JP5695191B2 - 弾性波デバイスおよびモジュール - Google Patents
弾性波デバイスおよびモジュール Download PDFInfo
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- JP5695191B2 JP5695191B2 JP2013514930A JP2013514930A JP5695191B2 JP 5695191 B2 JP5695191 B2 JP 5695191B2 JP 2013514930 A JP2013514930 A JP 2013514930A JP 2013514930 A JP2013514930 A JP 2013514930A JP 5695191 B2 JP5695191 B2 JP 5695191B2
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- JP
- Japan
- Prior art keywords
- dielectric film
- resonator
- region
- substrate
- acoustic wave
- Prior art date
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- 239000000758 substrate Substances 0.000 claims description 28
- 238000012986 modification Methods 0.000 description 35
- 230000004048 modification Effects 0.000 description 35
- 230000000052 comparative effect Effects 0.000 description 20
- 238000010586 diagram Methods 0.000 description 20
- 230000005540 biological transmission Effects 0.000 description 10
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 5
- 230000001902 propagating effect Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 101100536354 Drosophila melanogaster tant gene Proteins 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- PSVBHJWAIYBPRO-UHFFFAOYSA-N lithium;niobium(5+);oxygen(2-) Chemical compound [Li+].[O-2].[O-2].[O-2].[Nb+5] PSVBHJWAIYBPRO-UHFFFAOYSA-N 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- JNQQEOHHHGGZCY-UHFFFAOYSA-N lithium;oxygen(2-);tantalum(5+) Chemical compound [Li+].[O-2].[O-2].[O-2].[Ta+5] JNQQEOHHHGGZCY-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/25—Constructional features of resonators using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02858—Means for compensation or elimination of undesirable effects of wave front distortion
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Description
11a、11b バスバー
12a,12b 櫛型電極
13a、13b 電極指
14 誘電体膜
15 ギャップ
16 反射器
17a,17b ダミー電極指
20 傾斜領域
50 ギャップ領域
52 交差領域
54 バスバー領域
Claims (7)
- 基板と、
前記基板上に形成された誘電体膜と、
前記基板と前記誘電体膜との間に設けられ、それぞれ電極指を含み対向する櫛型電極と、
を備え、
前記基板および誘電体膜の少なくとも一方は圧電体であり、
前記対向する櫛型電極のうち一方の電極指の先端と、前記対向する櫛型電極のうち他方の櫛型電極の間のギャップの上方の前記誘電体膜の上面は、前記電極指の延伸方向に、前記基板の上面に対し傾斜しており、前記基板の上面に対する前記誘電体膜の上面の傾斜角度は30°以上かつ50°以下であることを特徴とする弾性波デバイス。 - 前記誘電体膜の上面は、前記ギャップの上方全体にわたり傾斜していることを特徴とする請求項1記載の弾性波デバイス。
- 前記対向する櫛型電極は、それぞれ前記電極指とバスバーとを含み、前記電極指上の前記誘電体膜の膜厚と、前記バスバー上の前記誘電体膜の膜厚とは異なることを特徴とする請求項1および2記載の弾性波デバイス。
- 前記誘電体膜の上面の傾斜により生じる前記誘電体膜の膜厚差は、前記対向する櫛型電極の膜厚より大きいことを特徴とする請求項1から3のいずれか一項記載の弾性波デバイス。
- 前記対向する櫛型電極を含むIDTを複数有し、前記複数のIDTは前記傾斜角度が異なることを特徴とする請求項1から4のいずれか一項記載の弾性波デバイス。
- 前記複数のIDTは、ラダー型フィルタの直列共振器に含まれる第1IDTと並列共振器の含まれる第2IDTとを含み、
前記第1IDTと前記第2IDTとで、前記傾斜角度が異なることを特徴とする請求項5記載の弾性波デバイス。 - 前記請求項1から6のいずれか一項記載の弾性波デバイスを含むことを特徴とするモジュール。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2011/061471 WO2012157101A1 (ja) | 2011-05-19 | 2011-05-19 | 弾性波デバイスおよびモジュール |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2012157101A1 JPWO2012157101A1 (ja) | 2014-07-31 |
JP5695191B2 true JP5695191B2 (ja) | 2015-04-01 |
Family
ID=47176464
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013514930A Active JP5695191B2 (ja) | 2011-05-19 | 2011-05-19 | 弾性波デバイスおよびモジュール |
Country Status (4)
Country | Link |
---|---|
US (1) | US8896399B2 (ja) |
JP (1) | JP5695191B2 (ja) |
SG (1) | SG186395A1 (ja) |
WO (1) | WO2012157101A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5422441B2 (ja) * | 2010-02-26 | 2014-02-19 | 太陽誘電株式会社 | 弾性波デバイス |
JP6335473B2 (ja) * | 2013-11-01 | 2018-05-30 | 太陽誘電株式会社 | 弾性表面波デバイス及びフィルタ |
JP2018078419A (ja) * | 2016-11-08 | 2018-05-17 | 株式会社村田製作所 | 弾性波装置、高周波フロントエンド回路及び通信装置 |
JP6947220B2 (ja) * | 2017-09-05 | 2021-10-13 | 株式会社村田製作所 | フィルタ装置 |
JP7027079B2 (ja) * | 2017-09-12 | 2022-03-01 | 太陽誘電株式会社 | 弾性波デバイスおよびその製造方法 |
US11652466B2 (en) * | 2019-08-29 | 2023-05-16 | Skyworks Solutions, Inc. | Suppression of transverse mode spurious signals in surface acoustic wave devices utilizing a dense film above gap region of interdigital transducer electrodes |
WO2022039210A1 (ja) * | 2020-08-19 | 2022-02-24 | 株式会社村田製作所 | 弾性波装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005244359A (ja) * | 2004-02-24 | 2005-09-08 | Murata Mfg Co Ltd | 弾性表面波装置、ラダー型フィルタ、及び共振子型フィルタ |
JP2007110342A (ja) * | 2005-10-12 | 2007-04-26 | Kyocera Corp | 弾性表面波素子及びその製造方法 |
WO2010137279A1 (ja) * | 2009-05-27 | 2010-12-02 | パナソニック株式会社 | 弾性波共振器と、これを用いたアンテナ共用器 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003037467A (ja) * | 2001-07-24 | 2003-02-07 | Murata Mfg Co Ltd | 弾性表面波装置 |
WO2006078001A1 (ja) | 2005-01-21 | 2006-07-27 | National University Corporation Chiba University | 弾性表面波装置 |
US7965155B2 (en) | 2006-12-27 | 2011-06-21 | Panasonic Corporation | Surface acoustic wave resonator, and surface acoustic wave filter and antenna duplexer in which the surface acoustic wave resonator is used |
JP2009290472A (ja) * | 2008-05-28 | 2009-12-10 | Fujitsu Ltd | 弾性波デバイス、フィルタ、通信モジュール、および通信装置 |
JP5422441B2 (ja) * | 2010-02-26 | 2014-02-19 | 太陽誘電株式会社 | 弾性波デバイス |
JP2011182220A (ja) * | 2010-03-02 | 2011-09-15 | Panasonic Corp | 弾性波共振器及びこれを用いた縦結合二重モードフィルタ、ラダー型フィルタ |
JP2011205625A (ja) * | 2010-03-02 | 2011-10-13 | Panasonic Corp | ラダー型フィルタ |
-
2011
- 2011-05-19 SG SG2012093399A patent/SG186395A1/en unknown
- 2011-05-19 JP JP2013514930A patent/JP5695191B2/ja active Active
- 2011-05-19 WO PCT/JP2011/061471 patent/WO2012157101A1/ja active Application Filing
-
2012
- 2012-12-21 US US13/725,514 patent/US8896399B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005244359A (ja) * | 2004-02-24 | 2005-09-08 | Murata Mfg Co Ltd | 弾性表面波装置、ラダー型フィルタ、及び共振子型フィルタ |
JP2007110342A (ja) * | 2005-10-12 | 2007-04-26 | Kyocera Corp | 弾性表面波素子及びその製造方法 |
WO2010137279A1 (ja) * | 2009-05-27 | 2010-12-02 | パナソニック株式会社 | 弾性波共振器と、これを用いたアンテナ共用器 |
Also Published As
Publication number | Publication date |
---|---|
US8896399B2 (en) | 2014-11-25 |
WO2012157101A1 (ja) | 2012-11-22 |
SG186395A1 (en) | 2013-01-30 |
JPWO2012157101A1 (ja) | 2014-07-31 |
US20130106536A1 (en) | 2013-05-02 |
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