JP7021863B2 - Cage - Google Patents

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JP7021863B2
JP7021863B2 JP2017066571A JP2017066571A JP7021863B2 JP 7021863 B2 JP7021863 B2 JP 7021863B2 JP 2017066571 A JP2017066571 A JP 2017066571A JP 2017066571 A JP2017066571 A JP 2017066571A JP 7021863 B2 JP7021863 B2 JP 7021863B2
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polished
prevention ring
contact prevention
polishing
width
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JP2018167358A (en
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栄利 兵頭
泰司 吉田
広樹 石黒
匠 永嶌
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Fujibo Holdins Inc
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Description

本発明は、概略的には保持具に関し、詳細には、板状の被研磨物を研磨パッドで研磨する際に使用される保持具に関する。 The present invention relates generally to a holder, and more particularly to a holder used when a plate-shaped object to be polished is polished with a polishing pad.

高精度な平坦性が要求されるフラットパネルディスプレイ（ＦＰＤ）用ガラス基板、カラーフィルタ、シリコンウェハ、インジウム錫酸化物（ＩＴＯ）成膜済基板等の板状の被研磨物には、研磨布を使用した研磨加工がしばしば施される。 Polishing cloth is used for plate-shaped objects to be polished such as glass substrates for flat panel displays (FPDs), color filters, silicon wafers, and substrates with indium tin oxide (ITO) film formation, which require high-precision flatness. The polishing process used is often applied.

被研磨物の研磨加工には、被研磨物を片面ずつ研磨加工する片面研磨機が使用されている。この片面研磨機では、保持用定盤に被研磨物が保持され、研磨用定盤に研磨パッドが取付けられる。研磨加工時には、被研磨物が研磨パッドに接触するように、保持用定盤と研磨用定盤とを相対配置し、研磨粒子を含む研磨液を研磨パッドに供給し、被研磨物に圧力をかけながら両定盤を回転させることで被研磨物を研磨加工する。 A single-sided polishing machine that polishes the object to be polished one side at a time is used for polishing the object to be polished. In this single-sided polishing machine, the object to be polished is held on the holding surface plate, and the polishing pad is attached to the polishing surface plate. At the time of polishing, the holding platen and the polishing platen are arranged relative to each other so that the object to be polished comes into contact with the polishing pad, and the polishing liquid containing the polishing particles is supplied to the polishing pad to apply pressure to the object to be polished. The object to be polished is polished by rotating both fixed plates while applying.

このような片面研磨機では、被研磨物が金属製の保持用定盤と直接接触することで生じる被研磨物の傷を抑制するため、保持用定盤に弾性を有する発泡性樹脂等で形成された保持材（保持バッド）を装着し、この保持材を介して被研磨物を研磨パッドに押圧している。さらに、研磨加工中に被研磨物の横ずれが生じるため、保持材の周縁に沿って枠材を取付け、保持材と枠材によって構成された保持具によって、被研磨物を研磨パッドに押圧している(特許文献１)。 In such a single-sided polishing machine, the holding surface plate is formed of an elastic foamable resin or the like in order to suppress scratches on the object to be polished caused by direct contact of the object to be polished with a metal holding surface plate. A holding material (holding pad) is attached, and the object to be polished is pressed against the polishing pad through the holding material. Further, since lateral displacement of the object to be polished occurs during the polishing process, the frame material is attached along the peripheral edge of the holding material, and the object to be polished is pressed against the polishing pad by the holder composed of the holding material and the frame material. (Patent Document 1).

ここで、保持具の枠材として、従来より、ガラスエポキシの積層板が使用されている。ガラスエポキシの積層板は、ガラス繊維の布帛とエポキシ樹脂を積層加熱圧縮硬化させることで製造されている。このようなガラスエポキシの積層板を、被研磨物の形状及び研磨機・研磨方法に応じた厚み及び寸法を有するリング形状にカットし、枠材として使用している。 Here, as a frame material for the holder, a laminated glass epoxy plate has been conventionally used. The glass epoxy laminated board is manufactured by laminating, heating, compressing and curing a glass fiber cloth and an epoxy resin. Such a laminated glass epoxy plate is cut into a ring shape having a thickness and dimensions according to the shape of the object to be polished and the polishing machine / polishing method, and is used as a frame material.

特開２００９－２０８１９９号公報Japanese Unexamined Patent Publication No. 2009-208199

上記のように保持具の枠材としてガラスエポキシの積層板は強度が高く耐久性に優れており有用である。しかし、ガラスエポキシの積層板には補強用のガラス繊維を含有しているため、研磨時に被研磨物が接触すると、その衝撃による破損や摩耗により、補強用の繊維が脱落することがある。この脱落した繊維が、被研磨物と研磨パッドの間に入り込み、被研磨物の表面にスクラッチを生じさせる可能性がある。 As described above, the laminated glass epoxy plate as the frame material of the holder is useful because it has high strength and excellent durability. However, since the glass epoxy laminated plate contains glass fibers for reinforcement, if the object to be polished comes into contact with the object to be polished during polishing, the reinforcing fibers may fall off due to damage or wear due to the impact. The shed fibers may enter between the object to be polished and the polishing pad and cause scratches on the surface of the object to be polished.

このような事態を防止すべく、リング形状（環状）の枠材の内周に、緩衝用の繊維を含まない追加の環状弾性部材を配置し、被研磨物が枠材に接触することを防止する構造を考えることができる。 In order to prevent such a situation, an additional annular elastic member that does not contain cushioning fibers is placed on the inner circumference of the ring-shaped (annular) frame material to prevent the object to be polished from coming into contact with the frame material. You can think of a structure to do.

しかしながら、環状の枠材１０２と接触防止リング（追加の環状弾性部材）１０４では硬度が異なるので、このような環状の枠材１０２と接触防止リング１０４とで構成された保持具１００を、研磨時に、研磨パッド１０６に押しつけたとき、両者間の硬度差に起因して、図１に模式的に示すように、研磨パッド１０６の表面に段差が生じ、この段差が、被研磨物１０６の表面形状に悪影響、特に被研磨物の端面が過剰に研磨される「エッジ垂れ」現象が生じさせ、さらには枠材１０２と接触防止リング１０４が剥離し、枠材１０２の内周部の側面が露出することで繊維が脱落する畏れもある、という新たな問題も認識された。 However, since the hardness of the annular frame member 102 and the contact prevention ring (additional annular elastic member) 104 are different, the holder 100 composed of such an annular frame member 102 and the contact prevention ring 104 is used during polishing. When pressed against the polishing pad 106, a step is generated on the surface of the polishing pad 106 due to the difference in hardness between the two, as schematically shown in FIG. 1, and this step is the surface shape of the object to be polished 106. In particular, an "edge sagging" phenomenon occurs in which the end face of the object to be polished is excessively polished, and further, the frame material 102 and the contact prevention ring 104 are peeled off, and the side surface of the inner peripheral portion of the frame material 102 is exposed. A new problem was also recognized, in which there was a fear that the fibers would fall off.

本発明は、このような問題に対処するために成されたものであり、枠材の強度を保ちながら、研磨時に補強用の繊維の脱落を防止しつつ、研磨パッドに押しつけられたとき、研磨パッドの表面に段差が生じ難くする被研磨物保持具を提供することを目的とする。 The present invention has been made to deal with such a problem, and while maintaining the strength of the frame material and preventing the reinforcing fibers from falling off during polishing, when pressed against the polishing pad, polishing is performed. It is an object of the present invention to provide a tool for holding an object to be polished so that a step is less likely to occur on the surface of the pad.

本願発明の発明者は、研磨後の被研磨物の表面の仕上げ状態を向上させるべく鋭意研究を重ねた結果、保持具の枠材から脱落した補強用の繊維が被研磨物の表面にスクラッチを生じさせる可能性があること、さらに、繊維脱落を防止すべく接触防止リングを追加すると、枠材と接触防止リングとの硬度差に起因して、研磨パッドの表面に段差が生じ、この段差が被研磨物の表面形状に悪影響を及ぼす畏れがあるという課題を新たに見出し、この新たな知見に基づいて本願発明をなしたものである。 As a result of intensive research to improve the finished state of the surface of the object to be polished after polishing, the inventor of the present invention causes scratches on the surface of the object to be polished by the reinforcing fibers that have fallen off from the frame material of the holder. If a contact prevention ring is added to prevent the fibers from falling off, a step will be created on the surface of the polishing pad due to the difference in hardness between the frame material and the contact prevention ring, and this step will occur. We have newly found a problem that there is a fear of adversely affecting the surface shape of the object to be polished, and made the present invention based on this new finding.

本願発明によれば、
板状の被研磨物を研磨パッドで研磨する際に前記被研磨物を保持するために使用される被研磨物保持具であって、
補強用の繊維を含有し、前記研磨時に前記被研磨物を取り囲んだ状態で該被研磨物を内部に収容する開口を有している環状枠材と、
前記研磨時に前記被研磨物の前記環状枠材への接触を阻止するように、前記開口内に配置された接触防止リングと、を備え、
前記環状枠材を構成する材料と接触防止リングを構成する材料との硬度の差が１５％以内である、
ことを特徴とする被研磨物保持具が提供される。 According to the invention of the present application
An object holder used to hold a plate-shaped object to be polished with a polishing pad.
An annular frame material containing reinforcing fibers and having an opening for accommodating the object to be polished while surrounding the object to be polished at the time of polishing.
A contact prevention ring arranged in the opening is provided so as to prevent the object to be polished from coming into contact with the annular frame material during the polishing.
The difference in hardness between the material constituting the annular frame material and the material constituting the contact prevention ring is within 15%.
An object holder is provided, characterized in that.

このような構成を有する被研磨物保持具は、外方の環状枠材と内方の接触防止リングとの硬度差が小さいため、研磨時に、研磨パッドに押しつけられても、研磨パッドの表面に、硬度差に起因する段差が生じにくくなる。そのため、エッジ垂れ等といった被研磨物への悪影響を低減し、さらには、枠材と接触防止リングが剥離し、枠材の内周部の側面が露出して繊維が脱落するのを抑制することができる。 The object holder having such a structure has a small difference in hardness between the outer annular frame material and the inner contact prevention ring, so that even if it is pressed against the polishing pad during polishing, it will be on the surface of the polishing pad. , Steps due to the difference in hardness are less likely to occur. Therefore, the adverse effect on the object to be polished such as edge sagging is reduced, and further, the frame material and the contact prevention ring are peeled off, the side surface of the inner peripheral portion of the frame material is exposed, and the fibers are suppressed from falling off. Can be done.

本発明の他の好ましい態様によれば、
前記接触防止リングの幅(径方向長さ)が、該接触防止リングの幅と前記環状枠材の幅(径方向長さ)の和の３０ないし６０％に設定されている。 According to another preferred embodiment of the invention.
The width (diameter length) of the contact prevention ring is set to 30 to 60% of the sum of the width of the contact prevention ring and the width (diameter length) of the annular frame member.

接触防止リングの幅(径方向長さ)が、接触防止リングの幅と前記環状枠材の幅(径方向長さ)の和の３０％を下回ると、研磨中に、研磨パッドに接触する環状枠材の面積が大きくなり、この接触部分からの繊維の脱落が多くなる。一方、接触防止リングの幅(径方向長さ)が、接触防止リングの幅と前記環状枠材の幅(径方向長さ)の和の６０％を上回ると、保持具全体に占める環状枠材の割合が低くなるため、枠材の強度が低下し、研磨中に破損する畏れがある。
したがって、接触防止リングの幅(径方向長さ)を上記範囲に設置することにより、上記のような問題を排除し、保持具の強度を保ちながら繊維脱落を抑えつつ、研磨パッドの表面に段差が生じることを抑制できる。 When the width (diameter length) of the contact prevention ring is less than 30% of the sum of the width of the contact prevention ring and the width (diameter length) of the annular frame material, the annular contact with the polishing pad during polishing is performed. The area of the frame material becomes large, and the fibers fall off from this contact portion more often. On the other hand, when the width (diameter length) of the contact prevention ring exceeds 60% of the sum of the width of the contact prevention ring and the width (diameter length) of the annular frame material, the annular frame material occupies the entire holder. Since the ratio of the frame material is low, the strength of the frame material is reduced, and there is a fear of damage during polishing.
Therefore, by installing the width (diameter length) of the contact prevention ring within the above range, the above-mentioned problems can be eliminated, and the step on the surface of the polishing pad can be prevented while maintaining the strength of the holder and suppressing the fiber dropout. Can be suppressed.

本発明の他の好ましい態様によれば、
前記環状枠材が、ガラス繊維強化樹脂材料で構成されている。 According to another preferred embodiment of the invention.
The annular frame material is made of a glass fiber reinforced resin material.

前記接触防止リングが、ポリフェニルスルファイド材料で構成されている。 The anti-contact ring is made of a polyphenyl sulfide material.

前記接触防止リングの幅が、５ないし１５ｍｍに設定されている。 The width of the contact prevention ring is set to 5 to 15 mm.

前記接触防止リングの幅が、前記接触防止リングの内径の１～１０％に設定されている。 The width of the contact prevention ring is set to 1 to 10% of the inner diameter of the contact prevention ring.

このような構成を有する本発明によれば、枠材の強度を保ちながら、研磨時に、補強用の繊維の脱落を防止しつつ、研磨パッドに押しつけられたとき、研磨パッドの表面に段差が生じ難くする被研磨物保持具が提供される。 According to the present invention having such a configuration, while maintaining the strength of the frame material and preventing the reinforcing fibers from falling off during polishing, a step is generated on the surface of the polishing pad when pressed against the polishing pad. An object holder that makes it difficult is provided.

本発明の課題を説明する模式的な断面図である。It is a schematic sectional drawing explaining the subject of this invention. 本発明の実施形態の被研磨物保持具が使用される片面研磨機の構成を示す概略的な斜視図である。It is a schematic perspective view which shows the structure of the single-sided grinding machine which uses the object holder of the embodiment of this invention. 本発明の好ましい実施形態の被研磨物保持具を示す模式的な縦断面図である。It is a schematic vertical sectional view which shows the object holder of a preferable embodiment of this invention. 図３の被研磨物保持具の横断面図である。FIG. 3 is a cross-sectional view of the object holder to be polished in FIG. 図３の被研磨物保持具の使用状態を示す模式的な縦断面図である。FIG. 3 is a schematic vertical sectional view showing a usage state of the object holder of FIG. 3.

以下、図面に沿って、本発明の好ましい実施形態の被研磨物保持具について説明する。 Hereinafter, the object holder according to the preferred embodiment of the present invention will be described with reference to the drawings.

まず、図２に沿って、本発明の実施形態の保持具１０が使用される片面研磨機について説明する。図２は、本発明の実施形態の保持具１０が使用される片面研磨機１の構成を示す概略的な斜視図である。 First, a single-sided grinding machine in which the holder 10 of the embodiment of the present invention is used will be described with reference to FIG. FIG. 2 is a schematic perspective view showing the configuration of a single-sided grinding machine 1 in which the holder 10 of the embodiment of the present invention is used.

図２に示すように、片面研磨機１は、円板状の研磨定盤２を備えている。研磨定盤２の裏面中央には、モータ等の図示しない駆動源によって回転駆動されるシャフト４が連結され、研磨定盤２は、中心軸線Ｘを中心に回転可能とされている。また、研磨定盤２の上面には、円板状の研磨パッド６が取付けられている。 As shown in FIG. 2, the single-sided polishing machine 1 includes a disk-shaped polishing surface plate 2. A shaft 4 that is rotationally driven by a drive source (not shown) such as a motor is connected to the center of the back surface of the polishing surface plate 2, and the polishing surface plate 2 is rotatable about the central axis X. Further, a disk-shaped polishing pad 6 is attached to the upper surface of the polishing surface plate 2.

研磨パッド６の上方には、中心軸線Ｘから偏心した位置に研磨ヘッド８が配置される。この研磨ヘッド８の底部に本実施形態の保持具（被研磨物保持具）１０が取付けられている。研磨ヘッド８にも、モータ等の図示しない駆動源によって回転駆動されるシャフト９が連結され、中心軸線Ｘ’を中心に回転（自転）可能とされている。
そして、保持具１０と研磨パッド２との間に、例えばシリコンウェハ等の板状の被研磨物Wが保持され、研磨パッド２によって被研磨物Wの研磨が行われる。 Above the polishing pad 6, the polishing head 8 is arranged at a position eccentric from the central axis X. The holder (object holder) 10 of the present embodiment is attached to the bottom of the polishing head 8. A shaft 9 that is rotationally driven by a drive source (not shown) such as a motor is also connected to the polishing head 8 so that it can rotate (rotate) about the central axis X'.
Then, a plate-shaped object W such as a silicon wafer is held between the holder 10 and the polishing pad 2, and the polishing pad 2 polishes the object W to be polished.

図３は、片面研磨機１に取付けられ被研磨物Ｗを支持している、本実施態様の保持具１０の縦断面図である。
保持具１０は、全体にわたり厚さが略一定の略円板状の保持材１２を備えている。保持材１２の一方の面１４(下面)には、この一方の面の外縁部を被うリング状の枠材１６が取付けられている。枠材１６の外径は、保持材１２の外径と略等しく設定されている。リング状すなわち環状の枠材１６の中央の開口１６’は、研磨時に、被研磨物Wを取り囲んだ状態で収容する開口１６’であり、保持材１２の一方の面１４の枠材１６で囲まれた部分が、研磨時に、板状の被研磨物Ｗの背面に当接する被研磨物保持面１８となる。 FIG. 3 is a vertical cross-sectional view of the holder 10 of the present embodiment, which is attached to the single-sided grinding machine 1 and supports the object to be polished W.
The holder 10 includes a substantially disk-shaped holding material 12 having a substantially constant thickness throughout. A ring-shaped frame member 16 that covers the outer edge portion of this one surface is attached to one surface 14 (lower surface) of the holding material 12. The outer diameter of the frame material 16 is set to be substantially equal to the outer diameter of the holding material 12. The central opening 16'of the ring-shaped or annular frame 16'is an opening 16'that surrounds and accommodates the object W to be polished at the time of polishing, and is surrounded by the frame 16 of one surface 14 of the holding material 12. The removed portion becomes an object holding surface 18 that abuts on the back surface of the plate-shaped object W to be polished during polishing.

本実施形態では、保持材１２は、発泡性樹脂で形成されている。この発泡性樹脂としては、例えば、ポリウレタン樹脂、エポキシ樹脂、不飽和ポリエステル樹脂等を用いることができるが、耐薬品性、加工性、粘弾性特性の調整、良好な発泡性、及び強度の観点からポリウレタン樹脂が好ましい。 In this embodiment, the holding material 12 is made of a foamable resin. As the foamable resin, for example, polyurethane resin, epoxy resin, unsaturated polyester resin and the like can be used, but from the viewpoint of chemical resistance, processability, adjustment of viscoelastic properties, good foamability, and strength. Polyurethane resin is preferred.

保持材１２としては、ショアＡ硬度が約５０～９０の発泡性樹脂(例えば、発泡ポリウレタン)を用いることが好ましく、より好ましくはショアＡ硬度が約６０～８０の発泡性樹脂(例えば、発泡ポリウレタン)を用いるのがよい。ここで、ショアA硬度は、日本工業規格（ＪＩＳ K ７２１５）に従い求めることができる。 As the holding material 12, it is preferable to use a foamable resin having a shore A hardness of about 50 to 90 (for example, foamed polyurethane), and more preferably a foamable resin having a shore A hardness of about 60 to 80 (for example, foamed polyurethane). ) Is better to use. Here, the shore A hardness can be determined according to the Japanese Industrial Standards (JIS K 7215).

保持材１２の硬度を上記範囲内とすることにより、ウェハＷの保持時のウェハ保持面の損傷、クッション性の低下による性能の低下を防止することができる。 By setting the hardness of the holding material 12 within the above range, it is possible to prevent damage to the wafer holding surface during holding of the wafer W and deterioration of performance due to deterioration of cushioning property.

また、保持材１２は、圧縮率が３～３０％の材料で構成されるのが好ましい。
圧縮率を上記範囲にすることで被研磨物Ｗに対するクッション性、および保持材１２の保持面の平坦度を保ち、保持材１２の被研磨物形状に対する追従性が低下するのを防止することができる。 Further, the holding material 12 is preferably made of a material having a compressibility of 3 to 30%.
By setting the compression ratio within the above range, it is possible to maintain the cushioning property for the object W to be polished and the flatness of the holding surface of the holding material 12 and prevent the holding material 12 from deteriorating the followability to the shape of the object to be polished. can.

ここで、圧縮率は日本工業規格（ＪＩＳ Ｌ １０２１）に従い、ショッパー型厚さ測定器（加圧面：直径１ｃｍの円形）を使用し求めることができる。具体的には、初荷重で３０秒間加圧した後の厚さｔ0を測定し、次に最終圧力のもとで５分間放置後の厚さｔ1を測定した。圧縮率は、圧縮率（％）＝（ｔ0－ｔ1）／ｔ0×１００で算出することができる。このとき、初荷重は１００ｇ／ｃｍ2、最終圧力は１１２０ｇ／ｃｍ2とする。 Here, the compression ratio can be determined by using a shopper type thickness measuring instrument (pressurized surface: circular with a diameter of 1 cm) in accordance with Japanese Industrial Standards (JIS L 1021). Specifically, the thickness t 0 after being pressurized with the initial load for 30 seconds was measured, and then the thickness t 1 after being left for 5 minutes under the final pressure was measured. The compression rate can be calculated by the compression rate (%) = (t 0 − t 1 ) / t 0 × 100. At this time, the initial load is 100 g / cm 2 and the final pressure is 1120 g / cm 2 .

枠材１６は、外周が保持材１２の保持面の外周と一致するように、保持材１２の一方の面１４に接着剤等を用いて取付けられている。枠材１６は、補強用の繊維を含有した比較的硬質の樹脂材料、例えばガラスエポキシ樹脂等のガラス繊維強化樹脂材料によって形成されている。
本実施態様では、枠材１６を構成する補強用の繊維を含有した比較的硬質の樹脂材料の硬度は、ショアＤ硬度で７０-９５である。ここで、ショアD硬度は日本工業規格（ＪＩＳ-Ｋ６２５３）に従い求めることができる。 The frame material 16 is attached to one surface 14 of the holding material 12 by using an adhesive or the like so that the outer circumference coincides with the outer circumference of the holding surface of the holding material 12. The frame material 16 is formed of a relatively hard resin material containing reinforcing fibers, for example, a glass fiber reinforced resin material such as glass epoxy resin.
In this embodiment, the hardness of the relatively hard resin material containing the reinforcing fibers constituting the frame material 16 is 70-95 in shore D hardness. Here, the shore D hardness can be obtained according to the Japanese Industrial Standards (JIS-K6253).

本実施態様の保持具１０は、さらに、接触防止リング２０を備えている。接触防止リング２０は、外径が環状の枠材１６の開口１６’の内径にほぼ等しく、枠材１６の開口１６’に着脱自在に嵌合した状態で配置されている。また、枠材１６と接触防止リング２０は、ほぼ同一の厚さ（図３における上下方向の長さ）を有している。
このような構成であるので、本実施態様の保持具１０では、接触防止リング２０の内側の空間が、研磨時に被研磨物Wを収容する空間となり、接触防止リング２０が、研磨時に被研磨物Wの環状枠材１６への接触を阻止することになる。 The holder 10 of the present embodiment further includes a contact prevention ring 20. The contact prevention ring 20 has an outer diameter substantially equal to the inner diameter of the opening 16'of the annular frame member 16 and is arranged in a detachably fitted state in the opening 16'of the frame member 16. Further, the frame member 16 and the contact prevention ring 20 have substantially the same thickness (length in the vertical direction in FIG. 3).
With such a configuration, in the holder 10 of the present embodiment, the space inside the contact prevention ring 20 becomes a space for accommodating the object to be polished W during polishing, and the contact prevention ring 20 is the object to be polished during polishing. This will prevent W from coming into contact with the annular frame member 16.

接触防止リング２０は、ポリフェニルスルファイド材料等の比較的、滑らかな硬質材料で形成されている。本実施態様では、接触防止リング２０を構成する滑らかな硬質材料の硬度は、ショアＤ硬度で７０-９５である。 The contact prevention ring 20 is made of a relatively smooth hard material such as a polyphenyl sulfide material. In this embodiment, the hardness of the smooth hard material constituting the contact prevention ring 20 is 70-95 in shore D hardness.

そして、本実施態様の被研磨物保持具１０では、環状枠材１６を構成する材料と接触防止リング２０を構成する材料との硬度の差が１５％以内となるように設定されている。 In the object holder 10 of the present embodiment, the difference in hardness between the material constituting the annular frame member 16 and the material constituting the contact prevention ring 20 is set to be within 15%.

一方、本実施態様の被研磨物保持具１０では、接触防止リング２０の幅（径方向長さ）が、５ないし１５ｍｍに設定されている。また、接触防止リング２０の幅(径方向長さ)Ｒ1は、接触防止リング２０の幅Ｒ1と環状枠材１６の幅(径方向長さ)Ｒ２の和Ｒの３０ないし６０％に設定されている。
上記実施態様の被研磨物保持具１０では、環状枠材１６の幅(径方向長さ)Ｒ２は１６．５ｍｍに、接触防止リング２０の幅は１０ｍｍにそれぞれ設定されている。従って、接触防止リング２０の幅Ｒ1と環状枠材１６の幅(径方向長さ)Ｒ２の和Ｒは、２６．５ｍｍとなる。 On the other hand, in the object holder 10 of the present embodiment, the width (diameter length) of the contact prevention ring 20 is set to 5 to 15 mm. Further, the width (diameter length) R1 of the contact prevention ring 20 is set to 30 to 60% of the sum R of the width R1 of the contact prevention ring 20 and the width (diameter length) R2 of the annular frame member 16. There is.
In the object holder 10 of the above embodiment, the width (diameter length) R2 of the annular frame member 16 is set to 16.5 mm, and the width of the contact prevention ring 20 is set to 10 mm. Therefore, the sum R of the width R1 of the contact prevention ring 20 and the width (diameter length) R2 of the annular frame member 16 is 26.5 mm.

さらに、本実施態様の被研磨物保持具１０では、接触防止リング２０の幅が、接触防止リング１６の内径Idの１～１０％になるように設定されている。
なお、上記実施態様の被研磨物保持具１０では、接触防止リング１６の内径Idは、３０２ｍｍに設定されている。 Further, in the object holder 10 of the present embodiment, the width of the contact prevention ring 20 is set to be 1 to 10% of the inner diameter Id of the contact prevention ring 16.
In the object holder 10 of the above embodiment, the inner diameter Id of the contact prevention ring 16 is set to 302 mm.

このような構成を有する被研磨物保持具１０は、図５に示されているように、接触防止リング２０の内側に被研磨物Wを配置した状態で、保持材１２を介して研磨定盤によって、被研磨物Wとともに、研磨パッドに押しつけられる。
上述したように、本実施態様の被研磨物保持具１０では、環状枠材１６を構成する材料と接触防止リング２０を構成する材料との硬度の差が１５％以内となるように設定されているので、研磨パッドに押しつけられたときの、環状枠材１６の変形量（圧縮量）と接触防止リング２０の変形量（圧縮量）との差が小さくなる。この結果、環状枠材１６に接触する研磨パッドの部分と接触防止リング２０との接触する研磨パッドの部分の間で、段差が発生しにくくなり、「エッジ垂れ」が抑制される。 As shown in FIG. 5, the object to be polished holder 10 having such a structure has a polishing platen via the holding material 12 in a state where the object to be polished W is arranged inside the contact prevention ring 20. Is pressed against the polishing pad together with the object W to be polished.
As described above, in the object holder 10 of the present embodiment, the difference in hardness between the material constituting the annular frame member 16 and the material constituting the contact prevention ring 20 is set to be within 15%. Therefore, the difference between the amount of deformation (compression amount) of the annular frame member 16 and the amount of deformation (compression amount) of the contact prevention ring 20 when pressed against the polishing pad becomes small. As a result, a step is less likely to occur between the portion of the polishing pad in contact with the annular frame member 16 and the portion of the polishing pad in contact with the contact prevention ring 20, and "edge sagging" is suppressed.

本発明の前記実施形態に限定されることなく、特許請求の範囲に記載された技術的思想の範囲内で種々の変更、変形が可能である。 Not limited to the above-described embodiment of the present invention, various modifications and modifications can be made within the scope of the technical idea described in the claims.

１：片面研磨機
１０：保持具
１２：保持材
１６：枠材
１８：被研磨物保持面
２０：接触防止リング 1: Single-sided polishing machine 10: Holder 12: Holding material 16: Frame material 18: Object holding surface 20: Contact prevention ring

Claims (5)

板状の被研磨物を研磨パッドで研磨する際に前記被研磨物を保持するために使用される被研磨物保持具であって、
補強用の繊維を含有し、前記研磨時に前記被研磨物を取り囲んだ状態で該被研磨物を内部に収容する開口を有している環状枠材と、
前記研磨時に前記被研磨物の前記環状枠材への接触を阻止するように、前記開口内に配置された接触防止リングと、を備え、
前記接触防止リングは、前記開口の内径と略等しい外径を有し、その外周と前記開口の内周との間に隙間を生じさせない状態で前記開口に嵌合し、
前記環状枠材を構成する材料と接触防止リングを構成する材料との硬度の差が１５％以内であり、
前記接触防止リングが、ポリフェニルスルファイド材料で構成されている、
ことを特徴とする被研磨物保持具。 An object holder used to hold a plate-shaped object to be polished with a polishing pad.
An annular frame material containing reinforcing fibers and having an opening for accommodating the object to be polished while surrounding the object to be polished at the time of polishing.
A contact prevention ring arranged in the opening is provided so as to prevent the object to be polished from coming into contact with the annular frame material during the polishing.
The contact prevention ring has an outer diameter substantially equal to the inner diameter of the opening, and is fitted into the opening without creating a gap between the outer circumference thereof and the inner circumference of the opening.
The difference in hardness between the material constituting the annular frame material and the material constituting the contact prevention ring is within 15% .
The anti-contact ring is made of a polyphenyl sulfide material.
A tool for holding an object to be polished. 前記接触防止リングの幅(径方向長さ)が、該接触防止リングの幅と前記環状枠材の幅(径方向長さ)の和の３０ないし６０％に設定されている、
請求項１に記載の被研磨物保持具。 The width (diameter length) of the contact prevention ring is set to 30 to 60% of the sum of the width of the contact prevention ring and the width (diameter length) of the annular frame member.
The object holder according to claim 1. 前記環状枠材が、ガラス繊維強化樹脂材料で構成されている、
請求項１または２に記載の被研磨物保持具。 The annular frame material is made of a glass fiber reinforced resin material.
The object holder according to claim 1 or 2. 前記接触防止リングの幅が、５ないし１５ｍｍに設定されている、
請求項１ないし３のいずれか１項に記載の被研磨物保持具。 The width of the contact prevention ring is set to 5 to 15 mm.
The object holder according to any one of claims 1 to 3 . 前記接触防止リングの幅が、前記接触防止リングの内径の１～１０％に設定されている、
請求項１ないし４のいずれか１項に記載の被研磨物保持具。 The width of the contact prevention ring is set to 1 to 10% of the inner diameter of the contact prevention ring.
The object holder according to any one of claims 1 to 4 .
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