JP6870554B2 - 製品洗浄装置及び洗浄方法 - Google Patents
製品洗浄装置及び洗浄方法 Download PDFInfo
- Publication number
- JP6870554B2 JP6870554B2 JP2017188396A JP2017188396A JP6870554B2 JP 6870554 B2 JP6870554 B2 JP 6870554B2 JP 2017188396 A JP2017188396 A JP 2017188396A JP 2017188396 A JP2017188396 A JP 2017188396A JP 6870554 B2 JP6870554 B2 JP 6870554B2
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- JP
- Japan
- Prior art keywords
- ultrapure water
- metal contamination
- ion exchange
- metal
- supply line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004140 cleaning Methods 0.000 title claims description 36
- 238000000034 method Methods 0.000 title claims description 8
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 104
- 239000012498 ultrapure water Substances 0.000 claims description 104
- 229910052751 metal Inorganic materials 0.000 claims description 77
- 239000002184 metal Substances 0.000 claims description 77
- 238000011109 contamination Methods 0.000 claims description 51
- 239000003112 inhibitor Substances 0.000 claims description 48
- 238000005342 ion exchange Methods 0.000 claims description 35
- 229920000642 polymer Polymers 0.000 claims description 26
- 239000000126 substance Substances 0.000 claims description 26
- 239000012528 membrane Substances 0.000 claims description 23
- 238000002347 injection Methods 0.000 claims description 18
- 239000007924 injection Substances 0.000 claims description 18
- 238000000926 separation method Methods 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 claims description 11
- 229940005642 polystyrene sulfonic acid Drugs 0.000 claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 239000011148 porous material Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 32
- 235000012431 wafers Nutrition 0.000 description 11
- 150000002739 metals Chemical class 0.000 description 9
- 238000005406 washing Methods 0.000 description 8
- 238000011071 total organic carbon measurement Methods 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 125000000542 sulfonic acid group Chemical group 0.000 description 4
- 238000000108 ultra-filtration Methods 0.000 description 4
- 230000003749 cleanliness Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 125000001453 quaternary ammonium group Chemical group 0.000 description 3
- 238000007872 degassing Methods 0.000 description 2
- 238000009296 electrodeionization Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 230000001172 regenerating effect Effects 0.000 description 2
- 238000001223 reverse osmosis Methods 0.000 description 2
- 229910021654 trace metal Inorganic materials 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Treatment Of Water By Ion Exchange (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
2 サブシステム
3 超純水供給ライン
7 リターンライン
Claims (5)
- 超純水製造装置からの超純水をユースポイントまで送る超純水供給ラインと、
ユースポイントで未使用の超純水を超純水製造装置又は超純水供給ラインに返送するリターンラインと、
該超純水供給ラインに、イオン交換基を有するポリマーを含有する金属汚染防止剤を添加する薬注装置と
を有する製品洗浄装置であって、
前記超純水供給ラインの超純水流量が一定であり、
前記薬注装置は金属汚染防止剤を超純水に定量添加するものであり、
前記薬注装置とユースポイントとの間の超純水供給ラインに、MF膜装置が設置されており、
該MF膜装置のMF膜の孔径が10nm以上である製品洗浄装置。 - 請求項1において、前記リターンラインに設けられた、金属汚染防止剤除去用の膜分離装置を有することを特徴とする製品洗浄装置。
- 請求項1又は2において、前記金属汚染防止剤がポリスチレンスルホン酸であることを特徴とする製品洗浄装置。
- 請求項1〜3のいずれかにおいて、前記薬注装置は、前記ポリマーを、前記ポリマーと超純水中の金属とのイオン交換反応当量比の1〜20倍となるように添加することを特徴とする製品洗浄装置。
- 請求項1〜4のいずれか1項の製品洗浄装置によって製品を洗浄する製品洗浄方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017188396A JP6870554B2 (ja) | 2017-09-28 | 2017-09-28 | 製品洗浄装置及び洗浄方法 |
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JP2017188396A JP6870554B2 (ja) | 2017-09-28 | 2017-09-28 | 製品洗浄装置及び洗浄方法 |
Publications (2)
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JP2019067799A JP2019067799A (ja) | 2019-04-25 |
JP6870554B2 true JP6870554B2 (ja) | 2021-05-12 |
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JP2017188396A Active JP6870554B2 (ja) | 2017-09-28 | 2017-09-28 | 製品洗浄装置及び洗浄方法 |
Country Status (1)
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JP (1) | JP6870554B2 (ja) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5499433B2 (ja) * | 2007-11-06 | 2014-05-21 | 栗田工業株式会社 | 超純水製造方法及び装置並びに電子部品部材類の洗浄方法及び装置 |
JP5251184B2 (ja) * | 2008-03-14 | 2013-07-31 | 栗田工業株式会社 | ガス溶解水供給システム |
JP5515588B2 (ja) * | 2009-10-05 | 2014-06-11 | 栗田工業株式会社 | ウエハ用洗浄水及びウエハの洗浄方法 |
JP6256443B2 (ja) * | 2015-09-30 | 2018-01-10 | 栗田工業株式会社 | 製品洗浄方法 |
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- 2017-09-28 JP JP2017188396A patent/JP6870554B2/ja active Active
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