JP6197684B2 - 着色組成物、着色硬化膜及び表示素子 - Google Patents

着色組成物、着色硬化膜及び表示素子 Download PDF

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JP6197684B2
JP6197684B2 JP2014029392A JP2014029392A JP6197684B2 JP 6197684 B2 JP6197684 B2 JP 6197684B2 JP 2014029392 A JP2014029392 A JP 2014029392A JP 2014029392 A JP2014029392 A JP 2014029392A JP 6197684 B2 JP6197684 B2 JP 6197684B2
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alkyl group
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JP2014194007A (ja
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米田　英司
英司 米田
江幡　敏
敏 江幡
怜史 倉
怜史 倉
泰典 川部
泰典 川部
紫 山口
紫 山口
拓弘 谷口
拓弘 谷口
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JSR Corp
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JSR Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/72—Nitrogen atoms
    • C07D213/76—Nitrogen atoms to which a second hetero atom is attached
    • C07D213/77—Hydrazine radicals
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D498/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms
    • C07D498/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D498/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B44/00—Azo dyes containing onium groups
    • C09B44/10—Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system
    • C09B44/16—1,3-Diazoles or hydrogenated 1,3-diazoles ; (Benz)imidazolium
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
JP2014029392A 2013-02-26 2014-02-19 着色組成物、着色硬化膜及び表示素子 Active JP6197684B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014029392A JP6197684B2 (ja) 2013-02-26 2014-02-19 着色組成物、着色硬化膜及び表示素子

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013035478 2013-02-26
JP2013035478 2013-02-26
JP2014029392A JP6197684B2 (ja) 2013-02-26 2014-02-19 着色組成物、着色硬化膜及び表示素子

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JP2014194007A JP2014194007A (ja) 2014-10-09
JP6197684B2 true JP6197684B2 (ja) 2017-09-20

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JP (1) JP6197684B2 (zh)
KR (1) KR20140106416A (zh)
CN (1) CN104007615B (zh)
TW (2) TWI663219B (zh)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6162084B2 (ja) * 2013-09-06 2017-07-12 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、ポリマー、キサンテン色素
JP6340871B2 (ja) * 2014-03-31 2018-06-13 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、およびカラーフィルタ
JP6541508B2 (ja) * 2014-08-25 2019-07-10 住友化学株式会社 塩、樹脂、レジスト組成物及びレジストパターンの製造方法
JP2016075829A (ja) * 2014-10-08 2016-05-12 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物およびカラーフィルタ
JP6662615B2 (ja) * 2014-11-25 2020-03-11 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 化合物
JP6588254B2 (ja) * 2014-11-25 2019-10-09 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色硬化性樹脂組成物、カラーフィルタ及び液晶表示装置
TWI696889B (zh) * 2015-06-30 2020-06-21 南韓商東友精細化工有限公司 著色固化性樹脂組合物、濾色器和液晶顯示裝置
JP6889543B2 (ja) * 2016-01-14 2021-06-18 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 染料溶解液の製造方法
KR102112258B1 (ko) * 2016-05-19 2020-05-18 동우 화인켐 주식회사 염 및 착색 경화성 조성물
KR102110484B1 (ko) * 2016-05-19 2020-05-13 동우 화인켐 주식회사 염 및 착색 경화성 수지 조성물
TWI707918B (zh) * 2016-05-20 2020-10-21 南韓商東友精細化工有限公司 鹽及著色硬化性組合物
CN107422601B (zh) * 2016-05-23 2021-06-25 东友精细化工有限公司 盐及着色固化性组合物
CN107422600B (zh) * 2016-05-23 2021-06-15 东友精细化工有限公司 盐及着色固化性树脂组合物
KR102590768B1 (ko) * 2016-05-31 2023-10-19 주식회사 이엔에프테크놀로지 블랙 컬럼 스페이서(bcs) 또는 블랙 매트릭스용 착색 감광성 조성물
KR101978977B1 (ko) 2017-09-27 2019-05-15 제이에스알 가부시끼가이샤 감방사선성 조성물, 착색 조성물, 경화막, 절연막 및 그의 제조 방법, 스페이서 및 컬러 필터와 이들의 제조 방법, 그리고 액정 표시 소자
JP7338127B2 (ja) * 2019-03-13 2023-09-05 山陽色素株式会社 顔料誘導体を含むアゾ顔料分散体及び塗膜形成用着色組成物
KR20190051937A (ko) 2019-05-09 2019-05-15 제이에스알 가부시끼가이샤 감방사선성 조성물, 착색 조성물, 경화막, 절연막 및 그의 제조 방법, 스페이서 및 컬러 필터와 이들의 제조 방법, 그리고 액정 표시 소자
JP7324046B2 (ja) * 2019-05-20 2023-08-09 東友ファインケム株式会社 着色樹脂組成物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5541235A (en) * 1995-03-06 1996-07-30 Minnesota Mining And Manufacturing Company Organic soluble cationic dyes with fluorinated alkylsulfonyl counterions
KR101533669B1 (ko) * 2009-12-01 2015-07-03 토요잉크Sc홀딩스주식회사 컬러 필터용 청색 착색 조성물, 컬러 필터 및 컬러 디스플레이
JP5772263B2 (ja) * 2010-07-30 2015-09-02 Jsr株式会社 着色組成物、カラーフィルタ及び表示素子
JP5577994B2 (ja) * 2010-09-27 2014-08-27 大日本印刷株式会社 カラーフィルター用着色組成物及びそれを用いたカラーフィルター、並びに表示装置
JP5573724B2 (ja) * 2011-02-18 2014-08-20 Ｊｓｒ株式会社 着色組成物、カラーフィルタ及び表示素子
JP5673258B2 (ja) * 2011-03-17 2015-02-18 大日本印刷株式会社 カラーフィルター用着色組成物及びそれを用いたカラーフィルター、並びに表示装置
JP5772122B2 (ja) * 2011-03-23 2015-09-02 三菱化学株式会社 染料、着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置

Also Published As

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TW201835239A (zh) 2018-10-01
CN104007615B (zh) 2020-03-13
JP2014194007A (ja) 2014-10-09
TWI663219B (zh) 2019-06-21
TWI641659B (zh) 2018-11-21
CN104007615A (zh) 2014-08-27
KR20140106416A (ko) 2014-09-03
TW201437293A (zh) 2014-10-01

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