JP6057706B2 - 研磨用組成物 - Google Patents
研磨用組成物 Download PDFInfo
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- JP6057706B2 JP6057706B2 JP2012288415A JP2012288415A JP6057706B2 JP 6057706 B2 JP6057706 B2 JP 6057706B2 JP 2012288415 A JP2012288415 A JP 2012288415A JP 2012288415 A JP2012288415 A JP 2012288415A JP 6057706 B2 JP6057706 B2 JP 6057706B2
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- polishing
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- metal substrate
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- XUIIKFGFIJCVMT-UHFFFAOYSA-N thyroxine-binding globulin Natural products IC1=CC(CC([NH3+])C([O-])=O)=CC(I)=C1OC1=CC(I)=C(O)C(I)=C1 XUIIKFGFIJCVMT-UHFFFAOYSA-N 0.000 description 1
- UAXOELSVPTZZQG-UHFFFAOYSA-N tiglic acid Natural products CC(C)=C(C)C(O)=O UAXOELSVPTZZQG-UHFFFAOYSA-N 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- XVZMLSWFBPLMEA-UHFFFAOYSA-N trimethoxy(2-pyridin-2-ylethyl)silane Chemical compound CO[Si](OC)(OC)CCC1=CC=CC=N1 XVZMLSWFBPLMEA-UHFFFAOYSA-N 0.000 description 1
- FTDRQHXSYGDMNJ-UHFFFAOYSA-N trimethoxy(3-pyrrol-1-ylpropyl)silane Chemical compound CO[Si](OC)(OC)CCCN1C=CC=C1 FTDRQHXSYGDMNJ-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- OUYCCCASQSFEME-UHFFFAOYSA-N tyrosine Natural products OC(=O)C(N)CC1=CC=C(O)C=C1 OUYCCCASQSFEME-UHFFFAOYSA-N 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- AQLJVWUFPCUVLO-UHFFFAOYSA-N urea hydrogen peroxide Chemical compound OO.NC(N)=O AQLJVWUFPCUVLO-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 239000004474 valine Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
本発明の研磨対象物となる金属基板は、好ましくは導電性物質層を有し、必要に応じてバリア層および絶縁膜を有する。
本発明の研磨用組成物中に含まれる機能性砥粒は、金属基板を機械的に研磨する作用を有し、また、金属基板のディッシングを抑制する。
金属酸化物粒子の具体例としては、例えば、シリカ、アルミナ、セリア、チタニア等が挙げられる。該金属酸化物粒子は、単独でもまたは2種以上混合して用いてもよい。また、該砥粒は、市販品を用いてもよいし合成品を用いてもよい。
本発明に係る表面修飾基は、金属基板に対して吸着することで前記金属基板の溶解を抑制する官能基(以下、単に官能基とも称する)を片末端に有する。さらに前記官能基と上記金属酸化物粒子とを連結する2価の連結基(以下、単に連結基とも称する)を有することが好ましい。
本発明に係る機能性砥粒の製造方法は、特に制限されないが、例えば、上記の金属酸化物粒子に対してシランカップリング剤を添加し、反応させ結合させることで製造することができる。
本発明の研磨用組成物は、砥粒を分散または溶解するための分散媒または溶媒として水を含む。他の成分の作用を阻害することを抑制するという観点から、不純物をできる限り含有しない水が好ましく、具体的には、イオン交換樹脂にて不純物イオンを除去した後、フィルタを通して異物を除去した純水や超純水、または蒸留水が好ましい。
本発明の研磨用組成物は、必要に応じてさらに、酸化剤、金属防食剤、研磨促進剤、界面活性剤、防腐剤、防カビ剤、還元剤、水溶性高分子、難溶性の有機物を溶解するための有機溶媒等の他の成分をさらに含んでもよい。これら他の成分の中でも、酸化剤、金属防食剤、研磨促進剤、および界面活性剤からなる群より選択される少なくとも1種が好ましい。以下、好ましい他の成分である酸化剤、金属防食剤、研磨促進剤、界面活性剤について説明する。
本発明に係る研磨用組成物は、酸化剤を含んでもよい。研磨用組成物中に含まれる酸化剤は、金属基板の表面を酸化する作用を有し、研磨用組成物による金属基板の研磨速度を向上させる。
本発明に係る研磨用組成物は、金属防食剤を含むことができる。研磨用組成物中に金属防食剤を加えることにより、研磨した後の金属基板のディッシングをより抑制することができる。
本発明に係る研磨用組成物は、研磨促進剤を含むことができる。研磨促進剤は、金属基板の表面に錯形成して結合し、不溶性の脆性膜を金属基板の表面に形成することによって研磨用組成物による金属基板の研磨速度を向上させる働きをする。また、研磨促進剤が有するエッチング作用により、研磨用組成物による金属基板の研磨速度が向上するという有利な効果がある。
本発明に係る研磨用組成物は、界面活性剤を含むことができる。研磨用組成物中に界面活性剤を加えることにより、研磨した後の金属基板のディッシングをより抑制することができる。
本発明の研磨用組成物のpHの下限は、1.5以上であることが好ましい。研磨用組成物のpHが大きくなるにつれて、研磨用組成物による金属基板表面の過剰なエッチングが起こる虞を少なくすることができる。
本発明の研磨用組成物の製造方法は、特に制限されず、例えば、機能性砥粒、および必要に応じて他の成分を、水中で攪拌混合することにより得ることができる。
上述のように、本発明の研磨用組成物は、上記で説明した金属基板の研磨に好適に用いられる。よって、本発明は、金属基板を本発明の研磨用組成物を用いて研磨する研磨方法を提供する。また、本発明は、金属基板を前記研磨方法で研磨する工程を含む金属基板の製造方法を提供する。
(合成例)
温度計、攪拌翼を備える10Lの反応器に、3−ブロモプロピルトリメトキシシラン2432g(10mol)、およびトルエン:キシレン=1:1(体積比)の混合溶媒5Lを加え、1時間攪拌して溶液を得た。この溶液に、1,2,3−ベンゾトリアゾール1191g(10mol)を添加し、さらに1時間攪拌した。その後、酸触媒である硫酸を10μmol添加後、10分間攪拌した。その後、50℃のエアバスにて4時間静置し、反応を進行させた。反応終了後、ロータリー式エバポレータでトルエンと硫酸を取り除き、目的物である、N−[3−(トリエトキシシリルプロピル)]ベンゾトリアゾールを得た。
(実施例1)
コロイダルシリカ水溶液1000g(濃度19.5重量%)を準備した。別途、上記合成例で得られたシランカップリング剤であるN−[3−(トリエトキシシリルプロピル)]ベンゾトリアゾールを7.5g秤量し、メタノール50gに溶解させた。このシランカップリング剤の量は、BET法で測定された前記コロイダルシリカの比表面積から、上記数式1に従い、シランカップリング剤1分子の占有面積を(5×10−10)2(m2)=25×10−20(m2)とし、コロイダルシリカの見かけのモル数を算出、その算出したモル数の50モル%に相当する量である。
N−[3−(トリエトキシシリルプロピル)]ベンゾトリアゾールの代わりに、IM−2000(JX日鉱日石金属株式会社製)8.2g(コロイダルシリカの見かけのモル数に対して50モル%)を用いたこと以外は、実施例1と同様にして、機能性砥粒2を得た。
N−[3−(トリエトキシシリルプロピル)]ベンゾトリアゾールの代わりに、KBM−803(信越化学工業株式会社製、3−メルカプトプロピルトリメトキシシラン)3.9g(コロイダルシリカの見かけのモル数に対して50モル%)を用いたこと以外は、実施例1と同様にして、機能性砥粒3を得た。
N−[3−(トリエトキシシリルプロピル)]ベンゾトリアゾールの代わりに、トリメトキシフェニルシラン(東京化成工業株式会社製)4.1g(コロイダルシリカの見かけのモル数に対して50モル%)を用いたこと以外は、実施例1と同様にして、機能性砥粒4を得た。
N−[3−(トリエトキシシリルプロピル)]ベンゾトリアゾールの代わりに、2−シアノエチルトリエトキシシラン(東京化成工業株式会社製)3.2g(コロイダルシリカの見かけのモル数に対して50モル%)を用いたこと以外は、実施例1と同様にして、機能性砥粒5を得た。
得られた機能性砥粒1〜5を用いて研磨用組成物を調製した。具体的には、機能性砥粒 6g/L、研磨促進剤としてグリシン 10g/L、酸化剤として過酸化水素 35g/L、および金属防食剤として1H−ベンゾトリアゾール 0.2g/Lの濃度に、それぞれなるように水中で攪拌混合し(混合温度:約25℃、混合時間:約10分)、研磨用組成物1〜5を調製した。なお、研磨用組成物のpHは、水酸化カリウムを加え、pH7.0に調整した。
Claims (4)
- 金属基板に対して吸着することで前記金属基板の溶解を抑制する官能基を片末端に有する表面修飾基と、前記表面修飾基が固定化されている金属酸化物粒子と、を含む機能性砥粒と、
水と、
を含む、研磨用組成物であって、
前記官能基がベンゾトリアゾリル基である、研磨用組成物。 - 酸化剤、金属防食剤、研磨促進剤、および界面活性剤からなる群より選択される少なくとも1種をさらに含む、請求項1に記載の研磨用組成物。
- 金属基板を請求項1または2に記載の研磨用組成物を用いて研磨する、研磨方法。
- 金属基板を請求項3に記載の研磨方法で研磨する工程を含む、金属基板の製造方法。
Priority Applications (6)
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JP2012288415A JP6057706B2 (ja) | 2012-12-28 | 2012-12-28 | 研磨用組成物 |
SG11201505037VA SG11201505037VA (en) | 2012-12-28 | 2013-10-25 | Polishing composition |
PCT/JP2013/078968 WO2014103494A1 (ja) | 2012-12-28 | 2013-10-25 | 研磨用組成物 |
US14/655,597 US20150322294A1 (en) | 2012-12-28 | 2013-10-25 | Polishing composition |
KR1020157016607A KR102154512B1 (ko) | 2012-12-28 | 2013-10-25 | 연마용 조성물 |
TW102140486A TWI592471B (zh) | 2012-12-28 | 2013-11-07 | Polishing composition |
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JP (1) | JP6057706B2 (ja) |
KR (1) | KR102154512B1 (ja) |
SG (1) | SG11201505037VA (ja) |
TW (1) | TWI592471B (ja) |
WO (1) | WO2014103494A1 (ja) |
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JP2016056254A (ja) * | 2014-09-08 | 2016-04-21 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
WO2016102279A1 (en) * | 2014-12-22 | 2016-06-30 | Basf Se | Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt and / or co-balt alloy comprising substrates |
US9528030B1 (en) * | 2015-10-21 | 2016-12-27 | Cabot Microelectronics Corporation | Cobalt inhibitor combination for improved dishing |
KR101833219B1 (ko) * | 2016-08-05 | 2018-04-13 | 주식회사 케이씨텍 | 텅스텐 베리어층 연마용 슬러리 조성물 |
JP6819280B2 (ja) * | 2016-12-27 | 2021-01-27 | Jsr株式会社 | 化学機械研磨用組成物および化学機械研磨方法 |
JP6841166B2 (ja) * | 2017-06-09 | 2021-03-10 | 堺化学工業株式会社 | フェニルアルコキシシラン処理シリカの製造方法 |
CN109096990A (zh) | 2017-06-21 | 2018-12-28 | 圣戈本陶瓷及塑料股份有限公司 | 表面改性的研磨颗粒、研磨制品以及其形成方法 |
US10647887B2 (en) | 2018-01-08 | 2020-05-12 | Cabot Microelectronics Corporation | Tungsten buff polishing compositions with improved topography |
US20210024779A1 (en) * | 2018-03-15 | 2021-01-28 | Nitta Dupont Incorporated | Polishing composition |
US10968366B2 (en) * | 2018-12-04 | 2021-04-06 | Cmc Materials, Inc. | Composition and method for metal CMP |
US20200172759A1 (en) * | 2018-12-04 | 2020-06-04 | Cabot Microelectronics Corporation | Composition and method for cobalt cmp |
KR102619857B1 (ko) * | 2020-05-20 | 2023-12-29 | 삼성에스디아이 주식회사 | 텅스텐 연마용 cmp 슬러리 조성물 및 이를 이용한 텅스텐 연마 방법 |
US20230220240A1 (en) * | 2020-06-30 | 2023-07-13 | Jsr Corporation | Method for manufacturing abrasive grains, composition for chemical mechanical polishing, and method for chemical mechanical polishing |
KR102577164B1 (ko) * | 2020-12-29 | 2023-09-08 | 에스케이엔펄스 주식회사 | 반도체 공정용 연마 조성물 및 연마 조성물을 적용한 기판의 연마방법 |
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WO2001004226A2 (en) * | 1999-07-07 | 2001-01-18 | Cabot Microelectronics Corporation | Cmp composition containing silane modified abrasive particles |
JP4521058B2 (ja) * | 2008-03-24 | 2010-08-11 | 株式会社Adeka | 表面改質コロイダルシリカおよびこれを含有するcmp用研磨組成物 |
EP2533274B1 (en) * | 2010-02-01 | 2014-07-30 | JSR Corporation | Aqueous dispersion for chemical mechanical polishing, and chemical mechanical polishing method using same |
JP5774283B2 (ja) * | 2010-04-08 | 2015-09-09 | 株式会社フジミインコーポレーテッド | 研磨用組成物及び研磨方法 |
JP5141792B2 (ja) * | 2010-06-29 | 2013-02-13 | 日立化成工業株式会社 | Cmp研磨液及び研磨方法 |
EP2722872A4 (en) * | 2011-06-14 | 2015-04-29 | Fujimi Inc | POLISHING COMPOSITION |
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- 2013-10-25 SG SG11201505037VA patent/SG11201505037VA/en unknown
- 2013-10-25 KR KR1020157016607A patent/KR102154512B1/ko active IP Right Grant
- 2013-11-07 TW TW102140486A patent/TWI592471B/zh active
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TWI592471B (zh) | 2017-07-21 |
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WO2014103494A1 (ja) | 2014-07-03 |
TW201430115A (zh) | 2014-08-01 |
US20150322294A1 (en) | 2015-11-12 |
KR20150102990A (ko) | 2015-09-09 |
KR102154512B1 (ko) | 2020-09-10 |
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