JP5367338B2 - 表示装置の作製方法 - Google Patents
表示装置の作製方法 Download PDFInfo
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- JP5367338B2 JP5367338B2 JP2008270668A JP2008270668A JP5367338B2 JP 5367338 B2 JP5367338 B2 JP 5367338B2 JP 2008270668 A JP2008270668 A JP 2008270668A JP 2008270668 A JP2008270668 A JP 2008270668A JP 5367338 B2 JP5367338 B2 JP 5367338B2
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1288—Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136231—Active matrix addressed cells for reducing the number of lithographic steps
- G02F1/136236—Active matrix addressed cells for reducing the number of lithographic steps using a grey or half tone lithographic process
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Thin Film Transistor (AREA)
- Liquid Crystal (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Recrystallisation Techniques (AREA)
Description
(実施の形態1)
本実施の形態では、薄膜トランジスタを有する表示装置及びその作製工程について、図1乃至図7を用いて説明する。
本実施の形態は、実施の形態1において、薄膜トランジスタの形状が異なる例である。従って、他は実施の形態1と同様に行うことができ、実施の形態1と同一部分又は同様な機能を有する部分、及び工程の繰り返しの説明は省略する。
本実施の形態では、実施の形態2において微結晶半導体膜にレーザ光を照射する作製工程例を説明する。
次に、本発明の表示装置の一形態である表示パネルの構成について、以下に示す。本実施の形態の表示装置は液晶表示素子を有する液晶表示装置の一形態である液晶表示パネルの例を示す。
本発明により得られる表示装置等によって、表示モジュールに用いることができる。即ち、それらを表示部に組み込んだ電子機器全てに本発明を実施できる。
Claims (1)
- 第1のソース配線層、第2のソース配線層、及び、前記第1のソース配線層と前記第2のソース配線層とに挟まれたゲート配線層を同じ工程で形成し、
前記第1のソース配線層、前記第2のソース配線層、及び前記ゲート配線層上にゲート絶縁層を形成し、
前記ゲート絶縁層上に第1の半導体膜及び一導電型を付与する不純物が添加された第2の半導体膜を積層し、
前記第2の半導体膜上に第1のマスク層を形成し、
前記第1のマスク層を用いて前記ゲート絶縁層、前記第1の半導体膜及び前記第2の半導体膜をエッチングして、前記第1のソース配線層に達する第1の開口、及び前記第2のソース配線層に達する第2の開口を形成し、
前記第1のマスク層をアッシングして第2のマスク層を形成し、
前記第2のマスク層を用いて前記第1の半導体膜及び前記第2の半導体膜をエッチングして、第1の半導体層及び一導電型を付与する不純物が添加された第2の半導体層を形成し、
前記ゲート配線層、前記第1のソース配線層、前記第2のソース配線層、前記ゲート絶縁層、前記第1の半導体層及び前記第2の半導体層上に透光性導電膜及び導電膜の積層を形成し、
前記透光性導電膜及び前記導電膜上に第3のマスク層を形成し、
前記第3のマスク層を用いて前記第1の半導体層、前記第2の半導体層、前記透光性導電膜及び前記導電膜をエッチングして、凹部を有する半導体層、ソース領域、ドレイン領域、並びに透光性導電層と導電層との積層を形成し、
前記第3のマスク層をアッシングして第4のマスク層を形成し、
前記第4のマスク層を用いて、前記導電層を選択的にエッチングして前記透光性導電層を露出させて画素電極層を形成するとともに、前記第1の開口及び前記第2の開口を介して前記第1のソース配線層及び前記第2のソース配線層を電気的に接続するソース電極層又はドレイン電極層を形成し、
前記第1のマスク層及び前記第3のマスク層は、透過した光が複数の強度となる露光マスクを用いて形成し、
前記凹部を有する半導体層は、前記ソース領域及び前記ドレイン領域と重なる領域の膜厚より薄い膜厚の領域を有することを特徴とする表示装置の作製方法。
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