JP5921787B1 - 液晶表示装置およびその製造方法 - Google Patents
液晶表示装置およびその製造方法 Download PDFInfo
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Abstract
Description
図1を参照して、本実施の形態における液晶表示装置200は液晶パネル100およびバックライトユニット90を有する。液晶パネル100は対向基板60と液晶層70とTFTアレイ基板101とを有する。
本実施の形態の液晶表示装置は、実施の形態1の液晶表示装置200(図1)において、FFSモード用のTFTアレイ基板101の代わりに、IPSモード用のTFTアレイ基板102(図14〜図16)を有する。図14は、本実施の形態のTFTアレイ基板102の構成を示す概略的な部分平面図である。図中、線XVIA−XVIAは、表示領域41(図2)内に位置しており、アレイ状に配列された多数の画素47のうちの1つを横断している。また線XVIB−XVIBおよび線XVIC−XVICは、額縁領域42に位置している。なお図14は平面図であるが、図を見やすくするためにハッチングが付されている。図15は、図14の表面側の一部構造を省略して示す。図16は、線VA−VA、線VB−VBおよび線VC−VC(図3および図4)のそれぞれに沿った断面A、BおよびCを示す。
図22は、本実施の形態における液晶表示装置が有するTFTアレイ基板103の構成を、TFTアレイ基板101を示す図5と同様の視野で示す。本実施の形態の液晶表示装置は、実施の形態1の液晶表示装置200(図1)においてTFTアレイ基板101(図5)の代わりにTFTアレイ基板103(図22)を有する。
図26は、本実施の形態における液晶表示装置が有するTFTアレイ基板104の構成を、TFTアレイ基板102を示す図16と同様の視野で示す。本実施の形態の液晶表示装置は、実施の形態1の液晶表示装置200(図1)においてTFTアレイ基板101(図5)の代わりにTFTアレイ基板104(図26)を有する。
図27は、本実施の形態における液晶表示装置が有するTFTアレイ基板105の構成を、TFTアレイ基板101を示す図5と同様の視野で示す。本実施の形態の液晶表示装置は、実施の形態1の液晶表示装置200(図1)においてTFTアレイ基板101(図5)の代わりにTFTアレイ基板105(図27)を有する。
図28は、本実施の形態における液晶表示装置が有するTFTアレイ基板106の構成を、TFTアレイ基板101を示す図5と同様の視野で示す。本実施の形態の液晶表示装置は、実施の形態1の液晶表示装置200(図1)においてTFTアレイ基板101(図5)の代わりにTFTアレイ基板106(図28)を有する。
電極構成層7Aまたは7Bを含む金属酸化物膜7の導電性の制御が還元処理によって行われる場合、その具体的な方法は、上述した水素プラズマ処理に限定されるものではない。例えば、水素雰囲気または他の還元ガス雰囲気中の熱処理が行われてもよい。あるいは、水素含有量の多い窒化シリコン膜が酸化物半導体のうち還元されることになる領域上に選択的に形成され、その後にアニール処理が行われてもよい。あるいは還元溶液中の浸漬がおこなわれてもよい。
Claims (7)
- 液晶層を変調するための画素電極および対向電極を有する液晶表示装置であって、
支持基板と、
前記支持基板上に設けられ金属酸化物から作られた電極構成層とを備え、前記電極構成層は、交互に配置された複数の電極領域と複数の絶縁体領域とを有するストライプ領域を含み、前記電極領域は、前記金属酸化物が酸素欠陥を有することによって導電性を有し、前記絶縁体領域は、前記金属酸化物が前記電極領域の酸素欠陥濃度に比して低い酸素欠陥濃度を有することによって絶縁性を有し、前記電極領域は前記画素電極および前記対向電極の少なくともいずれかに含まれる、
液晶表示装置。 - 前記支持基板は、表示領域と、前記表示領域を囲む額縁領域とを有し、
前記液晶表示装置は、前記支持基板上の前記額縁領域に設けられた電気回路と、前記支持基板の前記額縁領域上から前記支持基板外へ延びる外部配線とをさらに備え、前記電気回路と前記外部配線とは、前記支持基板上の前記額縁領域内において前記電気回路と前記外部配線との間に位置する接続領域で互いに接続されており、
前記電極構成層の前記ストライプ領域の前記電極領域および前記絶縁体領域は一の平坦な面をなしており、
前記電極構成層は前記支持基板上において、前記表示領域から前記額縁領域内へ延伸しており、かつ前記接続領域には設けられていない、請求項1に記載の液晶表示装置。 - 前記電極構成層の前記絶縁体領域は1×108Ω/sq以上のシート抵抗を有する、請求項1または2に記載の液晶表示装置。
- 前記金属酸化物はインジウム原子とガリウム原子とを含む、請求項3に記載の液晶表示装置。
- 前記電極構成層は前記画素電極および前記対向電極の一方のみを含み、
前記支持基板と前記電極構成層との間に、前記画素電極および前記対向電極の他方である下部電極をさらに備え、前記下部電極は前記電極構成層の前記絶縁体領域に対向する部分を含む、請求項1から4のいずれか1項に記載の液晶表示装置。 - 前記電極構成層の前記ストライプ領域の前記電極領域は、前記画素電極に含まれる部分と、前記対向電極に含まれる部分とを有し、前記電極領域には前記画素電極および前記対向電極が交互に配置されている、請求項1から4のいずれか1項に記載の液晶表示装置。
- 液晶層を変調するための画素電極および対向電極を有する液晶表示装置の製造方法であって、
支持基板上に一の酸化物材料を堆積することによって電極構成層を形成する工程と、
前記電極構成層上に、パターンを有するマスク層を形成する工程と、
前記マスク層が設けられた前記電極構成層に対して酸化および還元のいずれかの処理を行うことによって、前記電極構成層に、交互に配置された複数の電極領域と複数の絶縁体領域とを有するストライプ領域を形成する工程とを備え、前記電極領域は前記画素電極および前記対向電極の少なくともいずれかに含まれる、
液晶表示装置の製造方法。
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