JP6288951B2 - 走査電子顕微鏡を利用した検査システム - Google Patents
走査電子顕微鏡を利用した検査システム Download PDFInfo
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- JP6288951B2 JP6288951B2 JP2013112191A JP2013112191A JP6288951B2 JP 6288951 B2 JP6288951 B2 JP 6288951B2 JP 2013112191 A JP2013112191 A JP 2013112191A JP 2013112191 A JP2013112191 A JP 2013112191A JP 6288951 B2 JP6288951 B2 JP 6288951B2
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- 238000007689 inspection Methods 0.000 title claims description 159
- 239000012528 membrane Substances 0.000 claims description 34
- 239000002245 particle Substances 0.000 claims description 26
- 230000003287 optical effect Effects 0.000 claims description 25
- 238000010894 electron beam technology Methods 0.000 claims description 17
- 238000001514 detection method Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 4
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- 230000000694 effects Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
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- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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- 229910000889 permalloy Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
- H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24592—Inspection and quality control of devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/2602—Details
- H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
10 検査対象物
100 走査電子顕微鏡チャンバ
200 ステージ
300 移送装置
400 光学顕微鏡
500 平坦度調節装置
600 間隔調節装置
700 電子制御装置
800 支持台
Claims (10)
- 電子ビームを利用して検査対象物である平板表示装置を検査し、真空状態を維持する走査電子顕微鏡チャンバと、
前記走査電子顕微鏡チャンバに取り付けられており、前記検査対象物に光を照射して前記検査対象物を検査する光学顕微鏡と、
前記走査電子顕微鏡チャンバ及び前記光学顕微鏡と離隔して下方に位置し、前記検査対象物を載せるステージと、
前記走査電子顕微鏡チャンバ及び前記光学顕微鏡を、前記ステージ上でX軸、Y軸、およびZ軸方向に一体的に移送させる移送装置と、
メンブレンのパーティクル検査およびパーティクル除去を実行するメンブレンパーティクル検査および除去装置と、
を含み、
前記走査電子顕微鏡チャンバは、前記検査対象物に対向して配置されているメンブレンを含み、
前記走査電子顕微鏡チャンバと前記検査対象物の間は大気状態の雰囲気を維持し、
前記走査電子顕微鏡チャンバは、
真空チャンバ部と、
前記真空チャンバ部の内部に位置し、前記検査対象物に電子ビームを走査する走査電子顕微鏡と、
前記真空チャンバ部の内部に位置し、前記検査対象物から発生する検出信号を検出する信号検出器と、
を含み、
前記信号検出器は、
前記検査対象物から発生する二次電子を検出する二次電子検出器と、
前記検査対象物から発生する後方散乱電子を検出する後方散乱電子検出器と、
前記検査対象物から発生する特性X線を検出する特性X線検出器と、
を含む、走査電子顕微鏡を利用した検査システム。 - 前記光学顕微鏡を通じて前記検査対象物の1次光学検査を実施し、前記走査電子顕微鏡チャンバを通じて前記検査対象物の2次詳細検査を実施する、請求項1に記載の走査電子顕微鏡を利用した検査システム。
- 前記メンブレンは、前記走査電子顕微鏡から走査する電子ビームが通過し、前記検査対象物から発生した二次電子、後方散乱電子、および特性X線が通過して前記走査電子顕微鏡チャンバ内部に到達するようにする、請求項1に記載の走査電子顕微鏡を利用した検査システム。
- 前記ステージに連結しており、前記ステージの水平面に対する傾きを調節する平坦度調節装置をさらに含む、請求項1に記載の走査電子顕微鏡を利用した検査システム。
- 前記走査電子顕微鏡チャンバに取り付けられており、前記走査電子顕微鏡チャンバと前記検査対象物の間の距離を調節する間隔調節装置をさらに含む、請求項4に記載の走査電子顕微鏡を利用した検査システム。
- 前記メンブレンパーティクル検査および除去装置は、前記走査電子顕微鏡チャンバを利用した前記検査対象物の検査前に、前記メンブレンのパーティクル検査およびパーティクル除去を実行する、請求項1に記載の走査電子顕微鏡を利用した検査システム。
- 前記ステージおよび前記移送装置を支持する支持台をさらに含み、前記メンブレンパーティクル検査および除去装置は支持台上に設置される、請求項6に記載の走査電子顕微鏡を利用した検査システム。
- 前記支持台下に設置されており、外部振動を測定および除去し、前記走査電子顕微鏡チャンバが前記外部振動によって影響を受けることを遮断する制振装置をさらに含む、請求項7に記載の走査電子顕微鏡を利用した検査システム。
- 前記走査電子顕微鏡チャンバ、前記ステージ、および前記移送装置を囲んでおり、磁場および騒音を除去し、前記走査電子顕微鏡チャンバが磁場および騒音によって影響を受けることを遮断するカバーフレームをさらに含む、請求項8に記載の走査電子顕微鏡を利用した検査システム。
- 前記メンブレンは非導電性物質である、請求項3に記載の走査電子顕微鏡を利用した検査システム。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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KR10-2012-0057468 | 2012-05-30 | ||
KR1020120057468A KR101914231B1 (ko) | 2012-05-30 | 2012-05-30 | 주사 전자 현미경을 이용한 검사 시스템 |
Publications (3)
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JP2013251262A JP2013251262A (ja) | 2013-12-12 |
JP2013251262A5 JP2013251262A5 (ja) | 2016-07-07 |
JP6288951B2 true JP6288951B2 (ja) | 2018-03-07 |
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JP2013112191A Active JP6288951B2 (ja) | 2012-05-30 | 2013-05-28 | 走査電子顕微鏡を利用した検査システム |
Country Status (6)
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US (1) | US8890067B2 (ja) |
EP (1) | EP2669927A3 (ja) |
JP (1) | JP6288951B2 (ja) |
KR (1) | KR101914231B1 (ja) |
CN (1) | CN103454295B (ja) |
TW (1) | TWI597757B (ja) |
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JP2008210715A (ja) * | 2007-02-27 | 2008-09-11 | Ebara Corp | 荷電粒子線装置及びこれを用いた試料表面観察方法 |
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JP2009016073A (ja) * | 2007-07-02 | 2009-01-22 | Tokyo Seimitsu Co Ltd | 真空装置およびそのベーキング処理方法 |
JP2009217049A (ja) * | 2008-03-11 | 2009-09-24 | Hoya Corp | 顕微鏡対物レンズおよび顕微鏡 |
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JP2009252809A (ja) * | 2008-04-02 | 2009-10-29 | Hitachi High-Technologies Corp | ステージ装置及びステージ装置におけるステージの位置決め制御方法 |
DE102008035770A1 (de) * | 2008-07-31 | 2010-02-18 | Eads Deutschland Gmbh | Optischer Partikeldetektor sowie Detektionsverfahren |
CN102197301B (zh) * | 2008-09-28 | 2015-05-06 | B-纳诺有限公司 | 被抽真空的装置和扫描电子显微镜 |
JP5690086B2 (ja) * | 2010-07-02 | 2015-03-25 | 株式会社キーエンス | 拡大観察装置 |
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US8890067B2 (en) | 2014-11-18 |
TW201403652A (zh) | 2014-01-16 |
US20130320211A1 (en) | 2013-12-05 |
KR20130134160A (ko) | 2013-12-10 |
KR101914231B1 (ko) | 2018-11-02 |
TWI597757B (zh) | 2017-09-01 |
JP2013251262A (ja) | 2013-12-12 |
CN103454295A (zh) | 2013-12-18 |
CN103454295B (zh) | 2017-12-29 |
EP2669927A2 (en) | 2013-12-04 |
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