JP5879069B2 - プラズマ処理装置の上部電極の製造方法 - Google Patents
プラズマ処理装置の上部電極の製造方法 Download PDFInfo
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- JP5879069B2 JP5879069B2 JP2011176006A JP2011176006A JP5879069B2 JP 5879069 B2 JP5879069 B2 JP 5879069B2 JP 2011176006 A JP2011176006 A JP 2011176006A JP 2011176006 A JP2011176006 A JP 2011176006A JP 5879069 B2 JP5879069 B2 JP 5879069B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000000034 method Methods 0.000 title claims description 7
- 239000011247 coating layer Substances 0.000 claims description 34
- 238000005498 polishing Methods 0.000 claims description 20
- 239000010410 layer Substances 0.000 claims description 15
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 238000005422 blasting Methods 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 2
- 238000005259 measurement Methods 0.000 claims description 2
- 238000005530 etching Methods 0.000 description 23
- 235000011194 food seasoning agent Nutrition 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 7
- 239000002002 slurry Substances 0.000 description 6
- 238000007751 thermal spraying Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000470 constituent Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 239000006061 abrasive grain Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 210000004303 peritoneum Anatomy 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
- B24C1/08—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for polishing surfaces, e.g. smoothing a surface by making use of liquid-borne abrasives
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C11/00—Selection of abrasive materials or additives for abrasive blasts
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45565—Shower nozzles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45568—Porous nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32559—Protection means, e.g. coatings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32605—Removable or replaceable electrodes or electrode systems
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
- H01L21/31116—Etching inorganic layers by chemical means by dry-etching
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49156—Manufacturing circuit on or in base with selective destruction of conductive paths
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49204—Contact or terminal manufacturing
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Description
処理空間Sの圧力:20mT
下部電極への供給電力:0W
上部電極への供給電力:2000W
処理ガス:流量80sccmのC4F6、流量500sccmのCOの混合ガス
伝熱ガス供給部62からのHeガスの圧力:15T
伝熱ガス供給部64からのHeガスの圧力:40T
エッチング時間:120秒
被処理基体Wのサイズ:300mmφ
処理空間Sの圧力:20mT
下部電極への供給電力:200W
上部電極への供給電力:1800W
処理ガス:流量135sccmのCHF3、流量465sccmのCO、流量18sccmのO2の混合ガス
伝熱ガス供給部62からのHeガスの圧力:15T
伝熱ガス供給部64からのHeガスの圧力:40T
エッチング時間:30秒
被処理基体Wのサイズ:300mmφ
Claims (4)
- プラズマ処理装置の上部電極の製造方法であって、
前記プラズマ処理装置は、
プラズマが生成される処理空間を画成する処理容器と、
前記処理空間内に処理ガスを供給するガス供給部と、
前記処理空間の下方に設けられた下部電極と、
前記処理空間の上方に設けられた前記上部電極と、
を備え、
該方法は、
前記上部電極を構成する本体部の前記処理空間側の表面に耐プラズマ性を有する被覆層を形成する工程と、
前記処理空間に露出される前記被覆層の表面を研磨する工程と、
研磨された前記被覆層の前記表面に対してブラスト処理を行う工程と、
を含む、製造方法。 - 前記被覆層はY2O3層である、請求項1に記載の製造方法。
- 研磨する前記工程及びブラスト処理を行う前記工程が適用された前記被覆層の表面は、オリンパス株式会社製レーザ顕微鏡OLS3100の表面積測定モードを利用して測定した表面積として、20000μm2以上30000μm2以下の表面積を有する、請求項1又は2に記載の製造方法。
- 前記ブラスト処理に用いられるセラミック粒子は、SiO 2 、Al 2 O 3 、Y 2 O 3 、又はSiCから構成される、請求項1〜3の何れか一項に記載の製造方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011176006A JP5879069B2 (ja) | 2011-08-11 | 2011-08-11 | プラズマ処理装置の上部電極の製造方法 |
US14/238,039 US20140174662A1 (en) | 2011-08-11 | 2012-08-09 | Plasma processing device |
PCT/JP2012/070357 WO2013022066A1 (ja) | 2011-08-11 | 2012-08-09 | プラズマ処理装置 |
TW101128763A TWI573191B (zh) | 2011-08-11 | 2012-08-09 | 電漿處理裝置的上部電極的製造方法 |
KR1020147002644A KR101906641B1 (ko) | 2011-08-11 | 2012-08-09 | 플라즈마 처리 장치 |
US15/060,384 US10081090B2 (en) | 2011-08-11 | 2016-03-03 | Method of manufacturing an upper electrode of a plasma processing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011176006A JP5879069B2 (ja) | 2011-08-11 | 2011-08-11 | プラズマ処理装置の上部電極の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013041872A JP2013041872A (ja) | 2013-02-28 |
JP5879069B2 true JP5879069B2 (ja) | 2016-03-08 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2011176006A Active JP5879069B2 (ja) | 2011-08-11 | 2011-08-11 | プラズマ処理装置の上部電極の製造方法 |
Country Status (5)
Country | Link |
---|---|
US (2) | US20140174662A1 (ja) |
JP (1) | JP5879069B2 (ja) |
KR (1) | KR101906641B1 (ja) |
TW (1) | TWI573191B (ja) |
WO (1) | WO2013022066A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6714978B2 (ja) * | 2014-07-10 | 2020-07-01 | 東京エレクトロン株式会社 | プラズマ処理装置用の部品、プラズマ処理装置、及びプラズマ処理装置用の部品の製造方法 |
CN105655220B (zh) * | 2014-11-12 | 2018-01-02 | 中微半导体设备(上海)有限公司 | 电感耦合型等离子体处理装置 |
JP7197036B2 (ja) * | 2021-04-21 | 2022-12-27 | Toto株式会社 | 半導体製造装置用部材及び半導体製造装置 |
US11749507B2 (en) | 2021-04-21 | 2023-09-05 | Toto Ltd. | Semiconductor manufacturing apparatus member and semiconductor manufacturing apparatus |
JP7389845B2 (ja) | 2022-04-18 | 2023-11-30 | セメス カンパニー,リミテッド | 基板処理装置 |
Family Cites Families (17)
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JP3228644B2 (ja) * | 1993-11-05 | 2001-11-12 | 東京エレクトロン株式会社 | 真空処理装置用素材及びその製造方法 |
FR2775919B1 (fr) * | 1998-03-13 | 2000-06-02 | Virsol | Procede de traitement "mecano-chimique" d'un materiau |
US6203405B1 (en) * | 1998-06-30 | 2001-03-20 | Idaho Powder Products, Llc | Method for using recycled aluminum oxide ceramics in industrial applications |
US7147749B2 (en) * | 2002-09-30 | 2006-12-12 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
JP4150266B2 (ja) * | 2003-01-27 | 2008-09-17 | 信越化学工業株式会社 | プラズマ処理用シャワープレート及びその製造方法 |
JP4154253B2 (ja) * | 2003-02-10 | 2008-09-24 | 信越化学工業株式会社 | プラズマ処理用シリコンプレート |
US20050098106A1 (en) | 2003-11-12 | 2005-05-12 | Tokyo Electron Limited | Method and apparatus for improved electrode plate |
US20080318505A1 (en) * | 2004-11-29 | 2008-12-25 | Rajeev Bajaj | Chemical mechanical planarization pad and method of use thereof |
US20070113783A1 (en) * | 2005-11-19 | 2007-05-24 | Applied Materials, Inc. | Band shield for substrate processing chamber |
JP4707588B2 (ja) * | 2006-03-16 | 2011-06-22 | 東京エレクトロン株式会社 | プラズマ処理装置及びそれに用いられる電極 |
JP4996868B2 (ja) * | 2006-03-20 | 2012-08-08 | 東京エレクトロン株式会社 | プラズマ処理装置およびプラズマ処理方法 |
JP5003102B2 (ja) | 2006-10-27 | 2012-08-15 | 東京エレクトロン株式会社 | 静電チャックの診断方法、真空処理装置及び記憶媒体 |
JP4864757B2 (ja) | 2007-02-14 | 2012-02-01 | 東京エレクトロン株式会社 | 基板載置台及びその表面処理方法 |
JP2009161846A (ja) * | 2007-12-10 | 2009-07-23 | Densho Engineering Co Ltd | プラズマ処理容器内部材の製造方法 |
JP2009234877A (ja) | 2008-03-28 | 2009-10-15 | Covalent Materials Corp | プラズマ処理装置用部材 |
US8221582B2 (en) * | 2008-07-07 | 2012-07-17 | Lam Research Corporation | Clamped monolithic showerhead electrode |
CN101894725B (zh) * | 2010-07-09 | 2011-12-14 | 清华大学 | 离子源 |
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2011
- 2011-08-11 JP JP2011176006A patent/JP5879069B2/ja active Active
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2012
- 2012-08-09 TW TW101128763A patent/TWI573191B/zh active
- 2012-08-09 KR KR1020147002644A patent/KR101906641B1/ko active IP Right Grant
- 2012-08-09 US US14/238,039 patent/US20140174662A1/en not_active Abandoned
- 2012-08-09 WO PCT/JP2012/070357 patent/WO2013022066A1/ja active Application Filing
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2016
- 2016-03-03 US US15/060,384 patent/US10081090B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20160184966A1 (en) | 2016-06-30 |
US20140174662A1 (en) | 2014-06-26 |
KR101906641B1 (ko) | 2018-10-10 |
TW201314769A (zh) | 2013-04-01 |
KR20140051280A (ko) | 2014-04-30 |
WO2013022066A1 (ja) | 2013-02-14 |
US10081090B2 (en) | 2018-09-25 |
JP2013041872A (ja) | 2013-02-28 |
TWI573191B (zh) | 2017-03-01 |
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