JP5952460B1 - 有機白金化合物からなる化学蒸着用原料及び該化学蒸着用原料を用いた化学蒸着法 - Google Patents
有機白金化合物からなる化学蒸着用原料及び該化学蒸着用原料を用いた化学蒸着法 Download PDFInfo
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- 150000003058 platinum compounds Chemical class 0.000 title claims abstract description 18
- 238000005229 chemical vapour deposition Methods 0.000 title claims description 41
- 238000000034 method Methods 0.000 title claims description 15
- 239000000463 material Substances 0.000 title claims description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 102
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 48
- -1 alkyl anion Chemical class 0.000 claims abstract description 19
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 15
- RAABOESOVLLHRU-UHFFFAOYSA-N diazene Chemical compound N=N RAABOESOVLLHRU-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910000071 diazene Inorganic materials 0.000 claims abstract description 14
- 150000002466 imines Chemical class 0.000 claims abstract description 8
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 4
- 239000002994 raw material Substances 0.000 claims description 37
- 239000010409 thin film Substances 0.000 claims description 35
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 13
- 125000001424 substituent group Chemical group 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 4
- 125000003342 alkenyl group Chemical group 0.000 claims description 3
- 125000000304 alkynyl group Chemical group 0.000 claims description 3
- 125000003277 amino group Chemical group 0.000 claims description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 125000001841 imino group Chemical group [H]N=* 0.000 claims description 3
- 125000002462 isocyano group Chemical group *[N+]#[C-] 0.000 claims description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims 3
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000005234 chemical deposition Methods 0.000 claims 1
- 238000000354 decomposition reaction Methods 0.000 abstract description 8
- 238000009834 vaporization Methods 0.000 abstract description 8
- 230000008016 vaporization Effects 0.000 abstract description 8
- 238000003860 storage Methods 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 40
- 238000005755 formation reaction Methods 0.000 description 24
- 230000015572 biosynthetic process Effects 0.000 description 23
- 150000001875 compounds Chemical class 0.000 description 11
- 239000003446 ligand Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 239000012298 atmosphere Substances 0.000 description 7
- 150000003057 platinum Chemical class 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 239000012495 reaction gas Substances 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 150000004985 diamines Chemical class 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000000859 sublimation Methods 0.000 description 4
- 230000008022 sublimation Effects 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 238000000231 atomic layer deposition Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 150000001993 dienes Chemical class 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- NXICUOOCQAMYAN-UHFFFAOYSA-N C[Pt]C.C=CCC=CC Chemical compound C[Pt]C.C=CCC=CC NXICUOOCQAMYAN-UHFFFAOYSA-N 0.000 description 2
- LKSCPYCYSCCLCS-UHFFFAOYSA-N C[Pt]C.C=CCCC=C Chemical compound C[Pt]C.C=CCCC=C LKSCPYCYSCCLCS-UHFFFAOYSA-N 0.000 description 2
- PKKSQUUFOVYRLM-UHFFFAOYSA-N [Pt].CC(C(N(C)C)C)N(C)C Chemical compound [Pt].CC(C(N(C)C)C)N(C)C PKKSQUUFOVYRLM-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229940045985 antineoplastic platinum compound Drugs 0.000 description 2
- LRDJLICCIZGMSB-UHFFFAOYSA-N ethenyldiazene Chemical compound C=CN=N LRDJLICCIZGMSB-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- DTJSYSWZBHHPJA-UHFFFAOYSA-N n,n'-di(propan-2-yl)ethane-1,2-diimine Chemical compound CC(C)N=CC=NC(C)C DTJSYSWZBHHPJA-UHFFFAOYSA-N 0.000 description 2
- 150000003335 secondary amines Chemical class 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 238000002411 thermogravimetry Methods 0.000 description 2
- VEJOYRPGKZZTJW-FDGPNNRMSA-N (z)-4-hydroxypent-3-en-2-one;platinum Chemical compound [Pt].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O VEJOYRPGKZZTJW-FDGPNNRMSA-N 0.000 description 1
- YGBYJRVGNBVTCQ-UHFFFAOYSA-N C[Pt](C)C.[CH]1C=CC=C1 Chemical compound C[Pt](C)C.[CH]1C=CC=C1 YGBYJRVGNBVTCQ-UHFFFAOYSA-N 0.000 description 1
- XILIQYZLOIYIGT-UHFFFAOYSA-N C[Pt]C Chemical compound C[Pt]C XILIQYZLOIYIGT-UHFFFAOYSA-N 0.000 description 1
- DXGICGPKVQCNSA-UHFFFAOYSA-N C[Pt]CCC.C1=CCCC=CCC1 Chemical compound C[Pt]CCC.C1=CCCC=CCC1 DXGICGPKVQCNSA-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- AHAREKHAZNPPMI-UHFFFAOYSA-N hexa-1,3-diene Chemical compound CCC=CC=C AHAREKHAZNPPMI-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- LGEVDHRHEISTDG-UHFFFAOYSA-N n,n'-di(butan-2-yl)ethane-1,2-diimine Chemical compound CCC(C)N=CC=NC(C)CC LGEVDHRHEISTDG-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
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- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/0006—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table compounds of the platinum group
- C07F15/0086—Platinum compounds
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- C23C16/45523—Pulsed gas flow or change of composition over time
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Abstract
Description
本実施形態では、下記3種類の白金錯体を合成した。合成した白金錯体について物性を評価し、化学蒸着用原料として成膜試験を行った。
成膜温度250℃
試料温度:105℃
成膜圧力:5torr
反応ガス(水素)流量:10sccm
成膜時間:10分
本実施形態では、第一実施形態におけるSi基板上への成膜試験を、成膜温度200℃、225℃で行い、低温成膜性を評価した。その他の成膜条件は、第一実施形態と同様である。結果を下記表に示す。下記表には、第一実施形態の成膜結果を併せて示す。また、図3に形成した白金薄膜のSEM観察結果を示す。
本実施形態では、実施例に対し、ジメチル(N,N,N’,N’−テトラメチルエチレンジアミン)白金を比較例として、熱安定性及び成膜特性を評価した。
Claims (7)
- 化学蒸着法により白金薄膜又は白金化合物薄膜を製造するための化学蒸着用原料において、
次式で示される、2価の白金に、2つのイミンを含むジイミンと、アルキルアニオンとが配位した有機白金化合物からなる化学蒸着用原料。
- R1及びR4は、それぞれ、水素原子、メチル基、エチル基、プロピル基、ブチル基のいずれか1種である請求項1に記載の化学蒸着用原料。
- R1及びR4は、それぞれ、iso−プロピル基、sec−ブチル基、tert−ブチル基のいずれか1種である請求項1又は請求項2に記載の化学蒸着用原料。
- R2及びR3は、それぞれ、水素原子又はメチル基である請求項1〜3のいずれかに記載の化学蒸着用原料。
- R1〜R4は、全ての置換基の総炭素数が12以下である請求項1〜4のいずれかに記載の化学蒸着用原料。
- R5及びR6は、それぞれ、メチル基、エチル基、n−プロピル基のいずれか1種である請求項1〜5のいずれかに記載された化学蒸着用原料。
- 有機白金化合物からなる原料を気化して原料ガスとし、前記原料ガスを基板表面に導入しつつ加熱する白金薄膜又は白金化合物薄膜の化学蒸着法において、
前記原料として請求項1〜請求項6のいずれかに記載された化学蒸着用原料を用いる化学蒸着法。
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JP2015096976A JP5952460B1 (ja) | 2015-05-12 | 2015-05-12 | 有機白金化合物からなる化学蒸着用原料及び該化学蒸着用原料を用いた化学蒸着法 |
TW105113840A TWI638901B (zh) | 2015-05-12 | 2016-05-04 | 由有機鉑化合物所成之化學蒸鍍用原料及使用該化學蒸鍍用原料之化學蒸鍍法 |
US15/558,262 US10077282B2 (en) | 2015-05-12 | 2016-05-09 | Raw material for chemical deposition composed of organoplatinum compound, and chemical deposition method using the raw material for chemical deposition |
EP16792641.9A EP3299490A1 (en) | 2015-05-12 | 2016-05-09 | Chemical vapor deposition starting material comprising organic platinum compound, and chemical vapor deposition method using said chemical vapor deposition starting material |
KR1020177027929A KR102041027B1 (ko) | 2015-05-12 | 2016-05-09 | 유기 백금 화합물을 포함하는 화학 증착용 원료를 사용한 화학 증착법 |
PCT/JP2016/063693 WO2016181916A1 (ja) | 2015-05-12 | 2016-05-09 | 有機白金化合物からなる化学蒸着用原料及び該化学蒸着用原料を用いた化学蒸着法 |
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JP2009504911A (ja) * | 2005-08-08 | 2009-02-05 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 表面活性化剤を用いる金属含有フィルムの原子層蒸着 |
JP2013184925A (ja) * | 2012-03-08 | 2013-09-19 | Osaka Univ | タングステン錯体、メタセシス反応用触媒および環状オレフィン開環重合体の製造方法 |
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JP2615414B2 (ja) | 1994-02-25 | 1997-05-28 | 工業技術院長 | 情報記録材料 |
US5783716A (en) | 1996-06-28 | 1998-07-21 | Advanced Technology Materials, Inc. | Platinum source compositions for chemical vapor deposition of platinum |
JP3379315B2 (ja) * | 1995-12-11 | 2003-02-24 | 三菱マテリアル株式会社 | 有機金属化学蒸着による白金薄膜形成用原料 |
JP3321729B2 (ja) | 1998-04-03 | 2002-09-09 | 株式会社高純度化学研究所 | トリメチル(エチルシクロペンタジエニル)白金とそ の製造方法及びそれを用いた白金含有薄膜の製造方法 |
DE10358665A1 (de) * | 2003-12-12 | 2005-07-07 | Basf Ag | Verwendung von Platin(II)-Komplexen als lumineszierende Materialien in organischen Licht-emittierenden Dioden (OLEDs) |
US7439338B2 (en) | 2005-06-28 | 2008-10-21 | Micron Technology, Inc. | Beta-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same |
KR101606252B1 (ko) * | 2011-04-20 | 2016-03-24 | 다나카 기킨조쿠 고교 가부시키가이샤 | 화학 증착용 유기 백금 화합물 및 그 유기 백금 화합물을 사용한 화학 증착방법 |
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JP2013184925A (ja) * | 2012-03-08 | 2013-09-19 | Osaka Univ | タングステン錯体、メタセシス反応用触媒および環状オレフィン開環重合体の製造方法 |
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EP3299490A4 (en) | 2018-03-28 |
KR20170127499A (ko) | 2017-11-21 |
TW201708591A (zh) | 2017-03-01 |
US20180072765A1 (en) | 2018-03-15 |
TWI638901B (zh) | 2018-10-21 |
US10077282B2 (en) | 2018-09-18 |
JP2016210741A (ja) | 2016-12-15 |
WO2016181916A1 (ja) | 2016-11-17 |
EP3299490A1 (en) | 2018-03-28 |
KR102041027B1 (ko) | 2019-11-05 |
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