JP6624455B2 - Method for producing RTB based sintered magnet - Google Patents

Method for producing RTB based sintered magnet Download PDF

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JP6624455B2
JP6624455B2 JP2016159879A JP2016159879A JP6624455B2 JP 6624455 B2 JP6624455 B2 JP 6624455B2 JP 2016159879 A JP2016159879 A JP 2016159879A JP 2016159879 A JP2016159879 A JP 2016159879A JP 6624455 B2 JP6624455 B2 JP 6624455B2
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宣介 野澤
宣介 野澤
恭孝 重本
恭孝 重本
西内 武司
武司 西内
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Hitachi Metals Ltd
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本発明は、R−T−B系焼結磁石の製造方法に関する。   The present invention relates to a method for manufacturing an RTB based sintered magnet.

R−T−B系焼結磁石(Rは希土類元素のうちの少なくとも一種である。Tは遷移金属元素のうち少なくとも一種でありFeを必ず含む。Bは硼素である)は永久磁石の中で最も高性能な磁石として知られており、ハードディスクドライブのボイスコイルモータ(VCM)、電気自動車用(EV、HV、PHVなど)モータ、産業機器用モータなどの各種モータや家電製品などに使用されている。   RTB-based sintered magnets (R is at least one of rare earth elements; T is at least one of transition metal elements and always includes Fe; B is boron) is a permanent magnet. Known as the most high-performance magnets, they are used in various motors such as voice coil motors (VCM) for hard disk drives, motors for electric vehicles (EV, HV, PHV, etc.), motors for industrial equipment, and home appliances. I have.

R−T−B系焼結磁石は主としてR14B化合物からなる主相とこの主相の粒界部分に位置する粒界相(以下、単に「粒界」という場合がある)とから構成されている。R14B化合物は高い磁化を持つ強磁性相でありR−T−B系焼結磁石の特性の根幹をなしている。 The RTB-based sintered magnet is composed of a main phase mainly composed of an R 2 T 14 B compound and a grain boundary phase located at a grain boundary portion of the main phase (hereinafter, may be simply referred to as “grain boundary”). It is configured. The R 2 T 14 B compound is a ferromagnetic phase having high magnetization, and forms the basis of the characteristics of the RTB based sintered magnet.

R−T−B系焼結磁石は、高温で保磁力HcJ(以下、単に「保磁力」又は「HcJ」という場合がある)が低下するため不可逆熱減磁が起こるという問題がある。そのため、特に電気自動車用モータに使用されるR−T−B系焼結磁石では、高温下でも高いHcJを有する、すなわち室温においてより高いHcJを有することが要求されている。 The RTB -based sintered magnet has a problem that irreversible thermal demagnetization occurs because the coercive force HcJ (hereinafter, sometimes simply referred to as "coercive force" or " HcJ ") decreases at high temperatures. Therefore, in particular, an RTB -based sintered magnet used for an electric vehicle motor is required to have a high H cJ even at a high temperature, that is, a higher H cJ at room temperature.

R−T−B系焼結磁石において、R14B化合物中のRに含まれる軽希土類元素(主としてNd及び/又はPr)の一部を重希土類元素(主としてDy及び/又はTb)で置換すると、HcJが向上することが知られている。重希土類元素の置換量の増加に伴いHcJは向上する。 In the RTB based sintered magnet, a part of the light rare earth element (mainly Nd and / or Pr) contained in R in the R 2 T 14 B compound is replaced with a heavy rare earth element (mainly Dy and / or Tb). It is known that the substitution improves H cJ . H cJ increases with an increase in the substitution amount of heavy rare earth elements.

しかし、R14B化合物中の軽希土類元素を重希土類元素で置換するとR−T−B系焼結磁石のHcJが向上する一方、残留磁束密度Br(以下、単に「Br」という場合がある)が低下する。また、重希土類元素、特にDyなどは資源存在量が少ないうえ産出地が限定されているなどの理由から供給が安定しておらず、価格が大きく変動するなどの問題を有している。そのため、近年、ユーザーから重希土類元素をできるだけ使用することなくHcJを向上させることが求められている。 However, while improving the H cJ of R 2 T 14 B when the light rare earth element in the compound is replaced with the heavy rare-earth element R-T-B based sintered magnet, the remanence B r (hereinafter, simply "B r" May be reduced). In addition, heavy rare earth elements, particularly Dy, have a problem in that supply is not stable due to a small amount of resources and limited production areas, and the price fluctuates greatly. Therefore, in recent years, users have been demanding to improve HcJ without using heavy rare earth elements as much as possible.

特許文献1には、Dyの含有量を低減しつつ保磁力を高めたR−T−B系希土類焼結磁石が開示されている。この焼結磁石の組成は、一般に用いられてきたR−T−B系合金に比べてB量が相対的に少ない特定の範囲に限定され、かつ、Al、Ga、Cuのうちから選ばれる1種以上の金属元素Mを含有している。その結果、粒界にR17相が生成され、このR17相から粒界に形成される遷移金属リッチ相(R13M)の体積比率が増加することにより、HcJが向上する。 Patent Document 1 discloses an RTB-based rare earth sintered magnet in which the coercive force is increased while the content of Dy is reduced. The composition of this sintered magnet is limited to a specific range in which the amount of B is relatively smaller than that of a generally used RTB-based alloy, and is selected from Al, Ga, and Cu. Contains more than one kind of metal element M. As a result, an R 2 T 17 phase is generated at the grain boundary, and the volume ratio of the transition metal rich phase (R 6 T 13 M) formed at the grain boundary from the R 2 T 17 phase is increased, whereby H cJ is increased. Is improved.

国際公開第2013/008756号International Publication No. WO 2013/008756

特許文献1に記載されている方法は、重希土類元素の含有量を低減しつつR−T−B系焼結磁石を高保磁力化できる点で注目に値する。しかし、近年、電気自動車用モータ等の用途において更に高いHcJを有するR−T−B系焼結磁石が求められている。 The method described in Patent Document 1 is noteworthy in that the RTB-based sintered magnet can have a high coercive force while reducing the content of heavy rare earth elements. However, in recent years, there has been a demand for an RTB -based sintered magnet having a higher HcJ in applications such as motors for electric vehicles.

本開示の実施形態は、重希土類元素の含有量を低減しつつ、高いB及び高いHcJを有するR−T−B系焼結磁石の製造方法を提供する。 Embodiments of the present disclosure, while reducing the content of heavy rare earth elements, to provide a method of manufacturing a R-T-B based sintered magnet having a high B r and a high H cJ.

本開示の限定的ではない例示的なR−T−B−Cu−M系焼結磁石の製造方法は、
以下の要件(1)〜(6)を満たすR−T−B−Cu−M系焼結体を準備する工程と、
(1)Rは希土類元素のうち少なくとも一種でありNd及びPrの少なくとも一方を必ず含み、R−T−B−Cu−M系焼結体全体の27mass%以上35mass%以下である。
(2)TはFe又はFeとXであり、XはAl、Si、Ti、V、Cr、Mn、Co、Ni、Zn、Ge、Zr、Nb、Moから選択される一種以上である。
(3)[T]/[B]のmol比が13.0以上14.0以下である。
(4)CuはR−T−B−Cu−M系焼結体全体の0.1mass%以上1.5mass%以下である。
(5)MはGa及びAgの少なくとも一方であり、R−T−B−Cu−M系焼結体全体の0mass%以上1mass%以下である。
(6)不可避的不純物を含んでも良い。
以下の要件(7)〜(11)を満たすR−Ga−Fe−A系合金を準備する工程と、
(7)Rは希土類元素のうち少なくとも一種でありNd及びPrの少なくとも一方を必ず含み、R−Ga−Fe−A系合金全体の35mass%以上91mass%以下である。
(8)GaはR−Ga−Fe−A系合金全体の2.5mass%以上40mass%以下である。
(9)FeはR−Ga−Fe−A系合金全体の4mass%以上40mass%以下である。
(10)AはAl、Si、Ti、V、Cr、Mn、Co、Ni、Zn、Ge、Zr、Nb、Mo、Agから選択される一種以上であり、R−Ga−Fe−A系合金全体の0mass%以上1mass%以下である。
(11)不可避的不純物を含んでも良い。
前記R−T−B−Cu−M系焼結体の表面の少なくとも一部に、前記R−Ga−Fe−A系合金の少なくとも一部を接触させ、真空又は不活性ガス雰囲気中、700℃以上1100℃以下の温度で第一の熱処理を実施する工程と、
前記第一の熱処理が実施されたR−T−B−Cu−M系焼結体に対して、真空又は不活性ガス雰囲気中、450℃以上600℃以下の温度で第二の熱処理を実施する工程と、
を含む、以下の要件(12)〜(17)を満たすR−T−B−Cu−M系焼結磁石の製造方法。
(12)Rは希土類元素のうち少なくとも一種でありNd及びPrの少なくとも一方を必ず含み、R−T−B−Cu−M系焼結磁石全体の27mass%以上35mass%以下である。
(13)TはFe又はFeとXであり、XはAl、Si、Ti、V、Cr、Mn、Co、Ni、Zn、Ge、Zr、Nb、Moから選択される一種以上である。
(14)[T]/[B]のmol比が14.0超である。
(15)CuはR−T−B−Cu−M系焼結磁石全体の0.1mass%以上1.5mass%以下である。
(16)MはGa及びAgの少なくとも一方であり、R−T−B−Cu−M系焼結磁石全体の0.1mass%以上3mass%以下である。
(17)不可避的不純物を含んでいても良い。
A non-limiting exemplary method of manufacturing a R-T-B-Cu-M based sintered magnet of the present disclosure includes:
A step of preparing an RTB-Cu-M-based sintered body satisfying the following requirements (1) to (6):
(1) R is at least one of the rare earth elements and always contains at least one of Nd and Pr, and is 27 mass% or more and 35 mass% or less of the entire RTB-Cu-M-based sintered body.
(2) T is Fe or Fe and X, and X is at least one selected from Al, Si, Ti, V, Cr, Mn, Co, Ni, Zn, Ge, Zr, Nb, and Mo.
(3) The molar ratio of [T] / [B] is 13.0 or more and 14.0 or less.
(4) Cu accounts for 0.1 mass% or more and 1.5 mass% or less of the entire RTB-Cu-M-based sintered body.
(5) M is at least one of Ga and Ag, and is 0 mass% or more and 1 mass% or less of the entire RTB-Cu-M-based sintered body.
(6) Inevitable impurities may be contained.
A step of preparing an R—Ga—Fe—A alloy satisfying the following requirements (7) to (11):
(7) R is at least one of the rare earth elements and always contains at least one of Nd and Pr, and is 35 mass% or more and 91 mass% or less of the entire R-Ga-Fe-A-based alloy.
(8) Ga is not less than 2.5 mass% and not more than 40 mass% of the entire R—Ga—Fe—A alloy.
(9) Fe is at least 4 mass% and not more than 40 mass% of the entire R-Ga-Fe-A alloy.
(10) A is at least one selected from Al, Si, Ti, V, Cr, Mn, Co, Ni, Zn, Ge, Zr, Nb, Mo, and Ag, and is an R-Ga-Fe-A alloy. It is 0 mass% or more and 1 mass% or less of the whole.
(11) Inevitable impurities may be contained.
At least a part of the R-Ga-Fe-A-based alloy is brought into contact with at least a part of the surface of the RTB-Cu-M-based sintered body, and is heated to 700 ° C in a vacuum or an inert gas atmosphere. Performing a first heat treatment at a temperature of not less than 1100 ° C. and
The second heat treatment is performed on the RTB-Cu-M-based sintered body on which the first heat treatment is performed at a temperature of 450 ° C or more and 600 ° C or less in a vacuum or an inert gas atmosphere. Process and
And a method for producing an RTB-Cu-M sintered magnet that satisfies the following requirements (12) to (17).
(12) R is at least one of the rare earth elements and always contains at least one of Nd and Pr, and is 27 mass% or more and 35 mass% or less of the entire RTB-Cu-M-based sintered magnet.
(13) T is Fe or Fe and X, and X is at least one selected from Al, Si, Ti, V, Cr, Mn, Co, Ni, Zn, Ge, Zr, Nb, and Mo.
(14) The molar ratio [T] / [B] is more than 14.0.
(15) Cu accounts for 0.1 mass% or more and 1.5 mass% or less of the entire RTB-Cu-M-based sintered magnet.
(16) M is at least one of Ga and Ag, and is 0.1 mass% or more and 3 mass% or less of the whole RTB-Cu-M-based sintered magnet.
(17) Inevitable impurities may be contained.

ある実施形態において、前記R−Ga−Fe−A系合金は重希土類元素を含有していない。   In one embodiment, the R-Ga-Fe-A-based alloy does not contain a heavy rare earth element.

ある実施形態において、前記R−Ga−Fe−A系合金中のRの50mass%以上がPrである。   In one embodiment, at least 50 mass% of R in the R-Ga-Fe-A-based alloy is Pr.

ある実施形態において、前記R−T−B−Cu−M系焼結体の重希土類元素は1mass%以下である。   In one embodiment, the heavy rare earth element of the RTB-Cu-M-based sintered body is 1 mass% or less.

ある実施形態において、前記R−T−B−Cu−M系焼結体を準備する工程は、原料合金を3μm以上10μm以下に粉砕した後、磁界中で成形し、焼結を行うことを含む。   In one embodiment, the step of preparing the RTB-Cu-M-based sintered body includes, after pulverizing the raw material alloy to 3 μm or more and 10 μm or less, molding in a magnetic field, and performing sintering. .

本開示の実施形態によると、重希土類元素の含有量を低減しつつ、高いB及び高いHcJを有するR−T−B系焼結磁石(本開示のR−T−B−Cu−M系焼結磁石に相当)の製造方法を提供することができる。 According to embodiments of the present disclosure, while reducing the content of heavy rare-earth element, the R-T-B based sintered magnet (the disclosure having high B r and a high H cJ R-T-B- Cu-M (Corresponding to a sintered sintered magnet).

本開示によるR−T−B−Cu−M系焼結磁石の製造方法における工程の例を示すフローチャートである。It is a flowchart which shows the example of the process in the manufacturing method of the RTB-Cu-M sintered magnet by this indication. R−T−B−Cu−M系焼結磁石の主相と粒界相を示す模式図である。It is a schematic diagram which shows the main phase and grain boundary phase of RTB-Cu-M type sintered magnet. 図2Aの破線矩形領域内を更に拡大した模式図である。FIG. 2B is a schematic diagram further enlarging the inside of a broken-line rectangular area in FIG. 2A. 熱処理工程におけるR−T−B−Cu−M系合金焼結体とR−Ga−Fe−A系合金との配置形態を模式的に示す説明図である。It is explanatory drawing which shows typically the arrangement form of RTB-Cu-M type alloy sintered compact and R-Ga-Fe-A type alloy in a heat treatment process.

本開示によるR−T−B−Cu−M系焼結磁石の製造方法は、図1に示す様に、R−T−B−Cu−M系焼結体を準備する工程S10と、R−Ga−Fe−A系合金を準備する工程S20とを含む。R−T−B−Cu−M系焼結体を準備する工程S10と、R−Ga−Fe−A系合金を準備する工程S20との順序は任意であり、それぞれ、異なる場所で製造されたR−T−B−Cu−M系焼結体及びR−Ga−Fe−A系合金を用いてもよい。   As shown in FIG. 1, a method for manufacturing an RTB-Cu-M based sintered magnet according to the present disclosure includes a step S10 of preparing an RTB-Cu-M based sintered body; Preparing a Ga-Fe-A-based alloy. The order of the step S10 of preparing an RTB-Cu-M-based sintered body and the step S20 of preparing an R-Ga-Fe-A-based alloy are arbitrary, and they are respectively manufactured at different locations. An RTB-Cu-M-based sintered body and an R-Ga-Fe-A-based alloy may be used.

本開示において、第二の熱処理前及び第二の熱処理中のR−T−B−Cu−M系焼結磁石をR−T−B−Cu−M系焼結体と称し、第二の熱処理後のR−T−B−Cu−M系焼結磁石を単にR−T−B−Cu−M系焼結磁石と称する。   In the present disclosure, the RTB-Cu-M-based sintered magnet before and during the second heat treatment is referred to as an RTB-Cu-M-based sintered body, and the second heat treatment is performed. The subsequent RTB-Cu-M-based sintered magnet is simply referred to as RTB-Cu-M-based sintered magnet.

R−T−B−Cu−M系焼結体は、以下の要件(1)〜(6)を満たす。
(1)Rは希土類元素のうち少なくとも一種でありNd及びPrの少なくとも一方を必ず含み、R−T−B−Cu−M系焼結体全体の27mass%以上35mass%以下である。
(2)TはFe又はFeとXであり、XはAl、Si、Ti、V、Cr、Mn、Co、Ni、Zn、Ge、Zr、Nb、Moから選択される一種以上である。
(3)[T]/[B]のmol比が13.0以上14.0以下である。
(4)CuはR−T−B−Cu−M系焼結体全体の0.1mass%以上1.5mass%以下である。
(5)MはGa及びAgの少なくとも一方であり、R−T−B−Cu−M系焼結体全体の0mass%以上1mass%以下である。
(6)不可避的不純物を含んでも良い。
なお、本開示においては、Mが0mass%の場合であってもR−T−B−Cu−M系焼結体と称することとする。
前記(3)[T]/[B]のmol比が14.0以下であるということは、Bの含有量がR14B化合物の化学量論組成比よりも多い(又は同じ)、すなわち、主相(R14B化合物)形成に使われるT量に対して相対的にB量が多い(又は同じ)ことを意味している。
The RTB-Cu-M-based sintered body satisfies the following requirements (1) to (6).
(1) R is at least one of the rare earth elements and always contains at least one of Nd and Pr, and is 27 mass% or more and 35 mass% or less of the entire RTB-Cu-M-based sintered body.
(2) T is Fe or Fe and X, and X is at least one selected from Al, Si, Ti, V, Cr, Mn, Co, Ni, Zn, Ge, Zr, Nb, and Mo.
(3) The molar ratio of [T] / [B] is 13.0 or more and 14.0 or less.
(4) Cu accounts for 0.1 mass% or more and 1.5 mass% or less of the entire RTB-Cu-M-based sintered body.
(5) M is at least one of Ga and Ag, and is 0 mass% or more and 1 mass% or less of the entire RTB-Cu-M-based sintered body.
(6) Inevitable impurities may be contained.
In the present disclosure, even when M is 0 mass%, it is referred to as an RTB-Cu-M-based sintered body.
(3) The fact that the molar ratio of [T] / [B] is 14.0 or less means that the B content is higher (or the same) than the stoichiometric composition ratio of the R 2 T 14 B compound. That is, it means that the amount of B is relatively large (or the same) with respect to the amount of T used for forming the main phase (R 2 T 14 B compound).

R−Ga−Fe−A系合金は、以下の要件(7)〜(11)を満たす。
(7)Rは希土類元素のうち少なくとも一種でありNd及びPrの少なくとも一方を必ず含み、R−Ga−Fe−A系合金全体の35mass%以上91mass%以下である。

(8)GaはR−Ga−Fe−A系合金全体の2.5mass%以上40mass%以下である。
(9)FeはR−Ga−Fe−A系合金全体の4mass%以上40mass%以下である。
(10)AはAl、Si、Ti、V、Cr、Mn、Co、Ni、Zn、Ge、Zr、Nb、Mo、Agから選択される一種以上であり、R−Ga−Fe−A系合金全体の0mass%以上1mass%以下である。
(11)不可避的不純物を含んでも良い。
なお、本開示においては、Aが0mass%の場合であってもR−Ga−Fe−A系合金と称することとする。
The R-Ga-Fe-A alloy satisfies the following requirements (7) to (11).
(7) R is at least one of the rare earth elements and always contains at least one of Nd and Pr, and is 35 mass% or more and 91 mass% or less of the entire R-Ga-Fe-A-based alloy.

(8) Ga is not less than 2.5 mass% and not more than 40 mass% of the entire R—Ga—Fe—A alloy.
(9) Fe is at least 4 mass% and not more than 40 mass% of the entire R-Ga-Fe-A alloy.
(10) A is at least one selected from Al, Si, Ti, V, Cr, Mn, Co, Ni, Zn, Ge, Zr, Nb, Mo, and Ag, and is an R-Ga-Fe-A alloy. It is 0 mass% or more and 1 mass% or less of the whole.
(11) Inevitable impurities may be contained.
In the present disclosure, even when A is 0 mass%, it is referred to as an R-Ga-Fe-A-based alloy.

R−T−B−Cu−M系焼結磁石(第二の熱処理後のR−T−B−Cu−M系焼結磁石)は、以下の要件(12)〜(17)を満たす。
(12)Rは希土類元素のうち少なくとも一種でありNd及びPrの少なくとも一方を必ず含み、R−T−B−Cu−M系焼結磁石全体の27mass%以上35mass%以下である。
(13)TはFe又はFeとXであり、XはAl、Si、Ti、V、Cr、Mn、Co、Ni、Zn、Ge、Zr、Nb、Moから選択される一種以上である。
(14)[T]/[B]のmol比が14.0超である。
(15)CuはR−T−B−Cu−M系焼結磁石全体の0.1mass%以上1.5mass%以下である。
(16)MはGa及びAgの少なくとも一方であり、R−T−B−Cu−M系焼結磁石全体の0.1mass%以上3mass%以下である。
(17)不可避的不純物を含んでいても良い。
前記(14)[T]/[B]のmol比が14.0超であるということは、Bの含有量がR14B化合物の化学量論組成比よりも少ない、すなわち、主相(R14B化合物)形成に使われるT量に対して相対的にB量が少ないことを意味している。
The RTB-Cu-M-based sintered magnet (RTB-Cu-M-based sintered magnet after the second heat treatment) satisfies the following requirements (12) to (17).
(12) R is at least one of the rare earth elements and always contains at least one of Nd and Pr, and is 27 mass% or more and 35 mass% or less of the entire RTB-Cu-M-based sintered magnet.
(13) T is Fe or Fe and X, and X is at least one selected from Al, Si, Ti, V, Cr, Mn, Co, Ni, Zn, Ge, Zr, Nb, and Mo.
(14) The molar ratio [T] / [B] is more than 14.0.
(15) Cu accounts for 0.1 mass% or more and 1.5 mass% or less of the entire RTB-Cu-M-based sintered magnet.
(16) M is at least one of Ga and Ag, and is 0.1 mass% or more and 3 mass% or less of the whole RTB-Cu-M-based sintered magnet.
(17) Inevitable impurities may be contained.
(14) The fact that the molar ratio of [T] / [B] is more than 14.0 means that the B content is smaller than the stoichiometric composition ratio of the R 2 T 14 B compound, that is, the main phase. It means that the amount of B is relatively small with respect to the amount of T used for forming (R 2 T 14 B compound).

本開示によるR−T−B−Cu−M系焼結磁石の製造方法は、主相(R14B化合物)形成に使われるT量に対して化学量論比で相対的にB量が多い(又は同じ、すなわち、[T]/[B]のmol比が14.0以下である)R−T−B−Cu−M系焼結体の表面の少なくとも一部にR−Ga−Fe−A系合金を接触させ、図1に示す様に、真空又は不活性ガス雰囲気中、700℃以上1100℃以下の温度で第一の熱処理を実施する工程S30と、この第一の熱処理が実施されたR−T−B−Cu−M系焼結体に対して真空又は不活性ガス雰囲気中、450℃以上600℃以下の温度で第二の熱処理を実施する工程S40を行うことで、主相形成に使われるT量に対して相対的にB量が少ないR−T−B−Cu−M系焼結磁石を作製する。第一の熱処理を実施する工程S30と、第二の熱処理を実施する工程S40との間に他の工程、例えば冷却工程などが実行され得る。 The method of manufacturing an RTB-Cu-M sintered magnet according to the present disclosure provides a method of forming a B phase in a stoichiometric ratio relative to a T phase used for forming a main phase (R 2 T 14 B compound). (Or the same, that is, the molar ratio of [T] / [B] is 14.0 or less) on at least a part of the surface of the RTB-Cu-M-based sintered body. As shown in FIG. 1, a first heat treatment is performed at a temperature of 700 ° C. or more and 1100 ° C. or less in a vacuum or an inert gas atmosphere, as shown in FIG. By performing the step S40 of performing the second heat treatment on the performed RTB-Cu-M-based sintered body in a vacuum or an inert gas atmosphere at a temperature of 450 ° C or higher and 600 ° C or lower, Production of RTB-Cu-M sintered magnets with a relatively small B content relative to the T content used for main phase formation I do. Another step, for example, a cooling step, may be performed between the step S30 of performing the first heat treatment and the step S40 of performing the second heat treatment.

まず、R−T−B−Cu−M系焼結磁石の基本構造を説明する。
R−T−B−Cu−M系焼結磁石は、原料合金の粉末粒子が焼結によって結合した構造を有しており、主としてR14B化合物からなる主相と、この主相の粒界部分に位置する粒界相とから構成されている。
図2Aは、R−T−B−Cu−M系焼結磁石の主相と粒界相を示す模式図であり、図2Bは図1Aの破線矩形領域内を更に拡大した模式図である。図2Aには、一例として長さ5μmの矢印が大きさを示す基準の長さとして参考のために記載されている。図2A及び図2Bに示されるように、R−T−B−Cu−M系焼結磁石は、主としてR14B化合物からなる主相12と、主相12の粒界部分に位置する粒界相14とから構成されている。また、粒界相14は、図2Bに示されるように、2つのR14B化合物粒子(グレイン)が隣接する二粒子粒界相14aと、3つ以上のR14B化合物粒子が隣接する粒界三重点14bとを含む。
主相12であるRB化合物は高い飽和磁化と異方性磁界を持つ強磁性材料である。したがって、R−T−B−Cu−M系焼結磁石では、主相12であるR14B化合物の存在比率を高めることによってBを向上させることができる。R14B化合物の存在比率を高めるためには、原料合金中のR量、T量、B量を、R14B化合物の化学量論比(R量:T量:B量=2:14:1)に近づければよい。R14B化合物を形成するためのB量又はR量が化学量論比を下回ると、一般的には、粒界相14にFe相又はR17相等の磁性体が生成し、HcJが急激に低下する。
First, the basic structure of the RTB-Cu-M based sintered magnet will be described.
The RTB-Cu-M based sintered magnet has a structure in which powder particles of a raw material alloy are bonded by sintering, and a main phase mainly composed of an R 2 T 14 B compound and a main phase of the main phase. And a grain boundary phase located at the grain boundary portion.
FIG. 2A is a schematic diagram illustrating a main phase and a grain boundary phase of the RTB-Cu-M based sintered magnet, and FIG. 2B is a schematic diagram further enlarging the inside of a broken-line rectangular region in FIG. 1A. In FIG. 2A, as an example, an arrow having a length of 5 μm is described as a reference length indicating the size for reference. As shown in FIGS. 2A and 2B, the RTB-Cu-M based sintered magnet is located at a main phase 12 mainly composed of an R 2 T 14 B compound and at a grain boundary portion of the main phase 12. And a grain boundary phase 14. Further, as shown in FIG. 2B, the grain boundary phase 14 includes a two grain boundary phase 14a in which two R 2 T 14 B compound particles (grains) are adjacent to each other, and three or more R 2 T 14 B compound particles. And the adjacent grain boundary triple point 14b.
The R 2 T 4 B compound that is the main phase 12 is a ferromagnetic material having a high saturation magnetization and an anisotropic magnetic field. Therefore, in the R-T-B-Cu- M -based sintered magnet, it is possible to improve the B r by increasing the existence ratio of R 2 T 14 B compound is the main phase 12. In order to increase the abundance ratio of the R 2 T 14 B compound, the amount of R, the amount of T, and the amount of B in the raw material alloy are determined by the stoichiometric ratio of the R 2 T 14 B compound (R amount: T amount: B amount = 2: 14: 1). When the amount of B or R for forming the R 2 T 14 B compound falls below the stoichiometric ratio, generally, a magnetic material such as an Fe phase or an R 2 T 17 phase is generated in the grain boundary phase 14, HcJ drops sharply.

特許文献1に記載されている方法では、B量をR14B化合物の化学量論比よりも少なくし、且つ、Al、Ga、Cuのうちから選ばれる1種以上の金属元素Mを含有することで、R17相から粒界に遷移金属リッチ相(R13M)を生成させてHcJを向上させている。しかし、本発明者らは検討の結果、R−T−Ga相(R13M)は原料合金段階では生成し難くその後の熱処理時に生成され易いことがわかった。そして、特許文献1に記載されている方法の様に原料合金段階から低B組成(B量がR14B化合物の化学量論比よりも少ない組成)にすると、原料合金段階において粒界にR17相等が多く残存し、それにより最終的に得られる焼結磁石のHcJを低下させていることがわかった。そのため、高いHcJを得るためには、原料合金段階では高B組成(B量がR14B化合物の化学量論比よりも多い(又は同じ)組成)にしてR17相等の生成を抑制させる必要がある。
本発明者らは更に検討の結果、高B且つ特定の組成を有するR−T−B−Cu−M系焼結体の表面の少なくとも一部に、R−Ga−Fe−A系合金を接触させて特定の熱処理を実施することにより、R−Ga−Fe−A系合金中のFeをR−T−B−Cu−M系焼結体内部に導入し、熱処理後のR−T−B−Cu−M系焼結磁石を低B組成にする(FeをR−T−B−Cu−M系焼結体内部に導入することで相対的にB量をR14B化合物の化学量論比よりも少なくする)ことができることを見い出した。通常Feを含む合金(例えばDyFeやTbFe)を熱処理等により磁石表面から導入させても1mass%以下程度の少量しか磁石内部に導入されないため、[T]/[B]のmol比が14.0以下の磁石を14.0超にすることは困難である。本開示におけるR−T−B−Cu−M系焼結磁石の製造方法は、特定組成のR−T−B−Cu−M系焼結体の表面に特定組成のR、Ga、Feを全て含む合金を接触させることで、[T]/[B]のmol比が14.0超となるために必要な量のFeを磁石表面から内部に導入させることを可能とする。これにより、特許文献1に記載されている方法の様な最初(原料合金段階)から低B組成の場合と比べて、原料合金段階におけるR217相等の生成を抑制することができるため、より高いHcJを得ることができると考えられる。更に、最初(原料合金段階)から低B組成且つGa等を含有する組成(例えば特許文献1に記載されている組成)の場合、R−T−Ga相は磁石内部にほぼ均一に生成される。これに対し、本開示によるR−T−B−Cu−M系焼結磁石の製造方法は、磁石表面よりR、Ga、Feを導入させることで、最も耐熱性の要求される磁石表面付近で最も効率的にHcJを向上させることができ、その結果、Brの低下を抑えることができる。
In the method described in Patent Document 1, the amount of B is made smaller than the stoichiometric ratio of the R 2 T 14 B compound, and one or more metal elements M selected from Al, Ga, and Cu are removed. By containing, a transition metal-rich phase (R 6 T 13 M) is generated at the grain boundary from the R 2 T 17 phase, thereby improving HcJ . However, the present inventors have found that the RT-Ga phase (R 6 T 13 M) is hardly generated in the raw material alloy stage and is easily generated in the subsequent heat treatment. When a low B composition (a composition in which the amount of B is smaller than the stoichiometric ratio of the R 2 T 14 B compound) is obtained from the raw alloy stage as in the method described in Patent Document 1, the grain boundary in the raw alloy stage It was found that a large amount of R 2 T 17 phase and the like remained, thereby lowering the HcJ of the finally obtained sintered magnet. Therefore, in order to obtain a high HcJ , a high B composition (a composition in which the amount of B is larger than (or the same as) the stoichiometric ratio of the R 2 T 14 B compound) is used in the raw material alloy stage to obtain an R 2 T 17 phase or the like. It is necessary to suppress generation.
The present inventors further studied and found that an R-Ga-Fe-A-based alloy was brought into contact with at least a part of the surface of an RTB-Cu-M-based sintered body having a high B and a specific composition. By performing a specific heat treatment, Fe in the R-Ga-Fe-A-based alloy is introduced into the RTB-Cu-M-based sintered body, and the RTB after the heat treatment is introduced. the -cu-M based sintered magnet to a low B composition (Fe chemistry R-T-B-Cu- M -based sintered body within a relatively B amount by introducing R 2 T 14 B compound Less than the stoichiometric ratio). Usually, even if an alloy containing Fe (for example, DyFe or TbFe) is introduced from the magnet surface by heat treatment or the like, only a small amount of about 1 mass% or less is introduced into the magnet, so that the molar ratio of [T] / [B] is 14.0. It is difficult to make the following magnets more than 14.0. The method for manufacturing an RTB-Cu-M-based sintered magnet according to the present disclosure includes the steps of: adding a specific composition of R, Ga, and Fe to the surface of an RTB-Cu-M-based sintered body having a specific composition; By bringing the alloys into contact with each other, it becomes possible to introduce the necessary amount of Fe from the magnet surface to the inside so that the molar ratio of [T] / [B] exceeds 14.0. As a result, the generation of the R 2 T 17 phase and the like in the raw material alloy stage can be suppressed as compared with the case of the low B composition from the beginning (raw alloy stage) as in the method described in Patent Document 1. It is believed that higher HcJ can be obtained. Furthermore, in the case of a low B composition and a composition containing Ga or the like (for example, a composition described in Patent Document 1) from the beginning (raw material alloy stage), the R-T-Ga phase is generated almost uniformly inside the magnet. . On the other hand, the method of manufacturing the RTB-Cu-M based sintered magnet according to the present disclosure introduces R, Ga, and Fe from the magnet surface, so that the heat resistance is required in the vicinity of the most heat-resistant magnet surface. most efficiently can be improved H cJ, can be suppressed as a result, decrease in B r.

(R−T−B−Cu−M系焼結体を準備する工程)
まず、R−T−B−Cu−M系焼結体(以下、単に「焼結体」という場合がある)を準備する工程における焼結体の組成を説明する。
Rは希土類元素のうち少なくとも一種でありNd及びPrの少なくとも一方を必ず含む。更に、R−T−B−Cu−M系焼結体のHcJを向上させるために一般的に用いられるDy、Tb、Gd、Hoなどの重希土類元素を少量含有してもよい。但し、本開示は前記重希土類元素を多量に用いずとも十分に高いHcJを得ることができる。そのため、前記重希土類元素の含有量はR−T−B−Cu−M系焼結体の1mass%以下(R−T−B−Cu−M系焼結体中の重希土類元素が1mass%以下)であることが好ましく、0.5mass%以下であることがより好ましく、含有しない(実質的に0mass%)ことがさらに好ましい。
(Step of Preparing RTB-Cu-M Sintered Body)
First, the composition of a sintered body in a step of preparing an RTB-Cu-M-based sintered body (hereinafter, may be simply referred to as a “sintered body”) will be described.
R is at least one of the rare earth elements and always contains at least one of Nd and Pr. Further, a small amount of heavy rare earth elements such as Dy, Tb, Gd, and Ho generally used for improving HcJ of the RTB -Cu-M-based sintered body may be contained. However, the present disclosure can obtain a sufficiently high HcJ without using a large amount of the heavy rare earth element. Therefore, the content of the heavy rare earth element is 1 mass% or less of the RTB-Cu-M-based sintered body (the heavy rare earth element in the RTB-Cu-M-based sintered body is 1 mass% or less. ), More preferably 0.5 mass% or less, and even more preferably not containing (substantially 0 mass%).

RはR−T−B−Cu−M系焼結体全体の27mass%以上35mass%以下である。Rが27mass%未満では焼結過程で液相が十分に生成せず、R−T−B−Cu−M系焼結体を十分に緻密化することが困難になる。一方、Rが35mass%を超えても本開示の効果を得ることはできるが、R−T−B−Cu−M系焼結体の製造工程中における合金粉末が非常に活性になり、合金粉末の著しい酸化や発火などを生じることがあるため、35mass%以下が好ましい。Rは28mass%以上33mass%以下であることがより好ましく、28.5mass%以上32mass%以下であることがさらに好ましい。   R is at least 27 mass% and not more than 35 mass% of the entire RTB-Cu-M sintered body. When R is less than 27 mass%, a liquid phase is not sufficiently generated in the sintering process, and it is difficult to sufficiently densify the RTB-Cu-M-based sintered body. On the other hand, although the effect of the present disclosure can be obtained even if R exceeds 35 mass%, the alloy powder during the manufacturing process of the RTB-Cu-M-based sintered body becomes very active, Since it may cause significant oxidation or ignition, the content is preferably 35 mass% or less. R is more preferably 28 mass% or more and 33 mass% or less, and even more preferably 28.5 mass% or more and 32 mass% or less.

TはFe又はFeとXであり、XはAl、Si、Ti、V、Cr、Mn、Co、Ni、Zn、Ge、Zr、Nb、Mo、から選択される一種以上である。すなわち、TはFeのみであってもよいし、FeとXからなってもよい。TがFeとXからなる場合、T全体に対するFe量は80mass%以上であることが好ましい。   T is Fe or Fe and X, and X is at least one selected from Al, Si, Ti, V, Cr, Mn, Co, Ni, Zn, Ge, Zr, Nb, and Mo. That is, T may be only Fe or may be composed of Fe and X. When T is composed of Fe and X, the amount of Fe with respect to the entire T is preferably 80 mass% or more.

前記TとBとは、[T]/[B]のmol比が13.0以上14.0以下となるように設定する。[T]/[B]のmol比が13.0未満であると、最終的に得られるR−T−B−Cu−M系焼結磁石の[T]/[B]のmol比を14.0超にすることができず、高いHcJを得ることができない恐れがある。一方、[T]/[B]のmol比が14.0を超えると、原料段階におけるR17相等の生成を抑制することができず、高いHcJを得ることができない。[T]/[B]のmol比が14.0以下という条件は、主相(R14B化合物)形成に使われるT量に対して相対的にB量が多い(又は同じ)ことを示している。また、BはR−T−B−Cu−M系焼結体全体の0.9mass%以上1.1mass%未満が好ましい。 T and B are set such that the molar ratio of [T] / [B] is 13.0 or more and 14.0 or less. When the molar ratio of [T] / [B] is less than 13.0, the molar ratio of [T] / [B] of the finally obtained RTB-Cu-M-based sintered magnet is 14 0.0, and there is a possibility that a high HcJ cannot be obtained. On the other hand, when the molar ratio of [T] / [B] exceeds 14.0, generation of the R 2 T 17 phase or the like in the raw material stage cannot be suppressed, and a high HcJ cannot be obtained. The condition that the molar ratio of [T] / [B] is 14.0 or less means that the amount of B is relatively large (or the same) relative to the amount of T used for forming the main phase (R 2 T 14 B compound). Is shown. Further, B is preferably 0.9 mass% or more and less than 1.1 mass% of the entire RTB-Cu-M-based sintered body.

CuはR−T−B−Cu−M系焼結体全体の0.1mass%以上1.5mass%以下である。Cuが0.1mass%未満であると、後述する第一の熱処理で拡散が十分に進行せず、[T]/[B]のmol比を14.0超にすることができず、高いHcJを得ることができない恐れがある。一方、Cuが1.5mass%を超えるとBが低下する恐れがある。 Cu accounts for 0.1 mass% or more and 1.5 mass% or less of the entire RTB-Cu-M-based sintered body. If Cu is less than 0.1 mass%, diffusion does not sufficiently proceed in the first heat treatment described later, and the molar ratio of [T] / [B] cannot be increased to more than 14.0. There is a possibility that cJ cannot be obtained. On the other hand, there is a possibility that Cu is lowered B r exceeds 1.5 mass%.

MはGa及びAgの少なくとも一方であり、Mは0mass%以上1mass%以下である。Mを含有しなくても本開示の効果を奏することができるが、特にGaを少量(0.2mass%程度)含有させた方がより高いHcJを得ることができるため好ましい。 M is at least one of Ga and Ag, and M is 0 mass% or more and 1 mass% or less. Although the effects of the present disclosure can be achieved without containing M, it is particularly preferable to contain a small amount of Ga (about 0.2 mass%) because a higher HcJ can be obtained.

さらに、R−T−B−Cu−M系焼結体は、Ndメタル、Prメタル、ジジム合金(Nd−Pr)、電解鉄、フェロボロンなどの合金中及び製造工程中に通常含有される不可避的不純物及び少量の上記以外の元素を含んでいても良い。例えば、La、Ce、Sm、Ca、Mg、O(酸素)、N(炭素)、C(窒素)、Hf、Ta、Wなどをそれぞれ含有してもよい。   Further, the RTB-Cu-M-based sintered body is inevitably contained in alloys such as Nd metal, Pr metal, dymium alloy (Nd-Pr), electrolytic iron, ferroboron, and during the manufacturing process. It may contain impurities and a small amount of other elements. For example, it may contain La, Ce, Sm, Ca, Mg, O (oxygen), N (carbon), C (nitrogen), Hf, Ta, W, etc., respectively.

次にR−T−B−Cu−M系焼結体を準備する工程について説明する。R−T−B−Cu−M系焼結体を準備する工程は、Nd−Fe−B系焼結磁石に代表される一般的な製造方法を用いて準備することができる。一例を挙げると、ストリップキャスト法などで作製された原料合金を、ジェットミル装置などを用いて3μm以上10μm以下に粉砕した後、磁界中で成形し、900℃以上1100℃以下の温度で焼結することにより準備することができる。原料合金の粉砕粒径(気流分散式レーザー回折法による測定で得られる体積中心値=D50)が3μm未満では粉砕粉を作製するのが非常に困難であり、生産効率が大幅に低下するため好ましくない。一方、粉砕粒径が10μmを超えると最終的に得られるR−T−B−Cu−M系焼結体の結晶粒径が大きくなり過ぎ、高いHcJを得ることが困難となるため好ましくない。粉砕粒径は好ましくは、3μm以上5μm以下である。 Next, a step of preparing an RTB-Cu-M-based sintered body will be described. The step of preparing the RTB-Cu-M-based sintered body can be performed using a general manufacturing method represented by a Nd-Fe-B-based sintered magnet. For example, a raw material alloy manufactured by a strip casting method or the like is crushed to 3 μm or more and 10 μm or less using a jet mill or the like, then molded in a magnetic field, and sintered at a temperature of 900 ° C. to 1100 ° C. Can be prepared. When the pulverized particle size of the raw material alloy (the volume center value obtained by measurement by an airflow dispersion type laser diffraction method = D50) is less than 3 μm, it is very difficult to produce a pulverized powder, and the production efficiency is greatly reduced, which is preferable. Absent. On the other hand, when the crushed particle size exceeds 10 μm, the crystal grain size of the finally obtained RTB -Cu-M-based sintered body becomes too large, and it is difficult to obtain a high HcJ, which is not preferable. . The pulverized particle size is preferably 3 μm or more and 5 μm or less.

R−T−B−Cu−M系焼結体は、前記の各条件を満たしていれば、一種類の原料合金(単一原料合金)から作製してもよいし、二種類以上の原料合金を用いてそれらを混合する方法(ブレンド法)によって作製してもよい。また、得られたR−T−B−Cu−M系焼結体は、切断や切削など公知の機械加工を行った後後述する第一の熱処理及び第二の熱処理を実施してもよい。   The RTB-Cu-M-based sintered body may be made of one kind of raw material alloy (single raw material alloy) or two or more kinds of raw material alloys as long as the above conditions are satisfied. May be produced by a method of blending them (blend method). The obtained RTB-Cu-M-based sintered body may be subjected to a first heat treatment and a second heat treatment described later after performing known machining such as cutting and cutting.

(R−Ga−Fe−A系合金を準備する工程)
まず、R−Ga−Fe−A系合金を準備する工程におけるR−Ga−Fe−A系合金の組成を説明する。以下に説明する特定の範囲でR、Ga、Feを全て含有することにより、後述する第一の熱処理を実施する工程においてR−Ga−Fe−A系合金中のFeをR−T−B−Cu−M系焼結体内部に導入することができる。
Rは希土類元素のうち少なくとも一種でありNd及びPrの少なくとも一方を必ず含む。Rの50%以上がPrであることが好ましい。より高いHcJを得ることができるからである。ここで「Rの50%以上がPrである」とは、例えばRがR−Ga−Fe−A系合金中におけるRが50mass%である場合、25mass%以上がPrであることを言う。さらに好ましくは、RはPrのみ(不可避的不純物は含む)である。さらに高いHcJを得ることができる。また、Dy、Tb、Gd、Hoなどの重希土類元素を少量含有してもよい。但し、本開示は前記重希土類元素を多量に用いずとも十分に高いHcJを得ることができる。そのため、前記重希土類元素の含有量はR−Ga−Fe−A系合金全体の10mass%以下(R−Ga−Fe−A系合金中の重希土類元素が10mass%以下)であることが好ましく、5mass%以下であることがより好ましく、含有しない(実質的に0mass%)ことがさらに好ましい。R−Ga−Fe−A系合金のRに前記重希土類元素を含有する場合も、Rの50%以上がPrであることが好ましく、重希土類元素を除いたRがPrのみ(不可避的不純物は含む)であることがより好ましい。
(Step of Preparing R-Ga-Fe-A Alloy)
First, the composition of the R-Ga-Fe-A-based alloy in the step of preparing the R-Ga-Fe-A-based alloy will be described. By containing all of R, Ga, and Fe in a specific range described below, Fe in the R-Ga-Fe-A-based alloy is converted to RTB- It can be introduced inside the Cu-M based sintered body.
R is at least one of the rare earth elements and always contains at least one of Nd and Pr. Preferably, at least 50% of R is Pr. This is because higher HcJ can be obtained. Here, "50% or more of R is Pr" means that, for example, when R is 50 mass% in an R-Ga-Fe-A-based alloy, 25 mass% or more is Pr. More preferably, R is only Pr (including unavoidable impurities). Higher HcJ can be obtained. Further, a small amount of heavy rare earth elements such as Dy, Tb, Gd, and Ho may be contained. However, the present disclosure can obtain a sufficiently high HcJ without using a large amount of the heavy rare earth element. Therefore, the content of the heavy rare earth element is preferably 10 mass% or less of the entire R-Ga-Fe-A alloy (the heavy rare earth element in the R-Ga-Fe-A alloy is 10 mass% or less), The content is more preferably 5% by mass or less, and further preferably not contained (substantially 0% by mass). Even when the heavy rare earth element is contained in R of the R—Ga—Fe—A alloy, it is preferable that 50% or more of R is Pr, and R excluding heavy rare earth element is only Pr (inevitable impurities are Is more preferable.

RはR−Ga−Fe−A系合金全体の35mass%以上91mass%以下である。Rが35mass%未満では後述する第一の熱処理で拡散が十分に進行せず、[T]/[B]のmol比を14.0超にすることができず、高いHcJを得ることができない恐れがある。一方、Rが91mass%を超えても本開示の効果を得ることはできるが、R−Ga−Fe−A系合金の製造工程中における合金粉末が非常に活性になり、合金粉末の著しい酸化や発火などを生じることがあるため、91mass%以下が好ましい。Rは50mass%以上91mass%以下であることがより好ましく、60mass%以上85mass%以下であることがさらに好ましい。より高いHcJを得ることができるからである。 R is 35 mass% or more and 91 mass% or less of the entire R-Ga-Fe-A alloy. When R is less than 35 mass%, diffusion does not sufficiently proceed in the first heat treatment described below, and the [T] / [B] molar ratio cannot be more than 14.0, so that a high HcJ can be obtained. It may not be possible. On the other hand, although the effect of the present disclosure can be obtained even if R exceeds 91 mass%, the alloy powder during the manufacturing process of the R-Ga-Fe-A-based alloy becomes very active, and significant oxidation and Since ignition or the like may occur, 91 mass% or less is preferable. R is more preferably not less than 50 mass% and not more than 91 mass%, further preferably not less than 60 mass% and not more than 85 mass%. This is because higher HcJ can be obtained.

Gaは、R−Ga−Fe−A系合金全体の2.5mass%以上40mass%以下である。Gaが2.5mass%未満では、後述する第1の熱処理を実施する工程においてR−Ga−Fe−A系合金中のFeがR−T−B−Cu−M系焼結体の内部に導入され難くなる。これにより、最終的に得られるR−T−B−Cu−M系焼結磁石の[T]/[B]のmol比を14.0超とすることができず、高いHcJを得ることができない。一方、Gaが40mass%以上であると、Bが大幅に低下する恐れがある。Gaは4mass%以上30mass%以下であることがより好ましく、4mass%以上20mass%以下であることがさらに好ましい。より高いHcJを得ることができるからである。 Ga is 2.5 mass% or more and 40 mass% or less of the entire R-Ga-Fe-A-based alloy. If Ga is less than 2.5 mass%, Fe in the R-Ga-Fe-A-based alloy is introduced into the RTB-Cu-M-based sintered body in a step of performing a first heat treatment described later. It is hard to be done. As a result, the [T] / [B] molar ratio of the finally obtained RTB -Cu-M based sintered magnet cannot be more than 14.0, and a high HcJ can be obtained. Can not. On the other hand, if Ga is greater than or equal to 40 mass%, there is a possibility that B r is greatly reduced. Ga is more preferably 4 mass% or more and 30 mass% or less, and still more preferably 4 mass% or more and 20 mass% or less. This is because higher HcJ can be obtained.

Feは、R−Ga−Fe−A系合金全体の4mass%以上40mass%以下である。Feが4mass%未満では、後述する第1の熱処理を実施する工程においてR−Ga−Fe−A系合金中のFeのR−T−B−Cu−M系焼結体への導入量が少なすぎるため、最終的に得られるR−T−B−Cu−M系焼結磁石の[T]/[B]のmol比を14.0超とすることができず、高いHcJを得ることができない。一方、Feが40mass%以上であると、後述する第一の熱処理で拡散が十分に進行せず、[T]/[B]のmol比を14.0超にすることができず、高いHcJを得ることができない恐れがある。Feは4mass%以上30mass%以下であることがより好ましく、4mass%以上25mass%以下であることがさらに好ましい。より高いHcJを得ることができるからである。 Fe is 4 mass% or more and 40 mass% or less of the entire R-Ga-Fe-A-based alloy. When Fe is less than 4 mass%, the amount of Fe introduced into the RTB-Cu-M-based sintered body in the R-Ga-Fe-A-based alloy in the step of performing the first heat treatment described below is small. Since the molar ratio of [T] / [B] of the finally obtained RTB -Cu-M based sintered magnet cannot exceed 14.0, a high HcJ is obtained. Can not. On the other hand, if Fe is 40 mass% or more, diffusion does not sufficiently proceed in the first heat treatment described later, and the [T] / [B] molar ratio cannot be increased to more than 14.0, and high H There is a possibility that cJ cannot be obtained. Fe is more preferably 4 mass% or more and 30 mass% or less, even more preferably 4 mass% or more and 25 mass% or less. This is because higher HcJ can be obtained.

Aは、Al、Si、Ti、V、Cr、Mn、Co、Ni、Zn、Ge、Zr、Nb、Mo、Agから選択される一種以上であり、R−Ga−Fe−A系合金全体の0mass%以上1mass%以下である。Aは1mass%以下含有しても構わないが、より高いHcJを得るためには、Aは含有しない(すなわち0mass%)の方が好ましい。 A is at least one selected from Al, Si, Ti, V, Cr, Mn, Co, Ni, Zn, Ge, Zr, Nb, Mo, and Ag. It is 0 mass% or more and 1 mass% or less. A may be contained at 1 mass% or less, but in order to obtain a higher HcJ , it is preferable that A is not contained (that is, 0 mass%).

さらに、R−Ga−Fe−A系合金は、Ndメタル、Prメタル、ジジム合金(Nd−Pr)、電解鉄などの合金中及び製造工程中に通常含有される不可避的不純物及び少量の上記以外の元素を含んでいても良い。例えば、La、Ce、Sm、Ca、Mg、O(酸素)、N(炭素)、C(窒素)、Hf、Ta、Wなどをそれぞれ含有してもよい。   Further, R-Ga-Fe-A alloys are unavoidable impurities and a small amount other than those described above which are usually contained in alloys such as Nd metal, Pr metal, dymium alloy (Nd-Pr), electrolytic iron and in the manufacturing process. May be included. For example, it may contain La, Ce, Sm, Ca, Mg, O (oxygen), N (carbon), C (nitrogen), Hf, Ta, W, etc., respectively.

次にR−Ga−Fe−A系合金を準備する工程について説明する。R−Ga−Fe−A系合金は、Nd−Fe−B系焼結磁石に代表される一般的な製造方法において採用されている原料合金の作製方法、例えば、金型鋳造法やストリップキャスト法や単ロール超急冷法(メルトスピニング法)やアトマイズ法などを用いて準備することができる。また、R−Ga−Fe−A系合金は、前記によって得られた合金をピンミルなどの公知の粉砕手段によって粉砕されたものであってもよい。   Next, a step of preparing an R-Ga-Fe-A-based alloy will be described. The R-Ga-Fe-A-based alloy is a method for producing a raw material alloy used in a general manufacturing method represented by a Nd-Fe-B-based sintered magnet, for example, a die casting method or a strip casting method. And a single-roll ultra-quenching method (melt spinning method) or an atomizing method. Further, the R-Ga-Fe-A-based alloy may be obtained by pulverizing the alloy obtained as described above by a known pulverizing means such as a pin mill.

(第一の熱処理を実施する工程)
前記によって準備したR−T−B−Cu−M系焼結体の表面の少なくとも一部に、前記R−Ga−Fe−A系合金の少なくとも一部を接触させ、真空又は不活性ガス雰囲気中、700℃以上1100℃以下の温度で熱処理をする。本開示においてこの熱処理を第一の熱処理という。これにより、R−Ga−Fe−A系合金からGaやFeを含む液相が生成し、その液相がR−T−B−Cu−M系焼結体の粒界を経由して焼結体表面から内部に拡散導入される。第一の熱処理温度が700℃以下であると、GaやFeを含む液相量が少なすぎて後述する第二の熱処理を実施する工程により生成されるR−T−Ga相の生成量が少なくなったり、最終的に得られるR−T−B−Cu−M系焼結磁石の[T]/[B]のmol比を14.0超とすることができず、高いHcJを得ることが出来ない。一方、1100℃を超えるとHcJが低下する恐れがある。熱処理温度は、750℃以上900℃以下が好ましい。より高いHcJを得ることが出来るからである。なお、熱処理時間はR−T−B−Cu−M系焼結体やR−Ga−Fe−A系合金の組成や寸法、熱処理温度などによって適正値を設定するが、5分以上20時間以下が好ましく、10分以上15時間以下がより好ましく、30分以上10時間以下がさらに好ましい。
(Step of performing first heat treatment)
At least a part of the R-Ga-Fe-A-based alloy is brought into contact with at least a part of the surface of the RTB-Cu-M-based sintered body prepared as described above, and the mixture is placed in a vacuum or an inert gas atmosphere. The heat treatment is performed at a temperature of 700 ° C. to 1100 ° C. In the present disclosure, this heat treatment is referred to as a first heat treatment. As a result, a liquid phase containing Ga and Fe is generated from the R-Ga-Fe-A-based alloy, and the liquid phase is sintered through the grain boundaries of the RTB-Cu-M-based sintered body. It is diffused and introduced from the body surface to the inside. When the first heat treatment temperature is 700 ° C. or lower, the amount of the liquid phase containing Ga and Fe is too small, and the amount of the R—T—Ga phase generated in the step of performing the second heat treatment described below is small. In addition, the [T] / [B] molar ratio of the finally obtained RTB -Cu-M based sintered magnet cannot be more than 14.0, and a high HcJ can be obtained. Can not do. On the other hand, if it exceeds 1100 ° C., HcJ may decrease. The heat treatment temperature is preferably from 750 ° C to 900 ° C. This is because higher HcJ can be obtained. The heat treatment time is set to an appropriate value depending on the composition, dimensions, heat treatment temperature, etc. of the RTB-Cu-M-based sintered body or the R-Ga-Fe-A-based alloy. Is preferably 10 minutes or more and 15 hours or less, and more preferably 30 minutes or more and 10 hours or less.

第一の熱処理は、R−T−B−Cu−M系焼結体表面に、任意形状のR−Ga−Fe−A系合金を配置し、公知の熱処理装置を用いて行うことができる。例えば、R−T−B−Cu−M系焼結体表面をR−Ga−Fe−A系合金の粉末層で覆い、第一の熱処理を行うことができる。例えば、R−Ga−Fe−A系合金を分散媒中に分散させたスラリーをR−T−B−Cu−M系焼結体表面に塗布した後、分散媒を蒸発させてR−Ga−Fe−A系合金とR−T−B−Cu−M系焼結体とを接触させてもよい。また、後述する実験例に示す様に、R−Ga−Fe−A系合金は、R−T−B−Cu−M系焼結体の配向方向に対して垂直な表面に接触させるように配置することが好ましい。なお、分散媒として、アルコール(エタノール等)、アルデヒド及びケトンを例示できる。また、第一の熱処理が実施されたR−T−B−Cu−M系焼結体に対して切断や切削など公知の機械加工を行ってもよい。   The first heat treatment can be performed by disposing an R-Ga-Fe-A-based alloy having an arbitrary shape on the surface of the RTB-Cu-M-based sintered body and using a known heat treatment apparatus. For example, the first heat treatment can be performed by covering the surface of an RTB-Cu-M-based sintered body with a powder layer of an R-Ga-Fe-A-based alloy. For example, after a slurry in which an R-Ga-Fe-A-based alloy is dispersed in a dispersion medium is applied to the surface of an RT-B-Cu-M-based sintered body, the dispersion medium is evaporated to remove R-Ga- The Fe-A-based alloy may be brought into contact with the RTB-Cu-M-based sintered body. Further, as shown in an experimental example described later, the R-Ga-Fe-A-based alloy is arranged so as to be in contact with a surface perpendicular to the orientation direction of the RTB-Cu-M-based sintered body. Is preferred. In addition, alcohol (ethanol etc.), aldehyde, and ketone can be illustrated as a dispersion medium. In addition, known mechanical processing such as cutting or cutting may be performed on the RTB-Cu-M-based sintered body subjected to the first heat treatment.

(第二の熱処理を実施する工程)
第一の熱処理が実施されたR−T−B−Cu−M系焼結体に対して、真空又は不活性ガス雰囲気中、450℃以上600℃以下の温度で熱処理を行う。本開示においてこの熱処理を第二の熱処理という。第二の熱処理を行うことにより、焼結磁石内部の少なくとも一部にR−T−Ga相、典型的にはR13Z相(ZはCu及び/又はGaを必ず含む)を生成させる。これにより、GaやCuを含む厚い二粒子粒界が得られ、高いHcJを得ることができる。第二の熱処理の温度が450℃未満及び600℃超の場合は、R−T−Ga相の生成量が少なすぎて、高いHcJを得ることができない恐れがある。熱処理温度は、480℃以上560℃以下が好ましい。より高いHcJを得ることが出来る。なお、熱処理時間はR−T−B−Cu−M系焼結体の組成や寸法、熱処理温度などによって適正値を設定するが、5分以上20時間以下が好ましく、10分以上15時間以下がより好ましく、30分以上10時間以下がさらに好ましい。
(Step of performing second heat treatment)
The heat treatment is performed on the RTB-Cu-M-based sintered body subjected to the first heat treatment at a temperature of 450 ° C. or more and 600 ° C. or less in a vacuum or an inert gas atmosphere. In the present disclosure, this heat treatment is referred to as a second heat treatment. By performing the second heat treatment, an RT—Ga phase, typically an R 6 T 13 Z phase (Z always contains Cu and / or Ga) is generated in at least a part of the inside of the sintered magnet. . Thereby, a thick two-particle grain boundary containing Ga and Cu is obtained, and a high HcJ can be obtained. When the temperature of the second heat treatment is lower than 450 ° C. or higher than 600 ° C., the amount of the generated RT—Ga phase may be too small to obtain a high HcJ . The heat treatment temperature is preferably from 480 ° C to 560 ° C. Higher HcJ can be obtained. The heat treatment time is set to an appropriate value depending on the composition, dimensions, heat treatment temperature, etc. of the RTB-Cu-M sintered body, but is preferably 5 minutes to 20 hours, and preferably 10 minutes to 15 hours. The time is more preferably 30 minutes or more and 10 hours or less.

なお、前記のR13Z相(R13Z化合物)において、Rは希土類元素のうち少なくとも一種でありPr及びNdの少なくとも一方を必ず含み、Tは遷移金属元素のうち少なくとも一種でありFeを必ず含む。R13Z化合物は代表的にはNdFe13Ga化合物である。また、R13Z化合物はLaCo11Ga型結晶構造を有する。R13Z化合物はその状態によってはR13−δ1+δ化合物になっている場合がある。なお、R−T−B−Cu−M系焼結磁石中に比較的多くのCu、Al及びSiが含有される場合、R13−δ(Ga1−a−b−cCuaAlbSic1+δになっている場合がある。 In the R 6 T 13 Z phase (R 6 T 13 Z compound), R is at least one of rare earth elements and always contains at least one of Pr and Nd, and T is at least one of transition metal elements. Yes Always contains Fe. The R 6 T 13 Z compound is typically a Nd 6 Fe 13 Ga compound. Further, the R 6 T 13 Z compound has a La 6 Co 11 Ga 3- type crystal structure. R 6 T 13 Z compound depending on its state in some cases have become R 6 T 13-δ Z 1 + δ compound. When a relatively large amount of Cu, Al and Si are contained in the RTB-Cu-M sintered magnet, R 6 T 13-δ (Ga 1-a-b-c Cu a Al there may have been a b Si c) 1 + δ.

(R−T−B−Cu−M系焼結磁石)
前記第二の熱処理を実施する工程後のR−T−B−Cu−M系焼結磁石の組成について説明する。
尚、R−T−B−Cu−M系焼結磁石におけるR、T及びCuについては、上述したR−T−B−Cu−M系焼結体と同じ組成であるため、説明を省略する。
前記TとBとは、[T]/[B]のmol比が14.0超となるように設定する。[T]/[B]のmol比が14.0超にすることにより高いHcJを得ることができる。この条件は、主相(R14B化合物)形成に使われるT量に対して相対的にB量が少ないことを示している。また、BはR−T−B−Cu−M系焼結磁石全体の0.8mass%以上1.0mass%未満が好ましい。Bが0.8mass%未満であると、Brの大幅な低下を招く恐れがあるため好ましくない。一方、Bが1.0mass%以上であると[T]/[B]のmol比を14.0超にできず高いHcJを得ることができない。Bは0.81mass%以上0.95mass%以下であることがより好ましく、0.82mass%以上0.93mass%以下であることがさらに好ましい。MはGa及びAgの少なくとも一方であり、Mは0.1mass%以上3mass%以下である。Mが0.1mass%未満であると高いHcJが得られない恐れがあり、3mass%を超えるとBが低下する恐れがある。
(RTB-Cu-M based sintered magnet)
The composition of the RTB-Cu-M sintered magnet after the step of performing the second heat treatment will be described.
Note that R, T, and Cu in the RTB-Cu-M-based sintered magnet have the same composition as that of the RTB-Cu-M-based sintered body described above, and a description thereof will not be repeated. .
T and B are set such that the molar ratio of [T] / [B] is more than 14.0. When the molar ratio of [T] / [B] exceeds 14.0, a high HcJ can be obtained. This condition indicates that the amount of B is relatively small with respect to the amount of T used for forming the main phase (R 2 T 14 B compound). B is preferably 0.8 mass% or more and less than 1.0 mass% of the entire RTB-Cu-M-based sintered magnet. B is less than 0.8 mass%, undesirably can lead to significant reduction in B r. On the other hand, if B is 1.0 mass% or more, the molar ratio of [T] / [B] cannot exceed 14.0 and a high HcJ cannot be obtained. B is more preferably 0.81% by mass or more and 0.95% by mass or less, and even more preferably 0.82% by mass or more and 0.93% by mass or less. M is at least one of Ga and Ag, and M is 0.1 mass% or more and 3 mass% or less. M is there may not be obtained is the high H cJ less than 0.1mass%, there is a possibility that B r decreases exceeds 3 mass%.

さらに、R−T−B−Cu−M系焼結磁石は、Ndメタル、Prメタル、ジジム合金(Nd−Pr)、電解鉄、フェロボロンなどの合金中及び製造工程中に通常含有される不可避的不純物及び少量の上記以外の元素を含んでいても良い。例えば、La、Ce、Sm、Ca、Mg、O(酸素)、N(炭素)、C(窒素)、Hf、Ta、Wなどをそれぞれ含有してもよい。   Further, the RTB-Cu-M based sintered magnet is an unavoidable component usually contained in alloys such as Nd metal, Pr metal, dymium alloy (Nd-Pr), electrolytic iron, ferroboron and in the manufacturing process. It may contain impurities and a small amount of other elements. For example, it may contain La, Ce, Sm, Ca, Mg, O (oxygen), N (carbon), C (nitrogen), Hf, Ta, W, etc., respectively.

前記の第二の熱処理を実施する工程によって得られたR−T−B−Cu−M系焼結磁石は、切断や切削など公知の機械加工を行ったり、耐食性を付与するためのめっきなど、公知の表面処理を行うことができる。   The RTB-Cu-M-based sintered magnet obtained by the step of performing the second heat treatment is subjected to known machining such as cutting and cutting, plating for imparting corrosion resistance, and the like. A known surface treatment can be performed.

本発明を実施例によりさらに詳細に説明するが、本発明はそれらに限定されるものではない。   The present invention will be described in more detail with reference to examples, but the present invention is not limited thereto.

実験例1
[R−T−B−Cu−M系焼結体(焼結体)を準備する工程]
焼結体がおよそ表1の符号1−Aから1−Kに示す組成となるように、各元素を秤量しストリップキャスト法により鋳造し、厚み0.2〜0.4mmのフレーク状の原料合金を得た。得られたフレーク状の原料合金を水素粉砕した後、550℃まで真空中で加熱後冷却する脱水素処理を施し粗粉砕粉を得た。次に、得られた粗粉砕粉に、潤滑剤としてステアリン酸亜鉛を粗粉砕粉100mass%に対して0.04mass%添加、混合した後、気流式粉砕機(ジェットミル装置)を用いて、窒素気流中で乾式粉砕し、粉砕粒径D50が4μmの微粉砕粉(合金粉末)を得た。なお、粉砕粒径D50は、気流分散法によるレーザー回折法で得られた体積中心値(体積基準メジアン径)である。
Experimental example 1
[Step of Preparing RTB-Cu-M Sintered Body (Sintered Body)]
Each element is weighed and cast by a strip casting method so that the sintered body has a composition shown by reference numerals 1-A to 1-K in Table 1, and a flake-shaped raw material alloy having a thickness of 0.2 to 0.4 mm is formed. Got. The obtained flake-form raw material alloy was pulverized with hydrogen, and then subjected to a dehydrogenation treatment of heating to 550 ° C. in a vacuum and then cooling to obtain a coarsely pulverized powder. Next, 0.04 mass% of zinc stearate as a lubricant was added to the obtained coarse pulverized powder with respect to 100 mass% of the coarse pulverized powder, and the mixture was mixed with an air-flow type pulverizer (jet mill device). Dry pulverization was performed in an air stream to obtain a finely pulverized powder (alloy powder) having a pulverized particle diameter D50 of 4 μm. The pulverized particle size D50 is a volume center value (volume-based median diameter) obtained by a laser diffraction method using an airflow dispersion method.

前記微粉砕粉に、潤滑剤としてステアリン酸亜鉛を微粉砕粉100mass%に対して0.05mass%添加、混合した後磁界中で成形し成形体を得た。なお、成形装置には、磁界印加方向と加圧方向とが直交するいわゆる直角磁界成形装置(横磁界成形装置)を用いた。   Zinc stearate was added as a lubricant to the finely pulverized powder in an amount of 0.05 mass% with respect to 100 mass% of the finely pulverized powder, mixed, and then molded in a magnetic field to obtain a molded body. Note that a so-called right-angle magnetic field forming apparatus (transverse magnetic field forming apparatus) in which the magnetic field application direction and the pressing direction are orthogonal to each other was used as the forming apparatus.

得られた成形体を、真空中、1000℃以上1040℃以下(サンプル毎に焼結による緻密化が十分起こる温度を選定)で4時間焼結した後急冷し、焼結体を得た。得られた焼結体の密度は7.5Mg/m 以上であった。得られた焼結体の成分の結果を表1に示す。なお、表1における各成分は、高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定した。なお、焼結体の酸素量をガス融解−赤外線吸収法で測定した結果、すべて0.5mass%前後であることを確認した。また、C(炭素量)は、燃焼−赤外線吸収法によるガス分析装置を使用して測定した結果、0.1mass%前後であることを確認した。表1における「[T]/[B]」は、Tを構成する各元素(ここではFe、Al、Si、Mn)に対し、分析値(mass%)をその元素の原子量で除したものを求め、それらの値を合計したもの(a)と、Bの分析値(mass%)をBの原子量で除したもの(b)との比(a/b)である。以下の全ての表も同様である。なお、表1の各組成および酸素量、炭素量を合計しても100mass%にはならない。これは、前記の通り、各成分によって分析方法が異なるためである。その他表についても同様である。 The obtained molded body was sintered in a vacuum at 1000 ° C. or higher and 1040 ° C. or lower (a temperature at which densification by sintering was sufficiently selected for each sample) for 4 hours and then rapidly cooled to obtain a sintered body. The density of the obtained sintered body was 7.5 Mg / m 3 or more. Table 1 shows the results of the components of the obtained sintered body. In addition, each component in Table 1 was measured using high frequency inductively coupled plasma emission spectroscopy (ICP-OES). In addition, as a result of measuring the oxygen content of the sintered body by the gas melting-infrared absorption method, it was confirmed that all were around 0.5 mass%. In addition, C (carbon content) was measured using a gas analyzer based on a combustion-infrared absorption method, and as a result, it was confirmed to be about 0.1 mass%. “[T] / [B]” in Table 1 means the value obtained by dividing the analysis value (mass%) by the atomic weight of each element (here, Fe, Al, Si, and Mn) constituting T. It is the ratio (a / b) of the calculated value (a) obtained by summing the values and the analytical value (mass%) of B divided by the atomic weight of B (b). The same applies to all the following tables. It should be noted that the total of each composition, oxygen content and carbon content in Table 1 does not become 100 mass%. This is because the analysis method differs depending on each component as described above. The same applies to other tables.

Figure 0006624455
Figure 0006624455

[R−Ga−Fe−A系合金を準備する工程]
R−Ga−Fe−A系合金がおよそ表2の符号1−aに示す組成となるように、各元素を秤量しそれらの原料を溶解して、単ロール超急冷法(メルトスピニング法)によりリボンまたはフレーク状の合金を得た。得られた合金を乳鉢を用いてアルゴン雰囲気中で粉砕した後、目開き425μmの篩を通過させ、R−Ga−Fe−A系合金を準備した。得られたR−Ga−Fe−A系合金の組成を表2に示す。尚、表2における各成分は、高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定した。
[Step of Preparing R-Ga-Fe-A Alloy]
Each element is weighed and their raw materials are dissolved so that the R-Ga-Fe-A-based alloy has a composition shown by the symbol 1-a in Table 2 and the single-roll ultra-quenching method (melt spinning method). A ribbon or flake alloy was obtained. The obtained alloy was pulverized in an argon atmosphere using a mortar, and then passed through a sieve having an opening of 425 μm to prepare an R-Ga-Fe-A-based alloy. Table 2 shows the composition of the obtained R-Ga-Fe-A-based alloy. In addition, each component in Table 2 was measured using high frequency inductively coupled plasma emission spectroscopy (ICP-OES).

Figure 0006624455
Figure 0006624455

[第一の熱処理を実施する工程]
表1の符号1−Aから1−Kの焼結体を切断、切削加工し、4.4mm×10.0mm×11.0mmの直方体(10.0mm×11.0mmの面が配向方向と垂直な面)とした。次に、図3に示すように、ニオブ箔により作製した処理容器3中に、主に焼結体の配向方向(図中の矢印方向)と垂直な面がR−Ga−Fe−A系合金と接触するように、表2に示す符号1−aのR−Ga−Fe−A系合金を、符号1−Aから1−FのR−T−B−Cu−M系焼結体のそれぞれの上下に配置した。次に、管状流気炉を用いて、200Paに制御した減圧アルゴン中で、表3の第一の熱処理に示す温度及び時間で前記R−Ga−Fe−A合金及び前記R−T−B−Cu−M系焼結体を加熱して第一の熱処理を実施した後、冷却した。
[Step of performing first heat treatment]
A sintered body of reference numerals 1-A to 1-K in Table 1 was cut and cut, and a 4.4 mm × 10.0 mm × 11.0 mm rectangular parallelepiped (10.0 mm × 11.0 mm plane was perpendicular to the orientation direction) Surface). Next, as shown in FIG. 3, in a processing container 3 made of niobium foil, a plane mainly perpendicular to the orientation direction of the sintered body (the direction of the arrow in the figure) is an R-Ga-Fe-A-based alloy. The R-Ga-Fe-A-based alloy denoted by reference numeral 1-a shown in Table 2 was used to contact the RTB-Cu-M-based sintered bodies denoted by reference numerals 1-A to 1-F, respectively. Placed above and below. Next, using a tubular flow furnace, the R-Ga-Fe-A alloy and the RTB- at a temperature and for a time shown in the first heat treatment in Table 3 under reduced pressure argon controlled to 200 Pa. After the Cu-M-based sintered body was heated to perform the first heat treatment, it was cooled.

[第二の熱処理を実施する工程]
第二の熱処理を、管状流気炉を用いて200Paに制御した減圧アルゴン中で、表3の第二の熱処理に示す温度及び時間で、第一の熱処理が実施されたR−T−B−Cu−M系焼結体に対して実施した後、冷却した。熱処理後の各サンプルに対し表面研削盤を用いて各サンプルを全面を切削加工し、4.0mm×4.0mm×4.0mmの立方体状のサンプル(R−T−B−Cu−M系焼結磁石)を得た。尚、第一の熱処理を実施する工程におけるR−Ga−Fe−A合金及びR−T−B−Cu−M系焼結体の加熱温度、並びに、第二の熱処理を実施する工程におけるR−T―B−Cu−M系焼結体の加熱温度は、それぞれ熱電対を取り付けることにより測定した。
[Step of performing second heat treatment]
The second heat treatment was performed in a reduced-pressure argon controlled at 200 Pa using a tubular flow furnace, at the temperature and time indicated in the second heat treatment in Table 3, where the RTB was subjected to the first heat treatment. After being performed on the Cu-M based sintered body, it was cooled. The surface of each sample after heat treatment was cut using a surface grinder to form a 4.0 mm × 4.0 mm × 4.0 mm cubic sample (RT-B-Cu-M-based firing). Magnetized magnet). The heating temperature of the R-Ga-Fe-A alloy and the RTB-Cu-M-based sintered body in the step of performing the first heat treatment, and the R-Ga-Fe-A-based sintered body in the step of performing the second heat treatment. The heating temperature of the TB-Cu-M-based sintered body was measured by attaching a thermocouple.

[サンプル評価]
得られたサンプルを、B−Hトレーサによって各試料のB及びHcJを測定した。測定結果を表3に示す。また、サンプルの成分を高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定した結果を表4に示す。表3の通り、R−T−B−Cu−M系焼結体における[T]/[B]のmol比を13.0以上14.0以下とし、且つ、第二の熱処理が実施されたR−T−B−Cu−M系焼結磁石における[T]/[B]のmol比が14.0超である本発明例はいずれも高いB及び高いHcJが得られていることがわかる。これに対し、第二の熱処理が実施されたR−T−B−Cu−M系焼結磁石における[T]/[B]のmol比が14.0以下であるサンプルNo.1−1は高いHcJが得られなかった。さらに、第二の熱処理が実施されたR−T−B−Cu−M系焼結磁石における[T]/[B]のmol比が14超であっても、R−T−B−Cu−M系焼結体における[T]/[B]のmol比が本発明の範囲外であるサンプルNo.1−5([T]/[B]のmol比が14.2)はBが大幅に低下している。また、R−T−B−Cu−M系焼結体におけるCu量が0.1mass%以上1.5mass%以下でないサンプルNo.1−6、及びサンプルNo.1−11(Cu量がサンプルNo.1−6は0.05mass%、サンプルNo.1−11は1.95mass%)は、高いHcJがえられなかった。
[sample test]
The obtained sample was measured B r and H cJ of the sample by B-H tracer. Table 3 shows the measurement results. Table 4 shows the results of measuring the components of the sample using high frequency inductively coupled plasma emission spectroscopy (ICP-OES). As shown in Table 3, the molar ratio of [T] / [B] in the RTB-Cu-M-based sintered body was set to 13.0 or more and 14.0 or less, and the second heat treatment was performed. [T] / that the invention example both high B r and a high H cJ mol ratio of 14.0 greater than [B] is obtained in the R-T-B-Cu- M -based sintered magnet I understand. On the other hand, in the sample No. in which the molar ratio of [T] / [B] is 14.0 or less in the RTB-Cu-M based sintered magnet subjected to the second heat treatment. 1-1 did not obtain high HcJ . Furthermore, even if the molar ratio of [T] / [B] in the RTB-Cu-M sintered magnet subjected to the second heat treatment is more than 14, RTB-Cu-M Sample No. M in which the molar ratio of [T] / [B] in the M-based sintered body was outside the range of the present invention. In 1-5 (the molar ratio of [T] / [B] is 14.2), Br is significantly reduced. Further, in Sample No. 1 in which the amount of Cu in the RTB-Cu-M based sintered body was not more than 0.1 mass% and not more than 1.5 mass%. 1-6, and sample no. In sample No. 1-11 (Cu amount: 0.05 mass% for sample No. 1-6, sample No. 1-11: 1.95 mass%), high HcJ was not obtained.

Figure 0006624455
Figure 0006624455

Figure 0006624455
Figure 0006624455

実験例2
[R−T−B−Cu−M系焼結体を準備する工程]
焼結体がおよそ表5の符号2−Aに示すとなるように、各元素を秤量する以外は実験施例1と同じ方法で焼結体を作製した。得られた焼結体の密度は7.5Mg/m 以上であった。得られた焼結体の成分の結果を表5に示す。表5における各成分は実験例1と同じ方法で測定した。なお、焼結体の酸素量をガス融解−赤外線吸収法で測定した結果、すべて0.5mass%前後であることを確認した。また、C(炭素量)は、燃焼−赤外線吸収法によるガス分析装置を使用して測定した結果、0.1mass%前後であることを確認した。
Experimental example 2
[Step of Preparing RTB-Cu-M Sintered Body]
A sintered body was produced in the same manner as in Experimental Example 1 except that each element was weighed so that the sintered body was approximately indicated by reference numeral 2-A in Table 5. The density of the obtained sintered body was 7.5 Mg / m 3 or more. Table 5 shows the results of the components of the obtained sintered body. Each component in Table 5 was measured in the same manner as in Experimental Example 1. In addition, as a result of measuring the oxygen content of the sintered body by the gas melting-infrared absorption method, it was confirmed that all were around 0.5 mass%. In addition, C (carbon content) was measured using a gas analyzer based on a combustion-infrared absorption method, and as a result, it was confirmed to be about 0.1 mass%.

Figure 0006624455
Figure 0006624455

[R−Ga−Fe−A系合金を準備する工程]
R−Ga−Fe−A系合金がおよそ表2の符号2−aから2−gに示す組成となるように、各元素を秤量する以外は実験例1と同じ方法でR−Ga−Fe−A系合金を準備した。高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定したR−Ga−Fe−A系合金の組成を表6に示す。
[Step of Preparing R-Ga-Fe-A Alloy]
Except for weighing each element, the R-Ga-Fe-A-based alloy was prepared in the same manner as in Experimental Example 1 so that the R-Ga-Fe-A-based alloy had a composition shown by symbols 2-a to 2-g in Table 2. An A-based alloy was prepared. Table 6 shows the composition of the R-Ga-Fe-A-based alloy measured using high frequency inductively coupled plasma emission spectroscopy (ICP-OES).

Figure 0006624455
Figure 0006624455

[第一の熱処理を実施する工程]
表7の第一の熱処理に示す温度及び時間でR−Ga−Fe−A系合金及びR−T−B−Cu−M系焼結体を加熱すること以外は実験例1と同じ方法で第一の熱処理を実施した。
[Step of performing first heat treatment]
Except that the R-Ga-Fe-A-based alloy and the RTB-Cu-M-based sintered body were heated at the temperature and time shown in the first heat treatment in Table 7, the same method as in Experimental Example 1 was used. One heat treatment was performed.

[第二の熱処理を実施する工程]
表7の第二の熱処理に示す温度及び時間でR−T−B−Cu−M系焼結体を加熱すること以外は実験例1と同じ方法で第二の熱処理を実施した。熱処理後の各サンプルを実験例1と同じ方法で加工しR−T−B−Cu−M系焼結磁石を得た。
[Step of performing second heat treatment]
A second heat treatment was performed in the same manner as in Experimental Example 1, except that the RTB-Cu-M-based sintered body was heated at the temperature and time shown in the second heat treatment in Table 7. Each sample after the heat treatment was processed in the same manner as in Experimental Example 1 to obtain an RTB-Cu-M based sintered magnet.

[サンプル評価]
得られたサンプルを、B−Hトレーサによって各試料のB及びHcJを測定した。測定結果を表7に示す。また、サンプルの成分を高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定した結果を表8に示す。表7の通り、R−Ga−Fe−A系合金のFe量が4mass%以上40mass%以下である本発明例は高いB及び高いHcJが得られていることがわかる。また、表8の通り、R−Ga−Fe−A系合金のFe量が本発明の範囲外であると、最終的に得られるR−T−B−Cu−M系焼結磁石における[T]/[B]のmol比を14.0超とすることができず(表8中の比較例)、高いHcJを得ることができなかった。
[sample test]
The obtained sample was measured B r and H cJ of the sample by B-H tracer. Table 7 shows the measurement results. Table 8 shows the results of measuring the components of the sample using high frequency inductively coupled plasma emission spectroscopy (ICP-OES). As Table 7, the present invention example Fe amount of R-Ga-Fe-A based alloy is not more than 4 mass% or more 40 mass% It can be seen that the high B r and a high H cJ are achieved. Further, as shown in Table 8, when the Fe content of the R-Ga-Fe-A-based alloy is out of the range of the present invention, [T] in the finally obtained RTB-Cu-M-based sintered magnet ] / [B] molar ratio could not be more than 14.0 (comparative example in Table 8), and a high HcJ could not be obtained.

Figure 0006624455
Figure 0006624455

Figure 0006624455
Figure 0006624455

実験例3
[R−T−B−Cu−M系焼結体を準備する工程]
焼結体がおよそ表9の符号3−Aに示す組成となるように、各元素を秤量する以外は実験例1と同じ方法で焼結体を作製した。
得られた焼結体の密度は7.5Mg/m 以上であった。得られた焼結体の成分の結果を表9に示す。表9における各成分は実験例1と同じ方法で測定した。なお、焼結体の酸素量をガス融解−赤外線吸収法で測定した結果、すべて0.5mass%前後であることを確認した。また、C(炭素量)は、燃焼−赤外線吸収法によるガス分析装置を使用して測定した結果、0.1mass%前後であることを確認した。
Experimental example 3
[Step of Preparing RTB-Cu-M Sintered Body]
Except for weighing each element, a sintered body was produced in the same manner as in Experimental Example 1 so that the sintered body had the composition shown by the symbol 3-A in Table 9.
The density of the obtained sintered body was 7.5 Mg / m 3 or more. Table 9 shows the results of the components of the obtained sintered body. Each component in Table 9 was measured in the same manner as in Experimental Example 1. In addition, as a result of measuring the oxygen content of the sintered body by the gas melting-infrared absorption method, it was confirmed that all were around 0.5 mass%. In addition, C (carbon content) was measured using a gas analyzer based on a combustion-infrared absorption method, and as a result, it was confirmed to be about 0.1 mass%.

Figure 0006624455
Figure 0006624455

[R−Ga−Fe−A系合金を準備する工程]
R−Ga−Fe−A系合金がおよそ表10の符号3−a〜3−jに示す組成となるように、各元素を秤量する以外は実験例1と同じ方法でR−Ga−Fe−A系合金を準備した。高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定したR−Ga−Fe−A系合金の組成を表10に示す。
[Step of Preparing R-Ga-Fe-A Alloy]
Except for weighing each element, the R-Ga-Fe-A-based alloy was prepared in the same manner as in Experimental Example 1 so that the R-Ga-Fe-A-based alloy had the composition shown by symbols 3-a to 3-j in Table 10. An A-based alloy was prepared. Table 10 shows the composition of the R-Ga-Fe-A-based alloy measured using high frequency inductively coupled plasma emission spectroscopy (ICP-OES).

Figure 0006624455
Figure 0006624455

[第一の熱処理を実施する工程]
表11の第一の熱処理に示す温度及び時間でR−Ga−Fe−A合金及びR−T−B−Cu−M系焼結体を加熱すること以外は実験例1と同じ方法で第一の熱処理を実施した。
[Step of performing first heat treatment]
Except that the R-Ga-Fe-A alloy and the RTB-Cu-M-based sintered body were heated at the temperature and time indicated in the first heat treatment in Table 11, the first method was performed in the same manner as in Experimental Example 1. Was performed.

[第二の熱処理を実施する工程]
表11の第二の熱処理に示す温度及び時間でR−T−B−Cu−M系焼結体を加熱すること以外は実験例1と同じ方法で第二の熱処理を実施した。
[Step of performing second heat treatment]
A second heat treatment was performed in the same manner as in Experimental Example 1, except that the RTB-Cu-M-based sintered body was heated at the temperature and time shown in the second heat treatment in Table 11.

[サンプル評価]
得られたサンプルを、B−Hトレーサによって各試料のB及びHcJを測定した。測定結果を表11に示す。また、サンプルの成分を高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定した結果を表12に示す。表11の通り、R−Ga−Fe−A系合金のR量が35mass%以上91mass%以下、Ga量が2.5mass%以上40mass%以下である本発明例は高いB及び高いHcJが得られていることがわかる。また、表12の通り、R−Ga−Fe−A合金におけるR、Gaのいずれかが本発明の範囲外であると、最終的に得られるR−T−B−Cu−M系焼結磁石における[T]/[B]のmol比を14.0超とすることができず(表12中の比較例)、高いHcJを得ることができない。このように、R、Ga(及び実験例2に示す様に)Feの含有量が本発明の範囲内にあることにより、[T]/[B]のmol比が14.0超となるFeの必要量を磁石表面から内部に導入させることが可能となる。
[sample test]
The obtained sample was measured B r and H cJ of the sample by B-H tracer. Table 11 shows the measurement results. Table 12 shows the results of measuring the components of the sample using high frequency inductively coupled plasma emission spectroscopy (ICP-OES). As Table 11, R of R-Ga-Fe-A based alloy less 35 mass% or more 91mass%, the present invention example Ga amount is less 2.5 mass% or more 40 mass% has a high B r and a high H cJ It can be seen that it has been obtained. Moreover, as shown in Table 12, when either R or Ga in the R-Ga-Fe-A alloy is out of the range of the present invention, the finally obtained RTB-Cu-M based sintered magnet is obtained. , The molar ratio of [T] / [B] cannot be more than 14.0 (Comparative Example in Table 12), and a high HcJ cannot be obtained. Thus, since the contents of R and Ga (and as shown in Experimental Example 2) are within the range of the present invention, the molar ratio of [T] / [B] becomes higher than 14.0. Can be introduced from the magnet surface to the inside.

Figure 0006624455
Figure 0006624455

Figure 0006624455
Figure 0006624455

実験例4
[R−T−B−Cu−M系焼結体を準備する工程]
焼結体がおよそ表13の符号4−Aに示す組成となるように、各元素を秤量する以外は実験例1と同じ方法で焼結体を作製した。
得られた焼結体の密度は7.5Mg/m 以上であった。得られた焼結体の成分の結果を表13に示す。表13における各成分は実験例1と同じ方法で測定した。なお、焼結体の酸素量をガス融解−赤外線吸収法で測定した結果、すべて0.5mass%前後であることを確認した。また、C(炭素量)は、燃焼−赤外線吸収法によるガス分析装置を使用して測定した結果、0.1mass%前後であることを確認した。
Experimental example 4
[Step of Preparing RTB-Cu-M Sintered Body]
Except for weighing each element, a sintered body was produced in the same manner as in Experimental Example 1 so that the sintered body had a composition approximately as indicated by reference numeral 4-A in Table 13.
The density of the obtained sintered body was 7.5 Mg / m 3 or more. Table 13 shows the results of the components of the obtained sintered body. Each component in Table 13 was measured in the same manner as in Experimental Example 1. In addition, as a result of measuring the oxygen content of the sintered body by the gas melting-infrared absorption method, it was confirmed that all were around 0.5 mass%. In addition, C (carbon content) was measured using a gas analyzer based on a combustion-infrared absorption method, and as a result, it was confirmed to be about 0.1 mass%.

Figure 0006624455
Figure 0006624455

[R−Ga−Fe−A系合金を準備する工程]
R−Ga−Fe−A系合金がおよそ表14の符号4−aに示組成となるように、各元素を秤量する以外は実験例1と同じ方法でR−Ga−Fe−A系合金を準備した。高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定したR−Ga−Fe−A系合金の組成を表14に示す。
[Step of Preparing R-Ga-Fe-A Alloy]
An R-Ga-Fe-A-based alloy was prepared in the same manner as in Experimental Example 1 except that each element was weighed so that the R-Ga-Fe-A-based alloy had a composition approximately as indicated by reference numeral 4-a in Table 14. Got ready. Table 14 shows the composition of the R-Ga-Fe-A-based alloy measured using high frequency inductively coupled plasma emission spectroscopy (ICP-OES).

Figure 0006624455
Figure 0006624455

[第一の熱処理を実施する工程]
表15の第一の熱処理に示す温度及び時間でR−Ga−Fe−A合金及びR−T−B−Cu−M系焼結体を加熱すること以外は実験例1と同じ方法で第一の熱処理を実施した。
[Step of performing first heat treatment]
Except that the R-Ga-Fe-A alloy and the RTB-Cu-M-based sintered body were heated at the temperature and time shown in the first heat treatment in Table 15, the first method was performed in the same manner as in Experimental Example 1. Was performed.

[第二の熱処理を実施する工程]
表15の第二の熱処理に示す温度及び時間でR−T−B−Cu−M系焼結体を加熱すること以外は実験例1と同じ方法で第二の熱処理を実施した。熱処理後の各サンプルを実験例1と同じ方法で加工しR−T−B−Cu−M系焼結磁石を得た。
[Step of performing second heat treatment]
A second heat treatment was performed in the same manner as in Experimental Example 1, except that the RTB-Cu-M-based sintered body was heated at the temperature and time shown in the second heat treatment in Table 15. Each sample after the heat treatment was processed in the same manner as in Experimental Example 1 to obtain an RTB-Cu-M based sintered magnet.

[サンプル評価]
得られたサンプルを、B−Hトレーサによって各試料のB及びHcJを測定した。測定結果を表15に示す。また、サンプルの成分を高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定した結果を表16に示す。表15の通り、本発明の第一の熱処理温度(700℃以上1100℃以下)及び第二の熱処理温度(450℃以上600℃以下)である本発明例は、高いB及び高いHcJが得られていることがわかる。また、表16の通り、第一の熱処理温度又は第二の熱処理温度が本発明の範囲外である比較例は、最終的に得られるR−T−B系焼結磁石における[T]/[B]のmol比を14.0超とすることができず(表16中の比較例)、高いHcJを得ることができない。
[sample test]
The obtained sample was measured B r and H cJ of the sample by B-H tracer. Table 15 shows the measurement results. Table 16 shows the results of measuring the components of the sample using high-frequency inductively coupled plasma emission spectroscopy (ICP-OES). As Table 15, the present invention embodiment the first heat treatment temperature (700 ° C. or higher 1100 ° C. or less) and a second heat-treatment temperature (450 ° C. or higher 600 ° C. or less) of the present invention, a high B r and a high H cJ It can be seen that it has been obtained. Further, as shown in Table 16, the comparative example in which the first heat treatment temperature or the second heat treatment temperature is out of the range of the present invention is [T] / [in the finally obtained RTB based sintered magnet. B] cannot be higher than 14.0 (comparative example in Table 16), and a high HcJ cannot be obtained.

Figure 0006624455
Figure 0006624455

Figure 0006624455
Figure 0006624455

実験例5
[R−T−B−Cu−M系焼結体を準備する工程]
焼結体がおよそ表17の符号5−A〜5−Cに示す組成となるように、各元素を秤量する以外は実験例1と同じ方法で焼結体を作製した。
得られた焼結体の密度は7.5Mg/m 以上であった。得られた焼結体の成分の結果を表17に示す。表17における各成分は実験例1と同じ方法で測定した。なお、焼結体の酸素量をガス融解−赤外線吸収法で測定した結果、すべて0.5mass%前後であることを確認した。また、C(炭素量)は、燃焼−赤外線吸収法によるガス分析装置を使用して測定した結果、0.1mass%前後であることを確認した。表17における「[T]/[B]」は、Tを構成する各元素(ここではFeとXとして:Co、Al、Si、Mn、Ti、Zr)に対し、分析値(mass%)をその元素の原子量で除したものを求め、それらの値を合計したもの(a)と、Bの分析値(mass%)をBの原子量で除したもの(b)との比(a/b)である。
Experimental example 5
[Step of Preparing RTB-Cu-M Sintered Body]
Except for weighing each element, a sintered body was produced in the same manner as in Experimental Example 1 so that the sintered body had the composition shown in symbols 5-A to 5-C in Table 17.
The density of the obtained sintered body was 7.5 Mg / m 3 or more. Table 17 shows the results of the components of the obtained sintered body. Each component in Table 17 was measured in the same manner as in Experimental Example 1. In addition, as a result of measuring the oxygen content of the sintered body by the gas melting-infrared absorption method, it was confirmed that all were around 0.5 mass%. In addition, C (carbon content) was measured using a gas analyzer based on a combustion-infrared absorption method, and as a result, it was confirmed to be about 0.1 mass%. “[T] / [B]” in Table 17 indicates an analysis value (mass%) for each element constituting T (here, Fe and X: Co, Al, Si, Mn, Ti, and Zr). The ratio (a / b) of the value obtained by dividing the value by the atomic weight of the element and the sum of the values (a) and the value obtained by dividing the analytical value (mass%) of B by the atomic weight of B (b). It is.

Figure 0006624455
Figure 0006624455

[R−Ga−Fe−A系合金を準備する工程]
R−Ga−Fe−A系合金がおよそ表18の符号5−aに示す組成となるように、各元素を秤量する以外は実験例1と同じ方法でR−Ga−Fe−A系合金を準備した。高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定したR−Ga−Fe−A系合金の組成を表18に示す。
[Step of Preparing R-Ga-Fe-A Alloy]
An R-Ga-Fe-A-based alloy was prepared in the same manner as in Experimental Example 1 except that each element was weighed so that the R-Ga-Fe-A-based alloy had a composition approximately as indicated by reference numeral 5-a in Table 18. Got ready. Table 18 shows the composition of the R-Ga-Fe-A-based alloy measured using high frequency inductively coupled plasma emission spectroscopy (ICP-OES).

Figure 0006624455
Figure 0006624455

[第一の熱処理を実施する工程]
表19の第一の熱処理に示す温度及び時間でR−Ga−Fe−A合金及びR−T−B−Cu−M系焼結体を加熱すること以外は実験例1と同じ方法で第一の熱処理を実施した。
[Step of performing first heat treatment]
Except that the R-Ga-Fe-A alloy and the RTB-Cu-M-based sintered body were heated at the temperature and time indicated in the first heat treatment in Table 19, the first method was performed in the same manner as in Experimental Example 1. Was performed.

[第二の熱処理を実施する工程]
表19の第二の熱処理に示す温度及び時間でR−T−B−Cu−M系焼結体を加熱すること以外は実験例1と同じ方法で第二の熱処理を実施した。熱処理後の各サンプルを実験例1と同じ方法で加工しR−T−B−Cu−M系焼結磁石を得た。
[Step of performing second heat treatment]
A second heat treatment was performed in the same manner as in Experimental Example 1, except that the RTB-Cu-M-based sintered body was heated at the temperature and time shown in the second heat treatment in Table 19. Each sample after the heat treatment was processed in the same manner as in Experimental Example 1 to obtain an RTB-Cu-M based sintered magnet.

[サンプル評価]
得られたサンプルを、B−Hトレーサによって各試料のB及びHcJを測定した。測定結果を表19に示す。また、サンプルの成分を高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定した結果を表20に示す。表19の通り、R−T−B−Cu−M系焼結体にDy、Co、Ga、Ag、Cu、Zr、Tiが含まれていても高いHcJが得られていることがわかる。また、表20の通り、高いHcJが得られているサンプルは[T]/[B]のmol比が14.0超となっていることがわかる。
[sample test]
The obtained sample was measured B r and H cJ of the sample by B-H tracer. Table 19 shows the measurement results. Table 20 shows the results of measuring the components of the sample using high frequency inductively coupled plasma emission spectroscopy (ICP-OES). As shown in Table 19, it can be seen that high HcJ was obtained even when the RTB-Cu-M-based sintered body contained Dy, Co, Ga, Ag, Cu, Zr, and Ti. Further, as shown in Table 20, it can be seen that the sample in which high HcJ was obtained had a molar ratio of [T] / [B] of more than 14.0.

Figure 0006624455
Figure 0006624455

Figure 0006624455
Figure 0006624455

実験例6
[R−T−B−Cu−M系焼結体を準備する工程]
焼結体がおよそ表21の符号6−Aに示す組成となるように、各元素を秤量する以外は実験例1と同じ方法で焼結体を作製した。
得られた焼結体の密度は7.5Mg/m 以上であった。得られた焼結体の成分の結果を表21に示す。表21における各成分は実験例1と同じ方法で測定した。なお、焼結体の酸素量をガス融解−赤外線吸収法で測定した結果、すべて0.5mass%前後であることを確認した。また、C(炭素量)は、燃焼−赤外線吸収法によるガス分析装置を使用して測定した結果、0.1mass%前後であることを確認した。
Experimental example 6
[Step of Preparing RTB-Cu-M Sintered Body]
Except for weighing each element, a sintered body was prepared in the same manner as in Experimental Example 1 so that the sintered body had a composition approximately as indicated by reference numeral 6-A in Table 21.
The density of the obtained sintered body was 7.5 Mg / m 3 or more. Table 21 shows the results of the components of the obtained sintered body. Each component in Table 21 was measured in the same manner as in Experimental Example 1. In addition, as a result of measuring the oxygen content of the sintered body by the gas melting-infrared absorption method, it was confirmed that all were around 0.5 mass%. In addition, C (carbon content) was measured using a gas analyzer based on a combustion-infrared absorption method, and as a result, it was confirmed to be about 0.1 mass%.

Figure 0006624455
Figure 0006624455

[R−Ga−Fe−A系合金を準備する工程]
R−Ga−Fe−A系合金がおよそ表22の符号6−a〜6−eに示す組成となるように、各元素を秤量する以外は実験例1と同じ方法でR−Ga−Fe−A系合金を準備した。高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定したR−Ga−Fe−A系合金の組成を表22に示す。
[Step of Preparing R-Ga-Fe-A Alloy]
Except for weighing each element, the R-Ga-Fe-A-based alloy has the composition shown in symbols 6-a to 6-e in Table 22 in the same manner as in Experimental Example 1 except that R-Ga-Fe-A An A-based alloy was prepared. Table 22 shows the composition of the R-Ga-Fe-A-based alloy measured using high frequency inductively coupled plasma emission spectroscopy (ICP-OES).

Figure 0006624455
Figure 0006624455

[第一の熱処理を実施する工程]
表23の第一の熱処理に示す温度及び時間でR−Ga−Fe−A合金及びR−T−B−Cu−M系焼結体を加熱すること以外は実験例1と同じ方法で第一の熱処理を実施した。
[Step of performing first heat treatment]
Except that the R-Ga-Fe-A alloy and the RTB-Cu-M-based sintered body were heated at the temperature and time indicated in the first heat treatment in Table 23, the first method was performed in the same manner as in Experimental Example 1. Was performed.

[第二の熱処理を実施する工程]
表23の第二の熱処理に示す温度及び時間でR−T−B−Cu−M系焼結体を加熱すること以外は実験例1と同じ方法で第二の熱処理を実施した。熱処理後の各サンプルを実験例1と同じ方法加工しR−T−B−Cu−M系焼結磁石を得た。
[Step of performing second heat treatment]
A second heat treatment was performed in the same manner as in Experimental Example 1, except that the RTB-Cu-M-based sintered body was heated at the temperature and time shown in the second heat treatment in Table 23. Each sample after the heat treatment was processed in the same manner as in Experimental Example 1 to obtain an RTB-Cu-M based sintered magnet.

[サンプル評価]
得られたサンプルを、B−Hトレーサによって各試料のB及びHcJを測定した。測定結果を表23に示す。また、サンプルの成分を高周波誘導結合プラズマ発光分光分析法(ICP−OES)を使用して測定した結果を表24に示す。表23の通り、R−Ga−Fe−A系合金にAとして、Al、Si、Mn、Co、Znが含まれていても高いHcJが得られていることがわかる。また、表24の通り、高いHcJが得られているサンプルは[T]/[B]のmol比が14.0超となっていることがわかる。なお、表24における「[T]/[B]」は、Tを構成する各元素(ここではFeとXとして:Co、Al、Si、Mn、Zn)に対し、分析値(mass%)をその元素の原子量で除したものを求め、それらの値を合計したもの(a)と、Bの分析値(mass%)をBの原子量で除したもの(b)との比(a/b)である。
[sample test]
The obtained sample was measured B r and H cJ of the sample by B-H tracer. Table 23 shows the measurement results. Table 24 shows the results obtained by measuring the components of the sample using high-frequency inductively coupled plasma emission spectroscopy (ICP-OES). As shown in Table 23, it can be seen that a high HcJ was obtained even when Al, Si, Mn, Co, and Zn were included as A in the R-Ga-Fe-A-based alloy. Further, as shown in Table 24, it can be seen that the samples having high HcJ have a molar ratio of [T] / [B] of more than 14.0. Note that “[T] / [B]” in Table 24 indicates an analysis value (mass%) for each element constituting T (here, Fe and X: Co, Al, Si, Mn, Zn). The ratio (a / b) of the value obtained by dividing the value by the atomic weight of the element and the sum of the values (a) and the value obtained by dividing the analytical value (mass%) of B by the atomic weight of B (b). It is.

Figure 0006624455
Figure 0006624455

Figure 0006624455
Figure 0006624455

本開示により得られたR−T−B−Cu−M系焼結磁石は、ハードディスクドライブのボイスコイルモータ(VCM)や、電気自動車用(EV、HV、PHVなど)モータ、産業機器用モータなどの各種モータや家電製品などに好適に利用することができる。   The RTB-Cu-M based sintered magnet obtained according to the present disclosure is used for a voice coil motor (VCM) of a hard disk drive, a motor for an electric vehicle (EV, HV, PHV, etc.), a motor for industrial equipment, and the like. It can be suitably used for various motors and home electric appliances.

1 R−T−B−Cu−M系焼結体
2 R−Ga−Fe−A系合金
3 処理容器
DESCRIPTION OF SYMBOLS 1 RTB-Cu-M type sintered body 2 R-Ga-Fe-A type alloy 3 Processing container

Claims (5)

以下の要件(1)〜(6)を満たすR−T−B−Cu−M系焼結体を準備する工程と、
(1)Rは希土類元素のうち少なくとも一種でありNd及びPrの少なくとも一方を必ず含み、R−T−B−Cu−M系焼結体全体の27mass%以上35mass%以下である。
(2)TはFe又はFeとXであり、XはAl、Si、Ti、V、Cr、Mn、Co、Ni、Zn、Ge、Zr、Nb、Moから選択される一種以上である。
(3)[T]/[B]のmol比が13.0以上14.0以下である。
(4)CuはR−T−B−Cu−M系焼結体全体の0.1mass%以上1.5mass%以下である。
(5)MはGa及びAgの少なくとも一方であり、R−T−B−Cu−M系焼結体全体の0mass%以上1mass%以下である。
(6)不可避的不純物を含んでも良い。
以下の要件(7)〜(11)を満たすR−Ga−Fe−A系合金を準備する工程と、
(7)Rは希土類元素のうち少なくとも一種でありNd及びPrの少なくとも一方を必ず含み、R−Ga−Fe−A系合金全体の35mass%以上91mass%以下である。

(8)GaはR−Ga−Fe−A系合金全体の2.5mass%以上40mass%以下である。
(9)FeはR−Ga−Fe−A系合金全体の4mass%以上40mass%以下である。
(10)AはAl、Si、Ti、V、Cr、Mn、Co、Ni、Zn、Ge、Zr、Nb、Mo、Agから選択される一種以上であり、R−Ga−Fe−A系合金全体の0mass%以上1mass%以下である。
(11)不可避的不純物を含んでも良い。
前記R−T−B−Cu−M系焼結体の表面の少なくとも一部に、前記R−Ga−Fe−A系合金の少なくとも一部を接触させ、真空又は不活性ガス雰囲気中、700℃以上1100℃以下の温度で第一の熱処理を実施する工程と、
前記第一の熱処理が実施されたR−T−B−Cu−M系焼結体に対して、真空又は不活性ガス雰囲気中、450℃以上600℃以下の温度で第二の熱処理を実施する工程と、
を含む、以下の要件(12)〜(17)を満たすR−T−B−Cu−M系焼結磁石の製造方法。
(12)Rは希土類元素のうち少なくとも一種でありNd及びPrの少なくとも一方を必ず含み、R−T−B−Cu−M系焼結磁石全体の27mass%以上35mass%以下である。
(13)TはFe又はFeとXであり、XはAl、Si、Ti、V、Cr、Mn、Co、Ni、Zn、Ge、Zr、Nb、Moから選択される一種以上である。
(14)[T]/[B]のmol比が14.0超である。
(15)CuはR−T−B−Cu−M系焼結磁石全体の0.1mass%以上1.5mass%以下である。
(16)MはGa及びAgの少なくとも一方であり、R−T−B−Cu−M系焼結磁石全体の0.1mass%以上3mass%以下である。
(17)不可避的不純物を含んでいても良い。
A step of preparing an RTB-Cu-M-based sintered body satisfying the following requirements (1) to (6):
(1) R is at least one of the rare earth elements and always contains at least one of Nd and Pr, and is 27 mass% or more and 35 mass% or less of the entire RTB-Cu-M-based sintered body.
(2) T is Fe or Fe and X, and X is at least one selected from Al, Si, Ti, V, Cr, Mn, Co, Ni, Zn, Ge, Zr, Nb, and Mo.
(3) The molar ratio of [T] / [B] is 13.0 or more and 14.0 or less.
(4) Cu accounts for 0.1 mass% or more and 1.5 mass% or less of the entire RTB-Cu-M-based sintered body.
(5) M is at least one of Ga and Ag, and is 0 mass% or more and 1 mass% or less of the entire RTB-Cu-M-based sintered body.
(6) Inevitable impurities may be contained.
A step of preparing an R—Ga—Fe—A alloy satisfying the following requirements (7) to (11):
(7) R is at least one of the rare earth elements and always contains at least one of Nd and Pr, and is 35 mass% or more and 91 mass% or less of the entire R-Ga-Fe-A-based alloy.

(8) Ga is not less than 2.5 mass% and not more than 40 mass% of the entire R—Ga—Fe—A alloy.
(9) Fe is at least 4 mass% and not more than 40 mass% of the entire R-Ga-Fe-A alloy.
(10) A is at least one selected from Al, Si, Ti, V, Cr, Mn, Co, Ni, Zn, Ge, Zr, Nb, Mo, and Ag, and is an R-Ga-Fe-A alloy. It is 0 mass% or more and 1 mass% or less of the whole.
(11) Inevitable impurities may be contained.
At least a part of the R-Ga-Fe-A-based alloy is brought into contact with at least a part of the surface of the RTB-Cu-M-based sintered body, and is heated to 700 ° C in a vacuum or an inert gas atmosphere. Performing a first heat treatment at a temperature of not less than 1100 ° C. and
The second heat treatment is performed on the RTB-Cu-M-based sintered body on which the first heat treatment is performed at a temperature of 450 ° C or more and 600 ° C or less in a vacuum or an inert gas atmosphere. Process and
And a method for producing an RTB-Cu-M sintered magnet that satisfies the following requirements (12) to (17).
(12) R is at least one of the rare earth elements and always contains at least one of Nd and Pr, and is 27 mass% or more and 35 mass% or less of the entire RTB-Cu-M-based sintered magnet.
(13) T is Fe or Fe and X, and X is at least one selected from Al, Si, Ti, V, Cr, Mn, Co, Ni, Zn, Ge, Zr, Nb, and Mo.
(14) The molar ratio [T] / [B] is more than 14.0.
(15) Cu accounts for 0.1 mass% or more and 1.5 mass% or less of the entire RTB-Cu-M-based sintered magnet.
(16) M is at least one of Ga and Ag, and is 0.1 mass% or more and 3 mass% or less of the whole RTB-Cu-M-based sintered magnet.
(17) Inevitable impurities may be contained.
前記R−Ga−Fe−A系合金は重希土類元素を含有していない請求項1に記載のR−T−B−Cu−M系焼結磁石の製造方法。   The method for producing an RTB-Cu-M-based sintered magnet according to claim 1, wherein the R-Ga-Fe-A-based alloy does not contain a heavy rare earth element. 前記R−Ga−Fe−A系合金中のRの50mass%以上がPrである請求項1又は2に記載のR−T−B−Cu−M系焼結磁石の製造方法。   The method for producing an RTB-Cu-M-based sintered magnet according to claim 1 or 2, wherein 50 mass% or more of R in the R-Ga-Fe-A-based alloy is Pr. 前記R−T−B−Cu−M系焼結磁石中の重希土類元素は1mass%以下である請求項1から3のいずれかに記載のR−T−B−Cu−M系焼結磁石の製造方法。   4. The RTB-Cu-M sintered magnet according to claim 1, wherein the heavy rare earth element in the RTB-Cu-M based sintered magnet is 1 mass% or less. 5. Production method. 前記R−T−B−Cu−M系焼結体を準備する工程は、原料合金を3μm以上10μm以下に粉砕した後、磁界中で成形し、焼結を行うことを含む、請求項1から4のいずれかに記載のR−T−B−Cu−M系焼結磁石の製造方法。   The step of preparing the RTB-Cu-M-based sintered body includes, after pulverizing a raw material alloy to 3 μm or more and 10 μm or less, molding in a magnetic field, and performing sintering. 5. The method for producing an RTB-Cu-M-based sintered magnet according to any one of 4.
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