JP6630217B2 - Manufacturing method of glass plate - Google Patents
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- 239000011521 glass Substances 0.000 title claims description 196
- 238000004519 manufacturing process Methods 0.000 title claims description 37
- 239000006060 molten glass Substances 0.000 claims description 219
- 238000012545 processing Methods 0.000 claims description 94
- 238000002844 melting Methods 0.000 claims description 70
- 230000008018 melting Effects 0.000 claims description 70
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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Description
本発明は、ガラス板の製造方法および製造装置に関する。 The present invention relates to a method and an apparatus for manufacturing a glass sheet.
ガラス板の製造では、溶解炉でガラス原料を溶解して熔融ガラスがつくられ、ガラス供給管を通し、清澄管、攪拌槽などの溶融ガラス処理装置へ送られる。溶融ガラス処理装置へ送られた溶融ガラスは、清澄管で清澄され、攪拌槽でスターラにより攪拌されてガラス成分の均質化を行った後、成形体へ送られてシートガラスへと成形される。 In the production of a glass plate, a glass material is melted in a melting furnace to produce a molten glass, which is sent through a glass supply pipe to a molten glass processing apparatus such as a fining tube or a stirring tank. The molten glass sent to the molten glass processing apparatus is clarified by a fining tube, stirred by a stirrer in a stirring tank to homogenize glass components, and then sent to a molded body to be formed into sheet glass.
溶解炉、処理装置および成形体を備えたガラス板の製造装置の操業初期においては、高温の溶融ガラスを、ガラス供給管を通して、溶解炉から処理装置、成形対へと順に導入しながらガラス供給管や処理装置が加熱され昇温制御される。 In the early stage of operation of a glass sheet manufacturing apparatus having a melting furnace, a processing apparatus, and a molded body, a high-temperature molten glass is introduced through a glass supply pipe from a melting furnace to a processing apparatus and a molding pair in order. The processing apparatus is heated and the temperature is controlled.
操業開始時に高温の溶融ガラスを供給管、処理装置へ導入しながらこれらの装置を加熱するには、装置の昇温異常を招かないように、溶融ガラスの導入速度をコントロールする必要がある。溶解炉から供給管へ高温の溶融ガラスを流出したとき、装置温度が急上昇して装置の昇温機能が異状を示した場合には、一時的に冷却機能で装置温度を調整するなど対処が必要となる。
しかし、このような対処は、安定した操業を得るまでに長時間を要するだけでなく、処理装置の温度を管理して目的とする溶融ガラスの温度履歴を形成するという点において不利となり、製品の品質に影響を及ぼす。
In order to heat these devices while introducing high-temperature molten glass to the supply pipe and the processing device at the start of operation, it is necessary to control the rate of introducing the molten glass so as not to cause abnormal temperature rise of the device. If the temperature of the equipment suddenly rises due to the high temperature of the molten glass flowing out from the melting furnace to the supply pipe and the temperature rise function of the equipment is abnormal, it is necessary to take measures such as temporarily adjusting the equipment temperature with the cooling function. It becomes.
However, such measures are disadvantageous not only in that it takes a long time to obtain a stable operation, but also in that the temperature of the processing apparatus is controlled and the temperature history of the target molten glass is formed, and the product has a disadvantage. Affects quality.
溶融ガラスの供給管や清澄管に関して、白金又は白金合金で構成された供給管及び清澄管が知られている（特許文献１）。また、白金又は白金合金で構成された溶融ガラス処理装置に必要な温度管理と溶融ガラスの温度制御について開示されている（特許文献２）。 With respect to a molten glass supply tube and a fining tube, a supply tube and a fining tube made of platinum or a platinum alloy are known (Patent Document 1). Further, temperature management and temperature control of a molten glass required for a molten glass processing apparatus made of platinum or a platinum alloy are disclosed (Patent Document 2).
上述のとおり、ガラス板の製造装置の操業開始においては、高温の溶融ガラスを、ガラス供給管を通して清澄管、攪拌槽へと順に導入するには、溶融ガラスの導入量（導入速度）を制御しながら装置各々の昇温管理を行う必要がある。 As described above, at the start of the operation of the glass sheet manufacturing apparatus, in order to introduce the high-temperature molten glass into the fining tube and the stirring tank in order through the glass supply tube, the amount of the molten glass introduced (introduction speed) is controlled. It is necessary to control the temperature rise of each device.
しかし、供給管、清澄管、攪拌槽を含む、熔融ガラス処理装置それぞれについて、装置の構造や材料、溶融ガラスの温度、装置各々の設置条件を踏まえ、溶融ガラスの導入量（導入速度）を適切にコントロールしながら装置それぞれを加熱制御するのは容易ではない。 However, the amount of molten glass introduced (introduction rate) is appropriate for each molten glass processing equipment, including the supply pipe, fining pipe, and stirring tank, based on the structure and materials of the equipment, the temperature of the molten glass, and the installation conditions of each equipment. It is not easy to control the heating of each device while controlling the temperature.
本発明の目的は、操業開始から安定した操業へ到達するまでの操業初期において、溶解炉から熔融ガラスを処理装置へ順次、導入するのに、処置装置の昇温異常を起こすことなく、導入量（導入速度）を最適に維持しながら装置を昇温制御でき、処理装置を安定した操業へ効率的に到達できる、ガラス板の製造方法及びガラス板の製造装置の提供にある。 An object of the present invention is to introduce molten glass sequentially from a melting furnace to a processing apparatus in an early stage of operation from the start of the operation until reaching a stable operation, without causing an abnormal rise in the temperature of the processing apparatus. It is an object of the present invention to provide a glass sheet manufacturing method and a glass sheet manufacturing apparatus capable of controlling the temperature of the apparatus while maintaining the (introduction speed) at an optimum level and efficiently achieving a stable operation of the processing apparatus.
〔１〕熔解炉でガラス原料を熔解して熔融ガラスを生成する溶解工程と、前記熔解炉でつくられた熔融ガラスを処理する処理装置を用いて溶融ガラスを処理する熔融ガラス処理工程と、前記処理工程で処理された熔融ガラスを成形してシートガラスを形成する成形工程とを含むガラス板の製造方法であって、
操業開始時に、前記溶解炉からの溶融ガラスを前記処理装置へ導入し、前記処理装置を加熱するのに、前記処理装置を操業温度Ｔ１よりも低い待機温度Ｔ２で維持し、溶融ガラスが前記処理装置へ持ち込む熱量（Ａ）および前記処理装置の放熱量（Ｂ）が（Ａ）＜（Ｂ）となる溶融ガラスの導入速度を導入基準流量Ｘ０（ｋｇ／ｓ）とすると、熔融ガラスを導入するとき、所定時間ごと、前記導入基準流量Ｘ０に基づいて前記溶融ガラスの流量を規制して、前記処理装置が操業温度Ｔ１まで加熱される、ことを特徴とするガラス板の製造方法。
[1] a melting step of melting a glass raw material in a melting furnace to produce a molten glass; a melting glass processing step of processing the molten glass using a processing apparatus for processing the molten glass produced in the melting furnace; Forming a molten glass treated in the processing step to form a sheet glass, comprising:
At start operations, the molten glass from the melting furnace is introduced into the processing apparatus, to heat the apparatus, maintaining said processing apparatus at operating temperature T lower standby temperature T 2 than 1, the molten glass Assuming that the introduction rate of the molten glass at which the amount of heat (A) brought into the processing apparatus and the amount of heat radiation (B) of the processing apparatus satisfy (A) <(B) is the introduction reference flow rate X 0 (kg / s), the molten glass when introducing, every predetermined time, the introduction reference flow X 0 to regulate the flow rate of the molten glass on the basis of said processing apparatus is heated to operating temperature T 1, the manufacture of glass sheets, characterized in that Method.
〔２〕前記処理装置は、熔融ガラスに含まれるＯ2を脱泡して熔融ガラスを清澄する清澄管と、熔融ガラスを均質化する攪拌槽と、前記熔解炉から前記清澄管へ熔融ガラスを所定の温度で移送するガラス供給管１と、前記清澄管から攪拌槽へ熔融ガラスを所定の温度で移送するガラス供給管２と、前記攪拌槽から前記成形体へ所定の温度で熔融ガラスを移送するガラス供給管３と、を備え、
操業開始時に、前記溶解炉から溶融ガラスを流出させ、前記ガラス供給管１、前記清澄管、前記ガラス供給管２、前記攪拌槽、前記ガラス供給管３に、順に熔融ガラスを導入するとき、処理装置の各々が、熔融ガラスの流量がそれぞれの前記導入基準流量Ｘ０で規制され、それぞれの操業温度Ｔ１まで加熱される、〔１〕に記載のガラス板の製造方法。
[2] The processing unit, a finer tube for clarifying the defoaming O 2 to molten glass contained in the molten glass, a stirring tank to homogenize the molten glass, a molten glass into the finer tube from the melter A glass supply pipe 1 for transferring the molten glass at a predetermined temperature, a glass supply pipe 2 for transferring the molten glass from the fining tube to a stirring tank at a predetermined temperature, and a transfer of the molten glass from the stirring tank to the molded body at a predetermined temperature. A glass supply pipe 3 that performs
When starting the operation, the molten glass is discharged from the melting furnace, and the molten glass is introduced into the glass supply tube 1, the fining tube, the glass supply tube 2, the stirring tank, and the glass supply tube 3 in order. each device, the flow rate of the molten glass is regulated by the introduction reference flow rate X 0 respectively, are heated to the respective operating temperature T 1, the manufacturing method of a glass plate according to [1].
〔３〕前記処理装置は、熔融ガラスを導入するとき、前記導入基準流量Ｘ０を超えないように、熔融ガラスの流量が規制され、操業温度Ｔ１まで加熱される、請求項１又は２に記載のガラス板の製造方法。 [3] The processing unit, when introducing the molten glass, so as not to exceed the introduction reference flow X 0, the flow rate of the molten glass is regulated, is heated to operating temperature T 1, to claim 1 or 2 The method for producing a glass plate according to the above.
〔４〕前記処理装置の放熱量（Ｂ）は自然放熱によるものである、〔１〕から〔３〕のいずれか１つに記載の製造方法。 [4] The manufacturing method according to any one of [1] to [3], wherein the heat radiation amount (B) of the processing device is due to natural heat radiation.
〔５〕ガラス原料を熔解して熔融ガラスを生成する溶解炉と、加熱手段が備えられ、前記熔解炉でつくられた熔融ガラスを処理する処理装置と、前記処理装置で処理された溶融ガラスを成形してシートガラスを形成する成形装置と、
を備え、
操業開始時に、前記溶解炉からの溶融ガラスを前記処理装置へ導入し、前記処理装置を加熱するのに、前記処理装置を操業温度Ｔ１よりも低い待機温度Ｔ２で維持し、溶融ガラスが前記処理装置へ持ち込む熱量（Ａ）および前記処理装置の放熱量（Ｂ）が（Ａ）＜（Ｂ）となる溶融ガラスの導入速度を導入基準流量Ｘ０（ｋｇ／ｓ）とすると、熔融ガラスを導入するとき、所定時間ごと、前記導入基準流量Ｘ０に基づいて前記溶融ガラスの流量を規制して、前記処理装置が前記加熱手段により操業温度Ｔ１まで加熱される、ことを特徴とするガラス板の製造装置。
[5] A melting furnace for melting the glass raw material to produce a molten glass, a heating device is provided, a processing apparatus for processing the molten glass produced in the melting furnace, and a molten glass processed by the processing apparatus. A forming apparatus for forming sheet glass by forming;
With
At start operations, the molten glass from the melting furnace is introduced into the processing apparatus, to heat the apparatus, maintaining said processing apparatus at operating temperature T lower standby temperature T 2 than 1, the molten glass Assuming that the introduction rate of the molten glass at which the amount of heat (A) brought into the processing apparatus and the amount of heat radiation (B) of the processing apparatus satisfy (A) <(B) is the introduction reference flow rate X 0 (kg / s), the molten glass when introducing, every predetermined time, to regulate the flow rate of the molten glass on the basis of the introduction reference flow X 0, the processing device is heated by up to operating temperature T 1 of the heating means, characterized in that Glass plate manufacturing equipment.
〔６〕前記処理装置は、熔融ガラスに含まれるＯ2を脱泡して熔融ガラスを清澄する清澄管と、熔融ガラスを均質化する攪拌槽と、前記熔解炉から前記清澄管へ熔融ガラスを所定の温度で移送するガラス供給管１と、前記清澄管から攪拌槽へ熔融ガラスを所定の温度で移送するガラス供給管２と、前記攪拌槽から前記成形体へ所定の温度で熔融ガラスを移送するガラス供給管３と、を備え、
操業開始時に、前記溶解炉から溶融ガラスを流出させ、前記ガラス供給管１、前記清澄管、前記ガラス供給管２、前記攪拌槽、前記ガラス供給管３に、順に熔融ガラスを導入するとき、処理装置の各々は、熔融ガラスの流量がそれぞれの前記導入基準流量Ｘ０で規制され、それぞれの操業温度Ｔ１まで加熱される、〔５〕に記載のガラス板の製造装置。
[6] The processing unit, a finer tube for clarifying the defoaming O 2 to molten glass contained in the molten glass, a stirring tank to homogenize the molten glass, a molten glass into the finer tube from the melter A glass supply pipe 1 for transferring the molten glass at a predetermined temperature, a glass supply pipe 2 for transferring the molten glass from the fining tube to a stirring tank at a predetermined temperature, and a transfer of the molten glass from the stirring tank to the molded body at a predetermined temperature. A glass supply pipe 3 that performs
When starting the operation, the molten glass is discharged from the melting furnace, and the molten glass is introduced into the glass supply tube 1, the fining tube, the glass supply tube 2, the stirring tank, and the glass supply tube 3 in order. each device, the flow rate of molten glass is regulated by the introduction reference flow rate X 0 respectively, are heated to the respective operating temperature T 1, the manufacturing apparatus of glass plate according to [5].
〔７〕前記処理装置は、熔融ガラスを導入するとき、前記導入基準流量Ｘ０を超えないように、熔融ガラスの流量が規制され、操業温度Ｔ１まで加熱される、〔１〕又は〔２〕に記載のガラス板の製造装置。 [7] The processing unit, when introducing the molten glass, so as not to exceed the introduction reference flow X 0, the flow rate of the molten glass is regulated, is heated to operating temperature T 1, [1] or [2 ] The manufacturing apparatus of a glass plate as described in [1].
本発明によれば、操業初期の溶解炉からの処理装置への溶融ガラスの導入は、導入基準流量Ｘ０に基づいて、導入速度が最適に維持される。溶融ガラスの導入速度が最適にコントロールされているため、操業初期の処理装置の昇温制御は、昇温異常を招くことなく効率的に温度制御できる。 According to the present invention, the introduction of the molten glass to the processing unit from the operation initial melting furnace, based on the introduction reference flow X 0, rate of introduction is optimally maintained. Since the introduction speed of the molten glass is optimally controlled, the temperature control of the processing apparatus in the early stage of the operation can be efficiently performed without causing abnormal temperature rise.
以下、本実施形態のガラス基板の製造方法及び製造装置、及び攪拌槽について説明する。図１は、本発明のガラス基板の製造方法の工程の一例を示す図である。 Hereinafter, a method and an apparatus for manufacturing a glass substrate and a stirring tank according to the present embodiment will be described. FIG. 1 is a diagram illustrating an example of steps of a method for manufacturing a glass substrate according to the present invention.
（１）ガラス基板の製造方法の全体概要
ガラス基板の製造方法は、熔解工程（ＳＴ１）と、清澄工程（ＳＴ２）と、均質化工程（ＳＴ３）と、供給工程（ＳＴ４）と、成形工程（ＳＴ５）と、徐冷工程（ＳＴ６）と、切断工程（ＳＴ７）と、を主に有する。この他に、切断研削工程、洗浄工程、検査工程、梱包工程等を有し、梱包工程で積槽された複数のガラス基板は、納入先の業者に搬送される。
(1) Overall Overview of Glass Substrate Manufacturing Method The glass substrate manufacturing method includes a melting step (ST1), a fining step (ST2), a homogenizing step (ST3), a supplying step (ST4), and a forming step (ST4). ST5), a slow cooling step (ST6), and a cutting step (ST7). In addition to this, a plurality of glass substrates loaded in the packing process including a cutting and grinding process, a cleaning process, an inspection process, a packing process, and the like are transported to a supplier.
熔解工程（ＳＴ１）は熔解槽で行われる。熔解工程では、熔解槽に蓄えられた熔融ガラスの液面にガラス原料を投入することにより熔融ガラスを作る。さらに、熔解槽の底部に設けられた流出口から後工程に向けて熔融ガラスを流す。 The melting step (ST1) is performed in a melting tank. In the melting step, a molten glass is produced by putting a glass raw material into the liquid surface of the molten glass stored in the melting tank. Further, the molten glass flows from an outlet provided at the bottom of the melting tank toward a subsequent process.
熔解工程（ＳＴ１）は熔解炉で行われる。熔解炉では、ガラス原料を、熔解炉に蓄えられた熔融ガラスの液面に投入し、加熱することにより熔融ガラスを作る。さらに、熔解炉の内側側壁の１つの底部に設けられた流出口から下流工程に向けて熔融ガラスを流す。
熔解炉の熔融ガラスの加熱は、熔融ガラス自身に電気が流れて自ら発熱して加熱する方法に加えて、バーナーによる火焔を補助的に与えてガラス原料を熔解することもできる。なお、ガラス原料には清澄剤が添加される。清澄剤として、ＳｎＯ2，Ａｓ2Ｏ3，Ｓｂ2Ｏ3，Ｆｅ2Ｏ3等、高温で還元反応により酸素を放出するタイプの金属酸化物が知られているが、特に制限されない。しかし、環境負荷低減の点から、清澄剤としてＡｓ2Ｏ3の使用は望ましくない。
The melting step (ST1) is performed in a melting furnace. In a melting furnace, a glass raw material is charged into a liquid surface of the molten glass stored in the melting furnace and heated to produce a molten glass. Further, the molten glass flows from an outlet provided at one bottom of the inner side wall of the melting furnace toward a downstream process.
The heating of the molten glass in the melting furnace can be performed by melting the glass raw material by supplementing a flame with a burner in addition to the method of heating by heating the molten glass itself by the flow of electricity. Note that a fining agent is added to the glass raw material. As a fining agent, a metal oxide which releases oxygen by a reduction reaction at a high temperature, such as SnO 2 , As 2 O 3 , Sb 2 O 3 , and Fe 2 O 3 , is known, but is not particularly limited. However, use of As 2 O 3 as a fining agent is not desirable from the viewpoint of reducing the environmental load.
清澄工程（ＳＴ２）は、少なくとも清澄槽において行われる。清澄工程では、最初に、清澄槽内の熔融ガラスを昇温することで、溶融ガラス中に含まれる清澄剤に還元反応を起こさせ、Ｏ2を発生させる。このＯ2が、ガラス原料の分解反応やガラス原料中の不純物、溶解時の雰囲気の巻き込み等により、熔融ガラス中に含まれる、ＣＯ2、ＳＯ2あるいはＮ2等を含んだ気泡に吸収されることで、熔融ガラス中の気泡の泡径が拡大し、気泡の浮上速度が高まる。この気泡の浮上速度の向上により熔融ガラスの液面に気泡を浮上させて脱泡が促進される。すなわち、熔融ガラスの液面まで浮上した気泡は、液面で破泡し、気泡に含まれていたガスが清澄槽内の気相空間に放出される。
その後、溶融ガラスの温度を下げていき、清澄剤に酸化反応を起こさせ、溶融ガラス中のＯ2を再吸収させる。このＯ2の再吸収により、脱泡しきれなかった溶融ガラス中の小泡は、泡内のＯ2が脱泡とガラス温度の低下とが相まって、小泡内のガス圧が低下し、縮小消滅する。なお、清澄管は、熔融ガラスから気相空間に放出されたガスを大気に放出するために、大気に連通した通気管を備える。
The fining step (ST2) is performed at least in a fining tank. In the fining step, first, the temperature of the molten glass in the fining tank is raised to cause a reduction reaction in the fining agent contained in the molten glass to generate O 2 . This O 2 is absorbed by bubbles containing CO 2 , SO 2, N 2, etc. contained in the molten glass due to decomposition reaction of the glass raw material, impurities in the glass raw material, entrainment of the atmosphere during melting, and the like. As a result, the bubble diameter of the bubbles in the molten glass increases, and the floating speed of the bubbles increases. By improving the floating speed of the bubbles, the bubbles float on the liquid surface of the molten glass to promote defoaming. That is, the air bubbles that have risen to the liquid surface of the molten glass break at the liquid surface, and the gas contained in the air bubbles is released into the gas phase space in the fining tank.
Thereafter, the temperature of the molten glass is lowered to cause an oxidizing reaction in the fining agent to reabsorb O 2 in the molten glass. The resorption of the O 2, the small bubbles in the molten glass that has not been degassed, together have a reduced O 2 is degassing the glass temperature of Awanai, gas pressure in the small bubbles is reduced, the reduction Disappear. The fining tube is provided with a vent tube communicating with the atmosphere in order to release the gas released from the molten glass into the gas phase space to the atmosphere.
均質化工程（ＳＴ３）では、清澄管から延びる配管を通って供給された攪拌槽内の熔融ガラスを、スターラを用いて攪拌することにより、ガラス成分の均質化を行う。これにより、脈理等の原因であるガラスの組成ムラを低減することができる。
供給工程（ＳＴ４）では、攪拌槽から延びる配管を通して熔融ガラスが成形装置に供給される。
In the homogenization step (ST3), the molten glass in the stirring tank supplied through a pipe extending from the fining tube is stirred using a stirrer to homogenize the glass components. Thereby, it is possible to reduce the composition unevenness of the glass which is a cause of striae and the like.
In the supply step (ST4), the molten glass is supplied to the forming apparatus through a pipe extending from the stirring tank.
成形装置では、成形工程（ＳＴ５）及び徐冷工程（ＳＴ６）が行われる。
成形工程（ＳＴ５）では、熔融ガラスをシートガラスに成形し、シートガラスの流れを作る。成形は、オーバーフローダウンドロー法が用いられる。
徐冷工程（ＳＴ６）では、成形されて流れるシートガラスが所望の厚さになり、内部歪が生じないように、さらに、反りが生じないように冷却される。
切断工程（ＳＴ７）では、切断装置において、成形装置から供給されたシートガラスを所定の長さに切断することで、板状のガラス基板を得る。切断されたガラス基板はさらに、所定のサイズに切断され、目標サイズのガラス基板が作られる。この後、ガラス基板の端面の研削、研磨が行われ、ガラス基板の洗浄が行われ、さらに、気泡等の異常欠陥の有無が検査された後、検査合格品のガラス基板が最終製品として梱包される。
In the forming apparatus, a forming step (ST5) and a slow cooling step (ST6) are performed.
In the forming step (ST5), the molten glass is formed into a sheet glass to create a flow of the sheet glass. For the molding, an overflow down draw method is used.
In the slow cooling step (ST6), the formed sheet glass is cooled to have a desired thickness, not to cause internal distortion, and to prevent warpage.
In the cutting step (ST7), the sheet glass supplied from the forming device is cut into a predetermined length by a cutting device to obtain a plate-like glass substrate. The cut glass substrate is further cut into a predetermined size, and a glass substrate having a target size is produced. After this, the end surface of the glass substrate is ground and polished, the glass substrate is washed, and further inspected for abnormal defects such as bubbles, and then the glass substrate that has passed the inspection is packed as a final product. You.
図２は、本実施形態における熔解工程（ＳＴ１）〜切断工程（ＳＴ７）を行うガラス基板の製造装置の一例を模式的に示す図である。当該装置は、図２に示すように、主に熔解装置１００と、成形装置２００と、切断装置３００と、を有する。熔解装置１００は、熔解炉１０１と、清澄管１０２と、攪拌槽１０３と、ガラス供給管１０４，１０５，１０６と、を有する。 FIG. 2 is a diagram schematically illustrating an example of a glass substrate manufacturing apparatus that performs a melting step (ST1) to a cutting step (ST7) in the present embodiment. As shown in FIG. 2, the apparatus mainly includes a melting device 100, a molding device 200, and a cutting device 300. The melting apparatus 100 includes a melting furnace 101, a fining tube 102, a stirring tank 103, and glass supply tubes 104, 105, and 106.
図２に示す熔解装置１０１では、ガラス原料の投入がバケット１０１ｄを用いて行われるが、原料投入方法に制約は無く、スクリューフィーダー方式や、ブッシュープレート方式の投入機を用いてもよい。
清澄管１０２では、熔融ガラスＭＧの温度を調整して、清澄剤の酸化還元反応を利用して熔融ガラスＭＧの清澄が行われる。さらに、攪拌槽１０３では、スターラ１０３ａによって熔融ガラスＭＧが攪拌されて均質化される。成形装置２００では、成形体２１０を用いたオーバーフローダウンドロー法により、熔融ガラスＭＧからシートガラスＳＧが成形される。
なお、図２に示す熔解炉１０１から成形装置２００にいたる熔融ガラスＭＧの流路、具体的には、ガラス供給管１０４、清澄管１０２、ガラス供給管１０５、攪拌槽１０３、およびガラス供給管１０６の熔融ガラスＭＧの流路を形成する流路内表面は、少なくてもその一部が、白金あるいは白金合金で構成されている。
In the melting apparatus 101 shown in FIG. 2, the charging of the glass raw material is performed using the bucket 101d, but there is no restriction on the raw material charging method, and a screw feeder type or a bush plate type charging machine may be used.
In the fining tube 102, the temperature of the molten glass MG is adjusted, and the molten glass MG is fined by utilizing the oxidation-reduction reaction of the fining agent. Further, in the stirring tank 103, the molten glass MG is stirred and homogenized by the stirrer 103a. In the forming apparatus 200, the sheet glass SG is formed from the molten glass MG by the overflow down draw method using the formed body 210.
The flow path of the molten glass MG from the melting furnace 101 to the forming apparatus 200 shown in FIG. 2, specifically, the glass supply pipe 104, the fining pipe 102, the glass supply pipe 105, the stirring tank 103, and the glass supply pipe 106 At least a part of the inner surface of the flow path forming the flow path of the molten glass MG is made of platinum or a platinum alloy.
（２）ガラス基板
以下、本発明にかかるガラス基板の製造方法の一実施形態について説明する。
本発明の実施形態において製造されるガラス基板は、例えば、フラットパネルディスプレイ用ガラス基板、またはカーブドパネルディスプレイ用ガラス基板で、例えば、液晶ディスプレイ用ガラス基板あるいは、有機ＥＬディスプレイ用のガラス基板として好適である。また、このガラス基板は、その他、携帯端末機器などのディスプレイや筐体用のカバーガラス、タッチパネル板、太陽電池のガラス基板やカバーガラスとしても用いることができる。特に、液晶ディスプレイ用ガラス基板に好適である。その中でも特に熱収縮率の小さいことが要求される、ＬＴＰＳ（低温ポリシリコン）・ＴＦＴや、酸化物半導体・ＴＦＴ、ＩＧＺＯ（Indium-Gallium-Zinc-Oxide）・ＴＦＴディスプレイ用ガラス基板など、パネル製造工程において高温処理を必要とする製品に好適に用いることができる。
(2) Glass Substrate Hereinafter, one embodiment of a method for manufacturing a glass substrate according to the present invention will be described.
The glass substrate manufactured in the embodiment of the present invention is, for example, a glass substrate for a flat panel display, or a glass substrate for a curved panel display, for example, a glass substrate for a liquid crystal display or a glass substrate for an organic EL display. is there. In addition, this glass substrate can also be used as a cover glass for a display or a housing of a mobile terminal device, a touch panel, a glass substrate or a cover glass of a solar cell. In particular, it is suitable for a glass substrate for a liquid crystal display. Among them, panel production such as LTPS (low temperature polysilicon) TFT, oxide semiconductor TFT, IGZO (Indium-Gallium-Zinc-Oxide), glass substrate for TFT display, etc., which require particularly low heat shrinkage. It can be suitably used for products requiring high temperature treatment in the process.
本実施形態において製造されるガラス基板は、特に制限されないが、例えば縦寸法及び横寸法のそれぞれが、５００ｍｍ〜３５００ｍｍ、１５００ｍｍ〜３５００ｍｍ、１８００〜３５００ｍｍ、２０００ｍｍ〜３５００ｍｍなどが挙げられ、２０００ｍｍ〜３５００ｍｍであることが好ましい。
ガラス基板の厚さは、例えば０．０１ｍｍ〜１．１ｍｍである。より好ましくは０．７５ｍｍ以下の極めて薄い矩形形状の板で、例えば、０．５５ｍｍ以下、さらには０．４５ｍｍ以下の厚さがより好ましい。ガラス基板の厚さの下限値としては、０．１５ｍｍ以上が好ましく、０．２５ｍｍ以上がより好ましい。
Although the glass substrate manufactured in the present embodiment is not particularly limited, for example, each of a vertical dimension and a horizontal dimension is, for example, 500 mm to 3500 mm, 1500 mm to 3500 mm, 1800 to 3500 mm, 2000 mm to 3500 mm, and 2000 mm to 3500 mm. Preferably, there is.
The thickness of the glass substrate is, for example, 0.01 mm to 1.1 mm. More preferably, it is an extremely thin rectangular plate having a thickness of 0.75 mm or less, and for example, a thickness of 0.55 mm or less, and more preferably 0.45 mm or less. The lower limit of the thickness of the glass substrate is preferably 0.15 mm or more, more preferably 0.25 mm or more.
本実施形態で製造されるガラス基板として、以下のガラス組成のガラス基板が例示される。つまり、以下のガラス組成のガラス基板が製造されるように、熔融ガラスの原料が調合される。
＜ガラス組成＞
本実施形態が適用するガラス組成として、例えば、次が挙げられる（質量％表示）。
ＳｉＯ２：５０〜７０％（好ましくは、５７〜６４％）、Ａｌ２Ｏ３：５〜２５％（好ましくは、１２〜１８％）、Ｂ２Ｏ３：０〜１５％（好ましくは、６〜１３％）を含み、さらに、次に示す組成を任意に含んでもよい。任意で含む成分として、ＭｇＯ：０〜１０％（好ましくは、０．５〜４％）、ＣａＯ：０〜２０％（好ましくは、３〜７％）、ＳｒＯ：０〜２０％（好ましくは、０．５〜８％、より好ましくは３〜７％）、ＢａＯ：０〜１０％（好ましくは、０〜３％、より好ましくは０〜１％）、ＺｒＯ２：０〜１０％（好ましくは、０〜４％，より好ましくは０〜１％）が挙げられる。さらに、Ｒ’２Ｏ:０．１０％を超え２．０％以下（ただし、Ｒ’はＬｉ、ＮａおよびＫから選ばれる少なくとも１種である）を含むことがより好ましい。
或いは、ＳｉＯ２：５０〜７０％（好ましくは、５５〜６５％）、Ｂ２Ｏ３：０〜１０％（好ましくは、０〜５％、１．３〜５％）、Ａｌ２Ｏ３：１０〜２５％（好ましくは、１６〜２２％）、ＭｇＯ：０〜１０％（好ましくは、０．５〜４％）、ＣａＯ：０〜２０％（好ましくは、２〜１０％、２〜６％）、ＳｒＯ：０〜２０％（好ましくは、０〜４％、０．４〜３％）、ＢａＯ：０〜１５％（好ましくは、４〜１１％）、ＲＯ:５〜２０％（好ましくは、８〜２０％、１４〜１９％）,を含有することが好ましい（ただし、ＲはＭｇ、Ｃａ、ＳｒおよびＢａから選ばれる少なくとも１種である）。さらに、Ｒ’２Ｏが０．１０％を超え２．０％以下（ただし、Ｒ’はＬｉ、ＮａおよびＫから選ばれる少なくとも１種である）を含むことがより好ましい。
さらに本実施形態のガラス基板の物性値として次が挙げられる。
＜ヤング率＞
本実施形態が適用されるガラス基板のヤング率として、例えば、７２（Ｇｐａ）以上が好ましく、７５（Ｇｐａ）以上がより好ましく、７７（Ｇｐａ）以上がより更に好ましい。
＜歪点＞
本実施形態が適用されるガラス基板の歪率として、例えば、６５０℃以上が好ましく、６８０℃以上がより好ましく、７００℃以上、７２０℃以上が更により好ましい。
また、例えば、ガラス基板の液相粘度は、１０4.3ｐｏｉｓｅ〜１０6.7ｐｏｉｓｅである。
もちろん、本発明においては、ガラス基板のガラス組成を限定するものではない。
＜その他＞
本実施形態における熔融ガラスからシートガラスを成形する方法として、フロート法やフュージョン法等が用いられるが、本実施形態のガラス基板のオフラインにおける熱処理を含むガラス基板の製造方法は、フュージョン法（オーバーダウンドロー法）において製造ライン上の徐冷装置を長くすることが困難である点から、フュージョン法に適している。本実施形態の熱処理により熱収縮率を低減する前のガラス基板の熱収縮率は、５０ｐｐｍ以下であり、好ましくは４０ｐｐｍ以下、より好ましくは３０ｐｐｍ以下、更により好ましくは２０ｐｐｍ以下である。熱収縮率を低減する前のガラス基板の熱収縮率の範囲としては、１０ｐｐｍ〜４０ｐｐｍが好ましい。
As a glass substrate manufactured in the present embodiment, a glass substrate having the following glass composition is exemplified. That is, the raw materials of the molten glass are prepared so as to produce a glass substrate having the following glass composition.
<Glass composition>
As the glass composition to which the present embodiment is applied, for example, the following can be cited (in mass%).
SiO 2 : 50 to 70% (preferably 57 to 64%), Al 2 O 3 : 5 to 25% (preferably 12 to 18%), B 2 O 3 : 0 to 15% (preferably 6%) -13%), and may optionally further contain the composition shown below. As optional components, MgO: 0 to 10% (preferably 0.5 to 4%), CaO: 0 to 20% (preferably 3 to 7%), SrO: 0 to 20% (preferably, 0.5 to 8%, more preferably 3~7%), BaO: 0~10% ( preferably 0-3%, more preferably 0~1%), ZrO 2: 0~10 % ( preferably , 0 to 4%, more preferably 0 to 1%). Further, it is more preferable that R ′ 2 O: more than 0.10% and not more than 2.0% (where R ′ is at least one selected from Li, Na and K).
Alternatively, SiO 2: 50~70% (preferably, 55~65%), B 2 O 3: 0~10% ( preferably, 0~5%, 1.3~5%), Al 2 O 3: 10 to 25% (preferably 16 to 22%), MgO: 0 to 10% (preferably 0.5 to 4%), CaO: 0 to 20% (preferably 2 to 10%, 2 to 6%) %), SrO: 0 to 20% (preferably 0 to 4%, 0.4 to 3%), BaO: 0 to 15% (preferably 4 to 11%), RO: 5 to 20% (preferably) (8 to 20%, 14 to 19%) (R is at least one selected from Mg, Ca, Sr and Ba). Further, it is more preferable that R ′ 2 O contains more than 0.10% and not more than 2.0% (where R ′ is at least one selected from Li, Na and K).
Further, physical properties of the glass substrate of the present embodiment include the following.
<Young's modulus>
The Young's modulus of the glass substrate to which the present embodiment is applied is, for example, preferably 72 (Gpa) or more, more preferably 75 (Gpa) or more, and still more preferably 77 (Gpa) or more.
<Strain point>
The strain rate of the glass substrate to which the present embodiment is applied is, for example, preferably 650 ° C. or higher, more preferably 680 ° C. or higher, even more preferably 700 ° C. or higher and 720 ° C. or higher.
Further, for example, the liquidus viscosity of the glass substrate is 10 4.3 poise~10 6.7 poise.
Of course, in the present invention, the glass composition of the glass substrate is not limited.
<Others>
As a method of forming a sheet glass from the molten glass in the present embodiment, a float method, a fusion method, or the like is used. In the present embodiment, a method of manufacturing a glass substrate including off-line heat treatment of the glass substrate is a fusion method (overdown method). The draw method) is suitable for the fusion method because it is difficult to lengthen the slow cooling device on the production line. The heat shrinkage of the glass substrate before the heat shrinkage is reduced by the heat treatment of this embodiment is 50 ppm or less, preferably 40 ppm or less, more preferably 30 ppm or less, and even more preferably 20 ppm or less. The range of the heat shrinkage of the glass substrate before the heat shrinkage is reduced is preferably 10 ppm to 40 ppm.
本実施形態における熔融ガラスからシートガラスを成形する方法として、フロート法やフュージョン法等が用いられるが、本実施形態のガラス基板のオフラインにおける熱処理を含むガラス基板の製造方法は、フュージョン法（オーバーダウンドロー法）において製造ライン上の徐冷装置を長くすることが困難である点から、フュージョン法に適している。 As a method of forming a sheet glass from the molten glass in the present embodiment, a float method, a fusion method, or the like is used. In the present embodiment, a glass substrate manufacturing method including off-line heat treatment of the glass substrate is performed by a fusion method (overdown method). The draw method) is suitable for the fusion method because it is difficult to lengthen the slow cooling device on the production line.
（３）特徴「操業開始時の熔融ガラス処理装置の昇温制御」
図５は、ガラス板の製造において、本実施形態の昇温方法により昇温される溶融ガラスの処理装置の概略図で、処理装置として、ガラス供給管１０４（昇温制御１）、清澄管１０２（昇温制御２）、ガラス供給管１０５（昇温制御３）、攪拌槽１０３（昇温制御４）、およびガラス供給管１０６（昇温制御５）を含む処理装置が示されている。
以下、ガラス板製造における溶融ガラスの処理装置の昇温方法で、熔解炉１０１に接続されたガラス供給管１０４、清澄管１０２、ガラス供給管１０５、攪拌槽１０３、及びガラス供給管１０６を含む処理装置の昇温方法について説明する。
(3) Features "Control of temperature rise of molten glass processing equipment at start of operation"
FIG. 5 is a schematic diagram of a processing apparatus for molten glass whose temperature is increased by the heating method of the present embodiment in the production of a glass sheet. As the processing apparatus, a glass supply pipe 104 (temperature increase control 1), a fining pipe 102 (Temperature control 2), a processing apparatus including a glass supply pipe 105 (temperature control 3), a stirring tank 103 (temperature control 4), and a glass supply pipe 106 (temperature control 5) are shown.
Hereinafter, the process including the glass supply tube 104, the fining tube 102, the glass supply tube 105, the stirring tank 103, and the glass supply tube 106 connected to the melting furnace 101 by a method of raising the temperature of the molten glass processing apparatus in the production of a glass sheet. A method for raising the temperature of the apparatus will be described.
[ガラス供給管１０４の昇温制御]
ガラス供給管１０４の昇温制御について説明する。
熔解炉１０１には、図示されないバーナーおよび電極が設けられている。溶解炉を含むガラス板製造装置の操業を開始する準備が完了したところで、溶解槽１０１内へ清澄剤を含むガラス原料を所定量投入し、投入されたガラス原料をバーナー火焔によるバーナー加熱および通電加熱して、ガラス供給管１０４へ最初（操業開始時）に導入される溶融ガラスＭＧがつくられる。
[Temperature control of glass supply pipe 104]
The control for raising the temperature of the glass supply pipe 104 will be described.
The melting furnace 101 is provided with burners and electrodes (not shown). When the preparation for starting the operation of the glass sheet manufacturing apparatus including the melting furnace is completed, a predetermined amount of a glass material including a fining agent is charged into the melting tank 101, and the charged glass material is burner heated by a burner flame and electrically heated. Then, the molten glass MG to be first introduced into the glass supply pipe 104 (at the start of operation) is produced.
溶解炉１０１でつくられる溶融ガラスＭＧがガラス供給管１０４へ導入される前に、ガラス供給管１０４は、ガラス供給管１０４の操業温度（例えば約１６５０℃）よりも低い温度、例えば約１００℃〜２００℃低い温度、の待機温度Ｔ１で維持される。待機温度Ｔ１で維持されているガラス供給管１０４へ、溶解炉１０１でつくられた溶融ガラスＭＧを所定の流量速度（ｋｇ／ｓ）で導入しつつ、ガラス供給管を操業温度Ｔ２まで昇温する（昇温制御１）（図３）。熔融ガラスの処理装置の待機温度Ｔ１は、熔解炉１０１でつられる熔融ガラス温度、処理装置の供給管１０４におけるガラスの温度条件、操業温度Ｔ２、これらに基づいて設定することができる。 Before the molten glass MG produced in the melting furnace 101 is introduced into the glass supply pipe 104, the glass supply pipe 104 is at a temperature lower than the operating temperature of the glass supply pipe 104 (for example, about 1650 ° C.), for example, about 100 ° C. 200 ° C. lower temperature is maintained at the standby temperature T 1 of the. To glass supply tube 104 which is maintained at a standby temperature T 1, while introducing molten glass MG made in a melting furnace 101 at a predetermined flowrate (kg / s), temperature of the glass supply tube to operating temperature T 2 The temperature is increased (temperature increase control 1) (FIG. 3). Standby temperature T 1 of the processing apparatus of the molten glass, a molten glass temperature Tsurareru in melter 101, the temperature condition of the glass in the supply pipe 104 of the processing unit, operating temperature T 2, can be set on the basis of these.
溶解炉１０１からガラス供給管１０４への溶融ガラスＭＧ導入については、溶融ガラスＭＧからガラス供給管１０４へ持ち込まれる熱量（Ａ）と、ガラス供給管１０４を含む供給管ユニット全体から放熱される放熱量（Ｂ）との関係が（Ａ）＜（Ｂ）となる溶融ガラスＭＧの導入速度（ｋｇ／ｓ）を導入基準流量Ｘ０（ｋｇ／ｓ）とし、導入速度は導入基準流量Ｘ０に基づいて設定され、導入基準流量Ｘ０（ｋｇ／ｓ）を超えないように導入速度が決定され、溶融ガラスＭＧを少しずつ導入する。このように溶融ガラスＭＧの導入流量を規制することで、ガラス供給管１０４を待機温度Ｔ１から操業温度Ｔ２まで昇温するのに最適な装置の昇温幅を確保することができる（図３及び図４）。 Regarding the introduction of the molten glass MG from the melting furnace 101 to the glass supply pipe 104, the amount of heat (A) brought into the glass supply pipe 104 from the molten glass MG and the amount of heat radiated from the entire supply pipe unit including the glass supply pipe 104 The introduction speed (kg / s) of the molten glass MG whose relationship with (B) is (A) <(B) is defined as the introduction reference flow rate X 0 (kg / s), and the introduction speed is based on the introduction reference flow rate X 0 . The introduction speed is determined so as not to exceed the introduction reference flow rate X 0 (kg / s), and the molten glass MG is introduced little by little. By thus regulating the introduction flow rate of the molten glass MG, it is possible to ensure the Atsushi Nobori width of the optimum device for raising the temperature of the glass supply tube 104 from the standby temperature T 1 of up to operating temperature T 2 (FIG. 3 and FIG. 4).
溶解炉１０１からガラス供給管１０４へ溶融ガラスＭＧを導入するのに、上述のような溶融ガラスＭＧの導入速度を規制せず、溶融ガラスＭＧからガラス供給管１０４へ持ち込まれる熱量が、ガラス供給管１０４を含む供給管ユニット全体（保温部材を含む）から放熱される放熱量（Ｂ）を超える導入速度で溶融ガラスが導入されると、ガラス供給管１０４は待機温度Ｔ１から急速な勢いで操業温度Ｔ２を超えて上昇し、ガラス供給管１０４を昇温コントロールすることが不可能となる場合がある。また、急速な勢いで装置温度が上昇し、操業温度Ｔ２を超えた想定以上の高い装置温度となった処理装置を冷却機能などで冷却しても、装置の温度を制御可能な状態とするまでに時間を要する、あるいは、操業の定常状態に入るための温度制御を得るのは困難となる場合がある。 In order to introduce the molten glass MG from the melting furnace 101 to the glass supply pipe 104, the amount of heat brought into the glass supply pipe 104 from the molten glass MG is not limited by the above-described introduction speed of the molten glass MG. When the entire supply tube unit containing 104 molten glass in the introduction rate exceeding the heat radiation amount is radiated from (including heat insulating member) (B) is introduced, the glass supply tube 104 is operating in a rapid pace from the standby temperature T 1 of rises above the temperature T 2, it may become impossible to heated control glass supply tube 104. The device temperature at a rapid pace increases, even when the processing apparatus becomes more than expected high device temperature exceeding the operating temperature T 2 is cooled by such a cooling function, and the temperature can control the state of the apparatus Time may be required, or it may be difficult to obtain temperature control to enter a steady state of operation.
（導入基準流量Ｘ０の算出）
ガラス供給管１０４へ熔融ガラスを導入する際、導入基準流量Ｘ０に基づいて導入速度（ｋｇ／ｓ）を決定し、ガラス供給管１０４の所定の液面位置（例えば、図５のＬ１）まで、少しずつ熔融ガラスＭＧを導入する。待機温度Ｔ１で維持されていたガラス供給管に熔融ガラスＭＧを導入して、ガラス供給管１０４の所定の液面位置まで熔融ガラスで満たし、操業温度Ｔ２まで加熱して操業温度が安定したら、操業温度Ｔ２を維持しながら次工程への熔融ガラスの導入を待機する。
(Calculation of introduction reference flow rate X 0)
When introducing molten glass into the glass supply tube 104, to determine the introduction rate based on the introduction reference flow X 0 (kg / s), a predetermined liquid level position of the glass supply tube 104 (e.g., L 1 in FIG. 5) Until the molten glass MG is introduced little by little. When the molten glass MG is introduced into the glass supply pipe maintained at the standby temperature T 1 , the glass supply pipe 104 is filled with the molten glass up to a predetermined liquid level, and heated to the operation temperature T 2 , and the operation temperature is stabilized. , while maintaining the operating temperature T 2 to wait for the introduction of the molten glass to the next step.
導入基準流量Ｘ０の設定のために、まず、放熱量（Ｂ）を算出する。ガラス供給管１０４への溶融ガラスＭＧ導入の際の放熱量（導入開始から所定の液面位置まで導入する導入時間における放熱量あるいは単位時間あたりの放熱量）を算出するために、流体および構造解析シミュレーションを用いて予測算出することができる。
通常、ガラス供給管１０４は耐火物材料などで覆われ、保温構造が備えられる。待機温度Ｔ１まで加熱された供給管１０４に所定の温度の熔融ガラスＭＧを導入するときの放熱量として、供給管１０４および保温構造に使用されている材料の熱伝導度［Ｗ／ｍ／Ｋ］、さらに、ガラス供給管ユニット周囲の温度等、環境条件を考慮することで、ガラス供給管ユニット全体が外部空間へ放熱する放熱量（Ｂ）をシミュレーションにより算出することができる。あるいは、設備仕様と同等の構成を備えたスケールの小規模な装置で得られた放熱量データを元に、放熱量（Ｂ）を算出してもよい。
For setting the introduction reference flow X 0, first calculates the heat radiation amount (B). Fluid and structural analysis to calculate the amount of heat released when the molten glass MG is introduced into the glass supply pipe 104 (the amount of heat released during the introduction time from the start of introduction to the predetermined liquid level or the amount of heat released per unit time) The prediction can be calculated using a simulation.
Usually, the glass supply pipe 104 is covered with a refractory material or the like, and is provided with a heat retaining structure. As the heat radiation amount when introducing the molten glass MG predetermined temperature in the supply pipe 104 which is heated to the standby temperature T 1, the thermal conductivity of the materials used in the supply pipe 104 and the thermal insulation structure [W / m / K Furthermore, by considering environmental conditions such as the temperature around the glass supply pipe unit, the amount of heat radiation (B) of the entire glass supply pipe unit radiating heat to the external space can be calculated by simulation. Alternatively, the heat radiation amount (B) may be calculated based on the heat radiation amount data obtained by a small-scale device having a configuration equivalent to the equipment specification.
待機温度Ｔ１まで加熱されている供給管１０４に所定の温度の熔融ガラスＭＧを導入する間の放熱量（Ｂ）よりも、導入される熔融ガラスＭＧからガラス供給管１０４へ持ち込まれる持ち込み熱量（Ａ）が小さい熱量となるように、導入基準流量Ｘ０（ｋｇ／ｓ）が設定される。すなわち、熔融ガラス処理装置であるガラス供給管１０４への熔融ガラスＭＧの持ち込み熱量（Ａ）と、ガラス供給管１０４を含む供給管ユニット全体から放熱される放熱量（Ｂ）との関係が、（Ａ）＜（Ｂ）となる溶融ガラスＭＧの導入速度として（ｋｇ／ｓ）導入基準流量Ｘ０が設定される。熔融ガラス処理装置への熔融ガラスＭＧの持ち込み熱量（Ａ）は、ガラスの密度［ｋｇ/ｍ３］、粘度［Ｐａ・ｓ］、比熱［Ｊ/ｋｇ・Ｋ］から計算される。 Heat radiation amount between introducing the molten glass MG standby temperature T 1 of the predetermined temperature to supply pipe 104 which is heated up (B) than, bringing the amount of heat introduced into the glass supply tube 104 from the molten glass MG introduced ( The introduction reference flow rate X 0 (kg / s) is set so that A) has a small amount of heat. That is, the relationship between the amount of heat (A) brought in by the molten glass MG into the glass supply pipe 104 as the molten glass processing apparatus and the amount of heat (B) radiated from the entire supply pipe unit including the glass supply pipe 104 is expressed by ( a) <(B) and made as an introduction rate of the molten glass MG is (kg / s) introduced the reference flow X 0 is set. The amount of heat (A) brought into the molten glass MG into the molten glass processing apparatus is calculated from the density [kg / m 3 ], the viscosity [Pa · s], and the specific heat [J / kg · K] of the glass.
（導入基準流量Ｘ０による導入における液面位置の管理）
溶解炉１０１からガラス供給管１０４へ導入される溶解ガラスＭＧの流量制御（導入速度の制御）については、ガラス供給管１０４の入口付近から出口までに複数の温度計、液面レベル計、流速計、などを備えることにより、導入基準流量Ｘ０に対する変化（差分）をモニタリングして、溶解炉１０１からの溶融ガラスＭＧの導入量（導入速度）をコントロールすることができる。溶融ガラスＭＧの導入流量（ｋｇ／ｓ）が導入基準流量Ｘ０付近に近づいたときには、溶解炉１０１へ投入するガラス原料の量を抑えることで、ガラス供給管へ流出する溶融ガラスＭＧの液位をコントロールして、溶融ガラスＭＧの導入流量を調節してもよい。このような溶融ガラスＭＧの導入速度の導入コントロールを、所定の時間ごとに適切に管理することで、より安定的に溶融ガラスの導入とガラス供給管１０４の昇温制御を実施することができる。
ガラス供給管１０４（昇温制御１）には次工程への導入を待機させる基準位置Ｌ（図５のＬ１）が設定される。上述のとおり導入基準流量Ｘ０に基づいてガラス供給管への導入を規制しつつ供給管１０４を加熱し、基準位置Ｌ１の液面位置まで導入されたところで熔融ガラスＭＧの導入を待機させ供給管１０４の加熱を続ける。
(Management of the liquid surface position in the introduction by introducing a reference flow X 0)
Regarding the flow rate control (control of the introduction speed) of the molten glass MG introduced from the melting furnace 101 to the glass supply pipe 104, a plurality of thermometers, liquid level meters, and flow velocity meters are provided from near the entrance to the exit of the glass supply pipe 104. , by providing the like, can be controlled by monitoring change (difference) to the introduction reference flow X 0, the introduction of the molten glass MG from the melting furnace 101 (introduction rate). When the introduction rate of the molten glass MG (kg / s) is close to the vicinity of the introduction reference flow X 0, by suppressing the amount of glass material to be introduced into the melting furnace 101, the liquid level of the molten glass MG flowing into glass supply tube May be controlled to adjust the introduction flow rate of the molten glass MG. By appropriately managing such introduction control of the introduction speed of the molten glass MG at predetermined time intervals, it is possible to more stably introduce the molten glass and control the temperature of the glass supply pipe 104 to rise.
A reference position L (L 1 in FIG. 5) is set in the glass supply pipe 104 (temperature increase control 1) to wait for introduction to the next process. Based on the introduction reference flow X 0 as described above to heat the supply pipe 104 while restricting the introduction into the glass supply tube, to wait for the introduction of the molten glass MG where introduced to the liquid surface position of the reference position L 1 supplied The heating of the tube 104 is continued.
上述のように、導入基準流量Ｘ０に基づいて溶融ガラスを供給管１０４へ導入する際、ガラス供給管１０４は、流量規制（流量制御）を行いながら待機温度Ｔ１から操業温度Ｔ２まで少しずつ段階的に昇温される。溶融ガラスＭＧの液位が、ガラス供給管１０４の所定の液面位置Ｌ１に達したところで、ガラス供給管１０４の操業温度Ｔ２が一定となる温度制御を確保し、ガラス供給管１０４から清澄管１０２へ溶融ガラスＭＧを導入するのを待機する。
ガラス供給管１０４の液面位置Ｌ１と同じ液面高さ位置を、直前の前工程の熔解炉において特定することで、溶解炉から供給管１０４への熔融ガラスＭＧの導入プロセス（昇温制御１）の終了位置を正確に制御できる。また、このような基準位置（Ｌ１）を直前の工程で特定しておくことで、熔融ガラスの導入速度の導入コントロール手段としても使用することができる（図５）。
As described above, when introducing molten glass into the supply pipe 104 on the basis of the introduced reference flow X 0, the glass supply tube 104 is slightly from the standby temperature T 1 of up to operating temperature T 2 while the flow rate regulating (flow control) The temperature is increased step by step. Clarified liquid level of the molten glass MG is was reached predetermined level position L 1 of the glass supply pipe 104, to ensure temperature control operating temperature T 2 of the glass supply pipe 104 is constant from glass supply tube 104 It waits for the introduction of the molten glass MG into the tube 102.
The same liquid level height as the liquid level position L 1 of the glass supply pipe 104, by identifying the melting furnace just before the previous step, introducing the process (temperature increase control of the molten glass MG to the supply pipe 104 from the melting furnace The end position of 1) can be accurately controlled. Further, by specifying such a reference position (L 1 ) in the immediately preceding step, it can be used as a means for controlling the introduction speed of the molten glass (FIG. 5).
ガラス供給管１０４は、白金あるいは白金合金を用いて構成する、あるいは、白金または白金合金に金属酸化物粒子を分散させた材料で構成することができる。すなわち、ガラス供給管には、白金あるいは白金合金に金属酸化物粒子が分散した強化白金あるいは強化白金合金を用いることができる。 The glass supply pipe 104 can be made of platinum or a platinum alloy, or can be made of a material in which metal oxide particles are dispersed in platinum or a platinum alloy. That is, reinforced platinum or a reinforced platinum alloy in which metal oxide particles are dispersed in platinum or a platinum alloy can be used for the glass supply tube.
ガラス供給管１０４は、アルミナセメント１１４ａで被覆され、その外側には、耐火物レンガ等の断熱部材１１４ｂが積み重ねられて移送管ユニット１１４が形成されている。すなわち、ガラス供給管１０４の周りには、保温構造１１４ｂが設けられている。また、ガラス供給管１０４の両端部１０４ａ，１０４ｂは、フランジ形状を成し、保温構造１１４ｂの外に突出している。本実施形態の両端部１０４ａ，１０４ｂはフランジ形状を成しているが、両端部１０４ａ，１０４ｂが管外部から冷却される限りにおいて、フランジ形状でなくてもよい。 The glass supply pipe 104 is covered with alumina cement 114a, and a heat insulating member 114b such as a refractory brick is stacked on the outside thereof to form a transfer pipe unit 114. That is, the heat retaining structure 114b is provided around the glass supply pipe 104. Further, both ends 104a and 104b of the glass supply pipe 104 have a flange shape, and protrude outside the heat retaining structure 114b. Although both end portions 104a and 104b of the present embodiment have a flange shape, the end shape may not be a flange shape as long as both end portions 104a and 104b are cooled from the outside of the tube.
[昇温制御２から昇温制御５]
本実施形態における処理装置は、上述の熔解炉から清澄管へ熔融ガラスＭＧを所定の温度で移送するガラス供給管１０４のほかに、さらに、熔解炉から熔融ガラスＭＧに含まれるＯ2を脱泡して熔融ガラスを清澄する清澄管と、熔融ガラスＭＧを均質化する攪拌槽と、清澄管から攪拌槽へ熔融ガラスを所定の温度で移送するガラス供給管２と、攪拌槽から成形体へ所定の温度で熔融ガラスＭＧを移送するガラス供給管３と、を備え；
さらに、操業開始時に、前記溶解炉から溶融ガラスを流出させて、上述のガラス供給管１から、清澄管、ガラス供給管２、攪拌槽、ガラス供給管３へと、順に、熔融ガラスＭＧを所定の基準位置まで導入するとき、これらの処理装置の各々において、それぞれの導入基準流量Ｘ０に基づいて熔融ガラスの流量が規制され、それぞれの操業温度Ｔ２まで加熱される（図６）。
[Temperature control 2 to Temperature control 5]
Processing apparatus in this embodiment, in addition to the glass supply tube 104 for transferring the molten glass MG from melter above the finer tube at a predetermined temperature, further degassed O 2 contained the melting furnace molten glass MG A refining tube for refining the molten glass by heating, a stirring tank for homogenizing the molten glass MG, a glass supply pipe 2 for transferring the molten glass from the refining pipe to the stirring tank at a predetermined temperature, and a predetermined A glass supply pipe 3 for transferring the molten glass MG at a temperature of:
Further, at the start of the operation, the molten glass is caused to flow out of the melting furnace, and a predetermined amount of the molten glass MG is sequentially transferred from the glass supply pipe 1 to the fining pipe, the glass supply pipe 2, the stirring tank, and the glass supply pipe 3. when introducing to the reference position, in each of these processing devices, the flow rate of the molten glass on the basis of the respective introduction reference flow X 0 is regulated, it is heated to the respective operating temperature T 2 (FIG. 6).
ガラス供給管１０４から清澄管１０２への溶融ガラスＭＧの導入（昇温制御２）、清澄管１０２からガラス供給管１０５への溶融ガラスＭＧの導入（昇温制御３）、ガラス供給管１０５から攪拌槽１０３への溶融ガラスＭＧの導入（昇温制御４）、攪拌槽１０３からガラス供給管１０６への溶融ガラスＭＧの導入（昇温制御５）についても（図５）、上述の昇温制御１と同様に、処理装置へ持ち込む熔融ガラスＭＧの熱量（Ａ）＜放熱量（Ｂ）となる溶融ガラスの導入速度である導入基準流量Ｘ０（ｋｇ／ｓ）を特定し、導入基準流量Ｘ０に基づいて溶融ガラスの導入量を規制しながら溶融ガラスの処理装置を昇温する。
このように、昇温制御２、昇温制御３、昇温制御４、昇温制御５においても、溶融ガラスＭＧの導入流量を規制することで、待機温度Ｔ１から操業温度Ｔ２まで昇温するのに最適な処理装置の昇温幅を確保することができる（図３及び図４）。
Introduction of molten glass MG from glass supply tube 104 to fining tube 102 (temperature rise control 2), introduction of molten glass MG from fining tube 102 to glass supply tube 105 (temperature rise control 3), stirring from glass supply tube 105 The introduction of the molten glass MG into the tank 103 (temperature rise control 4) and the introduction of the molten glass MG from the stirring tank 103 into the glass supply pipe 106 (temperature rise control 5) (FIG. 5) also involve the above-described temperature rise control 1 Similarly, to identify the heat of the molten glass MG to bring the processor (a) <heat radiation amount (B) and a rate of introduction of molten glass comprising introducing reference flow X 0 (kg / s) and, introducing the reference flow X 0 The temperature of the molten glass processing apparatus is raised while regulating the amount of molten glass introduced based on the above.
Thus, temperature increase control 2, Atsushi Nobori control 3, Atsushi Nobori control 4, also in the Atsushi Nobori control 5, by regulating the introduction flow rate of the molten glass MG, heated from standby temperatures T 1 until operating temperature T 2 Therefore, it is possible to secure an optimum temperature increase range of the processing apparatus (FIGS. 3 and 4).
昇温制御２、昇温制御３、昇温制御４、昇温制御５それぞれにおいても、溶融ガラスＭＧを導入するのに、上述のような溶融ガラスＭＧの導入速度を規制せず、溶融ガラスＭＧから処理装置それぞれに持ち込まれる熱量が、処理装置に備えられる保温機構を含むユニット全体から放熱される放熱量（Ｂ）を超える導入速度で溶融ガラスが導入されると、処理装置は待機温度Ｔ１から急速な勢いで操業温度Ｔ２を超えて上昇し、昇温コントロールすることが不可能となる場合がある。急速な勢いで装置温度が上昇し、操業温度Ｔ２を超えた、想定以上の高い装置温度の状況にある処理装置を冷却機能などで冷却しても、装置の温度を制御可能な状態とするまでに時間を要する、あるいは、操業の定常状態に入るための温度制御を得るのは困難となる場合がある。 In each of the temperature increase control 2, the temperature increase control 3, the temperature increase control 4, and the temperature increase control 5, the molten glass MG is introduced without restricting the introduction speed of the molten glass MG as described above. When the molten glass is introduced at a rate that exceeds the amount of heat (B) radiated from the entire unit including the heat retaining mechanism provided in the processing device, the amount of heat brought into the respective processing devices from the first processing device becomes the standby temperature T 1. rises above the operating temperature T 2 at a rapid pace from, it may become impossible to raise the temperature control. And device temperature at a rapid pace is increased, it exceeds the operating temperature T 2, also to cool the processing device in the situation of more than expected high device temperature such as cooling function, and capable of controlling the temperature of the device state Time may be required, or it may be difficult to obtain temperature control to enter a steady state of operation.
昇温制御２、昇温制御３、昇温制御４、昇温制御５それぞれにおいても、処理装置へ熔融ガラスを導入する際、導入基準流量Ｘ０に基づいて導入速度（ｋｇ／ｓ）を決定して、待機温度Ｔ１にある処理装置の定の液面位置まで、少しずつ熔融ガラスＭＧを導入する。所定の液面位置まで熔融ガラスで満たし、操業温度Ｔ２まで加熱して操業温度が安定したら、操業温度Ｔ２を維持しながら次工程への熔融ガラスの導入を待機する。 Atsushi Nobori control 2, Atsushi Nobori control 3, Atsushi Nobori control 4, temperature increase control 5 also in each case to introduce molten glass to the processor, determine the introduction rate (kg / s) based on the introduction reference flow X 0 and, up to a constant liquid level position of the processing device in a standby temperature T 1, to introduce the molten glass MG gradually. Filled with molten glass to a predetermined liquid level position, once operating temperature has stabilized by heating to operating temperature T 2, while maintaining the operating temperature T 2 to wait for the introduction of the molten glass to the next step.
昇温制御２、昇温制御３、昇温制御４、昇温制御５それぞれにおいても、導入基準流量Ｘ０の設定のために、まず、放熱量（Ｂ）を算出する。供給管１０４と同様にして、溶融ガラスＭＧ導入の際の放熱量（導入開始から所定の液面位置まで導入する導入時間における放熱量あるいは単位時間あたりの放熱量）の算出も、流体および構造解析シミュレーションなどにより算出することができる。熔融ガラス処理装置への熔融ガラスＭＧの持ち込み熱量（Ａ）は、ガラスの密度［ｋｇ/ｍ３］、粘度［Ｐａ・ｓ］、比熱［Ｊ/ｋｇ・Ｋ］から計算される。 Atsushi Nobori control 2, Atsushi Nobori control 3, Atsushi Nobori control 4, also in the Atsushi Nobori control 5 respectively, for setting the introduction reference flow X 0, first calculates the heat radiation amount (B). In the same manner as in the supply pipe 104, the calculation of the amount of heat radiation at the time of introducing the molten glass MG (the amount of heat radiation at the time of introduction from the start of introduction to the predetermined liquid level or the amount of heat radiation per unit time) is also performed by fluid and structural analysis. It can be calculated by simulation or the like. The amount of heat (A) brought into the molten glass MG into the molten glass processing apparatus is calculated from the density [kg / m 3 ], the viscosity [Pa · s], and the specific heat [J / kg · K] of the glass.
昇温制御２、昇温制御３、昇温制御４、昇温制御５それぞれにおいても、待機温度Ｔ１まで加熱されている供給管１０４に所定の温度の熔融ガラスＭＧを導入する間の放熱量（Ｂ）よりも、導入される熔融ガラスＭＧからガラス供給管１０４へ持ち込まれる持ち込み熱量（Ａ）が小さい熱量となるように、導入基準流量Ｘ０（ｋｇ／ｓ）が設定される。 Atsushi Nobori control 2, Atsushi Nobori control 3, Atsushi Nobori control 4, temperature increase control 5 also in each heat radiation amount between introducing the molten glass MG predetermined temperature in the supply pipe 104 which is heated to the standby temperature T 1 of The introduction reference flow rate X 0 (kg / s) is set so that the amount of heat (A) brought into the glass supply pipe 104 from the introduced molten glass MG is smaller than that of (B).
昇温制御２、昇温制御３、昇温制御４、昇温制御５それぞれにおいても、上述と同様、導入基準流量Ｘ０に対する変化（差分）をモニタリングする方法及び手段を備えることができ、溶解炉１０１からの溶融ガラスＭＧの導入量（導入速度）をコントロールすることができる。溶融ガラスＭＧの導入速度の導入コントロールを、所定の時間ごとに適切に管理することで、より安定的に溶融ガラスの導入と処理装置の昇温制御を実施することができる。 Atsushi Nobori control 2, Atsushi Nobori control 3, Atsushi Nobori control 4, temperature increase control 5 also in each as described above, may comprise a method and means for monitoring changes (difference) to the introduction reference flow X 0, dissolution The amount (introduction rate) of the molten glass MG introduced from the furnace 101 can be controlled. By appropriately controlling the introduction control of the introduction speed of the molten glass MG at predetermined time intervals, it is possible to more stably introduce the molten glass and control the temperature rise of the processing apparatus.
上述のように、導入基準流量Ｘ０に基づいて溶融ガラスを供給管１０４へ導入する際、ガラス供給管１０４は、流量規制（流量制御）を行いながら待機温度Ｔ１から操業温度Ｔ２まで少しずつ段階的に昇温される。溶融ガラスＭＧの液位が、ガラス供給管１０４の所定の液面位置Ｌ１に達したところで、ガラス供給管１０４の操業温度Ｔ２が一定となる温度制御を確保し、ガラス供給管１０４から清澄管１０２へ溶融ガラスＭＧを導入するのを待機する。
昇温制御２、昇温制御３、昇温制御４、昇温制御５の処理装置それぞれにおいても、供給管１０４と同様に、次工程へのガラス導入開始を待機するための基準位置を特定するのが好ましい。
As described above, when introducing molten glass into the supply pipe 104 on the basis of the introduced reference flow X 0, the glass supply tube 104 is slightly from the standby temperature T 1 of up to operating temperature T 2 while the flow rate regulating (flow control) The temperature is increased step by step. Clarified liquid level of the molten glass MG is was reached predetermined level position L 1 of the glass supply pipe 104, to ensure temperature control operating temperature T 2 of the glass supply pipe 104 is constant from glass supply tube 104 It waits for the introduction of the molten glass MG into the tube 102.
In each of the processing apparatuses of the temperature raising control 2, the temperature raising control 3, the temperature raising control 4, and the temperature raising control 5, similarly to the supply pipe 104, the reference position for waiting for the start of glass introduction to the next process is specified. Is preferred.
昇温制御２、昇温制御３、昇温制御４、昇温制御５における処理装置も、ガラス供給管１０４と同様に、白金あるいは白金合金を用いて構成する、あるいは、白金または白金合金に金属酸化物粒子を分散させた材料で構成することができる。 Similarly to the glass supply pipe 104, the processing apparatus in the temperature raising control 2, the temperature raising control 3, the temperature raising control 4, and the temperature raising control 5 is also configured by using platinum or a platinum alloy, It can be composed of a material in which oxide particles are dispersed.
以上、本発明を実施の形態により説明したが、本発明は上記実施形態には限定されず、本発明の主旨を逸脱しない範囲において、種々の改良や変更をしてもよいのはもちろんである。 As described above, the present invention has been described with the embodiment. However, the present invention is not limited to the above embodiment, and various modifications and changes may be made without departing from the gist of the present invention. .
以上のとおり、熔融ガラスを処理する処理装置への溶融ガラスＭＧ導入については、それぞれの処理装置において、溶融ガラスＭＧから処理装置へ持ち込まれる熱量（Ａ）と、処理装置ユニット全体から放熱される放熱量（Ｂ）との関係が（Ａ）＜（Ｂ）となる溶融ガラスＭＧの導入速度（ｋｇ／ｓ）を導入基準流量Ｘ０（ｋｇ／ｓ）として、それぞれの導入速度が導入基準流量Ｘ０に基づいて設定され、導入基準流量Ｘ０（ｋｇ／ｓ）に基づいて溶融ガラスＭＧを少しずつ導入する。このように溶融ガラスＭＧの導入流量を規制することで、処理装置それぞれが待機温度Ｔ１から操業温度Ｔ２まで昇温するのに最適な装置の昇温幅を確保することができる（図６）。
処理装置それぞれにおいて、操業開始時に導入基準流量Ｘ０（ｋｇ／ｓ）に基づいて熔融ガラスの導入速度が最適にコントロールされているため、操業初期の処理装置の昇温制御は、昇温異常を招くことなく、また、冷却機能で装置温度を調整するなどの対処する必要がなく、効率的に安定した定常状態に到達できる。さらに、定常状態に異状なくスムーズに到達できるため、処理装置それぞれで目的とする溶融ガラスの温度履歴を形成するという点において有利となり、良い品質のガラス基板を量産できる。
As described above, regarding the introduction of the molten glass MG into the processing apparatus for processing the molten glass, in each processing apparatus, the amount of heat (A) brought into the processing apparatus from the molten glass MG and the heat radiated from the entire processing apparatus unit. Let the introduction speed (kg / s) of the molten glass MG satisfying the relationship (A) <(B) with the calorific value (B) be the introduction reference flow rate X 0 (kg / s), and each introduction speed be the introduction reference flow rate X 0 , and the molten glass MG is introduced little by little based on the introduction reference flow rate X 0 (kg / s). By thus regulating the introduction flow rate of the molten glass MG, can each processor to ensure the Atsushi Nobori width of the optimum device for heating from the standby temperature T 1 of up to operating temperature T 2 (FIG. 6 ).
In each processing apparatus, the introduction speed of the molten glass is optimally controlled based on the introduction reference flow rate X 0 (kg / s) at the start of the operation. There is no need to take measures such as adjusting the device temperature with the cooling function without inviting, and the stable steady state can be reached efficiently. Furthermore, since the steady state can be smoothly reached without any trouble, it is advantageous in that the temperature history of the target molten glass is formed in each processing apparatus, and glass substrates of good quality can be mass-produced.
１０１ 熔解炉（熔解装置）
１０２ 清澄管
１０３ 撹拌槽（攪拌装置）
１０４ ガラス供給管１
１０５ ガラス供給管２
１０６ ガラス供給管３
２００ 成形装置
２１０ 成形体
３００ 切断装置
101 melting furnace (melting equipment)
102 Refining tube 103 Stirring tank (stirring device)
104 Glass supply pipe 1
105 Glass supply pipe 2
106 Glass supply pipe 3
200 molding device 210 molded body 300 cutting device
Claims (7)
操業開始時に、前記溶解炉からの溶融ガラスを前記処理装置へ導入し、前記処理装置を加熱するのに、前記処理装置を操業温度Ｔ２よりも低い待機温度Ｔ１で維持し、溶融ガラスが前記処理装置へ持ち込む熱量（Ａ）および前記処理装置の放熱量（Ｂ）が（Ａ）＜（Ｂ）となる溶融ガラスの導入速度を導入基準流量Ｘ０（ｋｇ／ｓ）とすると、熔融ガラスを導入するとき、所定時間ごと、前記導入基準流量Ｘ０に基づいて前記溶融ガラスの流量を規制して、前記処理装置が操業温度Ｔ２まで加熱される、ことを特徴とするガラス板の製造方法。 A melting step of melting a glass raw material in a melting furnace to produce a molten glass; a melting glass processing step of processing the molten glass using a processing apparatus for processing the molten glass produced in the melting furnace; and And forming a sheet glass by molding the molten glass treated in the step, a method for manufacturing a glass plate,
At start operations, to introduce molten glass from the melting furnace to the processing apparatus, to heat the apparatus, maintaining said processing apparatus at operating temperature T 2 lower standby temperatures T 1 than is the molten glass Assuming that the introduction rate of the molten glass at which the amount of heat (A) brought into the processing apparatus and the amount of heat radiation (B) of the processing apparatus satisfy (A) <(B) is the introduction reference flow rate X 0 (kg / s), the molten glass when introducing, every predetermined time, the introduction reference flow X 0 to regulate the flow rate of the molten glass on the basis of said processing apparatus is heated to operating temperature T 2, the manufacture of glass sheets, characterized in that Method.
操業開始時に、前記溶解炉から溶融ガラスを流出させ、前記ガラス供給管１、前記清澄管、前記ガラス供給管２、前記攪拌槽、前記ガラス供給管３へ、順に、前記熔融ガラスを所定の基準位置まで導入するとき、前記処理装置の各々において、それぞれの前記導入基準流量Ｘ０に基づいて前記熔融ガラスの流量が規制され、それぞれの操業温度Ｔ２まで加熱される、請求項１に記載のガラス板の製造方法。 The processing apparatus includes a finer tube for refining the molten glass was defoamed and O 2 contained in the molten glass from the melting furnace, a stirring tank to homogenize the molten glass, into the finer tube from the melter A glass supply pipe 1 for transferring the molten glass at a predetermined temperature, a glass supply pipe 2 for transferring the molten glass from the fining tube to a stirring tank at a predetermined temperature, and melting at a predetermined temperature from the stirring tank to the molded body. A glass supply pipe 3 for transferring glass,
At the start of operation, the molten glass is allowed to flow out of the melting furnace, and the molten glass is supplied to the glass supply pipe 1, the fining pipe, the glass supply pipe 2, the stirring tank, and the glass supply pipe 3 in this order according to a predetermined standard. when introducing to a position, in each of the processing apparatus, the flow rate of the molten glass on the basis of each of the introduction reference flow X 0 is regulated, it is heated to the respective operating temperature T 2, according to claim 1 Manufacturing method of glass plate.
加熱手段が備えられ、前記熔融ガラスを導入して処理する処理装置と、
前記処理装置で処理された溶融ガラスを成形してシートガラスを形成する成形装置と、を備え、
操業開始時に、前記溶解炉からの溶融ガラスを前記処理装置へ導入し、前記処理装置を加熱するのに、前記処理装置を操業温度Ｔ２よりも低い待機温度Ｔ１で維持し、前記溶融ガラスが前記処理装置へ持ち込む熱量（Ａ）および前記処理装置の放熱量（Ｂ）が（Ａ）＜（Ｂ）となる前記溶融ガラスの導入速度を導入基準流量Ｘ０（ｋｇ／ｓ）とすると、前記熔融ガラスを導入するとき、所定時間ごと、前記導入基準流量Ｘ０に基づいて前記溶融ガラスの流量を規制して、前記処理装置が前記加熱手段により操業温度Ｔ２まで加熱される、ことを特徴とするガラス板の製造装置。 A melting furnace for melting glass raw materials to produce molten glass;
A heating device is provided, and a processing apparatus for introducing and processing the molten glass,
A molding device for molding the molten glass processed by the processing device to form a sheet glass,
At start operations, the molten glass from the melting furnace is introduced into the processing apparatus, to heat the apparatus, maintaining said processing apparatus at operating temperature T 2 lower standby temperatures T 1 than the molten glass Is the introduction reference flow rate X 0 (kg / s) where the amount of heat (A) brought into the processing apparatus and the amount of heat radiation (B) of the processing apparatus satisfy (A) <(B). when introducing the molten glass, every predetermined time, the introduction reference flow X 0 to regulate the flow rate of the molten glass on the basis of said processing apparatus is heated to operating temperature T 2 by the heating means, that Characteristic glass plate manufacturing equipment.
操業開始時に、前記溶解炉から前記溶融ガラスを流出させ、前記ガラス供給管１、前記清澄管、前記ガラス供給管２、前記攪拌槽、前記ガラス供給管３に、順に、前記熔融ガラスを所定の基準位置まで導入するとき、処理装置の各々は、それぞれの前記導入基準流量Ｘ０に基づいて前記熔融ガラスの流量が規制され、それぞれの操業温度Ｔ２まで加熱される、請求項５に記載のガラス板の製造装置。 The processing apparatus includes a finer tube for refining the molten glass was defoamed and O 2 contained in the molten glass, a stirring tank to homogenize the molten glass, the temperature of the molten glass predetermined from the melting furnace to the finer tube A glass supply pipe 1 for transferring the molten glass from the fining tube to the stirring tank at a predetermined temperature, and a glass supply pipe for transferring the molten glass from the stirring tank to the molding at a predetermined temperature. A pipe 3;
At the start of the operation, the molten glass is allowed to flow out of the melting furnace, and the molten glass is supplied to the glass supply tube 1, the fining tube, the glass supply tube 2, the stirring tank, and the glass supply tube 3 in order, in a predetermined manner. when introducing to the reference position, each processing device is the flow rate of the molten glass on the basis of each of the introduction reference flow X 0 is regulated, is heated to the respective operating temperature T 2, according to claim 5 Glass plate manufacturing equipment.
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| CN102892719B (en) * | 2011-03-31 | 2015-11-25 | 安瀚视特控股株式会社 | The manufacture method of sheet glass |
| KR101580070B1 (en) * | 2011-10-11 | 2015-12-29 | 아반스트레이트 가부시키가이샤 | Method of making glass sheet |
| KR101743375B1 (en) * | 2013-12-26 | 2017-06-02 | 아반스트레이트 가부시키가이샤 | Method and apparatus for making glass sheet |
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