JP5718810B2 - セラミック膜の堆積方法 - Google Patents
セラミック膜の堆積方法 Download PDFInfo
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- JP5718810B2 JP5718810B2 JP2011513041A JP2011513041A JP5718810B2 JP 5718810 B2 JP5718810 B2 JP 5718810B2 JP 2011513041 A JP2011513041 A JP 2011513041A JP 2011513041 A JP2011513041 A JP 2011513041A JP 5718810 B2 JP5718810 B2 JP 5718810B2
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- metal oxide
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- 238000000151 deposition Methods 0.000 title claims description 61
- 239000000919 ceramic Substances 0.000 title claims description 15
- 229910044991 metal oxide Inorganic materials 0.000 claims description 152
- 150000004706 metal oxides Chemical class 0.000 claims description 152
- 238000000034 method Methods 0.000 claims description 118
- 239000011222 crystalline ceramic Substances 0.000 claims description 106
- 229910002106 crystalline ceramic Inorganic materials 0.000 claims description 106
- 239000003792 electrolyte Substances 0.000 claims description 99
- 239000002243 precursor Substances 0.000 claims description 87
- 150000003839 salts Chemical class 0.000 claims description 84
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- 229910002076 stabilized zirconia Inorganic materials 0.000 claims description 46
- 241000968352 Scandia <hydrozoan> Species 0.000 claims description 43
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- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 38
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 34
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 34
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- DFCYEXJMCFQPPA-UHFFFAOYSA-N scandium(3+);trinitrate Chemical compound [Sc+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O DFCYEXJMCFQPPA-UHFFFAOYSA-N 0.000 claims description 7
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- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 6
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- PYPNFSVOZBISQN-LNTINUHCSA-K cerium acetylacetonate Chemical compound [Ce+3].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O PYPNFSVOZBISQN-LNTINUHCSA-K 0.000 claims description 6
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- YOBOXHGSEJBUPB-MTOQALJVSA-N (z)-4-hydroxypent-3-en-2-one;zirconium Chemical compound [Zr].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O YOBOXHGSEJBUPB-MTOQALJVSA-N 0.000 claims description 5
- LHENQXAPVKABON-UHFFFAOYSA-N 1-methoxypropan-1-ol Chemical compound CCC(O)OC LHENQXAPVKABON-UHFFFAOYSA-N 0.000 claims description 4
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- FKTOIHSPIPYAPE-UHFFFAOYSA-N samarium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Sm+3].[Sm+3] FKTOIHSPIPYAPE-UHFFFAOYSA-N 0.000 claims description 4
- 229910052772 Samarium Inorganic materials 0.000 claims description 3
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims description 3
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- 238000004528 spin coating Methods 0.000 claims description 3
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 claims description 2
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- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 2
- 229910010293 ceramic material Inorganic materials 0.000 claims 7
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 2
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- 239000010410 layer Substances 0.000 description 393
- 239000000446 fuel Substances 0.000 description 85
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- CMIHHWBVHJVIGI-UHFFFAOYSA-N gadolinium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Gd+3].[Gd+3] CMIHHWBVHJVIGI-UHFFFAOYSA-N 0.000 description 4
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- 239000002202 Polyethylene glycol Substances 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
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- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 2
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- 229910000859 α-Fe Inorganic materials 0.000 description 2
- FFQALBCXGPYQGT-UHFFFAOYSA-N 2,4-difluoro-5-(trifluoromethyl)aniline Chemical compound NC1=CC(C(F)(F)F)=C(F)C=C1F FFQALBCXGPYQGT-UHFFFAOYSA-N 0.000 description 1
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- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/4505—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application
- C04B41/4535—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied as a solution, emulsion, dispersion or suspension
- C04B41/4537—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied as a solution, emulsion, dispersion or suspension by the sol-gel process
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
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- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/87—Ceramics
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
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- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
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Description
・高性能カソード材料は、ジルコニアと反応してイオン伝導体の質が非常に悪いジルコン酸ストロンチウムまたはランタンを形成し、性能を劣化させる。
・LSGMは、通常アノードに含まれる酸化ニッケルと反応する。
・ドープセリアは、燃料雰囲気にさらすと部分還元し、混合イオン/電子伝導性を発現させ得る。これはひいては電池の内部短絡を発生させ、作動効率を低下させる。
・ドープセリアおよびジルコニアは、1200℃を超える温度で処理すると反応し、伝導性の悪い混合相を生成し得る。
・ジルコン酸塩の生成を回避し、カソードの触媒活性を向上させるため、ジルコニア主電解質層とコバルタイトカソードとの間に堆積させるドープセリアの中間層。
・アノードに含まれる酸化ニッケルとの反応を回避するため、LSGM主電解質とアノードとの間に堆積させるドープセリアの中間層。
(i)金属酸化物結晶性セラミックの可溶性塩前駆体の溶液を該基板の該表面上に堆積させ、該可溶性塩前駆体の該溶液の層を該表面上に画定する工程であって、該表面が金属表面およびセラミック表面からなる群から選択させる工程と、
(ii)該可溶性塩前駆体の該溶液を乾燥させ、該可溶性塩前駆体の層を該表面上に画定する工程と、
(iii)該可溶性塩前駆体を該表面上で150〜600℃の温度まで加熱し、分解して金属酸化物膜の層を該表面上に形成する工程と、
(iv)工程(i)〜(iii)を少なくとももう1回繰り返す工程であって、該可溶性塩前駆体の該溶液を該金属酸化物膜上に堆積させ、該表面上の該金属酸化物膜が複数の金属酸化物層を含むようにする工程と、
(v)該表面上に該金属酸化物膜を有する該基板を500〜1100℃の温度で焼成して該金属酸化物膜を結晶化し、該基板の該表面に結合した金属酸化物結晶性セラミック層を生成させる工程と
を含み、
各工程(ii)、(iii)および(v)を空気雰囲気中で行う方法を提供する。
・低SOFC作動温度(<600℃)では、電解質にドープセリアよりずっと低いイオン伝導性を有するジルコニアを用いることにより、アノード−電解質界面でアノードの触媒活性が低下する可能性が高い。
・こうした実施形態を、有害な材料の相互作用が起こる、金属支持型SOFCの最高処理温度より高い温度で、ジルコニアとCGOとを共焼結することなく製造することは困難である。
(vi)工程(i)〜(v)を少なくとも1回繰り返す工程であって、表面が工程(v)で前に生成させた金属酸化物結晶性セラミック層である工程
をさらに含むことができる。
工程(i)〜(v)の第1セットでは、可溶性塩前駆体は、ジルコニウムアセチルアセトナート、硝酸スカンジウム、および硝酸イットリウムからなる群の少なくとも1種から選択し、
工程(i)〜(v)の第2セットでは、可溶性塩前駆体は、セリウムアセチルアセトナートおよび硝酸ガドリニウムからなる群の少なくとも1種から選択する。
(i)金属酸化物結晶性セラミックの可溶性塩前駆体の溶液を該基板の該表面上に堆積させ、該可溶性塩前駆体の該溶液の層を該表面上に画定する工程であって、該表面が金属表面およびセラミック表面からなる群から選択される工程と、
(ii)該可溶性塩前駆体の該溶液を乾燥させ、該可溶性塩前駆体の層を該表面上に画定する工程と、
(iii)該可溶性塩前駆体を該表面上で150〜600℃の温度まで加熱し、分解して金属酸化物膜の層を該表面上で形成する工程と、
(iv)工程(i)〜(iii)を少なくとももう1回繰り返す工程であって、該表面上の該金属酸化物膜が複数の金属酸化物の層を含むように、該可溶性塩前駆体の該溶液を該金属酸化物膜上に堆積させる工程と、
(v)該表面上に該金属酸化物膜を有する該基板を500〜1100℃の温度で焼成して該金属酸化物膜を結晶化し、該基板の該表面に結合した金属酸化物結晶性セラミック層を生成させる工程と
を含み、
各工程(i)、(iii)および(v)を空気雰囲気中で行う方法も提供する。
(a)RTPで容積90%のエタノールおよび容積10%のメトキシプロパノール中のSc(NO3)3、Y(NO3)3およびZr(C5H7O2)の0.1Mのカチオン濃度の溶液(スカンジアイットリア共安定化ジルコニアを形成する可溶性塩前駆体)の層をCGO層上に空気噴霧する工程。
(b)RTPで可溶性塩前駆体層を空気中で60秒間乾燥させ、この間に可溶性塩前駆体を表面にわたってならし、その後100℃で30秒間さらに乾燥させる工程。
(c)赤外線(IR)加熱ランプを用いて可溶性塩前駆体を550℃まで合計60秒にわたり加熱し、分解および半結晶化して約125nmの厚さの半結晶スカンジアイットリア共安定化ジルコニア膜層を形成する工程。
(d)工程(a)〜(c)を4回繰り返す工程であって、基板および金属酸化物膜を工程(a)の各反復の前に35〜80℃の温度まで冷却し、約500nmの全厚を有する金属酸化物および半結晶の膜をもたらす工程。この膜には亀裂が全くなく、さらなる処理に適している。
(e)800℃で60分間、空気中で焼成する工程であって、スカンジアイットリア共安定化ジルコニアの金属酸化物膜が、約400nmの厚さを有するスカンジアイットリア共安定化ジルコニアの完全に結晶性のセラミック層20を生成する工程。
(f)工程(a)〜(e)をもう1回繰り返し、約800nmの厚さを有する最終層20を得る工程。
(g)工程(a)〜(e)をもう1回繰り返す工程であるが、今回は、CGOの層30を前に堆積させたスカンジアイットリア共安定化ジルコニアの結晶性セラミック層の上に堆積させる工程。具体的な条件は:容積70%のエタノールおよび容積30%のメトキシプロパノール中の0.1Mのカチオン濃度のCe(C5H7O2)および硝酸ガドリニウムならびに前と同様の噴霧、堆積および処理であるが、980℃の最終結晶化焼成温度を用いて250nmの最終厚さを有するCGO層を得る。この層は、スカンジアイットリア共安定化ジルコニア層とその次に堆積させるカソード層との間のバリア層の機能を果たす。
(h)最後に、カソード層40を前に堆積させたCGO層の上に堆積させる工程。これは、LSCFカソードをスクリーン印刷し、国際公開公報第2006/079800号に従って処理することにより行う。この層は、約50μmの厚さを有する。
(A)NiO−CGOアノード
(B)CGO(10)
(C)スカンジアイットリア共安定化ジルコニア(20)
(D)CGO(30)
(E)カソード(40)
20 ScSZ中間層
30 CGO中間層
40 カソード
50 フェライトステンレス鋼基板
60 アノード縁部
70 カソード活性層
80 カソード電流コレクタ
100 バリア有の出力密度
110 バリア無の出力密度
120 バリア有のセル電圧
130 バリア無のセル電圧
200 フェライトステンレス鋼基板
201 有孔領域
202 無孔領域
210 アノード層
220 CGO層
230 燃料側
240 酸化剤側
250 スカンジアイットリア共安定化ジルコニア層
260 CGO層
270 カソードアセンブリ
300 スカンジアイットリア共安定化ジルコニア(ScYSZ)層
310 ScYSZ層300が重ならないCGO電解質層220の領域
320 スカンジアイットリア共安定化ジルコニア(ScYSZ)層300の第1領域
330 スカンジアイットリア共安定化ジルコニア(ScYSZ)層300の第2領域
340 燃料電池の電解質構造
350 ScYSZ層
360 第1領域
370 第2領域
380 第3領域
390 第4領域
400 第5領域
410 CGO中間層
420 カソード層
500 結晶性スカンジアイットリア共安定化ジルコニア(ScYSZ)層
510 ScYSZ層500が重ならないCGO電解質層220の領域
520 スカンジアイットリア共安定化ジルコニア(ScYSZ)層500の第1領域
530 スカンジアイットリア共安定化ジルコニア(ScYSZ)層500の第2領域
540 ScYSZ層500が重ならないアノード層210およびCGO電解質層220の領域
Claims (23)
- 少なくとも2層の金属酸化物結晶性セラミック層を基板の表面上に堆積させる工程を含む、少なくとも2層のSOFC電解質を堆積させる方法であって、該方法が、
(i)金属酸化物結晶性セラミックの可溶性塩前駆体の溶液を該基板の該表面上に堆積させ、該可溶性塩前駆体の該溶液の層を該表面上に画定する工程と、
(ii)該可溶性塩前駆体の該溶液を乾燥させ、該可溶性塩前駆体の層を該表面上に画定する工程と、
(iii)該可溶性塩前駆体を該表面上で150〜600℃の温度まで加熱し、分解して金属酸化物膜の層を該表面上に形成する工程と、
(iv)工程(i)〜(iii)を少なくとももう1回繰り返す工程であって、該表面上の該金属酸化物膜が複数の金属酸化物の層を含むように、該可溶性塩前駆体の該溶液を該金属酸化物膜上に堆積させる工程と、
(v)該表面上に該金属酸化物膜を有する該基板を500〜1100℃の温度で焼成して該金属酸化物膜を結晶化し、該基板の該表面に結合した金属酸化物結晶性セラミック層を生成させる工程と、
(vi)工程(i)〜(v)を少なくとも1回繰り返す工程であって、前記表面が工程(v)で前に生成させた金属酸化物結晶性セラミック層である工程と
を含み、
各工程(ii)、(iii)および(v)を空気雰囲気中で行い、
前記工程(i)〜(v)の第1セットでは、前記基板が実質的に前記可溶性塩前駆体に対して不透過性の混合イオン電子伝導性電解質セラミック材料であり、前記金属酸化物結晶性セラミックがイオン透過性、電気絶縁性およびガス不透過性であり、
前記工程(i)〜(v)の最終セットでは、製造された前記金属酸化物結晶性セラミックが混合イオン電子伝導性電解質セラミック材料である、
方法。 - 請求項1に記載の方法において、前記工程(i)〜(v)の第1セットでは、前記基板がCGO電解質層である、方法。
- 請求項1又は2に記載の方法において、
前記工程(i)〜(v)の第1セットでは、前記可溶性塩前駆体を、ジルコニウムアセチルトセトナート、硝酸スカンジウム、および硝酸イットリウムからなる群の少なくとも1種から選択し、
前記工程(i)〜(v)の最終セットでは、前記可溶性塩前駆体を、セリウムアセチルアセトナートおよび硝酸ガドリニウムからなる群の少なくとも1種から選択する、
方法。 - 金属酸化物結晶性セラミック層を基板の表面上に堆積させる工程を含む、少なくとも2層のSOFC電解質を堆積させる方法であって、該方法が、
(i)金属酸化物結晶性セラミックの可溶性塩前駆体の溶液を該基板の該表面上に堆積させ、該可溶性塩前駆体の該溶液の層を該表面上に画定する工程と、
(ii)該可溶性塩前駆体の該溶液を乾燥させ、該可溶性塩前駆体の層を該表面上に画定する工程と、
(iii)該可溶性塩前駆体を該表面上で150〜600℃の温度まで加熱し、分解して金属酸化物膜の層を該表面上に形成する工程と、
(iv)工程(i)〜(iii)を少なくとももう1回繰り返す工程であって、該表面上の該金属酸化物膜が複数の金属酸化物の層を含むように、該可溶性塩前駆体の該溶液を該金属酸化物膜上に堆積させる工程と、
(v)該表面上に該金属酸化物膜を有する該基板を500〜1100℃の温度で焼成して該金属酸化物膜を結晶化し、該基板の該表面に結合した金属酸化物結晶性セラミック層を生成させる工程と
を含み、
各工程(ii)、(iii)および(v)を空気雰囲気中で行い、
前記基板が実質的に前記可溶性塩前駆体に対して不透過性の混合イオン電子伝導性電解質セラミック材料であり、
前記工程(i)〜(iii)の第1セットでは、前記可溶性塩前駆体が、イオン透過性、電気絶縁性およびガス不透過性である金属酸化物結晶性セラミックの前駆体であり、
前記工程(i)〜(iii)の最終セットでは、前記可溶性塩前駆体が、混合イオン電子伝導性電解質セラミック材料である金属酸化物結晶性セラミックからなる、
方法。 - 請求項4に記載の方法において、前記基板がCGO電解質層である、方法。
- 請求項4又は5に記載の方法において、
前記工程(i)〜(iii)の第1セットでは、前記可溶性塩前駆体を、ジルコニウムアセチルトセトナート、硝酸スカンジウム、および硝酸イットリウムからなる群の少なくとも1種から選択し、
前記工程(i)〜(iii)の最終セットでは、前記可溶性塩前駆体を、セリウムアセチルアセトナートおよび硝酸ガドリニウムからなる群の少なくとも1種から選択する、
方法。 - 前記請求項1〜6のいずれかに記載の方法において、各堆積工程(i)を温度が10〜100℃の基板または金属酸化物膜の表面を用いて行う、方法。
- 前記請求項1〜7のいずれかに記載の方法において、金属酸化物結晶性セラミックがイオン透過性、電気絶縁性およびガス不透過性である場合、該金属酸化物結晶性セラミックがドープ安定化ジルコニアを含む、方法。
- 請求項8に記載の方法において、前記イオン透過性、電気絶縁性およびガス不透過性の金属酸化物結晶性セラミックが、スカンジア安定化ジルコニア(ScSZ)、イットリア安定化ジルコニア(YSZ)、スカンジアセリア共安定化ジルコニア(ScCeSZ)、およびスカンジアイットリア共安定化ジルコニア(ScYSZ)からなる群から選択される、方法。
- 請求項1〜7のいずれかに記載の方法において、金属酸化物結晶性セラミックが混合イオン電子伝導性電解質セラミック材料である場合、該金属酸化物結晶性セラミックが希土類酸化物ドープセリアを含む、方法。
- 請求項10に記載の方法において、前記混合イオン電子伝導性電解質セラミック材料の金属酸化物結晶性セラミックが、サマリウムドープセリア(SDC)、ガドリニウムドープセリア(GDC)、プラセオジムドープセリア(PDC)、およびサマリアガドリニアドープセリア(SGDC)からなる群から選択される、方法。
- 前記請求項1〜11のいずれか一項に記載の方法において、前記可溶性塩前駆体が、ジルコニウムアセチルアセトナート、硝酸スカンジウム、硝酸イットリウム、セリウムアセチルアセトナートおよび硝酸ガドリニウムからなる群の少なくとも1種から選択される、方法。
- 前記請求項請求項1〜12のいずれかに記載の方法において、前記可溶性塩前駆体用の溶剤が、メタノール、エタノール、プロパノール、メトキシプロパノール、アセトンおよびブチルカルビトールからなる群の少なくとも1種から選択される、方法。
- 前記請求項1〜13のいずれかに記載の方法であって、工程(ii)の前に、前記表面上に堆積させた前記溶液を少なくとも5、10、15、20、25、30、35、40、45、50、55または60秒間置いておく工程をさらに含む、方法。
- 前記請求項1〜14のいずれかに記載の方法において、前記表面上の前記可溶性塩前駆体の層が、10〜999nm、100〜200nm、および約150nmからなる群から選択される厚さを有する、方法。
- 前記請求項1〜15のいずれかに記載の方法において、工程(i)〜(iv)完了後、前記表面上に画定した前記金属酸化物膜が、100nm未満、400nm未満、800nm未満、および1ミクロン未満からなる群から選択される厚さを有する、方法。
- 前記請求項1〜16のいずれかに記載の方法において、工程(v)完了後、前記表面に結合した前記金属酸化物結晶性セラミック堆積層が、100〜999nm、200〜800nm、250〜700nm、および400〜600nmからなる群から選択される厚さを有する、方法。
- 前記請求項1〜17のいずれかに記載の方法において、工程(v)完了後、前記表面に結合した前記金属酸化物結晶性セラミック層が、少なくとも90%の密度である、方法。
- 前記請求項1〜18のいずれかに記載の方法において、前記可溶性塩前駆体の前記堆積溶液中の溶剤の少なくとも90%を、乾燥工程(ii)の終了までに除去する、方法。
- 前記請求項1〜19のいずれかに記載の方法において、前記金属酸化物結晶性セラミックの可溶性塩前駆体の溶液を、噴霧、浸漬、インクジェット印刷およびスピンコートからなる群から選択する方法により前記表面上に堆積させる、方法。
- 請求項1〜3および請求項1に従属する場合の請求項7〜20のいずれかに記載の方法において、前記工程(i)〜(v)の第1セットでは、前記基板がCGOであり、前記金属酸化物結晶性セラミックがScYSZまたはScSZであり、また、前記工程(i)〜(v)の最終セットでは、前記金属酸化物結晶性セラミックがCGOである、方法。
- 請求項4〜6および請求項4に従属する場合の請求項7〜20のいずれかに記載の方法において、前記基板がCGOであり、前記工程(i)〜(iii)の第1セットでは、前記可溶性塩前駆体がScYSZまたはScSZの前駆体であり、また、前記工程(i)〜(v)の最終セットでは、前記可溶性塩前駆体がCGOの前駆体である、方法。
- 基板の表面であって、前記基板が実質的に前記可溶性塩前駆体に対して不透過性の混合イオン電子伝導性電解質セラミック材料であり、前記表面がセラミック表面であり、該表面に請求項1〜22のいずれかに記載の金属酸化物結晶性セラミックの少なくとも2層を堆積させた、基板の表面。
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Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8263420B2 (en) | 2008-11-12 | 2012-09-11 | Sandisk 3D Llc | Optimized electrodes for Re-RAM |
WO2013085087A1 (ko) * | 2011-12-09 | 2013-06-13 | 주식회사 포스코 | 반응방지층을 포함하는 고체산화물 연료전지 및 그 제조방법 |
KR101405477B1 (ko) * | 2011-12-29 | 2014-06-19 | 재단법인 포항산업과학연구원 | 금속지지체형 고체산화물 연료전지용 셀의 제조방법 및 금속지지체형 고체산화물 연료전지용 셀 |
US20130284338A1 (en) * | 2012-04-26 | 2013-10-31 | Gm Global Technology Operations Llc. | Self assembly of graphene materials |
GB2517928B (en) | 2013-09-04 | 2018-02-28 | Ceres Ip Co Ltd | Metal supported solid oxide fuel cell |
GB2517927B (en) | 2013-09-04 | 2018-05-16 | Ceres Ip Co Ltd | Process for forming a metal supported solid oxide fuel cell |
WO2015102701A2 (en) * | 2013-10-08 | 2015-07-09 | Phillips 66 Company | Formation of solid oxide fuel cells |
LT3099836T (lt) * | 2014-01-14 | 2022-05-25 | Elcogen As | Sofc katodo difuzijos barjerinio sluoksnio ir sofc gamybos būdas |
US10270119B2 (en) | 2014-03-12 | 2019-04-23 | Ceres Intellectual Property Company Limited | Fuel cell stack arrangement |
GB2534124B (en) | 2014-12-19 | 2017-04-19 | Ceres Ip Co Ltd | A swirl burner assembly and method |
US11527766B2 (en) | 2014-12-19 | 2022-12-13 | Ceres Intellectual Property Company Limited | Fuel cell system and tail gas burner assembly and method |
GB2524638B (en) * | 2015-02-06 | 2016-04-06 | Ceres Ip Co Ltd | Electrolyte forming process |
GB2535338B (en) * | 2015-02-06 | 2017-01-25 | Ceres Ip Co Ltd | Electrolyte forming process |
GB2550317B (en) * | 2016-03-09 | 2021-12-15 | Ceres Ip Co Ltd | Fuel cell |
JP6418362B1 (ja) | 2017-03-27 | 2018-11-07 | 新日鐵住金株式会社 | ステンレス鋼材、構成部材、セルおよび燃料電池スタック |
GB2563848B (en) | 2017-06-26 | 2022-01-12 | Ceres Ip Co Ltd | Fuel cell stack assembly |
CA3075916A1 (en) * | 2017-09-19 | 2019-03-28 | Phillips 66 Company | Solid oxide fuel cells with thickness graded electrolyte |
IT201800004765A1 (it) * | 2018-04-20 | 2019-10-20 | Protezione di un substrato metallico per pile di celle ad ossidi solidi mediante stampa inkjet | |
CN109266099A (zh) * | 2018-08-22 | 2019-01-25 | 华南理工大学 | 一种氧化锆喷墨打印墨水及制备氧化锆纳米晶薄膜的方法 |
US10930844B2 (en) * | 2018-10-11 | 2021-02-23 | International Business Machines Corporation | Three-terminal oxygen intercalation neuromorphic devices |
US11581561B2 (en) * | 2019-06-03 | 2023-02-14 | Kyocera Corporation | Cell, cell stack device, module, and module housing device |
GB201913907D0 (en) | 2019-09-26 | 2019-11-13 | Ceres Ip Co Ltd | Fuel cell stack assembly apparatus and method |
GB201915294D0 (en) | 2019-10-22 | 2019-12-04 | Ceres Ip Co Ltd | Alignment apparatus and methods of alignment |
GB201915438D0 (en) | 2019-10-24 | 2019-12-11 | Ceres Ip Co Ltd | Metal-supported cell unit |
CN110863191B (zh) * | 2019-11-27 | 2021-06-04 | 东北大学 | 一种带涂层的金属基体及其制备方法 |
GB2591462B (en) | 2020-01-27 | 2022-04-20 | Ceres Ip Co Ltd | Interlayer for solid oxide cell |
GB202009687D0 (en) * | 2020-06-25 | 2020-08-12 | Ceres Ip Co Ltd | Layer |
GB2616589B (en) | 2021-07-23 | 2024-05-01 | Ceres Ip Co Ltd | Fuel cell systems and method |
WO2023038167A1 (ko) * | 2021-09-09 | 2023-03-16 | 단국대학교 천안캠퍼스 산학협력단 | 접촉층을 포함하는 금속지지체형 고체산화물 연료전지 |
CA3230140A1 (en) | 2021-09-30 | 2023-04-06 | Robert Leah | Electrode and electrochemical cell |
CN113788707B (zh) * | 2021-10-09 | 2022-09-09 | 航天特种材料及工艺技术研究所 | 一种铈改性抗氧化陶瓷基复合材料及其制备方法 |
CN114974898B (zh) * | 2022-06-14 | 2024-06-14 | 中国振华(集团)新云电子元器件有限责任公司(国营第四三二六厂) | 电容器芯子及其制造方法、电解电容器及其制造方法 |
GB202213357D0 (en) | 2022-09-13 | 2022-10-26 | Ceres Ip Co Ltd | Electrochemical cell |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61261235A (ja) | 1985-05-13 | 1986-11-19 | Nissan Chem Ind Ltd | 透明導電膜の形成法 |
JPS63293168A (ja) | 1987-05-27 | 1988-11-30 | Toshiba Corp | 酸化チタン薄膜の形成方法 |
US4963390A (en) * | 1988-10-05 | 1990-10-16 | The Aerospace Corporation | Metallo-organic solution deposition (MOSD) of transparent, crystalline ferroelectric films |
JPH02116620A (ja) * | 1988-10-24 | 1990-05-01 | Toray Ind Inc | 超伝導薄膜の形成方法 |
US5273776A (en) * | 1991-12-06 | 1993-12-28 | Mitsubishi Materials Corporation | Method for forming thermistor thin film |
JP3161477B2 (ja) * | 1991-12-06 | 2001-04-25 | 三菱マテリアル株式会社 | マンガンコバルト酸化物薄膜の形成方法 |
US5699035A (en) | 1991-12-13 | 1997-12-16 | Symetrix Corporation | ZnO thin-film varistors and method of making the same |
US5494700A (en) * | 1994-04-05 | 1996-02-27 | The Curators Of The University Of Missouri | Method of coating a substrate with a metal oxide film from an aqueous solution comprising a metal cation and a polymerizable organic solvent |
US6139985A (en) * | 1998-07-24 | 2000-10-31 | Siemens Westinghouse Power Corporation | Electrode electrolyte interlayers containing cerium oxide for electrochemical fuel cells |
US20010022990A1 (en) * | 2000-02-28 | 2001-09-20 | Yoshimi Sato | Coating solutions for use in forming bismuth-based ferroelectric thin films and a method of forming bismuth-based ferroelectric thin films using the coating solutions |
US6558831B1 (en) | 2000-08-18 | 2003-05-06 | Hybrid Power Generation Systems, Llc | Integrated SOFC |
JP4605885B2 (ja) | 2000-10-23 | 2011-01-05 | 東邦瓦斯株式会社 | 支持膜式固体電解質型燃料電池 |
GB2368450B (en) * | 2000-10-25 | 2004-05-19 | Imperial College | Fuel cells |
US6803138B2 (en) * | 2001-07-02 | 2004-10-12 | Nextech Materials, Ltd. | Ceramic electrolyte coating methods |
JP3907532B2 (ja) * | 2002-06-11 | 2007-04-18 | 株式会社日本触媒 | ヒドロキシアルキル(メタ)アクリレートの製造方法 |
GB0217794D0 (en) * | 2002-08-01 | 2002-09-11 | Univ St Andrews | Fuel cell electrodes |
US6838119B2 (en) * | 2002-12-27 | 2005-01-04 | Praxair Technology, Inc. | Manufacturing method to improve oxygen ion conductivity of an ionic conductor |
US7090891B2 (en) * | 2003-04-28 | 2006-08-15 | Curators Of The University Of Missouri | Method for fabricating nanostructured solid oxide fuel cells and cell components |
US7632535B2 (en) * | 2003-05-07 | 2009-12-15 | De Nora Tech, Inc. | Smooth surface morphology chlorate anode coating |
CN100483818C (zh) * | 2003-08-06 | 2009-04-29 | Toto株式会社 | 固体氧化物型燃料电池 |
US7595019B2 (en) | 2005-03-01 | 2009-09-29 | Air Products And Chemicals, Inc. | Method of making an ion transport membrane oxygen separation device |
EP1887843A1 (en) | 2005-04-28 | 2008-02-13 | Mitsui Mining & Smelting Co., Ltd. | Method for oxide dielectric layer formation, and capacitor layer forming material comprising oxide dielectric layer formed by said formation method |
GB0601813D0 (en) * | 2006-01-30 | 2006-03-08 | Ceres Power Ltd | Fuel cell |
US20070180689A1 (en) * | 2006-02-08 | 2007-08-09 | Day Michael J | Nonazeotropic terpineol-based spray suspensions for the deposition of electrolytes and electrodes and electrochemical cells including the same |
US8337939B2 (en) * | 2007-09-13 | 2012-12-25 | General Electric Company | Method of processing a ceramic layer and related articles |
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BRPI0915139A2 (pt) | 2017-03-21 |
WO2009090419A8 (en) | 2011-04-14 |
EA021907B1 (ru) | 2015-09-30 |
CA2745575C (en) | 2017-09-12 |
KR101617007B1 (ko) | 2016-05-02 |
CA2745575A1 (en) | 2009-07-23 |
CN102119134B (zh) | 2015-02-11 |
TR201900926T4 (tr) | 2019-02-21 |
EP2318328A2 (en) | 2011-05-11 |
ES2708085T3 (es) | 2019-04-08 |
KR20110046441A (ko) | 2011-05-04 |
JP2011524844A (ja) | 2011-09-08 |
US20110143038A1 (en) | 2011-06-16 |
GB2456445A (en) | 2009-07-22 |
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