JP6623192B2 - Cu2ZnSnS4ナノ粒子 - Google Patents
Cu2ZnSnS4ナノ粒子 Download PDFInfo
- Publication number
- JP6623192B2 JP6623192B2 JP2017085335A JP2017085335A JP6623192B2 JP 6623192 B2 JP6623192 B2 JP 6623192B2 JP 2017085335 A JP2017085335 A JP 2017085335A JP 2017085335 A JP2017085335 A JP 2017085335A JP 6623192 B2 JP6623192 B2 JP 6623192B2
- Authority
- JP
- Japan
- Prior art keywords
- nanoparticles
- temperature
- solvent
- czts
- ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002105 nanoparticle Substances 0.000 title claims description 64
- 229910002475 Cu2ZnSnS4 Inorganic materials 0.000 title 1
- 239000003446 ligand Substances 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 27
- 239000002904 solvent Substances 0.000 claims description 21
- 238000009835 boiling Methods 0.000 claims description 16
- 229910052717 sulfur Inorganic materials 0.000 claims description 11
- 229910052725 zinc Inorganic materials 0.000 claims description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 9
- 229910052718 tin Inorganic materials 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 7
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 claims description 4
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 2
- -1 aromatic thiol Chemical class 0.000 claims description 2
- 239000011230 binding agent Substances 0.000 claims description 2
- 239000013078 crystal Substances 0.000 claims description 2
- 150000002576 ketones Chemical class 0.000 claims description 2
- 239000012454 non-polar solvent Substances 0.000 claims description 2
- 239000006254 rheological additive Substances 0.000 claims description 2
- 150000003505 terpenes Chemical class 0.000 claims description 2
- 235000007586 terpenes Nutrition 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- 238000000034 method Methods 0.000 description 43
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 27
- 230000015572 biosynthetic process Effects 0.000 description 19
- 239000002243 precursor Substances 0.000 description 18
- 239000000243 solution Substances 0.000 description 17
- 238000000137 annealing Methods 0.000 description 16
- 239000010949 copper Substances 0.000 description 16
- 238000003786 synthesis reaction Methods 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 14
- 239000010408 film Substances 0.000 description 13
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- 239000011701 zinc Substances 0.000 description 11
- 239000000976 ink Substances 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000012071 phase Substances 0.000 description 9
- 238000012545 processing Methods 0.000 description 9
- 239000011593 sulfur Substances 0.000 description 9
- 239000011135 tin Substances 0.000 description 9
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- 239000011669 selenium Substances 0.000 description 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 7
- 239000006096 absorbing agent Substances 0.000 description 7
- 238000013459 approach Methods 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 238000005245 sintering Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000000376 reactant Substances 0.000 description 4
- 238000002411 thermogravimetry Methods 0.000 description 4
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 3
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 229910052711 selenium Inorganic materials 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000010345 tape casting Methods 0.000 description 3
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 3
- 239000012691 Cu precursor Substances 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000013110 organic ligand Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- VNDYJBBGRKZCSX-UHFFFAOYSA-L zinc bromide Chemical compound Br[Zn]Br VNDYJBBGRKZCSX-UHFFFAOYSA-L 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- UAYWVJHJZHQCIE-UHFFFAOYSA-L zinc iodide Chemical compound I[Zn]I UAYWVJHJZHQCIE-UHFFFAOYSA-L 0.000 description 2
- 229910052984 zinc sulfide Inorganic materials 0.000 description 2
- YHQGMYUVUMAZJR-UHFFFAOYSA-N α-terpinene Chemical compound CC(C)C1=CC=C(C)CC1 YHQGMYUVUMAZJR-UHFFFAOYSA-N 0.000 description 2
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- WSTYNZDAOAEEKG-UHFFFAOYSA-N Mayol Natural products CC1=C(O)C(=O)C=C2C(CCC3(C4CC(C(CC4(CCC33C)C)=O)C)C)(C)C3=CC=C21 WSTYNZDAOAEEKG-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 238000010960 commercial process Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- RFKZUAOAYVHBOY-UHFFFAOYSA-M copper(1+);acetate Chemical group [Cu+].CC([O-])=O RFKZUAOAYVHBOY-UHFFFAOYSA-M 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- QNZRVYCYEMYQMD-UHFFFAOYSA-N copper;pentane-2,4-dione Chemical compound [Cu].CC(=O)CC(C)=O QNZRVYCYEMYQMD-UHFFFAOYSA-N 0.000 description 1
- 239000006071 cream Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- SZRLKIKBPASKQH-UHFFFAOYSA-N dibutyldithiocarbamic acid Chemical compound CCCCN(C(S)=S)CCCC SZRLKIKBPASKQH-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000004993 emission spectroscopy Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 230000035558 fertility Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 235000001510 limonene Nutrition 0.000 description 1
- 229940087305 limonene Drugs 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011234 nano-particulate material Substances 0.000 description 1
- 239000002159 nanocrystal Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000008816 organ damage Effects 0.000 description 1
- WATYAKBWIQTPDE-UHFFFAOYSA-N pentane-2,4-dione;zinc Chemical compound [Zn].CC(=O)CC(C)=O WATYAKBWIQTPDE-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000012066 reaction slurry Substances 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- KHMOASUYFVRATF-UHFFFAOYSA-J tin(4+);tetrachloride;pentahydrate Chemical compound O.O.O.O.O.Cl[Sn](Cl)(Cl)Cl KHMOASUYFVRATF-UHFFFAOYSA-J 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- DJWUNCQRNNEAKC-UHFFFAOYSA-L zinc acetate Chemical group [Zn+2].CC([O-])=O.CC([O-])=O DJWUNCQRNNEAKC-UHFFFAOYSA-L 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 229940102001 zinc bromide Drugs 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G19/00—Compounds of tin
- C01G19/006—Compounds containing, besides tin, two or more other elements, with the exception of oxygen or hydrogen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0326—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising AIBIICIVDVI kesterite compounds, e.g. Cu2ZnSnSe4, Cu2ZnSnS4
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035209—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures
- H01L31/035218—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures the quantum structure being quantum dots
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1828—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/84—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by UV- or VIS- data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/88—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by thermal analysis data, e.g. TGA, DTA, DSC
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/543—Solar cells from Group II-VI materials
Description
Claims (9)
- Cu、Zn、Sn及びSを含む半導体材料と、
沸点が300℃未満であって、前記半導体材料の表面に結合したオルガノチオールリガンドと、
から成り、
前記オルガノチオールリガンドは、アルカンチオール、アルケンチオール、または芳香族チオールであって、
ケステライト結晶構造を有しているナノ粒子。 - Cu、Zn、Sn及びSを含む前記半導体材料は、式Cu2ZnSnS4を有する、請求項1に記載のナノ粒子。
- ナノ粒子が350℃に加熱されると、前記半導体材料の表面に結合した前記オルガノチオールリガンドの少なくとも50%が前記半導体材料の表面から解放される、請求項1に記載のナノ粒子。
- 前記オルガノチオールリガンドは、1−ドデカンチオールである、請求項1に記載のナノ粒子。
- 溶媒と、
前記溶媒に溶解又は分散している、請求項1乃至4の何れかに記載のナノ粒子と、
を含むインク。 - 前記溶媒は無極性溶媒である、請求項5に記載のインク。
- 前記溶媒は、トルエン、アルカン、塩素系溶剤、ケトン、エーテル及びテルペンの何れかである、請求項5に記載のインク。
- 結合剤を更に含む、請求項5に記載のインク。
- レオロジー改良剤を更に含む、請求項5に記載のインク。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361798084P | 2013-03-15 | 2013-03-15 | |
US61/798,084 | 2013-03-15 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015562392A Division JP6138288B2 (ja) | 2013-03-15 | 2014-03-14 | Cu2ZnSnS4ナノ粒子 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2017206431A JP2017206431A (ja) | 2017-11-24 |
JP2017206431A5 JP2017206431A5 (ja) | 2019-09-12 |
JP6623192B2 true JP6623192B2 (ja) | 2019-12-18 |
Family
ID=51176411
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015562392A Active JP6138288B2 (ja) | 2013-03-15 | 2014-03-14 | Cu2ZnSnS4ナノ粒子 |
JP2017085335A Active JP6623192B2 (ja) | 2013-03-15 | 2017-04-24 | Cu2ZnSnS4ナノ粒子 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015562392A Active JP6138288B2 (ja) | 2013-03-15 | 2014-03-14 | Cu2ZnSnS4ナノ粒子 |
Country Status (7)
Country | Link |
---|---|
US (2) | US9206054B2 (ja) |
EP (1) | EP2994418B1 (ja) |
JP (2) | JP6138288B2 (ja) |
KR (1) | KR101716367B1 (ja) |
CN (1) | CN105164047B (ja) |
HK (1) | HK1215239A1 (ja) |
WO (1) | WO2014140889A2 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10453978B2 (en) | 2015-03-12 | 2019-10-22 | International Business Machines Corporation | Single crystalline CZTSSe photovoltaic device |
CN105226131B (zh) * | 2015-08-24 | 2017-09-29 | 中国工程物理研究院材料研究所 | 一种铜锌锡硫吸收层薄膜的化学合成方法 |
US9935214B2 (en) | 2015-10-12 | 2018-04-03 | International Business Machines Corporation | Liftoff process for exfoliation of thin film photovoltaic devices and back contact formation |
CN106629820B (zh) * | 2016-09-09 | 2019-05-24 | 武汉理工大学 | Cu2ZnSnS4纳米晶材料的可控制备方法 |
EP3837048A4 (en) | 2018-08-16 | 2022-01-26 | Northwestern University | POLYELEMENTARY NANOPARTICLES WITH HETEROSSTRUCTURE AND PROCESS FOR THEIR PRODUCTION |
CN113044813B (zh) * | 2019-12-26 | 2022-06-10 | 温州大学 | 一种铜锌锡硒纳米晶及其合成方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110056564A1 (en) * | 2008-05-09 | 2011-03-10 | Korgel Brian A | Nanoparticles and methods of making and using |
JP5649072B2 (ja) * | 2009-02-27 | 2015-01-07 | 国立大学法人名古屋大学 | 半導体ナノ粒子及びその製法 |
US20120055554A1 (en) * | 2009-05-21 | 2012-03-08 | E.I. Du Pont De Nemours And Company | Copper zinc tin chalcogenide nanoparticles |
WO2010138636A2 (en) * | 2009-05-26 | 2010-12-02 | Purdue Research Foundation | Synthesis of multinary chalcogenide nanoparticles comprising cu, zn, sn, s, and se |
KR20120085331A (ko) * | 2009-11-25 | 2012-07-31 | 이 아이 듀폰 디 네모아 앤드 캄파니 | CZTS/Se 전구체 잉크 및 얇은 CZTS/Se 필름과 CZTS/Se-계 광전지의 제조 방법 |
WO2011066205A1 (en) * | 2009-11-25 | 2011-06-03 | E. I. Du Pont De Nemours And Company | Aqueous process for producing crystalline copper chalcogenide nanoparticles, the nanoparticles so-produced, and inks and coated substrates incorporating the nanoparticles |
CN101830445B (zh) * | 2009-12-15 | 2014-12-10 | 河南大学 | 一种以乙酰丙酮盐为原料合成无机纳米晶的方法 |
KR101144738B1 (ko) * | 2009-12-28 | 2012-05-24 | 재단법인대구경북과학기술원 | 박막형 태양전지의 제조방법 |
US20120067408A1 (en) * | 2010-09-16 | 2012-03-22 | Solexant Corp. | Sintered CZTS Nanoparticle Solar Cells |
WO2012071288A1 (en) * | 2010-11-22 | 2012-05-31 | E. I. Du Pont De Nemours And Company | Semiconductor inks, films, coated substrates and methods of preparation |
US20130233202A1 (en) * | 2010-12-03 | 2013-09-12 | Ei Du Pont De Nemours And Company | Inks and processes for preparing copper indium gallium sulfide/selenide coatings and films |
CN102108540B (zh) * | 2010-12-27 | 2012-07-25 | 中国科学院长春光学精密机械与物理研究所 | 合成单分散多元化合物纳米晶的方法 |
JP2012250889A (ja) * | 2011-06-06 | 2012-12-20 | Toyota Motor Corp | 半導体粒子及びその製造方法 |
JP5884945B2 (ja) * | 2013-03-07 | 2016-03-15 | 株式会社村田製作所 | 化合物半導体超微粒子、超微粒子薄膜及び光電変換デバイス |
-
2014
- 2014-03-14 CN CN201480015872.3A patent/CN105164047B/zh active Active
- 2014-03-14 JP JP2015562392A patent/JP6138288B2/ja active Active
- 2014-03-14 EP EP14738593.4A patent/EP2994418B1/en active Active
- 2014-03-14 US US14/210,727 patent/US9206054B2/en active Active
- 2014-03-14 KR KR1020157029348A patent/KR101716367B1/ko active IP Right Grant
- 2014-03-14 WO PCT/IB2014/001118 patent/WO2014140889A2/en active Application Filing
-
2015
- 2015-09-02 US US14/842,909 patent/US9359222B2/en active Active
-
2016
- 2016-03-17 HK HK16103114.7A patent/HK1215239A1/zh unknown
-
2017
- 2017-04-24 JP JP2017085335A patent/JP6623192B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2016515990A (ja) | 2016-06-02 |
US20150376026A1 (en) | 2015-12-31 |
WO2014140889A3 (en) | 2015-01-08 |
JP6138288B2 (ja) | 2017-05-31 |
KR101716367B1 (ko) | 2017-03-14 |
US20140273337A1 (en) | 2014-09-18 |
CN105164047A (zh) | 2015-12-16 |
KR20150126966A (ko) | 2015-11-13 |
EP2994418A2 (en) | 2016-03-16 |
EP2994418B1 (en) | 2021-02-17 |
CN105164047B (zh) | 2019-03-15 |
WO2014140889A2 (en) | 2014-09-18 |
US9206054B2 (en) | 2015-12-08 |
JP2017206431A (ja) | 2017-11-24 |
US9359222B2 (en) | 2016-06-07 |
HK1215239A1 (zh) | 2016-08-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6623192B2 (ja) | Cu2ZnSnS4ナノ粒子 | |
US10756221B2 (en) | Cu2XSnY4 nanoparticles | |
KR101712053B1 (ko) | 13족 셀렌화물 나노입자들 | |
JP6688832B2 (ja) | アンチモンがドープされたナノ粒子 | |
JP2011505449A (ja) | ナノ粒子材料の調製 | |
KR20140097981A (ko) | 태양전지용 금속 나노 입자의 제조 방법, 그 금속 나노 입자를 포함하는 잉크 조성물 및 이를 사용한 박막의 제조 방법 | |
JPWO2012090339A1 (ja) | カルコパイライト構造を有する化合物の製造方法 | |
EP3022764A1 (en) | Preparation of copper selenide nanoparticles | |
JP2013533841A (ja) | セレン化物粉末と製造方法 | |
TWI510437B (zh) | A method for producing a compound having a chalcopyrite structure |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170518 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20180305 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180313 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20180604 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180719 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20181003 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20181220 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190228 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190521 |
|
A524 | Written submission of copy of amendment under article 19 pct |
Free format text: JAPANESE INTERMEDIATE CODE: A524 Effective date: 20190731 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20191119 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20191125 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6623192 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |