JP6423434B2 - Euvリソグラフィーに使用されるチタンドープシリカガラスを作製する方法 - Google Patents
Euvリソグラフィーに使用されるチタンドープシリカガラスを作製する方法 Download PDFInfo
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- JP6423434B2 JP6423434B2 JP2016533864A JP2016533864A JP6423434B2 JP 6423434 B2 JP6423434 B2 JP 6423434B2 JP 2016533864 A JP2016533864 A JP 2016533864A JP 2016533864 A JP2016533864 A JP 2016533864A JP 6423434 B2 JP6423434 B2 JP 6423434B2
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
- C03B19/1461—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering for doping the shaped article with flourine
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/52—Reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/60—Substrates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
- C03C2203/42—Gas-phase processes using silicon halides as starting materials
- C03C2203/46—Gas-phase processes using silicon halides as starting materials fluorine containing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Description
(a)ケイ素含有前駆物質及びチタン含有前駆物質の火炎加水分解を用いてTiO2−SiO2スート体を作製すること、
(b)120重量ppm未満の平均ヒドロキシル基含量が得られるように前記スート体を乾燥させること、
(c)前記スート体をガラス化して、ケイ酸含量が高いチタンドープガラスのブランクを形成すること、
を含む、方法に関する。
(1)2Ti3++N2O→2Ti4++O2−+N2
(2)8Ti3++2NO2→8Ti4++4O2−+N2
既知の「外付け蒸着」(Outside Vapor Deposition;OVD)法に基づくオクタメチルシクロテトラシロキサン(OMCTS)及びチタン−イソプロポキシド(Ti(OPri)4)の火炎加水分解を用いてスート体を作製する。スート体は8重量%のTiO2をドープした合成シリカガラスからなる。
Tiドープシリカガラスの別のブランクを、亜酸化窒素(N2O、笑気ガス)の代わりに窒素酸化物(NO2)を酸化剤として使用した以外は、実施例1を参照して上記のように作製する。
作製方法の変更形態では、実施例1を参照して記載のように、TiO2−SiO2スート体を乾燥工程後に20容量%のSiF4を含有する雰囲気でのドーピング処理に供する。
実施例4では、乾燥工程と組み合わせたTiO2−SiO2スート体のフッ素同時ドーピングを用いる実施例3の変形形態に言及する。したがって、TiO2−SiO2スート体を初めに熱乾燥プロセスに供さず、堆積後にスート体を1000℃のN2/SiF4のフッ素含有雰囲気で直接処理する。不活性ガス(N2)中のSiF4の容量比は10容量%である。処理は10時間にわたって行う。続いて、笑気ガス(N2O)による処理を行った後、実施例1に記載のようにガラス化及び均質化を行う。
Claims (9)
- EUVリソグラフィーに使用される、サンプル厚さ10mmで400nm〜1000nmの波長範囲における内部透過率が少なくとも70%のケイ酸含量が高いチタンドープガラスのブランクを作製する方法であって、該方法が以下の方法工程:
(a)ケイ素含有前駆物質及びチタン含有前駆物質の火炎加水分解を用いてTiO2−SiO2スート体を作製することと、
(b)120重量ppm未満の平均ヒドロキシル基含量が得られるように前記スート体を乾燥させることと、
(c)前記スート体をガラス化して、ケイ酸含量が高いチタンドープガラスのブランクを形成することと、
を含み、方法工程(c)によるガラス化の前に、前記TiO2−SiO2スート体を、窒素酸化物による処理を含むコンディショニング処理に供し、前記コンディショニング処理を、前記窒素酸化物として亜酸化窒素(N 2 O)を用いて行うことを特徴とする、方法。 - 前記コンディショニング処理を20℃〜600℃の範囲の処理温度で少なくとも1時間にわたって前記窒素酸化物を用いて行うことを特徴とする、請求項1記載の方法。
- 前記スート体からの反応ガスの排除のために、前記窒素酸化物によるコンディショニング処理の後でかつ方法工程(c)によるガラス化の前に600℃〜1000℃の温度範囲での熱処理を行うことを特徴とする、請求項1又は2に記載の方法。
- 前記窒素酸化物によるコンディショニング処理において、不活性ガス中の窒素酸化物含有ガスの量が0.1容量%〜20容量%であることを特徴とする、請求項1〜3のいずれか一項に記載の方法。
- 前記窒素酸化物によるコンディショニング処理において、不活性ガス中の窒素酸化物含有ガスの量が5容量%〜10容量%であることを特徴とする、請求項1〜3のいずれか一項に記載の方法。
- 前記TiO2−SiO2スート体のドーピング処理をフッ素含有雰囲気で、前記窒素酸化物によるコンディショニング処理の前に行うことを特徴とする、請求項1〜5のいずれか一項に記載の方法。
- 前記ドーピング処理中に方法工程(b)による乾燥を完全に又は部分的に行うことを特徴とする、請求項6に記載の方法。
- 前記ドーピング処理を20℃〜1000℃以下の温度範囲で行うことを特徴とする、請求項6又は7に記載の方法。
- 前記ドーピング処理中の前記フッ素含有雰囲気が、10容量%〜100容量%のSiF4を含む不活性ガス雰囲気を含有することを特徴とする、請求項6〜8のいずれか一項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102013108885.6A DE102013108885B3 (de) | 2013-08-16 | 2013-08-16 | Verfahren zur Herstellung von Titan-dotiertem Kieselglas für den Einsatz in der EUV-Lithographie und danach hergestellter Rohling |
DE102013108885.6 | 2013-08-16 | ||
PCT/EP2014/065686 WO2015022152A1 (de) | 2013-08-16 | 2014-07-22 | Verfahren zur herstellung von titan-dotiertem kieselglas für den einsatz in der euv-lithographie und danach hergestellter rohling |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016531828A JP2016531828A (ja) | 2016-10-13 |
JP6423434B2 true JP6423434B2 (ja) | 2018-11-14 |
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ID=51206289
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Application Number | Title | Priority Date | Filing Date |
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JP2016533864A Active JP6423434B2 (ja) | 2013-08-16 | 2014-07-22 | Euvリソグラフィーに使用されるチタンドープシリカガラスを作製する方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US9586850B2 (ja) |
EP (1) | EP3033306B8 (ja) |
JP (1) | JP6423434B2 (ja) |
KR (1) | KR102122331B1 (ja) |
CN (1) | CN105431388B (ja) |
DE (1) | DE102013108885B3 (ja) |
TW (1) | TWI600623B (ja) |
WO (1) | WO2015022152A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3000791B1 (de) * | 2014-09-24 | 2017-04-26 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur Herstellung eines Rohlings aus Fluor- und Titan-dotiertem, hochkieselsäurehaltigem Glas für den Einsatz in der EUV-Lithographie und danach hergestellter Rohling |
DE102015223923A1 (de) | 2015-12-01 | 2017-06-01 | Carl Zeiss Smt Gmbh | Bestimmung mindestens einer vom temperaturabhängigen thermischen Ausdehnungskoeffizienten eines Materials abhängigen thermischen Eigenschaft |
DE102018211234A1 (de) * | 2018-07-06 | 2020-01-09 | Carl Zeiss Smt Gmbh | Substrat für ein reflektives optisches Element |
KR102174894B1 (ko) * | 2018-10-12 | 2020-11-06 | 세종대학교산학협력단 | Ti가 도핑된 실리콘 산화물/탄소 복합체, 이의 제조방법 및 이를 함유하는 에너지 저장소자 |
JP7122997B2 (ja) * | 2019-04-05 | 2022-08-22 | 信越石英株式会社 | 紫外線吸収性に優れたチタン含有石英ガラス及びその製造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3868170A (en) | 1972-03-30 | 1975-02-25 | Corning Glass Works | Method of removing entrapped gas and/or residual water from glass |
JPS5748493B2 (ja) * | 1974-02-08 | 1982-10-16 | ||
JPS5562822A (en) * | 1978-11-02 | 1980-05-12 | Nippon Telegr & Teleph Corp <Ntt> | Production of multicomponent glass body for light transmission |
FR2476058A1 (fr) | 1980-02-15 | 1981-08-21 | Quartz Silice Sa | Semi-produit pour la production de fibres optiques, procede de preparation du semi-produit et fibres optiques obtenues a partir du semi-produit |
JP4792706B2 (ja) * | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | TiO2を含有するシリカガラスおよびその製造方法 |
EP2241538B1 (en) * | 2004-07-01 | 2013-05-29 | Asahi Glass Company, Limited | Silica glass containing TiO2 and process for its production |
US8137469B2 (en) * | 2005-12-14 | 2012-03-20 | Corning Incorporated | Method and apparatus for making fused silica |
DE102007017004A1 (de) * | 2007-02-27 | 2008-08-28 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils |
JP2008247631A (ja) * | 2007-03-29 | 2008-10-16 | Covalent Materials Corp | チタニア−シリカガラスの製造方法 |
DE112008003728B4 (de) * | 2008-02-27 | 2017-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines optischen Bauteils aus Quarzglas |
JP2009274947A (ja) * | 2008-04-16 | 2009-11-26 | Asahi Glass Co Ltd | TiO2を含有するEUVリソグラフィ光学部材用シリカガラス |
JP2011168450A (ja) * | 2010-02-19 | 2011-09-01 | Asahi Glass Co Ltd | TiO2を含有するシリカガラス体の製造方法 |
US8541325B2 (en) * | 2010-02-25 | 2013-09-24 | Corning Incorporated | Low expansivity, high transmission titania doped silica glass |
-
2013
- 2013-08-16 DE DE102013108885.6A patent/DE102013108885B3/de active Active
-
2014
- 2014-07-22 JP JP2016533864A patent/JP6423434B2/ja active Active
- 2014-07-22 US US14/911,506 patent/US9586850B2/en active Active
- 2014-07-22 EP EP14744804.7A patent/EP3033306B8/de not_active Not-in-force
- 2014-07-22 KR KR1020167006430A patent/KR102122331B1/ko active IP Right Grant
- 2014-07-22 WO PCT/EP2014/065686 patent/WO2015022152A1/de active Application Filing
- 2014-07-22 CN CN201480045062.2A patent/CN105431388B/zh active Active
- 2014-08-01 TW TW103126324A patent/TWI600623B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
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WO2015022152A1 (de) | 2015-02-19 |
DE102013108885B3 (de) | 2014-08-07 |
TW201509838A (zh) | 2015-03-16 |
US20160185645A1 (en) | 2016-06-30 |
JP2016531828A (ja) | 2016-10-13 |
EP3033306B8 (de) | 2017-08-16 |
EP3033306B1 (de) | 2017-06-28 |
US9586850B2 (en) | 2017-03-07 |
TWI600623B (zh) | 2017-10-01 |
CN105431388B (zh) | 2017-12-22 |
KR20160043022A (ko) | 2016-04-20 |
CN105431388A (zh) | 2016-03-23 |
EP3033306A1 (de) | 2016-06-22 |
KR102122331B1 (ko) | 2020-06-15 |
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