JP5482962B2 - レーザー加工用金属板とレーザー加工用ステンレス鋼板の製造方法 - Google Patents
レーザー加工用金属板とレーザー加工用ステンレス鋼板の製造方法 Download PDFInfo
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- JP5482962B2 JP5482962B2 JP2013502388A JP2013502388A JP5482962B2 JP 5482962 B2 JP5482962 B2 JP 5482962B2 JP 2013502388 A JP2013502388 A JP 2013502388A JP 2013502388 A JP2013502388 A JP 2013502388A JP 5482962 B2 JP5482962 B2 JP 5482962B2
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- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
- B23K2103/14—Titanium or alloys thereof
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/18—Dissimilar materials
- B23K2103/26—Alloys of Nickel and Cobalt and Chromium
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D2211/00—Microstructure comprising significant phases
- C21D2211/001—Austenite
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- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
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- C—CHEMISTRY; METALLURGY
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Description
特許文献1〜3により例示されるように、これまでレーザーメタルマスクの性能は、もっぱら、加工機の技術進歩といったレーザー加工方法の改良による細孔に対する加工精度向上や、ハンダ供給量の安定化のためにレーザー加工後のメタルマスクの機械的および/または化学的な加工を行うことによって向上してきた。
また、レーザー加工後の処理としては、レーザー加工で生じた裏面側のドロスやバリを除去するために電解/化学研磨または機械研磨を行うのに加えて、スキージ性(スキージによる半田供給量の均一性)を向上させるために表面側には鏡面仕上げを行っていた。そのため、作業時間が長時間化し、高コストとなっていた。
本発明者らは、金属板の結晶粒径をその板厚に依存してある限度以下に微細化することにより上記目的を達成できることを知見した。
d≦0.0448・t−1.28 ・・・ (1)
を満足することを特徴とするレーザー加工メタルマスク用金属板、望ましくはオーステナイト系ステンレス鋼板である。
[SUS301]
C:0.15%以下、Si:1.00%以下、Mn:2.00%以下、P:0.045%以下、S:0.030%以下、Ni:6.00〜8.00%、Cr:16.00〜18.00%以下、残部Feおよび不純物。
C:0.030%以下、Si:1.00%以下、Mn:2.00%以下、P:0.045%以下、S:0.030%以下、Ni:6.00〜8.00%、Cr:16.00〜18.00%、N:0.20以下、残部Feおよび不純物。
C:0.08%以下、Si:1.00%以下、Mn:2.00%以下、P:0.045%以下、S:0.030%以下、Ni:8.00〜10.50%、Cr:18.00〜20.00%以下、残部Feおよび不純物。
C:0.030%以下、Si:1.00%以下、Mn:2.00%以下、P:0.045%以下、S:0.030%以下、Ni:9.00〜13.00%、Cr:18.00〜20.00%以下、残部Feおよび不純物。
C:0.15%以下、Si:1.00%以下、Mn:2.00%以下、P:0.045%以下、S:0.030%以下、Ni:6.00〜8.00%、Cr:16.00〜18.00%以下、残部Feおよび不純物。
C:0.08%以下、Si:1.00%以下、Mn:2.00%以下、P:0.045%以下、S:0.030%以下、Ni:8.00〜10.50%、Cr:18.00〜20.00%以下、残部Feおよび不純物。
Sの含有がレーザー加工性を改善する機構は不明だが、レーザーにより溶融した金属の対流パターンが変化して深さ方向の溶解が促進されることや、FeSなどの低融点化合物の生成が寄与していると推定される。
d≦0.0448・t−1.28 ・・・ (1)
で示される関係を満足する。金属板がオーステナイト系ステンレス鋼板以外のもの、例えば、フェライト系ステンレス鋼、チタン板、チタン合金板などである場合にも同様である。この理由を次に説明する。
この図に示すように、ステンレス鋼板2のレーザー入射面2aにレーザー1が照射されると、その裏面であるレーザー出射側面2bへ向けてレーザー1のエネルギーによる金属の溶込みが起こり、ステンレス鋼板2に細孔3が穿孔される。
d≦0.0448・t−1.28 ・・・ (1)
を満たせば、良好なレーザー加工性が得られることになる。
オーステナイト系ステンレス鋼板2の平均結晶粒径d(μm)と、板厚t(μm)とが上記(1)式を満たさないと、細孔拡がりが増加して、レーザー1により広い範囲で金属が溶込んでしまい、細孔3の加工精度が不芳となる。このため、本発明では(1)式の関係を満足することが必要である。
さらに好ましくは、細孔拡がりW(μm)は板厚t(μm)の5%以下と更に小さくなり、この場合、W≦0.05・tが成り立ち、平均結晶粒径d(μm)と板厚t(μm)とは下記(1'')式を満たす。
図2(B)は、レーザー加工で穿孔された細孔に不可避的に生ずるドロスとバリの状況を示す説明図である。ドロスやバリは溶けた金属が細孔に付着することで生じ、細孔内面に付着しているのがドロス、レーザー出射側の細孔周縁に垂れ下がって付着しているのがバリである。これらは、加工後に行われる化学研磨や電解研磨により取り除かれる。従って、図中の最大ドロス厚さ4および最大バリ高さ5は、可及的に小さいことが望ましい。前述したように、本発明では、金属板の平均結晶粒径が小さいために、最大ドロス厚さや最大バリ高さが小さくなり、ドロスやバリの除去が容易となる。
まず、溶解および鋳造されたオーステナイト系ステンレス鋼からなる鋳塊に熱間圧延を行って、例えば板厚が3.0mmの熱延鋼帯とし、さらに、図1に第1中間焼鈍→第1中間圧延→第2中間焼鈍→第2中間圧延→最終焼鈍と示すように、冷間圧延及び焼鈍を少なくとも1回ずつ行って、目的とする板厚の冷間圧延オーステナイト系ステンレス鋼板を得る。通常、冷間圧延と焼鈍の繰り返しは2回〜3回程度行われる。最後の冷間圧延後の焼鈍が最終焼鈍であり、これは一般に光輝焼鈍(鋼板表面の酸化を防止するために不活性ガスまたは真空中で行われる焼鈍)により行われる。それより前の中間焼鈍は、大気中での連続焼鈍により行われ、焼鈍後に酸洗して表面のスケールを除去する。
歪取り焼鈍の温度が500℃未満であると、歪が十分に除去されずレーザー加工時に反りが発生し易く、820℃超であると、転位が消失し始め、軟化が急速に進む。歪取り焼鈍の時間が5秒間未満であると、鋼板温度が設定温度に未達となり、150秒間超であると生産性が劣る。このため、歪とり焼鈍は、500〜820℃で5〜150秒間の条件で行うことが望ましい。歪取り焼鈍はより好ましくは600〜820℃で10〜150秒間の条件で行われ、さらに好ましくは700〜820℃で10〜150秒間の条件で行われる。
d≦0.0448・t−1.28 ・・・ (1)
を満足することによって、レーザー照射による狭い範囲への溶込みが可能となり、これにより、細孔の加工精度の向上を図ることができる。
表1に示す化学組成を有するオーステナイト系ステンレス鋼A1、A2、B1、B2、及びフェライト系ステンレス鋼Cを溶製してスラブとなし、通常の方法で熱間圧延を行った。オーステナイト系ステンレス鋼A1、A2はSUS301Lベースの鋼材であり、オーステナイト系ステンレス鋼B1、B2はSUS304であり、フェライト系ステンレス鋼CはSUS430である。得られた熱間圧延ステンレス鋼板に、焼鈍酸洗ラインにおいて焼鈍及び脱スケールを行った後に、冷間圧延及び焼鈍を2回繰り返し、最終冷間圧延率及び最終焼鈍温度を表3に記載の様に変化させ、150〜300μm(0.15〜0.30mm)厚のステンレス鋼板を得た。
最大ドロス厚みの測定には、レーザー加工を行ったステンレス鋼板を、細孔のほぼ中心を通るように切断した後、透明樹脂で埋め込んで作製した細孔断面試験片を用いた。この試験片の切断断面に、研磨後に10%しゅう酸を用いて電解エッチングを施し、1000倍の光学顕微鏡またはSEM(走査型電子顕微鏡)によりドロス厚さを測定し、任意に選んだ10か所の測定点の内、最大の厚みを最大ドロス高さとした。
反り曲率増加量ρの評価基準
優: ρ≦0.0030
良: 0.0031>ρ≧0.0100
不良: 0.0010>ρ≧0.0500
非常に不良:ρ>0.0500。
Claims (7)
- 平均結晶粒径d(μm)と、板厚t(μm)とが下記(1)式を満足することを特徴とする板厚tが400μm以下のレーザー加工メタルマスク用金属板。
d≦0.0448・t−1.28 ・・・・・・・(1) - 前記金属板がオーステナイト系ステンレス鋼板、フェライト系ステンレス鋼板、及びチタン板から選ばれる、請求項1に記載のレーザー加工メタルマスク用金属板。
- レーザー加工によって形成された細孔またはスリットからなるパターンを有する請求項1または2に記載のレーザー加工メタルマスク用金属板。
- 平均結晶粒径d(μm)と、板厚t(μm)とが下記(1)式を満足することを特徴とする板厚tが400μm以下のレーザーメタルマスク。
d≦0.0448・t−1.28 ・・・・・・・(1) - オーステナイト系ステンレス鋼に熱間圧延、冷間圧延及び焼鈍を行ってオーステナイト系ステンレス鋼板とした後に、該オーステナイト系ステンレス鋼板に30%以上の圧下率で最後の冷間圧延を行い、その後800〜950℃で25〜70秒の焼鈍を行うことを特徴とする、平均結晶粒径d(μm)と、板厚t(μm)とが下記(1)式を満足する板厚tが400μm以下のレーザー加工メタルマスク用オーステナイト系ステンレス鋼板の製造方法。
d≦0.0448・t−1.28 ・・・・・・・(1) - 前記最後の冷間圧延とその後の焼鈍後に20%以上の圧下率で調質圧延を行う、請求項5に記載の方法。
- 前記調質圧延の後に、500〜820℃で5〜150秒間の歪とり焼鈍を行う、請求項6に記載の方法。
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ES2651023T3 (es) * | 2007-08-20 | 2018-01-23 | Jfe Steel Corporation | Chapa de acero inoxidable ferrítico excelente en cuanto a capacidad de troquelado y procedimiento para la producción de la misma |
JP5486936B2 (ja) | 2010-01-25 | 2014-05-07 | 株式会社ボンマーク | レーザ加工によるメタルマスクの化学研磨方法 |
KR101531453B1 (ko) * | 2010-10-18 | 2015-06-24 | 신닛테츠스미킨 카부시키카이샤 | 고속 변형 하에서의 균일 연성 및 국부 연성이 우수한 열연 강판, 냉연 강판 및 도금 강판 |
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2012
- 2012-02-29 US US14/002,398 patent/US20140060428A1/en not_active Abandoned
- 2012-02-29 CN CN201280021338.4A patent/CN103534373B/zh active Active
- 2012-02-29 WO PCT/JP2012/055047 patent/WO2012118113A1/ja active Application Filing
- 2012-02-29 KR KR1020137025790A patent/KR101877084B1/ko active IP Right Grant
- 2012-02-29 KR KR1020157036840A patent/KR20160005795A/ko not_active Application Discontinuation
- 2012-02-29 EP EP12752241.5A patent/EP2682490B1/en active Active
- 2012-02-29 JP JP2013502388A patent/JP5482962B2/ja active Active
- 2012-03-01 TW TW101106730A patent/TWI449796B/zh active
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2017
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US10744600B2 (en) | 2020-08-18 |
WO2012118113A1 (ja) | 2012-09-07 |
KR20160005795A (ko) | 2016-01-15 |
EP2682490A4 (en) | 2015-08-19 |
TW201300549A (zh) | 2013-01-01 |
CN103534373B (zh) | 2017-05-17 |
CN103534373A (zh) | 2014-01-22 |
JPWO2012118113A1 (ja) | 2014-07-07 |
TWI449796B (zh) | 2014-08-21 |
KR101877084B1 (ko) | 2018-07-10 |
EP2682490B1 (en) | 2019-08-28 |
US20140060428A1 (en) | 2014-03-06 |
KR20130133012A (ko) | 2013-12-05 |
US20170239755A1 (en) | 2017-08-24 |
EP2682490A1 (en) | 2014-01-08 |
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