JP7001728B2 - Photoelectric element - Google Patents

Photoelectric element Download PDF

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JP7001728B2
JP7001728B2 JP2020047220A JP2020047220A JP7001728B2 JP 7001728 B2 JP7001728 B2 JP 7001728B2 JP 2020047220 A JP2020047220 A JP 2020047220A JP 2020047220 A JP2020047220 A JP 2020047220A JP 7001728 B2 JP7001728 B2 JP 7001728B2
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semiconductor
electrode
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photoelectric element
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JP2020145432A (en
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シェン チェン-フ
ジン チャン-フェイ
シエ ミン-シュン
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Epistar Corp
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Description

本発明は発光素子アレイに関する。 The present invention relates to a light emitting device array.

固体照明素子のうち、発光ダイオードは低消費電力、低発熱、長寿命、耐衝突、小型、快速応答及び安定した波長の単色光の発出可能などの良好な光電特性を有しているため、家電、メーターの表示灯及び光電製品等に幅広く適用されている。光電技術の発展において、固体照明素子は発光効率、寿命及び輝度に注視し、近い将来に照明の適用において主流になると予期される。 Among solid-state lighting elements, light-emitting diodes have good photoelectric characteristics such as low power consumption, low heat generation, long life, collision resistance, small size, fast response, and stable wavelength monochromatic light. , Widely applied to meter indicator lights and photoelectric products. With the development of photoelectric technology, solid-state lighting devices pay attention to luminous efficiency, life and brightness, and are expected to become mainstream in the application of lighting in the near future.

現在、LEDはアレイ型発光素子の形で用いられ、高い駆動電圧の応用によく適用され、LEDの体積及び重量を減少することができる。LED製造者は、高い駆動電圧LEDに対するユーザーの要求に応じるように、アレイ型発光素子に対して異なる電極配置構造を設計し、これにより、コストを下げ、製造率を向上させる。 Currently, LEDs are used in the form of array-type light emitting devices and are often applied to high drive voltage applications, which can reduce the volume and weight of LEDs. LED manufacturers design different electrode arrangement structures for array-type light emitting devices to meet the user's demand for high drive voltage LEDs, thereby lowering costs and increasing manufacturing rates.

本発明は光電素子を提供する。 The present invention provides a photoelectric element.

本発明の光電素子であって、基板と、この基板に位置し、それぞれ第一半導体層、第二半導体層及びその間にある活性領域を有し、相互電気的に接続されている複数の半導体ユニットと、それぞれ第一半導体層に位置する複数の第一電極と、この複数の半導体ユニットに形成されて複数の半導体ユニットを電気的に直列につなぐ連結部と、それぞれ第二半導体層に位置する複数の第二電極と、を含み、一つの第一電極が第一延在部を有し、一つの第二電極が第二延在部を有する。 A plurality of semiconductor units of the present invention, which are located on a substrate and have an active region between the first semiconductor layer and the second semiconductor layer, respectively, and are electrically connected to each other. A plurality of first electrodes located in the first semiconductor layer, a connecting portion formed in the plurality of semiconductor units and electrically connecting the plurality of semiconductor units in series, and a plurality of components located in the second semiconductor layer, respectively. One first electrode has a first extension and one second electrode has a second extension.

本発明の光電素子であって、基板と、この基板に位置し、それぞれ第一半導体層、第二半導体層及びその間にある活性領域を有し、相互電気的に接続されている複数の半導体ユニットと、それぞれ第一半導体層に位置する複数の第一電極と、この複数の半導体ユニットに形成されて複数の半導体ユニットを電気的に直列につなぐ連結部と、それぞれ第二半導体層に位置する複数の第二電極と、を含み、一つの第一電極が第一延在部を有し、一つの第二電極が第二延在部を有し、この複数の半導体ユニットの駆動電圧は大体同様である。 A plurality of semiconductor units of the present invention, which are located on a substrate and have an active region between the first semiconductor layer and the second semiconductor layer, respectively, and are electrically connected to each other. A plurality of first electrodes located in the first semiconductor layer, a connecting portion formed in the plurality of semiconductor units and electrically connecting the plurality of semiconductor units in series, and a plurality of components located in the second semiconductor layer, respectively. One first electrode has a first extending portion and one second electrode has a second extending portion, and the drive voltages of the plurality of semiconductor units are almost the same. Is.

本発明の光電素子であって、基板と、この基板に位置し、それぞれ第一半導体層、第二半導体層及びその間にある活性領域を有し、相互電気的に接続されている複数の半導体ユニットと、それぞれ第一半導体層に位置する複数の第一電極と、それぞれ第二半導体層に位置する複数の第二電極とを含み、複数の半導体ユニットは第一半導体ユニットと、第二半導体ユニットと、第三半導体ユニットを含み、第一電極の中の少なくとも一つは基板の最外側にある第一半導体ユニットに位置する第一電極パッドを有し、第二電極の中の少なくとも一つは基板の最外側にある第二半導体ユニットに位置する第二電極パッドを有し、第一電極及び第二電極は電極パッドがない第三半導体ユニットに位置する第一延在部及び第二延在部を有する。 A plurality of semiconductor units of the present invention, which are located on a substrate and have an active region between the first semiconductor layer and the second semiconductor layer, respectively, and are electrically connected to each other. A plurality of first electrodes located in the first semiconductor layer and a plurality of second electrodes each located in the second semiconductor layer are included, and the plurality of semiconductor units are the first semiconductor unit and the second semiconductor unit. , At least one of the first electrodes has a first electrode pad located on the outermost first semiconductor unit of the substrate, and at least one of the second electrodes is the substrate. The first electrode and the second electrode have the second electrode pad located in the second semiconductor unit located on the outermost side of the semiconductor unit, and the first electrode and the second electrode are the first extending portion and the second extending portion located in the third semiconductor unit having no electrode pad. Has.

本発明の光電素子であって、基板と、この基板に位置し、それぞれ第一半導体層、第二半導体層及びその間にある活性領域を有し、相互電気的に接続されている複数の半導体ユニットと、それぞれ複数の半導体ユニットに位置する複数の第一電極及び複数の第二電極とを含み、各半導体ユニットは第一半導体ユニット、第二半導体ユニット及び第三半導体ユニットを含み、第一電極の中の少なくとも一つは第一半導体ユニットの第二半導体層に位置する第一電極パッドを有し、第二電極の中の少なくとも一つは第二半導体ユニットの第二半導体層に位置する第二電極パッドを有し、第一電極及び第二電極は電極パッドがない第三半導体ユニットに位置する第一延在部及び第二延在部を有する。 A plurality of semiconductor units of the present invention, which are located on a substrate and have an active region between the first semiconductor layer and the second semiconductor layer, respectively, and are electrically connected to each other. Each of the semiconductor units includes a plurality of first electrodes and a plurality of second electrodes located in a plurality of semiconductor units, and each semiconductor unit includes a first semiconductor unit, a second semiconductor unit, and a third semiconductor unit of the first electrode. At least one of them has a first electrode pad located in the second semiconductor layer of the first semiconductor unit, and at least one of the second electrodes has a second electrode located in the second semiconductor layer of the second semiconductor unit. The first electrode and the second electrode have an electrode pad, and have a first extending portion and a second extending portion located in the third semiconductor unit without the electrode pad.

本発明の実施例による光電素子の上面図である。It is a top view of the photoelectric element according to the embodiment of this invention. 図1に示された光電素子の断面図である。It is sectional drawing of the photoelectric element shown in FIG. 図1に示された光電素子の3D斜視図である。It is a 3D perspective view of the photoelectric element shown in FIG. 図1に示された光電素子の等価回路図である。It is an equivalent circuit diagram of the photoelectric element shown in FIG. 本発明の実施例による光電素子の上面図である。It is a top view of the photoelectric element according to the embodiment of this invention. 図5に示された光電素子の3D斜視図である。It is a 3D perspective view of the photoelectric element shown in FIG. 図5に示された光電素子の等価回路図である。It is an equivalent circuit diagram of the photoelectric element shown in FIG. 本発明の実施例による光電素子の上面図である。It is a top view of the photoelectric element according to the embodiment of this invention. 図8に示された光電素子の3D斜視図である。It is a 3D perspective view of the photoelectric element shown in FIG. 図8に示された光電素子の等価回路図である。It is an equivalent circuit diagram of the photoelectric element shown in FIG. 本発明の実施例による光電素子の上面図である。It is a top view of the photoelectric element according to the embodiment of this invention. 図11に示された光電素子の3D斜視図である。It is a 3D perspective view of the photoelectric element shown in FIG. 図11に示された光電素子の等価回路図である。It is an equivalent circuit diagram of the photoelectric element shown in FIG. 本発明の実施例による光電素子の上面図である。It is a top view of the photoelectric element according to the embodiment of this invention. 図14に示された光電素子の3D斜視図である。It is a 3D perspective view of the photoelectric element shown in FIG. 図14に示された光電素子の等価回路図である。It is an equivalent circuit diagram of the photoelectric element shown in FIG. 本発明の実施例による光電素子の上面図である。It is a top view of the photoelectric element according to the embodiment of this invention. 図17に示された光電素子の3D斜視図である。It is a 3D perspective view of the photoelectric element shown in FIG. 図17に示された光電素子の等価回路図である。It is an equivalent circuit diagram of the photoelectric element shown in FIG. 本発明の実施例による光電素子の上面図である。It is a top view of the photoelectric element according to the embodiment of this invention. 図20に示された光電素子の3D斜視図である。It is a 3D perspective view of the photoelectric element shown in FIG. 図20に示された光電素子の等価回路図である。It is an equivalent circuit diagram of the photoelectric element shown in FIG. 本発明の実施例による光電素子の上面図である。It is a top view of the photoelectric element according to the embodiment of this invention. 図23に示された光電素子の3D斜視図である。It is a 3D perspective view of the photoelectric element shown in FIG. 23. 本発明の実施例による光電素子の上面図である。It is a top view of the photoelectric element according to the embodiment of this invention.

図1は本発明の実施例による光電素子10の上面図である。光電素子10は、例えば発光ダイオード(LED)、レーザーダイオード(LD)又は太陽電池であり、基板11に形成された複数の半導体ユニットを含み、第一電極141、第二電極142及び連結部143が半導体ユニットに形成されている。本実施例において、光電素子10は発光ダイオード(LED)である。図2は図1に示された光電素子10のA-A′線の断面図である。各半導体ユニットは第一半導体層121、第二半導体層123及び第一半導体層121と第二半導体層123の間に形成された活性領域122を含む。第一半導体層121と第二半導体層123は、p型又はn型の不純物を混合したIII-V半導体材料から構成され、電気特性が相互異なる。活性領域122は、単一へテロ構造(SH)、ダブルへテロ構造(DH)又は多重量子井戸構造(MQW)である。スロット170は半導体ユニットをエッチングすることによって半導体ユニットに形成され、一部の第一半導体層121を露出する。半導体ユニット間に複数の隔溝111が形成され、一部の基板11を露出する。光電素子10は複数の第一電極141及び第二電極142を有し、第一電極141は露出された第一半導体層121に形成され、第二電極142は第二半導体層123に形成される。第一電極141は第一延在部1411を有し、第二電極142は第二延在部1421を有する。また、複数の半導体ユニット中の一つの半導体ユニットの第一電極141は第一電極パッド1412を有し、別の一つの半導体ユニットの第二電極142は第二電極パッド1422を有する。 FIG. 1 is a top view of the photoelectric element 10 according to the embodiment of the present invention. The photoelectric element 10 is, for example, a light emitting diode (LED), a laser diode (LD), or a solar cell, includes a plurality of semiconductor units formed on the substrate 11, and includes a first electrode 141, a second electrode 142, and a connecting portion 143. It is formed in a semiconductor unit. In this embodiment, the photoelectric element 10 is a light emitting diode (LED). FIG. 2 is a cross-sectional view taken along the line AA'of the photoelectric element 10 shown in FIG. Each semiconductor unit includes a first semiconductor layer 121, a second semiconductor layer 123, and an active region 122 formed between the first semiconductor layer 121 and the second semiconductor layer 123. The first semiconductor layer 121 and the second semiconductor layer 123 are made of a III-V semiconductor material mixed with p-type or n-type impurities, and have different electrical characteristics. The active region 122 is a single heterostructure (SH), double heterostructure (DH) or multiple quantum well structure (MQW). The slot 170 is formed in the semiconductor unit by etching the semiconductor unit, and exposes a part of the first semiconductor layer 121. A plurality of gaps 111 are formed between the semiconductor units, exposing a part of the substrate 11. The photoelectric element 10 has a plurality of first electrodes 141 and second electrodes 142, the first electrode 141 is formed on the exposed first semiconductor layer 121, and the second electrode 142 is formed on the second semiconductor layer 123. .. The first electrode 141 has a first extending portion 1411, and the second electrode 142 has a second extending portion 1421. Further, the first electrode 141 of one semiconductor unit among the plurality of semiconductor units has a first electrode pad 1412, and the second electrode 142 of another semiconductor unit has a second electrode pad 1422.

光電素子の特定面積、電流及び駆動電圧に対するユーザーの要求を満足するために、半導体ユニット及び電極の配置を特別に設計する必要がある。半導体ユニットの数量は基本的に式
(数1)n=v/v-1
(数2)n=v/v
又は、
(数3)n=v/v+1
(その内、nは半導体ユニットの数量、Vは光電素子の駆動電圧、Vは半導体ユニットの駆動電圧を示す)によって設計する。本実施例において、光電素子10の寸法は85×85milであり、その駆動電圧は72Vである。個々の半導体ユニットの駆動電圧は実に3Vであるが、半導体ユニットの駆動電圧は工程に対する制御及びエピタキシャル層の品質によって変化することがある。通常、光電素子の電気特性の効率上、半導体ユニットの駆動電圧は低いほどよい。各半導体ユニットの面積はほぼ同様である。上記の式によると、光電素子10は24個の半導体ユニットを有し、それぞれ行105、106、107、108及び109に配置される。第一行105には五個の半導体ユニット151、152、153、154及び155を有し、第一方向に沿って直列につながり、第二行106には五個の半導体ユニット161、162、163、164及び165を有し、第二方向に沿って直列につながり、第三行107には四個の半導体ユニット171、172、173及び174を有し、第一方向に沿って直列につながり、第四行108には五個の半導体ユニット181、182、183、184及び185を有し、第二方向に沿って直列につながり、第五行109には五個の半導体ユニット191、192、193、194及び195を有し、第一方向に沿って直列につながる。第一方向及び第二方向は相反する方向であり、異なる行に異なる数量の半導体ユニットを有する配置構造は、配置上ユーザーの要求をさらに容易に満たすことができる。
In order to meet the user's requirements for a specific area, current and drive voltage of the photoelectric element, it is necessary to specially design the arrangement of the semiconductor unit and the electrodes. The number of semiconductor units is basically the formula (Equation 1) n = v / v f -1.
(Number 2) n = v / v f
Or,
(Number 3) n = v / v f +1
(Of these, n is the number of semiconductor units, V is the drive voltage of the photoelectric element, and V f is the drive voltage of the semiconductor unit). In this embodiment, the dimension of the photoelectric element 10 is 85 × 85 mil 2 , and the driving voltage thereof is 72V. The drive voltage of each semiconductor unit is actually 3V, but the drive voltage of the semiconductor unit may change depending on the control for the process and the quality of the epitaxial layer. Generally, the lower the drive voltage of the semiconductor unit, the better in terms of the efficiency of the electrical characteristics of the photoelectric element. The area of each semiconductor unit is almost the same. According to the above equation, the photoelectric element 10 has 24 semiconductor units, which are arranged in rows 105, 106, 107, 108 and 109, respectively. The first row 105 has five semiconductor units 151, 152, 153, 154 and 155, which are connected in series along the first direction, and the second row 106 has five semiconductor units 161, 162, 163. It has 164 and 165 and is connected in series along the second direction, and the third row 107 has four semiconductor units 171, 172, 173 and 174, which are connected in series along the first direction. The fourth row 108 has five semiconductor units 181, 182, 183, 184 and 185, which are connected in series along the second direction, and the fifth row 109 has five semiconductor units 191, 192, 193, It has 194 and 195 and is connected in series along the first direction. The first and second directions are opposite directions, and an arrangement structure having different quantities of semiconductor units in different rows can more easily meet the user's requirements for arrangement.

第三行107において、半導体ユニットの形状は長方形(矩形)で、他の行にある半導体ユニットの形状と異なる。このように設計することによって、電極の配置構造を更に容易にすることができる。図1及び図3を参考するに、第一行105及び第五行109において、基板11のコーナー領域にある半導体ユニット151、155、191及び195を除いて、他の半導体ユニットの電極の配置構造は類似している。第二行106及び第四行108において、基板11の縁に近接する半導体ユニット161、165、181及び185を除いて、他の半導体ユニットの電極配置構造は同様である。第三行107にある半導体ユニットは、その電極配置構造が他の行にある半導体ユニットと比べて大きく相違し、その中の半導体ユニット172及び173の電極配置構造は同様であるが、基板11の縁に近接する半導体ユニット171及び174の電極配置構造は相互異なる。 In the third row 107, the shape of the semiconductor unit is rectangular (rectangular), which is different from the shape of the semiconductor unit in the other rows. By designing in this way, the arrangement structure of the electrodes can be further facilitated. With reference to FIGS. 1 and 3, in the first row 105 and the fifth row 109, except for the semiconductor units 151, 155, 191 and 195 in the corner region of the substrate 11, the arrangement structure of the electrodes of the other semiconductor units is It is similar. In the second row 106 and the fourth row 108, the electrode arrangement structure of the other semiconductor units is the same except for the semiconductor units 161 and 165, 181 and 185 that are close to the edge of the substrate 11. The semiconductor unit in the third row 107 has a significantly different electrode arrangement structure as compared with the semiconductor units in the other rows, and the electrode arrangement structures of the semiconductor units 172 and 173 in the semiconductor unit are the same, but the substrate 11 has the same electrode arrangement structure. The electrode arrangement structures of the semiconductor units 171 and 174 close to the edge are different from each other.

第一延在部1411は第一曲線延在部1411aを有し、第二延在部1421は第二曲線延在部1421aを有し、行105、106、108及び109にある半導体ユニットの第二延在部1421はさらに直線延在部1421bを有し、第一曲線延在部1411a及び/又は第二曲線延在部1421aは半導体ユニットの何れかの一辺にも平行しない。第一行105、第三行107及び第五行109にある半導体ユニット上の第一延在部1411は、スロット170の中に位置し、半導体ユニットの第一辺から第一辺に相対する第二辺へ延び、第二延在部1421は半導体ユニットの第二辺から第一辺へ延びる。第二行106及び第四行108の半導体ユニット上の第一延在部1411は、半導体ユニットの第二辺から第一辺へ延び、第二延在部1421は半導体ユニットの第一辺から第二辺へ延びる。本実施例において、第二延在部1421は大体半導体ユニットの縁に近接して設けられ、第一延在部1411は半導体ユニットのスロット170の中に配置されて、第一半導体層121と電気接続されている。延在部の数量は半導体ユニットの面積によって調整され、半導体ユニットの面積が大きい場合、数多くの延在部が必要になる。さらに、延在部は第一曲線延在部1411aから延びて形成された二級延在部1411c及び/又は第二曲線延在部1421aから延びて形成された二級延在部1421cを有して、電流分散を増加することができる。 The first extension 1411 has a first curve extension 1411a, the second extension 1421 has a second curve extension 1421a, and the third of the semiconductor units in rows 105, 106, 108 and 109. (2) The extending portion 1421 further has a linear extending portion 1421b, and the first curve extending portion 1411a and / or the second curve extending portion 1421a is not parallel to any one side of the semiconductor unit. The first extending portion 1411 on the semiconductor unit in the first row 105, the third row 107 and the fifth row 109 is located in the slot 170, and the second side facing the first side of the semiconductor unit. The second extending portion 1421 extends from the second side to the first side of the semiconductor unit. The first extending portion 1411 on the semiconductor unit of the second row 106 and the fourth row 108 extends from the second side to the first side of the semiconductor unit, and the second extending portion 1421 extends from the first side of the semiconductor unit to the first side. It extends to two sides. In this embodiment, the second extending portion 1421 is provided generally close to the edge of the semiconductor unit, and the first extending portion 1411 is arranged in the slot 170 of the semiconductor unit to be electrically connected to the first semiconductor layer 121. It is connected. The number of extending portions is adjusted by the area of the semiconductor unit, and when the area of the semiconductor unit is large, a large number of extending portions are required. Further, the extension has a secondary extension 1411c formed extending from the first curve extension 1411a and / or a secondary extension 1421c formed extending from the second curve extension 1421a. Therefore, the current distribution can be increased.

第一電極パッド1412及び第二電極パッド1422は、それぞれ基板11の相対するコーナーにある半導体ユニット155及び191に位置し、第一電極パッド1412は半導体ユニット155にある第一延在部1411と接続し、第二電極パッド1422は半導体ユニット191にある第二延在部1421と接続する。電極パッドは、ワイヤボンディング(wire bonding)又はフリップチップ型ボンディング(flip chip type bonding)に用いられる。接続の難度を下げるために、電極パッドはそれぞれ基板11の一番外側にある異なる半導体ユニットに配置されるのが好ましい。 The first electrode pad 1412 and the second electrode pad 1422 are located at the semiconductor units 155 and 191 at the opposite corners of the substrate 11, respectively, and the first electrode pad 1412 is connected to the first extending portion 1411 in the semiconductor unit 155. The second electrode pad 1422 is connected to the second extending portion 1421 in the semiconductor unit 191. The electrode pads are used for wire bonding or flip chip type bonding. In order to reduce the difficulty of connection, it is preferable that the electrode pads are arranged in different semiconductor units on the outermost side of the substrate 11.

各半導体ユニットを電気接続するために、各半導体ユニットの間に連結部143を形成する。連結部143は、例えば第一半導体ユニットの第一延在部1411及びそれに隣接する第二半導体ユニットの第二延在部1421と接続する。本実施例において、連結部143は第一行105、第三行107及び第五行109で半導体ユニットを第一方向へ直列させ、第二行106及び第四行108で半導体ユニットを逆方向としての第二方向へ直列させる。各行の間は、連結部143を介して半導体ユニット151と161、165と174、171と181及び185と195を直列につなぐ。第一行105、第二行106、第四行108及び第五行109において、二つ毎の半導体ユニットの間に二つの連結部143が存在し、第三行107において、二つ毎の半導体ユニットの間に一つの連結部143が存在する。図4は図1に示された光電素子10の等価回路図である。 In order to electrically connect each semiconductor unit, a connecting portion 143 is formed between the semiconductor units. The connecting portion 143 is connected to, for example, the first extending portion 1411 of the first semiconductor unit and the second extending portion 1421 of the second semiconductor unit adjacent thereto. In this embodiment, the connecting portion 143 has the semiconductor units in series in the first row 105, the third row 107, and the fifth row 109, and the semiconductor units in the second row 106 and the fourth row 108 in the opposite direction. Series in the second direction. Between each row, semiconductor units 151 and 161, 165 and 174, 171 and 181 and 185 and 195 are connected in series via a connecting portion 143. In the first row 105, the second row 106, the fourth row 108 and the fifth row 109, there are two connecting portions 143 between the two semiconductor units, and in the third row 107, every two semiconductor units. There is one connecting portion 143 between the two. FIG. 4 is an equivalent circuit diagram of the photoelectric element 10 shown in FIG.

光電素子10の第二半導体層123と第二電極142の間に更に透明導電層を含み、透明導電層の材料は、例えば酸化インジウム錫(ITO)、酸化カドミウム錫(CTO)、酸化アンチモンスズ、酸化インジウム亜鉛、酸化亜鉛アルミニウム又は亜鉛-スズ酸化物のような金属酸化材料を用いることができる。一方、金属層が光束を透過させる厚さを有する場合、この金属層を透明導電層として用いることもできる。 A transparent conductive layer is further included between the second semiconductor layer 123 and the second electrode 142 of the photoelectric element 10, and the material of the transparent conductive layer is, for example, indium tin oxide (ITO), cadmium tin oxide (CTO), antimonth tin oxide, and the like. Metal oxidizing materials such as indium tin oxide, zinc aluminum oxide or zinc-tin oxide can be used. On the other hand, when the metal layer has a thickness that allows the light flux to pass through, this metal layer can also be used as the transparent conductive layer.

また、基板11と第一半導体層121の間に更に接合層を含み、半導体ユニットを基板11に接合することができる。接合層は透明絶縁接合層又は透明導電接合層である。透明絶縁接合層である場合、その材料はポリイミド(polyimide)、ベンゾシクロブテン(BCB)又は過フルオロシクロブタン(PFCB)であり、導電接合層である場合、その材料は金属酸化材料又は金属である。金属酸化材料として、酸化インジウム錫(ITO)、酸化カドミウム錫(CTO)、酸化アンチモンスズ、酸化インジウム亜鉛、酸化亜鉛アルミニウム又は亜鉛-スズ酸化物を含み、金属材料として、ニッケル、金、チタン、クロム、アルミニウム又は白金を含む。隔溝111は各半導体ユニットの間に形成され、一部の基板11及び/又は透明絶縁接合層を露出する。接合層が導電接合層である場合、隔溝111は導電接合層を通り抜いて基板11を露出し、各半導体ユニットが互いに電気的に絶縁されるようにする。この場合、基板11は、窒化アルミニウム(AlN)、サファイア又はガラスである。 Further, a bonding layer is further included between the substrate 11 and the first semiconductor layer 121, and the semiconductor unit can be bonded to the substrate 11. The bonding layer is a transparent insulating bonding layer or a transparent conductive bonding layer. In the case of a transparent insulating bonding layer, the material is polyimide (polyimide), benzocyclobutene (BCB) or perfluorocyclobutane (PFCB), and in the case of a conductive bonding layer, the material is a metal oxidizing material or a metal. Metal oxidation materials include indium tin oxide (ITO), cadmium tin oxide (CTO), antimonthine oxide, indium tin oxide, zinc aluminum oxide or zinc-tin oxide, and metal materials include nickel, gold, titanium and chromium. , Aluminum or platinum. The partition 111 is formed between the semiconductor units to expose a part of the substrate 11 and / or the transparent insulating bonding layer. When the bonding layer is a conductive bonding layer, the partition groove 111 passes through the conductive bonding layer to expose the substrate 11 so that the semiconductor units are electrically insulated from each other. In this case, the substrate 11 is aluminum nitride (AlN), sapphire or glass.

図5は本発明の第二実施例による光電素子20の上面図である。図5、図6を参照するに、光電素子20は基板21に形成され、且つ複数の隔溝211によって仕切った複数の半導体ユニットを含み、第一電極241、第二電極242及び連結部243が半導体ユニットに形成される。半導体ユニットの構造は光電素子10の半導体ユニットと同様であり、第一半導体層121と、第二半導体層123と、第一半導体層121及び第二半導体層123の間に設けられた活性領域122を含む。複数の隔溝211は各半導体ユニットの間に形成される。光電素子20には複数の第一電極241及び第二電極242が設けられ、第一電極241は露出された第一半導体層121に形成され、第二電極242は第二半導体層123に形成される。第一電極241は第一延在部2411を有し、第二電極242は第二延在部2421を有する。更に、複数の半導体ユニットにおいて、一つの半導体ユニットの第一電極241は第一電極パッド2412を含み、別の一つの半導体ユニットの第二電極242は第二電極パッド2422を含む。 FIG. 5 is a top view of the photoelectric element 20 according to the second embodiment of the present invention. With reference to FIGS. 5 and 6, the photoelectric element 20 includes a plurality of semiconductor units formed on the substrate 21 and partitioned by a plurality of groove 211, and the first electrode 241 and the second electrode 242 and the connecting portion 243 are included. It is formed in a semiconductor unit. The structure of the semiconductor unit is the same as that of the semiconductor unit of the photoelectric element 10, and the active region 122 provided between the first semiconductor layer 121, the second semiconductor layer 123, the first semiconductor layer 121, and the second semiconductor layer 123. including. The plurality of dividers 211 are formed between the semiconductor units. The photoelectric element 20 is provided with a plurality of first electrodes 241 and second electrodes 242, the first electrode 241 is formed on the exposed first semiconductor layer 121, and the second electrode 242 is formed on the second semiconductor layer 123. To. The first electrode 241 has a first extending portion 2411 and the second electrode 242 has a second extending portion 2421. Further, in the plurality of semiconductor units, the first electrode 241 of one semiconductor unit includes the first electrode pad 2412, and the second electrode 242 of another semiconductor unit includes the second electrode pad 2422.

本実施例において、光電素子20の寸法は85×85milであり、駆動電圧は72Vであり、個々の半導体ユニットの面積はほぼ同様であり、上記の式(数1を参照)によって、光電素子20は23個の半導体ユニットを含み、それぞれ行205、206、207、208及び209に配置されている。第一行205には第一方向に沿って直列につながる五個の半導体ユニット251、252、253、254及び255を有し、電極の配置構造は光電素子10の第一行105の半導体ユニットにある電極配置構造と等しい。第二行206には第二方向に沿って直列につながる四個の半導体ユニット261、262、263及び264を有し、電極の配置構造は光電素子10の第三行107の半導体ユニットにある電極配置構造と等しい。第三行207には第一方向に沿って直列につながる五個の半導体ユニット271、272、273、274及び275を有し、電極の配置構造は光電素子10の第一行105の半導体ユニットにある電極配置構造と等しい。第四行208には第二方向に沿って直列につながる四個の半導体ユニット281、282、283及び284を有し、電極の配置構造は光電素子10の第三行107の半導体ユニットにある電極配置構造と等しい。第五行209には第一方向に沿って直列につながる五個の半導体ユニット291、292、293、294及び295を有し、電極の配置構造は光電素子10の第一行105の半導体ユニットにある電極配置構造と等しい。 In this embodiment, the dimensions of the photoelectric element 20 are 85 × 85 mil 2 , the drive voltage is 72 V, the areas of the individual semiconductor units are almost the same, and the photoelectric element is based on the above equation (see Equation 1). 20 comprises 23 semiconductor units, located in rows 205, 206, 207, 208 and 209, respectively. The first row 205 has five semiconductor units 251, 252, 253, 254 and 255 connected in series along the first direction, and the electrode arrangement structure is the semiconductor unit of the first row 105 of the photoelectric element 10. Equal to a certain electrode arrangement structure. The second row 206 has four semiconductor units 261, 262, 263 and 264 connected in series along the second direction, and the electrode arrangement structure is the electrode in the semiconductor unit of the third row 107 of the photoelectric element 10. Equal to the placement structure. The third row 207 has five semiconductor units 271, 272, 273, 274 and 275 connected in series along the first direction, and the electrode arrangement structure is the semiconductor unit of the first row 105 of the photoelectric element 10. Equal to a certain electrode arrangement structure. The fourth row 208 has four semiconductor units 281, 282, 283 and 284 connected in series along the second direction, and the electrode arrangement structure is the electrode in the semiconductor unit of the third row 107 of the photoelectric element 10. Equal to the placement structure. The fifth row 209 has five semiconductor units 291, 292, 293, 294 and 295 connected in series along the first direction, and the electrode arrangement structure is in the semiconductor unit of the first row 105 of the photoelectric element 10. Equal to the electrode placement structure.

第二行206及び第四行208において、半導体ユニットの形状は長方形で、他の行にある半導体ユニットの形状と異なる。図5及び図6を参照するに、第一行205、第三行207及び第五行209の半導体ユニットの電極配置構造は、半導体ユニット251、255、271、275、291及び295の電極を除いて、他の半導体ユニットの電極配置構造がほぼ類似し、第二行206及び第四行208の半導体ユニットの電極配置構造は、半導体ユニット261、264、281及び284の電極を除いて、他の半導体ユニットの電極配置構造がほぼ類似する。第一延在部2411は第一曲線延在部2411aを含み、第二延在部2421は第二曲線延在部2421aを含む。行205、207及び209の半導体ユニットにおいて、第二延在部2421は更に直線延在部2421bを含む。第一曲線延在部2411a及び第二曲線延在部2421aは、半導体ユニットのいずれかの一辺にも平行しない。第一行205、第三行207及び第五行209の半導体ユニットの第一延在部2411は第一半導体層121に設けられ、半導体ユニットの第一辺から第一辺に相対する第二辺へ延び、第二延在部2421は半導体ユニットの第二辺から第一辺へ延びる。第二行206及び第四行208の半導体ユニット上の第一延在部2411は、半導体ユニットの第二辺から第一辺へ延び、第二延在部2421は半導体ユニットの第一辺から第二辺へ延びる。本実施例において、第二延在部2421は大体半導体ユニットの縁に近接して設けられ、第一延在部2411は半導体ユニットに配置されて、第一半導体層と電気接続されている。さらに、延在部は第一曲線延在部2411aから延びて形成された二級延在部2411cを有して、電流分散を増加することができる。 In the second row 206 and the fourth row 208, the shape of the semiconductor unit is rectangular, which is different from the shape of the semiconductor unit in the other rows. With reference to FIGS. 5 and 6, the electrode arrangement structure of the semiconductor units in the first row 205, the third row 207 and the fifth row 209 excludes the electrodes of the semiconductor units 251, 255, 271, 275, 291 and 295. , The electrode arrangement structure of the other semiconductor units is almost similar, and the electrode arrangement structure of the semiconductor units in the second row 206 and the fourth row 208 is other semiconductors except for the electrodes of the semiconductor units 261, 264, 281 and 284. The electrode arrangement structure of the unit is almost similar. The first extending portion 2411 includes the first curve extending portion 2411a, and the second extending portion 2421 includes the second curve extending portion 2421a. In the semiconductor units of rows 205, 207 and 209, the second extension 2421 further includes a linear extension 2421b. The first curve extending portion 2411a and the second curve extending portion 2421a are not parallel to any one side of the semiconductor unit. The first extending portion 2411 of the semiconductor unit of the first row 205, the third row 207 and the fifth row 209 is provided on the first semiconductor layer 121, and from the first side of the semiconductor unit to the second side facing the first side. The second extending portion 2421 extends from the second side to the first side of the semiconductor unit. The first extending portion 2411 on the semiconductor unit of the second row 206 and the fourth row 208 extends from the second side to the first side of the semiconductor unit, and the second extending portion 2421 extends from the first side of the semiconductor unit to the first side. It extends to two sides. In this embodiment, the second extending portion 2421 is provided generally close to the edge of the semiconductor unit, and the first extending portion 2411 is arranged in the semiconductor unit and is electrically connected to the first semiconductor layer. Further, the extending portion has a secondary extending portion 2411c formed extending from the first curve extending portion 2411a, and the current distribution can be increased.

第一電極パッド2412及び第二電極パッド2422はそれぞれ半導体ユニット255及び291に形成され、第一電極パッド2412は半導体ユニット255の第一延在部2411と接続し、第二電極パッド2422は半導体ユニット291の第二延在部2421と接続する。電極パッドはボンディング用として、それぞれ基板21のコーナー領域にある異なる半導体ユニットに配置される。 The first electrode pad 2412 and the second electrode pad 2422 are formed in the semiconductor units 255 and 291 respectively, the first electrode pad 2412 is connected to the first extending portion 2411 of the semiconductor unit 255, and the second electrode pad 2422 is a semiconductor unit. It connects to the second extension portion 2421 of 291. The electrode pads are arranged in different semiconductor units in the corner regions of the substrate 21 for bonding.

本実施例において、連結部243は第一行205、第三行207及び第五行209で半導体ユニットを第一方向へ直列させ、第二行206及び第四行208で半導体ユニットを逆方向としての第二方向へ直列させる。各行の間は、連結部243を介して半導体ユニット251と261、264と275、271と281及び284と295を直列につなぐ。第一行205、第三行207及び第五行209において、二つ毎の半導体ユニットの間に二つの連結部243が存在し、第二行206及び第四行208において、二つ毎の半導体ユニットの間に一つの連結部243が存在する。図7は図5に示された光電素子20の等価回路図である。 In this embodiment, the connecting portion 243 connects the semiconductor units in the first direction in the first row 205, the third row 207, and the fifth row 209, and the semiconductor units in the second row 206 and the fourth row 208 in the opposite direction. Series in the second direction. Between each row, semiconductor units 251 and 261 and 264 and 275, 271 and 281 and 284 and 295 are connected in series via a connecting portion 243. In the first row 205, the third row 207 and the fifth row 209, there are two connecting portions 243 between the two semiconductor units, and in the second row 206 and the fourth row 208, every two semiconductor units. There is one connecting portion 243 between the two. FIG. 7 is an equivalent circuit diagram of the photoelectric element 20 shown in FIG.

図8は本発明の第三実施例による光電素子30の上面図である。図8、図9を参照するに、光電素子30は基板31に形成された複数の半導体ユニットを含み、第一電極341、第二電極342及び連結部343が半導体ユニットに形成される。半導体ユニットは第一半導体層121と、第二半導体層123と、第一半導体層121及び第二半導体層123の間に設けられた活性領域122を含む。また、複数の隔溝311が各半導体ユニットの間に形成される。光電素子30には複数の第一電極341及び第二電極342が設けられ、第一電極341は第一延在部3411を有し、半導体ユニット355以外の半導体ユニットに形成され、第二電極342は第二延在部3421を有する。更に、半導体ユニット355上の第一電極341は第一電極パッド3412を含み、半導体ユニット391上の第二電極342は第二電極パッド3422を含む。本実施例において、光電素子30の寸法は50×50milであり、駆動電圧は72Vであり、半導体ユニットの駆動電圧は3Vであり、各半導体ユニットの面積はほぼ同様である。光電素子30は23個の半導体ユニットを含み、それぞれ行305、306、307、308及び309に配置されている。第一行305には第一方向に沿って直列につながる五個の半導体ユニット351、352、353、354及び355を有し、第二行306には第二方向に沿って直列につながる四個の半導体ユニット361、362、363及び364を有し、第三行307には第一方向に沿って直列につながる五個の半導体ユニット371、372、373、374及び375を有し、第四行308には第二方向に沿って直列につながる四個の半導体ユニット381、382、383及び384を有し、第五行309には第一方向に沿って直列につながる五個の半導体ユニット391、392、393、394及び395を有する。 FIG. 8 is a top view of the photoelectric element 30 according to the third embodiment of the present invention. With reference to FIGS. 8 and 9, the photoelectric element 30 includes a plurality of semiconductor units formed on the substrate 31, and the first electrode 341, the second electrode 342, and the connecting portion 343 are formed on the semiconductor unit. The semiconductor unit includes a first semiconductor layer 121, a second semiconductor layer 123, and an active region 122 provided between the first semiconductor layer 121 and the second semiconductor layer 123. Further, a plurality of separating grooves 311 are formed between the semiconductor units. The photoelectric element 30 is provided with a plurality of first electrodes 341 and second electrodes 342, and the first electrode 341 has a first extending portion 3411 and is formed in a semiconductor unit other than the semiconductor unit 355, and the second electrode 342. Has a second extension 3421. Further, the first electrode 341 on the semiconductor unit 355 includes a first electrode pad 3412, and the second electrode 342 on the semiconductor unit 391 includes a second electrode pad 3422. In this embodiment, the dimensions of the photoelectric element 30 are 50 × 50 mil 2 , the drive voltage is 72 V, the drive voltage of the semiconductor unit is 3 V, and the areas of the semiconductor units are substantially the same. The photoelectric element 30 includes 23 semiconductor units and are arranged in rows 305, 306, 307, 308 and 309, respectively. The first row 305 has five semiconductor units 351, 352, 353, 354 and 355 connected in series along the first direction, and the second row 306 has four semiconductor units connected in series along the second direction. The semiconductor units 361, 362, 363 and 364 of the third row 307 have five semiconductor units 371, 372, 373, 374 and 375 connected in series along the first direction, and the fourth row has. The 308 has four semiconductor units 381, 382, 383 and 384 connected in series along the second direction, and the fifth row 309 has five semiconductor units 391, 392 connected in series along the first direction. , 393, 394 and 395.

第二行306及び第四行308において、半導体ユニットの形状は他の行にある半導体ユニットの形状と異なる。図8及び図9を参照するに、第一行305、第三行307及び第五行309の半導体ユニットの電極配置構造は、半導体ユニット351、355、371、375、391及び395の電極を除いて、他の半導体ユニットの電極配置構造がほぼ類似し、第二行306及び第四行308の半導体ユニットの電極配置構造は、半導体ユニット361、364、381及び384の電極を除いて、他の半導体ユニットの電極配置構造がほぼ類似する。第一延在部3411は、基板31の周囲に近接する半導体ユニット361、375、381、391及び395に設けられた曲線延在部3411aであり、他の半導体ユニットに設けられた直線延在部3411bでもある。第二延在部3421は曲線延在部である。 第一行305、第三行307及び第五行309において、半導体ユニット375、395を除く他の半導体ユニットの第一延在部3411は、半導体ユニットの第一辺から第一辺に相対する第二辺へ延び、第二延在部3421は半導体ユニットの第二辺から第一辺へ延びる。半導体ユニット375及び395の第一延在部3411は半導体ユニットの第三辺から第二辺へ延びる。第二行306及び第四行308において、半導体ユニット361及び381を除くほかの半導体ユニットの第一延在部3411は、半導体ユニットの第二辺から第一辺へ延び、第二延在部3421は半導体ユニットの第一辺から第二辺へ延びる。半導体ユニット361及び381の第一延在部3411は半導体ユニット361及び381の第三辺から第一辺へ延びる。第一延在部3411の曲線延在部及び第二延在部3421は半導体ユニットのいずれかの一辺にも平行しない。本実施例において、第二延在部3421は大体半導体ユニットの縁に近接して設けられ、第一延在部3411は半導体ユニットに配置されて、第一半導体層と電気接続されている。さらに、延在部は曲線延在部3411a及び直線延在部3411bから延びて形成された二級延在部3411cを有して、電流分散を増加することができる。 In the second row 306 and the fourth row 308, the shape of the semiconductor unit is different from the shape of the semiconductor unit in the other rows. Referring to FIGS. 8 and 9, the electrode arrangement structure of the semiconductor units in the first row 305, the third row 307 and the fifth row 309 excludes the electrodes of the semiconductor units 351, 355, 371, 375, 391 and 395. , The electrode arrangement structure of the other semiconductor units is almost similar, and the electrode arrangement structure of the semiconductor units in the second row 306 and the fourth row 308 is other semiconductors except for the electrodes of the semiconductor units 361, 364, 381 and 384. The electrode arrangement structure of the unit is almost similar. The first extending portion 3411 is a curved extending portion 3411a provided on the semiconductor units 361, 375, 381, 391 and 395 close to the periphery of the substrate 31, and is a linear extending portion provided on another semiconductor unit. It is also 3411b. The second extending portion 3421 is a curved extending portion. In the first row 305, the third row 307, and the fifth row 309, the first extending portion 3411 of the other semiconductor units except the semiconductor unit 375 and 395 is the second side facing the first side of the semiconductor unit. The second extending portion 3421 extends from the second side to the first side of the semiconductor unit. The first extending portion 3411 of the semiconductor units 375 and 395 extends from the third side to the second side of the semiconductor unit. In the second row 306 and the fourth row 308, the first extending portion 3411 of the other semiconductor units except the semiconductor units 361 and 381 extends from the second side to the first side of the semiconductor unit, and the second extending portion 3421. Extends from the first side to the second side of the semiconductor unit. The first extending portion 3411 of the semiconductor units 361 and 381 extends from the third side to the first side of the semiconductor units 361 and 381. The curved extending portion and the second extending portion 3421 of the first extending portion 3411 are not parallel to any one side of the semiconductor unit. In this embodiment, the second extending portion 3421 is provided generally close to the edge of the semiconductor unit, and the first extending portion 3411 is arranged in the semiconductor unit and is electrically connected to the first semiconductor layer. Further, the extending portion has a curved extending portion 3411a and a secondary extending portion 3411c formed extending from the straight extending portion 3411b, and the current distribution can be increased.

第一電極パッド3412及び第二電極パッド3422はそれぞれ半導体ユニット355及び391に形成され、第二電極パッド3422は半導体ユニット391の第二延在部3421と接続する。電極パッドはワイヤボンディング(wire bonding)又はフリップチップ型ボンディング(flip chip type bonding)に用いられ、それぞれ基板31のコーナー領域にある異なる半導体ユニットに配置される。 The first electrode pad 3412 and the second electrode pad 3422 are formed on the semiconductor units 355 and 391, respectively, and the second electrode pad 3422 is connected to the second extending portion 3421 of the semiconductor unit 391. The electrode pads are used for wire bonding or flip chip type bonding, and are arranged in different semiconductor units in the corner regions of the substrate 31, respectively.

本実施例において、連結部343は第一行305、第三行307及び第五行309で半導体ユニットを第一方向へ直列させ、第二行306及び第四行308で半導体ユニットを逆方向としての第二方向へ直列させる。各行の間は、連結部343を介して半導体ユニット351と361、364と375、371と381及び384と395を直列につなぐ。二つ毎の半導体ユニットの間に一つの連結部343が存在する。図10は図8に示された光電素子30の等価回路図である。 In this embodiment, the connecting portion 343 connects the semiconductor units in the first direction in the first row 305, the third row 307, and the fifth row 309, and the semiconductor units in the second row 306 and the fourth row 308 in the opposite direction. Series in the second direction. Between each row, semiconductor units 351 and 361, 364 and 375, 371 and 381, and 384 and 395 are connected in series via a connecting portion 343. There is one connecting portion 343 between each of the two semiconductor units. FIG. 10 is an equivalent circuit diagram of the photoelectric element 30 shown in FIG.

図11は本発明の第四実施例による光電素子40の上面図である。図11、図12を参照するに、光電素子40は基板41に形成された複数の半導体ユニットを含み、第一電極441、第二電極442及び連結部443が半導体ユニットに形成される。半導体ユニットは第一半導体層121と、第二半導体層123と、第一半導体層121及び第二半導体層123の間に設けられた活性領域122を含む。また、複数の隔溝411が各半導体ユニットの間に形成される。光電素子40には複数の第一電極441及び第二電極442が設けられ、第一電極441は第一延在部4411を有し、半導体ユニット455以外の半導体ユニットに形成され、半導体ユニット471以外の半導体ユニットに形成された第二電極442は第二延在部4421を有する。更に、半導体ユニット455上の第一電極441は第一電極パッド4412を含み、半導体ユニット471上の第二電極442は第二電極パッド4422を含む。 本実施例において、光電素子40の寸法は45×45milであり、駆動電圧は48Vであり、半導体ユニットの駆動電圧は3Vである。上記の式によって、光電素子40は16個の半導体ユニットを含み、それぞれ行405、406及び407に配置されている。第一行405には第一方向に沿って直列につながる五個の半導体ユニット451、452、453、454及び455を有し、第二行406には第二方向に沿って直列につながる六個の半導体ユニット461、462、463、464、465及び466を有し、第三行407には第一方向に沿って直列につながる五個の半導体ユニット471、472、473、474及び475を有する。 FIG. 11 is a top view of the photoelectric element 40 according to the fourth embodiment of the present invention. With reference to FIGS. 11 and 12, the photoelectric element 40 includes a plurality of semiconductor units formed on the substrate 41, and the first electrode 441, the second electrode 442, and the connecting portion 443 are formed on the semiconductor unit. The semiconductor unit includes a first semiconductor layer 121, a second semiconductor layer 123, and an active region 122 provided between the first semiconductor layer 121 and the second semiconductor layer 123. Further, a plurality of partition grooves 411 are formed between the semiconductor units. The photoelectric element 40 is provided with a plurality of first electrodes 441 and second electrodes 442, and the first electrode 441 has a first extending portion 4411 and is formed in a semiconductor unit other than the semiconductor unit 455, other than the semiconductor unit 471. The second electrode 442 formed on the semiconductor unit of the above has a second extending portion 4421. Further, the first electrode 441 on the semiconductor unit 455 includes the first electrode pad 4412, and the second electrode 442 on the semiconductor unit 471 includes the second electrode pad 4422. In this embodiment, the dimensions of the photoelectric element 40 are 45 × 45 mil 2 , the drive voltage is 48 V, and the drive voltage of the semiconductor unit is 3 V. According to the above equation, the photoelectric element 40 includes 16 semiconductor units and are arranged in rows 405, 406 and 407, respectively. The first row 405 has five semiconductor units 451, 452, 453, 454 and 455 connected in series along the first direction, and the second row 406 has six semiconductor units connected in series along the second direction. Has semiconductor units 461, 462, 463, 464, 465 and 466, and row 407 has five semiconductor units 471, 472, 473, 474 and 475 connected in series along the first direction.

第二行406にある半導体ユニットの形状は他の行にある半導体ユニットの形状と異なる。図11及び図12を参照するに、第一行405及び第三行407の半導体ユニットの電極配置構造は、半導体ユニット451、455、471及び475上の電極を除いて、他の半導体ユニットの電極配置構造がほぼ類似する。第一延在部4411は直線延在部4411a及び二級延在部4411cを含み、全ての第二延在部4421は曲線の延在部である。第一行405及び第三行407にある半導体ユニットの第一延在部4411は、半導体ユニットの第一辺から第一辺に隣接する第三辺及び第四辺へ延び、第二延在部4421は半導体ユニットの第二辺から第三辺及び第四辺へ延びる。第二行406にある半導体ユニット上の第一延在部4411は、半導体ユニットの第二辺から第三辺及び第四辺へ延び、第二延在部4421は半導体ユニットの第一辺から第三辺及び第四辺へ延びる。曲線延在部4411及び4421は半導体ユニットのいずれかの一辺にも平行しない。 The shape of the semiconductor unit in the second row 406 is different from the shape of the semiconductor unit in the other rows. With reference to FIGS. 11 and 12, the electrode arrangement structure of the semiconductor units in the first row 405 and the third row 407 is the electrodes of other semiconductor units except the electrodes on the semiconductor units 451, 455, 471 and 475. The arrangement structure is almost similar. The first extending portion 4411 includes a straight extending portion 4411a and a secondary extending portion 4411c, and all the second extending portions 4421 are curved extending portions. The first extending portion 4411 of the semiconductor unit in the first row 405 and the third row 407 extends from the first side of the semiconductor unit to the third side and the fourth side adjacent to the first side, and the second extending portion. The 4421 extends from the second side to the third side and the fourth side of the semiconductor unit. The first extending portion 4411 on the semiconductor unit in the second row 406 extends from the second side to the third side and the fourth side of the semiconductor unit, and the second extending portion 4421 extends from the first side of the semiconductor unit to the first side. Extends to the third and fourth sides. The curved extending portions 4411 and 4421 are not parallel to any one side of the semiconductor unit.

第一電極パッド4412及び第二電極パッド4422はそれぞれ半導体ユニット455及び471に形成され、連結部443は半導体ユニットを直列につなぐ。図13は図11に示された光電素子40の等価回路図である。 図14は本発明の第五実施例による光電素子50の上面図である。図15は光電素子50の3D斜視図である。光電素子50の寸法は40×40milであり、駆動電圧は36Vであり、半導体ユニットの駆動電圧は約3Vである。式(数1を参照)によって、本実施例で、光電素子50は11個の半導体ユニットを含み、それぞれ行505、506及び507に配置されている。第一行505には第一方向に沿って直列につながる四個の半導体ユニット551、552、553及び554を有し、第二行506には第二方向に沿って直列につながる三個の半導体ユニット561、562及び563を有し、第三行507には第一方向に沿って直列につながる四個の半導体ユニット571、572、573及び574を有する。第一延在部5411を有する第一電極541は半導体ユニット554以外の半導体ユニットに形成され、第二延在部5421を有する第二電極542は全ての半導体ユニットに形成される。半導体ユニット554上の第一電極541は第一電極パッド5412を含み、半導体ユニット571上の第二電極542は第二電極パッド5422を含む。連結部543は半導体ユニットを直列につなぐ。図16は図14に示された光電素子50の等価回路図である。 The first electrode pad 4412 and the second electrode pad 4422 are formed on the semiconductor units 455 and 471, respectively, and the connecting portion 443 connects the semiconductor units in series. FIG. 13 is an equivalent circuit diagram of the photoelectric element 40 shown in FIG. FIG. 14 is a top view of the photoelectric element 50 according to the fifth embodiment of the present invention. FIG. 15 is a 3D perspective view of the photoelectric element 50. The dimensions of the photoelectric element 50 are 40 × 40 mil 2 , the drive voltage is 36 V, and the drive voltage of the semiconductor unit is about 3 V. According to the equation (see Equation 1), in this embodiment, the photoelectric element 50 includes 11 semiconductor units, which are arranged in rows 505, 506, and 507, respectively. The first row 505 has four semiconductor units 551, 552, 552 and 554 connected in series along the first direction, and the second row 506 has three semiconductors connected in series along the second direction. It has units 561, 562 and 563, and the third row 507 has four semiconductor units 571, 572, 573 and 574 connected in series along the first direction. The first electrode 541 having the first extending portion 5411 is formed in a semiconductor unit other than the semiconductor unit 554, and the second electrode 542 having the second extending portion 5421 is formed in all the semiconductor units. The first electrode 541 on the semiconductor unit 554 includes a first electrode pad 5412, and the second electrode 542 on the semiconductor unit 571 includes a second electrode pad 5422. The connecting portion 543 connects the semiconductor units in series. FIG. 16 is an equivalent circuit diagram of the photoelectric element 50 shown in FIG.

図17は本発明の第六実施例による光電素子60の上面図である。図18は光電素子60の3D斜視図である。光電素子60の寸法は120×120milであり、駆動電圧は24Vであり、半導体ユニットの駆動電圧は約3Vである。式(数2を参照)によって、本実施例で、光電素子60は8個の半導体ユニットを含み、それぞれ行605、606及び607に配置されている。第一行605には第一方向に沿って直列につながる二個の半導体ユニット651及び652を有し、第二行606には第二方向に沿って直列につながる四個の半導体ユニット661、662、663及び664を有し、第三行607には第一方向に沿って直列につながる二個の半導体ユニット671及び672を有する。第一電極641は第一延在部6411を有し、第二電極642は第二延在部6421を有する。さらに、複数の半導体ユニットの中、一つの半導体ユニットにある第一電極641は二つの第一電極パッド6412を有し、別の一つの半導体ユニットにある第二電極642は二つの第二電極パッド6422を有する。連結部643は半導体ユニットを直列につなぐ。図19は図17に示された光電素子60の等価回路図である。 FIG. 17 is a top view of the photoelectric element 60 according to the sixth embodiment of the present invention. FIG. 18 is a 3D perspective view of the photoelectric element 60. The dimensions of the photoelectric element 60 are 120 × 120 mil 2 , the drive voltage is 24 V, and the drive voltage of the semiconductor unit is about 3 V. According to the equation (see Equation 2), in this embodiment, the photoelectric element 60 includes eight semiconductor units and are arranged in rows 605, 606 and 607, respectively. The first row 605 has two semiconductor units 651 and 652 connected in series along the first direction, and the second row 606 has four semiconductor units 661 and 662 connected in series along the second direction. , 663 and 664, and the third row 607 has two semiconductor units 671 and 672 connected in series along the first direction. The first electrode 641 has a first extending portion 6411, and the second electrode 642 has a second extending portion 6421. Further, among the plurality of semiconductor units, the first electrode 641 in one semiconductor unit has two first electrode pads 6412, and the second electrode 642 in another semiconductor unit has two second electrode pads. It has 6422. The connecting portion 643 connects the semiconductor units in series. FIG. 19 is an equivalent circuit diagram of the photoelectric element 60 shown in FIG.

図20は本発明の第七実施例による光電素子70の上面図である。図21は光電素子70の3D斜視図である。光電素子70の寸法は120×120milであり、駆動電圧は24Vであり、半導体ユニットの駆動電圧は約3Vである。式(数1を参照)によって、本実施例で、光電素子70は7個の半導体ユニットを含み、それぞれ行705、706及び707に配置されている。第一行705には第一方向に沿って直列につながる二個の半導体ユニット751及び752を有し、第二行706には第二方向に沿って直列につながる三個の半導体ユニット761、762及び763を有し、第三行707には第一方向に沿って直列につながる二個の半導体ユニット771及び772を有する。第一電極741は第一延在部7411を有し、第二電極742は第二延在部7421を有する。さらに、複数の半導体ユニットの中、一つの半導体ユニットにある第一電極741は二つの第一電極パッド7412を有し、別の一つの半導体ユニットにある第二電極742は二つの第二電極パッド7422を有する。連結部743は半導体ユニットを直列につなぐ。図22は図20に示された光電素子70の等価回路図である。 FIG. 20 is a top view of the photoelectric element 70 according to the seventh embodiment of the present invention. FIG. 21 is a 3D perspective view of the photoelectric element 70. The dimensions of the photoelectric element 70 are 120 × 120 mil 2 , the drive voltage is 24 V, and the drive voltage of the semiconductor unit is about 3 V. According to the equation (see Equation 1), in this embodiment, the photoelectric element 70 includes seven semiconductor units and are arranged in rows 705, 706 and 707, respectively. The first row 705 has two semiconductor units 751 and 752 connected in series along the first direction, and the second row 706 has three semiconductor units 761 and 762 connected in series along the second direction. And 763, and the third row 707 has two semiconductor units 771 and 772 connected in series along the first direction. The first electrode 741 has a first extending portion 7411, and the second electrode 742 has a second extending portion 7421. Further, among the plurality of semiconductor units, the first electrode 741 in one semiconductor unit has two first electrode pads 7412, and the second electrode 742 in another semiconductor unit has two second electrode pads. It has 7422. The connecting portion 743 connects the semiconductor units in series. FIG. 22 is an equivalent circuit diagram of the photoelectric element 70 shown in FIG.

図23は本発明の第八実施例による光電素子80の上面図である。図24は光電素子80の3D斜視図である。光電素子80の寸法は85×85milであり、駆動電圧は144Vであり、半導体ユニットの駆動電圧は約3Vである。式(数2を参照)によって、本実施例で、光電素子80は48個の半導体ユニットを含み、それぞれ行801、802、803、804、805、806及び807に配置されている。行801、803、805及び807には第一方向に沿って直列につながる七個の半導体ユニットを有し、行802及び806には第二方向に沿って直列につながる七個の半導体ユニットを有し、第四行804には第一方向に沿って直列につながる六個の半導体ユニットを有する。複数の半導体ユニットの中、一つの半導体ユニットにある第一電極841は半導体ユニット811の第一半導体層121に位置する第一電極パッド8412を含み、半導体ユニット871にある第二電極842は第二半導体層123に位置する第二電極パッド8422を含む。さらに、第一延在部8411を有する第一電極841は、第一電極パッド8412が位置した半導体ユニット以外の半導体ユニットに位置し、第二延在部8421を有する第二電極842は全ての半導体ユニットに位置する。連結部843は半導体ユニットを直列につなぐ。第一電極パッド8412が位置する半導体ユニット811上の第二電極842は第二半導体層123に位置し、連結部843を介して半導体ユニット812の第一電極841に連結される。第二電極パッド8422が位置する半導体ユニット871上の第一電極841は第一半導体層121に位置し、連結部843を介して半導体ユニット872の第二電極842に連結される。 FIG. 23 is a top view of the photoelectric element 80 according to the eighth embodiment of the present invention. FIG. 24 is a 3D perspective view of the photoelectric element 80. The dimensions of the photoelectric element 80 are 85 × 85 mil 2 , the drive voltage is 144 V, and the drive voltage of the semiconductor unit is about 3 V. According to the equation (see Equation 2), in this embodiment, the photoelectric element 80 includes 48 semiconductor units, which are arranged in rows 801, 802, 803, 804, 805, 806, and 807, respectively. Rows 801 and 803, 805 and 807 have seven semiconductor units connected in series along the first direction, and rows 802 and 806 have seven semiconductor units connected in series along the second direction. However, the fourth row 804 has six semiconductor units connected in series along the first direction. Among the plurality of semiconductor units, the first electrode 841 in one semiconductor unit includes the first electrode pad 8412 located in the first semiconductor layer 121 of the semiconductor unit 811, and the second electrode 842 in the semiconductor unit 871 is the second. A second electrode pad 8422 located on the semiconductor layer 123 is included. Further, the first electrode 841 having the first extending portion 8411 is located in a semiconductor unit other than the semiconductor unit in which the first electrode pad 8412 is located, and the second electrode 842 having the second extending portion 8421 is all semiconductors. Located in the unit. The connecting portion 843 connects the semiconductor units in series. The second electrode 842 on the semiconductor unit 811 in which the first electrode pad 8412 is located is located in the second semiconductor layer 123 and is connected to the first electrode 841 of the semiconductor unit 812 via the connecting portion 843. The first electrode 841 on the semiconductor unit 871 in which the second electrode pad 8422 is located is located in the first semiconductor layer 121 and is connected to the second electrode 842 of the semiconductor unit 872 via the connecting portion 843.

図25は本発明の第九実施例による光電素子90の上面図である。光電素子90は48個の半導体ユニットを含み、それぞれ行801、802、803、804、805、806及び807に配置されている。本実施例の光電素子90は、その形状及び電極配置構造が光電素子80と類似するが、第一電極パッド9412は半導体ユニット811の第二半導体層123に形成され、連結部843を介して半導体ユニット812の第一電極841と直列につながり、第二電極パッド9422は半導体ユニット871の第二半導体層123に形成され、連結部843を介して半導体ユニット872の第二電極842と直列につながる点で光電素子80と相違する。ある外部電源から電流を供給し、第二電極パッド9422から入力して更に第一電極パッド9412から出力する場合、第二電極パッド9422の下の半導体ユニット871の抵抗が連結部843及び半導体ユニット812の第一電極841の直列接続抵抗より大きいため、電流は直接第二電極パッド9422から連結部843を経由して半導体ユニット812の第一電極841に流れ、半導体ユニット871の下の第一半導体層121、活性領域122及び第二半導体層123に流れない。同様な電流は、半導体ユニット812の第一電極841まで流れ、連結部843を経由して第一電極パッド9412に流れた後、半導体ユニット811の下方の第一半導体層121、活性領域122及び第二半導体層123に流れず、直接外部電源に出力される。従って、第一電極パッド9412及び第二電極パッド9422の下方の半導体ユニット811及び871には光が生じない。電極パッド及び下方の半導体ユニットを更に電気的に絶縁するために、電極パッド及び半導体ユニットの間に絶縁層が形成され、大電流によって電極パッドの下方にある半導体層を電流が突き抜けて短路になることを避ける。 FIG. 25 is a top view of the photoelectric element 90 according to the ninth embodiment of the present invention. The photoelectric element 90 includes 48 semiconductor units, which are arranged in rows 801, 802, 803, 804, 805, 806, and 807, respectively. The photoelectric element 90 of this embodiment is similar in shape and electrode arrangement structure to the photoelectric element 80, but the first electrode pad 9412 is formed on the second semiconductor layer 123 of the semiconductor unit 811 and is a semiconductor via the connecting portion 843. A point connected in series with the first electrode 841 of the unit 812, the second electrode pad 9422 is formed on the second semiconductor layer 123 of the semiconductor unit 871 and connected in series with the second electrode 842 of the semiconductor unit 872 via the connecting portion 843. It is different from the photoelectric element 80. When a current is supplied from a certain external power source, input from the second electrode pad 9422, and further output from the first electrode pad 9412, the resistance of the semiconductor unit 871 under the second electrode pad 9422 is the connection portion 843 and the semiconductor unit 812. Since it is larger than the series connection resistance of the first electrode 841, the current flows directly from the second electrode pad 9422 to the first electrode 841 of the semiconductor unit 812 via the connecting portion 843, and the first semiconductor layer under the semiconductor unit 871. It does not flow to 121, the active region 122 and the second semiconductor layer 123. A similar current flows to the first electrode 841 of the semiconductor unit 812, flows to the first electrode pad 9412 via the connecting portion 843, and then flows to the first semiconductor layer 121, the active region 122, and the first unit below the semiconductor unit 811. (2) It does not flow to the semiconductor layer 123 and is directly output to the external power source. Therefore, no light is generated in the semiconductor units 811 and 871 below the first electrode pad 9412 and the second electrode pad 9422. In order to further electrically insulate the electrode pad and the semiconductor unit below, an insulating layer is formed between the electrode pad and the semiconductor unit, and a large current causes a current to penetrate the semiconductor layer below the electrode pad to form a short path. Avoid that.

第一電極パッド9412及び第二電極パッド9422の下方の半導体ユニットが発光しないため、第一電極パッド9412の面積は半導体ユニット811の面積とほぼ同様に形成され、第二電極パッド9422の面積は半導体ユニット871の面積とほぼ同様に形成されて、ワイヤー工程の歩留まりを向上させることができる。一方、光電素子90において、第一電極パッド9412は光電素子80中の第二電極パッド8422と組み合わせることができる。この場合、第一電極パッド9412は半導体ユニット811の第二半導体層123を全体的に覆うように形成され、第二電極パッド8422は半導体ユニット871の一部第二半導体層123に形成される。第一電極パッド9412の下方にある半導体ユニットには電流が流れないため、発光しない。第二電極パッド8422が位置する半導体ユニット871上の第一電極841は、連結部843を介して半導体ユニット872の第二電極842と連結され、電流が流れると、第二電極パッド8422が位置する半導体ユニット871は発光する。同様に、光電素子90において、第二電極パッド9422は光電素子80中の第一電極パッド8412と組み合わせることができる。この場合、第一電極パッド8412は半導体ユニット811の一部第一半導体層121に位置され、第二電極パッド9422は半導体ユニット871の第二半導体層123を全体的に覆うように形成される。第一電極パッドが位置する半導体ユニット811上の第二電極842は、連結部843を介して半導体ユニット812の第一電極841と連結され、電流が流れると、第一電極パッド8422が位置する半導体ユニット811は発光する。しかし、第二電極パッド9422に流れる電流は半導体ユニット871の活性領域122を通らず、直接連結部843を介して半導体ユニット872に流れるため、第二電極パッド9422が位置する半導体ユニット871は発光しない。 Since the semiconductor unit below the first electrode pad 9412 and the second electrode pad 9422 does not emit light, the area of the first electrode pad 9412 is formed to be substantially the same as the area of the semiconductor unit 811, and the area of the second electrode pad 9422 is a semiconductor. It is formed in substantially the same area as the unit 871 and can improve the yield of the wire process. On the other hand, in the photoelectric element 90, the first electrode pad 9412 can be combined with the second electrode pad 8422 in the photoelectric element 80. In this case, the first electrode pad 9412 is formed so as to completely cover the second semiconductor layer 123 of the semiconductor unit 811, and the second electrode pad 8422 is formed on a part of the second semiconductor layer 123 of the semiconductor unit 871. Since no current flows through the semiconductor unit below the first electrode pad 9412, it does not emit light. The first electrode 841 on the semiconductor unit 871 in which the second electrode pad 8422 is located is connected to the second electrode 842 of the semiconductor unit 872 via the connecting portion 843, and when a current flows, the second electrode pad 8422 is located. The semiconductor unit 871 emits light. Similarly, in the photoelectric element 90, the second electrode pad 9422 can be combined with the first electrode pad 8412 in the photoelectric element 80. In this case, the first electrode pad 8412 is located in a part of the first semiconductor layer 121 of the semiconductor unit 811, and the second electrode pad 9422 is formed so as to totally cover the second semiconductor layer 123 of the semiconductor unit 871. The second electrode 842 on the semiconductor unit 811 in which the first electrode pad is located is connected to the first electrode 841 of the semiconductor unit 812 via the connecting portion 843, and when a current flows, the semiconductor in which the first electrode pad 8422 is located is located. The unit 811 emits light. However, since the current flowing through the second electrode pad 9422 does not pass through the active region 122 of the semiconductor unit 871 but flows directly to the semiconductor unit 872 via the connecting portion 843, the semiconductor unit 871 in which the second electrode pad 9422 is located does not emit light. ..

第一半導体層、活性層及び第二半導体層の材料は、Ga、Al、In、As、P、N及びSiから構成された群から選択された一つ又は複数の元素を含み、例えば、GaN、AlGaN、InGaN、AlGaInN、GaP、GaAs、GaAsP、GaNAs又はSiである。基板の材料は、サファイア、GaAs、GaP、SiC、ZnO、GaN、AlN、Cu又はSiを含む。 The material of the first semiconductor layer, the active layer and the second semiconductor layer contains one or more elements selected from the group composed of Ga, Al, In, As, P, N and Si, for example, GaN. , AlGaN, InGaN, AlGaInN, GaP, GaAs, GaAsP, GaN As or Si. Substrate materials include sapphire, GaAs, GaP, SiC, ZnO, GaN, AlN, Cu or Si.

上記に挙げられた各実施例は、本発明を説明するためのものであり、本発明の範囲を制限するものではない。本発明に対して行った各種変更と修飾は、依然として本発明の範囲に属する。 Each of the examples given above is for the purpose of explaining the present invention and does not limit the scope of the present invention. Various modifications and modifications made to the present invention still fall within the scope of the present invention.

10、20、30、40、50、60、70、80、90 光電素子
11、21、31、41、51、61、71、81 基板
141、241、341、441、541、641、741、841 第一電極
142、242、342、442、542、642、742、842 第二電極
143、243、343、443、543、643、743、843 連結部
121 第一半導体層
123 第二半導体層
122 活性領域
170 スロット
111、311 隔溝
1411、2411、3411、4411、5411、6411、7411、8411 第一延在部
1421、2421、3421、4421、5421、6421、7421、8421 第二延在部
1412、2412、3412、4412、5412、6412、7412、8412、9412 第一電極パット
1422、2422、3422、4422、5422、6422、7422、8422、9422 第二電極パット
105~109、205~209、305~309、405~407、505~507、605~607、705~707、801~807 行
151~155、161~165、171~174、181~185、191~195、251~255、261~264、271~275、281~284、291~295、351~355、361~364、371~375、381~384、391~395、451~455、461~466、471~475、551~554、561~563、571~574、651~652、661~664、671~672、751~752、761~762、769、771~772、811~812、871~872 半導体ユニット
1411a、2411a 第一曲線延在部
1421a、2421a 第二曲線延在部
1421b、2421b、3411b、4411a 直線延在部
1411c、1421c、2411c、3411c、4411c 二級延在部
3411a 曲線延在部
10, 20, 30, 40, 50, 60, 70, 80, 90 Photoelectric elements 11, 21, 31, 41, 51, 61, 71, 81 Substrate 141, 241, 341, 441, 541, 641, 741, 841 First electrode 142, 242, 342, 442, 542, 642, 742, 842 Second electrode 143, 243, 343, 443, 543, 643, 743, 843 Connecting part 121 First semiconductor layer 123 Second semiconductor layer 122 Active Area 170 Slot 111, 311 Diagonal groove 1411, 2411, 3411, 4411, 5411, 6411, 7411, 8411 First extension part 1421, 2421, 3421, 4421, 5421, 6421, 7421, 8421 Second extension part 1412, 2412, 3412, 4412, 5412, 6412, 7412, 8412, 9412 1st electrode pad 1422, 2422, 3422, 4422, 5422, 6422, 7422, 8422, 9422 2nd electrode pad 105-109, 205-209, 305- 309, 405 to 407, 505 to 507, 605 to 607, 705 to 707, 801 to 807 lines 151 to 155, 161 to 165, 171 to 174, 181 to 185, 191 to 195, 251 to 255, 261 to 264, 271 to 275, 281 to 284, 291 to 295, 351 to 355, 361 to 364, 371 to 375, 381 to 384, 391 to 395, 451 to 455, 461 to 466, 471 to 475, 551 to 554, 561 to 563, 571 to 574, 651 to 652, 661 to 664, 671 to 672, 751 to 752, 761 to 762, 769, 771 to 772, 811 to 812, 871 to 872 Semiconductor units 1411a, 2411a First curve extension 1421a, 2421a Second curve extension part 1421b, 2421b, 3411b, 4411a Straight extension part 1411c, 1421c, 2411c, 3411c, 4411c Secondary curve extension part 3411a Curve extension part

Claims (10)

光電素子であって、
基板;
前記基板に配置される複数の半導体ユニットであって、
前記複数の半導体ユニットが、第一行に位置する第一半導体ユニット及び第二半導体ユニット、並びに、第二行に位置する第三半導体ユニット及び第四半導体ユニットを含み、
前記複数の半導体ユニットの各々が、第一半導体層及び第二半導体層を含み、前記第一半導体層が、前記第一半導体層の周囲を構成する複数の辺を含み、前記複数の辺のうちの隣接する2つが、コーナーを構成する、複数の半導体ユニット;
前記複数の半導体ユニットのうちの隣接する2つの間に位置し、前記基板の表面を露出させる隔溝;
前記複数の半導体ユニットの各々に位置し、前記第一半導体層の第一表面を露出させるスロットであって、
前記スロットが、前記第一半導体ユニットの前記第一半導体層の前記コーナー以外の領域に位置する第一スロット、及び、前記第二半導体ユニットの前記第一半導体層の前記コーナーに位置する第二スロットを含む、スロット;
前記複数の半導体ユニットの各々の前記スロットに位置する第一電極であって、
前記第一電極が、前記第一半導体ユニットの前記第一スロット内に位置する第一の第一延在電極、及び、前記第二半導体ユニットの前記第二スロット内に位置する第二の第一延在電極を含む、第一電極;
前記複数の半導体ユニットの各々の前記第二半導体層に位置する複数の第二延在電極を含む第二電極;
前記第一半導体ユニット及び前記第二半導体ユニット間の前記隔溝に位置し、前記第一スロット内の前記第一の第一延在電極に連結される第一連結部;及び
前記第二半導体ユニット及び前記第三半導体ユニット間の前記隔溝に位置し、前記第二スロット内の前記第二の第一延在電極に連結される第二連結部を含み、
前記第一連結部は、前記第一半導体ユニットの前記第一半導体層から第一方向に沿って前記第二半導体ユニットの前記第二半導体層に延在し、前記第二連結部は、前記第二半導体ユニットの前記第一半導体層から第二方向に沿って前記第三半導体ユニットの前記第二半導体層に延在し、前記第二方向は、前記第一方向に平行でなく、
前記光電素子の上面図において、前記第一の第一延在電極は、前記第一連結部と直接接触し、且つ前記第一方向に沿って延在し、
前記光電素子の前記上面図において、前記第二の第一延在電極は、前記第二連結部と直接接触し、前記第二の第一延在電極は、前記第一方向に平行な第一部分、及び、前記第一方向に平行でない第二部分を含み、前記第二部分は、前記第一部分と前記第二連結部との間に位置し、
前記光電素子の前記上面図において、前記第一連結部及び前記第二連結部は、曲がった部分を含まず、前記第一連結部は、前記第一スロット内に位置する第一表面積を有し、前記第二連結部は、前記第二スロット内に位置する第二表面積を有し、前記第一表面積は、前記第二表面積よりも小さい、光電素子。
It is a photoelectric element
substrate;
A plurality of semiconductor units arranged on the substrate.
The plurality of semiconductor units include a first semiconductor unit and a second semiconductor unit located in the first row, and a third semiconductor unit and a fourth semiconductor unit located in the second row.
Each of the plurality of semiconductor units includes a first semiconductor layer and a second semiconductor layer, and the first semiconductor layer includes a plurality of sides constituting the periphery of the first semiconductor layer, and among the plurality of sides. Two adjacent semiconductor units that make up a corner;
A groove that is located between two adjacent semiconductor units and exposes the surface of the substrate;
A slot located in each of the plurality of semiconductor units and exposing the first surface of the first semiconductor layer.
The slot is a first slot located in a region other than the corner of the first semiconductor layer of the first semiconductor unit, and a second slot located in the corner of the first semiconductor layer of the second semiconductor unit. Including, slot;
A first electrode located in the slot of each of the plurality of semiconductor units.
The first electrode is a first extending electrode located in the first slot of the first semiconductor unit, and a second first electrode located in the second slot of the second semiconductor unit. First electrode, including extending electrode;
A second electrode including a plurality of second extending electrodes located in the second semiconductor layer of each of the plurality of semiconductor units;
A first connecting portion located in the gap between the first semiconductor unit and the second semiconductor unit and connected to the first extending electrode in the first slot; and the second semiconductor unit. And a second connecting portion located in the gap between the third semiconductor units and connected to the second extending electrode in the second slot.
The first connecting portion extends from the first semiconductor layer of the first semiconductor unit to the second semiconductor layer of the second semiconductor unit along the first direction, and the second connecting portion extends from the first semiconductor layer to the second semiconductor layer of the second semiconductor unit. (Ii) It extends from the first semiconductor layer of the semiconductor unit to the second semiconductor layer of the third semiconductor unit along the second direction, and the second direction is not parallel to the first direction.
In the top view of the photoelectric element, the first extending electrode is in direct contact with the first connecting portion and extends along the first direction.
In the top view of the photoelectric element, the second extending electrode is in direct contact with the second connecting portion, and the second extending electrode is a first portion parallel to the first direction. , And a second portion that is not parallel to the first direction, the second portion being located between the first portion and the second connecting portion.
In the top view of the photoelectric element, the first connecting portion and the second connecting portion do not include a bent portion, and the first connecting portion has a first surface area located in the first slot. , The second connecting portion has a second surface area located in the second slot, the first surface area being smaller than the second surface area, a photoelectric element.
光電素子であって、
基板;
前記基板に配置される複数の半導体ユニットであって、
前記複数の半導体ユニットが、第一行に位置する第一半導体ユニット及び第二半導体ユニット、並びに、第二行に第三半導体ユニット及び第四半導体ユニットを含み、
前記複数の半導体ユニットの各々が、第一半導体層及び第二半導体層を含み、前記第一半導体層が、前記第一半導体層の周囲を構成する複数の辺を含み、前記複数の辺のうちの隣接する2つが、コーナーを構成する、複数の半導体ユニット;
前記複数の半導体ユニットのうちの隣接する2つの間に位置し、前記基板の表面を露出させる隔溝;
前記複数の半導体ユニットの各々に位置し、前記第一半導体層の第一表面を露出させるスロットであって、
前記スロットが、前記第一半導体ユニットの前記第一半導体層の前記コーナー以外の領域に位置する第一スロット、及び、前記第二半導体ユニットの前記第一半導体層の前記コーナーに位置する第二スロットを含む、スロット;
前記複数の半導体ユニットの各々の前記第一半導体層に位置する第一電極であって、
前記第一電極が、前記第一半導体ユニットの前記第一スロット内の前記第一半導体層に位置する第一の第一延在電極、及び、前記第二半導体ユニットの前記第二スロット内の前記第一半導体層に位置する第二の第一延在電極を含む、第一電極;
前記複数の半導体ユニットの各々の前記第二半導体層に位置する第二電極であって、
前記第二電極が、前記第一半導体ユニットの前記第二半導体層に位置する第一の第二延在電極、前記第二半導体ユニットの前記第二半導体層に位置する第二の第二延在電極、及び、前記第三半導体ユニットの前記第二半導体層に位置する第三の第二延在電極を含む、第二電極;
前記第一半導体ユニット及び前記第二半導体ユニット間の前記隔溝に位置し、前記第一スロット内の前記第一の第一延在電極に連結される第一連結部;及び
前記第二半導体ユニット及び前記第三半導体ユニット間の前記隔溝に位置し、前記第二スロット内の前記第二の第一延在電極に連結される第二連結部を含み、
前記第一連結部は、前記第一半導体ユニットの前記第一半導体層から第一方向に沿って前記第二半導体ユニットの前記第二半導体層に延在し、前記第二連結部は、前記第二半導体ユニットの前記第一半導体層から第二方向に沿って前記第三半導体ユニットの前記第二半導体層に延在し、前記第二方向は、前記第一方向に平行でなく、
前記光電素子の上面図において、前記第一連結部は、前記第一の第一延在電極の幅よりも大きく且つ前記第二の第二延在電極の幅よりも大きい幅を有し、前記第二連結部は、前記第二の第一延在電極の幅よりも大きく且つ前記第三の第二延在電極の幅よりも大きい幅を有し、
前記光電素子の前記上面図において、前記第二の第一延在電極及び前記第三の第二延在電極がそれぞれ前記第二連結部と直接接触する部分は、前記第二連結部の対角線にのみ位置する、光電素子。
It is a photoelectric element
substrate;
A plurality of semiconductor units arranged on the substrate.
The plurality of semiconductor units include a first semiconductor unit and a second semiconductor unit located in the first row, and a third semiconductor unit and a fourth semiconductor unit in the second row.
Each of the plurality of semiconductor units includes a first semiconductor layer and a second semiconductor layer, and the first semiconductor layer includes a plurality of sides constituting the periphery of the first semiconductor layer, and among the plurality of sides. Two adjacent semiconductor units that make up a corner;
A groove that is located between two adjacent semiconductor units and exposes the surface of the substrate;
A slot located in each of the plurality of semiconductor units and exposing the first surface of the first semiconductor layer.
The slot is a first slot located in a region other than the corner of the first semiconductor layer of the first semiconductor unit, and a second slot located in the corner of the first semiconductor layer of the second semiconductor unit. Including, slot;
A first electrode located in the first semiconductor layer of each of the plurality of semiconductor units.
The first electrode is a first extending electrode located in the first semiconductor layer in the first slot of the first semiconductor unit, and the second electrode in the second slot of the second semiconductor unit. A first electrode, including a second first extending electrode located in the first semiconductor layer;
A second electrode located in the second semiconductor layer of each of the plurality of semiconductor units.
The second electrode is a first second extending electrode located in the second semiconductor layer of the first semiconductor unit, and a second second extending electrode located in the second semiconductor layer of the second semiconductor unit. A second electrode comprising an electrode and a third second extending electrode located in the second semiconductor layer of the third semiconductor unit;
A first connecting portion located in the gap between the first semiconductor unit and the second semiconductor unit and connected to the first extending electrode in the first slot; and the second semiconductor unit. And a second connecting portion located in the gap between the third semiconductor units and connected to the second extending electrode in the second slot.
The first connecting portion extends from the first semiconductor layer of the first semiconductor unit to the second semiconductor layer of the second semiconductor unit along the first direction, and the second connecting portion extends from the first semiconductor layer to the second semiconductor layer of the second semiconductor unit. (Ii) It extends from the first semiconductor layer of the semiconductor unit to the second semiconductor layer of the third semiconductor unit along the second direction, and the second direction is not parallel to the first direction.
In the top view of the photoelectric element, the first connecting portion has a width larger than the width of the first first extending electrode and larger than the width of the second extending electrode, and the width thereof is larger than the width of the second extending electrode. The second connecting portion has a width larger than the width of the second extending electrode and larger than the width of the third extending electrode.
In the top view of the photoelectric element, the portions where the second extending electrode and the third extending electrode are in direct contact with the second connecting portion are diagonally aligned with the second connecting portion. A photoelectric element located only.
光電素子であって、
基板;
前記基板に配置される複数の半導体ユニットであって、
前記複数の半導体ユニットが、第一行に位置する第一半導体ユニット及び第二半導体ユニット、並びに、第二行に位置する第三半導体ユニット及び第四半導体ユニットを含み、
前記複数の半導体ユニットの各々が、第一半導体層及び第二半導体層を含み、前記第一半導体層が、前記第一半導体層の周囲を構成する複数の辺を含み、前記複数の辺のうちの隣接する2つが、コーナーを構成する、複数の半導体ユニット;
前記複数の半導体ユニットのうちの隣接する2つの間に位置し、前記基板の表面を露出させる隔溝;
前記第一半導体ユニットに位置し、前記第一半導体ユニットの前記第一半導体層を露出させる第一スロットであって、
前記第一スロットが、前記第一半導体ユニットの前記コーナー以外の領域に位置する、第一スロット;
前記第二半導体ユニットに位置し、前記第二半導体ユニットの前記第一半導体層を露出させる第二スロットであって、
前記第二スロットが、前記第二半導体ユニットの前記コーナーを含む、第二スロット;
前記第一半導体ユニットの前記第一スロットに位置する第一の第一延在電極、及び、前記第二半導体ユニットの前記第二スロットに位置する第二の第一延在電極を含む第一電極;
前記第一半導体ユニットの前記第二半導体層に位置する第一の複数の第二延在電極、及び、前記第二半導体ユニットの前記第二半導体層に位置する第二の複数の第二延在電極を含む第二電極であって、
前記第一の複数の第二延在電極が、対称パターンで前記第一の第一延在電極の両側に位置し、前記第二の複数の第二延在電極が、非対称パターンで前記第二の第一延在電極の両側に位置する、第二電極;
前記第一半導体ユニット及び前記第二半導体ユニット間の前記隔溝に位置する第一連結部;及び
前記第二半導体ユニット及び前記第三半導体ユニット間の前記隔溝に位置する第二連結部であって、
前記第一連結部が、前記第一スロット内に位置する第一表面積を有し、前記第二連結部が、前記第二スロット内に位置する第二表面積を有し、前記第一表面積が前記第二表面積よりも小さい、第二連結部、を含む、光電素子。
It is a photoelectric element
substrate;
A plurality of semiconductor units arranged on the substrate.
The plurality of semiconductor units include a first semiconductor unit and a second semiconductor unit located in the first row, and a third semiconductor unit and a fourth semiconductor unit located in the second row.
Each of the plurality of semiconductor units includes a first semiconductor layer and a second semiconductor layer, and the first semiconductor layer includes a plurality of sides constituting the periphery of the first semiconductor layer, and among the plurality of sides. Two adjacent semiconductor units that make up a corner;
A groove that is located between two adjacent semiconductor units and exposes the surface of the substrate;
A first slot located in the first semiconductor unit and exposing the first semiconductor layer of the first semiconductor unit.
The first slot is located in a region other than the corner of the first semiconductor unit;
A second slot located in the second semiconductor unit and exposing the first semiconductor layer of the second semiconductor unit.
The second slot comprises the corner of the second semiconductor unit;
A first electrode including a first extending electrode located in the first slot of the first semiconductor unit and a second first extending electrode located in the second slot of the second semiconductor unit. ;
A first plurality of second extending electrodes located in the second semiconductor layer of the first semiconductor unit, and a second plurality of second extending electrodes located in the second semiconductor layer of the second semiconductor unit. A second electrode that includes an electrode
The first plurality of second extending electrodes are located on both sides of the first first extending electrode in a symmetric pattern, and the second plurality of second extending electrodes are arranged in an asymmetric pattern. Second electrodes located on both sides of the first extending electrode of
A first connecting portion located in the gap between the first semiconductor unit and the second semiconductor unit; and a second connecting portion located in the gap between the second semiconductor unit and the third semiconductor unit. hand,
The first connecting portion has a first surface area located in the first slot, the second connecting portion has a second surface area located in the second slot, and the first surface area is said. A photoelectric element containing a second connecting portion, which is smaller than the second surface area.
請求項1に記載の光電素子であって、
前記第部分が、前記第部分の長さよりも大きい長さを有する、光電素子。
The photoelectric element according to claim 1.
A photoelectric device in which the second portion has a length larger than the length of the first portion.
請求項1に記載の光電素子であって、
前記第一半導体ユニット及び前記第二半導体ユニットが同じ面積を有し、前記第三半導体ユニット及び前記第四半導体ユニットが同じ面積を有する、光電素子。
The photoelectric element according to claim 1.
A photoelectric element in which the first semiconductor unit and the second semiconductor unit have the same area, and the third semiconductor unit and the fourth semiconductor unit have the same area.
請求項1に記載の光電素子であって、
前記第一半導体ユニットに位置する前記複数の第二延在電極が、前記第一半導体ユニットの前記第一の第一延在電極の両側に位置する、光電素子。
The photoelectric element according to claim 1.
A photoelectric element in which the plurality of second extending electrodes located in the first semiconductor unit are located on both sides of the first extending electrode of the first semiconductor unit.
請求項2に記載の光電素子であって、
前記光電素子の前記上面図において、前記第一の第一延在電極及び前記第二の第二延在電極がそれぞれ前記第一連結部と直接接触する部分は、前記第一連結部の相対する辺に位置する、光電素子。
The photoelectric element according to claim 2.
In the top view of the photoelectric element, the portions where the first extending electrode and the second extending electrode are in direct contact with the first connecting portion face each other of the first connecting portion. A photoelectric element located on the side.
請求項2に記載の光電素子であって、
前記スロットが、前記隔溝の最小幅よりも大きい最小幅を有する、光電素子。
The photoelectric element according to claim 2.
A photoelectric element in which the slot has a minimum width larger than the minimum width of the groove.
請求項3に記載の光電素子であって、
前記第一スロット又は前記第二スロットが、前記隔溝の最小幅よりも大きい最小幅を有する、光電素子。
The photoelectric element according to claim 3, wherein the photoelectric element is used.
A photoelectric element in which the first slot or the second slot has a minimum width larger than the minimum width of the partition groove.
請求項3に記載の光電素子であって、
前記第一半導体ユニット及び前記第二半導体ユニットが同じ形状を有し、前記第三半導体ユニット及び前記第四半導体ユニットが同じ形状を有する、光電素子。
The photoelectric element according to claim 3, wherein the photoelectric element is used.
A photoelectric element in which the first semiconductor unit and the second semiconductor unit have the same shape, and the third semiconductor unit and the fourth semiconductor unit have the same shape.
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