JP6411952B2 - 熱分解窒化ほう素容器の製造方法 - Google Patents
熱分解窒化ほう素容器の製造方法 Download PDFInfo
- Publication number
- JP6411952B2 JP6411952B2 JP2015117015A JP2015117015A JP6411952B2 JP 6411952 B2 JP6411952 B2 JP 6411952B2 JP 2015117015 A JP2015117015 A JP 2015117015A JP 2015117015 A JP2015117015 A JP 2015117015A JP 6411952 B2 JP6411952 B2 JP 6411952B2
- Authority
- JP
- Japan
- Prior art keywords
- container
- pbn
- boron nitride
- film
- carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/583—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on boron nitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/342—Boron nitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Description
PBN容器の面と面を繋ぐコーナー部は特に膜の異方性による残留応力によって、PBN膜質が脆くなりやすく脱離し易くなると考えられる。そのためこのコーナー部の、元々脆い上に一部B2O3化したPBN層の減肉化は、フレッシュな欠陥の少ないPBN層を露出させる点でより有効である。
図1に示す外熱型減圧CVD装置1内に 150mmφ×200mmH、コーナー部R20mmの円筒状のグラファイト製の容器型材4をセットし、NH3とBCl3とを2Torr(267Pa)の真空下に1800℃で反応させて、容器型材4上にPBN膜を厚さ1mm成膜した。室温まで冷却して、図2に示すようにして容器型材4から取り外し、図3のような内径150mmで高さ200mm、コーナー部がR20mmの容器形状のPBN成形体7を作製した。
実施例1−10と同様に容器形状のPBN成形体を作製し、その後大気中1000℃で3時間酸化処理を行い、内壁面にグラファイト型から転写して付着したカーボンを除去した。さらに内壁面のコーナー部を番手#600のサンドペーパーで所定の厚さを研磨除去して種々のPBN容器を作製した(実施例11〜20)。
Claims (2)
- 熱分解窒化ほう素容器を製造する方法であって、
熱分解窒化ほう素を熱CVD法でカーボン製の容器型材上に成膜する工程、
この成膜物を前記容器型材から取り外すことで容器形状の成形体を得る工程、
該容器形状の成形体を850℃から1100℃の温度で1〜10時間加熱して、酸化処理することで前記容器型材に由来して表面に付着したカーボンを除去する工程、
その後に、前記容器形状の成形体に型材と接していた側の面から0.5μm以上100μm以下の厚さの表層を除去する減肉化処理を施し容器とする工程から成る熱分解窒化ほう素容器の製造方法。 - 前記減肉化処理を、前記容器形状の成形体のコーナー部だけに行うことを特徴とする請求項1に記載した熱分解窒化ほう素容器の製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015117015A JP6411952B2 (ja) | 2015-06-09 | 2015-06-09 | 熱分解窒化ほう素容器の製造方法 |
DE102016006963.5A DE102016006963A1 (de) | 2015-06-09 | 2016-06-07 | Verfahren zum Herstellen eines Behälters aus pyrolytischem Bornitrid und Behälter aus pyrolytischem Bornitrid |
CN201610405107.3A CN106245000B (zh) | 2015-06-09 | 2016-06-08 | 热分解氮化硼容器的制造方法及热分解氮化硼容器 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015117015A JP6411952B2 (ja) | 2015-06-09 | 2015-06-09 | 熱分解窒化ほう素容器の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017002357A JP2017002357A (ja) | 2017-01-05 |
JP6411952B2 true JP6411952B2 (ja) | 2018-10-24 |
Family
ID=57395054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015117015A Active JP6411952B2 (ja) | 2015-06-09 | 2015-06-09 | 熱分解窒化ほう素容器の製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6411952B2 (ja) |
CN (1) | CN106245000B (ja) |
DE (1) | DE102016006963A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108545914B (zh) * | 2018-05-18 | 2022-09-06 | 山东国晶新材料有限公司 | 一种解决氧化的防起层的热解氮化硼涂层热弯模具的制备方法 |
CN110219051A (zh) * | 2019-06-12 | 2019-09-10 | 有研光电新材料有限责任公司 | 从热解氮化硼坩埚中分离砷化镓单晶的分离方法以及分离装置 |
CN111321388A (zh) * | 2020-03-26 | 2020-06-23 | 久钻科技(成都)有限公司 | 一种金刚石薄膜退涂方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0431309A (ja) * | 1990-05-24 | 1992-02-03 | Shin Etsu Chem Co Ltd | 熱分解窒化ほう素成形体の製造方法 |
JPH1087306A (ja) | 1996-09-10 | 1998-04-07 | Shin Etsu Chem Co Ltd | 熱分解窒化ホウ素容器 |
JP3212522B2 (ja) * | 1996-12-27 | 2001-09-25 | 信越化学工業株式会社 | 分子線エピタキシー用熱分解窒化硼素るつぼ |
JP3596337B2 (ja) | 1998-03-25 | 2004-12-02 | 住友電気工業株式会社 | 化合物半導体結晶の製造方法 |
JP2003146791A (ja) | 2001-11-19 | 2003-05-21 | Sumitomo Metal Mining Co Ltd | 化合物半導体単結晶の製造方法 |
CN101643932B (zh) * | 2009-09-09 | 2011-07-27 | 北京博宇半导体工艺器皿技术有限公司 | 一种低织构的热解氮化硼(pbn)薄壁容器及其制备方法 |
CN102586754B (zh) * | 2012-03-06 | 2013-10-23 | 山东国晶新材料有限公司 | 一种易脱模的热解氮化硼坩埚的制备方法 |
CN103803513B (zh) * | 2014-03-13 | 2015-06-10 | 中国人民解放军国防科学技术大学 | 一种氮化硼纳米管的制备方法 |
-
2015
- 2015-06-09 JP JP2015117015A patent/JP6411952B2/ja active Active
-
2016
- 2016-06-07 DE DE102016006963.5A patent/DE102016006963A1/de active Pending
- 2016-06-08 CN CN201610405107.3A patent/CN106245000B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN106245000B (zh) | 2019-12-13 |
DE102016006963A1 (de) | 2016-12-15 |
CN106245000A (zh) | 2016-12-21 |
JP2017002357A (ja) | 2017-01-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW471052B (en) | Silicon focus ring and its manufacturing method | |
JP2004530306A5 (ja) | ||
JP6279619B2 (ja) | 半導体基板の製造方法 | |
JP2007119273A (ja) | 炭化珪素単結晶の成長方法 | |
JP6411952B2 (ja) | 熱分解窒化ほう素容器の製造方法 | |
JP2018027893A (ja) | Iii族窒化物半導体単結晶の製造方法 | |
JP2015182948A (ja) | 炭化ケイ素単結晶の製造方法 | |
TWI772866B (zh) | 晶圓以及其製造方法 | |
JP2013004825A5 (ja) | ||
JP2021195299A (ja) | Iii族窒化物系エピタキシャル成長用基板とその製造方法 | |
CN111819311A (zh) | 碳化硅单晶的制造方法 | |
CN116084011A (zh) | 一种碳化硅复合衬底及其制造方法 | |
JP5948988B2 (ja) | 炭化珪素単結晶の製造方法 | |
KR101419472B1 (ko) | 단결정 성장용 종자정의 제조 방법, 상기 종자정을 이용한 단결정 성장 방법 | |
CN107923068B (zh) | 单晶硅提拉装置内的部件的再生方法 | |
JPH0977595A (ja) | 炭化珪素単結晶の製造方法 | |
JPH0797299A (ja) | SiC単結晶の成長方法 | |
CN113322520A (zh) | 晶片及其制造方法 | |
CN115698391A (zh) | Iii族氮化物系外延生长用基板及其制造方法 | |
TWI793167B (zh) | 砷化鎵系化合物半導體結晶及晶圓群 | |
KR101544904B1 (ko) | 고온 반응을 이용한 종자정 접착 방법 | |
US20220372653A1 (en) | Method for reducing structural damage to the surface of monocrystalline aluminium-nitride substrates, and monocrystalline aluminium-nitride substrates that can be produced by a method of this type | |
CN111902573B (zh) | 砷化镓单晶和砷化镓单晶基板 | |
JP2005029459A (ja) | 炭化珪素単結晶の成長方法、炭化珪素種結晶および炭化珪素単結晶 | |
EP4324961A1 (en) | Method for producing a bulk sic single crystal with improved quality using a sic seed crystal with a temporary protective oxide layer, and sic seed crystal with protective oxide layer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170726 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20180315 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180403 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180522 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180911 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180927 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6411952 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |