JP5916287B2 - 基板をコーティングする方法 - Google Patents
基板をコーティングする方法 Download PDFInfo
- Publication number
- JP5916287B2 JP5916287B2 JP2010508632A JP2010508632A JP5916287B2 JP 5916287 B2 JP5916287 B2 JP 5916287B2 JP 2010508632 A JP2010508632 A JP 2010508632A JP 2010508632 A JP2010508632 A JP 2010508632A JP 5916287 B2 JP5916287 B2 JP 5916287B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- coating
- reagent
- plasma
- plasma jet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000576 coating method Methods 0.000 title claims description 95
- 239000011248 coating agent Substances 0.000 title claims description 89
- 239000000758 substrate Substances 0.000 title claims description 84
- 238000000034 method Methods 0.000 title claims description 16
- 239000003153 chemical reaction reagent Substances 0.000 claims description 66
- 238000011144 upstream manufacturing Methods 0.000 claims description 34
- 238000002156 mixing Methods 0.000 claims description 4
- 239000011247 coating layer Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 11
- 230000032258 transport Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000007704 transition Effects 0.000 description 5
- 239000002131 composite material Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 2
- GCSJLQSCSDMKTP-UHFFFAOYSA-N ethenyl(trimethyl)silane Chemical compound C[Si](C)(C)C=C GCSJLQSCSDMKTP-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- JGWUKKFNKOUBPW-UHFFFAOYSA-N 2-ethenyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C=C[SiH]1O[SiH2]O[SiH2]O[SiH2]O1 JGWUKKFNKOUBPW-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- 239000012042 active reagent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000000071 blow moulding Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000003856 thermoforming Methods 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Chemical Vapour Deposition (AREA)
- Nozzles (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Description
本出願は、2007年5月17日出願の仮特許出願第60/938,559号に基づく優先権を主張する。その全文は、参照により本明細書に組み込むものとする。
Claims (5)
- 基板をコーティングする方法であって、
コーティングゾーンを通る経路に沿って基板を移動させるステップと、
前記基板の一方の側に向かって誘導されるプラズマジェットを生成するステップと、
前記プラズマジェットの上流の位置から第1の試薬を前記プラズマジェット内に注入するステップと、
前記プラズマジェットの下流の位置から前記第1の試薬とは異なる第2の試薬を前記プラズマジェット内に注入するステップと、
第1の組のパラメータに従って、前記第1の試薬の流れを調整するステップと、
第1および第2の試薬が前記基板に塗布されて、前記基板上に少なくとも1つのコーティング層を形成するように、第2の組のパラメータに従って、前記第2の試薬の流れを調整するステップと、
を含み、
第1および第2の組のパラメータに従って、前記第1および第2の試薬の流れを調整する前記ステップが、lt>>ttであるように、通過時間(tt)に対する横混合時間(lt)を規定する前記第1および第2の組のパラメータを選択することを含み、それにより前記注入された第1および第2の試薬が、それぞれ前記基板に塗布される前に前記プラズマジェット内に浸透する方法。 - 前記調整するステップが、上流吐出オリフィスおよび下流吐出オリフィスに結合された少なくとも1つの試薬源の動作を制御することを含む、請求項1に記載の方法。
- 主に前記第1の試薬から形成された前記コーティングの第1のサブ層を前記基板上に付着させ、主に前記第2の試薬から形成された前記コーティングの第2のサブ層を前記基板上に付着させるように、前記プラズマジェット内で前記第1の試薬を前記第2の試薬と実質的には混合しないことをさらに含む、請求項1に記載の方法。
- 前記第1の試薬が、前記プラズマジェットの上流部分内の位置から注入される、請求項1に記載の方法。
- 前記第2の試薬が、前記プラズマジェットの下流部分内の位置から注入される、請求項1に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US93855907P | 2007-05-17 | 2007-05-17 | |
US60/938,559 | 2007-05-17 | ||
PCT/US2008/064137 WO2008144658A1 (en) | 2007-05-17 | 2008-05-19 | Apparatus and method for depositing multiple coating materials in a common plasma coating zone |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010527411A JP2010527411A (ja) | 2010-08-12 |
JP5916287B2 true JP5916287B2 (ja) | 2016-05-11 |
Family
ID=39529328
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010508632A Expired - Fee Related JP5916287B2 (ja) | 2007-05-17 | 2008-05-19 | 基板をコーティングする方法 |
Country Status (6)
Country | Link |
---|---|
US (2) | US9790584B2 (ja) |
EP (1) | EP2152931B1 (ja) |
JP (1) | JP5916287B2 (ja) |
KR (2) | KR20100017761A (ja) |
CN (1) | CN101688306B (ja) |
WO (1) | WO2008144658A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7521653B2 (en) * | 2004-08-03 | 2009-04-21 | Exatec Llc | Plasma arc coating system |
US8206794B2 (en) * | 2009-05-04 | 2012-06-26 | The Boeing Company | System and method for applying abrasion-resistant coatings |
JP2011252085A (ja) | 2010-06-02 | 2011-12-15 | Honda Motor Co Ltd | プラズマ成膜方法 |
US8361607B2 (en) | 2011-04-14 | 2013-01-29 | Exatec Llc | Organic resin laminate |
KR101871867B1 (ko) | 2011-04-14 | 2018-06-27 | 엑사테크 엘.엘.씨. | 유기 수지 라미네이트 |
CN103732337B (zh) | 2011-08-26 | 2017-03-08 | 埃克阿泰克有限责任公司 | 有机树脂层压板、制造和使用该有机树脂层压板的方法 |
CN113774363A (zh) * | 2020-06-09 | 2021-12-10 | 江苏菲沃泰纳米科技股份有限公司 | 镀膜设备及其镀膜方法 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE814046A (fr) * | 1974-04-22 | 1974-08-16 | Procede et installation pour l'application en continu d'un revetement metallique sur une tole en bande. | |
FR2590808B1 (fr) * | 1985-12-04 | 1989-09-15 | Canon Kk | Dispositif de soufflage de particules fines |
US5047612A (en) * | 1990-02-05 | 1991-09-10 | General Electric Company | Apparatus and method for controlling powder deposition in a plasma spray process |
FR2674450B1 (fr) * | 1991-03-26 | 1994-01-21 | Agence Spatiale Europeenne | Procede pour deposer un revetement sur un substrat par projection au plasma, et dispositif pour la mise en óoeuvre du procede. |
US5670224A (en) | 1992-11-13 | 1997-09-23 | Energy Conversion Devices, Inc. | Modified silicon oxide barrier coatings produced by microwave CVD deposition on polymeric substrates |
US6070551A (en) * | 1996-05-13 | 2000-06-06 | Applied Materials, Inc. | Deposition chamber and method for depositing low dielectric constant films |
US6110544A (en) * | 1997-06-26 | 2000-08-29 | General Electric Company | Protective coating by high rate arc plasma deposition |
US5993915A (en) * | 1997-08-14 | 1999-11-30 | Adaptive Coating Technologies, Llc | Fusing thermal spray coating and heat treating base material using infrared heating |
JP2000167484A (ja) | 1998-11-30 | 2000-06-20 | Nakashima:Kk | ガラス溶射方法および装置 |
US6793981B2 (en) * | 1999-03-23 | 2004-09-21 | Dai Nippon Printing Co., Ltd. | Process for producing laminated film, and reflection reducing film |
US6259072B1 (en) * | 1999-11-09 | 2001-07-10 | Axcelis Technologies, Inc. | Zone controlled radiant heating system utilizing focused reflector |
KR100436297B1 (ko) * | 2000-03-14 | 2004-06-18 | 주성엔지니어링(주) | 반도체 소자 제조용 플라즈마 스프레이 장치 및 이를이용한 반도체 소자 제조방법 |
US6947802B2 (en) * | 2000-04-10 | 2005-09-20 | Hypertherm, Inc. | Centralized control architecture for a laser materials processing system |
US7223676B2 (en) * | 2002-06-05 | 2007-05-29 | Applied Materials, Inc. | Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer |
US6397776B1 (en) * | 2001-06-11 | 2002-06-04 | General Electric Company | Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators |
US6681716B2 (en) * | 2001-11-27 | 2004-01-27 | General Electric Company | Apparatus and method for depositing large area coatings on non-planar surfaces |
US6948448B2 (en) * | 2001-11-27 | 2005-09-27 | General Electric Company | Apparatus and method for depositing large area coatings on planar surfaces |
US6818864B2 (en) * | 2002-08-09 | 2004-11-16 | Asm America, Inc. | LED heat lamp arrays for CVD heating |
JP2006514161A (ja) | 2003-02-20 | 2006-04-27 | ゼネラル・エレクトリック・カンパニイ | 平坦な表面上に大面積の皮膜を堆積するための装置及び方法 |
EP2261392B1 (en) * | 2004-03-09 | 2018-10-03 | Exatec, LLC. | Expanding thermal plasma deposition system |
US7521653B2 (en) * | 2004-08-03 | 2009-04-21 | Exatec Llc | Plasma arc coating system |
US20060156983A1 (en) * | 2005-01-19 | 2006-07-20 | Surfx Technologies Llc | Low temperature, atmospheric pressure plasma generation and applications |
US7312422B2 (en) * | 2006-03-17 | 2007-12-25 | Momentive Performance Materials Inc. | Semiconductor batch heating assembly |
EP2100485B1 (en) * | 2006-12-28 | 2013-05-29 | Exatec, LLC. | Apparatus and method for plasma arc coating |
JP2011530194A (ja) * | 2008-08-04 | 2011-12-15 | ソラア インコーポレーテッド | 物質および蛍光体を含んだ非分極性あるいは半極性のガリウムを用いた白色灯デバイス |
-
2008
- 2008-05-19 JP JP2010508632A patent/JP5916287B2/ja not_active Expired - Fee Related
- 2008-05-19 KR KR1020097025834A patent/KR20100017761A/ko not_active Application Discontinuation
- 2008-05-19 WO PCT/US2008/064137 patent/WO2008144658A1/en active Application Filing
- 2008-05-19 CN CN2008800226941A patent/CN101688306B/zh not_active Expired - Fee Related
- 2008-05-19 EP EP08755888.8A patent/EP2152931B1/en not_active Not-in-force
- 2008-05-19 KR KR1020157023296A patent/KR101588174B1/ko active IP Right Grant
- 2008-05-19 US US12/123,274 patent/US9790584B2/en active Active
-
2017
- 2017-09-07 US US15/697,826 patent/US20170362696A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
KR20100017761A (ko) | 2010-02-16 |
EP2152931B1 (en) | 2013-08-14 |
EP2152931A1 (en) | 2010-02-17 |
WO2008144658A1 (en) | 2008-11-27 |
KR20150103764A (ko) | 2015-09-11 |
CN101688306B (zh) | 2011-08-17 |
US20170362696A1 (en) | 2017-12-21 |
CN101688306A (zh) | 2010-03-31 |
JP2010527411A (ja) | 2010-08-12 |
KR101588174B1 (ko) | 2016-01-27 |
US9790584B2 (en) | 2017-10-17 |
US20080286492A1 (en) | 2008-11-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20170362696A1 (en) | Apparatus and method for depositing multiple coating materials in a common plasma coating zone | |
JP5357050B2 (ja) | プラズマアークコーティング用装置および方法 | |
US6397776B1 (en) | Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators | |
US7595097B2 (en) | Expanding thermal plasma deposition system | |
US6426125B1 (en) | Multilayer article and method of making by ARC plasma deposition | |
US20100221426A1 (en) | Web Substrate Deposition System | |
WO2006033233A1 (ja) | 透明ガスバリア性フィルム | |
JPH1171681A (ja) | 高速アークプラズマ成膜による保護皮膜 | |
US20120009355A1 (en) | Method and apparatus for stabilizing a coating | |
CN105420683B (zh) | 基于低压等离子化学气相沉积制备纳米多层膜的装置 | |
CN114286875B (zh) | 原子层沉积装置和原子层沉积方法 | |
CN112030139A (zh) | 循环式磊晶沉积*** | |
KR101800755B1 (ko) | 유연성 박막 증착 방법, 및 이를 위한 증착 장치 | |
JP2009191355A (ja) | ガス供給ユニット及び化学気相蒸着装置 | |
US20030159652A1 (en) | Heating injection apparatus for vapor liquid delivery system |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100622 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20120515 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120904 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20121203 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131001 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20131227 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20140826 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20141226 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20150107 |
|
A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20150206 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160125 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20160405 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5916287 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |