JP5307466B2 - 半導体レーザ及びその駆動方法、並びに、半導体レーザ装置 - Google Patents
半導体レーザ及びその駆動方法、並びに、半導体レーザ装置 Download PDFInfo
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- JP5307466B2 JP5307466B2 JP2008194373A JP2008194373A JP5307466B2 JP 5307466 B2 JP5307466 B2 JP 5307466B2 JP 2008194373 A JP2008194373 A JP 2008194373A JP 2008194373 A JP2008194373 A JP 2008194373A JP 5307466 B2 JP5307466 B2 JP 5307466B2
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- Prior art keywords
- semiconductor laser
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- peak
- compound semiconductor
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
- H01S5/06216—Pulse modulation or generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0428—Electrical excitation ; Circuits therefor for applying pulses to the laser
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Description
Vth=R×Ith+V0
の関係がある。ここで、V0は、p−n接合のビルドインポテンシャルである。
半導体レーザは、第1化合物半導体層、量子井戸構造を有する活性層、及び、第2化合物半導体層から成る積層構造体、第1化合物半導体層に電気的に接続された第1電極、並びに、第2化合物半導体層に電気的に接続された第2電極を備えており、
積層構造体は、AlGaInN系化合物半導体から成る構成、即ち、半導体レーザはGaN系半導体レーザである構成とすることができる。
V1=R×I1+V0≒V0=3ボルト
で与えられる。但し、配線抵抗、配線と半導体レーザ20との接触抵抗等は無視している。図1の(B)に示した回路構成にあっては、図1の(D)に示すように、半導体レーザ20に印加される電圧は、時間幅tpの矩形状のパルス電圧V2である。
第2化合物半導体層50
p型GaNコンタクト層(Mgドープ)55
p型GaN(Mgドープ)/AlGaN超格子クラッド層54
p型AlGaN電子障壁層(Mgドープ)53
ノンドープAlGaNクラッド層52
ノンドープGaInN光ガイド層51
活性層40
GaInN量子井戸活性層
(井戸層:Ga0.92In0.08N/障壁層:Ga0.98In0.02N)
第1化合物半導体層30
n型GaNクラッド層32
n型AlGaNクラッド層31
直流定電流I1 :0.1ミリアンペア
パルス幅tp :2ナノ秒
パルスの繰り返し周波数f:100kHz
直流定電流I1 :0.1ミリアンペア
パルス幅tp :2ナノ秒
パルスの繰り返し周波数f:100kHz
パルス電圧V2 :45ボルト
直流定電流I1 0.1mA 3mA
半導体レーザ−A 19ボルト 40ボルト
半導体レーザ−B 13ボルト 26ボルト
半導体レーザ−C 10ボルト 23ボルト
Claims (4)
- 第1化合物半導体層、量子井戸構造を有する活性層、及び、第2化合物半導体層から成る積層構造体、第1化合物半導体層に電気的に接続された第1電極、並びに、第2化合物半導体層に電気的に接続された第2電極を備えており、
積層構造体がAlGaInN系化合物半導体から成る半導体レーザを、閾値電流の値の10倍以上の値を有するパルス電流で駆動し、以て、3ワット以上の光強度を有し、半値幅が20ピコ秒以下の尖頭ピークを有するレーザ光を出射する半導体レーザの駆動方法。 - パルス電流の幅は10ナノ秒以下である請求項1に記載の半導体レーザの駆動方法。
- 半導体レーザは、リッジストライプ型の分離閉じ込めヘテロ構造を有する半導体レーザである請求項1又は請求項2に記載の半導体レーザの駆動方法。
- 第2化合物半導体層は、p型GaN層及びp型AlGaN層が交互に積層された超格子構造を有し、
超格子構造の厚さは0.7μm以下である請求項1乃至請求項3のいずれか1項に記載の半導体レーザの駆動方法。
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008194373A JP5307466B2 (ja) | 2008-07-29 | 2008-07-29 | 半導体レーザ及びその駆動方法、並びに、半導体レーザ装置 |
US12/506,713 US8111723B2 (en) | 2008-07-29 | 2009-07-21 | Method of driving a laser diode |
EP11001865A EP2367245A3 (en) | 2008-07-29 | 2009-07-28 | GaN laser diode and method of driving a laser diode |
EP09009752A EP2149944A1 (en) | 2008-07-29 | 2009-07-28 | Method of driving a laser diode |
KR1020090068648A KR20100012837A (ko) | 2008-07-29 | 2009-07-28 | 반도체 레이저 및 그 구동 방법, 및 반도체 레이저 장치 |
CN2009101606855A CN101640374B (zh) | 2008-07-29 | 2009-07-29 | 驱动激光二极管的方法 |
CN201110358564.9A CN102420387B (zh) | 2008-07-29 | 2009-07-29 | 驱动激光二极管的方法 |
CN201110369269.3A CN102403650B (zh) | 2008-07-29 | 2009-07-29 | 激光二极管 |
US13/047,317 US8116343B2 (en) | 2008-07-29 | 2011-03-14 | Method of driving a laser diode |
US13/212,249 US8588264B2 (en) | 2008-07-29 | 2011-08-18 | Method of driving a laser diode |
US13/212,244 US8290005B2 (en) | 2008-07-29 | 2011-08-18 | Method of driving a laser diode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008194373A JP5307466B2 (ja) | 2008-07-29 | 2008-07-29 | 半導体レーザ及びその駆動方法、並びに、半導体レーザ装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010034252A JP2010034252A (ja) | 2010-02-12 |
JP2010034252A5 JP2010034252A5 (ja) | 2011-06-23 |
JP5307466B2 true JP5307466B2 (ja) | 2013-10-02 |
Family
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Family Applications (1)
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JP2008194373A Active JP5307466B2 (ja) | 2008-07-29 | 2008-07-29 | 半導体レーザ及びその駆動方法、並びに、半導体レーザ装置 |
Country Status (5)
Country | Link |
---|---|
US (4) | US8111723B2 (ja) |
EP (2) | EP2367245A3 (ja) |
JP (1) | JP5307466B2 (ja) |
KR (1) | KR20100012837A (ja) |
CN (3) | CN101640374B (ja) |
Families Citing this family (10)
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JP5307466B2 (ja) * | 2008-07-29 | 2013-10-02 | ソニー株式会社 | 半導体レーザ及びその駆動方法、並びに、半導体レーザ装置 |
JP5332462B2 (ja) * | 2008-09-29 | 2013-11-06 | ソニー株式会社 | 短パルス光源、レーザ光出射方法、光学装置、光ディスク装置及び光ピックアップ |
EP2214168A4 (en) * | 2008-10-03 | 2012-05-30 | Sony Corp | OPTICAL SENSOR, OPTICAL INFORMATION RECORDING METHOD, AND OPTICAL DISC DEVICE |
JP5636773B2 (ja) * | 2010-07-06 | 2014-12-10 | ソニー株式会社 | 半導体レーザ |
US9162350B2 (en) * | 2010-07-28 | 2015-10-20 | Eca Medical Instruments | Robust nose torque-limiting device |
JP6391904B2 (ja) | 2011-11-11 | 2018-09-19 | ソニー株式会社 | 半導体レーザ装置組立体 |
JP2014115121A (ja) * | 2012-12-06 | 2014-06-26 | Sony Corp | 微小粒子分析装置及び微小粒子分析方法 |
JP6123561B2 (ja) * | 2013-08-08 | 2017-05-10 | ソニー株式会社 | 発光素子及びその製造方法、並びに、表示装置 |
CN104457982A (zh) * | 2013-09-17 | 2015-03-25 | 中国科学院大连化学物理研究所 | 一种用于光谱测量中的增强脉冲型光源装置及其实现方法 |
WO2017126077A1 (ja) * | 2016-01-21 | 2017-07-27 | 三菱電機株式会社 | 通信システム、通信装置及び通信方法 |
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2008
- 2008-07-29 JP JP2008194373A patent/JP5307466B2/ja active Active
-
2009
- 2009-07-21 US US12/506,713 patent/US8111723B2/en not_active Expired - Fee Related
- 2009-07-28 KR KR1020090068648A patent/KR20100012837A/ko not_active Application Discontinuation
- 2009-07-28 EP EP11001865A patent/EP2367245A3/en not_active Withdrawn
- 2009-07-28 EP EP09009752A patent/EP2149944A1/en not_active Withdrawn
- 2009-07-29 CN CN2009101606855A patent/CN101640374B/zh not_active Expired - Fee Related
- 2009-07-29 CN CN201110369269.3A patent/CN102403650B/zh not_active Expired - Fee Related
- 2009-07-29 CN CN201110358564.9A patent/CN102420387B/zh not_active Expired - Fee Related
-
2011
- 2011-03-14 US US13/047,317 patent/US8116343B2/en not_active Expired - Fee Related
- 2011-08-18 US US13/212,244 patent/US8290005B2/en not_active Expired - Fee Related
- 2011-08-18 US US13/212,249 patent/US8588264B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN102403650A (zh) | 2012-04-04 |
EP2367245A2 (en) | 2011-09-21 |
KR20100012837A (ko) | 2010-02-08 |
CN101640374A (zh) | 2010-02-03 |
US20100027573A1 (en) | 2010-02-04 |
CN102420387A (zh) | 2012-04-18 |
CN102403650B (zh) | 2014-07-09 |
CN101640374B (zh) | 2013-04-03 |
EP2149944A1 (en) | 2010-02-03 |
US20110164632A1 (en) | 2011-07-07 |
US8290005B2 (en) | 2012-10-16 |
CN102420387B (zh) | 2014-07-09 |
EP2367245A3 (en) | 2012-10-31 |
US8111723B2 (en) | 2012-02-07 |
US20120002690A1 (en) | 2012-01-05 |
JP2010034252A (ja) | 2010-02-12 |
US8116343B2 (en) | 2012-02-14 |
US8588264B2 (en) | 2013-11-19 |
US20120002695A1 (en) | 2012-01-05 |
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