JP6458236B2 - アルカリ可溶性樹脂、感光性樹脂組成物及びその用途 - Google Patents

アルカリ可溶性樹脂、感光性樹脂組成物及びその用途 Download PDF

Info

Publication number
JP6458236B2
JP6458236B2 JP2014196958A JP2014196958A JP6458236B2 JP 6458236 B2 JP6458236 B2 JP 6458236B2 JP 2014196958 A JP2014196958 A JP 2014196958A JP 2014196958 A JP2014196958 A JP 2014196958A JP 6458236 B2 JP6458236 B2 JP 6458236B2
Authority
JP
Japan
Prior art keywords
group
alkali
meth
resin composition
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014196958A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016069400A (ja
Inventor
昌祥 九澤
昌祥 九澤
優太 深津
優太 深津
啓雄 飯田
啓雄 飯田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Natoco Co Ltd
Original Assignee
Natoco Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Natoco Co Ltd filed Critical Natoco Co Ltd
Priority to JP2014196958A priority Critical patent/JP6458236B2/ja
Priority to TW104131352A priority patent/TWI669287B/zh
Priority to PCT/JP2015/076970 priority patent/WO2016047703A1/ja
Priority to KR1020177010773A priority patent/KR20170063762A/ko
Priority to CN201580051227.1A priority patent/CN106715598B/zh
Publication of JP2016069400A publication Critical patent/JP2016069400A/ja
Application granted granted Critical
Publication of JP6458236B2 publication Critical patent/JP6458236B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/05Alcohols; Metal alcoholates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • C08L101/02Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C08L101/10Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing hydrolysable silane groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2014196958A 2014-09-26 2014-09-26 アルカリ可溶性樹脂、感光性樹脂組成物及びその用途 Active JP6458236B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2014196958A JP6458236B2 (ja) 2014-09-26 2014-09-26 アルカリ可溶性樹脂、感光性樹脂組成物及びその用途
TW104131352A TWI669287B (zh) 2014-09-26 2015-09-23 Alkali-soluble resin, photosensitive resin composition and use thereof
PCT/JP2015/076970 WO2016047703A1 (ja) 2014-09-26 2015-09-24 アルカリ可溶性樹脂、感光性樹脂組成物及びその用途
KR1020177010773A KR20170063762A (ko) 2014-09-26 2015-09-24 알칼리 가용성 수지, 감광성 수지 조성물 및 그 용도
CN201580051227.1A CN106715598B (zh) 2014-09-26 2015-09-24 碱溶性树脂、感光性树脂组合物及其用途

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014196958A JP6458236B2 (ja) 2014-09-26 2014-09-26 アルカリ可溶性樹脂、感光性樹脂組成物及びその用途

Publications (2)

Publication Number Publication Date
JP2016069400A JP2016069400A (ja) 2016-05-09
JP6458236B2 true JP6458236B2 (ja) 2019-01-30

Family

ID=55581224

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014196958A Active JP6458236B2 (ja) 2014-09-26 2014-09-26 アルカリ可溶性樹脂、感光性樹脂組成物及びその用途

Country Status (5)

Country Link
JP (1) JP6458236B2 (zh)
KR (1) KR20170063762A (zh)
CN (1) CN106715598B (zh)
TW (1) TWI669287B (zh)
WO (1) WO2016047703A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017056928A1 (ja) * 2015-09-30 2017-04-06 富士フイルム株式会社 レジスト組成物、並びに、これを用いたレジスト膜、パターン形成方法及び電子デバイスの製造方法
KR102658153B1 (ko) * 2017-09-28 2024-04-16 제이에스알 가부시끼가이샤 감방사선성 수지 조성물 및 그의 용도
JP7035889B2 (ja) * 2017-09-28 2022-03-15 Jsr株式会社 感放射線性樹脂組成物およびその用途
JP7047652B2 (ja) * 2017-09-28 2022-04-05 Jsr株式会社 感放射線性樹脂組成物およびその用途
JP7392719B2 (ja) 2019-06-25 2023-12-06 株式会社レゾナック 感光性樹脂組成物、樹脂硬化膜及び画像表示素子
TW202204475A (zh) * 2020-06-03 2022-02-01 日商富士軟片股份有限公司 硬化性樹脂組成物、硬化膜、積層體、硬化膜之製造方法及半導體器件
WO2024042107A1 (en) 2022-08-26 2024-02-29 Merck Patent Gmbh Composition
WO2024042106A1 (en) 2022-08-26 2024-02-29 Merck Patent Gmbh Composition

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4526856A (en) * 1983-05-23 1985-07-02 Allied Corporation Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents
JPS60206802A (ja) * 1984-03-30 1985-10-18 Dainippon Ink & Chem Inc 改良された加水分解性シリル基含有ビニル系重合体の製造法
JPS60206812A (ja) * 1984-03-31 1985-10-18 Dainippon Ink & Chem Inc 改良された加水分解性シリル基含有ビニル系重合体を含む常温硬化性樹脂組成物
JPH02233709A (ja) * 1989-03-08 1990-09-17 Kansai Paint Co Ltd 樹脂、有機液体、非水分散液、水性液体、硬化性組成物及び塗料組成物
KR101068111B1 (ko) * 2005-01-27 2011-09-27 주식회사 동진쎄미켐 감광성 수지 조성물
JP2006337567A (ja) * 2005-05-31 2006-12-14 Sekisui Chem Co Ltd フォトレジスト用光硬化性樹脂組成物、カラムスペーサ及び液晶表示素子
JP5135820B2 (ja) * 2007-02-20 2013-02-06 Jsr株式会社 アルカリ可溶性重合体、着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示素子
JP5108480B2 (ja) * 2007-11-28 2012-12-26 東京応化工業株式会社 層間絶縁膜用感光性樹脂組成物
JP5375412B2 (ja) * 2009-07-30 2013-12-25 Jsr株式会社 微細パターン形成用樹脂組成物および微細パターン形成方法
JP5413666B2 (ja) * 2009-11-20 2014-02-12 Dic株式会社 複合樹脂組成物、それを含むプライマーコート剤、及び積層体
TW201310166A (zh) * 2011-08-31 2013-03-01 Everlight Chem Ind Corp 層間絕緣膜暨保護膜用之樹脂及感光樹脂組成物
JP5935297B2 (ja) * 2011-11-09 2016-06-15 Jnc株式会社 ポジ型感光性組成物
JP6218393B2 (ja) * 2013-02-28 2017-10-25 東京応化工業株式会社 層間絶縁膜用感光性樹脂組成物

Also Published As

Publication number Publication date
CN106715598B (zh) 2019-07-19
TW201612141A (en) 2016-04-01
CN106715598A (zh) 2017-05-24
KR20170063762A (ko) 2017-06-08
WO2016047703A1 (ja) 2016-03-31
TWI669287B (zh) 2019-08-21
JP2016069400A (ja) 2016-05-09

Similar Documents

Publication Publication Date Title
JP6458236B2 (ja) アルカリ可溶性樹脂、感光性樹脂組成物及びその用途
JP5616871B2 (ja) ポジ型感光性樹脂組成物、硬化物の製造方法、樹脂パターン製造方法、硬化物及び光学部材
JP5507208B2 (ja) ポジ型感光性樹脂組成物、硬化膜、層間絶縁膜、有機el表示装置、及び液晶表示装置
TWI537288B (zh) 光敏樹脂組成物及使用該組成物之介電絕緣膜及電子裝置
JP5744694B2 (ja) ポジ型感光性樹脂組成物、硬化物の製造方法、樹脂パターン製造方法、硬化物及び光学部材
JP2013134263A (ja) ブラックカラムスペーサ用感光性樹脂組成物、ブラックカラムスペーサ、表示装置、及びブラックカラムスペーサの形成方法
KR20150055417A (ko) 착색 감광성 수지 조성물
CN107272341B (zh) 遮光膜用感光性树脂组合物、显示器用基板及其制造方法
JP5566988B2 (ja) 樹脂組成物、硬化物の製造方法、樹脂パターン製造方法、硬化物及び光学部材
TWI665518B (zh) 負型感光性樹脂組合物、使用該組合物的光固化圖案及圖像顯示裝置
JP7201034B2 (ja) 感放射線性組成物
TW202012382A (zh) 組合物、硬化物、圖案形成方法、化合物、聚合物及化合物之製造方法
TWI626507B (zh) 負型光敏性樹脂組成物
TW201831459A (zh) 組合物、硬化物、圖案形成方法、化合物、聚合物、及化合物之製造方法
JP2014174374A (ja) 感光性樹脂組成物及びその硬化物
JP2014153411A (ja) 感光性樹脂組成物及びその硬化物
JP2018045239A (ja) 感光性樹脂組成物及びそれから製造される光硬化パターン
JP2010181866A (ja) ポジ型感光性樹脂組成物、硬化膜、層間絶縁膜、有機el表示装置、および液晶表示装置
WO2019142415A1 (ja) カラーフィルター用感光性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法
JP5916939B2 (ja) ブラックカラムスペーサの形成方法
TWI659266B (zh) Photosensitive resin composition
KR20170115954A (ko) 감광성 수지 조성물
JP5884551B2 (ja) 感光性樹脂組成物およびその用途
JP5637024B2 (ja) 感光性樹脂組成物およびその用途
KR20180073002A (ko) 네가티브형 감광성 수지 조성물 및 이로부터 형성된 광경화 패턴

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170619

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180807

RD05 Notification of revocation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7425

Effective date: 20180822

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180926

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20181119

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20181119

R150 Certificate of patent or registration of utility model

Ref document number: 6458236

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250