JP6884495B2 - イオン源強化のSi含有量及び結晶寸法が勾配変化するAlCrSiNコーティング - Google Patents
イオン源強化のSi含有量及び結晶寸法が勾配変化するAlCrSiNコーティング Download PDFInfo
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- 239000011248 coating agent Substances 0.000 title claims description 100
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- 239000010410 layer Substances 0.000 description 45
- 238000005530 etching Methods 0.000 description 17
- 239000007789 gas Substances 0.000 description 17
- 239000002131 composite material Substances 0.000 description 16
- 150000002500 ions Chemical class 0.000 description 16
- 238000010586 diagram Methods 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 14
- 239000000758 substrate Substances 0.000 description 14
- 229910000997 High-speed steel Inorganic materials 0.000 description 10
- 229910052786 argon Inorganic materials 0.000 description 10
- 238000000992 sputter etching Methods 0.000 description 8
- 229910017150 AlTi Inorganic materials 0.000 description 7
- 238000007373 indentation Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 230000001052 transient effect Effects 0.000 description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- 229910052774 Proactinium Inorganic materials 0.000 description 5
- 238000005728 strengthening Methods 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- 239000013077 target material Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- SSJWWCKNRIUXON-UHFFFAOYSA-N 2-(2,6-dimethoxyphenyl)-5-hydroxy-7,8-dimethoxychromen-4-one Chemical compound COC1=CC=CC(OC)=C1C1=CC(=O)C2=C(O)C=C(OC)C(OC)=C2O1 SSJWWCKNRIUXON-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
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- 230000004048 modification Effects 0.000 description 3
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- 229910010037 TiAlN Inorganic materials 0.000 description 2
- 230000009471 action Effects 0.000 description 2
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- 238000005137 deposition process Methods 0.000 description 2
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- 238000003754 machining Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000002114 nanocomposite Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910008482 TiSiN Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- QRXWMOHMRWLFEY-UHFFFAOYSA-N isoniazide Chemical compound NNC(=O)C1=CC=NC=C1 QRXWMOHMRWLFEY-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
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- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
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Description
マルチアークイオンプレーティングの真空炉を2.0×10−4Paに真空排気し、次にArガスを入れて圧力を4.0Paに調節して450℃に加熱し、洗浄Tiターゲットを起動し、次に陽極ターゲットを起動して、洗浄Tiターゲットとともに正負極を構成することで電子が運動するように牽引し、電子がArガスと衝突してAr+を発生させ、負バイアスを−200Vに制御し、Ar+が基材の表面にイオン衝撃を与えるように引きつけ、衝撃時間を45分とするというエッチング洗浄を行う。
真空炉をバックグラウンド真空1×10−4〜2×10−4Paに真空排気し、480℃に温度上昇するステップ(1)と、
Arガスを入れて、炉内真空度を4.0Paに制御し、ベースの負バイアスを−200Vに低下し、Tiターゲットを起動し、ターゲット電流を80Aに制御し、ベースの負バイアスが−200Vである条件下で高エネルギーイオン衝撃の基材の表面に対するエッチング洗浄を完了し、洗浄時間を45分とするステップ(2)と、
Tiターゲットを停止し、N2ガスを入れて、基材の負バイアスを−60Vに制御し、炉内真空度を3.5Paに調節し、真空度を3.5Paに維持する定圧方式でN2ガスを入れて、2組のAlCrターゲットを利用して2組のAlCrターゲットの電流を120Aに調節し、時間を77分とするステップ(3)と、
2組のAlCrターゲットが設定パラメータで継続作業し、AlCrSiターゲットのターゲット電流を120Aに調節し、基材の負バイアスが依然として−60Vである条件下で、時間を58分とするステップ(4)と、
1組のAlCrターゲットを停止し、残りのAlCrターゲットとAlCrSiターゲットとが設定パラメータで継続作業し、時間を88分とするステップ(5)と、
AlCrターゲットを停止し、AlCrSiターゲットが設定パラメータで継続作業し、時間を120分とするステップ(6)と、を含む。
図1に示すように、本実施例の真空炉の火室1内に1枚の高エネルギーイオン洗浄のための柱状Tiターゲット2及びコーティング堆積のための6枚のターゲット3が配置される。炉内が高真空度に達すると、柱状Tiターゲット2を起動し、大量のTiイオンをイオン化すると同時に、アルゴンガスを入れて、Ar+を励起させてベースをエッチング洗浄する。図中、4はワークである。
炉内真空度が2.0×10−4Paに達すると、99.999%純度のArガスを入れて450℃に加熱する。円筒状Tiターゲットを牽引アークターゲットとして起動し、洗浄時の電流を40Aに制御し、大量の電子を励起発生させる。円形補助陽極ターゲットを起動し、Tiターゲットとともに正負極を構成することで電子が運動するように牽引する。電子が炉内のArガスと衝突して高密度のAr+を発生させる。基材の負バイアスを−200Vとし、Ar+が基材の表面にイオン衝撃を与えるように引きつける。衝撃時間は45分とする。
AlCrターゲットを停止し、AlCrSiターゲット材電流を130Aに調節し、基材の負バイアスが依然として−60Vである条件下で、時間を122分とし、AlCrSiターゲットを停止し、バイアス電源を切って、N2フローバルブを閉じて、コーティング工程を完了し、カッターが25℃に炉中冷却してから取り出される。
本実施例の高エネルギーAr+イオンエッチング過程においてTiカラムアーク洗浄電流を70Aに制御し、イオンエッチング洗浄後の基材及び製造後のコーティングを検出する。
本実施例の高エネルギーAr+イオンエッチング過程においてTiカラムアーク洗浄電流を100Aに制御し、イオンエッチング洗浄後の基材及び製造後のコーティングを検出する。
上記各実施例のコーティングの詳細な洗浄及び堆積工程パラメータは表1に示される。
本実施例のAlCrSiN複合カッターコーティングの製造方法は、具体的に、以下のとおりである。
炉内真空度が2.0×10−4Paに達すると、99.999%純度のArガスを入れて450℃に加熱する。円筒状Tiターゲットを牽引アークターゲットとして起動し、洗浄時の電流を100Aに制御し、大量の電子を励起発生させる。円形補助陽極ターゲットを起動し、Tiターゲットとともに正負極を構成することで電子が運動するように牽引する。電子が炉内のArガスと衝突して高密度のAr+を発生させる。基材の負バイアスを−200Vとし、Ar+が基材の表面にイオン衝撃を与えるように引きつけ、衝撃時間を45分とする。
1組のAlCrターゲットを停止し、残りのAlCrターゲットとAlCrSiターゲットとが設定パラメータで継続作業し、時間を88分とし、
AlCrターゲットを停止し、AlCrSiターゲットが設定パラメータで継続作業し、時間を120分とし、AlCrSiターゲットを停止し、バイアス電源を切って、N2フローバルブを閉じて、コーティング工程を完了し、カッターが25℃に炉中冷却してから取り出される。
本実施例のAlCrSiN複合カッターコーティングにおけるCrをTiで全体的に代替してAlTiSiNコーティングを製造する製造方法は、具体的に、以下のとおりである。
炉内真空度が2.0×10−4Paに達すると、99.999%純度のArガスを入れて450℃に加熱する。円筒状Tiターゲットを牽引アークターゲットとして起動し、洗浄時の電流を100Aに制御し、大量の電子を励起発生させる。円形補助陽極ターゲットを起動し、Tiターゲットとともに正負極を構成することで電子が運動するように牽引する。電子が炉内のArガスと衝突して高密度のAr+を発生させる。基材の負バイアスを−200Vとし、Ar+が基材の表面にイオン衝撃を与えるように引きつけ、衝撃時間を45分とする。
2組のAlTiターゲットが設定パラメータで継続作業し、AlTiSiターゲット(Al:Ti:Si=60:30:10)電流を120Aに調節し、基材の負バイアスが依然として−60Vである条件下で、時間を55分とし、
1組のAlTiターゲットを停止し、残りのAlTiターゲットとAlTiSiターゲットとが設定パラメータで継続作業し、時間を85分とし、
本実施例のAlCrSiN複合カッターコーティングにおけるCrをTiで部分的に代替してAlCrTiSiNコーティングを製造する製造方法は、具体的に、以下のとおりである。
炉内真空度が2.0×10−4Paに達すると、99.999%純度のArガスを入れて450℃に加熱する。円筒状Tiターゲットを牽引アークターゲットとして起動し、洗浄時の電流を100Aに制御し、大量の電子を励起発生させる。円形補助陽極ターゲットを起動し、Tiターゲットとともに正負極を構成することで電子が運動するように牽引する。電子が炉内のArガスと衝突して高密度のAr+を発生させる。基材の負バイアスを−200Vとし、Ar+が基材の表面にイオン衝撃を与えるように引きつけ、衝撃時間を45分とする。
2組のAlCrターゲットが設定パラメータで継続作業し、AlTiSiターゲット(Al:Ti:Si=60:30:10)電流を120Aに調節し、基材の負バイアスが依然として−60Vである条件下で、時間を55分とし、
1組のAlCrターゲットを停止し、残りのAlTiターゲットとAlTiSiターゲットとが設定パラメータで継続作業し、時間を200分とし、
AlTiターゲット材、AlTiSiターゲットを停止し、バイアス電源を切って、N2フローバルブを閉じて、コーティング工程を完了し、カッターが25℃に炉中冷却してから取り出される。
Claims (3)
- Si含有量及び結晶寸法が勾配変化するAlCrSiNコーティングであって、
前記コーティングが表面から基材まで順にAlCrSiN作業層、中間層、AlCrNプライマ層であり、AlCrNプライマ層からAlCrSiN作業層まで、前記中間層内において、Si含有量が1wt.%から徐々に5wt.%に増加し、前記中間層の組織構造が粗大柱状結晶から微細等軸結晶に変化することを含み、組織構造が順に粗大柱状結晶、微細柱状結晶、微細等軸結晶であり、結晶寸法が60nmから徐々に20nmに減少し、
前記AlCrSiNコーティングは常温下で摩擦係数が0.36〜0.40であることを特徴とするSi含有量及び結晶寸法が勾配変化するAlCrSiNコーティング。 - 前記AlCrSiNコーティングの顕微硬度が3800HKより大きいことを特徴とする請求項1に記載のSi含有量及び結晶寸法が勾配変化するAlCrSiNコーティング。
- 請求項1に記載のコーティングを切削工具に使用する方法。
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