JP6870348B2 - カバーガラス及びガラス積層体 - Google Patents

カバーガラス及びガラス積層体 Download PDF

Info

Publication number: JP6870348B2
Authority: JP; Japan
Prior art keywords: film; refractive index; glass; index material; thickness
Prior art date: 2016-02-04
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

JP2017015705A

Other languages

English (en)

Japanese (ja)

Other versions

JP2017137235A (ja

Inventor

和伸前重

信孝青峰

博之大川

小野田　仁

仁小野田

佐野　真

真佐野

裕介小林

玉井　喜芳

喜芳玉井

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

AGC Inc

Original Assignee

Asahi Glass Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2016-02-04

Filing date

2017-01-31

Publication date

2021-05-12

2017-01-31 Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd

2017-08-10 Publication of JP2017137235A publication Critical patent/JP2017137235A/ja

2021-05-12 Application granted granted Critical

2021-05-12 Publication of JP6870348B2 publication Critical patent/JP6870348B2/ja

Status Active legal-status Critical Current

2037-01-31 Anticipated expiration legal-status Critical

Links

239000006059 cover glass Substances 0.000 title claims description 106
239000005340 laminated glass Substances 0.000 title claims description 39
239000011521 glass Substances 0.000 claims description 150
239000000463 material Substances 0.000 claims description 102
239000010410 layer Substances 0.000 claims description 90
238000004544 sputter deposition Methods 0.000 claims description 38
239000005345 chemically strengthened glass Substances 0.000 claims description 29
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 17
230000003373 anti-fouling effect Effects 0.000 claims description 17
229910052814 silicon oxide Inorganic materials 0.000 claims description 17
229910052581 Si3N4 Inorganic materials 0.000 claims description 16
HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 16
238000010030 laminating Methods 0.000 claims description 8
239000002344 surface layer Substances 0.000 claims description 7
239000010408 film Substances 0.000 description 450
238000005452 bending Methods 0.000 description 64
238000000034 method Methods 0.000 description 47
230000015572 biosynthetic process Effects 0.000 description 37
239000007789 gas Substances 0.000 description 30
238000006243 chemical reaction Methods 0.000 description 23
235000002639 sodium chloride Nutrition 0.000 description 23
239000000758 substrate Substances 0.000 description 23
238000011156 evaluation Methods 0.000 description 22
150000003839 salts Chemical group 0.000 description 22
229910004298 SiO 2 Inorganic materials 0.000 description 21
229910052710 silicon Inorganic materials 0.000 description 19
239000011734 sodium Substances 0.000 description 19
239000012528 membrane Substances 0.000 description 17
229910018072 Al 2 O 3 Inorganic materials 0.000 description 16
239000002253 acid Substances 0.000 description 16
238000003426 chemical strengthening reaction Methods 0.000 description 15
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 14
FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical group [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 14
239000010703 silicon Substances 0.000 description 14
239000000203 mixture Substances 0.000 description 13
239000003513 alkali Substances 0.000 description 12
230000008859 change Effects 0.000 description 12
238000005342 ion exchange Methods 0.000 description 12
229910052708 sodium Inorganic materials 0.000 description 11
150000004767 nitrides Chemical class 0.000 description 10
239000010409 thin film Substances 0.000 description 10
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
238000004140 cleaning Methods 0.000 description 9
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 8
238000010306 acid treatment Methods 0.000 description 8
229910052731 fluorine Inorganic materials 0.000 description 8
239000011737 fluorine Substances 0.000 description 8
239000002585 base Substances 0.000 description 7
230000003287 optical effect Effects 0.000 description 7
230000000694 effects Effects 0.000 description 6
230000004907 flux Effects 0.000 description 6
229910017053 inorganic salt Inorganic materials 0.000 description 6
238000005259 measurement Methods 0.000 description 6
238000002844 melting Methods 0.000 description 6
230000008018 melting Effects 0.000 description 6
150000002894 organic compounds Chemical class 0.000 description 6
230000003647 oxidation Effects 0.000 description 6
238000007254 oxidation reaction Methods 0.000 description 6
BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Substances [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 6
239000004323 potassium nitrate Chemical group 0.000 description 6
235000010333 potassium nitrate Nutrition 0.000 description 6
229910001415 sodium ion Inorganic materials 0.000 description 6
239000000243 solution Substances 0.000 description 6
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 5
229910052782 aluminium Inorganic materials 0.000 description 5
230000000052 comparative effect Effects 0.000 description 5
150000002500 ions Chemical class 0.000 description 5
238000004519 manufacturing process Methods 0.000 description 5
229910052760 oxygen Inorganic materials 0.000 description 5
239000005341 toughened glass Substances 0.000 description 5
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
239000003921 oil Substances 0.000 description 4
230000008569 process Effects 0.000 description 4
238000005546 reactive sputtering Methods 0.000 description 4
229910052726 zirconium Inorganic materials 0.000 description 4
QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
238000000560 X-ray reflectometry Methods 0.000 description 3
KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
238000000576 coating method Methods 0.000 description 3
229910001416 lithium ion Inorganic materials 0.000 description 3
238000000465 moulding Methods 0.000 description 3
229910017604 nitric acid Inorganic materials 0.000 description 3
229910000027 potassium carbonate Inorganic materials 0.000 description 3
238000012545 processing Methods 0.000 description 3
239000000126 substance Substances 0.000 description 3
230000003746 surface roughness Effects 0.000 description 3
238000012360 testing method Methods 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
150000007513 acids Chemical class 0.000 description 2
239000000853 adhesive Substances 0.000 description 2
230000001070 adhesive effect Effects 0.000 description 2
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
239000011248 coating agent Substances 0.000 description 2
238000001816 cooling Methods 0.000 description 2
238000005260 corrosion Methods 0.000 description 2
230000007797 corrosion Effects 0.000 description 2
239000013078 crystal Substances 0.000 description 2
238000000572 ellipsometry Methods 0.000 description 2
229910052735 hafnium Inorganic materials 0.000 description 2
238000007654 immersion Methods 0.000 description 2
239000007788 liquid Substances 0.000 description 2
150000003961 organosilicon compounds Chemical class 0.000 description 2
TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
239000001301 oxygen Substances 0.000 description 2
238000002360 preparation method Methods 0.000 description 2
239000002994 raw material Substances 0.000 description 2
238000002310 reflectometry Methods 0.000 description 2
VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
238000005507 spraying Methods 0.000 description 2
229910052715 tantalum Inorganic materials 0.000 description 2
229910052719 titanium Inorganic materials 0.000 description 2
238000007740 vapor deposition Methods 0.000 description 2
238000005406 washing Methods 0.000 description 2
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
-1 K 2 CO 3 Chemical class 0.000 description 1
229910018068 Li 2 O Inorganic materials 0.000 description 1
WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
238000006124 Pilkington process Methods 0.000 description 1
ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
229910002808 Si–O–Si Inorganic materials 0.000 description 1
229910010413 TiO 2 Inorganic materials 0.000 description 1
YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
239000003929 acidic solution Substances 0.000 description 1
230000002378 acidificating effect Effects 0.000 description 1
229910001413 alkali metal ion Inorganic materials 0.000 description 1
229910000272 alkali metal oxide Inorganic materials 0.000 description 1
229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
229910000147 aluminium phosphate Inorganic materials 0.000 description 1
239000005354 aluminosilicate glass Substances 0.000 description 1
238000004458 analytical method Methods 0.000 description 1
239000007864 aqueous solution Substances 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
239000012298 atmosphere Substances 0.000 description 1
239000003637 basic solution Substances 0.000 description 1
229910021538 borax Inorganic materials 0.000 description 1
150000001642 boronic acid derivatives Chemical class 0.000 description 1
BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
238000005266 casting Methods 0.000 description 1
239000013626 chemical specie Substances 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
150000003841 chloride salts Chemical class 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
239000000470 constituent Substances 0.000 description 1
238000005520 cutting process Methods 0.000 description 1
238000003618 dip coating Methods 0.000 description 1
238000003280 down draw process Methods 0.000 description 1
238000005553 drilling Methods 0.000 description 1
238000001035 drying Methods 0.000 description 1
239000000428 dust Substances 0.000 description 1
239000004744 fabric Substances 0.000 description 1
238000007667 floating Methods 0.000 description 1
230000009477 glass transition Effects 0.000 description 1
230000005484 gravity Effects 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
229910052739 hydrogen Inorganic materials 0.000 description 1
230000001771 impaired effect Effects 0.000 description 1
239000008235 industrial water Substances 0.000 description 1
238000010884 ion-beam technique Methods 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
238000003475 lamination Methods 0.000 description 1
229910052744 lithium Inorganic materials 0.000 description 1
238000000691 measurement method Methods 0.000 description 1
239000000155 melt Substances 0.000 description 1
238000002156 mixing Methods 0.000 description 1
239000006060 molten glass Substances 0.000 description 1
229910052754 neon Inorganic materials 0.000 description 1
GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
239000012299 nitrogen atmosphere Substances 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
238000007500 overflow downdraw method Methods 0.000 description 1
235000006408 oxalic acid Nutrition 0.000 description 1
238000005268 plasma chemical vapour deposition Methods 0.000 description 1
238000005498 polishing Methods 0.000 description 1
229910052700 potassium Inorganic materials 0.000 description 1
239000011591 potassium Substances 0.000 description 1
239000001103 potassium chloride Substances 0.000 description 1
235000011164 potassium chloride Nutrition 0.000 description 1
238000007372 rollout process Methods 0.000 description 1
238000004904 shortening Methods 0.000 description 1
239000005368 silicate glass Substances 0.000 description 1
239000005361 soda-lime glass Substances 0.000 description 1
229910000029 sodium carbonate Inorganic materials 0.000 description 1
239000011780 sodium chloride Substances 0.000 description 1
239000004317 sodium nitrate Substances 0.000 description 1
235000010344 sodium nitrate Nutrition 0.000 description 1
235000010339 sodium tetraborate Nutrition 0.000 description 1
238000004528 spin coating Methods 0.000 description 1
239000007921 spray Substances 0.000 description 1
229910001220 stainless steel Inorganic materials 0.000 description 1
239000010935 stainless steel Substances 0.000 description 1
210000004243 sweat Anatomy 0.000 description 1
238000005496 tempering Methods 0.000 description 1
238000002834 transmittance Methods 0.000 description 1
WUUHFRRPHJEEKV-UHFFFAOYSA-N tripotassium borate Chemical compound [K+].[K+].[K+].[O-]B([O-])[O-] WUUHFRRPHJEEKV-UHFFFAOYSA-N 0.000 description 1
BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1

Images

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class

Landscapes

Surface Treatment Of Glass (AREA)
Laminated Bodies (AREA)

JP2017015705A 2016-02-04 2017-01-31 カバーガラス及びガラス積層体 Active JP6870348B2 (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP2016020184		2016-02-04
JP2016020184		2016-02-04

Publications (2)

Publication Number	Publication Date
JP2017137235A JP2017137235A (ja)	2017-08-10
JP6870348B2 true JP6870348B2 (ja)	2021-05-12

Family

ID=59534132

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2017015705A Active JP6870348B2 (ja)	2016-02-04	2017-01-31	カバーガラス及びガラス積層体

Country Status (2)

Country	Link
JP (1)	JP6870348B2 (zh)
CN (2)	CN206605867U (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP6870348B2 (ja) *	2016-02-04	2021-05-12	Ａｇｃ株式会社	カバーガラス及びガラス積層体
US11286201B2 (en)	2017-01-31	2022-03-29	AGC Inc.	Cover glass and glass laminate
CN107601920A (zh) *	2017-09-27	2018-01-19	信义光伏产业(安徽)控股有限公司	分光银白镜玻璃及其制备方法
KR102490522B1 (ko) *	2017-11-14	2023-01-19	삼성전자주식회사	커버 글래스 및 이를 포함하는 전자 장치, 및 커버 글래스 제조 방법
JP6863343B2 (ja) *	2018-07-12	2021-04-21	Ａｇｃ株式会社	ガラス積層体、ディスプレイ用前面板、表示装置およびガラス積層体の製造方法
JP2020060657A (ja) *	2018-10-09	2020-04-16	日東電工株式会社	反射防止ガラス

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3867393B2 (ja) *	1998-03-20	2007-01-10	株式会社デンソー	マイクロヒータおよびその製造方法ならびにエアフローセンサ
JP2000211053A (ja) *	1999-01-22	2000-08-02	Sony Corp	光学薄膜デバイス
JP2004271480A (ja) *	2003-03-12	2004-09-30	Citizen Watch Co Ltd	時計用カバーガラス
JP5023556B2 (ja) *	2006-05-31	2012-09-12	旭硝子株式会社	導電性積層体、プラズマディスプレイ用電磁波遮蔽フィルムおよびプラズマディスプレイ用保護板
CN201000491Y (zh) *	2007-01-17	2008-01-02	深圳市蓝思科技有限公司	具有防污增透膜的视窗玻璃镜片
JP5326407B2 (ja) *	2008-07-31	2013-10-30	セイコーエプソン株式会社	時計用カバーガラス、および時計
CN105555729A (zh) *	2013-09-18	2016-05-04	旭硝子株式会社	带低反射膜的强化玻璃板及其制造方法
DE102014108057A1 (de) *	2014-06-06	2015-12-17	Schott Ag	Kratzfestes, chemisch vorgespanntes Glassubstrat und dessen Verwendung
JP5920446B2 (ja) *	2014-11-21	2016-05-18	日本電気硝子株式会社	光学フィルムの製造方法
JP6870348B2 (ja) *	2016-02-04	2021-05-12	Ａｇｃ株式会社	カバーガラス及びガラス積層体

2017
- 2017-01-31 JP JP2017015705A patent/JP6870348B2/ja active Active
- 2017-02-03 CN CN201720106587.3U patent/CN206605867U/zh active Active
- 2017-02-03 CN CN201710063610.XA patent/CN107031145B/zh active Active

Also Published As

Publication number	Publication date
CN107031145A (zh)	2017-08-11
JP2017137235A (ja)	2017-08-10
CN107031145B (zh)	2022-01-04
CN206605867U (zh)	2017-11-03

Legal Events

Date	Code	Title	Description
2019-08-07	A621	Written request for application examination	Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190807
2020-06-24	A977	Report on retrieval	Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20200624
2020-10-06	A131	Notification of reasons for refusal	Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20201006
2020-12-07	A521	Request for written amendment filed	Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20201207
2021-01-05	A131	Notification of reasons for refusal	Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210105
2021-03-03	A521	Request for written amendment filed	Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210303
2021-03-10	TRDD	Decision of grant or rejection written
2021-03-16	A01	Written decision to grant a patent or to grant a registration (utility model)	Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20210316
2021-04-19	A61	First payment of annual fees (during grant procedure)	Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20210329
2021-04-19	R150	Certificate of patent or registration of utility model	Ref document number: 6870348 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150
2024-04-03	R250	Receipt of annual fees	Free format text: JAPANESE INTERMEDIATE CODE: R250

Publication	Publication Date	Title
JP6870348B2 (ja)	2021-05-12	カバーガラス及びガラス積層体
US20210284571A1 (en)	2021-09-16	Cover glass
CN104955783B (zh)	2018-01-26	带防污膜的透明基体
TWI695184B (zh)	2020-06-01	附有低反射膜之基體
TWI767206B (zh)	2022-06-11	離子交換方法及由彼得到之化學強化玻璃基板
JP6582974B2 (ja)	2019-10-02	カバーガラスおよびその製造方法
US9434644B2 (en)	2016-09-06	Cover glass and method for producing cover glass
KR102493138B1 (ko)	2023-01-30	강화 유리판의 제조 방법, 및 강화용 유리판의 제조 방법
US11866365B2 (en)	2024-01-09	Cover glass for display, in-vehicle display device, and manufacturing method of cover glass for display
TW201800358A (zh)	2018-01-01	強化玻璃板及強化玻璃板的製造方法
JP6860829B2 (ja)	2021-04-21	強化ガラスの製造方法および強化ガラス製造装置
US20210371330A1 (en)	2021-12-02	Antifouling layer-attached glass substrate and method for manufacturing antifouling layer-attached glass substrate
US11286201B2 (en)	2022-03-29	Cover glass and glass laminate