JP5797282B2 - ターゲット装置及び方法 - Google Patents
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- G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
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Description
Claims (16)
- ターゲット座標系を従えると共に第1再帰反射器及び球体を備え、球体中心及び球体半径で規定される外側球状部分がその球体に備わり、第1再帰反射器を保持可能な大きさの空洞がその球体内にあり、その空洞が球体外に向け開いており、第1再帰反射器がその空洞内に少なくとも部分的に収まっており、且つ第1再帰反射器がターゲット座標系における第1再帰反射器側基準点を提供するターゲットを、準備するターゲット準備ステップと、
第1光源を備え、自装置から見た第1再帰反射器側基準点の距離及び二通りの見込み角を計測可能で、且つ装置座標系を従える計測装置を準備する計測装置準備ステップと、
第1再帰反射器側基準点から球体中心へと延びる非ゼロ長のずれベクトルに関し一通り又は複数通りのずれベクトル長成分をターゲット座標系に従い導出するずれベクトル長成分導出ステップと、
第1光源からの光で第1再帰反射器を照らすことで計測装置に戻る第1反射光を発生させる第1再帰反射器照光ステップと、
計測装置から見た第1再帰反射器側基準点の距離たる第1距離及び二通りの見込み角たる第1見込み角ペアを、第1反射光に全面的又は部分的に基づき計測するステップであって、前記第1距離を、同装置から第1再帰反射器側基準点に至る光路上での光の伝搬速度に基づいて計測するステップと、
装置座標系におけるターゲット座標系の姿勢を全面的に画定できるよう装置座標系におけるターゲット座標系の姿勢自由度三通りを画定する姿勢自由度画定ステップと、
これらずれベクトル長成分、第1距離、第1見込み角ペア及び姿勢自由度画定結果に全面的又は部分的に基づき装置座標系における球体中心の三次元座標を算出する球体中心座標算出ステップと、
算出した三次元座標を保存するステップと、
を有し、
上記ターゲット準備ステップにて採用される第1再帰反射器が、平坦反射面同士が共通の頂点にて当接するよう、且つ平坦反射面毎に2個、合計で3個生じる稜線部が隣接平坦反射面間で共有されるよう、光反射性を有する平坦反射面3個を互いに垂直に、且つある対称軸を基準に配置した構成を有するキューブコーナを備え、
上記ずれベクトル長成分導出ステップにてそのキューブコーナの頂点を上記第1再帰反射器側基準点とする方法。 - 請求項1記載の方法であって、
上記装置座標系内で実行される上記球体中心座標算出ステップにて、上記ターゲットに熱接触中の温度センサによる温度計測値を利用する方法。 - ターゲットを計測装置で計測する方法であって、
ターゲット座標系を従えると共に第1再帰反射器及び球体を備え、球体中心及び球体半径で規定される外側球状部分がその球体に備わり、第1再帰反射器を保持可能な大きさの空洞がその球体内にあり、その空洞が球体外に向け開いており、第1再帰反射器がその空洞内に少なくとも部分的に収まっており、且つ第1再帰反射器がターゲット座標系における第1再帰反射器側基準点を提供するターゲットを、準備するターゲット準備ステップと、
第1光源を備え、自装置から見た第1再帰反射器側基準点の距離及び二通りの見込み角を計測可能で、且つ装置座標系を従える計測装置を準備する計測装置準備ステップと、
第1再帰反射器側基準点から球体中心へと延びる非ゼロ長のずれベクトルに関し一通り又は複数通りのずれベクトル長成分をターゲット座標系に従い導出するずれベクトル長成分導出ステップと、
第1光源からの光で第1再帰反射器を照らすことで計測装置に戻る第1反射光を発生させる第1再帰反射器照光ステップと、
計測装置から見た第1再帰反射器側基準点の距離たる第1距離及び二通りの見込み角たる第1見込み角ペアを、第1反射光に全面的又は部分的に基づき計測するステップであって、前記第1距離を、同装置から第1再帰反射器側基準点に至る光路上での光の伝搬速度に基づいて計測するステップと、
装置座標系におけるターゲット座標系の姿勢を全面的に画定できるよう装置座標系におけるターゲット座標系の姿勢自由度三通りを画定する姿勢自由度画定ステップと、
これらずれベクトル長成分、第1距離、第1見込み角ペア及び姿勢自由度画定結果に全面的又は部分的に基づき装置座標系における球体中心の三次元座標を算出する球体中心座標算出ステップと、
算出した三次元座標を保存するステップと、
を有し、
上記計測装置準備ステップにて、第1感光アレイ及び第1レンズ系を有する第1カメラを備えた計測装置を準備し、
上記姿勢自由度画定ステップにて、上記第1反射光によってもたらされる第1線像パターンを第1感光アレイで捉え、第1感光アレイで捉えた第1線像パターンのディジタル表現を生成し、当該第1線像パターンのディジタル表現に全面的又は部分的に基づき上記装置座標系における上記ターゲット座標系の姿勢自由度三通りを画定し、
上記ターゲット準備ステップにて採用される第1再帰反射器が、平坦反射面同士が共通の頂点にて当接するよう、且つ平坦反射面毎に2個、合計で3個生じる稜線部が隣接平坦反射面間で共有されるよう、光反射性を有する平坦反射面3個を互いに垂直に、且つある対称軸を基準に配置した構成を有するキューブコーナを備え、
上記ずれベクトル長成分導出ステップにてそのキューブコーナの頂点を上記第1再帰反射器側基準点とする方法。 - 請求項3記載の方法であって、上記ターゲット準備ステップにて採用される第1再帰反射器が1個又は複数個の非反射マークを有する方法。
- 請求項3記載の方法であって、
上記ターゲット準備ステップにて採用される第1再帰反射器が、3個ある上記稜線部毎に非反射部分を有し、
上記姿勢自由度画定ステップにて、上記第1反射光によってもたらされる第1線像パターンを上記第1感光アレイで捉える際、それら非反射部分によってもたらされる複数本の線像を捉える方法。 - 請求項5記載の方法であって、上記姿勢自由度画定ステップにて、上記複数本の線像それぞれの傾斜を算出し、算出した傾斜に全面的又は部分的に基づき上記三通りの姿勢自由度を画定する方法。
- 請求項6記載の方法であって、
上記ターゲット準備ステップにて準備されるターゲットの平坦反射面が、その上面が上記頂点から離隔した位置を占めるよう配置されたガラスプリズムの表面であり、
上記球体中心座標算出ステップにおける算出を、そのガラスプリズムの屈折率、上記ターゲット座標系にてプリズム上面に直交する法線ベクトル、キューブコーナ型再帰反射器の頂点から対称軸・プリズム上面間の交点までの距離に等しいガラスプリズム厚、並びに上記ずれベクトル長成分のうち上記対称軸に沿う縦ずれ長成分に全面的又は部分的に基づき実行する方法。 - 請求項7記載の方法であって、
上記ずれベクトル長成分導出ステップにて、上記ずれベクトル長成分のうち上記対称軸に対し直交する平面に沿う二通りの横ずれ長成分を導出し、
上記球体中心座標算出ステップにて、上記球体中心の三次元座標をそれら横ずれ長成分に全面的又は部分的に基づき算出する方法。 - 請求項3記載の方法であって、
上記ターゲット準備ステップにて基準部材を準備し、
上記姿勢自由度画定ステップにて、上記装置座標系における上記ターゲット座標系の大まかな姿勢をその基準部材を使用し画定する方法。 - 請求項9記載の方法であって、
上記ターゲット準備ステップにて準備される基準部材が、上記ターゲット座標系における基準姿勢に沿い上記ターゲット上に配された基準マークであり、
上記姿勢自由度画定ステップにて、その基準姿勢に全面的又は部分的に基づき上記大まかな姿勢を画定する方法。 - 請求項9記載の方法であって、
上記ターゲット準備ステップにて準備される基準部材が反射素材を有し、
上記計測装置準備ステップにて、第2感光アレイ、第2レンズ系、第2光源及び第3光源を備え、第3光源に比べ第2光源の方が第2レンズ系に近い位置にあり、且つ上記第1再帰反射器及びその反射素材領域への入射光が第2光源からの光であるなら第1再帰反射器での反射光による部分、第3光源からの光であるなら反射素材領域での反射光による部分が第2感光アレイ側での総受光パワーにて卓越するよう第2及び第3光源が構成された第2カメラを準備し、
上記第1再帰反射器照光ステップにて、第2光源からの光で基準部材を照らし第2感光アレイで第2線像パターンを捉える一方、第3光源からの光で反射素材領域を照らし第2感光アレイで第3線像パターンを捉え、
上記姿勢自由度画定ステップにて、上記装置座標系における上記ターゲット座標系の大まかな姿勢を第2及び第3線像パターンに全面的又は部分的に基づき画定する方法。 - 請求項9記載の方法であって、
上記計測装置準備ステップにて、第2感光アレイ、第2レンズ系及び第2光源を備える第2カメラを準備し、
上記ターゲット準備ステップにて準備される基準部材が基準再帰反射器を有し、
上記第1再帰反射器照光ステップにて、第2光源からの光で基準再帰反射器及び上記第1再帰反射器を同時に照らし第2感光アレイで第2線像パターンを捉え、
上記姿勢自由度画定ステップにて、上記装置座標系における上記ターゲット座標系の大まかな姿勢を第2線像パターンに全面的又は部分的に基づき画定する方法。 - 請求項9記載の方法であって、
上記ターゲット準備ステップにて準備される基準部材が第2再帰反射器を有し、
上記第1光源からの光をステアするビームステアリング機構を準備し、
第1光源からの光を第2再帰反射器方向にステアして二通りの見込み角からなる第2見込み角ペアを計測し、
上記第1見込み角ペア及び第2見込み角ペアに全面的又は部分的に基づく算出で上記大まかな姿勢を画定する方法。 - 請求項9記載の方法であって、
上記ターゲット準備ステップにて準備される基準部材がターゲット光源を有し、
上記計測装置準備ステップにて、第2感光アレイ、第2レンズ系及び第2光源を備える第2カメラを準備し、
上記第1再帰反射器照光ステップにて、第2光源からの光で上記第1再帰反射器を照らし第2感光アレイで第2線像パターンを捉える一方、ターゲット光源を点灯させ第2感光アレイで第3線像パターンを捉え、
上記姿勢自由度画定ステップにて、上記装置座標系における上記ターゲット座標系の大まかな姿勢を第2及び第3線像パターンに全面的又は部分的に基づき画定する方法。 - ターゲットの特性を計測装置で求める方法であって、
ターゲット座標系を従えると共に第1再帰反射器及び体部を備え、第1再帰反射器を保持可能な大きさの空洞がその体部内にあり、その空洞が体部外に向け開いており、第1再帰反射器がその空洞内に少なくとも部分的に収まっており、且つ第1再帰反射器がターゲット座標系における第1再帰反射器側基準点を提供するターゲットを、準備するターゲット準備ステップと、
体部に対し堅固に固定された球状湾曲部位を有し且つ球体中心及び球体半径で規定される球状接触要素を準備するステップと、
第1光源を備え、自装置から見た第1再帰反射器側基準点の距離及び二通りの見込み角を計測可能で、且つ装置座標系を従える計測装置を準備するステップと、
球体半径を示す情報又は球状半径を得るためにプロセッサによるアクセスされるシリアルナンバーを含む第1情報を保持可能で、且つバーコードパターン又は無線周波数識別タグの形態をとる識別要素を、その体部上に配するステップと、
表面を有するワークピースを準備するステップと、
球状接触要素をワークピースの表面に接触させるステップと、
第1光源からの光で第1再帰反射器を照らし計測装置に戻る第1反射光を発生させるステップと、
計測装置から見た第1再帰反射器側基準点の距離たる第1距離及び二通りの見込み角たる第1見込み角ペアを、第1反射光に全面的又は部分的に基づき計測するステップであって、前記第1距離を、同装置から第1再帰反射器側基準点に至る光路上での光の伝搬速度に基づいて計測するステップと、
バーコードスキャナ、無線周波数識別タグリーダ又はカメラの形態をとり計測装置に装着されている第1リーダで第1情報を読み取るステップと、
これら第1距離、第1見込み角ペアに全面的又は部分的に基づきワークピースの表面上にある点の三次元座標を算出するステップと、
を有する方法。 - 請求項15記載の方法であって、上記ターゲット準備ステップにおける体部の中心及び半径が球状接触要素の球体中心及び球体半径と同一な方法。
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CN103403575B (zh) | 2015-09-16 |
GB2518543A (en) | 2015-03-25 |
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GB201421763D0 (en) | 2015-01-21 |
GB201421764D0 (en) | 2015-01-21 |
US8593648B2 (en) | 2013-11-26 |
US20130202010A1 (en) | 2013-08-08 |
GB2511236B (en) | 2015-01-28 |
JP2014511493A (ja) | 2014-05-15 |
DE112012001082T5 (de) | 2014-07-03 |
GB201421783D0 (en) | 2015-01-21 |
US8467072B2 (en) | 2013-06-18 |
GB2503390B (en) | 2014-10-29 |
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