JP5236960B2 - Powder thin film feeder - Google Patents

Powder thin film feeder Download PDF

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JP5236960B2
JP5236960B2 JP2008026006A JP2008026006A JP5236960B2 JP 5236960 B2 JP5236960 B2 JP 5236960B2 JP 2008026006 A JP2008026006 A JP 2008026006A JP 2008026006 A JP2008026006 A JP 2008026006A JP 5236960 B2 JP5236960 B2 JP 5236960B2
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JP2009183856A (en
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恒美 林
誠 野副
達 小橋川
安裕 渡辺
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赤武エンジニアリング株式会社
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本発明は、ホッパなどに貯留した粉体を薄膜状にして供給する粉体薄膜供給装置に関する。   The present invention relates to a powder thin film supply apparatus that supplies powder stored in a hopper or the like in a thin film form.

粉体を薄膜状にして供給する粉体薄膜供給装置は、粉体中の異物の検知・除去、パン・菓子等の食品製造における手粉供給、粉体原料の吸水剤・滑り防止剤・食品味剤などのシート状にした供給など、種々の分野に用いられている。   Powder thin film supply equipment that supplies powder in a thin film form is to detect and remove foreign substances in powder, supply hand powder in the manufacture of foods such as bread and confectionery, water absorbent, anti-slip agent, food for powder raw materials It is used in various fields, such as feeding in the form of a sheet such as a taste agent.

粉体薄膜供給装置としては、ベルトコンベアによるもの、振動フィーダによるもの、長いロールを用いて隙間から供給するものなど、種々の装置が開発され実用されている(例えば、許文献1参照)。
特開2000−84496号公報(図1)
As the powder thin film supply device, various devices such as a device using a belt conveyor, a device using a vibration feeder, and a device supplying from a gap using a long roll have been developed and put into practical use (for example, see Permit Document 1).
Japanese Unexamined Patent Publication No. 2000-84496 (FIG. 1)

しかしながら、従来の粉体薄膜供給装置には、次のとおりの、さらなる改善の望まれている課題がある。   However, the conventional powder thin film supply apparatus has the following problems that are desired to be further improved.

すなわち、粉体が、特に薬品のような極微細粉の場合には、均一の薄膜にするのが難しい。また、粉体を薄膜にする過程において、ほとんどの粉体は粒子同士が付着する凝集現象を起こし、塊の発生、壁面に付着など、均一な薄膜を連続してつくることができない。粉体の流れる部分を振動させる、ハンマリングするなどしても、均一な薄い膜にすることはできなかった。   That is, when the powder is an extremely fine powder such as a chemical, it is difficult to form a uniform thin film. In addition, in the process of making a powder into a thin film, most powders cause an agglomeration phenomenon in which particles adhere to each other, and a uniform thin film cannot be continuously formed such as generation of lumps or adhesion to a wall surface. Even if the part where the powder flows is vibrated or hammered, a uniform thin film could not be obtained.

本発明は上記事実に鑑みてなされたもので、その技術的課題は、ホッパなどに貯留した粉体を、粉粒の大きさにかかわらず、薄い均一の膜厚で、連続定量的に、かつ凝集、付着を防止して、安定して供給することができる、新規な粉体薄膜供給装置を提供することである。   The present invention has been made in view of the above-mentioned facts, and its technical problem is that the powder stored in a hopper or the like is continuously and quantitatively measured with a thin uniform film thickness regardless of the size of the powder particles, and It is to provide a novel powder thin film supply apparatus that can prevent aggregation and adhesion and can supply stably.

本発明者は、種々実験および検討を重ねた結果、上記の技術的課題を解決することができる粉体薄膜供給装置を開発した。   As a result of various experiments and studies, the present inventor has developed a powder thin film supply apparatus that can solve the above technical problem.

すなわち、本発明によれば粉体薄膜供給装置として、周縁を水平に位置付けた円盤面を有してこの円の中心を通る鉛直軸線を中心に回転駆動を自在に配設された円盤体と、円盤体の上方の該鉛直軸線上に位置した粉体供給口を有して円盤面に粉体を連続定量的に供給する粉体供給機と、円盤体の回転および粉体の供給によって円盤面の外周から水平方向に散布される粉体の落下を案内する円盤体の外側を包囲した誘導外壁と、誘導外壁の下方に位置して下方に向けて傾斜し落下した粉体の流れを整える整流板とを備え、該誘導外壁が、該鉛直軸線を挟んで対向した一対の平行案内面を有した長穴状筒体に形成され、該整流板が、該一対の平行案内面それぞれに対向して一対備えられている、ことを特徴とする粉体薄膜供給装置が提供される。 That is, according to the present invention, as a powder thin film supply device, a disk body having a disk surface with the periphery positioned horizontally and freely arranged to rotate around a vertical axis passing through the center of the circle; A powder feeder having a powder feed port located on the vertical axis above the disc body and supplying powder continuously and quantitatively to the disc surface, and the disc surface by rotating the disc body and supplying the powder Guiding outer wall that surrounds the outside of the disc body that guides the fall of the powder sprayed horizontally from the outer periphery of the slab, and rectification that regulates the flow of the falling powder that is located below the guiding outer wall and is inclined downward And the guide outer wall is formed in a long cylindrical tube having a pair of parallel guide surfaces opposed to each other across the vertical axis, and the current plate is opposed to each of the pair of parallel guide surfaces. are provided a pair Te, it is provided a powder film supply apparatus characterized by.

好適には、該整流板の粉体の流下面は、裏面側から気体が均一に通気され、粉体の凝集・付着を防止する多孔板によって形成され、該円盤体の円盤面は、裏面側から気体が均一に通気され粉体の凝集・付着を防止する多孔板によって形成されている。 Preferably, a stream surface of the current plate of the powder is vented from the back side gas is uniformly formed by a porous plate you prevent powder aggregation and adhesion of a disc surface of the disc-body rear face gas is formed by a perforated plate you prevent uniform aggregation and adhesion of the aerated powder from the side.

本発明に従って構成された粉体薄膜供給装置は、円盤面を有して回転駆動される円盤体と、円盤面に粉体を連続定量的に供給する粉体供給機と、円盤面の外周縁から散布される粉体の落下を案内する誘導外壁と、その下方に位置して下方に向けて傾斜し落下した粉体の流れを整える整流板を備え、誘導外壁は、円盤体を挟んで対向した一対の平行案内面を有した長穴状筒体に形成され、整流板は、一対の平行案内面それぞれに対向して一対備えられている。 A powder thin film supply apparatus configured in accordance with the present invention includes a disk body that has a disk surface and is driven to rotate, a powder supply machine that continuously and quantitatively supplies powder to the disk surface, and an outer periphery of the disk surface A guide outer wall that guides the fall of the powder sprayed from and a baffle plate that is positioned below it and tilts downward to regulate the flow of the dropped powder . The guide outer wall faces the disc body A pair of rectifying plates are provided so as to face each of the pair of parallel guide surfaces .

したがって、円盤面に連続定量的に供給された粉体は、遠心力によって周縁に向けて均一に広げられ外周から均一で薄い膜状になって散布され、誘導外壁によって下方に傾斜した整流板上に案内され、整流板上を自重で流下し整流されるので、ホッパなどに貯留した粉体を、粉粒の大きさにかかわらず、薄い均一の膜厚で、連続定量的に、かつ凝集、付着を防止して、安定して供給することができる。   Therefore, the powder continuously and quantitatively supplied to the disk surface is uniformly spread toward the periphery by centrifugal force, spread in a uniform and thin film form from the outer periphery, and on the rectifying plate inclined downward by the induction outer wall. The powder is stored in a hopper and rectified with a thin uniform film thickness, continuously and quantitatively, regardless of the size of the powder. Adhesion is prevented and stable supply is possible.

以下、本発明に従って構成された粉体薄膜供給装置について、好適実施形態を図示している添付図面を参照して、さらに詳細に説明する。   Hereinafter, a powder thin film supply apparatus configured according to the present invention will be described in more detail with reference to the accompanying drawings illustrating preferred embodiments.

図1を参照して説明する。全体を番号2で示す粉体薄膜供給装置は、周縁を水平に位置付けた円盤面Fを有してこの円の中心を通る鉛直軸線Xを中心に回転駆動を自在に配設された円盤体4と、円盤体4の上方の鉛直軸線X上に位置した粉体供給口6を有して円盤面Fに粉体を連続定量的に供給する粉体供給機8と、円盤体4の回転および粉体の供給によって円盤面Fの外周から水平方向に散布される粉体の落下を案内する円盤体4の外側を包囲した誘導外壁10と、誘導外壁10の下方に位置して下方に向けて傾斜し落下した粉体の流れを整える整流板12を備えている。   A description will be given with reference to FIG. The powder thin film supply apparatus denoted as a whole by number 2 has a disk surface F with a peripheral edge positioned horizontally, and a disk body 4 that is rotatably arranged around a vertical axis X passing through the center of this circle. A powder supply device 8 having a powder supply port 6 located on the vertical axis X above the disk body 4 and continuously supplying powder to the disk surface F quantitatively; A guide outer wall 10 that surrounds the outside of the disc body 4 that guides the fall of the powder dispersed horizontally from the outer periphery of the disk surface F by the supply of powder, and is positioned below the guide outer wall 10 and directed downward. A rectifying plate 12 is provided for adjusting the flow of the powder that has been inclined and dropped.

円盤体4は、上面が平板の円盤面Fを備えた中空円盤状に形成され、下面が、下方に設置された駆動装置14から延びる駆動軸16に接続され支持されている。円盤面Fの中央には鉛直軸線Xを中心にして、粉体供給口6から供給された粉体を滑らかに円盤面Fに拡散させる環状突起4aが備えられている。円盤体4については後にさらに詳述する。   The disc body 4 is formed in a hollow disc shape having a flat disc surface F on its upper surface, and its lower surface is connected to and supported by a drive shaft 16 extending from a drive device 14 installed below. At the center of the disk surface F, there is provided an annular protrusion 4a for smoothly diffusing the powder supplied from the powder supply port 6 to the disk surface F with the vertical axis X as the center. The disk body 4 will be described in detail later.

粉体供給機8は、周知の例えば特公平4−53778号公報に開示されているもので、粉体貯槽8a内の底部に、外周部に複数個の計量室を有した回転テーブル8bを備え、回転テーブル8bを電動モータ8cによって所定方向に回転させることにより、計量室に流入した粉体が、回転に応じて順次粉体供給口6に送られるものである。   The powder feeder 8 is disclosed in, for example, a well-known Japanese Patent Publication No. 4-53778, and includes a rotary table 8b having a plurality of measuring chambers on the outer periphery at the bottom of the powder storage tank 8a. By rotating the rotary table 8b in a predetermined direction by the electric motor 8c, the powder flowing into the measuring chamber is sequentially sent to the powder supply port 6 according to the rotation.

図1とともに図2、図3を参照して説明する。誘導外壁10は、鉛直軸線Xを挟んで対向した一対の平行案内面10a、10aと、平行案内面10a、10aそれぞれの両端部を結ぶ円弧面10b、10bを有した長穴状筒体に形成され、上面は蓋板10cによって閉じられている。蓋板10cは粉体供給口6を形成する筒体に一体に取付けられている。   This will be described with reference to FIGS. 2 and 3 together with FIG. The guide outer wall 10 is formed in an elongated cylindrical body having a pair of parallel guide surfaces 10a and 10a facing each other across the vertical axis X and arcuate surfaces 10b and 10b connecting both ends of the parallel guide surfaces 10a and 10a. The upper surface is closed by the lid plate 10c. The lid plate 10 c is integrally attached to a cylinder that forms the powder supply port 6.

誘導外壁10の大きさは、一対の平行案内面10a、10aの間隔Lに対して一対の円弧面10b、10bの間隔は(π/2)Lに設定されている。平行案内面10a、10aそれぞれには、円盤面Fの半径方向外方に位置し円盤面Fから拡散される粉体を下方に向けて案内する断面三角形状の、円弧面10bまで延びた案内片10dが、互いを平行にして備えられている。   The size of the guide outer wall 10 is set such that the interval between the pair of arcuate surfaces 10b and 10b is (π / 2) L with respect to the interval L between the pair of parallel guide surfaces 10a and 10a. In each of the parallel guide surfaces 10a and 10a, a guide piece extending to the circular arc surface 10b having a triangular cross section for guiding downwardly the powder diffused from the disk surface F located radially outward of the disk surface F is provided. 10d are provided parallel to each other.

円盤体4の下方には下面に隣接して円筒状の上面が閉じられた誘導内壁11が備えられている。誘導内壁11は、円盤体4の外縁と略同じ大きさの外径を有し下方の整流板12まで延びている。円盤体4の円盤面Fの外周から水平方向に散布される粉体は、誘導外壁10とこの誘導内壁11の間の空間を通って落下する。   Below the disc body 4 is provided a guide inner wall 11 adjacent to the lower surface and having a cylindrical upper surface closed. The guide inner wall 11 has an outer diameter substantially the same as the outer edge of the disk body 4 and extends to the lower rectifying plate 12. The powder dispersed horizontally from the outer periphery of the disk surface F of the disk body 4 falls through the space between the guide outer wall 10 and the guide inner wall 11.

整流板12は、矩形平板状に形成され一対備えられ、それぞれが誘導外壁10の一対の平行案内面10a、10aに対向した位置に配設されている。一対の整流板12、12はそれぞれ傾斜角度θ、実施例においては45°、で下方に傾け上端を付き合わせ山形にして、その稜線に円直線軸線Xを直行させて配設されている。   The rectifying plates 12 are formed in a rectangular flat plate shape and are provided as a pair. The rectifying plates 12 are respectively disposed at positions facing the pair of parallel guide surfaces 10 a and 10 a of the guide outer wall 10. Each of the pair of rectifying plates 12 and 12 is inclined with an inclination angle θ, 45 ° in the embodiment, and is inclined downward with an upper end and a mountain shape, and a circular linear axis X is perpendicular to the ridgeline.

整流板12は、中空箱状に形成され、粉体が流れ落ちる流下面Rは、裏面側から気体が均一に通気される多孔板によって形成され、裏面側の箱状空間に気体が導入される。   The rectifying plate 12 is formed in a hollow box shape, and the flow lower surface R from which the powder flows is formed by a perforated plate in which gas is uniformly ventilated from the back side, and the gas is introduced into the box-like space on the back side.

図1とともに図4を参照して説明する。円盤体4の粉体が流れる円盤面Fも裏面の中空部側から気体が均一に通気される多孔板によって形成されている。   A description will be given with reference to FIG. 4 together with FIG. The disk surface F through which the powder of the disk body 4 flows is also formed by a perforated plate in which gas is uniformly ventilated from the hollow part side of the back surface.

整流板13および円盤体4の多孔板としては、周知の、エアレーション用、フィルター用などに用いられる、高分子ポリエチレンによる多孔質プラスチック成形体が採用されている。   As the rectifying plate 13 and the porous plate of the disk body 4, a well-known porous plastic molded body made of polymer polyethylene used for aeration, filter, or the like is employed.

円盤体4の駆動装置14は、駆動軸16を支持する支持部18と、支持部18の下端に取付けられ駆動軸16を回転作動させる電動モータ20を備えている。支持部18は、箱体18aの中に一体に取付けられた筒体18bを備え、駆動軸16は中空軸に形成されて筒体18bの中に一対の球軸受18cを介して回転自在に取付けられている。箱体18aの外部から導入される気体が、筒体18bの部分から中空の駆動軸16を通して円盤体4の中空部に送られる。   The drive device 14 of the disk body 4 includes a support portion 18 that supports the drive shaft 16 and an electric motor 20 that is attached to the lower end of the support portion 18 and rotates the drive shaft 16. The support portion 18 includes a cylindrical body 18b integrally attached to the box 18a, and the drive shaft 16 is formed as a hollow shaft and is rotatably attached to the cylindrical body 18b via a pair of ball bearings 18c. It has been. The gas introduced from the outside of the box 18a is sent from the cylindrical body 18b through the hollow drive shaft 16 to the hollow portion of the disk body 4.

主として図1を参照して説明する。一対の整流板12、12および円盤体4に通気する気体としての、圧力空気供給源22の圧力空気が、円盤体4の駆動装置14および一対の整流板12、12に、それぞれ開度調整自在な開閉弁24を介して供給される。多孔板を通す圧力空気は、主として粉体の付着を防止するためであり、粉体の流れを乱すものであってはならないので、その量は開閉弁24によって調整される。   A description will be given mainly with reference to FIG. The pressure air of the pressure air supply source 22 as gas that flows through the pair of rectifying plates 12 and 12 and the disk body 4 can be freely adjusted to the driving device 14 of the disk body 4 and the pair of rectifying plates 12 and 12, respectively. It is supplied through the open / close valve 24. The pressure air passing through the perforated plate is mainly for preventing the adhesion of the powder and should not disturb the flow of the powder.

上述したとおりの粉体薄膜供給装置2の作用効果について説明する。   The effect of the powder thin film supply apparatus 2 as described above will be described.

粉体薄膜供給装置2は、円盤面Fを有して回転駆動される円盤体4と、円盤面Fに粉体を連続定量的に供給する粉体供給機8と、円盤面Fの外周縁から散布される粉体の落下を案内する誘導外壁10と、その下方に位置して下方に向けて傾斜し落下した粉体の流れを整える整流板12を備えている。   The powder thin film supply device 2 includes a disk body 4 that has a disk surface F and is rotationally driven, a powder supply device 8 that continuously and quantitatively supplies powder to the disk surface F, and an outer peripheral edge of the disk surface F. And a guide outer wall 10 for guiding the fall of the powder sprayed from the bottom, and a rectifying plate 12 that is positioned below and guides the flow of the fallen powder that is inclined downward.

そして、円盤面Fに連続定量的に供給された粉体は、遠心力によって周縁に向けて均一に広げられ、外周から均一で薄い膜状になって散布され、誘導外壁10によって整流板12上に案内され、下方に傾斜した整流板12上を自重によって流れ落ち整流される。したがって、ホッパなどに貯留した粉体を、粉粒の大きさにかかわらず、薄い均一の膜厚で、連続定量的に、さらに粉体の凝集、付着を防止して、安定して供給することができる。   Then, the powder continuously and quantitatively supplied to the disk surface F is uniformly spread toward the periphery by centrifugal force, and is dispersed in the form of a uniform and thin film from the outer periphery, and on the current plate 12 by the guide outer wall 10. And flows down on the rectifying plate 12 inclined downward by its own weight to be rectified. Therefore, the powder stored in the hopper, etc. can be supplied stably in a thin and uniform film thickness, continuously and quantitatively, further preventing the powder from agglomerating and adhering, regardless of the size of the particles. Can do.

また、誘導外壁10は、鉛直軸線Xを挟んで対向した一対の平行案内面10a、10aを有した長穴状筒体に形成され、整流板12は、一対の平行案内面10a、10aそれぞれに対向して一対備えられている。したがって、一対の平行案内面10a、10aを備えた誘導外壁10は、円盤面Fから遠心力によって散布された薄い膜状になった粉体を、平行案内面10a、10aに対向した下方の一対の整流板12、12上に薄い膜状で案内することができる。   The guide outer wall 10 is formed in an elongated cylindrical body having a pair of parallel guide surfaces 10a, 10a facing each other across the vertical axis X, and the rectifying plate 12 is formed on each of the pair of parallel guide surfaces 10a, 10a. A pair is provided facing each other. Therefore, the guide outer wall 10 provided with a pair of parallel guide surfaces 10a and 10a is formed of a thin film-like powder dispersed from the disk surface F by centrifugal force, and a pair of lower portions facing the parallel guide surfaces 10a and 10a. Can be guided in the form of a thin film on the current plate 12, 12.

さらに、整流板12の粉体の流下面Rは、裏面側から気体が均一に通気される多孔板によって形成され、円盤体4の円盤面Fも、裏面側から気体が均一に通気される多孔板によって形成されている。したがって、粉体の流下面Rおよび円盤面Fへの凝集・付着を確実に防止でき、薄い均一の膜厚を容易に形成することができる。   Further, the powder flow surface R of the rectifying plate 12 is formed by a porous plate through which gas is uniformly ventilated from the back surface side, and the disk surface F of the disk body 4 is also porous from which gas is uniformly vented from the back surface side. It is formed by a plate. Therefore, the powder can be reliably prevented from aggregating and adhering to the flow lower surface R and the disk surface F, and a thin uniform film thickness can be easily formed.

以上、本発明を実施例に基づいて詳細に説明したが、本発明は上記の実施例に限定されるものではなく、例えば下記のように、本発明の範囲内においてさまざまな変形あるいは修正ができるものである。   The present invention has been described in detail based on the embodiments. However, the present invention is not limited to the above-described embodiments, and various changes or modifications can be made within the scope of the present invention, for example, as described below. Is.

本発明の実施の形態においては、整流板12の傾斜角度θは45°に設定したが、粉体の性状などに応じて、角度θは適宜に設定すればよい。   In the embodiment of the present invention, the inclination angle θ of the rectifying plate 12 is set to 45 °. However, the angle θ may be appropriately set according to the properties of the powder.

本発明に従って構成された粉体薄膜供給装置の側面図。The side view of the powder thin film supply apparatus comprised according to this invention. 図1のA−A方向に見た断面図。Sectional drawing seen in the AA direction of FIG. 図1のB−B方向に見た断面図。Sectional drawing seen in the BB direction of FIG. 円盤体の駆動装置の詳細図。FIG.

符号の説明Explanation of symbols

2:粉体薄膜供給装置
4:円盤体
6:粉体供給口
8:粉体供給機
10:誘導外壁
10a:平行案内面
11:誘導内壁
F:円盤面
X:鉛直軸線
2: Powder thin film supply device 4: Disk body 6: Powder supply port 8: Powder supply machine 10: Guide outer wall 10a: Parallel guide surface 11: Guide inner wall F: Disk surface X: Vertical axis

Claims (3)

周縁を水平に位置付けた円盤面を有してこの円の中心を通る鉛直軸線を中心に回転駆動を自在に配設された円盤体と、
円盤体の上方の該鉛直軸線上に位置した粉体供給口を有して円盤面に粉体を連続定量的に供給する粉体供給機と、
円盤体の回転および粉体の供給によって円盤面の外周から水平方向に散布される粉体の落下を案内する円盤体の外側を包囲した誘導外壁と、
誘導外壁の下方に位置して下方に向けて傾斜し落下した粉体の流れを整える整流板とを備え
該誘導外壁が、該鉛直軸線を挟んで対向した一対の平行案内面を有した長穴状筒体に形成され、
該整流板が、該一対の平行案内面それぞれに対向して一対備えられている、
ことを特徴とする粉体薄膜供給装置。
A disc body having a disc surface with the periphery positioned horizontally and freely arranged to rotate around a vertical axis passing through the center of the circle;
A powder feeder having a powder feed port located on the vertical axis above the disc body and continuously and quantitatively supplying powder to the disc surface;
A guide outer wall that surrounds the outside of the disk body that guides the fall of the powder that is dispersed horizontally from the outer periphery of the disk surface by rotating the disk body and supplying the powder;
A rectifying plate that is positioned below the outer guiding wall and that inclines downward and adjusts the flow of the powder that has fallen ;
The guide outer wall is formed in an elongated cylindrical body having a pair of parallel guide surfaces facing each other across the vertical axis,
A pair of the current plates are provided opposite to the pair of parallel guide surfaces ,
The powder thin film supply apparatus characterized by the above-mentioned.
該整流板の粉体の流下面が、裏面側から気体が均一に通気され粉体の凝集・付着を防止する多孔板によって形成されている、
ことを特徴とする請求項1記載の粉体薄膜供給装置。
Falling surface of the rectifying plate of the powder is, the gas from the back side is formed by a perforated plate you prevent uniform aggregation and adhesion of the aerated powder,
Powder film supply apparatus according to claim 1 Symbol mounting, characterized in that.
該円盤体の円盤面が、裏面側から気体が均一に通気され粉体の凝集・付着を防止する多孔板によって形成されている、
ことを特徴とする請求項1または2記載の粉体薄膜供給装置。
Disc plane of the disc-body, the gas from the back side is formed by a perforated plate you prevent uniform aggregation and adhesion of the aerated powder,
The powder thin film supply apparatus according to claim 1 or 2, wherein
JP2008026006A 2008-02-06 2008-02-06 Powder thin film feeder Active JP5236960B2 (en)

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JPS5127568A (en) * 1974-08-29 1976-03-08 Anzai Seisakusho Kokuryu no senbetsukiko
JP2001046980A (en) * 1999-08-12 2001-02-20 C & R Separator:Kk Sorting machine
JP2002241819A (en) * 2001-02-09 2002-08-28 Nkk Corp Device for blowing fine grain ore
JP4509712B2 (en) * 2004-09-13 2010-07-21 五大エンボディ株式会社 Granule sorter
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