JP6523840B2 - ガス成分検出装置 - Google Patents

ガス成分検出装置 Download PDF

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Publication number
JP6523840B2
JP6523840B2 JP2015142206A JP2015142206A JP6523840B2 JP 6523840 B2 JP6523840 B2 JP 6523840B2 JP 2015142206 A JP2015142206 A JP 2015142206A JP 2015142206 A JP2015142206 A JP 2015142206A JP 6523840 B2 JP6523840 B2 JP 6523840B2
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Japan
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light
detection
component
gas
intensity
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JP2015142206A
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Japanese (ja)
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JP2017026345A (ja
Inventor
井戸　琢也
琢也 井戸
石川　浩二
浩二 石川
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Horiba Ltd
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Horiba Ltd
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Priority to JP2015142206A priority Critical patent/JP6523840B2/ja
Priority to CN201610550431.4A priority patent/CN106353263A/zh
Publication of JP2017026345A publication Critical patent/JP2017026345A/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N2021/3129—Determining multicomponents by multiwavelength light

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2015142206A 2015-07-16 2015-07-16 ガス成分検出装置 Expired - Fee Related JP6523840B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015142206A JP6523840B2 (ja) 2015-07-16 2015-07-16 ガス成分検出装置
CN201610550431.4A CN106353263A (zh) 2015-07-16 2016-07-13 气体成分检测装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015142206A JP6523840B2 (ja) 2015-07-16 2015-07-16 ガス成分検出装置

Publications (2)

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JP2017026345A JP2017026345A (ja) 2017-02-02
JP6523840B2 true JP6523840B2 (ja) 2019-06-05

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JP2015142206A Expired - Fee Related JP6523840B2 (ja) 2015-07-16 2015-07-16 ガス成分検出装置

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JP (1) JP6523840B2 (zh)
CN (1) CN106353263A (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6965654B2 (ja) * 2017-09-19 2021-11-10 横河電機株式会社 フーリエ分光分析装置
CN108562540A (zh) * 2017-12-29 2018-09-21 深圳市华星光电技术有限公司 光学测试装置
CN109596541A (zh) * 2018-11-07 2019-04-09 北京东方安杰科技有限公司 一种光源状态检测***及其检测方法
JPWO2022220145A1 (zh) * 2021-04-13 2022-10-20

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JPS509482A (zh) * 1973-05-22 1975-01-30
JPS63259438A (ja) * 1987-04-15 1988-10-26 Osaka Gas Co Ltd 管内の水または水蒸気の測定装置
JPH0628720U (ja) * 1992-09-17 1994-04-15 関西電力株式会社 ガス総量測定装置
US5679957A (en) * 1996-01-04 1997-10-21 Ada Technologies, Inc. Method and apparatus for monitoring mercury emissions
JP4227991B2 (ja) * 2005-12-28 2009-02-18 トヨタ自動車株式会社 排ガス分析装置および排ガス分析方法
JP2008175611A (ja) * 2007-01-17 2008-07-31 Fuji Electric Systems Co Ltd ガス濃度測定装置およびガス濃度測定方法
JP2009036714A (ja) * 2007-08-03 2009-02-19 Canon Inc 光学濃度センサー及び光学濃度センサーを搭載した画像形成装置
CN101290283B (zh) * 2008-06-04 2010-07-14 太原中绿环保技术有限公司 激光后向散射测尘设备的探头装置
KR101947004B1 (ko) * 2008-06-10 2019-02-12 엑스트랄리스 테크놀로지 리미티드 입자 검출
JP5190700B2 (ja) * 2008-11-14 2013-04-24 株式会社Ｉｈｉ 気体成分濃度測定装置
WO2010102375A1 (en) * 2009-03-11 2010-09-16 Thiebaeud Jerome Apparatus for continuous in situ monitoring of elemental mercury vapour, and method of using same
EP2430423B1 (en) * 2009-05-11 2017-08-02 GasPorOx AB Apparatus and method for non-intrusive assessment of gas in packages
CN101694460B (zh) * 2009-10-16 2011-02-09 东南大学 烟气污染物浓度的自适应差分吸收光谱测量方法及装置
CN102639983A (zh) * 2009-12-04 2012-08-15 西门子公司 用于在管道气体监控***中确定光学测量路径长度的方法
EP2405254B1 (de) * 2010-07-05 2014-06-04 Sick Ag Optoelektronisches Verfahren zur Gasanalyse
EP2525210B1 (de) * 2011-05-16 2014-06-04 Sick Ag Vorrichtung und Verfahren zur Bestimmung einer Konzentration einer Messkomponente in einem Gas
EP2711688B1 (en) * 2011-05-20 2020-09-02 HORIBA, Ltd. Measuring unit and gas analyzing apparatus
US20130015362A1 (en) * 2011-07-12 2013-01-17 Sharp Kabushiki Kaisha Fluid purification and sensor system
JP6416453B2 (ja) * 2011-08-12 2018-10-31 株式会社堀場製作所 ガス分析装置
EP2587154A1 (en) * 2011-10-24 2013-05-01 Alstom Technology Ltd Method for data acquisition from a combustion process
JP2013127385A (ja) * 2011-12-19 2013-06-27 Fuji Electric Co Ltd レーザ式ガス分析計
CN203324177U (zh) * 2013-02-01 2013-12-04 深圳市理邦精密仪器股份有限公司 一种测量气体浓度的装置
JP6271139B2 (ja) * 2013-03-21 2018-01-31 株式会社堀場製作所 温度計
CN103543124A (zh) * 2013-06-26 2014-01-29 天津大学 一种基于软件锁相的可调激光吸收光谱气体检测方法
CN103528983B (zh) * 2013-10-23 2016-01-20 山东省科学院海洋仪器仪表研究所 一种气体检测装置及气体检测方法
CN203616250U (zh) * 2013-12-18 2014-05-28 天津科技大学 一种用于监测农产品运输车车厢中氨气含量的装置
CN203772736U (zh) * 2014-04-18 2014-08-13 廊坊开元高技术开发公司 一种抗干扰汞蒸气测量装置

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JP2017026345A (ja) 2017-02-02
CN106353263A (zh) 2017-01-25

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