JP6858576B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP6858576B2 JP6858576B2 JP2017014613A JP2017014613A JP6858576B2 JP 6858576 B2 JP6858576 B2 JP 6858576B2 JP 2017014613 A JP2017014613 A JP 2017014613A JP 2017014613 A JP2017014613 A JP 2017014613A JP 6858576 B2 JP6858576 B2 JP 6858576B2
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Description
[第1の実施の形態に係る半導体装置の構造]
まず、第1の実施の形態に係る半導体装置の構造について説明する。図1は、第1の実施の形態に係る半導体装置を例示する断面図であり、図1(a)は全体図、図1(b)は図1(a)のA部の部分拡大断面図である。
次に、第1の実施の形態に係る半導体装置の製造方法について説明する。図2及び図3は、第1の実施の形態に係る半導体装置の製造工程を例示する図である。配線基板10は、半導体装置1となる複数の領域が設けられた多数個取りの基板の状態で製造される。そして、最終的に個片化されて個々の半導体装置1となる。以下に、半導体装置1の具体的な製造方法について説明する。
第1の実施の形態の変形例1では、第1の実施の形態とは異なる方法で貫通配線14を形成する例を示す。なお、第1の実施の形態の変形例1において、既に説明した実施の形態と同一構成部についての説明は省略する場合がある。
第1の実施の形態の変形例2では、配線基板と半導体チップとを接続する導電性ペーストの形状が第1の実施の形態と異なる例を示す。なお、第1の実施の形態の変形例2において、既に説明した実施の形態と同一構成部についての説明は省略する場合がある。
第2の実施の形態では、配線基板と半導体チップとを接続する導電性ペーストの位置が第1の実施の形態と異なる例を示す。なお、第2の実施の形態において、既に説明した実施の形態と同一構成部についての説明は省略する場合がある。
まず、第2の実施の形態に係る半導体装置の構造について説明する。図7は、第2の実施の形態に係る半導体装置を例示する断面図であり、図7(a)は全体図、図7(b)は図7(a)のA部の部分拡大断面図である。
次に、第2の実施の形態に係る半導体装置の製造方法について説明する。図8は、第2の実施の形態に係る半導体装置の製造工程を例示する図である。
第2の実施の形態の変形例1では、配線基板と半導体チップとを接続する導電性ペーストの形状が第2の実施の形態と異なる例を示す。なお、第2の実施の形態の変形例1において、既に説明した実施の形態と同一構成部についての説明は省略する場合がある。
10 配線基板
11 絶縁層
11x 貫通孔
12、13 配線層
14 貫通配線
15 ソルダーレジスト層
15x、61x 開口部
30 半導体チップ
35 電極パッド
40 金属ピラー
50、50A、50C 導電性ペースト
60、60B 接着層
60f、62f フィレット
61 第1接着層
62 第2接着層
Claims (4)
- 絶縁層、及び前記絶縁層の一方の面に設けられた配線層、を備えた配線基板の前記配線層上に突起電極を形成する工程と、
前記絶縁層の一方の面の全体に前記配線層を被覆して前記突起電極の端面を露出する接着層を形成する工程と、
回路形成面に電極パッドが設けられた半導体チップを準備する工程と、
前記電極パッド又は前記突起電極の端面に導電性ペーストを形成する工程と、
前記電極パッドと前記突起電極が前記導電性ペーストを介して接し前記回路形成面が前記接着層と接するように前記半導体チップを前記接着層上に配置し、前記半導体チップを前記接着層側に押圧しながら前記導電性ペースト及び前記接着層を同時に硬化させる工程と、を有し、
前記絶縁層及び前記導電性ペーストは、熱硬化性であり、
前記導電性ペーストは、主成分となる金属粉末をバインダーとなる樹脂の中に分散させたものであり、
前記硬化させる工程では、
前記接着層が前記絶縁層の一方の面と前記回路形成面との対向部分の隙間を充填して前記配線基板と前記半導体チップとを接着し、
前記接着層が前記半導体チップの側面に延伸してフィレットを形成し、
前記フィレットは前記回路形成面側に向かって裾広がりの形状となる半導体装置の製造方法。 - 絶縁層、及び前記絶縁層の一方の面に設けられた配線層、を備えた配線基板の前記絶縁層の一方の面の全体に前記配線層を被覆する第1接着層を形成する工程と、
前記第1接着層に、前記配線層を選択的に露出する開口部を形成する工程と、
回路形成面に電極パッドが設けられた半導体チップを準備し、前記電極パッドに突起電極を形成する工程と、
前記回路形成面に、前記突起電極の端面を露出する第2接着層を形成する工程と、
前記開口部内又は前記突起電極の端面に導電性ペーストを形成する工程と、
前記突起電極と前記開口部内に露出する前記配線層が前記導電性ペーストを介して接し前記第2接着層が前記第1接着層と接するように前記半導体チップを前記第1接着層上に配置し、前記半導体チップを前記第1接着層側に押圧しながら前記導電性ペースト、前記第1接着層、及び前記第2接着層を同時に硬化させる工程と、を有し、
前記絶縁層及び前記導電性ペーストは、熱硬化性であり、
前記導電性ペーストは、主成分となる金属粉末をバインダーとなる樹脂の中に分散させたものであり、
前記硬化させる工程では、
前記第1接着層及び前記第2接着層が前記絶縁層の一方の面と前記回路形成面との対向部分の隙間を充填して前記配線基板と前記半導体チップとを接着し、
前記第2接着層が前記半導体チップの側面に延伸してフィレットを形成し、
前記フィレットは前記回路形成面側に向かって裾広がりの形状となる半導体装置の製造方法。 - 前記導電性ペーストは、前記突起電極の端面から前記突起電極の側面に延伸する請求項1又は2に記載の半導体装置の製造方法。
- 前記導電性ペーストは、前記突起電極の側面の全体を被覆する請求項3に記載の半導体装置の製造方法。
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