JP6751408B2 - 断熱成形体を製造する方法 - Google Patents
断熱成形体を製造する方法 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 100
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 60
- 229910021529 ammonia Inorganic materials 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 43
- 238000000465 moulding Methods 0.000 claims description 29
- 239000000377 silicon dioxide Substances 0.000 claims description 25
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 20
- 238000009413 insulation Methods 0.000 claims description 18
- 229910021485 fumed silica Inorganic materials 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 230000002209 hydrophobic effect Effects 0.000 claims description 8
- 229910002011 hydrophilic fumed silica Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 description 15
- 239000000835 fiber Substances 0.000 description 4
- 239000003605 opacifier Substances 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- AZUYLZMQTIKGSC-UHFFFAOYSA-N 1-[6-[4-(5-chloro-6-methyl-1H-indazol-4-yl)-5-methyl-3-(1-methylindazol-5-yl)pyrazol-1-yl]-2-azaspiro[3.3]heptan-2-yl]prop-2-en-1-one Chemical compound ClC=1C(=C2C=NNC2=CC=1C)C=1C(=NN(C=1C)C1CC2(CN(C2)C(C=C)=O)C1)C=1C=C2C=NN(C2=CC=1)C AZUYLZMQTIKGSC-UHFFFAOYSA-N 0.000 description 3
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000005871 repellent Substances 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229910003849 O-Si Inorganic materials 0.000 description 2
- 229910003872 O—Si Inorganic materials 0.000 description 2
- 229910008051 Si-OH Inorganic materials 0.000 description 2
- 229910002808 Si–O–Si Inorganic materials 0.000 description 2
- 229910006358 Si—OH Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- -1 silicon halide Chemical class 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229910002018 Aerosil® 300 Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- YTEISYFNYGDBRV-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)oxy-dimethylsilyl]oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)(C)O[Si](C)C YTEISYFNYGDBRV-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000004964 aerogel Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- JCDAAXRCMMPNBO-UHFFFAOYSA-N iron(3+);oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Ti+4].[Fe+3].[Fe+3] JCDAAXRCMMPNBO-UHFFFAOYSA-N 0.000 description 1
- YDZQQRWRVYGNER-UHFFFAOYSA-N iron;titanium;trihydrate Chemical compound O.O.O.[Ti].[Fe] YDZQQRWRVYGNER-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- 230000004584 weight gain Effects 0.000 description 1
- 235000019786 weight gain Nutrition 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/60—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only artificial stone
- C04B41/61—Coating or impregnation
- C04B41/62—Coating or impregnation with organic materials
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- C04B18/00—Use of agglomerated or waste materials or refuse as fillers for mortars, concrete or artificial stone; Treatment of agglomerated or waste materials or refuse, specially adapted to enhance their filling properties in mortars, concrete or artificial stone
- C04B18/04—Waste materials; Refuse
- C04B18/14—Waste materials; Refuse from metallurgical processes
- C04B18/146—Silica fume
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- C04B41/49—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Organo-clay compounds; Organo-silicates, i.e. ortho- or polysilicic acid esters ; Organo-phosphorus compounds; Organo-inorganic complexes
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
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- C04B41/4922—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Organo-clay compounds; Organo-silicates, i.e. ortho- or polysilicic acid esters ; Organo-phosphorus compounds; Organo-inorganic complexes containing silicon applied to the substrate as monomers, i.e. as organosilanes RnSiX4-n, e.g. alkyltrialkoxysilane, dialkyldialkoxysilane
- C04B41/4944—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Organo-clay compounds; Organo-silicates, i.e. ortho- or polysilicic acid esters ; Organo-phosphorus compounds; Organo-inorganic complexes containing silicon applied to the substrate as monomers, i.e. as organosilanes RnSiX4-n, e.g. alkyltrialkoxysilane, dialkyldialkoxysilane containing atoms other than carbon, hydrogen, oxygen, silicon, alkali metals or halogens, e.g. N-silyldisilazane: Image
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Description
このプロセスは、
a)親水性ヒュームドシリカ含有断熱成形体をチャンバー内に導入し、かつ差圧Δp≧20mbarになるまでガス状アンモニアを供給することにより、前記成形体をアンモニアで処理し、
b)続けてこのようにして処理された断熱成形体を、(CH3)3Si−NH−Si(CH3)3で処理してアンモニアを生成させ、
c)このようにして得られたアンモニアを、必要に応じて更なるアンモニアとともに、親水性ヒュームドシリカ含有断熱成形体が中にある別のチャンバーに供給し、ここで、差圧Δp≧20mbarになるまでアンモニアを供給する、
ことを特徴とする。
DIN ISO 844:2009およびEN 826:1996に依拠。試験仕様とは異なり、1バールまで負荷をかけ、圧縮値(Stauchung)を評価する。そのほか、試験に先立って試験片を調温することなく、単一測定のみを実施した。
Claims (14)
- 親水性シリカ含有断熱成形体をアンモニアで処理することを含む、アンモニアで処理された親水性の断熱成形体を製造する方法において、前記断熱成形体をチャンバー内に導入し、かつ差圧Δpが20mbar以上になるまでガス状アンモニアを供給し、かつガス状アンモニアを導入する前のチャンバー内の圧力p1が、1mbar≦p1≦500mbarであることを特徴とする方法。
- 前記親水性の断熱成形体が、水を5質量%まで含有することを特徴とする、請求項1記載の方法。
- さらに水蒸気をチャンバー内に導入することを特徴とする、請求項1または2記載の方法。
- 導入された前記親水性の断熱成形体を、ガス状アンモニアの添加時点から、さらに1〜100時間にわたってチャンバー内に放置することを特徴とする、請求項1から3までのいずれか1項記載の方法。
- チャンバー内の温度が、0℃から100℃までの間であることを特徴とする、請求項1から4までのいずれか1項記載の方法。
- 親水性シリカとして、ヒュームドシリカを用いることを特徴とする、請求項1から5までのいずれか1項記載の方法。
- 請求項1から5までのいずれか1項記載の方法によって得られた親水性の断熱成形体を、有機ケイ素化合物で処理することを特徴とする、疎水性シリカ含有断熱成形体を製造する方法。
- 有機ケイ素化合物により処理するために、アンモニアで処理された前記親水性の断熱成形体をチャンバー内に導入し、かつ差圧Δpが20mbar以上になるまで蒸気状の有機ケイ素化合物をチャンバー内に導入することを特徴とする、請求項7記載の方法。
- アンモニアで処理された前記親水性の断熱成形体が、水を2質量%以下含有することを特徴とする、請求項8記載の方法。
- 有機ケイ素化合物を導入する前のチャンバー内の圧力が、大気圧未満であることを特徴とする、請求項8または9記載の方法。
- 前記蒸気状の有機ケイ素化合物が導入されるチャンバー内の温度が、20〜300℃であることを特徴とする、請求項8から10までのいずれか1項記載の方法。
- 有機ケイ素化合物の添加時点から、さらに1分〜1時間にわたって、アンモニアで処理された前記親水性の断熱成形体をチャンバー内に放置することを特徴とする、請求項8から11までのいずれか1項記載の方法。
- 疎水性シリカ含有断熱成形体を製造する方法において、
a)親水性ヒュームドシリカ含有断熱成形体をチャンバー内に導入し、かつ差圧Δpが20mbar以上になるまでガス状アンモニアを供給することにより、断熱成形体をアンモニアで処理し、ここで、ガス状アンモニアを導入する前のチャンバー内の圧力p1が、1mbar≦p1≦500mbarであり、
b)続けてこのようにして処理された断熱成形体を、(CH3)3Si−NH−Si(CH3)3で処理してアンモニアを生成させ、
c)このようにして得られたアンモニアを、必要に応じて更なるアンモニアとともに、親水性ヒュームドシリカ含有断熱成形体がその中にある別のチャンバーに供給し、ここで、差圧Δpが20mbar以上になるまでアンモニアを供給する、
ことを特徴とする方法。 - Δp=p2−p1が適用され、p1は、ガス状アンモニアの導入前のチャンバー内の圧力であり、p2は、ガス状アンモニアの導入が停止されるときのチャンバー内の圧力であることを特徴とする、請求項1から13までのいずれか1項に記載の方法。
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