JP5815948B2 - 歪み補償半導体構造および歪み補償半導体構造を製作する方法 - Google Patents
歪み補償半導体構造および歪み補償半導体構造を製作する方法 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims description 148
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000463 material Substances 0.000 claims description 94
- 239000000758 substrate Substances 0.000 claims description 78
- 150000004767 nitrides Chemical class 0.000 claims description 50
- 230000007704 transition Effects 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 10
- 238000005336 cracking Methods 0.000 claims description 7
- 229910002601 GaN Inorganic materials 0.000 description 25
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 20
- 229910010271 silicon carbide Inorganic materials 0.000 description 19
- 229910002704 AlGaN Inorganic materials 0.000 description 15
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 7
- 229910052594 sapphire Inorganic materials 0.000 description 7
- 239000010980 sapphire Substances 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- 208000012868 Overgrowth Diseases 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- RNQKDQAVIXDKAG-UHFFFAOYSA-N aluminum gallium Chemical compound [Al].[Ga] RNQKDQAVIXDKAG-UHFFFAOYSA-N 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02494—Structure
- H01L21/02496—Layer structure
- H01L21/02505—Layer structure consisting of more than two layers
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02378—Silicon carbide
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02455—Group 13/15 materials
- H01L21/02458—Nitrides
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/0254—Nitrides
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
- H01L29/2003—Nitride compounds
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- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0066—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound
- H01L33/007—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound comprising nitride compounds
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- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
- H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
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Description
Claims (14)
- 第1の面内無歪み格子定数を有する材料を有し、無歪みである基板と、
前記基板上に設けられ、第1の半導体材料を含む第1の層であって、前記第1の半導体材料は、前記基板の前記第1の面内無歪み格子定数とは異なる第2の面内無歪み格子定数を有する第1のIII族窒化物半導体材料を含み、前記第1の層は、面内歪み格子定数によって歪んでいる、前記第1の層と、
前記第1の層上に設けられ、第2の半導体材料を含む第2の層であって、前記第2の層は無歪みであり、前記第2の半導体材料は、前記基板の前記第1の面内無歪み格子定数とは異なると共に、前記第1の層の前記面内歪み格子定数とも異なる第3の面内無歪み格子定数を有する第2のIII族窒化物半導体材料を含む、前記第2の層と、
前記第1の層の前記面内歪み格子定数から、前記第2のIII族窒化物半導体材料の前記第3の面内無歪み格子定数へ移行する前記第1の層と前記第2の層との間に配置された第3のIII族窒化物半導体材料を含む第3の層と、
前記第2の層上に直接設けられ、前記第2の層と格子整合し、第3の半導体材料を含む第4の層であって、前記第3の半導体材料は第4のIII族窒化物半導体材料を含み、デバイス層である第4の層と、
を有することを特徴とする半導体構造。 - 前記第3のIII族窒化物半導体材料が、前記第1のIII族窒化物半導体材料から前記第2のIII族窒化物半導体材料に移行する傾斜半導体材料を含むことを特徴とする請求項1に記載の半導体構造。
- 前記第3のIII族窒化物半導体材料は、前記第1のIII族窒化物半導体材料と同じ組成を有する前記第1の層に隣接する第1の表面と、前記第2のIII族窒化物半導体材料と同じ組成を有する前記第2の層に隣接する第2の表面とを含むことを特徴とする請求項2に記載の半導体構造。
- 前記第1の層の前記面内歪み格子定数と、前記第2のIII族窒化物半導体材料の前記第3の面内無歪み格子定数との差は、1%未満であることを特徴とする請求項1に記載の半導体構造。
- 前記第1の層の前記面内歪み格子定数と、前記第2のIII族窒化物半導体材料の前記第3の面内無歪み格子定数との差は、0.5%未満であることを特徴とする請求項1に記載の半導体構造。
- 前記第1の層の前記面内歪み格子定数と、前記第2のIII族窒化物半導体材料の前記第3の面内無歪み格子定数との差は、0.1%未満であることを特徴とする請求項1に記載の半導体構造。
- 前記第1の層の厚さが、割れが生じる厚さに満たないことを特徴とする請求項1に記載の半導体構造。
- 前記基板と前記第1の層の間にAlNバッファ層をさらに含むことを特徴とする請求項1に記載の半導体構造。
- 前記第1の層が、AlxGa1−xN(0<x<1)を含むことを特徴とする請求項1に記載の半導体構造。
- 前記第2の層が、AlyGa1−yN(0<y<1)を含むことを特徴とする請求項9に記載の半導体構造。
- 半導体構造を製造する方法であって、
基板上に設けられ、第1のIII族窒化物半導体材料を含む第1の層であって、前記基板は、第1の面内無歪み格子定数によって無歪みであり、前記第1のIII族窒化物半導体材料は、前記基板の第1の面内無歪み格子定数とは異なる第2の面内無歪み格子定数を有し、前記第1の層は、前記基板の第1の面内無歪み格子定数とは異なる面内歪み格子定数を有する、前記第1の層を形成するステップと、
前記第1の層上に設けられ、第2のIII族窒化物半導体材料を含む第2の層であって、前記第2の層は無歪みであり、前記第2のIII族窒化物半導体材料は、前記基板の第1の面内歪み格子定数とは異なると共に、前記第1のIII族窒化物半導体材料の前記第2の面内無歪み格子定数とは異なる第3の面内無歪み格子定数を有する第3の面内無歪み格子定数を含む、前記第2の層を形成するステップと、
前記第1の層の前記面内歪み格子定数から、前記第2の層の前記第3の面内無歪み格子定数へ移行する前記第1の層と前記第2の層との間に配置された第3のIII族窒化物半導体材料を含む第3の層を形成するステップと、
前記第2の層上に直接設けられ、前記第2の層と格子整合し、第3の半導体材料を含む第4の層であって、前記第3の半導体材料は第4のIII族窒化物半導体材料を含み、デバイス層である第4の層を形成するステップと、
を備えることを特徴とする方法。 - 前記第3の層を形成するステップは、前記第1のIII族窒化物半導体材料から前記第2のIII族窒化物半導体材料へ移行する前記第3のIII族窒化物半導体材料の傾斜層を形成するステップを含むことを特徴とする請求項11に記載の方法。
- 前記傾斜層を形成するステップは、前記第1のIII族窒化物半導体材料と同じ組成を有する前記第1の層に隣接する第1の表面と、前記第2のIII族窒化物半導体材料と同じ組成を有する前記第2の層に隣接する第2の表面とを含むように前記第3の層を形成するステップを含むことを特徴とする請求項12に記載の半導体構造。
- 前記第1の層がAlxGa1−xN(0<x<1)を含み、前記第2の層がAlyGa1−yN(0<y<1)を含み、前記傾斜半導体層がAlzGa1−zN(xはyと等しくなく、zはxからyへ移行する)を含むことを特徴とする請求項11に記載の方法。
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US10/199,454 US6841001B2 (en) | 2002-07-19 | 2002-07-19 | Strain compensated semiconductor structures and methods of fabricating strain compensated semiconductor structures |
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AU (1) | AU2003282959A1 (ja) |
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Families Citing this family (72)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6265289B1 (en) * | 1998-06-10 | 2001-07-24 | North Carolina State University | Methods of fabricating gallium nitride semiconductor layers by lateral growth from sidewalls into trenches, and gallium nitride semiconductor structures fabricated thereby |
US8829546B2 (en) * | 1999-11-19 | 2014-09-09 | Cree, Inc. | Rare earth doped layer or substrate for light conversion |
US8545629B2 (en) | 2001-12-24 | 2013-10-01 | Crystal Is, Inc. | Method and apparatus for producing large, single-crystals of aluminum nitride |
US20060005763A1 (en) | 2001-12-24 | 2006-01-12 | Crystal Is, Inc. | Method and apparatus for producing large, single-crystals of aluminum nitride |
US7638346B2 (en) | 2001-12-24 | 2009-12-29 | Crystal Is, Inc. | Nitride semiconductor heterostructures and related methods |
US6841001B2 (en) * | 2002-07-19 | 2005-01-11 | Cree, Inc. | Strain compensated semiconductor structures and methods of fabricating strain compensated semiconductor structures |
EP1588416B1 (en) * | 2003-01-07 | 2009-03-25 | S.O.I.Tec Silicon on Insulator Technologies | Recycling of a wafer comprising a multi-layer structure after taking-off a thin layer |
JP4525894B2 (ja) * | 2003-11-21 | 2010-08-18 | サンケン電気株式会社 | 半導体素子形成用板状基体及びこの製造方法及びこれを使用した半導体素子 |
US20050243889A1 (en) * | 2004-04-30 | 2005-11-03 | Honeywell International Inc. | Digital alloy oxidation layers |
FR2872626B1 (fr) * | 2004-07-05 | 2008-05-02 | Commissariat Energie Atomique | Procede pour contraindre un motif mince |
US20060073621A1 (en) * | 2004-10-01 | 2006-04-06 | Palo Alto Research Center Incorporated | Group III-nitride based HEMT device with insulating GaN/AlGaN buffer layer |
US7456443B2 (en) * | 2004-11-23 | 2008-11-25 | Cree, Inc. | Transistors having buried n-type and p-type regions beneath the source region |
US7709859B2 (en) * | 2004-11-23 | 2010-05-04 | Cree, Inc. | Cap layers including aluminum nitride for nitride-based transistors |
US7355215B2 (en) * | 2004-12-06 | 2008-04-08 | Cree, Inc. | Field effect transistors (FETs) having multi-watt output power at millimeter-wave frequencies |
US7161194B2 (en) * | 2004-12-06 | 2007-01-09 | Cree, Inc. | High power density and/or linearity transistors |
US7465967B2 (en) | 2005-03-15 | 2008-12-16 | Cree, Inc. | Group III nitride field effect transistors (FETS) capable of withstanding high temperature reverse bias test conditions |
US7626217B2 (en) * | 2005-04-11 | 2009-12-01 | Cree, Inc. | Composite substrates of conductive and insulating or semi-insulating group III-nitrides for group III-nitride devices |
US8575651B2 (en) * | 2005-04-11 | 2013-11-05 | Cree, Inc. | Devices having thick semi-insulating epitaxial gallium nitride layer |
US7544963B2 (en) * | 2005-04-29 | 2009-06-09 | Cree, Inc. | Binary group III-nitride based high electron mobility transistors |
US7615774B2 (en) * | 2005-04-29 | 2009-11-10 | Cree.Inc. | Aluminum free group III-nitride based high electron mobility transistors |
US7365374B2 (en) * | 2005-05-03 | 2008-04-29 | Nitronex Corporation | Gallium nitride material structures including substrates and methods associated with the same |
US9331192B2 (en) * | 2005-06-29 | 2016-05-03 | Cree, Inc. | Low dislocation density group III nitride layers on silicon carbide substrates and methods of making the same |
US20070018198A1 (en) * | 2005-07-20 | 2007-01-25 | Brandes George R | High electron mobility electronic device structures comprising native substrates and methods for making the same |
JP2009517329A (ja) | 2005-11-28 | 2009-04-30 | クリスタル・イズ,インコーポレイテッド | 低欠陥の大きな窒化アルミニウム結晶及びそれを製造する方法 |
US7641735B2 (en) | 2005-12-02 | 2010-01-05 | Crystal Is, Inc. | Doped aluminum nitride crystals and methods of making them |
US7592211B2 (en) * | 2006-01-17 | 2009-09-22 | Cree, Inc. | Methods of fabricating transistors including supported gate electrodes |
US7709269B2 (en) | 2006-01-17 | 2010-05-04 | Cree, Inc. | Methods of fabricating transistors including dielectrically-supported gate electrodes |
US7566918B2 (en) * | 2006-02-23 | 2009-07-28 | Cree, Inc. | Nitride based transistors for millimeter wave operation |
US7388236B2 (en) * | 2006-03-29 | 2008-06-17 | Cree, Inc. | High efficiency and/or high power density wide bandgap transistors |
JP5479888B2 (ja) | 2006-03-30 | 2014-04-23 | クリスタル アイエス インコーポレイテッド | 窒化アルミニウムバルク結晶を制御可能にドーピングする方法 |
US9034103B2 (en) | 2006-03-30 | 2015-05-19 | Crystal Is, Inc. | Aluminum nitride bulk crystals having high transparency to ultraviolet light and methods of forming them |
US7646024B2 (en) * | 2006-08-18 | 2010-01-12 | Cree, Inc. | Structure and method for reducing forward voltage across a silicon carbide-group III nitride interface |
US7692263B2 (en) | 2006-11-21 | 2010-04-06 | Cree, Inc. | High voltage GaN transistors |
US8323406B2 (en) | 2007-01-17 | 2012-12-04 | Crystal Is, Inc. | Defect reduction in seeded aluminum nitride crystal growth |
US9771666B2 (en) | 2007-01-17 | 2017-09-26 | Crystal Is, Inc. | Defect reduction in seeded aluminum nitride crystal growth |
US20080173895A1 (en) * | 2007-01-24 | 2008-07-24 | Sharp Laboratories Of America, Inc. | Gallium nitride on silicon with a thermal expansion transition buffer layer |
US8080833B2 (en) | 2007-01-26 | 2011-12-20 | Crystal Is, Inc. | Thick pseudomorphic nitride epitaxial layers |
US9437430B2 (en) | 2007-01-26 | 2016-09-06 | Crystal Is, Inc. | Thick pseudomorphic nitride epitaxial layers |
US8362503B2 (en) | 2007-03-09 | 2013-01-29 | Cree, Inc. | Thick nitride semiconductor structures with interlayer structures |
US7825432B2 (en) * | 2007-03-09 | 2010-11-02 | Cree, Inc. | Nitride semiconductor structures with interlayer structures |
US8088220B2 (en) * | 2007-05-24 | 2012-01-03 | Crystal Is, Inc. | Deep-eutectic melt growth of nitride crystals |
US20080296625A1 (en) * | 2007-06-04 | 2008-12-04 | Sharp Laboratories Of America Inc. | Gallium nitride-on-silicon multilayered interface |
US7923098B2 (en) * | 2008-01-02 | 2011-04-12 | The Board Of Regents Of The University Of Oklahoma | Low-defect-density crystalline structure and method for making same |
JP5567569B2 (ja) | 2008-08-27 | 2014-08-06 | ソイテック | 選択した格子定数または制御した格子定数を有する半導体材料の層を使用する半導体構造または半導体デバイスを製造する方法 |
US20100187568A1 (en) * | 2009-01-28 | 2010-07-29 | S.O.I.Tec Silicon On Insulator Technologies, S.A. | Epitaxial methods and structures for forming semiconductor materials |
CN102484142A (zh) | 2009-08-21 | 2012-05-30 | 加利福尼亚大学董事会 | 通过具有错配位错的部分或完全驰豫氮化铝铟镓层的半极性氮化物量子阱中的各向异性应变控制 |
US8575660B2 (en) * | 2009-10-14 | 2013-11-05 | International Rectifier Corporation | Group III-V semiconductor device with strain-relieving interlayers |
JP6028280B2 (ja) * | 2009-11-18 | 2016-11-16 | ソイテックSoitec | 半導体構造又は半導体素子を製造する方法 |
US8785305B2 (en) * | 2009-12-11 | 2014-07-22 | National Semiconductor Corporation | Backside stress compensation for gallium nitride or other nitride-based semiconductor devices |
CN105951177B (zh) | 2010-06-30 | 2018-11-02 | 晶体公司 | 使用热梯度控制的大块氮化铝单晶的生长 |
WO2012058584A1 (en) * | 2010-10-29 | 2012-05-03 | The Regents Of The University Of California | Strain compensated short-period superlattices on semipolar or nonpolar gan for defect reduction and stress engineering |
JP5781292B2 (ja) | 2010-11-16 | 2015-09-16 | ローム株式会社 | 窒化物半導体素子および窒化物半導体パッケージ |
US9082948B2 (en) | 2011-02-03 | 2015-07-14 | Soitec | Methods of fabricating semiconductor structures using thermal spray processes, and semiconductor structures fabricated using such methods |
US8436363B2 (en) | 2011-02-03 | 2013-05-07 | Soitec | Metallic carrier for layer transfer and methods for forming the same |
US9142412B2 (en) | 2011-02-03 | 2015-09-22 | Soitec | Semiconductor devices including substrate layers and overlying semiconductor layers having closely matching coefficients of thermal expansion, and related methods |
US9105469B2 (en) | 2011-06-30 | 2015-08-11 | Piquant Research Llc | Defect mitigation structures for semiconductor devices |
US8962359B2 (en) | 2011-07-19 | 2015-02-24 | Crystal Is, Inc. | Photon extraction from nitride ultraviolet light-emitting devices |
US8916906B2 (en) * | 2011-07-29 | 2014-12-23 | Kabushiki Kaisha Toshiba | Boron-containing buffer layer for growing gallium nitride on silicon |
JP5127978B1 (ja) * | 2011-09-08 | 2013-01-23 | 株式会社東芝 | 窒化物半導体素子、窒化物半導体ウェーハ及び窒化物半導体層の製造方法 |
US20130140525A1 (en) * | 2011-12-01 | 2013-06-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Gallium nitride growth method on silicon substrate |
JP2014022685A (ja) * | 2012-07-23 | 2014-02-03 | Nagoya Institute Of Technology | 半導体積層構造およびこれを用いた半導体素子 |
US8872225B2 (en) * | 2012-12-20 | 2014-10-28 | Intel Corporation | Defect transferred and lattice mismatched epitaxial film |
KR101464854B1 (ko) | 2013-01-14 | 2014-11-25 | 주식회사 엘지실트론 | 반도체 기판 |
EP3154092B1 (en) * | 2013-02-15 | 2021-12-15 | AZUR SPACE Solar Power GmbH | P-doping of group iii-nitride buffer layer structure on a heterosubstrate |
WO2014151264A1 (en) | 2013-03-15 | 2014-09-25 | Crystal Is, Inc. | Planar contacts to pseudomorphic electronic and optoelectronic devices |
DE102013112785B3 (de) * | 2013-11-19 | 2015-02-26 | Aixatech Gmbh | Verfahren zur Herstellung eines Verbundkörpers mit zumindest einer funktionellen Schicht oder zur weiteren Herstellung elektronischer oder opto-elektronischer Bauelemente |
KR101626393B1 (ko) * | 2013-12-31 | 2016-06-01 | (재)한국나노기술원 | 스트레인 보상층을 포함한 기판 재활용 구조, 구조 생성 방법 및 소자 제작 방법 |
US10340353B2 (en) * | 2014-08-01 | 2019-07-02 | The United States Of America, As Represented By The Secretary Of The Navy | Epitaxial metallic transition metal nitride layers for compound semiconductor devices |
US9752224B2 (en) * | 2015-08-05 | 2017-09-05 | Applied Materials, Inc. | Structure for relaxed SiGe buffers including method and apparatus for forming |
CN108140695B (zh) | 2015-09-17 | 2021-02-09 | 晶体公司 | 包含二维空穴气体的紫外发光器件 |
RU169283U1 (ru) * | 2016-11-15 | 2017-03-14 | Федеральное государственное бюджетное учреждение науки Научно-технологический центр микроэлектроники и субмикронных гетероструктур Российской академии наук | ГЕТЕРОСТРУКТУРНЫЙ ПОЛЕВОЙ ТРАНЗИСТОР InGaAIN/SiC |
US10741387B1 (en) | 2019-02-07 | 2020-08-11 | International Business Machines Corporation | High percentage silicon germanium graded buffer layers with lattice matched Ga(As1-yPy) interlayers |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5192987A (en) | 1991-05-17 | 1993-03-09 | Apa Optics, Inc. | High electron mobility transistor with GaN/Alx Ga1-x N heterojunctions |
US5393993A (en) | 1993-12-13 | 1995-02-28 | Cree Research, Inc. | Buffer structure between silicon carbide and gallium nitride and resulting semiconductor devices |
US5523589A (en) * | 1994-09-20 | 1996-06-04 | Cree Research, Inc. | Vertical geometry light emitting diode with group III nitride active layer and extended lifetime |
US5592501A (en) | 1994-09-20 | 1997-01-07 | Cree Research, Inc. | Low-strain laser structures with group III nitride active layers |
US5670798A (en) * | 1995-03-29 | 1997-09-23 | North Carolina State University | Integrated heterostructures of Group III-V nitride semiconductor materials including epitaxial ohmic contact non-nitride buffer layer and methods of fabricating same |
JP3604205B2 (ja) * | 1995-09-18 | 2004-12-22 | 日亜化学工業株式会社 | 窒化物半導体の成長方法 |
US5874747A (en) | 1996-02-05 | 1999-02-23 | Advanced Technology Materials, Inc. | High brightness electroluminescent device emitting in the green to ultraviolet spectrum and method of making the same |
JP3713118B2 (ja) | 1997-03-04 | 2005-11-02 | ローム株式会社 | 半導体発光素子の製法 |
US5877519A (en) | 1997-03-26 | 1999-03-02 | Picolight Incoporated | Extended wavelength opto-electronic devices |
JPH10335637A (ja) | 1997-05-30 | 1998-12-18 | Sony Corp | ヘテロ接合電界効果トランジスタ |
US6165874A (en) * | 1997-07-03 | 2000-12-26 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method for growth of crystal surfaces and growth of heteroepitaxial single crystal films thereon |
GB2327145A (en) * | 1997-07-10 | 1999-01-13 | Sharp Kk | Graded layers in an optoelectronic semiconductor device |
JP3930161B2 (ja) * | 1997-08-29 | 2007-06-13 | 株式会社東芝 | 窒化物系半導体素子、発光素子及びその製造方法 |
JP3036495B2 (ja) * | 1997-11-07 | 2000-04-24 | 豊田合成株式会社 | 窒化ガリウム系化合物半導体の製造方法 |
JP3372470B2 (ja) | 1998-01-20 | 2003-02-04 | シャープ株式会社 | 窒化物系iii−v族化合物半導体装置 |
US6194742B1 (en) | 1998-06-05 | 2001-02-27 | Lumileds Lighting, U.S., Llc | Strain engineered and impurity controlled III-V nitride semiconductor films and optoelectronic devices |
US6316793B1 (en) | 1998-06-12 | 2001-11-13 | Cree, Inc. | Nitride based transistors on semi-insulating silicon carbide substrates |
JP3758390B2 (ja) * | 1998-12-14 | 2006-03-22 | パイオニア株式会社 | 窒化物半導体発光素子及びその製造方法 |
JP3209270B2 (ja) * | 1999-01-29 | 2001-09-17 | 日本電気株式会社 | ヘテロ接合電界効果トランジスタ |
JP3786544B2 (ja) * | 1999-06-10 | 2006-06-14 | パイオニア株式会社 | 窒化物半導体素子の製造方法及びかかる方法により製造された素子 |
US6639255B2 (en) | 1999-12-08 | 2003-10-28 | Matsushita Electric Industrial Co., Ltd. | GaN-based HFET having a surface-leakage reducing cap layer |
JP3393602B2 (ja) | 2000-01-13 | 2003-04-07 | 松下電器産業株式会社 | 半導体装置 |
US6586781B2 (en) | 2000-02-04 | 2003-07-01 | Cree Lighting Company | Group III nitride based FETs and HEMTs with reduced trapping and method for producing the same |
US6746777B1 (en) * | 2000-05-31 | 2004-06-08 | Applied Optoelectronics, Inc. | Alternative substrates for epitaxial growth |
US6515316B1 (en) * | 2000-07-14 | 2003-02-04 | Trw Inc. | Partially relaxed channel HEMT device |
JP5095064B2 (ja) * | 2000-08-04 | 2012-12-12 | ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア | シリコン基板上に堆積された窒化物層を有する半導体フィルムおよびその製造方法 |
US6649287B2 (en) | 2000-12-14 | 2003-11-18 | Nitronex Corporation | Gallium nitride materials and methods |
US6777253B2 (en) * | 2000-12-20 | 2004-08-17 | Matsushita Electric Industrial Co., Ltd. | Method for fabricating semiconductor, method for fabricating semiconductor substrate, and semiconductor light emitting device |
JP3515974B2 (ja) * | 2001-06-13 | 2004-04-05 | 松下電器産業株式会社 | 窒化物半導体、その製造方法及び窒化物半導体素子 |
US6697413B2 (en) * | 2001-10-31 | 2004-02-24 | Applied Optoelectronics, Inc. | Tunable vertical-cavity surface-emitting laser with tuning junction |
US7030428B2 (en) * | 2001-12-03 | 2006-04-18 | Cree, Inc. | Strain balanced nitride heterojunction transistors |
US6841001B2 (en) * | 2002-07-19 | 2005-01-11 | Cree, Inc. | Strain compensated semiconductor structures and methods of fabricating strain compensated semiconductor structures |
-
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US20040012015A1 (en) | 2004-01-22 |
EP1523766A1 (en) | 2005-04-20 |
TW200402108A (en) | 2004-02-01 |
TWI271804B (en) | 2007-01-21 |
US7271416B2 (en) | 2007-09-18 |
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US20040206978A1 (en) | 2004-10-21 |
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