JP6273109B2 - Optical interference measurement device - Google Patents
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Description
本発明は、光の干渉によって生じる干渉縞の輝度情報を用いた測定を行う光干渉測定装置に関する。 The present invention relates to an optical interference measuring apparatus that performs measurement using luminance information of interference fringes generated by light interference.
従来、光の干渉によって生じる干渉縞の輝度情報を用いて例えば測定対象物の三次元形状を精密に測定する三次元形状測定装置などの光干渉測定装置が知られている。 2. Description of the Related Art Conventionally, an optical interference measurement device such as a three-dimensional shape measurement device that accurately measures the three-dimensional shape of a measurement object using luminance information of interference fringes generated by light interference is known.
このような光干渉測定装置においては、参照光路と測定光路の光路長が一致するピント位置では各波長の干渉縞のピークが重なり合い合成される干渉縞の輝度が大きくなる。したがって、光干渉測定装置では、参照光路または測定光路の光路長を変化させながら干渉光強度の二次元の分布を示す干渉画像をＣＣＤカメラ等の撮像素子により撮影し、撮影視野内の各測定位置で干渉光の強度がピークとなるピント位置を検出することで、各測定位置における測定面の高さを測定し、測定対象物の三次元形状などを測定することができる（例えば、特許文献１参照。）。 In such an optical interference measuring apparatus, the luminance of the interference fringes that overlap and combine the peaks of the interference fringes of each wavelength are increased at the focus position where the optical path lengths of the reference optical path and the measurement optical path coincide. Therefore, in the optical interference measurement apparatus, an interference image showing a two-dimensional distribution of the interference light intensity is photographed by an imaging element such as a CCD camera while changing the optical path length of the reference optical path or the measurement optical path, and each measurement position in the field of view is taken. By detecting the focus position where the intensity of the interference light reaches a peak, the height of the measurement surface at each measurement position can be measured, and the three-dimensional shape of the measurement object can be measured (for example, Patent Document 1). reference.).
上述のような光干渉測定装置で用いられる撮像素子の個々の画素は、所定の面積の受光面を有し、受光面への入射光量を面内で積分した値を受光量として出力する。このとき、測定対象物の測定面が撮像素子の受光面に対し傾斜していると、１つの画素の受光面内に干渉縞の輝度が異なる部分が混在することとなる。例えば、１つの画素内のある部分で干渉光強度がピーク（明部）となっているときに同じ画素内の他の部分で干渉光強度がゼロ（暗部）となる場合には、画素内の各位置での干渉光強度が相殺し合い、各測定位置の高さを正しく測定できない。 Each pixel of the image sensor used in the optical interference measuring apparatus as described above has a light receiving surface with a predetermined area, and outputs a value obtained by integrating the amount of incident light on the light receiving surface within the surface as the amount of received light. At this time, if the measurement surface of the measurement object is inclined with respect to the light receiving surface of the image sensor, portions having different luminances of interference fringes are mixed in the light receiving surface of one pixel. For example, when the interference light intensity is at a peak (bright part) in a certain part in one pixel and the interference light intensity is zero (dark part) in another part in the same pixel, The interference light intensity at each position cancels out, and the height at each measurement position cannot be measured correctly.
このような測定対象物の傾斜の影響は、１つの画素がカバーする面積が大きいほど（つまり、測定倍率が低いほど）顕著であり、横方向分解能が低い撮像素子を用いると測定対応傾斜角が著しく制約され、光干渉測定装置を低倍率・広視野化する際の障害となっている。 The influence of the inclination of the measurement object is more remarkable as the area covered by one pixel is larger (that is, the measurement magnification is lower). This is a significant limitation, which is an obstacle when the optical interference measuring apparatus is reduced in magnification and wide field of view.
そこで、本発明は上記の課題を解決することのできる光干渉測定装置を提供することを目的とする。 Accordingly, an object of the present invention is to provide an optical interference measuring apparatus that can solve the above-described problems.
上記課題を解決するために、本発明に係る光干渉測定装置は、光を出力する光源と、光源から出力された光を参照光路と測定光路とに分岐するとともに、参照光路を経た反射光と測定光路に配置された測定対象物を経た反射光とを合成した合成波を出力するビームスプリッタと、参照光路に配置され、ビームスプリッタで参照光路に分岐された光を、反射面に配された複数の微小ミラーによって反射する参照ミラーと、測定光路に配置され、測定対象物が載置されるステージと、参照光路および測定光路のいずれか一方の光路長を変化させる光路長可変手段と、二次元に配列された複数の受光素子により合成波における干渉光強度の二次元の分布を示す干渉画像を撮像する撮像手段とを備え、複数の微小ミラーは、複数の受光素子と対応して配列され、各微小ミラーによる反射光が、当該微小ミラーに対応する受光素子に入射する。このような構成により、光干渉測定装置によって測定可能な測定対象物の最大の傾きを示す測定対応傾斜角を大きくすることができる。 In order to solve the above problems, an optical interference measurement apparatus according to the present invention includes a light source that outputs light, a light output from the light source that is branched into a reference optical path and a measurement optical path, and reflected light that has passed through the reference optical path. A beam splitter that outputs a combined wave obtained by combining the reflected light that has passed through the measurement object arranged in the measurement optical path, and light that is arranged in the reference optical path and branched into the reference optical path by the beam splitter is arranged on the reflection surface. A reference mirror that is reflected by a plurality of micromirrors, a stage that is disposed in the measurement optical path and on which a measurement object is placed, an optical path length varying unit that changes the optical path length of either the reference optical path or the measurement optical path, An imaging unit that captures an interference image indicating a two-dimensional distribution of interference light intensity in the combined wave by a plurality of light receiving elements arranged in a dimension, and the plurality of micromirrors correspond to the plurality of light receiving elements. Are columns, the light reflected by each micro mirror is incident on the light receiving elements corresponding to the micromirrors. With such a configuration, it is possible to increase the measurement-compatible inclination angle that indicates the maximum inclination of the measurement object that can be measured by the optical interference measurement apparatus.
本発明では、微小ミラーによる反射光が入射する領域の面積を、当該受光素子の受光部の面積よりも狭くすると更によい。このような構成により、光干渉測定装置の測定対応傾斜角を受光素子の受光部の面積によらず、大きくすることができる。 In the present invention, it is further preferable that the area of the region where the light reflected by the micromirror is incident is narrower than the area of the light receiving portion of the light receiving element. With such a configuration, the measurement-compatible inclination angle of the optical interference measuring apparatus can be increased regardless of the area of the light receiving portion of the light receiving element.
本発明では、微小ミラーは、円形に形成されると更によい。このような構成により、光干渉測定装置の測定対応傾斜角を、傾きの方向に依存せずに大きくすることができる。 In the present invention, the micromirror is preferably formed in a circular shape. With such a configuration, the measurement-compatible tilt angle of the optical interference measurement apparatus can be increased without depending on the tilt direction.
本発明では、参照ミラーの反射面における微小ミラーが配されていない部分は、ビームスプリッタからの光を吸収すると更によい。微小ミラーに入射しなかった光がビームスプリッタに戻ることを防ぎ、不要な反射光によるノイズを低減することができる。 In the present invention, it is further preferable that the portion of the reflecting surface of the reference mirror where the micromirror is not disposed absorbs light from the beam splitter. It is possible to prevent light that has not entered the minute mirror from returning to the beam splitter, and to reduce noise caused by unnecessary reflected light.
以下、本発明に係る光干渉測定装置の一実施形態として、形状測定装置１について、図面を参照しつつ説明する。なお、ここではマイケルソン型の干渉計を示すが、ミロー型等、他の等光路干渉計を用いることもできる。 Hereinafter, a shape measuring apparatus 1 will be described as an embodiment of an optical interference measuring apparatus according to the present invention with reference to the drawings. Although a Michelson type interferometer is shown here, other iso-optical path interferometers such as a Millo type can also be used.
形状測定装置１は、図１に示すように、光出射部１０と、光学ヘッド部２０、対物レンズ部３０と、結像レンズ４１と、撮像部４０と、画像メモリ５０と、演算処理部６０と、入力部７０と、出力部８０と、表示部９０と、測定対象物（以下、「ワーク」という）Ｗを載置するためのステージＳと、を備える。 As shown in FIG. 1, the shape measuring apparatus 1 includes a light emitting unit 10, an optical head unit 20, an objective lens unit 30, an imaging lens 41, an imaging unit 40, an image memory 50, and an arithmetic processing unit 60. An input unit 70, an output unit 80, a display unit 90, and a stage S on which a measurement object (hereinafter referred to as "workpiece") W is placed.
光出射部１０は、例えば広帯域に亘る多数の波長成分を有しコヒーレンシーの低い広帯域光を出力する光源を備え、例えば、ハロゲンやＬＥＤ（Light Emitting Diode）などの白色光源が用いられる。可干渉性の少ない白色光を使用することで、干渉縞の発生する範囲を狭くすることができる。尚、光出射部１０から出射される光は特定波長（単波長）のものでも良い。 The light emitting unit 10 includes a light source that outputs a wide band light having a large number of wavelength components over a wide band and low coherency, for example, and a white light source such as a halogen or an LED (Light Emitting Diode) is used. By using white light with less coherence, the range in which interference fringes are generated can be narrowed. The light emitted from the light emitting unit 10 may have a specific wavelength (single wavelength).
光学ヘッド部２０は、ビームスプリッタ２１と、コリメータレンズ２２とを備えている。光出射部１０から出射した光は、対物レンズ部３０の光軸と直角の方向から、コリメータレンズ２２を介してビームスプリッタ２１に平行に照射され、ビームスプリッタ２１からは光軸に沿った光が出射されて、対物レンズ部３０に対して上方から平行ビームが照射される。 The optical head unit 20 includes a beam splitter 21 and a collimator lens 22. The light emitted from the light emitting unit 10 is irradiated in parallel to the beam splitter 21 via the collimator lens 22 from a direction perpendicular to the optical axis of the objective lens unit 30, and light along the optical axis is emitted from the beam splitter 21. It is emitted and a parallel beam is irradiated onto the objective lens unit 30 from above.
対物レンズ部３０は、図２に示すように、対物レンズ３１、プリズム３２、参照ミラー３３、等を備えて構成される。対物レンズ部３０においては、上方から平行ビームが対物レンズ３１に入射した場合、入射光は対物レンズ３１で収束光となり、プリズム３２の内部の反射面３２１に入射する。ここで、入射光は、参照ミラー３３を有する参照光路（図中破線）を進む反射光（参照光）と、ワークＷを配置した測定光路（図中実線）を進む透過光（測定光）とに分岐する。反射光は、収束して参照ミラー３３で反射され、更にプリズム３２の反射面３２１により反射される。一方、透過光は、収束してワークＷで反射され、プリズム３２の反射面３２１を透過する。参照ミラー３３からの反射光と測定対象物Ｗからの反射光とはプリズム３２の反射面３２１により合波されて合成波となる。参照ミラー３３は、演算処理部６０による制御の下、ピエゾ素子のような駆動手段３４によって光軸方向に移動走査される。参照ミラー３３の走査位置はエンコーダ３５で測定され、演算処理部６０に入力される。参照光路（光路１＋光路２）と、測定光路（光路３＋光路４）の光路長が等しいときに、合成波に干渉縞が発生する。なお、参照ミラー３３の詳細な構造については後述する。 As shown in FIG. 2, the objective lens unit 30 includes an objective lens 31, a prism 32, a reference mirror 33, and the like. In the objective lens unit 30, when a parallel beam enters the objective lens 31 from above, the incident light becomes convergent light by the objective lens 31 and enters the reflecting surface 321 inside the prism 32. Here, incident light includes reflected light (reference light) that travels along a reference optical path (broken line in the figure) having the reference mirror 33, and transmitted light (measurement light) that travels along a measurement optical path (solid line in the figure) where the workpiece W is disposed. Branch to The reflected light is converged and reflected by the reference mirror 33, and further reflected by the reflecting surface 321 of the prism 32. On the other hand, the transmitted light converges and is reflected by the workpiece W, and passes through the reflecting surface 321 of the prism 32. The reflected light from the reference mirror 33 and the reflected light from the measurement object W are combined by the reflecting surface 321 of the prism 32 to become a combined wave. The reference mirror 33 is moved and scanned in the optical axis direction by a driving unit 34 such as a piezo element under the control of the arithmetic processing unit 60. The scanning position of the reference mirror 33 is measured by the encoder 35 and input to the arithmetic processing unit 60. When the optical path lengths of the reference optical path (optical path 1 + optical path 2) and the measurement optical path (optical path 3 + optical path 4) are equal, interference fringes are generated in the combined wave. The detailed structure of the reference mirror 33 will be described later.
ビームスプリッタ３２の反射面３２１より合成された合成波は、対物レンズ３１で平行ビームになり上方へ進み、結像レンズ４１に入射する（図１中一点鎖線）。結像レンズ４１は合成派を収束させ撮像部４０上に干渉画像を結像させる。 The synthesized wave synthesized from the reflecting surface 321 of the beam splitter 32 becomes a parallel beam by the objective lens 31, travels upward, and enters the imaging lens 41 (a chain line in FIG. 1). The imaging lens 41 converges the composite group and forms an interference image on the imaging unit 40.
撮像部４０は、２次元状に配列された複数個の画素を有する撮像素子からなるＣＣＤカメラ等であり、合成波の干渉画像を撮像する。干渉画像は、参照ミラー３３を移動走査しながら複数回撮像される。撮像部４０が撮像した干渉画像の画像データは、画像メモリ５０に記憶される。 The imaging unit 40 is a CCD camera or the like including an imaging element having a plurality of pixels arranged in a two-dimensional shape, and captures a synthetic wave interference image. The interference image is captured a plurality of times while moving and scanning the reference mirror 33. The image data of the interference image captured by the imaging unit 40 is stored in the image memory 50.
演算処理部６０は、ワークＷの測定面の各位置での干渉光の強度とエンコーダ３５から入力される参照ミラー３３の走査位置とに基づいて、ワークＷの測定面の形状測定データを求める。入力部７０は、計測に必要なデータを演算処理部６０に入力する。出力部８０は、演算処理部で求められた測定結果を出力する。表示部９０は、入力操作に必要な情報および測定結果を表示する。 The arithmetic processing unit 60 obtains shape measurement data of the measurement surface of the workpiece W based on the intensity of the interference light at each position on the measurement surface of the workpiece W and the scanning position of the reference mirror 33 input from the encoder 35. The input unit 70 inputs data necessary for measurement to the arithmetic processing unit 60. The output unit 80 outputs the measurement result obtained by the arithmetic processing unit. The display unit 90 displays information necessary for input operation and measurement results.
図３は、形状測定方法を示すフローチャートである。 FIG. 3 is a flowchart showing the shape measuring method.
形状測定を開始すると、参照ミラー３３を光軸方向に所定量移動し（Ｓ１）、測定面の干渉光強度の二次元の分布を示す干渉画像を画像メモリ５０に記憶する（Ｓ２）。これを所定サンプリング数だけ繰り返し（Ｓ３）、所定枚の干渉画像が画像メモリ５０に蓄積されると、演算処理部６０が測定面の各測定位置における光路長差の変化に伴う干渉光強度の変化を示す干渉光強度列のピーク位置を検出する（Ｓ４）。そして、検出した各測定位置のピーク位置を測定点における高さとして表示、出力する（Ｓ５）。 When shape measurement is started, the reference mirror 33 is moved by a predetermined amount in the optical axis direction (S1), and an interference image indicating a two-dimensional distribution of interference light intensity on the measurement surface is stored in the image memory 50 (S2). This is repeated for a predetermined number of samplings (S3), and when a predetermined number of interference images are accumulated in the image memory 50, the arithmetic processing unit 60 changes the interference light intensity according to the change in the optical path length difference at each measurement position on the measurement surface. Is detected (S4). Then, the detected peak position of each measurement position is displayed and output as the height at the measurement point (S5).
図４は、参照ミラー３３の反射面（参照面）の構造を示す。参照ミラー３３の反射面は、広帯域光を吸収する基板３３１に円形の微小ミラー３３２が縦横にドットパターン状に配列された構造を有する。微小ミラー３３２に入射する光は、反射されてビームスプリッタ３２に戻る。一方、微小ミラー３３２のない基板３３１部分に入射する光は、基板３３１に吸収され、ビームスプリッタ３２には戻らない。微小ミラー３３２の配列パターンは撮像部４０が備える撮像素子の配列パターンに対応し、ある微小ミラー３３２による反射光は、ビームスプリッタ３２でワークＷからの反射光と合波され、結像ミラー４１を介して撮像部４０において当該微小ミラー３３２に対応する位置の画素に入射され結像する。 FIG. 4 shows the structure of the reflective surface (reference surface) of the reference mirror 33. The reflection surface of the reference mirror 33 has a structure in which circular micromirrors 332 are arranged in a dot pattern vertically and horizontally on a substrate 331 that absorbs broadband light. The light incident on the micromirror 332 is reflected and returns to the beam splitter 32. On the other hand, light incident on the portion of the substrate 331 without the micromirror 332 is absorbed by the substrate 331 and does not return to the beam splitter 32. The arrangement pattern of the micromirrors 332 corresponds to the arrangement pattern of the imaging elements included in the imaging unit 40, and the reflected light from the certain micromirror 332 is combined with the reflected light from the workpiece W by the beam splitter 32, Then, the light is incident on the pixel at a position corresponding to the minute mirror 332 in the imaging unit 40 and forms an image.
図５は、合成波の各成分が、撮像部４０の１つの画素に入射する領域を示した模式図である。ワークＷでの反射光は画素の受光部全域（図５（ａ）の領域Ａ）に入射され、参照ミラー３３での反射光は微小ミラー３３２に対応する領域（図５（ｂ）の領域Ｂ）にのみ入射される。したがって、干渉は領域Ｂ内のみで発生し、領域Ｂの外側では発生しない。 FIG. 5 is a schematic diagram illustrating a region where each component of the combined wave is incident on one pixel of the imaging unit 40. The reflected light from the workpiece W is incident on the entire light receiving portion of the pixel (region A in FIG. 5A), and the reflected light from the reference mirror 33 is the region corresponding to the micromirror 332 (region B in FIG. 5B). ) Only. Accordingly, interference occurs only in the region B and does not occur outside the region B.
このように、図４に示したような参照ミラー３３を用いることにより、１つの画素の受光面内において光干渉が発生する領域を画素の受光面積よりも狭めることができ、これによりワークＷが傾斜していても光干渉が生じる範囲内での干渉のばらつきを低減することができる。また、１つの画素内で干渉が生じる領域の大きさは微小ミラー３３２の面積によって決まるので、横方向分解能が低い撮像素子を用いる場合でも測定対応傾斜角を大きくすることができる。 As described above, by using the reference mirror 33 as shown in FIG. 4, a region where light interference occurs in the light receiving surface of one pixel can be made narrower than the light receiving area of the pixel. Even if it is inclined, it is possible to reduce variations in interference within a range where optical interference occurs. In addition, since the size of the region in which interference occurs in one pixel is determined by the area of the micromirror 332, the measurement-corresponding tilt angle can be increased even when an image sensor with low lateral resolution is used.
なお、本発明は、上記の実施形態に限定されるものではなく、本発明の目的を達成できる範囲での変形、改良等は本発明に含まれるものである。例えば、上記の実施形態ではマイケルソン型の干渉計を例に説明したが、図４に示したような微小ミラーを備える参照ミラーを、ミロー型等、他の等光路干渉計に適用することで、これらの方式の光干渉測定装置においても測定対応傾斜角を大きくすることができる。 In addition, this invention is not limited to said embodiment, The deformation | transformation in the range which can achieve the objective of this invention, improvement, etc. are included in this invention. For example, in the above embodiment, a Michelson type interferometer has been described as an example. However, by applying a reference mirror including a micromirror as shown in FIG. 4 to another optical path interferometer such as a mirro type. In these types of optical interference measuring apparatuses, the tilt angle for measurement can be increased.
また、上記実施形態では、微小ミラー３３２が縦横のマトリックス状のドットパターンで配列された構造の参照ミラー３３を例示したが、微小ミラーの配列は撮像素子の配列に対応するものとすればよく、例えば撮像素子がハニカム配列を採用する場合には、微小ミラーもこれに対応したハニカム配列とされ、１つの微小ミラーによる反射光が対応する１つの素子に入射するようにするとよい。 In the above embodiment, the reference mirror 33 having a structure in which the micromirrors 332 are arranged in a matrix pattern of vertical and horizontal matrixes is exemplified. However, the arrangement of the micromirrors may correspond to the arrangement of the imaging elements. For example, when the image pickup element adopts a honeycomb arrangement, the micromirrors are also made to have a honeycomb arrangement corresponding thereto, and reflected light from one micromirror may be incident on one corresponding element.
また、参照ミラー３３の基板３３１は、入射する光を吸収するのではなく散乱することにより、微小ミラー３３２に入射しなかった光が合成波における光干渉に寄与しないようにしてもよい。 Further, the substrate 331 of the reference mirror 33 may scatter rather than absorb incident light so that light that has not entered the micromirror 332 does not contribute to optical interference in the combined wave.
本発明は、光干渉測定装置に適用して測定対応傾斜角を改善することができる。 The present invention can be applied to an optical interference measuring apparatus to improve the measurement-compatible tilt angle.
１・・・形状測定装置
１０・・・光射出部
２０・・・光学ヘッド部
３０・・・対物レンズ部
４０・・・撮像部
４１・・・結像レンズ
５０・・・画像メモリ
６０・・・演算処理部
７０・・・入力部
８０・・・出力部
９０・・・表示部
Ｓ・・・ステージ
Ｗ・・・測定対象物（ワーク）
DESCRIPTION OF SYMBOLS 1 ... Shape measuring apparatus 10 ... Light emission part 20 ... Optical head part 30 ... Objective lens part 40 ... Imaging part 41 ... Imaging lens 50 ... Image memory 60 ... Calculation processing unit 70 ... input unit 80 ... output unit 90 ... display unit S ... stage W ... measurement object (workpiece)
Claims (4)
前記光源から出力された光を参照光路と測定光路とに分岐するとともに、参照光路を経た反射光と測定光路に配置された測定対象物を経た反射光とを合成した合成波を出力するビームスプリッタと、
前記参照光路に配置され、ビームスプリッタで参照光路に分岐された光を、反射面に配された複数の微小ミラーによって反射する参照ミラーと、
前記測定光路に配置され、測定対象物が載置されるステージと、
前記参照光路および前記測定光路のいずれか一方の光路長を変化させる光路長可変手段と、
二次元に配列された複数の受光素子により前記合成波における干渉光強度の二次元の分布を示す干渉画像を撮像する撮像手段と、
を備える光干渉測定装置であって、
前記複数の微小ミラーは、前記複数の受光素子と対応して配列され、各微小ミラーによる反射光が、当該微小ミラーに対応する受光素子に入射し、
前記受光素子の受光部において、前記微小ミラーによる反射光が入射する領域の面積は、当該受光素子の受光部の面積よりも狭いことを特徴とする、光干渉測定装置。 A light source that outputs light;
A beam splitter that branches the light output from the light source into a reference optical path and a measurement optical path, and outputs a combined wave obtained by combining the reflected light that has passed through the reference optical path and the reflected light that has passed through the measurement object disposed in the measurement optical path. When,
A reference mirror that is arranged in the reference optical path and reflects the light branched into the reference optical path by a beam splitter by a plurality of micromirrors arranged on a reflection surface;
A stage disposed in the measurement optical path and on which a measurement object is placed; and
An optical path length variable means for changing an optical path length of any one of the reference optical path and the measurement optical path;
Imaging means for imaging an interference image showing a two-dimensional distribution of interference light intensity in the combined wave by a plurality of light receiving elements arranged in two dimensions;
An optical interference measurement apparatus comprising:
The plurality of micromirrors are arranged corresponding to the plurality of light receiving elements, and the reflected light from each micromirror is incident on the light receiving elements corresponding to the micromirrors ,
An optical interference measuring apparatus characterized in that, in the light receiving part of the light receiving element, the area of the region where the reflected light from the micromirror is incident is narrower than the area of the light receiving part of the light receiving element .
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