JP6175517B2 - Polyamideimide solution, porous polyamideimide film, and method for producing the same - Google Patents
Polyamideimide solution, porous polyamideimide film, and method for producing the same Download PDFInfo
- Publication number
- JP6175517B2 JP6175517B2 JP2015557872A JP2015557872A JP6175517B2 JP 6175517 B2 JP6175517 B2 JP 6175517B2 JP 2015557872 A JP2015557872 A JP 2015557872A JP 2015557872 A JP2015557872 A JP 2015557872A JP 6175517 B2 JP6175517 B2 JP 6175517B2
- Authority
- JP
- Japan
- Prior art keywords
- pai
- porous
- film
- solution
- polyamideimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/14—Polyamide-imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
- C08J3/09—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
- C08J3/091—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids characterised by the chemical constitution of the organic liquid
- C08J3/095—Oxygen containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
- C08J3/09—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
- C08J3/091—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids characterised by the chemical constitution of the organic liquid
- C08J3/096—Nitrogen containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/24—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by surface fusion and bonding of particles to form voids, e.g. sintering
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2479/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2461/00 - C08J2477/00
- C08J2479/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2479/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Cell Separators (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
本発明は、ポリアミドイミド溶液およびその製造方法、ならびにこのポリアミドイミド溶液から得られる多孔質ポリアミドイミドフィルムおよびその製造方法に関するものである（以下、ポリアミドイミドを「ＰＡＩ」と略記することがある）。 The present invention relates to a polyamideimide solution and a production method thereof, and a porous polyamideimide film obtained from the polyamideimide solution and a production method thereof (hereinafter, polyamideimide may be abbreviated as “PAI”).
ポリイミド系の多孔質フィルムは、その優れた耐熱性と高い気孔率を利用して、電子材料や光学材料、リチウム二次電池用セパレータ、フィルタ、分離膜、電線被覆等の産業用材料、医療材料の素材等の分野で利用されている。ポリイミド系の多孔質フィルムの中で、ポリイミド前駆体（ポリアミック酸）を利用する熱硬化型のポリイミド（ＰＩ）については、この多孔質フィルムを製造する方法として、アミド系溶媒とエーテル系溶媒とを溶媒として含有するＰＩ前駆体溶液を、３００℃以上の耐熱性を有する基材上に塗布後、乾燥することによって、相分離現象を誘起せしめた後、３００℃程度の高温で熱硬化して多孔質ＰＩフィルムを得る方法（以下、この方法を「乾式多孔化プロセス」と略記することがある）が提案されている（特許文献１）。この方法は、多孔質ＰＩフィルムを製造する際に、基材上に形成された塗膜を、貧溶媒を含む凝固液に浸漬し、多孔質化を図る湿式多孔化プロセスとは異なり、多孔質化のための凝固浴を用いる必要がない。そのため、多孔質ＰＩフィルム製造の際、凝固浴から廃液が発生しないので、乾式多孔化プロセスは環境適合性の良好な優れた方法である。ただ、熱硬化型の多孔質ポリイミドフィルムを製造するには、熱硬化の際、基材上に形成されたＰＩ前駆体塗膜の収縮がおこり、そのため、場合によっては、その適用範囲が限定されることがあった。 Polyimide-based porous films use electronic materials and optical materials, lithium secondary battery separators, filters, separation membranes, wire coatings, and other industrial materials and medical materials by utilizing their excellent heat resistance and high porosity. It is used in the field of materials. Among thermosetting polyimides (PI) using a polyimide precursor (polyamic acid) among polyimide porous films, an amide solvent and an ether solvent are used as a method for producing this porous film. A PI precursor solution contained as a solvent is applied on a substrate having a heat resistance of 300 ° C. or higher, and then dried to induce a phase separation phenomenon, and then thermoset at a high temperature of about 300 ° C. to be porous. There has been proposed a method for obtaining a high quality PI film (hereinafter, this method may be abbreviated as “dry pore forming process”) (Patent Document 1). This method is different from a wet porous process in which a coating film formed on a substrate is immersed in a coagulating liquid containing a poor solvent to produce a porous film when producing a porous PI film. There is no need to use a coagulation bath for conversion. Therefore, since no waste liquid is generated from the coagulation bath during the production of the porous PI film, the dry porosification process is an excellent method with good environmental compatibility. However, in order to produce a thermosetting porous polyimide film, the PI precursor coating film formed on the base material contracts during thermosetting, which limits the range of application in some cases. There was.
そこで、前記したような塗膜製造の際に収縮が発生しないＰＡＩを用いて多孔質フィルムや被膜を製造する方法が提案されている。例えば、特許文献２〜４には、アミド系溶媒とエーテル系溶媒とを溶媒として含有するＰＡＩ溶液を、銅線やアルミ条等の基材上に塗布後、５００℃程度の高温で熱処理することによって、多孔質ＰＡＩ被膜やフィルムを得る方法が提案されている。これらの方法は、高温での溶媒の分解と揮発に起因する発泡現象を利用して多孔質ＰＡＩ被膜を得ようとするものであった。またＰＡＩ溶液はエーテル系溶媒の含有量が極めて少ないものであった。 Therefore, a method of manufacturing a porous film or a coating using PAI that does not cause shrinkage during the manufacturing of a coating as described above has been proposed. For example, in Patent Documents 2 to 4, a PAI solution containing an amide solvent and an ether solvent as a solvent is applied on a substrate such as a copper wire or an aluminum strip and then heat treated at a high temperature of about 500 ° C. Has proposed a method for obtaining a porous PAI coating or film. These methods have attempted to obtain a porous PAI film by utilizing a foaming phenomenon caused by decomposition and volatilization of a solvent at a high temperature. The PAI solution had a very low ether solvent content.
しかしながら、公知のＰＡＩ溶液を、低温での多孔質化が容易な相分離現象を利用した乾式多孔化プロセスに適用した場合には、気孔率が低く、かつ独立気孔が多いため透過性の低いフィルムしか得られなかった。また、フィルム表面に気孔を形成させることは困難であった。従い、高い透過性が要求されるリチウム二次電池用セパレータやフィルタ等の用途に利用することは困難であった。さらに、発泡現象を利用して多孔質ＰＡＩ被膜を基材から剥離して得られる多孔質ＰＡＩフィルムは、気孔の均一性に劣り、力学的強度が低いものであった。 However, when a known PAI solution is applied to a dry porosification process that utilizes a phase separation phenomenon that facilitates the formation of a porous material at a low temperature, it has a low porosity and a large number of independent pores. Only obtained. Moreover, it was difficult to form pores on the film surface. Accordingly, it has been difficult to use for applications such as separators and filters for lithium secondary batteries that require high permeability. Furthermore, the porous PAI film obtained by peeling the porous PAI film from the base material using the foaming phenomenon is inferior in the uniformity of the pores and has low mechanical strength.
そこで本発明は、前記課題を解決するものであって、乾式多孔化プロセスへの適応が可能であり、耐熱性に優れ、かつ気孔率が高く、透過性に優れた多孔質ＰＡＩフィルムが得られるＰＡＩ溶液およびその製造方法、ならびにこの溶液から得られる多孔質ＰＡＩフィルム、およびその製造方法を提供することを目的とする。 Therefore, the present invention solves the above-described problems, and can be applied to a dry porous process, and can provide a porous PAI film having excellent heat resistance, high porosity, and excellent permeability. It is an object of the present invention to provide a PAI solution and a production method thereof, a porous PAI film obtained from the solution, and a production method thereof.
本発明者らは、ＰＡＩ溶液を特定の組成、特に特定の溶媒含有量、とすることにより前記課題が解決されることを見出し、本発明の完成に至った。 The present inventors have found that the above problems can be solved by setting the PAI solution to a specific composition, particularly a specific solvent content, and have completed the present invention.
本発明は下記を趣旨とするものである。
＜１＞ 含窒素極性溶媒およびエーテル系溶媒を含有するＰＡＩ溶液であって、
前記ＰＡＩの固形分濃度が、ＰＡＩ溶液質量に対し２５質量％以下であり、
前記含窒素極性溶媒の含有量が、ＰＡＩ溶液質量に対し１５質量％以上であり、
前記エーテル系溶媒の含有量が、ＰＡＩ溶液質量に対し３０質量％超であることを特徴とするＰＡＩ溶液。
＜２＞ 固体状のＰＡＩを、含窒素極性溶媒およびエーテル系溶媒を含む混合溶媒に溶解させることを特徴とする＜１＞に記載のＰＡＩ溶液の製造方法。
＜３＞ ＜１＞に記載のＰＡＩ溶液を基材上に塗布後、２００℃以下の温度で乾燥することにより相分離現象を誘起せしめ多孔質化することを特徴とする多孔質ＰＡＩフィルムの製造方法。
＜４＞ 基材がポリエステルフィルムであることを特徴とする＜３＞に記載の多孔質ＰＡＩフィルムの製造方法。
＜５＞ ＜３＞または＜４＞に記載の方法によって製造された多孔質ＰＡＩフィルム。The present invention has the following objects.
<1> A PAI solution containing a nitrogen-containing polar solvent and an ether solvent,
The solid content concentration of the PAI is 25% by mass or less based on the mass of the PAI solution,
The content of the nitrogen-containing polar solvent is 15% by mass or more based on the mass of the PAI solution,
The PAI solution, wherein the content of the ether solvent is more than 30% by mass with respect to the mass of the PAI solution.
<2> The method for producing a PAI solution according to <1>, wherein the solid PAI is dissolved in a mixed solvent containing a nitrogen-containing polar solvent and an ether solvent.
<3> Production of a porous PAI film, wherein the PAI solution according to <1> is applied on a substrate and then dried at a temperature of 200 ° C. or less to induce a phase separation phenomenon to make the film porous. Method.
<4> The method for producing a porous PAI film according to <3>, wherein the substrate is a polyester film.
<5> A porous PAI film produced by the method according to <3> or <4>.
本発明のＰＡＩ溶液から、低温での簡単なプロセスで容易に多孔質ＰＡＩフィルムを得ることができる。得られた多孔質ＰＡＩフィルムは、耐熱性に優れ、気孔率が高く、透過性に優れ、かつ気孔の優れた均一性に基づく良好な力学的特性を有するので、電子材料や光学材料、リチウム二次電池用セパレータ、フィルタ、分離膜、電線被覆等の産業用材料、医療材料の素材等の分野で好適に使用することができる。 A porous PAI film can be easily obtained from the PAI solution of the present invention by a simple process at a low temperature. The obtained porous PAI film has excellent heat resistance, high porosity, excellent permeability, and good mechanical properties based on excellent uniformity of pores. It can be suitably used in the fields of industrial materials such as secondary battery separators, filters, separation membranes, wire coatings, and medical materials.
以下、本発明について詳細に説明する。
本発明はＰＡＩ溶液およびその製造方法、このＰＡＩ溶液から得られる多孔質ＰＡＩフィルム、およびその製造方法に関するものである。Hereinafter, the present invention will be described in detail.
The present invention relates to a PAI solution and a production method thereof, a porous PAI film obtained from the PAI solution, and a production method thereof.
［ＰＡＩ溶液］
ＰＡＩは、主鎖にイミド結合とアミド結合の両方を有する耐熱性高分子であり、例えば、原料であるトリカルボン酸成分とジアミン成分との重縮合反応を行うことにより得ることができる。[PAI solution]
PAI is a heat-resistant polymer having both an imide bond and an amide bond in the main chain, and can be obtained, for example, by performing a polycondensation reaction between a tricarboxylic acid component as a raw material and a diamine component.
ＰＡＩのトリカルボン酸成分は、１分子あたり３個のカルボキシル基（その誘導体を含む）および１個以上の芳香環または脂肪族環を有する有機化合物であって、当該３個のカルボキシル基のうち、少なくとも２個のカルボキシル基が共に酸無水物形態を形成し得る位置に配置されたものである。トリカルボン酸成分は芳香族トリカルボン酸成分および脂環族トリカルボン酸成分を包含する概念で用いるものとする。 The tricarboxylic acid component of PAI is an organic compound having three carboxyl groups (including derivatives thereof) and one or more aromatic rings or aliphatic rings per molecule, and at least of the three carboxyl groups. Two carboxyl groups are arranged at a position where an acid anhydride form can be formed together. The tricarboxylic acid component is used in a concept including an aromatic tricarboxylic acid component and an alicyclic tricarboxylic acid component.
芳香族トリカルボン酸成分として、例えば、ベンゼントリカルボン酸成分、ナフタレントリカルボン酸成分が挙げられる。 Examples of the aromatic tricarboxylic acid component include a benzene tricarboxylic acid component and a naphthalene tricarboxylic acid component.
ベンゼントリカルボン酸成分の具体例として、例えば、トリメリット酸、ヘミメリット酸、ならびにこれらの無水物およびそのモノクロライドが挙げられる。 Specific examples of the benzenetricarboxylic acid component include, for example, trimellitic acid, hemimellitic acid, anhydrides thereof, and monochlorides thereof.
ナフタレントリカルボン酸成分の具体例として、例えば、１，２，３‐ナフタレントリカルボン酸、１，６，７−ナフタレントリカルボン酸、１，４，５−ナフタレントリカルボン酸、ならびにこれらの無水物およびそのモノクロライドが挙げられる。 Specific examples of the naphthalene tricarboxylic acid component include, for example, 1,2,3-naphthalene tricarboxylic acid, 1,6,7-naphthalene tricarboxylic acid, 1,4,5-naphthalene tricarboxylic acid, and anhydrides and monochlorides thereof. Is mentioned.
脂環族トリカルボン酸成分の具体例として、例えば、１，２，４−シクロペンタントリカルボン酸、１，２，３−シクロヘキサントリカルボン酸、１，２，４−シクロヘキサントリカルボン酸、１，３，５−シクロヘキサントリカルボン酸、１，２，４−デカヒドロナフタレントリカルボン酸、１，２，５−デカヒドロナフタレントリカルボン酸ならびにこれらの無水物およびそのモノクロライドが挙げられる。 Specific examples of the alicyclic tricarboxylic acid component include, for example, 1,2,4-cyclopentanetricarboxylic acid, 1,2,3-cyclohexanetricarboxylic acid, 1,2,4-cyclohexanetricarboxylic acid, 1,3,5- Examples include cyclohexanetricarboxylic acid, 1,2,4-decahydronaphthalenetricarboxylic acid, 1,2,5-decahydronaphthalenetricarboxylic acid, and anhydrides and monochlorides thereof.
トリカルボン酸成分の中では、芳香族トリカルボン酸成分が好ましい。
芳香族トリカルボン酸成分の中では、トリメリット酸および無水トリメリット酸クロライド（ＴＡＣ）が好ましい。Of the tricarboxylic acid components, aromatic tricarboxylic acid components are preferred.
Of the aromatic tricarboxylic acid components, trimellitic acid and trimellitic anhydride chloride (TAC) are preferred.
トリカルボン酸成分は、単独で用いてもよく、２種以上を組み合わせて用いてもよい。トリカルボン酸成分は、その一部がピロメリット酸、ベンゾフェノンテトラカルボン酸、またはビフェニルテトラカルボン酸等の成分で置換されたものを用いてもよい。 A tricarboxylic acid component may be used independently and may be used in combination of 2 or more type. As the tricarboxylic acid component, a part of which is substituted with a component such as pyromellitic acid, benzophenone tetracarboxylic acid, or biphenyl tetracarboxylic acid may be used.
ＰＡＩのジアミン成分は、１分子あたり２個の１級アミノ基（その誘導体を含む）および１個以上の芳香環または脂肪族環を有する有機化合物である。ジアミン成分は芳香族ジアミン成分および脂環族ジアミン成分を包含する概念で用いるものとする。 The diamine component of PAI is an organic compound having two primary amino groups (including derivatives thereof) and one or more aromatic rings or aliphatic rings per molecule. A diamine component shall be used by the concept including an aromatic diamine component and an alicyclic diamine component.
芳香族ジアミン成分の具体例として、例えば、４，４′−ジアミノジフェニルエーテル（ＤＡＤＥ）、ｍ−フェニレンジアミン（ＭＤＡ）、ｐ−フェニレンジアミン、４，４′−ジフェニルメタンジアミン（ＤＭＡ）、４，４′−ジフェニルエーテルジアミン、ジフェニルスルホン−４，４′−ジアミン、ジフェニルー４，４′−ジアミン、ｏ−トリジン、２，４−トリレンジアミン、２，６−トリレンジアミン、キシリレンジアミン、ナフタレンジアミン、ならびにこれらのジイソシアネート誘導体が挙げられる。 Specific examples of the aromatic diamine component include, for example, 4,4′-diaminodiphenyl ether (DADE), m-phenylenediamine (MDA), p-phenylenediamine, 4,4′-diphenylmethanediamine (DMA), 4,4 ′. -Diphenyl ether diamine, diphenyl sulfone-4,4'-diamine, diphenyl-4,4'-diamine, o-tolidine, 2,4-tolylenediamine, 2,6-tolylenediamine, xylylenediamine, naphthalenediamine, and These diisocyanate derivatives are mentioned.
脂環族ジアミン成分の具体例として、例えば、１，３−ジアミノシクロヘキサン、１，４−ジアミノシクロヘキサン、ならびにこれらのジイソシアネート誘導体が挙げられる。 Specific examples of the alicyclic diamine component include 1,3-diaminocyclohexane, 1,4-diaminocyclohexane, and diisocyanate derivatives thereof.
ジアミン成分の中では、芳香族ジアミン成分が好ましい。
芳香族ジアミン成分の中では、ＤＡＤＥ、ＭＤＡおよびＤＭＡが好ましい。Of the diamine components, aromatic diamine components are preferred.
Of the aromatic diamine components, DADE, MDA and DMA are preferred.
ジアミン成分は、単独で用いてもよく、２種以上を組み合わせて用いてもよい。 A diamine component may be used independently and may be used in combination of 2 or more type.
ＰＡＩは、通常、２００℃以上のガラス転移温度を有する。ガラス転移温度は、ＤＳＣ（示差熱分析）により測定された値を用いている。 PAI usually has a glass transition temperature of 200 ° C. or higher. As the glass transition temperature, a value measured by DSC (differential thermal analysis) is used.
ＰＡＩの中でも、力学的特性や耐熱性に優れた芳香族ＰＡＩが好ましい。芳香族ＰＡＩとは、前記した芳香族トリカルボン酸成分と芳香族ジアミン成分との重縮合反応を行うことにより得ることができるものである。芳香族ＰＡＩは、熱可塑性であっても非熱可塑性であってもよいが、前記したガラス転移温度を有する芳香族ＰＡＩを好ましく用いることができる。 Among PAIs, aromatic PAIs excellent in mechanical properties and heat resistance are preferable. The aromatic PAI can be obtained by performing a polycondensation reaction between the aromatic tricarboxylic acid component and the aromatic diamine component. The aromatic PAI may be thermoplastic or non-thermoplastic, but the aromatic PAI having the glass transition temperature described above can be preferably used.
本発明においては、ＰＡＩを溶媒に溶解したＰＡＩ溶液から、後で詳述するように、２００℃以下の温度により、溶媒を除去することにより、力学的特性の優れた耐熱性フィルムを、容易に得ることができる。ＰＡＩは、この点において、成形の際、その前駆体であるポリアミック酸をイミド化するために３００℃程度の高温を必要とする熱硬化型ポリイミドとは異なるものである。 In the present invention, as will be described in detail later, by removing the solvent from a PAI solution in which PAI is dissolved in a solvent at a temperature of 200 ° C. or lower, a heat resistant film having excellent mechanical properties can be easily obtained. Can be obtained. In this respect, PAI is different from thermosetting polyimide that requires a high temperature of about 300 ° C. in order to imidize its precursor polyamic acid during molding.
本発明のＰＡＩ溶液は、含窒素極性溶媒およびエーテル系溶媒を含む混合溶媒を含有する溶液であって、前記ＰＡＩの固形分濃度が、ＰＡＩ溶液質量に対し２５質量％以下であり、前記含窒素極性溶媒の含有量が、ＰＡＩ溶液質量に対し１５質量％以上であり、かつ、前記エーテル系溶媒の含有量が、ＰＡＩ溶液質量に対し３０質量％超である。 The PAI solution of the present invention is a solution containing a mixed solvent containing a nitrogen-containing polar solvent and an ether solvent, wherein the solid content concentration of the PAI is 25% by mass or less with respect to the mass of the PAI solution, The content of the polar solvent is 15% by mass or more with respect to the mass of the PAI solution, and the content of the ether solvent is more than 30% by mass with respect to the mass of the PAI solution.
ＰＡＩの固形分濃度が高すぎると、均一な溶液を得ることができず、フィルム形成のための使用に耐えない。ＰＡＩの固形分濃度は、フィルムにおける気孔率のさらなる増大の観点から、ＰＡＩ溶液質量に対し、２０質量％以下とすることが好ましい。ただ、ＰＡＩの固形分濃度を必要以上に低下させると、生産性が低下するので、ＰＡＩの固形分濃度は、５質量％以上とすることが好ましい。 When the solid content concentration of PAI is too high, a uniform solution cannot be obtained and it cannot be used for film formation. From the viewpoint of further increasing the porosity of the film, the solid content concentration of PAI is preferably 20% by mass or less with respect to the mass of the PAI solution. However, if the solid content concentration of PAI is lowered more than necessary, the productivity is lowered. Therefore, the solid content concentration of PAI is preferably 5% by mass or more.
含窒素極性溶媒の含有量が少なすぎると、均一なＰＡＩ溶液を得ることができない。均一なＰＡＩ溶液を得るためには、含窒素極性溶媒の含有量は、ＰＡＩ溶液質量に対し１７質量％以上であることが好ましい。本発明において、含窒素極性溶媒の含有量における上限値は特に限定されるものではないが、フィルムにおける気孔率のさらなる増大の観点から、ＰＡＩ溶液質量に対し５０質量％以下、特に３０質量％以下であることが好ましい。 If the content of the nitrogen-containing polar solvent is too small, a uniform PAI solution cannot be obtained. In order to obtain a uniform PAI solution, the content of the nitrogen-containing polar solvent is preferably 17% by mass or more based on the mass of the PAI solution. In the present invention, the upper limit of the content of the nitrogen-containing polar solvent is not particularly limited, but from the viewpoint of further increasing the porosity of the film, it is 50% by mass or less, particularly 30% by mass or less, based on the mass of the PAI solution. It is preferable that
エーテル系溶媒の含有量が少なすぎると、十分な気孔率を有するフィルムを得ることができない。エーテル系溶媒の含有量は、フィルムにおける気孔率のさらなる増大の観点から、ＰＡＩ溶液質量に対し４０質量％超であることが好ましく、５０質量％超、特に６０質量％以上とすることがより好ましい。本発明において、エーテル系溶媒の含有量における上限値は特に限定されるものではないが、フィルムにおける気孔率のさらなる増大の観点から、ＰＡＩ溶液質量に対し８０質量％以下、特に７５質量％以下であることが好ましい。 When there is too little content of an ether solvent, the film which has sufficient porosity cannot be obtained. From the viewpoint of further increasing the porosity of the film, the content of the ether solvent is preferably more than 40% by mass, more preferably more than 50% by mass, and more preferably more than 60% by mass with respect to the mass of the PAI solution. . In the present invention, the upper limit of the content of the ether solvent is not particularly limited, but from the viewpoint of further increasing the porosity of the film, it is 80% by mass or less, particularly 75% by mass or less, based on the mass of the PAI solution. Preferably there is.
溶媒組成を前記のようにすることにより、ＰＡＩ溶液から得られる塗膜を乾燥して固化させる際に、塗膜中に残存するエーテル系溶媒（貧溶媒）の作用により、２００℃以下の温度で効率よく相分離が起こる。従い、高い気孔率を有するＰＡＩフィルムを得ることができる。 By setting the solvent composition as described above, when the coating film obtained from the PAI solution is dried and solidified, the ether solvent (poor solvent) remaining in the coating film acts at a temperature of 200 ° C. or lower. Phase separation occurs efficiently. Accordingly, a PAI film having a high porosity can be obtained.
本発明で用いられる含窒素極性溶媒としては、アミド系溶媒や尿素系溶媒を用いることができる。アミド系溶媒としては、例えば、Ｎ−メチル−２−ピロリドン（ＮＭＰ 沸点：２０２℃）、Ｎ，Ｎ−ジメチルホルムアミド（沸点：１５３℃）、Ｎ，Ｎ−ジメチルアセトアミド（ＤＭＡｃ 沸点：１６６℃）が挙げられる。尿素系溶媒としては、例えば、テトラメチル尿素（ＴＭＵ 沸点：１７７℃）、ジメチルエチレン尿素（沸点：２２０℃）が挙げられる。含窒素極性溶媒は、これらを単独で用いてもよく、２種以上を組み合わせて用いてもよい。これらの中でも、ＮＭＰおよびＤＭＡｃが好ましく用いられ、ＮＭＰが特に好ましい。 As the nitrogen-containing polar solvent used in the present invention, an amide solvent or a urea solvent can be used. Examples of the amide solvent include N-methyl-2-pyrrolidone (NMP boiling point: 202 ° C.), N, N-dimethylformamide (boiling point: 153 ° C.), N, N-dimethylacetamide (DMAc boiling point: 166 ° C.). Can be mentioned. Examples of the urea solvent include tetramethylurea (TMU boiling point: 177 ° C) and dimethylethyleneurea (boiling point: 220 ° C). These nitrogen-containing polar solvents may be used alone or in combination of two or more. Among these, NMP and DMAc are preferably used, and NMP is particularly preferable.
本発明で用いられるエーテル系溶媒としては、前記含窒素極性溶媒よりも沸点が高いものを用いることが好ましく、その沸点差は、５℃以上が好ましく、２０℃以上がより好ましく、５０℃以上が更に好ましい。これらのエーテル系溶媒は単独では、ＰＡＩを溶解できない貧溶媒である。エーテル系溶媒としては、例えば、ジエチレングリコールジメチルエーテル（ＤＥＧＭ 沸点：１６２℃）、トリエチレングリコールジメチルエーテル（ＴＲＧＭ 沸点：２１６℃）、テトラエチレングリコールジメチルエーテル（ＴＥＧＭ 沸点：２７５℃）、ジエチレングリコール（ＤＥＧ 沸点：２４４℃）、トリエチレングリコール（ＴＥＧ 沸点：２８７℃）等の溶媒が挙げられる。これらを単独で用いてもよく、２種以上を組み合わせて用いてもよい。これらの中でも、ＴＲＧＭおよびＴＥＧＭが好ましく用いられ、ＴＥＧＭが特に好ましい。 As the ether solvent used in the present invention, a solvent having a boiling point higher than that of the nitrogen-containing polar solvent is preferably used. The boiling point difference is preferably 5 ° C or higher, more preferably 20 ° C or higher, and 50 ° C or higher. Further preferred. These ether solvents alone are poor solvents that cannot dissolve PAI. Examples of the ether solvent include diethylene glycol dimethyl ether (DEGM boiling point: 162 ° C.), triethylene glycol dimethyl ether (TRGM boiling point: 216 ° C.), tetraethylene glycol dimethyl ether (TEGM boiling point: 275 ° C.), diethylene glycol (DEG boiling point: 244 ° C.). And solvents such as triethylene glycol (TEG boiling point: 287 ° C.). These may be used alone or in combination of two or more. Among these, TRGM and TEGM are preferably used, and TEGM is particularly preferable.
混合溶媒は、必要に応じて、他の溶媒を、本発明の効果を損なわない範囲で含んでもよい。 If necessary, the mixed solvent may contain other solvents as long as the effects of the present invention are not impaired.
本発明のＰＡＩ溶液は、例えば、以下のような製造方法で製造することが好ましい。すなわち、固体状のＰＡＩを前記混合溶媒に溶解せしめてＰＡＩ溶液とする。固体状のＰＡＩとしては、例えば、市販のＰＡＩ粉体（例えば、ソルベイアドバンストポリマーズ株式会社製トーロン４０００Ｔシリーズ、トーロン４０００ＴＦ、トーロンＡＩ−１０シリーズ等）を利用することができる。固体状のＰＡＩを用いることにより、本発明の組成としたＰＡＩ溶液を容易に得ることができる。 The PAI solution of the present invention is preferably produced, for example, by the following production method. That is, solid PAI is dissolved in the mixed solvent to obtain a PAI solution. As the solid PAI, for example, commercially available PAI powder (for example, Torlon 4000T series, Torlon 4000TF, Torlon AI-10 series, etc. manufactured by Solvay Advanced Polymers Co., Ltd.) can be used. By using solid PAI, a PAI solution having the composition of the present invention can be easily obtained.
本発明のＰＡＩ溶液を得るには、前記したような固体状のＰＡＩを用いて製造する方法が好ましいが、原料である前記トリカルボン酸成分および前記ジアミン成分を略等モルで配合し、それを前記混合溶媒中で重合反応させて得られる溶液も用いることができる。また、含窒素極性溶媒中のみで重合反応して溶液を得た後、これにエーテル系溶媒を加える方法や、エーテル系溶媒中のみで重合反応して懸濁液を得た後、これに含窒素極性溶媒を加える方法で、ＰＡＩ溶液を得ることもできるが、前記したような固体状のＰＡＩを用いて製造する方法が好ましい。 In order to obtain the PAI solution of the present invention, the production method using the solid PAI as described above is preferable, but the tricarboxylic acid component and the diamine component as raw materials are blended in approximately equimolar amounts, A solution obtained by polymerization reaction in a mixed solvent can also be used. In addition, a polymerization reaction is obtained only in a nitrogen-containing polar solvent to obtain a solution, and then an ether solvent is added thereto, or a suspension is obtained by polymerization reaction only in an ether solvent, and then contained in this. Although a PAI solution can be obtained by adding a nitrogen polar solvent, a method using a solid PAI as described above is preferred.
本発明のＰＡＩ溶液には、必要に応じて、各種界面活性剤や有機シランカップリング剤のような公知の添加物を、本発明の効果を損なわない範囲で添加してもよい。また、必要に応じて、ＰＡＩ溶液に、ＰＡＩ以外の他のポリマーを、本発明の効果を損なわない範囲で添加してもよい。 You may add well-known additives, such as various surfactants and an organosilane coupling agent, to the PAI solution of this invention in the range which does not impair the effect of this invention. Moreover, you may add other polymers other than PAI to a PAI solution in the range which does not impair the effect of this invention as needed.
［多孔質ＰＡＩフィルム］
本発明の多孔質ＰＡＩフィルムは、前記ＰＡＩ溶液を用いて低温乾式多孔化プロセスにより製造することができる。すなわち、本発明の前記ＰＡＩ溶液を、基材の表面に塗布し、８０〜２００℃、好ましくは１００〜１６０℃で、１０〜６０分乾燥することにより、気孔率が４０〜９０体積％の多孔質ＰＡＩフィルムを形成することができる。その後、これらの基材から多孔質ＰＡＩフィルムを剥離して多孔質ＰＡＩフィルム単体とすることができる。また、基材上に形成された多孔質ＰＡＩフィルムは、基材から剥離することなく、基材と積層一体化して使用することもできる。なお、多孔質ＰＡＩフィルムは、耐熱性に優れるので、前記乾燥後、２００℃以上の温度、例えば３００℃程度で熱処理を行っても良い。[Porous PAI film]
The porous PAI film of the present invention can be produced by a low-temperature dry porosity process using the PAI solution. That is, the PAI solution of the present invention is applied to the surface of a substrate and dried at 80 to 200 ° C., preferably 100 to 160 ° C. for 10 to 60 minutes, whereby a porosity of 40 to 90% by volume is obtained. A quality PAI film can be formed. Thereafter, the porous PAI film can be peeled from these substrates to form a porous PAI film alone. Moreover, the porous PAI film formed on the base material can be used by being laminated and integrated with the base material without peeling from the base material. In addition, since the porous PAI film is excellent in heat resistance, after the drying, heat treatment may be performed at a temperature of 200 ° C. or higher, for example, about 300 ° C.
前記基材としては、例えば、金属箔、金属線、ガラス板、熱可塑性樹脂フィルム（ポリエステル、ポリプロピレン、ポリカーボネート等融点または軟化点が３００℃以下の熱可塑性樹脂フィルム）、ポリイミド等の熱硬化性樹脂フィルム、各種織物、各種不織布等が挙げられる。前記金属としては、金、銀、銅、白金、アルミニウム等を用いることができる。基材は、多孔質であっても非多孔質であってもよい。これらの中で、ポリエステルフィルムが好ましく、ポリエチレンテレフタレート（ＰＥＴ 融点：２６０℃）フィルムが特に好ましい。ＰＥＴフィルムはコロナ放電処理等の表面処理が行われていても良い。これら基材への塗液の塗布方法としては、ディップコータ、バーコータ、スピンコータ、ダイコータ、スプレーコータ等を用い、連続式またはバッチ式で塗布することができる。 Examples of the substrate include a metal foil, a metal wire, a glass plate, a thermoplastic resin film (a thermoplastic resin film having a melting point or a softening point of 300 ° C. or less such as polyester, polypropylene, polycarbonate), a thermosetting resin such as polyimide. A film, various textiles, various nonwoven fabrics, etc. are mentioned. As the metal, gold, silver, copper, platinum, aluminum, or the like can be used. The substrate may be porous or non-porous. Among these, a polyester film is preferable, and a polyethylene terephthalate (PET melting point: 260 ° C.) film is particularly preferable. The PET film may be subjected to surface treatment such as corona discharge treatment. As a method of applying the coating liquid to these substrates, a dip coater, a bar coater, a spin coater, a die coater, a spray coater or the like can be used, and the coating can be applied continuously or batchwise.
前記製造方法により得られた多孔質ＰＡＩフィルムの気孔率は、４０〜９０体積％であることが好ましく、４５〜８５体積％であることがより好ましく、６０〜８５体積％であることがさらに好ましい。気孔率がこのように設定された多孔質ＰＡＩフィルムは、良好な力学的特性と透過性とが同時に確保されるので、リチウム二次電池用セパレータ、フィルタ等に利用することができる。多孔質ＰＡＩフィルムの気孔率は、多孔質ＰＡＩフィルムの見掛け密度と、多孔質ＰＡＩフィルムを構成するＰＡＩの真密度（比重）とから算出される値である。詳細には、気孔率（体積％）は、多孔質ＰＡＩフィルムの見掛け密度がＡ（ｇ／ｃｍ３）、ＰＡＩの真密度がＢ（ｇ／ｃｍ３）の場合、次式により算出される。The porosity of the porous PAI film obtained by the production method is preferably 40 to 90% by volume, more preferably 45 to 85% by volume, and further preferably 60 to 85% by volume. . The porous PAI film having the porosity set in this way can ensure good mechanical properties and permeability at the same time, and can be used for a separator for a lithium secondary battery, a filter, and the like. The porosity of the porous PAI film is a value calculated from the apparent density of the porous PAI film and the true density (specific gravity) of the PAI constituting the porous PAI film. Specifically, the porosity (volume%) is calculated by the following formula when the apparent density of the porous PAI film is A (g / cm 3 ) and the true density of the PAI is B (g / cm 3 ).
多孔質ＰＡＩフィルムの気孔の平均孔径は、０．１〜１０μｍが好ましく、０．５〜５μｍがより好ましい。 The average pore diameter of the pores of the porous PAI film is preferably 0.1 to 10 μm, and more preferably 0.5 to 5 μm.
また、形成される気孔は、連続気孔であっても、独立気孔であってもよいが、連続気孔であることが好ましい。また、フィルム表面には気孔が形成されていることが好ましい。 The formed pores may be continuous pores or independent pores, but are preferably continuous pores. In addition, pores are preferably formed on the film surface.
多孔質ＰＡＩフィルムの厚みは１〜３００μｍが好ましく、１０〜１００μｍがより好ましい。 The thickness of the porous PAI film is preferably 1 to 300 μm, more preferably 10 to 100 μm.
前記プロセスにおいて、ＰＡＩ溶液中の混合溶媒（含窒素極性溶媒とエーテル系溶媒）の種類や配合量を選ぶことにより、気孔率や気孔径を調整することができる。 In the above process, the porosity and the pore diameter can be adjusted by selecting the type and blending amount of the mixed solvent (nitrogen-containing polar solvent and ether solvent) in the PAI solution.
以上述べた如く、本発明のＰＡＩ溶液から容易に多孔質ＰＡＩフィルムが得られる。この多孔質ＰＡＩフィルム製造方法は、乾式多孔化プロセスに基づくので、気孔形成の際、貧溶媒を含む凝固浴からの廃液が発生しない。従い、環境適合性が良好であり、しかも、プロセスが極めて簡単である。得られた多孔質ＰＡＩフィルムは、高い気孔率と良好な力学的特性を有する。 As described above, a porous PAI film can be easily obtained from the PAI solution of the present invention. Since this porous PAI film manufacturing method is based on a dry porous process, waste liquid from a coagulation bath containing a poor solvent is not generated during pore formation. Therefore, the environmental compatibility is good and the process is very simple. The resulting porous PAI film has high porosity and good mechanical properties.
以下に、実施例を挙げて、本発明をさらに詳細に説明する。なお本発明は実施例により限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to examples. The present invention is not limited to the examples.
＜実施例１＞
ＴＡＣと、ＤＡＤＥおよびＭＤＡとを共重合（共重合モル比：ＤＡＤＥ／ＭＤＡ＝７／３）して得られるＰＡＩ粉体（ソルベイアドバンストポリマーズ株式会社製トーロン４０００Ｔ−ＨＶ、ガラス転移温度２８０℃）１５ｇを、ＮＭＰ２５ｇとＴＥＧＭ６０ｇとからなる混合溶媒に、３０℃で溶解して、ＰＡＩの固形分濃度が対ＰＡＩ溶液比で１５質量％であり、エーテル系溶媒の含有比率が対ＰＡＩ溶液比で６０質量％の均一なＰＡＩ溶液（Ａ−１）を得た。<Example 1>
PAI powder obtained by copolymerizing TAC with DADE and MDA (copolymerization molar ratio: DADE / MDA = 7/3) (Tolon 4000T-HV manufactured by Solvay Advanced Polymers, glass transition temperature 280 ° C.) 15 g Was dissolved in a mixed solvent consisting of 25 g of NMP and 60 g of TEGM at 30 ° C., the PAI solid content concentration was 15% by mass with respect to the PAI solution, and the ether solvent content ratio was 60% with respect to the PAI solution. % Homogeneous PAI solution (A-1) was obtained.
この溶液を、表面がコロナ放電処理されたＰＥＴフィルム（ユニチカ社製：厚み１００μｍ）上に塗布し、１３０℃で３０分乾燥後、ＰＥＴフィルムから塗膜を剥離することにより、厚みが５０μｍの多孔質ＰＡＩフィルムを得た。この多孔質ＰＡＩフィルムの気孔率の測定結果を表１に示す。また、この多孔質ＰＡＩフィルム断面および表面（ＰＥＴフィルム接触面）のＳＥＭ像を図１〜図３に示す。断面全般にわたって、孔径２〜３μｍ程度の均一な連続気孔が形成され、表面にも気孔が形成されていることが判る。ＪＩＳ−Ｃ−２１５１の規定に基づき、この多孔質ＰＡＩフィルムの力学的特性を評価した所、引張強度は１４．１ＭＰａ、伸度は３８．８％と良好な力学的特性を有していることが確認された。さらに、ＪＩＳ−Ｐ８１１７の規定に基づき、この多孔質ＰＡＩフィルムのガーレ値を測定した所、１５８０秒であり、連続気孔に基づく良好な透過性を示すことが確認された。 This solution was applied onto a PET film (Unitika Ltd. thickness: 100 μm) whose surface was subjected to corona discharge treatment, dried at 130 ° C. for 30 minutes, and then peeled off the coating film from the PET film to give a porous film having a thickness of 50 μm. A quality PAI film was obtained. The measurement results of the porosity of this porous PAI film are shown in Table 1. Moreover, the SEM image of this porous PAI film cross section and the surface (PET film contact surface) is shown in FIGS. It can be seen that uniform continuous pores having a pore diameter of about 2 to 3 μm are formed over the entire cross section, and pores are also formed on the surface. When the mechanical properties of this porous PAI film were evaluated based on the provisions of JIS-C-2151, the tensile strength was 14.1 MPa and the elongation was 38.8%. Was confirmed. Furthermore, it was 1580 seconds when the Gurley value of this porous PAI film was measured based on the prescription | regulation of JIS-P8117, and it was confirmed that the favorable permeability based on a continuous pore is shown.
＜実施例２〜８＞
実施例１と同様にして、表１に示す組成で、ＰＡＩ溶液（Ａ−２〜Ａ−８）を作成した。これらの溶液から、実施例１と同様の条件で多孔質ＰＡＩフィルムを得た。これらの多孔質ＰＡＩフィルムの気孔率測定結果を表１に示す。<Examples 2 to 8>
In the same manner as in Example 1, PAI solutions (A-2 to A-8) were prepared with the compositions shown in Table 1. From these solutions, porous PAI films were obtained under the same conditions as in Example 1. Table 1 shows the measurement results of the porosity of these porous PAI films.
＜実施例９＞
ＰＡＩ粉体として、ＴＡＣと、ＤＭＡとを重合して得られるＰＡＩ粉体（ソルベイアドバンストポリマーズ株式会社製トーロンＡＩ−１０、ガラス転移温度２７２℃）を用いたこと以外は、実施例１と同様にして、ＰＡＩ溶液（Ａ−９）を作成した。この溶液から、実施例１と同様の条件で多孔質ＰＡＩフィルムを得た。この多孔質ＰＡＩフィルムの気孔率測定結果を表１に示す。<Example 9>
Except that PAI powder obtained by polymerizing TAC and DMA (Tolon AI-10 manufactured by Solvay Advanced Polymers Co., Ltd., glass transition temperature 272 ° C.) was used as the PAI powder. Thus, a PAI solution (A-9) was prepared. From this solution, a porous PAI film was obtained under the same conditions as in Example 1. Table 1 shows the porosity measurement results of this porous PAI film.
＜比較例１〜６＞
実施例１と同様にして、表１に示す組成で、ＰＡＩ溶液（Ｂ−１〜Ｂ−６）を作成した。これらの溶液から、実施例１と同様の条件で多孔質ＰＡＩフィルムを得た。これらの多孔質ＰＡＩフィルムの気孔率測定結果を表１に示す。<Comparative Examples 1-6>
In the same manner as in Example 1, PAI solutions (B-1 to B-6) were prepared with the compositions shown in Table 1. From these solutions, porous PAI films were obtained under the same conditions as in Example 1. Table 1 shows the measurement results of the porosity of these porous PAI films.
＜比較例７〜９＞
表１に示した組成で、実施例１と同様にしてＰＡＩ溶液（Ｂ−７〜Ｂ−９）を作成しようとしたが、均一な溶液を得ることができなかった。<Comparative Examples 7-9>
An attempt was made to prepare PAI solutions (B-7 to B-9) in the same manner as in Example 1 with the compositions shown in Table 1, but a uniform solution could not be obtained.
＜比較例１０＞
特開２０１３−１８７０２９（特許文献２）実施例１の記載に従って、ＰＡＩ溶液（Ｂ−１０）を作成した。すなわち、市販のＰＡＩ溶液（日立化成工業株式会社製：ＨＩ−４０６、ＰＡＩ固形分：３２質量％、溶媒：ＮＭＰ、ＰＡＩのガラス転移温度：２８８℃）２００ｇにＴＲＧＭ５１．２ｇを加えることにより、ＰＡＩの固形分濃度が対ＰＡＩ溶液比で約２５質量％であり、エーテル系溶媒の含有比率が対ＰＡＩ溶液比で約２１質量％の均一なＰＡＩ溶液（Ｂ−１０）を得た。この溶液から、実施例１と同様の条件で多孔質ＰＡＩフィルムを得た。このＰＡＩフィルムの気孔率測定結果を表１に示す。<Comparative Example 10>
According to the description in Example 1 of JP2013-187029 (Patent Document 2), a PAI solution (B-10) was prepared. That is, by adding TRGM 51.2 g to 200 g of a commercially available PAI solution (manufactured by Hitachi Chemical Co., Ltd .: HI-406, PAI solid content: 32% by mass, solvent: NMP, PAI glass transition temperature: 288 ° C.), PAI A uniform PAI solution (B-10) having a solid content concentration of about 25% by mass with respect to the PAI solution and an ether solvent content ratio of about 21% by mass with respect to the PAI solution was obtained. From this solution, a porous PAI film was obtained under the same conditions as in Example 1. The results of measuring the porosity of this PAI film are shown in Table 1.
＜比較例１１＞
特開２０１３−２１０４９３（特許文献３）実施例２の記載に従って、ＰＡＩ溶液（Ｂ−１０）を作成した。すなわち、市販のＰＡＩ溶液（日立化成工業株式会社製：ＨＩ−４０６、ＰＡＩ固形分：３２質量％、溶媒：ＮＭＰ、ＰＡＩのガラス転移温度：２８８℃）２００ｇに、ＮＭＰ１５ｇ，ＴＲＧＭ１０ｇ、ＴＥＧＭ３０ｇを加えることにより、ＰＡＩの固形分濃度が対ＰＡＩ溶液比で約２５質量％であり、エーテル系溶媒の含有比率が対ＰＡＩ溶液比で約１６質量％の均一なＰＡＩ溶液（Ｂ−１１）を得た。この溶液から、実施例１と同様の条件で多孔質ＰＡＩフィルムを得た。このＰＡＩフィルムの気孔率測定結果を表１に示す。<Comparative Example 11>
A PAI solution (B-10) was prepared according to the description in Example 2 of JP2013-210493A. That is, NMP15g, TRGM10g, and TEGM30g are added to 200g of commercially available PAI solution (Hitachi Chemical Industry Co., Ltd. product: HI-406, PAI solid content: 32 mass%, solvent: NMP, PAI glass transition temperature: 288 degreeC). As a result, a uniform PAI solution (B-11) having a PAI solid content concentration of about 25% by mass in the PAI solution ratio and an ether solvent content ratio of about 16% by mass in the PAI solution ratio was obtained. From this solution, a porous PAI film was obtained under the same conditions as in Example 1. The results of measuring the porosity of this PAI film are shown in Table 1.
実施例で示した様に、本発明のＰＡＩ溶液から得られた多孔質ＰＡＩフィルムの気孔率（４０体積％以上）は高いものであり、二次電池セパレータやフィルタ等に好適に使用できるものであることが判る。これに対し、比較例で示したＰＡＩ溶液から得られた多孔質ＰＡＩフィルムの気孔率（４０体積％未満）は低いものであり、二次電池セパレータやフィルタ等への適用は難しいことが判る。 As shown in the Examples, the porous PAI film obtained from the PAI solution of the present invention has a high porosity (40% by volume or more), and can be suitably used for secondary battery separators, filters, and the like. I know that there is. On the other hand, the porosity (less than 40 volume%) of the porous PAI film obtained from the PAI solution shown in the comparative example is low, and it can be seen that application to a secondary battery separator, a filter or the like is difficult.
本発明のＰＡＩ溶液を用いて得られた多孔質ＰＡＩフィルムは、電子材料や光学材料、リチウム二次電池用セパレータ、フィルタ、分離膜、電線被覆等の産業用材料、医療材料の素材等の分野で有用である。 The porous PAI film obtained by using the PAI solution of the present invention is used in the fields of electronic materials, optical materials, lithium secondary battery separators, filters, separation membranes, electric wire coatings, and other industrial materials, and medical materials. It is useful in.
Claims (9)
前記ポリアミドイミドの固形分濃度が、ポリアミドイミド溶液質量に対し２５質量％以下であり、
前記含窒素極性溶媒の含有量が、ポリアミドイミド溶液質量に対し１５質量％以上であり、
前記エーテル系溶媒の含有量が、ポリアミドイミド溶液質量に対し５０質量％超であることを特徴とする多孔質ポリアミドイミドフィルム形成用ポリアミドイミド溶液。 A uniform polyamideimide solution containing a nitrogen-containing polar solvent and triethylene glycol dimethyl ether and / or tetraethylene glycol dimethyl ether as an ether solvent,
The solid content concentration of the polyamideimide is 25% by mass or less based on the mass of the polyamideimide solution,
The content of the nitrogen-containing polar solvent is 15% by mass or more based on the mass of the polyamideimide solution,
The polyamide-imide solution for forming a porous polyamide-imide film, wherein the content of the ether solvent is more than 50% by mass with respect to the mass of the polyamide-imide solution.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014006004 | 2014-01-16 | ||
| JP2014006004 | 2014-01-16 | ||
| PCT/JP2015/050962 WO2015108114A1 (en) | 2014-01-16 | 2015-01-15 | Polyamide imide solution, porous polyamide imide film, and methods for producing same |
Related Child Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017028928A Division JP6656192B2 (en) | 2014-01-16 | 2017-02-20 | Polyamide imide solution, porous polyamide imide film, and method for producing the same |
| JP2017081323A Division JP2017128741A (en) | 2014-01-16 | 2017-04-17 | Polyamide imide solution, porous polyamide imide film, and method for producing the same |
| JP2017081326A Division JP6425760B2 (en) | 2014-01-16 | 2017-04-17 | Polyamideimide solution, porous polyamideimide film, and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2015108114A1 JPWO2015108114A1 (en) | 2017-03-23 |
| JP6175517B2 true JP6175517B2 (en) | 2017-08-02 |
Family
ID=53542999
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015557872A Active JP6175517B2 (en) | 2014-01-16 | 2015-01-15 | Polyamideimide solution, porous polyamideimide film, and method for producing the same |
| JP2017028928A Active JP6656192B2 (en) | 2014-01-16 | 2017-02-20 | Polyamide imide solution, porous polyamide imide film, and method for producing the same |
| JP2017081326A Active JP6425760B2 (en) | 2014-01-16 | 2017-04-17 | Polyamideimide solution, porous polyamideimide film, and method for producing the same |
| JP2017081323A Pending JP2017128741A (en) | 2014-01-16 | 2017-04-17 | Polyamide imide solution, porous polyamide imide film, and method for producing the same |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017028928A Active JP6656192B2 (en) | 2014-01-16 | 2017-02-20 | Polyamide imide solution, porous polyamide imide film, and method for producing the same |
| JP2017081326A Active JP6425760B2 (en) | 2014-01-16 | 2017-04-17 | Polyamideimide solution, porous polyamideimide film, and method for producing the same |
| JP2017081323A Pending JP2017128741A (en) | 2014-01-16 | 2017-04-17 | Polyamide imide solution, porous polyamide imide film, and method for producing the same |
Country Status (4)
| Country | Link |
|---|---|
| JP (4) | JP6175517B2 (en) |
| KR (2) | KR101874728B1 (en) |
| CN (2) | CN105916941A (en) |
| WO (1) | WO2015108114A1 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6577182B2 (en) * | 2014-12-02 | 2019-09-18 | ユニチカ株式会社 | Imide polymer solution, porous imide polymer film, and production method thereof |
| JP6962548B2 (en) * | 2016-08-22 | 2021-11-05 | ユニチカ株式会社 | Polyamide-imide solution for power storage element electrodes, manufacturing method of power storage element electrodes, and power storage element electrodes |
| JP7116461B2 (en) * | 2016-12-09 | 2022-08-10 | ユニチカ株式会社 | Binder solution, coating solution, and method for producing storage element electrode |
| JP7233071B2 (en) * | 2018-04-24 | 2023-03-06 | ユニチカ株式会社 | Polyamideimide composition and use thereof |
| KR102326790B1 (en) * | 2018-11-29 | 2021-11-15 | 주식회사 엘지화학 | Polyamide copolymers and colorless and polyamideimide film comprising the same |
| JP6974368B2 (en) * | 2019-01-11 | 2021-12-01 | エセックス古河マグネットワイヤジャパン株式会社 | Insulation paint and manufacturing method of insulated wire using it |
| JP7436023B2 (en) | 2019-05-28 | 2024-02-21 | ユニチカ株式会社 | Method for producing polyamide-imide solution and porous polyamide-imide film |
| CN111514766B (en) * | 2020-02-21 | 2022-04-26 | 山西格瑞思科技有限公司 | Polyamide-polyimide coal bed gas denitrification concentration separation membrane with carboxylic acid group |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4947989B1 (en) | 1970-09-22 | 1974-12-19 | ||
| DE3743780A1 (en) * | 1987-12-23 | 1989-07-06 | Bayer Ag | METHOD FOR IMPROVING THE ADHESIVITY OF CURRENTLY DEPOSITED METAL LAYERS ON POLYIMIDE SURFACES |
| JPH08208984A (en) * | 1995-02-06 | 1996-08-13 | Sumitomo Bakelite Co Ltd | Polyimide resin composition |
| JP2001266949A (en) * | 2000-03-17 | 2001-09-28 | Sumitomo Chem Co Ltd | Lithium ion secondary battery |
| JP2004256750A (en) * | 2003-02-27 | 2004-09-16 | Toppan Forms Co Ltd | Metal-nanoparticle-containing conductive coating liquid and conductive metal foil |
| KR100796476B1 (en) * | 2004-02-23 | 2008-01-21 | 토요 보세키 가부시기가이샤 | Porous film, process for producing the same, and lithium-ion secondary cell made with the same |
| JP4591010B2 (en) * | 2004-03-03 | 2010-12-01 | 東洋紡績株式会社 | Porous membrane, method for producing the same, and lithium ion secondary battery using the same |
| JP4812266B2 (en) * | 2004-07-01 | 2011-11-09 | 株式会社巴川製紙所 | Separator for electronic parts and method for manufacturing the same |
| JP2007154029A (en) * | 2005-12-05 | 2007-06-21 | Toyobo Co Ltd | Polyamide-imide resin |
| JP4947989B2 (en) | 2006-02-09 | 2012-06-06 | ユニチカ株式会社 | Polyimide precursor solution, polyimide porous film, and production method thereof |
| JP2007269575A (en) * | 2006-03-31 | 2007-10-18 | Tomoegawa Paper Co Ltd | Method for manufacturing porous carbon membrane, electrode for fuel cell, and electrode for saline water electrolysis |
| JP2008027766A (en) * | 2006-07-21 | 2008-02-07 | Hitachi Maxell Ltd | Lithium battery |
| JP5430249B2 (en) * | 2009-06-23 | 2014-02-26 | キヤノン株式会社 | Method for producing porous polymer membrane and porous polymer membrane produced by the production method |
| JP2012111790A (en) * | 2010-11-19 | 2012-06-14 | Daicel Corp | Dry type polyimide-based porous film and method for producing the same |
| KR101890451B1 (en) * | 2011-04-20 | 2018-08-21 | 가부시키가이샤 가네카 | Polyamide-imide solution and polyamide-imide film |
| JP2013187029A (en) | 2012-03-07 | 2013-09-19 | Furukawa Electric Co Ltd:The | Method for manufacturing insulated electric wire having bubble therein |
| CN103650065B (en) | 2012-03-07 | 2016-11-23 | 古河电气工业株式会社 | Insulated electric conductor, electrical equipment and the manufacture method of the insulated electric conductor containing bubble layer containing bubble layer |
| JP5895660B2 (en) * | 2012-03-30 | 2016-03-30 | 東洋紡株式会社 | Semiconductor coating agent |
| JP2013210493A (en) | 2012-03-30 | 2013-10-10 | Furukawa Electric Co Ltd:The | Light reflecting member and manufacturing method thereof |
| KR101905513B1 (en) | 2012-05-29 | 2018-10-10 | 삼성전자주식회사 | Method and apparatus for reproducing moving picture in a portable terminal |
-
2015
- 2015-01-15 JP JP2015557872A patent/JP6175517B2/en active Active
- 2015-01-15 WO PCT/JP2015/050962 patent/WO2015108114A1/en active Application Filing
- 2015-01-15 CN CN201580004484.XA patent/CN105916941A/en active Pending
- 2015-01-15 KR KR1020167017884A patent/KR101874728B1/en active IP Right Grant
- 2015-01-15 KR KR1020187017652A patent/KR102127586B1/en active IP Right Grant
- 2015-01-15 CN CN201811502729.3A patent/CN109971174A/en active Pending
-
2017
- 2017-02-20 JP JP2017028928A patent/JP6656192B2/en active Active
- 2017-04-17 JP JP2017081326A patent/JP6425760B2/en active Active
- 2017-04-17 JP JP2017081323A patent/JP2017128741A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2015108114A1 (en) | 2017-03-23 |
| JP2017082250A (en) | 2017-05-18 |
| KR102127586B1 (en) | 2020-06-26 |
| KR20180075695A (en) | 2018-07-04 |
| JP6656192B2 (en) | 2020-03-04 |
| KR101874728B1 (en) | 2018-07-04 |
| JP6425760B2 (en) | 2018-11-21 |
| WO2015108114A1 (en) | 2015-07-23 |
| CN109971174A (en) | 2019-07-05 |
| CN105916941A (en) | 2016-08-31 |
| KR20160107167A (en) | 2016-09-13 |
| JP2017122243A (en) | 2017-07-13 |
| JP2017128741A (en) | 2017-07-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6175517B2 (en) | Polyamideimide solution, porous polyamideimide film, and method for producing the same | |
| JP6218931B2 (en) | Laminated porous film and method for producing the same | |
| JP5944613B1 (en) | Porous polyimide film and method for producing the same | |
| TWI629095B (en) | Polyimide composition and preparation method of separation membrane | |
| JP6577182B2 (en) | Imide polymer solution, porous imide polymer film, and production method thereof | |
| JP6403389B2 (en) | Method for producing imide-based porous film and imide-based porous film | |
| JP2019183153A (en) | Method for producing polyimide aerogel | |
| JP6777308B2 (en) | Polyimide solution for forming a porous polyimide film, a method for producing a porous polyimide film, and a porous polyimide film | |
| JP6509779B2 (en) | Aromatic amide polymer solution and porous aromatic amide film | |
| JP7436023B2 (en) | Method for producing polyamide-imide solution and porous polyamide-imide film | |
| JP6835348B2 (en) | Polyamide-imide solution for power storage element separator and power storage element separator | |
| JP6923913B2 (en) | Polyimide solution for forming a porous polyimide film, a method for producing a porous polyimide film, and a porous polyimide film | |
| JP2010023271A (en) | Laminate | |
| JP2020189972A (en) | Polyamide-imide solution and method for producing porous polyamide-imide film | |
| JP7389459B2 (en) | Method for producing polyamide-imide solution and thickening polyamide-imide | |
| JP2018065902A (en) | Porous composite film, and production method of porous composite film | |
| JP2010023310A (en) | Laminate | |
| JP2017174540A (en) | Solution for polymer electrolyte and polymer electrolyte | |
| JP2018062104A (en) | Porous laminated film and method for producing porous laminated film | |
| TW201831598A (en) | Composition for forming polyimide, polyimide and polyimide film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170119 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170119 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20170119 |
|
| A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20170208 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170214 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170417 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170620 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170710 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6175517 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |