JP6747815B2 - 減圧乾燥装置及び減圧乾燥方法 - Google Patents
減圧乾燥装置及び減圧乾燥方法 Download PDFInfo
- Publication number
- JP6747815B2 JP6747815B2 JP2016017622A JP2016017622A JP6747815B2 JP 6747815 B2 JP6747815 B2 JP 6747815B2 JP 2016017622 A JP2016017622 A JP 2016017622A JP 2016017622 A JP2016017622 A JP 2016017622A JP 6747815 B2 JP6747815 B2 JP 6747815B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- suction
- unit
- pressure
- leak
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title description 7
- 238000001291 vacuum drying Methods 0.000 title description 4
- 239000000758 substrate Substances 0.000 claims description 180
- 238000001035 drying Methods 0.000 claims description 52
- 239000011248 coating agent Substances 0.000 claims description 42
- 238000000576 coating method Methods 0.000 claims description 42
- 230000006837 decompression Effects 0.000 claims description 34
- 230000004308 accommodation Effects 0.000 claims description 23
- 239000007789 gas Substances 0.000 description 26
- 229920006395 saturated elastomer Polymers 0.000 description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 229910001873 dinitrogen Inorganic materials 0.000 description 12
- 239000002904 solvent Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- -1 air Chemical compound 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/12—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/06—Controlling, e.g. regulating, parameters of gas supply
- F26B21/10—Temperature; Pressure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Drying Of Solid Materials (AREA)
- Coating Apparatus (AREA)
Description
したがって、チャンバ部2の基板収容部30を減圧させる真空ポンプ31が大容量化された場合でも、塗布膜を安定して乾燥させることができ、基板1と塗布膜との密着性を向上させることができる。
2 チャンバ部
3 吸引減圧部
4 減圧調節部
30 基板収容部
32 吸引配管
33 吸引連結部
36 吸引調節弁
42 リーク配管
43 リーク連結部
46 リーク調節弁
Claims (1)
- 基板上に塗布された塗布膜を減圧環境下で乾燥させる減圧乾燥装置であって、
基板が収容される基板収容部を有するチャンバ部と、
基板収容部を吸引することにより基板収容部の圧力を減圧させる吸引減圧部と、
を備え、
前記チャンバ部には、前記基板収容部に気体を供給することにより前記吸引減圧部の減圧速度を抑えて前記基板収容部を所定の圧力に調節する減圧調節部を有しており、
前記吸引減圧部は、前記基板収容部に連結される吸引配管とこの吸引配管の開度を調節する吸引調節弁とを有しており、
前記減圧調節部は、前記基板収容部に連結されるリーク配管とこのリーク配管の開度を調節するリーク調節弁とを有しており、
前記吸引調節弁と前記リーク調節弁のそれぞれの開度が調節されることにより、前記基板収容部を所定の圧力に調節され、
前記吸引配管が前記基板収容部と連結される吸引連結部と、前記リーク配管が前記基板収容部と連結されるリーク連結部とは、前記吸引連結部と前記リーク連結部との間に基板が配置されるのを避けた位置に配置され、
前記吸引連結部と、前記リーク連結部とが、前記チャンバ部の底面に設けられていることを特徴とする減圧乾燥装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016017622A JP6747815B2 (ja) | 2016-02-02 | 2016-02-02 | 減圧乾燥装置及び減圧乾燥方法 |
PCT/JP2017/001177 WO2017135018A1 (ja) | 2016-02-02 | 2017-01-16 | 減圧乾燥装置及び減圧乾燥方法 |
TW106101494A TWI717451B (zh) | 2016-02-02 | 2017-01-17 | 減壓乾燥裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016017622A JP6747815B2 (ja) | 2016-02-02 | 2016-02-02 | 減圧乾燥装置及び減圧乾燥方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017138022A JP2017138022A (ja) | 2017-08-10 |
JP6747815B2 true JP6747815B2 (ja) | 2020-08-26 |
Family
ID=59500166
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016017622A Expired - Fee Related JP6747815B2 (ja) | 2016-02-02 | 2016-02-02 | 減圧乾燥装置及び減圧乾燥方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6747815B2 (ja) |
TW (1) | TWI717451B (ja) |
WO (1) | WO2017135018A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7316323B2 (ja) * | 2021-06-30 | 2023-07-27 | 株式会社Screenホールディングス | 減圧乾燥装置および減圧乾燥方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005329303A (ja) * | 2004-05-19 | 2005-12-02 | Mitsubishi Chemicals Corp | 枚葉塗布部材の製造方法、減圧乾燥処理方法、および減圧乾燥処理装置 |
JP2006261379A (ja) * | 2005-03-17 | 2006-09-28 | Dainippon Screen Mfg Co Ltd | 減圧乾燥装置、排気装置および減圧乾燥方法 |
JP2006194577A (ja) * | 2005-12-21 | 2006-07-27 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
KR101509830B1 (ko) * | 2009-09-07 | 2015-04-06 | 도쿄엘렉트론가부시키가이샤 | 감압건조장치 및 감압건조방법 |
JP2015191880A (ja) * | 2014-03-31 | 2015-11-02 | 東京エレクトロン株式会社 | 処理装置及び処理方法 |
-
2016
- 2016-02-02 JP JP2016017622A patent/JP6747815B2/ja not_active Expired - Fee Related
-
2017
- 2017-01-16 WO PCT/JP2017/001177 patent/WO2017135018A1/ja active Application Filing
- 2017-01-17 TW TW106101494A patent/TWI717451B/zh active
Also Published As
Publication number | Publication date |
---|---|
TW201730494A (zh) | 2017-09-01 |
TWI717451B (zh) | 2021-02-01 |
JP2017138022A (ja) | 2017-08-10 |
WO2017135018A1 (ja) | 2017-08-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9607855B2 (en) | Etching method and storage medium | |
JP6633175B2 (ja) | 基板保持装置及び弾性膜 | |
JP5649125B2 (ja) | テープ貼付装置 | |
KR100730453B1 (ko) | 감압 건조 장치 및 감압 건조 방법 | |
JP6336231B1 (ja) | 真空処理装置 | |
JP2006261379A (ja) | 減圧乾燥装置、排気装置および減圧乾燥方法 | |
JP5958446B2 (ja) | ロードポート装置 | |
JP7157521B2 (ja) | 基板研磨方法、トップリングおよび基板研磨装置 | |
JP2006253517A (ja) | 減圧乾燥装置 | |
JP6747815B2 (ja) | 減圧乾燥装置及び減圧乾燥方法 | |
JP5344690B2 (ja) | 減圧乾燥装置 | |
JP2009041790A (ja) | 減圧乾燥装置 | |
US11027970B2 (en) | Method of manufacturing semiconductor device | |
JP6863747B2 (ja) | 減圧乾燥装置 | |
JP2012247507A (ja) | 基板の貼り合せ装置 | |
JP2010010259A (ja) | 真空処理装置 | |
JP5280000B2 (ja) | 減圧乾燥処理装置 | |
WO2013035599A1 (ja) | 接合方法、コンピュータ記憶媒体及び接合システム | |
JP2013157418A (ja) | エッチング装置 | |
KR20130016359A (ko) | 기판 처리 방법 및 기판 처리 시스템 | |
JP2008232210A (ja) | 圧力制御バルブおよび該圧力制御バルブを備えた処理装置 | |
JP2006071185A (ja) | 減圧乾燥装置 | |
JP4274168B2 (ja) | プラズマ処理装置およびプラズマ処理方法 | |
WO2018235459A1 (ja) | 基板処理装置及び基板処理方法 | |
JP2009294615A (ja) | 基板貼り合わせ装置及び方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20181207 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200205 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200306 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200616 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200710 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20200722 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20200806 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6747815 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |