JP5310549B2 - 低屈折率被膜形成用塗布液、その製造方法及び反射防止材 - Google Patents

低屈折率被膜形成用塗布液、その製造方法及び反射防止材 Download PDF

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Publication number
JP5310549B2
JP5310549B2 JP2009515214A JP2009515214A JP5310549B2 JP 5310549 B2 JP5310549 B2 JP 5310549B2 JP 2009515214 A JP2009515214 A JP 2009515214A JP 2009515214 A JP2009515214 A JP 2009515214A JP 5310549 B2 JP5310549 B2 JP 5310549B2
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Japan
Prior art keywords
amine compound
polysiloxane
coating
carbon atoms
film
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JP2009515214A
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English (en)
Japanese (ja)
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JPWO2008143186A1 (ja
Inventor
隆之 根木
賢一 元山
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Nissan Chemical Corp
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Nissan Chemical Corp
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Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Priority to JP2009515214A priority Critical patent/JP5310549B2/ja
Publication of JPWO2008143186A1 publication Critical patent/JPWO2008143186A1/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Silicon Polymers (AREA)
JP2009515214A 2007-05-18 2008-05-16 低屈折率被膜形成用塗布液、その製造方法及び反射防止材 Active JP5310549B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009515214A JP5310549B2 (ja) 2007-05-18 2008-05-16 低屈折率被膜形成用塗布液、その製造方法及び反射防止材

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007132683 2007-05-18
JP2007132683 2007-05-18
PCT/JP2008/059070 WO2008143186A1 (ja) 2007-05-18 2008-05-16 低屈折率被膜形成用塗布液、その製造方法及び反射防止材
JP2009515214A JP5310549B2 (ja) 2007-05-18 2008-05-16 低屈折率被膜形成用塗布液、その製造方法及び反射防止材

Publications (2)

Publication Number Publication Date
JPWO2008143186A1 JPWO2008143186A1 (ja) 2010-08-05
JP5310549B2 true JP5310549B2 (ja) 2013-10-09

Family

ID=40031887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009515214A Active JP5310549B2 (ja) 2007-05-18 2008-05-16 低屈折率被膜形成用塗布液、その製造方法及び反射防止材

Country Status (5)

Country Link
JP (1) JP5310549B2 (ko)
KR (1) KR101463641B1 (ko)
CN (1) CN101679805B (ko)
TW (1) TWI537349B (ko)
WO (1) WO2008143186A1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101535430B (zh) * 2006-11-14 2012-02-08 日产化学工业株式会社 低折射率被膜形成用涂布液及其制造方法以及防反射材料
JP2022011583A (ja) * 2020-06-30 2022-01-17 日本電産株式会社 光学部材の製造方法及び光学部材

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09208898A (ja) * 1995-12-01 1997-08-12 Nissan Chem Ind Ltd 低屈折率及び撥水性を有する被膜
WO2005059051A1 (ja) * 2003-12-19 2005-06-30 Nissan Chemical Industries, Ltd. 低屈折率及び大きい水接触角を有する被膜
WO2007102514A1 (ja) * 2006-03-07 2007-09-13 Nissan Chemical Industries, Ltd. 被膜形成用塗布液、その製造方法、その被膜、及び反射防止材
WO2008044742A1 (fr) * 2006-10-12 2008-04-17 Nissan Chemical Industries, Ltd. Solution de revêtement pour former un film de revêtement de faible réfraction, procédé de production de celle-ci, et matériau anti-réflexion

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW376408B (en) 1995-12-01 1999-12-11 Nissan Chemical Ind Ltd Coating film having water repellency and low refractive index
JP4136046B2 (ja) * 1998-02-03 2008-08-20 ダイキン工業株式会社 塗料用組成物
JP2003025510A (ja) * 2001-07-16 2003-01-29 Shin Etsu Chem Co Ltd 反射防止性及び耐擦傷性を有する多層積層体
US7652115B2 (en) 2003-09-08 2010-01-26 3M Innovative Properties Company Fluorinated polyether isocyanate derived silane compositions
TW200530350A (en) * 2003-12-18 2005-09-16 Nissan Chemical Ind Ltd Water repellent coating film having low refractive index
CN101535430B (zh) * 2006-11-14 2012-02-08 日产化学工业株式会社 低折射率被膜形成用涂布液及其制造方法以及防反射材料

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09208898A (ja) * 1995-12-01 1997-08-12 Nissan Chem Ind Ltd 低屈折率及び撥水性を有する被膜
WO2005059051A1 (ja) * 2003-12-19 2005-06-30 Nissan Chemical Industries, Ltd. 低屈折率及び大きい水接触角を有する被膜
WO2007102514A1 (ja) * 2006-03-07 2007-09-13 Nissan Chemical Industries, Ltd. 被膜形成用塗布液、その製造方法、その被膜、及び反射防止材
WO2008044742A1 (fr) * 2006-10-12 2008-04-17 Nissan Chemical Industries, Ltd. Solution de revêtement pour former un film de revêtement de faible réfraction, procédé de production de celle-ci, et matériau anti-réflexion

Also Published As

Publication number Publication date
JPWO2008143186A1 (ja) 2010-08-05
CN101679805A (zh) 2010-03-24
WO2008143186A1 (ja) 2008-11-27
TWI537349B (zh) 2016-06-11
KR101463641B1 (ko) 2014-11-19
KR20100016601A (ko) 2010-02-12
CN101679805B (zh) 2013-02-27
TW200916540A (en) 2009-04-16

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