JP6065555B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP6065555B2 JP6065555B2 JP2012265312A JP2012265312A JP6065555B2 JP 6065555 B2 JP6065555 B2 JP 6065555B2 JP 2012265312 A JP2012265312 A JP 2012265312A JP 2012265312 A JP2012265312 A JP 2012265312A JP 6065555 B2 JP6065555 B2 JP 6065555B2
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- 239000004065 semiconductor Substances 0.000 title claims description 52
- 230000002093 peripheral effect Effects 0.000 claims description 73
- 239000000758 substrate Substances 0.000 claims description 12
- 239000010410 layer Substances 0.000 description 131
- 239000012535 impurity Substances 0.000 description 33
- 230000015556 catabolic process Effects 0.000 description 29
- 230000005684 electric field Effects 0.000 description 23
- 239000002344 surface layer Substances 0.000 description 16
- 239000011229 interlayer Substances 0.000 description 9
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 9
- 229920005591 polysilicon Polymers 0.000 description 9
- 208000035208 Ring chromosome 20 syndrome Diseases 0.000 description 6
- 230000001105 regulatory effect Effects 0.000 description 6
- 238000003892 spreading Methods 0.000 description 6
- 108010075750 P-Type Calcium Channels Proteins 0.000 description 5
- 239000000969 carrier Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000004088 simulation Methods 0.000 description 3
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- 108091006146 Channels Proteins 0.000 description 1
- 210000000746 body region Anatomy 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7811—Vertical DMOS transistors, i.e. VDMOS transistors with an edge termination structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
- H01L29/063—Reduced surface field [RESURF] pn-junction structures
- H01L29/0634—Multiple reduced surface field (multi-RESURF) structures, e.g. double RESURF, charge compensation, cool, superjunction (SJ), 3D-RESURF, composite buffer (CB) structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
- H01L29/0692—Surface layout
- H01L29/0696—Surface layout of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Composite Materials (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Description
以下、本発明の第1実施形態について図1〜図4を参照して説明する。ここでは、半導体装置としてトレンチゲート型のMOSFETを備えたものを例に挙げて説明するが、他の縦型半導体素子が備えられるものであっても良い。なお、図3や図4A、図4Bは断面図ではないが、図を見やすくするためにp型の部分をハッチングで示してある。
本発明は上記した実施形態に限定されるものではなく、特許請求の範囲に記載した範囲内において適宜変更が可能である。
2 周辺領域
3 ドレイン層
4 N型カラム領域
5 P型カラム領域
6 半導体基板
7 P型層
9 半導体素子
12 ソース電極
25 チャージバランス変化領域
Claims (6)
- ドリフト領域としての一方向を長手方向とする第1導電型カラム領域(4)および第2導電型カラム領域(5)が第1導電型層(3)の上に形成されていると共に、前記第1導電型カラム領域および前記第2導電型カラム領域が前記一方向と垂直な方向を繰り返し方向として所定ピッチで交互に繰り返し形成されることによってスーパージャンクション構造が構成された半導体基板(6)を備え、
前記半導体基板のうち半導体素子(9)が形成された領域がセル領域(1)とされ、当該セル領域の外周に設けられた領域が周辺領域(2)とされている半導体装置であって、
前記周辺領域には、前記スーパージャンクション構造のうち前記第1導電型カラム領域の表層部に、隣り合う前記第2導電型カラム領域を連結し、前記一方向と同方向において、前記第1導電型カラム領域および前記第2導電型カラム領域が繰り返し形成されたピッチよりも小さなピッチで配置された第2導電型層(7)が備えられており、
前記第2導電型層は、前記セル領域の外周方向に向かって徐々にピッチが広くされていることを特徴とする半導体装置。 - 前記繰り返し方向において、前記第2導電型層の幅が前記第2導電型層の間に配置される前記第1導電型カラム領域の幅以下となっていることを特徴とする請求項1に記載の半導体装置。
- 前記第2導電型層は、前記セル領域の中心から外周方向に向かった距離が等距離の場所で比較して、前記第1導電型カラム領域および前記第2導電型カラム領域が繰り返し形成されたピッチよりも小さなピッチで配置されていることを特徴とする請求項1または2に記載の半導体装置。
- 前記第2導電型層は、前記セル領域の外周方向に向かって幅が徐々に狭くされていることを特徴とする請求項1ないし3のいずれか1つに記載の半導体装置。
- 前記周辺領域では、前記第1導電型層の面方向において前記繰り返し方向に垂直な方向における前記第2導電型カラム領域の幅が当該第2導電型カラム領域の端部(5a)に向かって連続的に狭くされていることを特徴とする請求項1ないし4のいずれか1つに記載の半導体装置。
- 前記周辺領域では、前記繰り返し方向において、前記セル領域から離れるほど、前記第1導電型カラム領域の幅が広くされていることを特徴とする請求項1ないし5のいずれか1つに記載の半導体装置。
Priority Applications (1)
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JP2012265312A JP6065555B2 (ja) | 2012-12-04 | 2012-12-04 | 半導体装置 |
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JP2012265312A JP6065555B2 (ja) | 2012-12-04 | 2012-12-04 | 半導体装置 |
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JP2014110382A JP2014110382A (ja) | 2014-06-12 |
JP6065555B2 true JP6065555B2 (ja) | 2017-01-25 |
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JP2012265312A Expired - Fee Related JP6065555B2 (ja) | 2012-12-04 | 2012-12-04 | 半導体装置 |
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Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101721181B1 (ko) * | 2015-04-01 | 2017-03-30 | 주식회사 케이이씨 | 전력 반도체 소자 |
CN105914149B (zh) * | 2016-06-24 | 2019-01-04 | 上海华虹宏力半导体制造有限公司 | 沟槽栅超结功率器件的制造方法 |
DE112018001442T5 (de) * | 2017-01-25 | 2020-01-09 | Rohm Co., Ltd. | Halbleitervorrichtung |
JP7081876B2 (ja) * | 2017-12-19 | 2022-06-07 | ラピスセミコンダクタ株式会社 | 半導体装置及び半導体装置の製造方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3628613B2 (ja) * | 1997-11-03 | 2005-03-16 | インフィネオン テクノロジース アクチエンゲゼルシャフト | 半導体構成素子のための耐高圧縁部構造 |
JP2008010506A (ja) * | 2006-06-27 | 2008-01-17 | Matsushita Electric Ind Co Ltd | 半導体装置 |
JP5198030B2 (ja) * | 2007-10-22 | 2013-05-15 | 株式会社東芝 | 半導体素子 |
JP2010040973A (ja) * | 2008-08-08 | 2010-02-18 | Sony Corp | 半導体装置およびその製造方法 |
JP4844605B2 (ja) * | 2008-09-10 | 2011-12-28 | ソニー株式会社 | 半導体装置 |
JP4883099B2 (ja) * | 2009-01-28 | 2012-02-22 | ソニー株式会社 | 半導体装置及び半導体装置の製造方法 |
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