JP5873621B2 - 基材をコーティングするためのプロセスおよび金属合金真空蒸着装置 - Google Patents
基材をコーティングするためのプロセスおよび金属合金真空蒸着装置 Download PDFInfo
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- 229910001092 metal group alloy Inorganic materials 0.000 title claims description 53
- 239000000758 substrate Substances 0.000 title claims description 41
- 238000000576 coating method Methods 0.000 title claims description 39
- 238000000034 method Methods 0.000 title claims description 34
- 239000011248 coating agent Substances 0.000 title claims description 31
- 238000001771 vacuum deposition Methods 0.000 title claims description 14
- 238000001704 evaporation Methods 0.000 claims description 58
- 230000008020 evaporation Effects 0.000 claims description 39
- 229910052751 metal Inorganic materials 0.000 claims description 37
- 239000000203 mixture Substances 0.000 claims description 31
- 239000011777 magnesium Substances 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 27
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 26
- 229910052749 magnesium Inorganic materials 0.000 claims description 26
- 238000000151 deposition Methods 0.000 claims description 23
- 239000011701 zinc Substances 0.000 claims description 17
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 15
- 230000008021 deposition Effects 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 15
- 229910052725 zinc Inorganic materials 0.000 claims description 15
- 229910000831 Steel Inorganic materials 0.000 claims description 11
- 239000010959 steel Substances 0.000 claims description 11
- 230000006698 induction Effects 0.000 claims description 6
- 238000007740 vapor deposition Methods 0.000 claims description 5
- 238000005507 spraying Methods 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 description 13
- 239000000956 alloy Substances 0.000 description 13
- 239000010410 layer Substances 0.000 description 12
- 229910001338 liquidmetal Inorganic materials 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- PGTXKIZLOWULDJ-UHFFFAOYSA-N [Mg].[Zn] Chemical compound [Mg].[Zn] PGTXKIZLOWULDJ-UHFFFAOYSA-N 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 238000001912 gas jet deposition Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910001297 Zn alloy Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 229910018125 Al-Si Inorganic materials 0.000 description 1
- 229910018520 Al—Si Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- 229910003023 Mg-Al Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- KFZAUHNPPZCSCR-UHFFFAOYSA-N iron zinc Chemical compound [Fe].[Zn] KFZAUHNPPZCSCR-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
Description
金属元素が亜鉛およびマグネシウムである、
金属合金層が、鉄−亜鉛金属間相を含まない、
金属合金層が、主にZn2Mg相で構成されている、
所定のマグネシウム含有量が4重量%から20重量%である亜鉛ベースの金属合金層が、所定のマグネシウム含有量が最初30重量%から55重量%のマグネシウムである亜鉛ベースの金属合金の浴を蒸発させることによって基材上に連続的に蒸着され、最初の含有量は蒸着中一定に保たれる、
所定のマグネシウム含有量が4重量%から18重量%である亜鉛ベースの金属合金層が、所定のマグネシウム含有量が最初30重量%から50重量%のマグネシウムである亜鉛ベースの金属合金の浴を蒸発させることによって基材上に連続的に蒸着され、最初の含有量は蒸着中一定に保たれる、
金属元素の蒸発温度が、選択された蒸発圧力において大きくても100℃しか異ならない、
金属合金層が、厚さ0.1から20μmで蒸着される、
基材が金属ストリップ、好ましくは鋼ストリップである、
金属ストリップが、焼付硬化性の鋼で作製されている、
金属合金層が、主にZn2Mg相で構成されている。
音速蒸気ジェットコータと、
上記少なくとも2種の金属元素を所定および一定の比率で含む蒸気を上記コータに供給するための手段と、
上記コータに供給する、上記金属元素を含む金属合金浴を蒸発させるための手段と、
金属合金浴の組成を調節し、時間が経っても一定に保つことを可能にするための手段とをさらに備える。
金属合金浴の組成を調節するための手段が、制御された組成の溶融金属合金を蒸発手段に供給する手段を備える、
蒸発手段が、加熱手段が設けられている蒸発るつぼで構成され、制御された組成の溶融金属合金を上記蒸発るつぼに供給するための上記手段が、金属インゴット供給手段に接続され加熱システムが設けられている再充填式炉を備え、上記再充填式炉が、供給対象の蒸発るつぼに接続されている、
装置が、再充填式炉に蒸発るつぼを接続する再循環パイプの形で、浴を連続的に循環させるための手段をさらに備える、
蒸発るつぼが真空チャンバ内に設置され、再充填式炉が真空チャンバの外に設置される、
再充填式炉と蒸発るつぼとが並べて設置され、金属合金浴の高さよりも下方であるが炉およびるつぼの底部よりも上方に位置する少なくとも1つの開口部によって穿孔されている共通壁を有する、
蒸発るつぼが密閉チャンバ内に設置され、再充填式炉が密閉チャンバの外に設置される。
Claims (9)
- 基材(S)をコーティングするためのプロセスであって、亜鉛およびマグネシウムを含む金属合金層が、一定および所定の相対含有量の前記亜鉛およびマグネシウムを含有する蒸気を用いて、基材(S)に吹き付けるための蒸気ジェットコータ(7、17)を備える真空蒸着装置(1、11)によって音速で前記基材(S)上に連続的に蒸着されるプロセスであって、所定のマグネシウム含有量が4重量%から20重量%である亜鉛ベースの金属合金層が、所定のマグネシウム含有量が最初30重量%から55重量%のマグネシウムである亜鉛ベースの金属合金の浴を蒸発させることによって前記基材(S)上に連続的に蒸着され、前記金属合金の浴は誘導加熱によって過熱されており、前記最初の含有量は蒸着中一定に保たれるプロセス。
- 所定のマグネシウム含有量が4重量%から18重量%である亜鉛ベースの金属合金層が、所定のマグネシウム含有量が最初30重量%から50重量%のマグネシウムである亜鉛ベースの金属合金の浴を蒸発させることによって前記基材上に連続的に蒸着され、前記最初の含有量は蒸着中一定に保たれる、請求項1に記載のプロセス。
- 金属合金層が、厚さ0.1から20μmで蒸着される、請求項1および2のいずれか一項に記載のプロセス。
- 前記基材(S)が金属ストリップである、請求項1から3のいずれか一項に記載のプロセス。
- 前記金属ストリップが鋼ストリップである、請求項4に記載のプロセス。
- 前記金属ストリップが焼付硬化性の鋼で作製されている、請求項4または5に記載のプロセス。
- 少なくとも2種の金属元素を含む金属合金から形成されるコーティングを走行基材(S)上に連続的に蒸着させるための真空蒸着装置(1)であって、真空蒸着チャンバ(2)と、このチャンバ(2)を通して前記基材(S)を走行させるための手段とを備え、前記装置(1)はさらに、音速蒸気ジェットコータ(7)と、前記少なくとも2種の金属元素を所定および一定の比率で含む蒸気を前記コータ(7)に供給するための手段と、前記コータ(7)に供給する前記金属元素を含む金属合金浴を蒸発させるための手段(3)と、金属合金浴の組成を調節し、時間が経っても一定に保つことを可能にするための手段をさらに備え、
前記金属合金浴の組成を調節するための手段が、制御された組成の溶融金属合金を蒸発手段(3)に供給する手段を備え、
前記蒸発手段(3)が誘導加熱手段が設けられている蒸発るつぼ(3)で構成され、制御された組成の溶融金属合金を前記蒸発るつぼ(3)に供給するための前記手段が、金属インゴット供給手段に接続され加熱システムが設けられている再充填式炉(5)を備え、前記再充填式炉(5)が供給対象の蒸発るつぼ(3)に接続されており、
前記再充填式炉(5)に前記蒸発るつぼ(3)を接続する再循環パイプ(6)の形で、浴を連続的に循環させるための手段をさらに含み、
前記蒸発るつぼ(3)が前記真空チャンバ(2)内に設置され、前記再充填式炉(5)が前記真空チャンバ(2)の外に設置されている前記装置(1)。 - 少なくとも2種の金属元素を含む金属合金から形成されるコーティングを走行基材(S)上に連続的に蒸着させるための真空蒸着装置(11)であって、真空蒸着チャンバ(12)と、このチャンバ(12)を通して前記基材(S)を走行させるための手段とを備え、前記装置(11)はさらに、音速蒸気ジェットコータ(17)と、前記少なくとも2種の金属元素を所定および一定の比率で含む蒸気を前記コータ(17)に供給するための手段と、前記コータ(17)に供給する前記金属元素を含む金属合金浴を蒸発させるための手段(13)と、金属合金浴の組成を調節し、時間が経っても一定に保つことを可能にするための手段をさらに備え、
前記金属合金浴の組成を調節するための手段が、制御された組成の溶融金属合金を蒸発手段(13)に供給する手段を備え、
前記蒸発手段(13)が誘導加熱手段が設けられている蒸発るつぼ(13)で構成され、制御された組成の溶融金属合金を前記蒸発るつぼ(13)に供給するための前記手段が、金属インゴット供給手段に接続され加熱システムが設けられている再充填式炉(15)を備え、前記再充填式炉(15)が供給対象の蒸発るつぼ(13)に接続されており、
前記再充填式炉(15)と前記蒸発るつぼ(13)とが並べて設置され、金属合金浴の高さよりも下方であるが前記炉(15)および前記るつぼ(13)の底部よりも上方に位置する少なくとも1つの開口部(19)によって穿孔されている共通壁(16)を有する前記装置(11)。 - 前記蒸発るつぼ(13)が密閉チャンバ(18)内に設置され、前記再充填式炉(15)が前記密閉チャンバ(18)の外に設置される、請求項8に記載の装置(11)。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07290342A EP1972699A1 (fr) | 2007-03-20 | 2007-03-20 | Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique |
EP07290342.0 | 2007-03-20 | ||
PCT/FR2008/000347 WO2008142222A1 (fr) | 2007-03-20 | 2008-03-19 | Procédé de revêtement d'un substrat et installation de dépôt sous vide d'alliage métallique |
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JP2010522272A JP2010522272A (ja) | 2010-07-01 |
JP5873621B2 true JP5873621B2 (ja) | 2016-03-01 |
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JP2009554057A Active JP5873621B2 (ja) | 2007-03-20 | 2008-03-19 | 基材をコーティングするためのプロセスおよび金属合金真空蒸着装置 |
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US (3) | US8481120B2 (ja) |
EP (2) | EP1972699A1 (ja) |
JP (1) | JP5873621B2 (ja) |
KR (1) | KR101453583B1 (ja) |
CN (1) | CN101680080B (ja) |
BR (1) | BRPI0809194B1 (ja) |
CA (1) | CA2681329C (ja) |
ES (1) | ES2599364T3 (ja) |
HU (1) | HUE031482T2 (ja) |
MA (1) | MA31417B1 (ja) |
MX (1) | MX2009009914A (ja) |
PL (1) | PL2129810T3 (ja) |
RU (1) | RU2456372C2 (ja) |
UA (1) | UA99280C2 (ja) |
WO (1) | WO2008142222A1 (ja) |
ZA (1) | ZA200906306B (ja) |
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KR20170018821A (ko) * | 2014-06-11 | 2017-02-20 | 타타 스틸 네덜란드 테크날러지 베.뷔. | 고온 액체용 밸브 |
US11261860B2 (en) * | 2016-05-03 | 2022-03-01 | Tata Steel Nederland Technology B.V. | Method to control the temperature of an electromagnetic pump |
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KR101940885B1 (ko) | 2016-12-26 | 2019-01-21 | 주식회사 포스코 | 점용접성 및 내식성이 우수한 단층 아연합금도금강재 및 그 제조방법 |
EP3561147A4 (en) | 2016-12-26 | 2020-03-25 | Posco | STEEL PLATED WITH ZINC ALLOY WITH EXCELLENT WELDABILITY AND CORROSION RESISTANCE |
WO2019043424A1 (en) * | 2017-08-30 | 2019-03-07 | Arcelormittal | COATED METALLIC SUBSTRATE |
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2007
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2008
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- 2008-03-19 UA UAA200910581A patent/UA99280C2/ru unknown
- 2008-03-19 CN CN2008800135887A patent/CN101680080B/zh active Active
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- 2008-03-19 ES ES08787802.1T patent/ES2599364T3/es active Active
- 2008-03-19 US US12/532,043 patent/US8481120B2/en active Active
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Also Published As
Publication number | Publication date |
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ES2599364T3 (es) | 2017-02-01 |
US8481120B2 (en) | 2013-07-09 |
US20100104752A1 (en) | 2010-04-29 |
CN101680080A (zh) | 2010-03-24 |
MA31417B1 (fr) | 2010-06-01 |
KR101453583B1 (ko) | 2014-11-03 |
HUE031482T2 (en) | 2017-07-28 |
BRPI0809194A2 (pt) | 2014-09-23 |
EP2129810A1 (fr) | 2009-12-09 |
CN101680080B (zh) | 2012-07-11 |
WO2008142222A1 (fr) | 2008-11-27 |
CA2681329A1 (fr) | 2008-11-27 |
RU2456372C2 (ru) | 2012-07-20 |
KR20090122247A (ko) | 2009-11-26 |
RU2009138469A (ru) | 2011-04-27 |
MX2009009914A (es) | 2009-10-20 |
ZA200906306B (en) | 2010-05-26 |
PL2129810T3 (pl) | 2017-08-31 |
US20180112305A1 (en) | 2018-04-26 |
CA2681329C (fr) | 2012-05-22 |
BRPI0809194B1 (pt) | 2018-12-04 |
US20130239890A1 (en) | 2013-09-19 |
EP1972699A1 (fr) | 2008-09-24 |
EP2129810B1 (fr) | 2016-07-20 |
UA99280C2 (ru) | 2012-08-10 |
JP2010522272A (ja) | 2010-07-01 |
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