコンタクト領域
29…下面電極
30a,30b…ゲートトレンチ
31,31…配線
33…インバータ
100…出力部
200…回路部
201…エッジ構造
D0…還流ダイオード
D1…ツェナーダイオード
T0…出力段素子
T1…第1回路素子
T2…第2回路素子
T3…スイッチング素子
T11…エンハンスメント型トランジスタ
T12…デプレッション型トランジスタ
Claims (14)
- 第1導電型の半導体基体と、
前記半導体基体の下面に設けられ、第1電位が印加される下面電極と、
前記半導体基体の上面側に設けられ、前記第1電位よりも低い第2電位が印加される第2導電型の第1ウェルと、
前記第1ウェル内に設けられた第1導電型の第2ウェルと、
前記第1ウェルに設けられ、前記第2電位よりも高い第3電位を前記第2ウェルに供給するエッジ構造と、
を備えることを特徴とする半導体集積回路。 - 前記エッジ構造は、
前記第2ウェルと電位が等しく前記第3電位を供給する第1導電型の第1主端子領域、前記第1電位が印加される第1導電型の第2主端子領域、及び前記第1主端子領域と前記第2主端子領域の間を流れる電流を制御する第1制御電極を有するエンハンスメント型トランジスタと、
前記第2電位が印加される第2導電型の第3主端子領域、及び前記第1制御電極に接続された第1導電型の第4主端子領域を有するツェナーダイオードと、
前記第4主端子領域に接続された第1導電型の第5主端子領域、前記第1電位が印加される第1導電型の第6主端子領域、及び前記第1制御電極に接続され前記第5主端子領域と前記第6主端子領域の間を流れる電流を制御する第2制御電極を有するデプレッション型トランジスタと、
を備えることを特徴とする請求項1に記載の半導体集積回路。 - 前記第1主端子領域が、前記第2ウェルとの共有領域で構成されることを特徴とする請求項2に記載の半導体集積回路。
- 前記第2主端子領域が、前記第1ウェル内に前記第1主端子領域から離間して設けられ、前記半導体基体と第1配線を介して接続されていることを特徴とする請求項2又は3に記載の半導体集積回路。
- 前記エンハンスメント型トランジスタが、前記第1主端子領域と前記第2主端子領域との間の前記第1ウェル上に設けられた第1ゲート絶縁膜を更に備え、
前記第1制御電極が、前記第1ゲート絶縁膜上に設けられていることを特徴とする請求項2~4のいずれか1項に記載の半導体集積回路。 - 前記第3主端子領域が、前記第1ウェル内に前記第2ウェル及び前記第2主端子領域から離間して設けられ、前記第1ウェルよりも高不純物濃度の半導体領域であることを特徴とする請求項2~5のいずれか1項に記載の半導体集積回路。
- 前記第4主端子領域が、前記第3主端子領域内に設けられ、前記第3主端子領域とpn接合をなすことを特徴とする請求項2~6のいずれか1項に記載の半導体集積回路。
- 前記第5主端子領域が、前記第4主端子領域との共有領域で構成されることを特徴とする請求項2~7のいずれか1項に記載の半導体集積回路。
- 前記第6主端子領域が、前記第2主端子領域との共有領域で構成されることを特徴とする請求項2~8のいずれか1項に記載の半導体集積回路。
- 前記デプレッション型トランジスタが、
前記第5主端子領域と前記第6主端子領域の間に設けられ、前記第3主端子領域と重複する部分の導電型が反転可能な第1導電型のチャネル形成領域と、
前記チャネル形成領域上に設けられた第2ゲート絶縁膜と、
を更に備え、
前記第2制御電極が前記第2ゲート絶縁膜上に設けられ、前記第5主端子領域及び前記第1制御電極と第2配線を介して接続されている
ことを特徴とする請求項2~9のいずれか1項に記載の半導体集積回路。 - 前記ツェナーダイオードは、5V~10Vの降伏電圧を有することを特徴とする請求項2~10のいずれか1項に記載の半導体集積回路。
- 前記エンハンスメント型トランジスタのゲート長が、前記デプレッション型トランジスタのゲート長よりも短いことを特徴とする請求項2~11のいずれか1項に記載の半導体集積回路。
- 前記エンハンスメント型トランジスタのゲート幅が、前記デプレッション型トランジスタのゲート幅よりも広いことを特徴とする請求項2~12のいずれか1項に記載の半導体集積回路。
- 前記エンハンスメント型トランジスタの平面パターンが、前記第2ウェルを取り囲むように設けられていることを特徴とする請求項2~13のいずれか1項に記載の半導体集積回路。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019093138 | 2019-05-16 | ||
JP2019093138 | 2019-05-16 | ||
PCT/JP2020/014219 WO2020230465A1 (ja) | 2019-05-16 | 2020-03-27 | 半導体集積回路 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2020230465A1 JPWO2020230465A1 (ja) | 2021-10-28 |
JP7115637B2 true JP7115637B2 (ja) | 2022-08-09 |
Family
ID=73289024
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021519298A Active JP7115637B2 (ja) | 2019-05-16 | 2020-03-27 | 半導体集積回路 |
Country Status (4)
Country | Link |
---|---|
US (1) | US11948937B2 (ja) |
JP (1) | JP7115637B2 (ja) |
CN (1) | CN112956025B (ja) |
WO (1) | WO2020230465A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11398565B2 (en) * | 2020-12-07 | 2022-07-26 | Globalfoundries Singapore Pte. Ltd. | Silicon controlled rectifier with a gate electrode for electrostatic discharge protection |
KR20220150109A (ko) * | 2021-05-03 | 2022-11-10 | 에스케이하이닉스 주식회사 | 반도체 장치 및 그 제조방법 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005191263A (ja) | 2003-12-25 | 2005-07-14 | Fuji Electric Device Technology Co Ltd | 半導体装置 |
WO2006003729A1 (ja) | 2004-07-02 | 2006-01-12 | Matsushita Electric Industrial Co., Ltd. | 半導体集積回路 |
WO2008012899A1 (fr) | 2006-07-27 | 2008-01-31 | Fujitsu Limited | Dispositif de circuit à semi-conducteurs, système de dispositif de circuit à semi-conducteurs et procédé de fabrication pour le dispositif de circuit à semi-conducteurs |
US20100001351A1 (en) | 2006-09-21 | 2010-01-07 | Nanyang Technological University | Triple well transmit-receive switch transistor |
JP2016042558A (ja) | 2014-08-19 | 2016-03-31 | 富士電機株式会社 | 半導体装置 |
WO2016132418A1 (ja) | 2015-02-18 | 2016-08-25 | 富士電機株式会社 | 半導体集積回路 |
WO2016132417A1 (ja) | 2015-02-18 | 2016-08-25 | 富士電機株式会社 | 半導体集積回路 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07211802A (ja) * | 1994-01-19 | 1995-08-11 | Fujitsu Ltd | 半導体集積回路 |
JP3413569B2 (ja) * | 1998-09-16 | 2003-06-03 | 株式会社日立製作所 | 絶縁ゲート型半導体装置およびその製造方法 |
JP2003258118A (ja) * | 2002-03-06 | 2003-09-12 | Seiko Epson Corp | 半導体装置 |
JP4530823B2 (ja) * | 2004-12-02 | 2010-08-25 | 三洋電機株式会社 | 半導体装置及びその製造方法 |
JP6610114B2 (ja) * | 2015-09-16 | 2019-11-27 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
JP6845688B2 (ja) | 2016-12-28 | 2021-03-24 | ラピスセミコンダクタ株式会社 | スイッチデバイス及びスイッチ回路 |
CN110828564B (zh) * | 2018-08-13 | 2022-04-08 | 香港科技大学 | 具有半导体性栅极的场效应晶体管 |
-
2020
- 2020-03-27 CN CN202080005944.1A patent/CN112956025B/zh active Active
- 2020-03-27 WO PCT/JP2020/014219 patent/WO2020230465A1/ja active Application Filing
- 2020-03-27 JP JP2021519298A patent/JP7115637B2/ja active Active
-
2021
- 2021-04-23 US US17/238,908 patent/US11948937B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005191263A (ja) | 2003-12-25 | 2005-07-14 | Fuji Electric Device Technology Co Ltd | 半導体装置 |
WO2006003729A1 (ja) | 2004-07-02 | 2006-01-12 | Matsushita Electric Industrial Co., Ltd. | 半導体集積回路 |
WO2008012899A1 (fr) | 2006-07-27 | 2008-01-31 | Fujitsu Limited | Dispositif de circuit à semi-conducteurs, système de dispositif de circuit à semi-conducteurs et procédé de fabrication pour le dispositif de circuit à semi-conducteurs |
US20100001351A1 (en) | 2006-09-21 | 2010-01-07 | Nanyang Technological University | Triple well transmit-receive switch transistor |
JP2016042558A (ja) | 2014-08-19 | 2016-03-31 | 富士電機株式会社 | 半導体装置 |
WO2016132418A1 (ja) | 2015-02-18 | 2016-08-25 | 富士電機株式会社 | 半導体集積回路 |
WO2016132417A1 (ja) | 2015-02-18 | 2016-08-25 | 富士電機株式会社 | 半導体集積回路 |
Also Published As
Publication number | Publication date |
---|---|
US20210242198A1 (en) | 2021-08-05 |
CN112956025B (zh) | 2024-06-28 |
WO2020230465A1 (ja) | 2020-11-19 |
US11948937B2 (en) | 2024-04-02 |
JPWO2020230465A1 (ja) | 2021-10-28 |
CN112956025A (zh) | 2021-06-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5070693B2 (ja) | 半導体装置 | |
US6503782B2 (en) | Complementary accumulation-mode JFET integrated circuit topology using wide (>2eV) bandgap semiconductors | |
JP7139683B2 (ja) | 半導体集積回路及びその製造方法 | |
EP2924723B1 (en) | Integrated circuit | |
US8686531B2 (en) | Structure and method for forming a guard ring to protect a control device in a power semiconductor IC | |
US11257806B2 (en) | Semiconductor integrated circuit | |
JP2000156495A (ja) | 高耐圧横型半導体装置 | |
JP7115637B2 (ja) | 半導体集積回路 | |
JP6579273B2 (ja) | 半導体集積回路 | |
JP6226101B2 (ja) | 半導体集積回路 | |
JP2013247188A (ja) | 半導体装置 | |
JPH11163336A (ja) | 半導体装置 | |
JPH0758331A (ja) | 半導体装置 | |
JP5022013B2 (ja) | 静電気保護用半導体装置および自動車用複合ic | |
US6010950A (en) | Method of manufacturing semiconductor bonded substrate | |
JP2006332539A (ja) | 半導体集積回路装置 | |
JP7472522B2 (ja) | 半導体集積回路 | |
JP2013041891A (ja) | 半導体装置 | |
JP2011014740A (ja) | 半導体装置、半導体装置の制御方法、半導体モジュール | |
JP2023026061A (ja) | 半導体装置 | |
US20230187437A1 (en) | Semiconductor device | |
US20240128266A1 (en) | Semiconductor device | |
JP2022018931A (ja) | 半導体装置 | |
JP2022095150A (ja) | 半導体装置 | |
JP2629434B2 (ja) | アノードショート伝導度変調型misfetを備えた半導体装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210428 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210428 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220628 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220711 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7115637 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |