JP5929511B2 - 積層セラミック電子部品の製造方法 - Google Patents
積層セラミック電子部品の製造方法 Download PDFInfo
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- JP5929511B2 JP5929511B2 JP2012117712A JP2012117712A JP5929511B2 JP 5929511 B2 JP5929511 B2 JP 5929511B2 JP 2012117712 A JP2012117712 A JP 2012117712A JP 2012117712 A JP2012117712 A JP 2012117712A JP 5929511 B2 JP5929511 B2 JP 5929511B2
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- 239000000919 ceramic Substances 0.000 title claims description 214
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 239000004014 plasticizer Substances 0.000 claims description 33
- 239000011230 binding agent Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 15
- 238000006116 polymerization reaction Methods 0.000 claims description 13
- 229920005989 resin Polymers 0.000 claims description 13
- 239000011347 resin Substances 0.000 claims description 13
- 229920002554 vinyl polymer Polymers 0.000 claims description 7
- 238000010304 firing Methods 0.000 claims description 6
- JARKCYVAAOWBJS-UHFFFAOYSA-N hexanal Chemical compound CCCCCC=O JARKCYVAAOWBJS-UHFFFAOYSA-N 0.000 claims description 6
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims description 6
- -1 phthalate ester Chemical class 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims description 2
- 206010042674 Swelling Diseases 0.000 description 12
- 230000008961 swelling Effects 0.000 description 12
- 239000000843 powder Substances 0.000 description 11
- 239000002904 solvent Substances 0.000 description 7
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000004020 conductor Substances 0.000 description 5
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 4
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 3
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 3
- 229940116411 terpineol Drugs 0.000 description 3
- IRIAEXORFWYRCZ-UHFFFAOYSA-N Butylbenzyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC1=CC=CC=C1 IRIAEXORFWYRCZ-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 2
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- UODXCYZDMHPIJE-UHFFFAOYSA-N menthanol Chemical compound CC1CCC(C(C)(C)O)CC1 UODXCYZDMHPIJE-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical class OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- HBNHCGDYYBMKJN-UHFFFAOYSA-N 2-(4-methylcyclohexyl)propan-2-yl acetate Chemical compound CC1CCC(C(C)(C)OC(C)=O)CC1 HBNHCGDYYBMKJN-UHFFFAOYSA-N 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- HBGGXOJOCNVPFY-UHFFFAOYSA-N diisononyl phthalate Chemical compound CC(C)CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC(C)C HBGGXOJOCNVPFY-UHFFFAOYSA-N 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- DROMNWUQASBTFM-UHFFFAOYSA-N dinonyl benzene-1,2-dicarboxylate Chemical compound CCCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCCC DROMNWUQASBTFM-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
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Description
図6は、本実施形態において製造された積層セラミック電子部品の略図的斜視図である。図7は、本実施形態におけるセラミック電子部品の略図的側面図である。図8は、図6の線VIII−VIIIにおける略図的断面図である。図9は、図8の線IX−IXにおける略図的断面図である。
上記実施形態に係る積層セラミック電子部品1のマザー積層体22を、上記実施形態において説明した方法で、以下の条件で作製した。
セラミック粉末: BaTiO3 72.8体積%
第1の有機バインダー:ポリビニルブチラール樹脂(重合度850) 10.2体積%
第1の可塑剤:フタル酸ジオクチル 17.0体積%
導電層21の組成:導電材料Ni、溶剤テルピネオール
第1のセラミックグリーンシート20aのサイズ:200mm×200mm 第1のセラミックグリーンシート20aの積層枚数7枚
セラミック粉末: BaTiO3 72.8体積%
第2の有機バインダー:ポリビニルブチラール樹脂(重合度1300) 23.0体積%
第2の可塑剤:フタル酸ジオクチル 4.2体積%
第2のセラミックグリーンシート20bのサイズ:200mm×200mm 第2のセラミックグリーンシート20bの積層枚数7枚
焼成後のセラミック素体23のサイズが1.0mm×0.5mm×0.15mmとなるようにして、実施例1で得られたマザー積層体22をカットした。生のセラミック素体23の膨潤、歪みの有無をニコンインスペック社製のNEXIV VMR−6555を用いて確認した。具体的には、マザー積層体22をカットした後、個々の生のセラミック素体23に分割する前に、マザー積層体22を平面視して100の領域に均等に区画し、各領域内の複数ある生のセラミック素体23のうち、各領域の中央に位置する1つの生のセラミック素体23それぞれについて、導電性ペースト層27が塗布された部分の幅方向Xの膨潤、歪みの有無を確認した。生のセラミック素体23の寸法規格として、導電性ペースト層27部分の幅方向長さにおいて一定の長さを満たさないものを膨潤、歪みが発生していると判定した。100領域中、膨潤、歪みを有する生のセラミック素体が含まれていた領域の数を表1に示す。表1に示すように、実施例1で得られた生のセラミック素体23には、膨潤、歪みはほとんど発生しなかった。
第1及び第2の有機バインダーの種類(重合度)及び使用量と第1及び第2の可塑剤の使用量を表1に記載のものとし、実施例1と同様にして、実施例2〜8及び比較例1,2のマザー積層体22をそれぞれ作製した。次に、実施例2〜8及び比較例1,2で得られたマザー積層体22を用いて、実施例1と同様にして膨潤・歪みを確認した。結果を表1に示す。表1に示すように、実施例2〜8で得られた生のセラミック素体23には、膨潤・歪みはほとんど発生しなかった。一方、比較例1,2で得られた生のセラミック素体には多くの膨潤・歪みが発生した。
次に、実施例1〜8及び比較例1,2のマザー積層体22から得られた全ての生のセラミック素体23を不活性ガス雰囲気下、1200℃で2時間焼成した。得られたセラミック積層体の全てについて、超音波顕微鏡(C−SAM)を用いて内部空隙の有無を確認した。その結果、実施例2〜5で得られたセラミック積層体には、内部空隙が発生しているものは1つもなかった。
10…セラミック素体
10a、10b…主面
10c、10d…側面
10e、10f…端面
10g…セラミック層
11…第1の内部電極
12…第2の内部電極
13…第1の外部電極
14…第2の外部電極
13a,14a…第1の部分
13b,14b…第2の部分
13c,14c…第3の部分
20a…第1のセラミックグリーンシート
20b…第2のセラミックグリーンシート
21…導電層
22…マザー積層体
23…生のセラミック素体
24…チップ本体
24a、24b…主面
24e、24f…端面
25…第1の内部電極
26…第2の内部電極
27…導電性ペースト層
29…セラミック層
L1,L2…カットライン
Claims (5)
- 内部電極を構成するための導電層が表面上に形成された第1のセラミックグリーンシートと、内部電極を構成するための導電層が表面上に形成されていない第2のセラミックグリーンシートとを用意する工程と、
少なくとも一枚の前記第2のセラミックグリーンシートと、複数の前記第1のセラミックグリーンシートと、少なくとも一枚の前記第2のセラミックグリーンシートとをこの順番で積層することにより、対向し合う第1及び第2の主面と、前記導電層が露出した端面とを有する生のセラミック素体を作製する工程と、
前記第1及び第2の主面の内の少なくとも一方の主面の上に、導電性ペーストを塗布し、外部電極を形成するための導電性ペースト層を形成する工程と、
前記導電性ペースト層が形成された前記生のセラミック素体を焼成することにより積層セラミック電子部品を作製する工程と、
を備え、
前記第1及び第2のセラミックグリーンシートのそれぞれは、1種類の有機バインダーと、可塑剤とを含み、前記第1のセラミックグリーンシートに含有されている前記有機バインダーと、前記第2のセラミックグリーンシートに含有されている前記有機バインダーとは異なっており、
前記第2のセラミックグリーンシートに含まれる前記有機バインダーの重合度をAとし、前記第2のセラミックグリーンシートに含まれる前記可塑剤の体積含有率をB(可塑剤が複数種の場合には、複数種の可塑剤の体積の合計を基準とした体積含有率)としたときに、前記第1及び第2の主面の内の前記導電性ペースト層が形成されている主面を構成している前記第2のセラミックグリーンシートにおいて、180.56≦A/Bとなり、
前記第1のセラミックグリーンシートに含まれる前記有機バインダーの重合度をA1、前記第1のセラミックグリーンシートに含まれる前記可塑剤の体積含有率をB1(可塑剤が複数種の場合には、複数種の可塑剤の体積の合計を基準とした体積含有率)としたときに、
前記第1及び第2の主面の内の前記導電性ペースト層が形成されている主面を構成している前記第2のセラミックグリーンシートにおいて、2.74≦((A/B)/(A1/B1))≦5.00となる、積層セラミック電子部品の製造方法。 - 前記生のセラミック素体を作製する工程において、複数の前記第2のセラミックグリーンシートと、複数の前記第1のセラミックグリーンシートと、複数の前記第2のセラミックグリーンシートとをこの順番で積層し、
前記複数の第2のセラミックグリーンシートのそれぞれにおいて、180.56≦A/Bとなる、請求項1に記載の積層セラミック電子部品の製造方法。 - 前記生のセラミック素体を作製する工程において、複数の前記第2のセラミックグリーンシートと、複数の前記第1のセラミックグリーンシートと、複数の前記第2のセラミックグリーンシートとをこの順番で積層し、
前記複数の第2のセラミックグリーンシートのそれぞれにおいて、2.74≦((A/B)/(A1/B1))≦5.00となる、請求項1または2に記載の積層セラミック電子部品の製造方法。 - 前記第1及び第2のセラミックグリーンシートに含まれる前記有機バインダーは、それぞれポリビニルブチラール樹脂、ポリビニルホルマール樹脂、ポリビニルヘキサナール樹脂からなる群から選ばれる1種からなる、請求項1〜3のいずれか一項に記載の積層セラミック電子部品の製造方法。
- 前記第1及び第2のセラミックグリーンシートに含まれる前記可塑剤は、フタル酸エステルである、請求項1〜4のいずれか一項に記載の積層セラミック電子部品の製造方法。
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