JP6621401B2 - 耐摩耗層を生産する方法およびその方法によって生産された耐摩耗層 - Google Patents
耐摩耗層を生産する方法およびその方法によって生産された耐摩耗層 Download PDFInfo
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Description
耐摩耗層が、摩耗に曝される内燃機関コンポーネントの表面上に、本発明に係る方法を用いて形成(生産)される。この点において、パルス化レーザー放射によりアーク放電が真空条件下で連続して点火されることによってプラズマが形成され、アーク放電は、アノードと、グラファイトで構成されるカソードとの間にもたらされる。プラズマのイオン化部分が、sp2およびsp3の混成炭素の混合物を含む少なくともおおよそ水素フリーの四面体アモルファス(ta−C)から形成される層(VDI基準2840に従うta−C)として形成され、少なくとも1つのコンポーネントの表面上に堆積する。
また、本発明に従って生産された耐摩耗層は、平均粗さ深さRzが最大1.0μmであるのが有益である。平均粗さ深さRzは、全ての測定された値の個々の粗さ深さの算術平均値に相当する。
耐摩耗層の微小硬度が少なくとも3500HV、好ましくは4000HV、さらに好ましくは少なくとも5000HV、特に好ましくは少なくとも5700HV、特に非常に好ましくは6000HVである場合、平均粗さ値Raが0.08μm未満、特に好ましくは0.05μm未満であることが特に良好であり、これによって耐摩耗性を向上させ、また耐用年数を増大し得る。Helmut Fischer GmbH & Co.KG社の機器「FISCHERSCOPE H100C XYP」が、硬度測定に用いることができる。試験力は、インデンターの侵入深さが、層厚さの最大1/10に達するように選択されるべきである。
この点において、sp3の混成炭素の割合は、40%を超えて、好ましくは50%を超えて存在すべきである。
図1は、真空チャンバ1を有する真空コーティングプラントを示しており、回転装置には、コーティングされるコンポーネント14が、固定され、2回、および3回の回転でコーティングされ得る。既知のアーク放電源もしくはスパッター源2、またはこれらの組合せが、プラズマエッチングのため、または薄い接着層を堆積させるために真空チャンバ1内に存在する。
コーティングが、好ましくは、コンポーネント14の表面上への耐摩耗層の形成時に、3倍の回転で形成すべきである。真空チャンバ1を空にして、表面のクリーニングおよび表面活性化を実行した後に、厚さがおよそ0.1μmのCr接着層が、スパッタリングによって堆積される。
Raが平均で0.09μm、Rzが平均で1.0μm、Rpkが平均で0.28μm。フィッシャースコープ(Fischerscope)を用いて判定された耐摩耗層の微小硬度は、7040HVであり、Lawaveを用いて判定されたヤング率は、740GPaであった。
Claims (6)
- 耐摩耗層を、摩耗に曝される内燃機関のコンポーネントの表面上に形成生産する方法であって、
グラファイトのカソードと、前記カソードの近傍に配置されたアノードと、前記カソードから発生するプラズマ中のより大きな滴または小滴の飛翔方向に配置されたアブソーバ電極と、前記カソードと少なくとも1つのコンポーネントの間であって、前記アノードの横方向に配置された永久磁石装置とを有する真空コーティングプラントを用いて、
前記アーク放電は、前記アノードと、前記グラファイトのカソードとの間にもたらされ、前記プラズマのイオン化部分が、sp2およびsp3の混成炭素の混合物を含む少なくともおおよそ水素フリーの四面体アモルファス(ta−C)から形成される層として、前記少なくとも1つのコンポーネントの表面上に堆積し、前記プラズマについて、前記アブソーバ電極によって、前記プラズマの正に帯電するイオンが前記少なくとも1つのコンポーネントの方向に屈折し、少なくともおおよそ同じ電圧が前記アノードおよび前記アブソーバ電極に印加され、前記アーク放電がもたらされると同時に、電流が前記アブソーバ電極を通って流れ、該電流は、前記アノードを通って流れる前記電流よりも少なくとも1.5倍大きく、かつ1100A±100Aであり、前記少なくとも1つのコンポーネントのコーティングされた前記表面の機械仕上げおよび/または化学的機械仕上げが実行されなく、前記表面の平滑化をもたらす方法。 - 前記アブソーバ電極を通って流れる前記電流は、前記アノードを通って流れる前記電流よりも少なくとも2倍大きいことを特徴とする請求項1に記載の方法。
- 前記プラズマは、レーザーアークチャンバ内で形成されて、前記少なくとも1つのコンポーネントが配置される真空チャンバ中に屈折することを特徴とする請求項1または2に記載の方法。
- 前記プラズマの正に帯電するイオンが、前記アブソーバ電極によって、前記少なくとも1つのコンポーネントの前記表面に影響を与えないように屈折して、前記カソードから直接的に放出し、電子が、前記プラズマから前記アブソーバ電極の方向に移動することを特徴とする請求項1から3のいずれか一項に記載の方法。
- 真空チャンバ内に配置されるアーク放電源、またはスパッター源を用いて、薄い接着層が前記少なくとも1つのコンポーネント上に堆積することを特徴とする請求項1から4のいずれか一項に記載の方法。
- 複数のストリップを有するアブソーバ電極が用いられ、これらの間に、より大きな滴または小滴が、前記少なくとも1つのコンポーネントの前記表面に影響を与えないように通されることを特徴とする請求項1から5のいずれか一項に記載の方法。
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EP1884978B1 (en) * | 2006-08-03 | 2011-10-19 | Creepservice S.à.r.l. | Process for the coating of substrates with diamond-like carbon layers |
JP5273337B2 (ja) | 2007-06-01 | 2013-08-28 | 神奈川県 | 低摩擦摺動部材 |
WO2010020274A1 (en) * | 2008-08-18 | 2010-02-25 | Metso Paper, Inc. | Coating for lowering friction effect and improving wear resistance of a component in a fibre web machine and process of producing the same |
DE102011003254A1 (de) * | 2011-01-27 | 2012-08-02 | Federal-Mogul Burscheid Gmbh | Gleitelement, insbesondere Kolbenring, mit einer Beschichtung sowie Verfahren zur Herstellung eines Gleitelements |
DE102011016611A1 (de) | 2011-04-01 | 2012-10-04 | Technische Universität Dresden | Gleitsystem |
WO2012148794A2 (en) * | 2011-04-25 | 2012-11-01 | Waters Technologies Corporation | Valves having protective coatings |
EP2587518B1 (en) * | 2011-10-31 | 2018-12-19 | IHI Hauzer Techno Coating B.V. | Apparatus and Method for depositing Hydrogen-free ta C Layers on Workpieces and Workpiece |
-
2014
- 2014-04-30 WO PCT/EP2014/058884 patent/WO2014177641A1/de active Application Filing
- 2014-04-30 EP EP14720969.6A patent/EP2992121B1/de active Active
- 2014-04-30 US US14/787,335 patent/US9803273B2/en active Active
- 2014-04-30 PL PL14720969T patent/PL2992121T3/pl unknown
- 2014-04-30 KR KR1020157033403A patent/KR20160003045A/ko not_active IP Right Cessation
- 2014-04-30 JP JP2016511068A patent/JP6621401B2/ja active Active
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Publication number | Publication date |
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KR20160003045A (ko) | 2016-01-08 |
US9803273B2 (en) | 2017-10-31 |
US20160153083A1 (en) | 2016-06-02 |
EP2992121B1 (de) | 2019-06-19 |
JP2016524651A (ja) | 2016-08-18 |
PL2992121T3 (pl) | 2019-11-29 |
EP2992121A1 (de) | 2016-03-09 |
WO2014177641A1 (de) | 2014-11-06 |
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