JP7100475B2 - Processing equipment - Google Patents

Processing equipment Download PDF

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JP7100475B2
JP7100475B2 JP2018067874A JP2018067874A JP7100475B2 JP 7100475 B2 JP7100475 B2 JP 7100475B2 JP 2018067874 A JP2018067874 A JP 2018067874A JP 2018067874 A JP2018067874 A JP 2018067874A JP 7100475 B2 JP7100475 B2 JP 7100475B2
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plate
shaped work
holding
tub
cleaning member
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JP2019179830A (en
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裕樹 阿部
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Disco Corp
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Disco Corp
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Priority to JP2018067874A priority Critical patent/JP7100475B2/en
Priority to KR1020190028060A priority patent/KR102672866B1/en
Priority to CN201910215867.1A priority patent/CN110315435B/en
Priority to TW108110554A priority patent/TWI779181B/en
Publication of JP2019179830A publication Critical patent/JP2019179830A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00Cleaning by methods involving the use of tools
    • B08B1/30Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00Cleaning by methods involving the use of tools
    • B08B1/10Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/14Wipes; Absorbent members, e.g. swabs or sponges
    • B08B1/143Wipes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00Cleaning by methods involving the use of tools
    • B08B1/30Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02Cleaning by the force of jets, e.g. blowing-out cavities
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/34Accessories
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/06Dust extraction equipment on grinding or polishing machines

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Description

本発明は、板状ワークを加工する加工装置に関する。 The present invention relates to a processing apparatus for processing a plate-shaped work.

板状ワークを研削する研削装置は、保持テーブルの保持面で保持した板状ワークを、研削砥石を環状に配設した研削ホイールを回転させ研削砥石で研削している。そして、研削した板状ワークを保持テーブルから離脱させる前に保持テーブル上で被研削面を洗浄し、その後、搬出手段で板状ワークを保持し、保持テーブルから板状ワークを離間させ、保持テーブルに保持されていた板状ワークの下面(被保持面)を洗浄ブラシ(例えば、特許文献1参照)や洗浄スポンジで洗浄している。 The grinding device that grinds the plate-shaped work grinds the plate-shaped work held by the holding surface of the holding table by rotating the grinding wheel in which the grinding wheel is arranged in an annular shape. Then, the surface to be ground is washed on the holding table before the ground plate-shaped work is separated from the holding table, and then the plate-shaped work is held by the carrying-out means, the plate-shaped work is separated from the holding table, and the holding table is separated. The lower surface (held surface) of the plate-shaped work held in the table is cleaned with a cleaning brush (see, for example, Patent Document 1) or a cleaning sponge.

特開2003-045841号公報Japanese Patent Application Laid-Open No. 2003-045841

しかし、板状ワークの下面の洗浄において、板状ワークに付着していたゴミが洗浄ブラシ又は洗浄スポンジに付着する。そして、そのゴミが板状ワークに再付着することで、板状ワークが十分に洗浄された状態にならないことがある。これを防ぐために、作業者が洗浄ブラシ又は洗浄スポンジの清掃を定期的に行っている。
よって、加工後の板状ワークの下面(被保持面)を洗浄する場合においては、作業者が洗浄ブラシ又は洗浄スポンジ等の洗浄部材の清掃作業を行わなくとも、綺麗な洗浄部材で板状ワークを継続して洗浄し続けることができるようにするという課題がある。
However, in cleaning the lower surface of the plate-shaped work, dust adhering to the plate-shaped work adheres to the cleaning brush or the cleaning sponge. Then, the dust may reattach to the plate-shaped work, so that the plate-shaped work may not be sufficiently cleaned. To prevent this, workers regularly clean the cleaning brush or cleaning sponge.
Therefore, when cleaning the lower surface (held surface) of the plate-shaped work after processing, the plate-shaped work is cleaned with a clean cleaning member without the need for the operator to clean the cleaning member such as a cleaning brush or a cleaning sponge. There is a problem of being able to continue cleaning.

上記課題を解決するための本発明は、保持面で板状ワークを保持する保持手段と、該保持面で保持した板状ワークを研削砥石で研削または研磨パッドで研磨する加工手段と、該加工手段で加工された板状ワークを該保持面に直交する方向で該保持面から離間させる搬出手段と、該搬出手段が保持する板状ワークの下面を洗浄する洗浄機構と、該保持面に平行なY軸方向に該保持手段を移動させる移動手段と、を備えた加工装置であって、該洗浄機構は、該Y軸方向に対して水平面内において交差する方向で且つ該保持面に平行に板状ワークの長手方向の長さ以上に延在する円筒状のロール洗浄部材と、該ロール洗浄部材の中心軸を軸に回転させる回転手段と、該ロール洗浄部材の側面の一部を延在方向に細長く露出させた露出部を形成すると共に該ロール洗浄部材の該露出部以外を収容し水没させる桶と、該桶に貯水する水供給手段と、を備え、該移動手段によって該保持手段と共に該Y軸方向に移動可能であり、該保持手段に対して、板状ワークの下面を洗浄する際の該保持手段の進行方向である+Y方向の反対側となる-Y方向側に配置され、該水供給手段により供給される水を該桶の上部から溢れさせながら、該移動手段によって該洗浄機構を該+Y方向に進行させ、該桶内で回転する該ロール洗浄部材の該露出部該搬出手段が保持した該板状ワークの下面当接させ、該板状ワークの下面を洗浄する加工装置である。 The present invention for solving the above problems includes a holding means for holding a plate-shaped work on a holding surface, a processing means for grinding the plate-shaped work held on the holding surface with a grinding wheel or a polishing pad, and the processing. A carry-out means for separating the plate-shaped work processed by the means from the holding surface in a direction orthogonal to the holding surface, a cleaning mechanism for cleaning the lower surface of the plate-shaped work held by the carrying-out means, and parallel to the holding surface. A processing device including a moving means for moving the holding means in the Y-axis direction , wherein the cleaning mechanism intersects the Y-axis direction in a horizontal plane and is parallel to the holding surface. A cylindrical roll cleaning member extending beyond the length in the longitudinal direction of the plate-shaped work, a rotating means for rotating the central axis of the roll cleaning member as an axis, and a part of a side surface of the roll cleaning member extending. It is provided with a tub for forming an exposed portion elongated in the direction and accommodating and submerging other than the exposed portion of the roll cleaning member, and a water supply means for storing water in the tub, together with the holding means by the moving means. It is movable in the Y-axis direction, and is arranged on the −Y direction side opposite to the + Y direction, which is the traveling direction of the holding means when cleaning the lower surface of the plate-shaped work, with respect to the holding means. While overflowing the water supplied by the water supply means from the upper part of the tub, the cleaning mechanism is advanced in the + Y direction by the moving means, and the exposed portion of the roll cleaning member rotating in the tub is covered with the exposed portion. It is a processing device that abuts on the lower surface of the plate-shaped work held by the carrying-out means and cleans the lower surface of the plate-shaped work.

上記加工装置は、前記ロール洗浄部材の延在方向に平行に延び、板状ワークの下面を洗浄するために前記+Y方向に進行する前記洗浄機構よりも前記-Y方向側に配設され、前記搬出手段が保持した板状ワークの下面にエアを噴射するエア噴射手段を備え、該洗浄機構を該+Y方向に進行させることにより洗浄された板状ワークの下面をエアで後から追うように乾燥させると好ましい。 The processing apparatus is arranged on the −Y direction side of the cleaning mechanism that extends in parallel to the extending direction of the roll cleaning member and advances in the + Y direction in order to clean the lower surface of the plate-shaped work. An air injection means for injecting air to the lower surface of the plate-shaped work held by the carrying-out means is provided, and the lower surface of the plate-shaped work cleaned by advancing the cleaning mechanism in the + Y direction is followed by the air. It is preferable to dry it.

本発明に係る加工装置は、保持面で板状ワークを保持する保持手段と、搬出手段が保持する板状ワークの下面を洗浄する洗浄機構と、保持面に平行なY軸方向に保持手段を移動させる移動手段と、を備えた加工装置であって、洗浄機構は、Y軸方向に対して水平面内において交差する方向で且つ保持面に平行に板状ワークの長手方向の長さ以上に延在する円筒状のロール洗浄部材と、ロール洗浄部材の中心軸を軸に回転させる回転手段と、ロール洗浄部材の側面の一部を延在方向に細長く露出させた露出部を形成すると共にロール洗浄部材の露出部以外を収容し水没させる桶と、桶に貯水する水供給手段と、を備え、移動手段によって保持手段と共にY軸方向に移動可能であり、保持手段に対して、板状ワークの下面を洗浄する際の保持手段の進行方向である+Y方向の反対側となる-Y方向側に配置され、水供給手段により供給される水を桶の上部から溢れさせながら、移動手段によって洗浄機構を+Y方向に進行させ、桶内で回転するロール洗浄部材の露出部搬出手段が保持した板状ワークの下面当接させ、板状ワークの下面を洗浄するため、ワーク洗浄中にロール洗浄部材に付着したゴミを桶の水中で濯ぎ落として、洗浄中にロール洗浄部材から板状ワークにゴミを再付着させないようにして、綺麗なロール洗浄部材で継続して板状ワークの下面を洗浄できる。また、搬出手段が板状ワークを吸引保持可能な位置と、板状ワークを加工手段が加工可能な加工位置とに保持手段を移動させる移動手段によって、洗浄機構を板状ワークの下面を洗浄させるために移動させることが可能となるため、従来と異なり、洗浄機構を板状ワークの下面を洗浄させるために移動させる用途のみの移動機構を備えずに済み、装置の小型化、低コスト化を図ることが可能となる。さらに、移動手段によって保持手段と共に移動可能な洗浄機構が、保持手段に対して、板状ワークの下面を洗浄する際の保持手段の進行方向である+Y方向の反対側となる-Y方向側(進行方向における保持手段の後方側)に配置されていることで、搬出手段が保持する板状ワークの下方を保持手段が通過した後に、洗浄機構により板状ワークの下面の洗浄が開始されるため、保持手段が洗浄後の板状ワークから垂れ落ちる洗浄水によって汚されることが無い。 The processing apparatus according to the present invention includes a holding means for holding the plate-shaped work on the holding surface, a cleaning mechanism for cleaning the lower surface of the plate-shaped work held by the carrying-out means, and a holding means in the Y-axis direction parallel to the holding surface. A processing device provided with a moving means for moving, wherein the cleaning mechanism extends beyond the longitudinal length of the plate-shaped work in a direction intersecting the Y-axis direction in the horizontal plane and parallel to the holding surface. A cylindrical roll cleaning member, a rotating means for rotating the central axis of the roll cleaning member, and an exposed portion in which a part of the side surface of the roll cleaning member is exposed in the extending direction are formed and the roll cleaning is performed. It is equipped with a tub for accommodating and submerging parts other than the exposed part of the member and a water supply means for storing water in the tub, and can be moved in the Y-axis direction together with the holding means by the moving means. The cleaning mechanism is arranged by the moving means while overflowing the water supplied by the water supply means from the upper part of the tub, which is arranged on the -Y direction side opposite to the + Y direction, which is the traveling direction of the holding means when cleaning the lower surface. In the + Y direction, the exposed part of the roll cleaning member rotating in the tub is brought into contact with the lower surface of the plate-shaped work held by the carrying-out means, and the lower surface of the plate-shaped work is cleaned. Rinse off the dust adhering to the member in the water of the tub to prevent the dust from reattaching from the roll cleaning member to the plate-shaped work during cleaning, and continuously clean the lower surface of the plate-shaped work with a clean roll cleaning member. can. Further, the cleaning mechanism cleans the lower surface of the plate-shaped work by the moving means for moving the holding means to the position where the carrying-out means can suck and hold the plate-shaped work and the processing position where the plate-shaped work can be machined. Therefore, unlike the conventional method, it is not necessary to have a moving mechanism only for the purpose of moving the cleaning mechanism to clean the lower surface of the plate-shaped work, which makes the device smaller and lower in cost. It is possible to plan. Further, the cleaning mechanism that can be moved together with the holding means by the moving means is opposite to the holding means in the + Y direction, which is the traveling direction of the holding means when cleaning the lower surface of the plate-shaped work. Since it is arranged on the rear side of the holding means in the traveling direction), the cleaning mechanism starts cleaning the lower surface of the plate-shaped work after the holding means passes under the plate-shaped work held by the carrying-out means. The holding means is not contaminated by the washing water dripping from the plate-shaped work after washing.

加工装置は、ロール洗浄部材の延在方向に平行に延び、板状ワークの下面を洗浄するために+Y方向に進行する洗浄機構よりも-Y方向側に配設され、搬出手段が保持した板状ワークの下面にエアを噴射するエア噴射手段を備えることで、板状ワークの長手方向の長さ以上に延在するロール洗浄部材によ洗浄された板状ワークの下面を、洗浄の後を追うようにエアで乾燥させることができるため、移動手段による板状ワークの一方向の洗浄送りで板状ワークの下面全面を洗浄及び乾燥させて洗浄時間を短縮することができる。 The processing apparatus is arranged in the −Y direction side of the cleaning mechanism that extends in parallel to the extending direction of the roll cleaning member and proceeds in the + Y direction to clean the lower surface of the plate-shaped work, and is held by the carrying-out means. By providing an air injection means for injecting air on the lower surface of the shaped work, the lower surface of the plate-shaped work cleaned by the roll cleaning member extending beyond the length in the longitudinal direction of the plate-shaped work is cleaned. Since it can be dried with air so as to follow the above, the entire lower surface of the plate-shaped work can be washed and dried by the one-way cleaning feed of the plate-shaped work by the moving means, and the cleaning time can be shortened.

加工装置の一例を示す斜視図である。It is a perspective view which shows an example of a processing apparatus. 洗浄機構及びエア噴射手段の一例を拡大して示す斜視図である。It is a perspective view which shows an enlarged example of a cleaning mechanism and an air injection means. 洗浄機構による板状ワークの下面の洗浄を開始した状態を示す斜視図である。It is a perspective view which shows the state which started the cleaning of the lower surface of a plate-shaped work by the cleaning mechanism. 洗浄機構により板状ワークの下面を洗浄し、エア噴射手段により板状ワークの下面を乾燥している状態を示す断面図である。It is sectional drawing which shows the state which the lower surface of a plate-shaped work is cleaned by the cleaning mechanism, and the lower surface of a plate-shaped work is dried by an air injection means.

図1に示す加工装置1は、保持手段30に保持された板状ワークWを研削砥石740を備える加工手段7により研削加工する装置であり、Y軸方向に延びるベース10と、ベース10上の後部側(+Y方向側)に立設されたコラム11とを備えている。なお、加工装置1は、回転可能に装着された研磨パッドによって板状ワークWに研磨加工を施すことができる研磨装置であってもよい。 The processing device 1 shown in FIG. 1 is a device for grinding a plate-shaped work W held by the holding means 30 by a processing means 7 provided with a grinding wheel 740, and is a device that grinds the plate-shaped work W held by the holding means 30 on a base 10 extending in the Y-axis direction and on the base 10. It is provided with a column 11 erected on the rear side (+ Y direction side). The processing device 1 may be a polishing device capable of polishing the plate-shaped work W by a polishing pad rotatably mounted.

例えば外形が円形の保持手段30は、ポーラス部材等からなり板状ワークWを吸着する吸着部300と、吸着部300を支持する枠体301とを備える。吸着部300は、真空発生装置等の図示しない吸引源に連通し、吸引源が吸引することで生み出された吸引力が、吸着部300の露出面である保持面300aに伝達されることで、保持手段30は保持面300a上で板状ワークWを吸引保持できる。
また、保持手段30は、保持手段30と共に移動可能なカバー39により周囲を囲まれつつ、保持手段30の下方に配設された回転手段34によりZ軸方向の軸心周りに回転可能となっている。
For example, the holding means 30 having a circular outer shape includes a suction portion 300 which is made of a porous member or the like and sucks the plate-shaped work W, and a frame body 301 which supports the suction portion 300. The suction unit 300 communicates with a suction source (not shown) such as a vacuum generator, and the suction force generated by the suction source sucking is transmitted to the holding surface 300a which is the exposed surface of the suction unit 300. The holding means 30 can suck and hold the plate-shaped work W on the holding surface 300a.
Further, the holding means 30 can be rotated around the axis in the Z-axis direction by the rotating means 34 arranged below the holding means 30 while being surrounded by a cover 39 that can move together with the holding means 30. There is.

保持手段30、カバー39、及びカバー39に連結された蛇腹カバー39aの下方には、保持手段30を保持面300a方向(Y軸方向)に移動させる移動手段14が配設されている。移動手段14は、Y軸方向の軸心を有するボールネジ140と、ボールネジ140と平行に配設された一対のガイドレール141と、ボールネジ140に連結しボールネジ140を回動させるモータ142と、内部に備えるナットがボールネジ140に螺合し底部がガイドレール141上を摺動する可動板143とを備えており、モータ142がボールネジ140を回動させると、これに伴い可動板143がガイドレール141にガイドされてY軸方向に移動し、可動板143上に回転手段34を介して配設された保持手段30及びカバー39がY軸方向に移動する。また、蛇腹カバー39aは保持手段30の移動に伴ってY軸方向に伸縮する。 Below the holding means 30, the cover 39, and the bellows cover 39a connected to the cover 39, a moving means 14 for moving the holding means 30 in the holding surface 300a direction (Y-axis direction) is arranged. The moving means 14 includes a ball screw 140 having an axial center in the Y-axis direction, a pair of guide rails 141 arranged in parallel with the ball screw 140, a motor 142 connected to the ball screw 140 and rotating the ball screw 140, and the inside thereof. The provided nut is screwed into the ball screw 140, and the bottom portion is provided with a movable plate 143 that slides on the guide rail 141. When the motor 142 rotates the ball screw 140, the movable plate 143 becomes the guide rail 141 accordingly. Guided and moved in the Y-axis direction, the holding means 30 and the cover 39 arranged on the movable plate 143 via the rotating means 34 move in the Y-axis direction. Further, the bellows cover 39a expands and contracts in the Y-axis direction with the movement of the holding means 30.

コラム11の前面には加工手段7を保持手段30の保持面300aに対して離間又は接近するZ軸方向(鉛直方向)に加工送りする加工送り手段5が配設されている。加工送り手段5は、Z軸方向の軸心を有するボールネジ50と、ボールネジ50と平行に配設された一対のガイドレール51と、ボールネジ50の上端に連結しボールネジ50を回動させるモータ52と、内部のナットがボールネジ50に螺合し側部がガイドレール51に摺接する昇降板53とを備えており、モータ52がボールネジ50を回動させることに伴い昇降板53がガイドレール51にガイドされてZ軸方向に往復移動し、昇降板53に固定された加工手段7がZ軸方向に加工送りされる。 On the front surface of the column 11, a machining feed means 5 for machining and feeding the machining means 7 in the Z-axis direction (vertical direction) separated or approaching the holding surface 300a of the holding means 30 is arranged. The machining feed means 5 includes a ball screw 50 having an axial center in the Z-axis direction, a pair of guide rails 51 arranged in parallel with the ball screw 50, and a motor 52 connected to the upper end of the ball screw 50 to rotate the ball screw 50. It is provided with an elevating plate 53 in which an internal nut is screwed into the ball screw 50 and a side portion is in sliding contact with the guide rail 51, and the elevating plate 53 guides the elevating plate 53 to the guide rail 51 as the motor 52 rotates the ball screw 50. Then, it reciprocates in the Z-axis direction, and the machining means 7 fixed to the elevating plate 53 is machined and fed in the Z-axis direction.

保持手段30に保持された板状ワークWを研削加工する加工手段7は、軸方向がZ軸方向である回転軸70と、回転軸70を回転可能に支持するハウジング71と、回転軸70を回転駆動するモータ72と、回転軸70の下端に接続された円形板状のマウント73と、マウント73の下面に着脱可能に装着された研削ホイール74と、ハウジング71を支持し加工送り手段5の昇降板53にその側面が固定されたホルダ75とを備える。 The processing means 7 for grinding the plate-shaped work W held by the holding means 30 includes a rotating shaft 70 whose axial direction is the Z-axis direction, a housing 71 that rotatably supports the rotating shaft 70, and a rotating shaft 70. A rotary drive motor 72, a circular plate-shaped mount 73 connected to the lower end of the rotary shaft 70, a grinding wheel 74 detachably mounted on the lower surface of the mount 73, and a machining feed means 5 that supports the housing 71. The elevating plate 53 is provided with a holder 75 whose side surface is fixed.

研削ホイール74の底面には、略直方体形状の複数の研削砥石740が環状に固定されている。回転軸70の内部には、研削水供給源に連通し研削水の通り道となる流路が、回転軸70の軸方向に貫通して設けられており、流路は、マウント73を通り、研削ホイール74の底面において研削砥石740に向かって研削水を噴出できるように開口している。
なお、加工手段7は、不織布等からなる研磨パッドを備える研磨手段であってもよい。
A plurality of grinding wheels 740 having a substantially rectangular cuboid shape are fixed to the bottom surface of the grinding wheel 74 in an annular shape. Inside the rotating shaft 70, a flow path that communicates with the grinding water supply source and serves as a path for grinding water is provided so as to penetrate in the axial direction of the rotating shaft 70, and the flow path passes through the mount 73 and grinds. The bottom surface of the wheel 74 is opened so that grinding water can be ejected toward the grinding wheel 740.
The processing means 7 may be a polishing means provided with a polishing pad made of a non-woven fabric or the like.

ベース10上のコラム11の前方かつ加工手段7の下方となる位置には、例えば、箱状の加工室16が配設されている。加工室16を構成する側板160には搬入出口161が形成されており、搬入出口161を保持手段30が通過することで、保持手段30を加工室16内に収容することができる。搬入出口161は図示しないシャッターによって開閉可能となっている。加工室16を構成する天板162には、加工手段7を加工室16内に進入させる円形状の加工手段進入口163が形成されている。 For example, a box-shaped processing chamber 16 is arranged in front of the column 11 on the base 10 and below the processing means 7. A carry-in outlet 161 is formed in the side plate 160 constituting the processing chamber 16, and the holding means 30 can be accommodated in the processing chamber 16 by passing the carry-in outlet 161 through the carrying-in outlet 161. The carry-in outlet 161 can be opened and closed by a shutter (not shown). The top plate 162 constituting the processing chamber 16 is formed with a circular processing means entrance 163 that allows the processing means 7 to enter the processing chamber 16.

ベース10上の保持手段30の移動経路脇には、加工手段7で加工された板状ワークWを保持手段30の保持面300aに直交する方向(Z軸方向)で保持面300aから離間させる搬出手段4が配設されている。
搬出手段4は、例えば、ベース10上に立設され後述する保持パッド42を所定の高さ位置に移動可能とするシリンダ機構40と、シリンダ機構40の上端側に固定され保持手段30の移動経路の上方側に水平(+X方向)に延びるアーム部41と、アーム部41の先端側の下面に配設され板状ワークWを吸引保持する保持パッド42とを備えている。
On the side of the movement path of the holding means 30 on the base 10, the plate-shaped work W machined by the processing means 7 is carried out so as to be separated from the holding surface 300a in the direction orthogonal to the holding surface 300a of the holding means 30 (Z-axis direction). Means 4 are arranged.
The carrying-out means 4 is, for example, a cylinder mechanism 40 that is erected on the base 10 and enables the holding pad 42 described later to be moved to a predetermined height position, and a moving path of the holding means 30 that is fixed to the upper end side of the cylinder mechanism 40. It is provided with an arm portion 41 extending horizontally (in the + X direction) on the upper side of the arm portion 41 and a holding pad 42 disposed on the lower surface of the arm portion 41 on the tip end side to suck and hold the plate-shaped work W.

保持パッド42は、例えば、板状ワークWの外形に合わせた矩形状をしており、その下面が、ポーラス部材等からなり板状ワークWを吸引保持する保持面となる。保持パッド42の該保持面は、吸引管421を介して真空発生装置等の吸引源43に連通している。 The holding pad 42 has, for example, a rectangular shape that matches the outer shape of the plate-shaped work W, and its lower surface is a holding surface made of a porous member or the like for sucking and holding the plate-shaped work W. The holding surface of the holding pad 42 communicates with a suction source 43 such as a vacuum generator via a suction pipe 421.

図1、2に示すように、加工装置1は、搬出手段4が保持する板状ワークWの下面Waを洗浄する洗浄機構8を備えている。洗浄機構8は、保持手段30の近傍に配設され、保持手段30と共に移動手段14によってY軸方向に往復移動可能となっている。即ち、洗浄機構8は、例えば、カバー39の上面上に配設されている。
なお、洗浄機構8の配設箇所は本実施形態に示す例に限定されず、例えば、保持手段30の枠体301の側面に連結部材を介して所定距離-Y方向に離した状態で取り付けられていてもよい。
As shown in FIGS. 1 and 2, the processing apparatus 1 includes a cleaning mechanism 8 for cleaning the lower surface Wa of the plate-shaped work W held by the carrying-out means 4. The cleaning mechanism 8 is arranged in the vicinity of the holding means 30, and can be reciprocated in the Y-axis direction by the moving means 14 together with the holding means 30. That is, the cleaning mechanism 8 is arranged, for example, on the upper surface of the cover 39.
The location of the cleaning mechanism 8 is not limited to the example shown in the present embodiment, and is, for example, attached to the side surface of the frame body 301 of the holding means 30 via a connecting member in a state of being separated from each other in the predetermined distance −Y direction. May be.

図2に拡大して示す洗浄機構8は、移動手段14が保持手段30を移動させる方向(Y軸方向)に対して交差(直交差)する方向(X軸方向)で且つ保持手段30の保持面300aに平行に延在する円筒状のロール洗浄部材80と、ロール洗浄部材80の中心軸を軸に回転させる回転手段81と、ロール洗浄部材80の側面の一部を延在方向(X軸方向)に細長く露出させた露出部801を形成すると共にロール洗浄部材80の露出部801以外を収容し水没させる桶82と、桶82に洗浄水を供給して貯水する水供給手段83と、を備えている。 The cleaning mechanism 8 enlarged and shown in FIG. 2 is held in a direction (X-axis direction) in which the moving means 14 intersects (orthogonally different) with respect to the direction in which the holding means 30 is moved (Y-axis direction) and holds the holding means 30. A cylindrical roll cleaning member 80 extending parallel to the surface 300a, a rotating means 81 for rotating the central axis of the roll cleaning member 80 as an axis, and a part of the side surface of the roll cleaning member 80 in the extending direction (X-axis). A tub 82 for forming an elongated exposed portion 801 and submerging the roll cleaning member 80 other than the exposed portion 801 and a water supply means 83 for supplying and storing cleaning water to the tub 82. I have.

X軸方向に延びる円筒状のロール洗浄部材80は、本実施形態においては、所定の厚みを備えるスポンジを円筒状に成型したものであり、板状ワークWの長手方向の長さ以上の長さを備えている。スポンジとしては、例えば、ポリウレタンを発泡成形して作られるスポンジ、PVAスポンジ、又はゴムに発泡剤等を練り込み成形されるスポンジ等を用いる。なお、ロール洗浄部材80は、スポンジに限定されるものではなく、例えば、弾力性を備える化学繊維等を直毛状に形成し密集させ、さらにロール状に形成した洗浄ブラシであってもよい。
ロール洗浄部材80は、その筒内に回転手段81の回転シャフト810が挿入され、回転シャフト810に対して固定された状態となっている。
In the present embodiment, the cylindrical roll cleaning member 80 extending in the X-axis direction is formed by molding a sponge having a predetermined thickness into a cylindrical shape, and has a length equal to or longer than the length of the plate-shaped work W in the longitudinal direction. It is equipped with. As the sponge, for example, a sponge made by foam-molding polyurethane, a PVA sponge, or a sponge formed by kneading a foaming agent or the like into rubber is used. The roll cleaning member 80 is not limited to the sponge, and may be, for example, a cleaning brush in which elastic chemical fibers or the like are formed in a straight hair shape and densely formed, and further formed in a roll shape.
The roll cleaning member 80 is in a state in which the rotary shaft 810 of the rotary means 81 is inserted into the cylinder and is fixed to the rotary shaft 810.

桶82は、例えば、略長方形状の底板82aと、底板82aの四辺から立設される4枚の側板とからなり上部が開口している。例えば、桶82を構成する2枚の側板82b、82c(桶82の長手方向(X軸方向)において対面する側板82b、82c)には、軸受けを備える図示しない貫通孔がそれぞれ厚さ方向に向かって貫通形成されており、ロール洗浄部材80が固定された回転シャフト810が、この貫通孔を通して桶82に挿通されている。 The tub 82 is composed of, for example, a substantially rectangular bottom plate 82a and four side plates erected from the four sides of the bottom plate 82a, and the upper portion thereof is open. For example, through holes (not shown) provided with bearings face in the thickness direction of the two side plates 82b and 82c (side plates 82b and 82c facing each other in the longitudinal direction (X-axis direction) of the tub 82) constituting the tub 82. A rotary shaft 810 to which the roll cleaning member 80 is fixed is inserted into the tub 82 through the through hole.

桶82の容積は、例えば、ロール洗浄部材80全体を収容可能な大きさとなっている。図2に示すように、ロール洗浄部材80が装着された回転シャフト810の桶82内の配設高さ位置が調整されることで、ロール洗浄部材80の側面の一部が延在方向(X軸方向)に細長く桶82内からはみ出し露出した露出部801となる。また、ロール洗浄部材80と桶82の底板82aとの間には所定の大きさの隙間(図4参照)が形成された状態になる。 The volume of the tub 82 is, for example, large enough to accommodate the entire roll cleaning member 80. As shown in FIG. 2, by adjusting the arrangement height position in the tub 82 of the rotary shaft 810 on which the roll cleaning member 80 is mounted, a part of the side surface of the roll cleaning member 80 is extended in the extending direction (X). The exposed portion 801 is elongated in the axial direction) and protrudes from the inside of the tub 82. Further, a gap (see FIG. 4) having a predetermined size is formed between the roll cleaning member 80 and the bottom plate 82a of the tub 82.

回転シャフト810の+X方向側の一端には、カップリング等を介してモータ811が連結されている。モータ811が回転シャフト810を回転させることで、回転シャフト810に装着されたロール洗浄部材80も桶82内でX軸方向の軸心周りに回転する。 A motor 811 is connected to one end of the rotary shaft 810 on the + X direction side via a coupling or the like. When the motor 811 rotates the rotary shaft 810, the roll cleaning member 80 mounted on the rotary shaft 810 also rotates around the axis in the X-axis direction in the tub 82.

図2、4に示すように、桶82は、例えば、桶82と同方向に延在しカバー39上に固定された一対の支持台86の上に固定されており、桶82の下方の隙間には、可撓性を有するチューブ等からなる水供給管830が配設されている。水供給管830は、ポンプ等から構成され純水等の洗浄水を供給可能な水供給源831に連通しており、水供給管830と水供給源831とにより桶82に水を貯水する水供給手段83が構成される。図4に示すように、例えば、桶82の底板82aには、桶82の延在方向に等間隔空けて複数の水供給口820が形成されており、各水供給口820は水供給管830に連通している。 As shown in FIGS. 2 and 4, the tub 82 is fixed on a pair of support bases 86 extending in the same direction as the tub 82 and fixed on the cover 39, and the gap below the tub 82 is fixed. Is provided with a water supply pipe 830 made of a flexible tube or the like. The water supply pipe 830 communicates with a water supply source 831 which is composed of a pump or the like and can supply washing water such as pure water, and the water is stored in the tub 82 by the water supply pipe 830 and the water supply source 831. The supply means 83 is configured. As shown in FIG. 4, for example, the bottom plate 82a of the tub 82 is formed with a plurality of water supply ports 820 at equal intervals in the extending direction of the tub 82, and each water supply port 820 is a water supply pipe 830. Communicate with.

図2、4に示すように、本実施形態における加工装置1は、ロール洗浄部材80の延在方向(X軸方向)に平行に延び、且つ板状ワークWを洗浄する時の搬出手段4に対する洗浄機構8の進行方向(+Y方向)において洗浄機構8の後方側(-Y方向側)に配設され、搬出手段4が保持した板状ワークWにエアを噴射するエア噴射手段2を備える。 As shown in FIGS. The air injection means 2 is provided on the rear side (−Y direction side) of the cleaning mechanism 8 in the traveling direction (+ Y direction) of the cleaning mechanism 8 and injects air into the plate-shaped work W held by the carrying-out means 4.

エア噴射手段2は、例えば、桶82の側板に配設されている。エア噴射手段2は、例えば、X軸方向に延びる台部20と、台部20の上面に複数所定間隔を空けて並ぶように開口する噴射口21と、コンプレッサー及び圧縮エア貯留タンク等からなり各噴射口21に圧縮エアを供給するエア供給源22と、噴射口21から噴射したエアを例えばロール洗浄部材80側に導く誘導板23とを備えている。
台部20と同程度の長さを備える誘導板23は、例えば、台部20の上面に固定されており、ロール洗浄部材80側に向かってなだらかに湾曲している。
The air injection means 2 is arranged, for example, on the side plate of the tub 82. The air injection means 2 includes, for example, a pedestal 20 extending in the X-axis direction, an injection port 21 opening on the upper surface of the pedestal 20 so as to line up at a plurality of predetermined intervals, a compressor, a compressed air storage tank, and the like. It includes an air supply source 22 that supplies compressed air to the injection port 21, and a guide plate 23 that guides the air injected from the injection port 21 to, for example, the roll cleaning member 80 side.
The guide plate 23 having a length similar to that of the base portion 20 is fixed to the upper surface of the base portion 20, for example, and is gently curved toward the roll cleaning member 80 side.

各噴射口21は、図2に示すような丸穴状に形成される例に限定されず、例えば、細幅のスリット状に形成されていてもよいし、台部20の上面に一本連続的に直線状に延びる細幅のスリットに形成されていてもよい。
また、各噴射口21は真上を向いているのではなく、+Y方向側の斜め上方に向かうように開口していてもよいし、誘導板23を備えないものとしてもよい。
Each injection port 21 is not limited to the example formed in the shape of a round hole as shown in FIG. 2, and may be formed in the shape of a narrow slit, for example, or one continuous injection port 21 on the upper surface of the base portion 20. It may be formed in a narrow slit extending linearly.
Further, each injection port 21 may be opened so as to be diagonally upward on the + Y direction side instead of facing directly upward, or may not be provided with the guide plate 23.

例えば、カバー39上の保持手段30と洗浄機構8との間には、区切り壁38が配設されており、区切り壁38は、洗浄機構8の桶82から溢れ出た研削屑等のゴミが混じった洗浄水が保持手段30側に流れていくことを防ぐ。 For example, a partition wall 38 is disposed between the holding means 30 on the cover 39 and the cleaning mechanism 8, and the partition wall 38 contains dust such as grinding debris overflowing from the tub 82 of the cleaning mechanism 8. It prevents the mixed washing water from flowing to the holding means 30 side.

以下に、保持手段30に保持された板状ワークWを研削加工する場合の加工装置1の動作について説明する。図1に示す板状ワークWは、例えば、外形が矩形状の大型の基板であり、図1において下方を向いている板状ワークWの下面Waには回路が形成されており、上方を向いている板状ワークWの上面Wbは、研削加工が施される被研削面となる。なお、板状ワークWは図示の例に限定されるものではなく、円形板状の半導体ウェーハ等であってもよい。 The operation of the processing apparatus 1 when grinding the plate-shaped work W held by the holding means 30 will be described below. The plate-shaped work W shown in FIG. 1 is, for example, a large substrate having a rectangular outer shape, and a circuit is formed on the lower surface Wa of the plate-shaped work W facing downward in FIG. 1 and faces upward. The upper surface Wb of the plate-shaped work W is a surface to be ground to be ground. The plate-shaped work W is not limited to the illustrated example, and may be a circular plate-shaped semiconductor wafer or the like.

まず、板状ワークWが保持手段30の保持面300aに載置され吸引保持される。次いで、移動手段14が、板状ワークWを保持した保持手段30を+Y方向へ移動させる。また、加工室16の図示しないシャッターが開き、保持手段30が側板160の搬入出口161を通り加工室16内に搬入された後、シャッターが閉じられる。 First, the plate-shaped work W is placed on the holding surface 300a of the holding means 30 and is sucked and held. Next, the moving means 14 moves the holding means 30 holding the plate-shaped work W in the + Y direction. Further, a shutter (not shown) of the processing chamber 16 is opened, and the holding means 30 is carried into the processing chamber 16 through the carry-in outlet 161 of the side plate 160, and then the shutter is closed.

板状ワークWを保持した保持手段30が加工手段7の下まで移動して、研削砥石740の回転軌道が板状ワークWの回転中心を通るように板状ワークWと加工手段7との位置合わせがなされる。
図1に示すモータ72により回転軸70が回転駆動されるのに伴って、研削ホイール74が回転する。また、加工手段7が図1に示す加工送り手段5により-Z方向へと送られ、研削ホイール74が加工手段進入口163を通り加工室16内に進入していく。そして、回転する研削砥石740が板状ワークWの上面Wbに当接することで研削加工が行われる。また、回転手段34が保持手段30を回転させることで保持面300a上に保持された板状ワークWも回転するので、板状ワークWの上面Wbの全面が研削される。研削加工中は、研削水が研削砥石740と板状ワークWとの接触部位に対して供給され、接触部位の冷却・洗浄がなされる。
The position of the plate-shaped work W and the processing means 7 so that the holding means 30 holding the plate-shaped work W moves to the bottom of the processing means 7 and the rotation trajectory of the grinding wheel 740 passes through the rotation center of the plate-shaped work W. Matching is done.
As the rotary shaft 70 is rotationally driven by the motor 72 shown in FIG. 1, the grinding wheel 74 rotates. Further, the machining means 7 is fed in the −Z direction by the machining feed means 5 shown in FIG. 1, and the grinding wheel 74 passes through the machining means entrance 163 and enters the machining chamber 16. Then, the rotating grinding wheel 740 comes into contact with the upper surface Wb of the plate-shaped work W to perform the grinding process. Further, since the plate-shaped work W held on the holding surface 300a is also rotated by the rotating means 34 rotating the holding means 30, the entire surface of the upper surface Wb of the plate-shaped work W is ground. During the grinding process, grinding water is supplied to the contact portion between the grinding wheel 740 and the plate-shaped work W, and the contact portion is cooled and washed.

板状ワークWの上面Wbが所定量研削された後、加工手段7が加工送り手段5により+Z方向へと引き上げられて、研削砥石740が板状ワークWから離間する。次いで、移動手段14が、研削済みの板状ワークWを保持した保持手段30を-Y方向へ移動させる。また、加工室16の図示しないシャッターが開き、保持手段30が図示しない搬入出口161を通り加工室16外に搬出される。 After the upper surface Wb of the plate-shaped work W is ground by a predetermined amount, the machining means 7 is pulled up in the + Z direction by the machining feed means 5, and the grinding wheel 740 is separated from the plate-shaped work W. Next, the moving means 14 moves the holding means 30 holding the ground plate-shaped work W in the −Y direction. Further, a shutter (not shown) of the processing chamber 16 is opened, and the holding means 30 is carried out of the processing chamber 16 through a carry-in outlet 161 (not shown).

移動手段14が、板状ワークWを吸引保持した保持手段30を搬出手段4の真下の位置まで-Y方向に移動させる。
図3に示すように、シリンダ機構40が保持パッド42を降下させて、保持パッド42の保持面と板状ワークWの上面Wbとを接触させる。吸引源43が作動して生み出される吸引力が保持パッド42の保持面に伝達されることで、保持パッド42が板状ワークWを吸引保持する。保持手段30による板状ワークWの吸引保持が解除され、搬出手段4が、加工手段7で加工された板状ワークWを保持手段30の保持面300aから+Z方向に離間させる
The moving means 14 moves the holding means 30 that sucks and holds the plate-shaped work W to a position directly below the carrying-out means 4 in the −Y direction.
As shown in FIG. 3, the cylinder mechanism 40 lowers the holding pad 42 to bring the holding surface of the holding pad 42 into contact with the upper surface Wb of the plate-shaped work W. The suction force generated by the operation of the suction source 43 is transmitted to the holding surface of the holding pad 42, so that the holding pad 42 sucks and holds the plate-shaped work W. The suction holding of the plate-shaped work W by the holding means 30 is released, and the carrying-out means 4 separates the plate-shaped work W machined by the processing means 7 from the holding surface 300a of the holding means 30 in the + Z direction.

図4に示すように、水供給源831が水供給管830に洗浄水を送出し、該洗浄水が桶82内に貯水されていく。桶82内が洗浄水で満たされた後も、水供給源831からの洗浄水の供給が継続してなされることで、洗浄水が桶82の上部から溢れ出る状態になり、ロール洗浄部材80の露出部801以外が桶82に収容され水没した状態になる。また、ロール洗浄部材80全体が洗浄水を十分に含んだ状態になる。 As shown in FIG. 4, the water supply source 831 sends wash water to the water supply pipe 830, and the wash water is stored in the tub 82. Even after the inside of the tub 82 is filled with the washing water, the washing water is continuously supplied from the water supply source 831, so that the washing water overflows from the upper part of the tub 82, and the roll cleaning member 80 Except for the exposed portion 801 of the above, the portion other than the exposed portion 801 is housed in the tub 82 and is submerged. In addition, the entire roll cleaning member 80 is in a state of sufficiently containing cleaning water.

板状ワークWを吸引保持する搬出手段4の保持パッド42が、板状ワークWの下面Waがロール洗浄部材80の露出部801に接触するように、シリンダ機構40(図3参照)により所定の高さ位置に位置付けられる。また、図4に示すように、移動手段14が、洗浄機構8を+Y方向に所定の洗浄送り速度で移動させることで、ロール洗浄部材80の露出部801が、板状ワークWの下面Waに対して接触していく。即ち、露出部801が板状ワークWに押し付けられ板状ワークWの下面Waに合わせて変形していき、その接触面積が最大化される。
この状態で、モータ811が回転シャフト810を回転させることで、回転シャフト810と共に回転するロール洗浄部材80が板状ワークWの下面Waを-Y方向側から+Y方向側に向かって洗浄していく。
The holding pad 42 of the carrying-out means 4 that sucks and holds the plate-shaped work W is determined by the cylinder mechanism 40 (see FIG. 3) so that the lower surface Wa of the plate-shaped work W comes into contact with the exposed portion 801 of the roll cleaning member 80. Positioned at the height position. Further, as shown in FIG. 4, the moving means 14 moves the cleaning mechanism 8 in the + Y direction at a predetermined cleaning feed rate, so that the exposed portion 801 of the roll cleaning member 80 is moved to the lower surface Wa of the plate-shaped work W. I will contact you. That is, the exposed portion 801 is pressed against the plate-shaped work W and deformed in accordance with the lower surface Wa of the plate-shaped work W, and the contact area thereof is maximized.
In this state, the motor 811 rotates the rotary shaft 810, and the roll cleaning member 80 that rotates together with the rotary shaft 810 cleans the lower surface Wa of the plate-shaped work W from the −Y direction side to the + Y direction side. ..

ロール洗浄部材80の露出部801が板状ワークWの下面Waを洗浄していくのに伴って、回転するロール洗浄部材80の側面には、板状ワークWに付着していた研削屑等のゴミが付着する。このロール洗浄部材80に付着したゴミは、ロール洗浄部材80の回転に伴って桶82内に入り、桶82に貯水されている洗浄水によりロール洗浄部材80の側面から濯ぎ落とされる。該ゴミが、洗浄水よりも比重が小さい場合には、桶82から溢れ出る洗浄水と共に桶82の外部に流下するので、ロール洗浄部材80に再び付着することはない。したがって、水供給源831から洗浄水が桶82に供給され続けることで、桶82内は一定量の清潔な洗浄水が貯水された状態が保たれる。
一方で、該ゴミが洗浄水よりも比重が大きい場合には、該ゴミは桶82の底板82aに沈殿しないように、洗浄水を桶82の底板82a側から供給させ、ゴミが沈殿する前に桶82から洗浄水と共に溢れ出させ、桶82の内部を綺麗な状態で維持させ、ゴミをロール洗浄部材80に再び付着させないようにする。また、板状ワークWを1枚洗浄するごとに桶82の洗浄水を排水させる排水弁(不図示)を備えてもよい。
As the exposed portion 801 of the roll cleaning member 80 cleans the lower surface Wa of the plate-shaped work W, the side surface of the rotating roll cleaning member 80 is covered with grinding debris and the like adhering to the plate-shaped work W. Dust adheres. The dust adhering to the roll cleaning member 80 enters the tub 82 as the roll cleaning member 80 rotates, and is rinsed off from the side surface of the roll cleaning member 80 by the cleaning water stored in the tub 82. When the dust has a lower specific gravity than the washing water, it flows down to the outside of the tub 82 together with the washing water overflowing from the tub 82, so that the dust does not adhere to the roll cleaning member 80 again. Therefore, by continuing to supply the washing water from the water supply source 831 to the tub 82, a certain amount of clean washing water is kept in the tub 82.
On the other hand, when the dust has a higher specific gravity than the washing water, the washing water is supplied from the bottom plate 82a side of the tub 82 so that the dust does not settle on the bottom plate 82a of the tub 82, and before the dust settles. It overflows from the tub 82 together with the washing water to keep the inside of the tub 82 in a clean state and prevent dust from adhering to the roll cleaning member 80 again. Further, a drain valve (not shown) for draining the washing water of the tub 82 every time the plate-shaped work W is washed may be provided.

本実施形態においては、上記洗浄機構8による板状ワークWの下面Waの洗浄を行うと共に、板状ワークWの洗浄後の下面Waを洗浄機構8と共に+Y方向に移動するエア噴射手段2により乾燥させていく。即ち、エア供給源22が作動して圧縮エアを台部20に供給し、該エアを噴射口21から板状ワークWの下面Waに向かって噴射させる。その結果、洗浄された板状ワークWの下面Waに付着していた洗浄水が該エアにより吹き飛ばされ、板状ワークWの下面Waが乾燥する。即ち、板状ワークWの下面Waの洗浄された箇所が後から追いかけられるように乾燥されていく。 In the present embodiment, the lower surface Wa of the plate-shaped work W is cleaned by the cleaning mechanism 8, and the lower surface Wa after cleaning of the plate-shaped work W is dried by the air injection means 2 that moves in the + Y direction together with the cleaning mechanism 8. Let me do it. That is, the air supply source 22 operates to supply compressed air to the base portion 20, and the air is injected from the injection port 21 toward the lower surface Wa of the plate-shaped work W. As a result, the washing water adhering to the lower surface Wa of the washed plate-shaped work W is blown off by the air, and the lower surface Wa of the plate-shaped work W is dried. That is, the washed portion of the lower surface Wa of the plate-shaped work W is dried so as to be chased afterwards.

洗浄機構8及びエア噴射手段2が、搬出手段4で保持された板状ワークWの下方を通過しきる+Y方向の所定の位置まで移動することで、板状ワークWの下面Waが洗浄され乾燥された状態になる。 The cleaning mechanism 8 and the air injection means 2 move to a predetermined position in the + Y direction that passes under the plate-shaped work W held by the carrying-out means 4, so that the lower surface Wa of the plate-shaped work W is washed and dried. It becomes a state.

上記のように本発明に係る加工装置1は、搬出手段4が保持する板状ワークWの下面Waを洗浄する洗浄機構8と、Y軸方向に搬出手段4と洗浄機構8とを相対的に移動させる移動手段14と、を備え、洗浄機構8は、移動手段14の移動方向に対して交差する方向で且つ保持手段30の保持面300aに平行に延在する円筒状のロール洗浄部材80と、ロール洗浄部材80の中心軸を軸に回転させる回転手段81と、ロール洗浄部材80の側面の一部を延在方向に細長く露出させた露出部801を形成すると共にロール洗浄部材80の露出部801以外を収容し水没させる桶82と、桶82に貯水する水供給手段83と、を備え、水供給手段83により供給される水を桶82の上部から溢れさせながら桶82内で回転するロール洗浄部材80の露出部801に搬出手段4が保持する板状ワークWの下面Waを当接させ、板状ワークWの下面Waを洗浄するため、ワーク洗浄中にロール洗浄部材80に付着したゴミを桶82の水中で濯ぎ落として、洗浄中にロール洗浄部材80から板状ワークWにゴミを再付着させないようにして、綺麗なロール洗浄部材80で継続して板状ワークWの下面Waを洗浄できる。 As described above, in the processing apparatus 1 according to the present invention, the cleaning mechanism 8 for cleaning the lower surface Wa of the plate-shaped work W held by the unloading means 4 and the unloading means 4 and the cleaning mechanism 8 are relatively relative to each other in the Y-axis direction. The cleaning mechanism 8 includes a moving means 14 to be moved, and the cleaning mechanism 8 includes a cylindrical roll cleaning member 80 extending in a direction intersecting the moving direction of the moving means 14 and parallel to the holding surface 300a of the holding means 30. , A rotating means 81 that rotates around the central axis of the roll cleaning member 80 and an exposed portion 801 in which a part of the side surface of the roll cleaning member 80 is elongated in the extending direction are formed, and the exposed portion of the roll cleaning member 80 is formed. A roll that includes a tub 82 that accommodates and submerges other than 801 and a water supply means 83 that stores water in the tub 82, and rotates in the tub 82 while overflowing the water supplied by the water supply means 83 from the upper part of the tub 82. Dust adhering to the roll cleaning member 80 during work cleaning in order to bring the lower surface Wa of the plate-shaped work W held by the carrying-out means 4 into contact with the exposed portion 801 of the cleaning member 80 to clean the lower surface Wa of the plate-shaped work W. Is rinsed off in the water of the tub 82 so that dust does not reattach from the roll cleaning member 80 to the plate-shaped work W during cleaning, and the lower surface Wa of the plate-shaped work W is continuously cleaned with the clean roll cleaning member 80. Can be washed.

加工装置1は、ロール洗浄部材80の延在方向に平行に延び、且つ板状ワークWを洗浄する時の搬出手段4に対する洗浄機構8の進行方向(+Y方向)において洗浄機構8の後方側に配設され、搬出手段4が保持した板状ワークWの下面Waにエアを噴射するエア噴射手段2を備えることで、ロール洗浄部材80により洗浄された板状ワークWの下面Waを後から追うようにエアで乾燥させていくことができるため、移動手段14による板状ワークWの一方向の洗浄送り(+Y方向への1パスの洗浄送り)で板状ワークWの下面Waを洗浄及び乾燥させて洗浄時間を短縮することができる。 The processing apparatus 1 extends parallel to the extending direction of the roll cleaning member 80, and is located behind the cleaning mechanism 8 in the traveling direction (+ Y direction) of the cleaning mechanism 8 with respect to the carrying-out means 4 when cleaning the plate-shaped work W. By providing the air injection means 2 for injecting air onto the lower surface Wa of the plate-shaped work W arranged and held by the carrying-out means 4, the lower surface Wa of the plate-shaped work W cleaned by the roll cleaning member 80 is followed later. Since it can be dried with air as described above, the lower surface Wa of the plate-shaped work W is washed and dried by the one-way cleaning feed (one-pass cleaning feed in the + Y direction) by the moving means 14. The cleaning time can be shortened.

なお、本発明に係る加工装置1は上記実施形態に限定されるものではなく、また、添付図面に図示されている装置の各構成の形状等についても、これに限定されず、本発明の効果を発揮できる範囲内で適宜変更可能である。
例えば、搬出手段4をY軸方向に移動可能な構成として、板状ワークWの下面Waの洗浄時に、保持手段30はY軸方向に移動させず、板状ワークWを保持する搬出手段4を保持手段30に対して相対的に移動させて洗浄を行ってもよい。
The processing apparatus 1 according to the present invention is not limited to the above embodiment, and the shape and the like of each configuration of the apparatus shown in the attached drawings are not limited to this, and the effect of the present invention is not limited to this. Can be changed as appropriate within the range in which the above can be exhibited.
For example, the carrying-out means 4 is configured to be movable in the Y-axis direction, and when cleaning the lower surface Wa of the plate-shaped work W, the holding means 30 does not move in the Y-axis direction, and the carrying-out means 4 for holding the plate-shaped work W is provided. Cleaning may be performed by moving the holding means 30 relative to the holding means 30.

W:板状ワーク
1:加工装置 10:ベース 11:コラム
30:保持手段 300:吸着部 300a:保持面 301:枠体 39:カバー
39a:蛇腹カバー 38:区切り壁
14:移動手段 140:ボールネジ 141:ガイドレール 142:モータ 143:可動板
5:加工送り手段 7:加工手段 740:研削砥石
16:加工室 160:側板 161:搬入出口 162:天板 163:加工手段進入口
4:搬出手段 40:シリンダ機構 41:アーム部 42:保持パッド 421:吸引管 43:吸引源
8:洗浄機構 80:ロール洗浄部材 801:露出部
81:回転手段 810:回転シャフト 811:モータ
82:桶 82a:底板 82b、82c:側板 820:水供給口
83:水供給手段 830:水供給管 831:水供給源
86:支持台
2:エア噴射手段
W: Plate-shaped work
1: Processing equipment 10: Base 11: Column
30: Holding means 300: Suction part 300a: Holding surface 301: Frame 39: Cover 39a: Bellows cover 38: Separation wall 14: Transportation means 140: Ball screw 141: Guide rail 142: Motor 143: Movable plate 5: Processing feed means 7: Processing means 740: Grinding wheel
16: Machining chamber 160: Side plate 161: Carry-in / exit 162: Top plate 163: Machining means entrance 4: Carry-out means 40: Cylinder mechanism 41: Arm part 42: Holding pad 421: Suction pipe 43: Suction source 8: Cleaning mechanism 80 : Roll cleaning member 801: Exposed part 81: Rotating means 810: Rotating shaft 811: Motor 82: Oke 82a: Bottom plate 82b, 82c: Side plate 820: Water supply port 83: Water supply means 830: Water supply pipe 831: Water supply source 86: Support stand 2: Air injection means

Claims (2)

保持面で板状ワークを保持する保持手段と、該保持面で保持した板状ワークを研削砥石で研削または研磨パッドで研磨する加工手段と、該加工手段で加工された板状ワークを該保持面に直交する方向で該保持面から離間させる搬出手段と、該搬出手段が保持する板状ワークの下面を洗浄する洗浄機構と、該保持面に平行なY軸方向に該保持手段を移動させる移動手段と、を備えた加工装置であって、
該洗浄機構は、該Y軸方向に対して水平面内において交差する方向で且つ該保持面に平行に板状ワークの長手方向の長さ以上に延在する円筒状のロール洗浄部材と、該ロール洗浄部材の中心軸を軸に回転させる回転手段と、該ロール洗浄部材の側面の一部を延在方向に細長く露出させた露出部を形成すると共に該ロール洗浄部材の該露出部以外を収容し水没させる桶と、該桶に貯水する水供給手段と、を備え、該移動手段によって該保持手段と共に該Y軸方向に移動可能であり、該保持手段に対して、板状ワークの下面を洗浄する際の該保持手段の進行方向である+Y方向の反対側となる-Y方向側に配置され、
該水供給手段により供給される水を該桶の上部から溢れさせながら、該移動手段によって該洗浄機構を該+Y方向に進行させ、該桶内で回転する該ロール洗浄部材の該露出部該搬出手段が保持した該板状ワークの下面当接させ、該板状ワークの下面を洗浄する加工装置。
The holding means for holding the plate-shaped work on the holding surface, the processing means for grinding the plate-shaped work held on the holding surface with a grinding wheel or polishing with a polishing pad, and the holding means for holding the plate-shaped work processed by the processing means. A carrying means that separates the holding surface from the holding surface in a direction orthogonal to the surface, a cleaning mechanism that cleans the lower surface of the plate-shaped work held by the carrying means, and the holding means that moves the holding means in the Y-axis direction parallel to the holding surface. A processing device equipped with a means of transportation,
The cleaning mechanism includes a cylindrical roll cleaning member extending in a direction intersecting the Y-axis direction in a horizontal plane and parallel to the holding surface and extending beyond the length in the longitudinal direction of the plate-shaped work , and the roll. A rotating means for rotating the central axis of the cleaning member and an exposed portion in which a part of the side surface of the roll cleaning member is exposed in the extending direction are formed, and other than the exposed portion of the roll cleaning member is accommodated. It is provided with a tub to be submerged and a water supply means for storing water in the tub, and can be moved in the Y-axis direction together with the holding means by the moving means, and the lower surface of the plate-shaped work is washed with respect to the holding means. It is arranged on the -Y direction side, which is the opposite side of the + Y direction, which is the traveling direction of the holding means.
While overflowing the water supplied by the water supply means from the upper part of the tub, the cleaning mechanism is advanced in the + Y direction by the moving means, and the exposed portion of the roll cleaning member rotating in the tub is covered with the exposed portion. A processing device that abuts the lower surface of the plate-shaped work held by the carrying-out means and cleans the lower surface of the plate-shaped work.
前記ロール洗浄部材の延在方向に平行に延び、板状ワークの下面を洗浄するために前記+Y方向に進行する前記洗浄機構よりも前記-Y方向側に配設され、前記搬出手段が保持した板状ワークの下面にエアを噴射するエア噴射手段を備え、該洗浄機構を該+Y方向に進行させることにより洗浄された板状ワークの下面をエアで後から追うように乾燥させる請求項1記載の加工装置。 It is arranged in the −Y direction side of the cleaning mechanism that extends in parallel with the extending direction of the roll cleaning member and proceeds in the + Y direction in order to clean the lower surface of the plate-shaped work, and is held by the carrying-out means. Claim 1 is provided with an air injection means for injecting air on the lower surface of the plate-shaped work, and the lower surface of the plate-shaped work cleaned by advancing the cleaning mechanism in the + Y direction is dried so as to be followed by the air. The processing equipment described.
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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021074825A (en) * 2019-11-11 2021-05-20 株式会社ディスコ Holding surface cleaning device
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003209089A (en) 2002-01-17 2003-07-25 Sony Corp Cleaning method, cleaning device and dicing device for wafer
JP2013094876A (en) 2011-10-31 2013-05-20 Disco Corp Machining device
JP2015217501A (en) 2014-05-21 2015-12-07 株式会社ディスコ Transfer robot
JP2017152565A (en) 2016-02-25 2017-08-31 株式会社ディスコ Washing apparatus

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2838660B2 (en) * 1994-09-19 1998-12-16 株式会社明治ゴム化成 Cleaning device for printing blanket sheet surface
JP2930580B1 (en) * 1998-03-27 1999-08-03 株式会社カイジョー Cleaning equipment for semiconductor wafers
JP4672924B2 (en) 2001-08-02 2011-04-20 株式会社ディスコ Suction pad cleaning apparatus and suction pad cleaning method using the same
CN201304603Y (en) 2008-11-29 2009-09-09 常熟华冶薄板有限公司 Grinding cleaning device for pre-washing continuous hot-dip galvanized steel strip
JP5268599B2 (en) * 2008-12-03 2013-08-21 株式会社ディスコ Grinding apparatus and grinding method
CN103831680B (en) 2014-02-17 2017-06-20 广州恒微机电设备有限公司 A kind of full-automatic horizontal surface grinding machine manipulator
JP6316652B2 (en) * 2014-05-14 2018-04-25 株式会社ディスコ Grinding equipment
CN204075988U (en) * 2014-06-03 2015-01-07 中芯国际集成电路制造(北京)有限公司 Grinding pad adjuster cleaning device and chemical mechanical polishing device
JP6844970B2 (en) * 2016-08-18 2021-03-17 株式会社ディスコ Polishing equipment

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003209089A (en) 2002-01-17 2003-07-25 Sony Corp Cleaning method, cleaning device and dicing device for wafer
JP2013094876A (en) 2011-10-31 2013-05-20 Disco Corp Machining device
JP2015217501A (en) 2014-05-21 2015-12-07 株式会社ディスコ Transfer robot
JP2017152565A (en) 2016-02-25 2017-08-31 株式会社ディスコ Washing apparatus

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