JP6189769B2 - フッ素化オルガノシロキサン網目構造のための配合組成物 - Google Patents
フッ素化オルガノシロキサン網目構造のための配合組成物 Download PDFInfo
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- 239000000203 mixture Substances 0.000 title claims description 124
- 238000009472 formulation Methods 0.000 title description 14
- 125000005375 organosiloxane group Chemical group 0.000 title description 8
- 238000000576 coating method Methods 0.000 claims description 80
- 239000011248 coating agent Substances 0.000 claims description 66
- 239000000178 monomer Substances 0.000 claims description 51
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 49
- 239000000758 substrate Substances 0.000 claims description 36
- 239000013022 formulation composition Substances 0.000 claims description 28
- 239000010410 layer Substances 0.000 claims description 28
- 239000002904 solvent Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 21
- 239000003054 catalyst Substances 0.000 claims description 19
- 239000007787 solid Substances 0.000 claims description 19
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 13
- -1 hydroxide ions Chemical class 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 12
- 238000001879 gelation Methods 0.000 claims description 12
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 10
- 229910052731 fluorine Inorganic materials 0.000 claims description 10
- 239000011737 fluorine Substances 0.000 claims description 10
- 238000002360 preparation method Methods 0.000 claims description 9
- 238000002156 mixing Methods 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 5
- 238000007639 printing Methods 0.000 claims description 4
- 239000011247 coating layer Substances 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 3
- 230000003247 decreasing effect Effects 0.000 claims description 2
- 239000004744 fabric Substances 0.000 claims description 2
- 125000003709 fluoroalkyl group Chemical group 0.000 claims 14
- 239000000976 ink Substances 0.000 description 112
- 239000000499 gel Substances 0.000 description 19
- 239000002243 precursor Substances 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 239000000463 material Substances 0.000 description 14
- 239000012071 phase Substances 0.000 description 14
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 13
- 230000008859 change Effects 0.000 description 12
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 10
- 239000007788 liquid Substances 0.000 description 10
- 239000010703 silicon Substances 0.000 description 9
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 8
- 125000000524 functional group Chemical group 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
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- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 229920001721 polyimide Polymers 0.000 description 6
- 238000009736 wetting Methods 0.000 description 6
- 150000002430 hydrocarbons Chemical class 0.000 description 5
- QERRDGMIGCCGHT-UHFFFAOYSA-N methyl-di(propan-2-yloxy)-(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane Chemical compound CC(C)O[Si](C)(CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)OC(C)C QERRDGMIGCCGHT-UHFFFAOYSA-N 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 150000001335 aliphatic alkanes Chemical class 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
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- 229910052751 metal Inorganic materials 0.000 description 4
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- 229920000642 polymer Polymers 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 3
- 150000004703 alkoxides Chemical group 0.000 description 3
- 230000001588 bifunctional effect Effects 0.000 description 3
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- 238000006243 chemical reaction Methods 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
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- 230000006870 function Effects 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
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- 239000004215 Carbon black (E152) Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- LUXIMSHPDKSEDK-UHFFFAOYSA-N bis(disilanyl)silane Chemical compound [SiH3][SiH2][SiH2][SiH2][SiH3] LUXIMSHPDKSEDK-UHFFFAOYSA-N 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- CBFCDTFDPHXCNY-UHFFFAOYSA-N icosane Chemical compound CCCCCCCCCCCCCCCCCCCC CBFCDTFDPHXCNY-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 239000012703 sol-gel precursor Substances 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- POOSGDOYLQNASK-UHFFFAOYSA-N tetracosane Chemical compound CCCCCCCCCCCCCCCCCCCCCCCC POOSGDOYLQNASK-UHFFFAOYSA-N 0.000 description 2
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 description 2
- 0 CC(C)OS(C)(CCC(*)C(C(C(C(*)C(*)F)=*)=*)=*)OC(C)=C Chemical compound CC(C)OS(C)(CCC(*)C(C(C(C(*)C(*)F)=*)=*)=*)OC(C)=C 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- 229920002449 FKM Polymers 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- 229920001646 UPILEX Polymers 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000011243 crosslinked material Substances 0.000 description 1
- XCIXKGXIYUWCLL-UHFFFAOYSA-N cyclopentanol Chemical compound OC1CCCC1 XCIXKGXIYUWCLL-UHFFFAOYSA-N 0.000 description 1
- DIOQZVSQGTUSAI-NJFSPNSNSA-N decane Chemical compound CCCCCCCCC[14CH3] DIOQZVSQGTUSAI-NJFSPNSNSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 230000008570 general process Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000006335 response to radiation Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
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- 230000007704 transition Effects 0.000 description 1
- 238000007039 two-step reaction Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J11/00—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
- B41J11/0015—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14008—Structure of acoustic ink jet print heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/1433—Structure of nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1606—Coating the nozzle area or the ink chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
Description
4,15−ジイソプロポキシ−7,7,8,8,9,9,10,10,11,11,12,12−ドデカフルオロ−4,15−ジメチル−3,16−ジオキサ−4,15−ジシラオクタデカン(9.00グラム、13.3mmol)をn−ブタノール(8.50グラム)に溶解した。テトラブチルアンモニウム水酸化物触媒(0.0778グラム、Siに対して0.4mol%)の1.0M MeOH(Sigma−Aldrich)溶液および水(0.48グラム、26.7mmol、Siに対して1当量)を上の溶液に加え、50重量%溶液を得た。ボルテックス(2500rpm、10秒)によって混合して配合物を混合し、0.45mm PTFEフィルターによって濾過し、50℃で30分間放置した。室温(約20℃〜約25℃)まで冷却した後、溶液は、周囲条件で2時間を超えて安定であった。
4,15−ジイソプロポキシ−7,7,8,8,9,9,10,10,11,11,12,12−ドデカフルオロ−4,15−ジメチル−3,16−ジオキサ−4,15−ジシラオクタデカン(0.755グラム、1.1mmol)およびジイソプロポキシ(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)メチルシラン(0.241グラム、0.47mmol)をn−ブタノール(0.603グラム)に溶解した。テトラブチルアンモニウム水酸化物触媒(0.0113グラム、Siに対して0.5mol%)の1.0M MeOH(Sigma−Aldrich)溶液および水(0.044グラム、2.4mmol、Siに対して0.9当量)を上の溶液に加え、60重量%溶液を得た。ボルテックス(2500rpm、10秒)によって混合して配合物を混合し、0.45mm PTFEフィルターによって濾過し、50℃で30分間放置した。室温まで冷却した後、溶液は、周囲条件で2時間を超えて安定であった。
4,15−ジイソプロポキシ−7,7,8,8,9,9,10,10,11,11,12,12−ドデカフルオロ−4,15−ジメチル−3,16−ジオキサ−4,15−ジシラオクタデカン(0.494グラム、0.73mmol)およびジイソプロポキシ(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)メチルシラン(0.498グラム、0.98mmol)をn−ブタノール(0.460グラム)に溶解した。テトラブチルアンモニウム水酸化物触媒(0.0205グラム、Siに対して1.0mol%)の1.0M MeOH(Sigma−Aldrich)溶液および水(0.0508グラム、2.82mmol、Siに対して1.2当量)を上の溶液に加え、65重量%溶液を得た。ボルテックス(2500rpm、10秒)によって混合して配合物を混合し、0.45mm PTFEフィルターによって濾過し、50℃で30分間放置した。室温まで冷却した後、溶液は、周囲条件で2時間を超えて安定であった。
(二置換シランに対し)0〜50重量%の一置換ペルフルオロアルコキシシランを含む配合物を調製した。アルコキシシラン混合物をn−ブタノールまたはn−ブタノール/シクロペンタノール混合物に溶解し、40〜75重量%の配合物を得た。1モル当量の水、0.3〜1.0mol%の水酸化物イオン触媒(テトラブチルアンモニウム水酸化物)を加え、ゾル生成を誘発させた。ゾルは、2時間を超えて安定であった(粘度の顕著な変化なし)。
Claims (16)
- 印刷ヘッド前面のコーティングを調製するための配合組成物であって、この配合組成物が、
二置換(フルオロアルキル)アルコキシシランモノマー
および
一置換(フルオロアルキル)アルコキシシランモノマー
を含む(フルオロアルキル)アルコキシシランモノマーを含むモノマー混合物と;
30重量%〜50重量%のアルコール溶媒と;
ケイ素原子あたりの水酸化物イオンの量が0.3mol%〜1mol%であるような量で存在する可溶性水酸化物触媒である触媒と;
前記(フルオロアルキル)アルコキシシランモノマーに対して1モル当量〜10モル当量の水と
を含むゾルを含み、
この配合組成物が、1.5時間を超える時間、ゲル化に対して安定である、配合組成物。 - 前記モノマー混合物は、フッ素含有量が15重量%〜65重量%である、請求項1に記載の配合組成物。
- 前記一置換(フルオロアルキル)アルコキシシランモノマーが、前記二置換(フルオロアルキル)アルコキシシランモノマーに対し、25〜50重量%の量で存在する、請求項1に記載の配合組成物。
- 前記配合組成物は、粘度が1cP〜10cPである、請求項1に記載の配合組成物。
- 前記配合組成物が、硬化させると架橋したシロキサン網目構造を形成する、請求項1に記載の配合組成物。
- インクジェット印刷ヘッド前面であって、
前面と;
前面に配置されたコーティング層とを備え、
コーティング層が、請求項1に記載の配合組成物を前記前面に堆積させ、配合組成物を硬化させ、架橋したシロキサン層を前面の上に作成することによって作られる、インクジェット印刷ヘッド前面。 - 二置換(フルオロアルキル)アルコキシシランモノマー
および
一置換(フルオロアルキル)アルコキシシランモノマー
を含む(フルオロアルキル)アルコキシシランモノマーを含むモノマー混合物と、
30重量%〜50重量%のアルコール溶媒と、
ケイ素原子あたりの水酸化物イオンの量が0.3mol%〜1mol%であるような量で存在する可溶性水酸化物触媒である触媒と、
前記(フルオロアルキル)アルコキシシランモノマーに対して1モル当量〜10モル当量の水と、
を含有するゾルを含む配合組成物を調製することと;
前記配合組成物をゾルとして、印刷ヘッドの表面に塗布することと;
前記配合組成物を硬化させ、架橋したシロキサン網目構造層を前記印刷ヘッドの表面に作製することと;
を含み、
前記配合組成物は、1.5時間を超える時間、ゲル化に対して安定である、印刷ヘッドを調製する方法。 - 前記配合組成物を調製してから1.5時間より後、前記配合組成物を硬化させ、架橋したシロキサン層を作製する、請求項7に記載の方法。
- 前記モノマー混合物は、フッ素含有量が15重量%〜65重量%である、請求項7に記載の方法。
- 前記印刷ヘッドの前面の前記架橋したシロキサン層上の吐出した紫外線硬化性インクの液滴または吐出した固体インクの液滴は、140°〜40°の接触角を示す、請求項7に記載の方法。
- 前記印刷ヘッドの前記架橋したシロキサン網目構造層は、30°未満の滑り角を有する、請求項7に記載の方法。
- 二置換(フルオロアルキル)アルコキシシランモノマー
および
一置換(フルオロアルキル)アルコキシシランモノマー
を含む(フルオロアルキル)アルコキシシランモノマーを含むモノマー混合物と、
30重量%〜50重量%のアルコール溶媒と、
ケイ素原子あたりの水酸化物イオンの量が0.3mol%〜1mol%であるような量で存在する可溶性水酸化物触媒である触媒と、
前記(フルオロアルキル)アルコキシシランモノマーに対して1モル当量〜10モル当量の水と、
を含有するゾルを含む配合組成物を調製することと;
前記配合組成物をゾルとして、インクジェット印刷ヘッドの前面に塗布することと;
前記配合組成物を硬化させ、架橋したシロキサン層を前記インクジェット印刷ヘッドの前面に作製することと;
前記インクジェット印刷ヘッドを用いてインクジェットインクを基材に塗布することと;
を含み、
前記配合組成物は、1.5時間を超える時間、ゲル化に対して安定である、ゲル化に対して安定である、基材に画像を印刷する方法。 - 前記配合組成物を調製してから1.5時間より後、前記配合組成物を硬化させ、架橋したシロキサン層を作製する、請求項12に記載の方法。
- 前記インクジェット印刷ヘッドの前面にゾルとして塗布するときの前記配合組成物の粘度は、1cP〜10cPである、請求項12に記載の方法。
- 前記モノマー混合物は、フッ素含有量が15重量%〜65重量%であり、前記架橋したシロキサン層の表面エネルギーは、前記モノマー混合物のフッ素含有量を増やすか、または減らすことにより調節される、請求項12に記載の方法。
- 前記架橋したシロキサン層は、Crock布を用いた200回の洗浄サイクルの後に1°〜30°未満の低い滑り角を維持するコーティング表面を形成する、請求項12に記載の方法。
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