JP6468358B2 - パージストッカ、及びパージストッカにおけるパージガスの供給方法 - Google Patents
パージストッカ、及びパージストッカにおけるパージガスの供給方法 Download PDFInfo
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- JP6468358B2 JP6468358B2 JP2017532414A JP2017532414A JP6468358B2 JP 6468358 B2 JP6468358 B2 JP 6468358B2 JP 2017532414 A JP2017532414 A JP 2017532414A JP 2017532414 A JP2017532414 A JP 2017532414A JP 6468358 B2 JP6468358 B2 JP 6468358B2
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- JP
- Japan
- Prior art keywords
- container
- purge
- flow rate
- purge gas
- placement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
- B08B5/023—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/0821—Handling or manipulating containers, e.g. moving or rotating containers in cleaning devices, conveying to or from cleaning devices
- B08B9/0826—Handling or manipulating containers, e.g. moving or rotating containers in cleaning devices, conveying to or from cleaning devices the containers being brought to the cleaning device
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
- B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
- B08B9/283—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking by gas jets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
- B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
- B08B9/34—Arrangements of conduits or nozzles
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K21/00—Fluid-delivery valves, e.g. self-closing valves
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Warehouses Or Storage Devices (AREA)
Description
Claims (3)
- 水平方向に並び、容器が載置されるグループ化された複数の載置部と、
前記載置部に前記容器が載置されることにより前記容器にパージガスを供給する流路が開くように形成されたノズルと、
前記グループ内の前記容器の個数に基づいて前記グループ内に供給する前記パージガスの流量を調整する流量制御装置と、を備えるパージ装置を複数備え、
前記複数の載置部に沿って走行可能であり、前記載置部に対して前記容器を移載する搬送装置を備え、
前記流量制御装置は、前記搬送装置の走行範囲の端部側にまとめて配置され、
前記載置部のそれぞれは、前記容器が載置されているか否かを検出する検出部を有し、
前記流量制御装置は、前記グループ内に新たな前記容器が載置された場合、前記パージガスの流量を、一旦減少させてから徐々に、前記検出部の検出結果によって取得される前記容器の個数に基づく所定流量まで増加させる、パージストッカ。 - 前記ノズルは、前記載置部に前記容器が載置されない状態において前記パージガスの圧力によって流路を閉塞する蓋部を有し、
前記蓋部は、前記載置部に前記容器が載置された場合に前記容器の重量によって前記流路を開放する、請求項1記載のパージストッカ。 - 水平方向にグループ化された複数の載置部に載置された容器に対してパージガスを供給する方法であって、
前記載置部に前記容器が載置されることにより前記容器にパージガスを供給する流路を開くことと、
前記複数の載置部に沿って走行可能であり、前記載置部に対して前記容器を移載する搬送装置の走行範囲の端部側にまとめて配置される複数の流量制御装置のそれぞれにより、前記グループ内の前記容器の個数に基づいて前記グループ内に供給する前記パージガスの流量を調整することと、を含み、
前記載置部のそれぞれは、前記容器が載置されているか否かを検出する検出部を有し、
前記流量制御装置は、前記グループ内に新たな前記容器が載置された場合、前記パージガスの流量を、一旦減少させてから徐々に、前記検出部の検出結果によって取得される前記容器の個数に基づく所定流量まで増加させる、パージストッカにおけるパージガスの供給方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015153757 | 2015-08-04 | ||
JP2015153757 | 2015-08-04 | ||
PCT/JP2016/067203 WO2017022330A1 (ja) | 2015-08-04 | 2016-06-09 | パージ装置、パージストッカ、及びパージガスの供給方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2017022330A1 JPWO2017022330A1 (ja) | 2018-05-24 |
JP6468358B2 true JP6468358B2 (ja) | 2019-02-13 |
Family
ID=57944189
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017532414A Active JP6468358B2 (ja) | 2015-08-04 | 2016-06-09 | パージストッカ、及びパージストッカにおけるパージガスの供給方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US10766056B2 (ja) |
JP (1) | JP6468358B2 (ja) |
CN (1) | CN107851596A (ja) |
TW (1) | TWI693660B (ja) |
WO (1) | WO2017022330A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6623988B2 (ja) * | 2016-09-09 | 2019-12-25 | 株式会社ダイフク | 容器収納設備 |
JP6817757B2 (ja) * | 2016-09-16 | 2021-01-20 | 東京エレクトロン株式会社 | 基板処理装置及び基板移送方法 |
WO2018150698A1 (ja) * | 2017-02-20 | 2018-08-23 | 村田機械株式会社 | パージストッカ |
JP6794898B2 (ja) * | 2017-03-29 | 2020-12-02 | 株式会社ダイフク | 収納棚 |
KR102453738B1 (ko) * | 2018-06-15 | 2022-10-12 | 무라다기카이가부시끼가이샤 | 보관 선반 |
JP7090513B2 (ja) * | 2018-09-06 | 2022-06-24 | 東京エレクトロン株式会社 | 基板処理装置及びパージ方法 |
CN117402277B (zh) * | 2023-12-15 | 2024-04-09 | 万华化学集团股份有限公司 | 一种淤浆法生产超高分子量聚乙烯出料线防堵塞的工艺方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH11314703A (ja) * | 1998-04-30 | 1999-11-16 | Ebara Corp | 基板保管装置 |
JP2005340330A (ja) | 2004-05-25 | 2005-12-08 | Matsushita Electric Ind Co Ltd | 半導体基板の保管容器および半導体基板の保管方法 |
JP4670808B2 (ja) * | 2006-12-22 | 2011-04-13 | ムラテックオートメーション株式会社 | コンテナの搬送システム及び測定用コンテナ |
JP2009022908A (ja) * | 2007-07-20 | 2009-02-05 | Chugoku Electric Power Co Inc:The | 汚水浄化システム |
JP5236518B2 (ja) * | 2009-02-03 | 2013-07-17 | 株式会社ダン・タクマ | 保管システムおよび保管方法 |
JP5598728B2 (ja) * | 2011-12-22 | 2014-10-01 | 株式会社ダイフク | 不活性ガス注入装置 |
JP5709011B2 (ja) * | 2011-12-26 | 2015-04-30 | 株式会社ダイフク | 物品保管設備 |
JP5598729B2 (ja) * | 2011-12-26 | 2014-10-01 | 株式会社ダイフク | 物品保管設備 |
JP5598734B2 (ja) * | 2012-01-06 | 2014-10-01 | 株式会社ダイフク | 物品保管設備 |
JP5888288B2 (ja) * | 2013-06-26 | 2016-03-16 | 株式会社ダイフク | 物品保管設備の検査装置 |
JP6217281B2 (ja) | 2013-09-25 | 2017-10-25 | 村田機械株式会社 | 自動倉庫、及びガス供給方法 |
JP2015142104A (ja) * | 2014-01-30 | 2015-08-03 | 村田機械株式会社 | パージ装置、パージストッカ、及び容器 |
-
2016
- 2016-06-09 WO PCT/JP2016/067203 patent/WO2017022330A1/ja active Application Filing
- 2016-06-09 US US15/749,803 patent/US10766056B2/en active Active
- 2016-06-09 JP JP2017532414A patent/JP6468358B2/ja active Active
- 2016-06-09 CN CN201680045256.1A patent/CN107851596A/zh active Pending
- 2016-08-04 TW TW105124757A patent/TWI693660B/zh active
Also Published As
Publication number | Publication date |
---|---|
US10766056B2 (en) | 2020-09-08 |
TWI693660B (zh) | 2020-05-11 |
US20180229277A1 (en) | 2018-08-16 |
WO2017022330A1 (ja) | 2017-02-09 |
TW201714241A (zh) | 2017-04-16 |
JPWO2017022330A1 (ja) | 2018-05-24 |
CN107851596A (zh) | 2018-03-27 |
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