JP6841914B2 - 改良されたガス流で三次元工作物を製造するための装置 - Google Patents
改良されたガス流で三次元工作物を製造するための装置 Download PDFInfo
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Description
Claims (13)
- 三次元工作物を製造するための装置(10)であって、
−原料粉末を受けるためのキャリア(14)を収容するプロセス室(12)と、
−積層造形法によって前記原料粉末で作られる工作物を製造するために、前記キャリア(14)上の前記原料粉末に電磁気又は粒子放射線を選択的に照射するための照射デバイス(16)と、
−前記照射デバイス(16)によって放出された前記電磁気又は粒子放射線を前記プロセス室(12)の中へ透過できるようにする透過要素(22)と、
−前記プロセス室(12)の中に存在する不純物による汚染から前記透過要素(22)を保護するために前記プロセス室(12)の中に保護ガスストリーム(F1、F2)を生成するように構成される、前記プロセス室(12)へガスを供給するためのガス入口(26)及び前記プロセス室(12)からガスを排出するためのガス出口(32)と、
を備え、
前記ガス入口(26)が、ランダムに配分された開口を備えかつ前記ガス入口(26)のガス取入れエリア(A)を形成するパネル形ガス透過性多孔質構成部品(36)を備え、前記ガス入口(26)の前記パネル形ガス透過性多孔質構成部品(36)が、前記プロセス室の第1側壁(38)の中に配置され、前記プロセス室(12)の前記第1側壁(38)が前記ガス出口(32)を収容する前記プロセス室(12)の第2側壁(40)に対向して配置される、
装置(10)。 - 前記ガス入口(26)の前記パネル形ガス透過性多孔質構成部品(36)が、焼結材料及び/又は繊維性材料及び/又は連続気泡フォームを含む、
請求項1に記載の装置(10)。 - 前記ガス入口(26)の前記パネル形ガス透過性多孔質構成部品(36)が、ステンレス鋼、ブロンズ、チタン及び/又はニッケル系合金を含む材料で作られる、
請求項1又は2に記載の装置(10)。 - 前記ガス入口(26)の前記パネル形ガス透過性多孔質構成部品(36)が、20%〜90%の気孔率及び/又は1μm〜10μmの孔径を有する、
請求項1〜3のいずれか1項に記載の装置(10)。 - 前記ガス入口(26)の前記パネル形ガス透過性多孔質構成部品(36)が、これを通過して流れるガスに関して異なる流動抵抗を有する複数の区間を備える、
請求項1〜4のいずれか1項に記載の装置(10)。 - 前記ガス入口(26)の前記パネル形ガス透過性多孔質構成部品(36)が、前記第1側壁(38)の幅全体を横切って延びる、
請求項1〜5のいずれか1項に記載の装置(10)。 - 前記プロセス室(12)へガスを供給するための別のガス入口(42)を更に備え、前記別のガス入口(42)が、前記ガス入口(26)の前記パネル形ガス透過性多孔質構成部品(36)の下方で前記プロセス室(12)の前記第1側壁(38)の中に収容されたガス取入れ開口(44)を有する、
請求項1〜6のいずれか1項に記載の装置(10)。 - 前記ガス入口(26)及び前記ガス出口(32)が、前記透過要素(22)から離れた方向を向く流動方向成分(v1)を有する前記保護ガスストリーム(F1、F2)の第1ガス流(F1)が生成されるように構成され配置され、かつ、前記別のガス入口(42)及び前記ガス出口(32)が、前記キャリア(14)を横切る前記保護ガスストリーム(F1、F2)の第2ガス流(F2)が生成されるように構成され配置される、
請求項7に記載の装置(10)。 - 前記ガス入口(26)を介する前記プロセス室(12)へのガスの体積流量が前記別のガス入口(42)を介する前記プロセス室(12)へのガスの体積流量より大きくなるように、前記プロセス室(12)へのガスの供給を制御するように適合された制御ユニットを更に備える、
請求項7又は8に記載の装置(10)。 - 前記ガス入口(26)に接続されかつ前記ガス入口(26)を介して前記プロセス室(12)へガスを供給するように構成されたガス取入れ流路(50)を更に備え、前記ガス取入れ流路(50)が、第1流れ断面を有する第1部分(52)と、前記第1流れ断面より大きい第2流れ断面を有する、前記第1部分(52)の下流の第2部分(54)と、を有し、前記第2部分(54)が、前記第1部分(52)から前記第2部分(54)へ向けられたガス流を分散するための分散ユニット(56)を備える、
請求項1〜9のいずれか1項に記載の装置(10)。 - 三次元工作物を製造する方法であって、
−プロセス室(12)の中に収容されたキャリア(14)上に原料粉末の層を塗布することと、
−積層造形法によって前記原料粉末で作られる工作物を製造するために、照射デバイス(16)によって前記キャリア(14)上の前記原料粉末に電磁気又は粒子放射線を選択的に照射することと、
−前記照射デバイス(16)によって放出された前記電磁気又は粒子放射線を透過要素(22)を介して前記プロセス室(12)の中へ透過することと、
−前記プロセス室(12)の中に存在する不純物による汚染から前記透過要素(22)を保護するために前記プロセス室(12)の中で保護ガスストリーム(F1、F2)が生成されるように、ガス入口(26)を介して前記プロセス室(12)へガスを供給しかつガス出口(32)を介して前記プロセス室(12)からガスを排出することと、
を含み、
前記ガス入口(26)が、ランダムに配分された開口を備えかつ前記ガス入口(26)のガス取入れエリア(A)を形成するパネル形ガス透過性多孔質構成部品(36)を備え、前記ガス入口(26)の前記パネル形ガス透過性多孔質構成部品(36)が、前記プロセス室(12)の第1側壁(38)の中に配置され、前記プロセス室(12)の前記第1側壁(38)が、前記ガス出口(32)を収容する前記プロセス室(12)の第2側壁(40)に対向して配置される、
方法。 - 別のガス入口(42)を介して前記プロセス室(12)へガスを供給するステップを更に含み、前記別のガス入口(42)が、前記ガス入口(26)の前記パネル形ガス透過性多孔質構成部品(36)の下方で前記プロセス室(12)の前記第1側壁(38)の中に収容されたガス取入れ開口(44)を有し、前記ガス入口(26)及び前記ガス出口(32)が、前記透過要素(22)から離れる方向を向く流動方向成分(v1)を有する前記保護ガスストリーム(F1、F2)の第1ガス流(F1)が生成されるように構成され配置され、前記別のガス入口(42)及び前記ガス出口(32)が、前記キャリア(14)を横切る前記保護ガスストリーム(F1、F2)の第2ガス流(F2)が生成されるように構成され配置される、
請求項11に記載の方法。 - 前記プロセス室(12)へのガスの前記供給が、前記ガス入口(26)を介する前記プロセス室(12)へのガスの体積流量が、前記別のガス入口(42)を介する前記プロセス室(12)へのガスの体積流量より大きくなるように制御される、
請求項12に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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EP16198446.3A EP3321003B1 (en) | 2016-11-11 | 2016-11-11 | Apparatus and method for producing a three-dimensional work piece with improved gas flow |
EP16198446.3 | 2016-11-11 | ||
PCT/EP2017/077295 WO2018086887A1 (en) | 2016-11-11 | 2017-10-25 | Apparatus for producing a three-dimensional work piece with improved gas flow |
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JP2019536907A JP2019536907A (ja) | 2019-12-19 |
JP6841914B2 true JP6841914B2 (ja) | 2021-03-10 |
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EP (1) | EP3321003B1 (ja) |
JP (1) | JP6841914B2 (ja) |
CN (1) | CN109890538B (ja) |
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CN109890538A (zh) | 2019-06-14 |
BR112019009342B1 (pt) | 2022-10-11 |
EP3321003B1 (en) | 2019-01-09 |
CN109890538B (zh) | 2022-05-17 |
EP3321003A1 (en) | 2018-05-16 |
BR112019009342A2 (pt) | 2019-07-30 |
US20190262901A1 (en) | 2019-08-29 |
JP2019536907A (ja) | 2019-12-19 |
CA3038232A1 (en) | 2018-05-17 |
US11278965B2 (en) | 2022-03-22 |
WO2018086887A1 (en) | 2018-05-17 |
CA3038232C (en) | 2021-02-16 |
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