JP5189446B2 - Hatake-shimeji fungus bed cultivation method - Google Patents

Hatake-shimeji fungus bed cultivation method Download PDF

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JP5189446B2
JP5189446B2 JP2008247430A JP2008247430A JP5189446B2 JP 5189446 B2 JP5189446 B2 JP 5189446B2 JP 2008247430 A JP2008247430 A JP 2008247430A JP 2008247430 A JP2008247430 A JP 2008247430A JP 5189446 B2 JP5189446 B2 JP 5189446B2
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克彦 日下部
健一 大島
和嘉子 八木
勇二 橋元
郁之進 加藤
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Takara Bio Inc
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Description

本発明は、ハタケシメジ(学名:Lyophyllum decastes)の菌床栽培方法に関する。   The present invention relates to a method for cultivating fungus bed of Hatake shimeji (scientific name: Lyophyllum decades).

ハタケシメジは、夏から秋にかけて人家の近くや、畑、林地等に広く発生するきのこで、形はホンジメジに良く似ている。味は非常に良く、肉質はホンシメジより固くて歯切れの良いきのこであり、好んで食用とされている。   Hatake-shimeji is a mushroom that occurs widely in the vicinity of people's houses, in fields, and in forests from summer to autumn. The taste is very good and the meat quality is harder and more crisp than hon-shimeji mushroom, and it is preferred to be edible.

近年、エノキタケ、ヒラタケ、ブナシメジ、ナメコ等において、主に鋸屑と米糠を混合した培養基を用いて人工的に栽培を行う菌床栽培法が確立され、一年を通して四季に関係なく、安定してきのこが収穫できるようになっている。ハタケシメジについても食用きのことして有用なことから、栽培方法が種々検討されている。ハタケシメジの栽培方法において、子実体の発生工程、すなわち子実体原基形成の芽出し工程及び成熟子実体形成の生育工程は、通常、相対湿度が70〜100%の条件下で行われる。   In recent years, fungus bed cultivation methods have been established for artificial cultivation using a culture medium that is mainly mixed with sawdust and rice bran in enokitake, oyster mushrooms, beech shimeji, nameko, etc., and stable mushrooms throughout the year regardless of the seasons. Can be harvested. Hatake shimeji is also useful as an edible mushroom, and various cultivation methods have been studied. In the cultivation method of Hatake shimeji, the fruiting body generation process, that is, the bud formation process of the fruiting body primordial formation and the growth process of the mature fruiting body formation are usually performed under conditions of relative humidity of 70 to 100%.

相対湿度が70〜100%の条件下で生育工程が行われた場合、成熟子実体の傘形は野生でよく観察される平らなまんじゅう形が多く発生し、半球形やまんじゅう形を主体としたボリューム感のある傘形の子実体発生は少ない。そこで、特許文献1では、子実体原基形成時の芽出し工程及び/又は成熟子実体形成の生育工程を、相対湿度100%を超える高加湿条件下で行うハタケシメジの栽培方法が開発された。当該特許文献1の方法により、半球形やまんじゅう形を主体とした形状の優れた子実体が得られている。   When the growth process is carried out under conditions of 70-100% relative humidity, the umbrella shape of the mature fruit body has many flat bunches that are often observed in the wild, mainly hemispheres and bunju forms. There are few occurrences of umbrella-shaped fruit bodies with a sense of volume. Therefore, Patent Document 1 has developed a method for cultivating Hatake shimeji mushrooms in which the sprouting step during the formation of the fruiting body primordial and / or the growing process of the formation of the mature fruiting body is performed under highly humidified conditions exceeding 100% relative humidity. According to the method of Patent Document 1, a fruit body having an excellent shape mainly composed of a hemispherical shape or a bun shape is obtained.

ハタケシメジの菌床栽培では、子実体は通常株状で発生する。したがって、商品化に当たっては、株状のままで採取し、一部を分割したりすることはあっても、基本的にはその形状を維持させて商品化するのが主流である。しかしながら、栽培された株状のハタケシメジ子実体は、傘のまとまりに関して、大きさが不揃いで傘(茎)の方向に統一性がなく、株状のハタケシメジ子実体の特に周縁部の子実体が横方向や下方向に伸張した形態(本願明細書においてはこのような子実体の形態を「アバレ」と称する場合がある)や、茎が徒長した子実体が発生することがある。このような形状のアバレを含む株状子実体は製品として見た目が好ましくなく、著しい商品価値の低下を招く。また株状あるいは分割を施した子実体のトレイへの収納、包装においても、横方向や下方向に伸長したアバレの子実体はトレイに適切に納まらないことから、アバレ子実体部分は切断して製品には使用されないのが現状である。このため栽培されたハタケシメジの子実体に対する製品化率を下げる原因ともなっている。よってアバレの少ない整った株状の高品質なハタケシメジ子実体の菌床栽培方法の開発が求められている。   In the fungus bed cultivation of Hatake shimeji, fruit bodies usually occur in a stock form. Therefore, for commercialization, even if the stock is collected as it is and partly divided, it is basically the mainstream to commercialize it while maintaining its shape. However, the cultivated stock-shaped Hatake-Shimeji fruiting bodies are not uniform in size and the direction of the umbrella (stem) is not uniform, and the fruit-shaped Hatake-Shimeji fruiting bodies, especially the peripheral fruiting bodies, are lateral. There are cases in which a form extending in the direction or downward (in this specification, such a form of the fruiting body may be referred to as “abare”) or a fruiting body with an elongated stem may occur. The stock-like fruit body including such a shape of an irregularity is not preferable as a product, and causes a significant decrease in commercial value. In addition, when storing and packaging stock bodies or divided fruit bodies into trays, Abare fruit bodies that extend in the horizontal or downward direction do not fit properly in the tray, so the Abare fruit body parts must be cut off. It is currently not used for products. For this reason, it is also a cause of lowering the productization rate for the fruit bodies of cultivated Hatake-Shimeji. Therefore, there is a demand for the development of a method for cultivating the fungus bed of high quality Hatake Shimeji fruiting bodies that are well-stocked with little abalone.

また、ハタケシメジは生鮮食品であることから、鮮度管理は重大な課題である。収穫されたハタケシメジは、鮮度を少しでも長く保つために、低温流通されたり、店頭では冷蔵棚へ陳列されたりしている。   Moreover, freshness management is a serious issue because Hatake shimeji is a fresh food. Harvested shimeji mushrooms are distributed at low temperatures or kept on refrigerated shelves at stores to keep the freshness as long as possible.

特開平10−178890号JP-A-10-178890

本発明の目的は、高品質で製品化率が高く、保存性も良好な株状ハタケシメジ子実体を安定的に生産することのできるハタケシメジの菌床栽培方法を提供することにある。   An object of the present invention is to provide a fungus bed cultivation method for Hatake shimeji that can stably produce a stock-like Hatake shimeji fruiting body having a high quality, a high commercialization rate, and a good storage stability.

本発明者らは、ハタケシメジの菌床栽培における諸要素を鋭意検討した結果、栽培環境において、子実体原基の傘の着色が始まるころの環境制御管理がハタケシメジ子実体の発生形態や生産された子実体の保存性に極めて重要であることを見出し、本発明を完成させた。これまで、ハタケシメジの子実体の保存性に栽培環境が影響を与えるという知見も報告もなく、本発明者らにより初めて見出された驚くべき効果である。   As a result of earnestly examining the various elements in the fungus bed cultivation of Hatake shimeji, the present inventors found that the environmental control management at the start of coloring of the umbrella of the fruiting body primordial in the cultivation environment was the generation form and production of Hatake shimeji fruiting body The present invention was completed by finding that it is extremely important for the preservation of the fruiting body. So far, there has been no report that the cultivation environment has an influence on the storage stability of the fruit bodies of Hatake-shimeji, and this is a surprising effect that was first discovered by the present inventors.

すなわち、本発明を概説すれば、本発明の第1の発明は、ハタケシメジの菌床栽培方法における子実体原基の生育工程において、相対湿度を段階的に下げることを特徴とするハタケシメジの菌床栽培方法に関する。本発明の第1の発明の態様において、相対湿度を90〜120%の範囲内で段階的に下げることが好ましい。また、前期生育工程として相対湿度110〜120%の範囲内の加湿条件下での生育、及び後期生育工程として相対湿度90〜105%の範囲内の加湿条件下での生育を行なうことが好適である。更に、前期生育工程を110〜115%の範囲内又は115〜120%の範囲内の加湿条件下での生育、後期生育工程を90〜100%の範囲内又は95〜105%の範囲内の加湿条件下での生育を行なう事が好適である。また、後期生育工程において、相対湿度95〜105%の範囲内の加湿条件下で生育を行った後、更に相対湿度90〜100%の範囲内の加湿条件下で相対湿度を段階的に下げて生育を行ってもよい。本発明の第1の発明の別の態様として、芽出し工程での子実体原基形成を相対湿度115〜120%の範囲内の加湿条件下、子実体原基の前期生育工程を相対湿度110〜120%の範囲内の加湿条件下での生育、及び後期生育工程を相対湿度90〜105%の範囲内の加湿条件下での生育を行うことが好ましい。更に、前期生育工程を110〜115%の範囲内又は115〜120%の範囲内の加湿条件下での生育、後期生育工程を90〜100%の範囲内又は95〜105%の範囲内の加湿条件下での生育を行なうことが好ましい。また、後期生育工程において、相対湿度95〜105%の範囲内の加湿条件下で生育を行った後、更に相対湿度90〜100%の条件下で相対湿度を段階的に下げて生育を行なってもよい。芽出し工程は15〜17℃で9〜12日間、前期生育工程は14〜17℃で3〜10日間、及び後期生育工程は14〜17℃で3〜10日間で行うことが好ましい。さらに、芽出し工程のCO濃度は1500ppm以下、前期生育工程及び後期生育工程のCO濃度を1000〜2000ppmの環境条件下で行うことが好ましい。更に、仕込み時の菌床栽培用培養基の培地pHとしては、6.6〜8.0に維持することが好ましい。 That is, when the present invention is outlined, the first invention of the present invention is a fungus bed of Hatake shimeji mushroom characterized in that the relative humidity is lowered stepwise in the growth process of the fruiting body primordium in the method for cultivating the fungus bed of Hatake shimeji It relates to the cultivation method. In the first aspect of the present invention, the relative humidity is preferably lowered stepwise within a range of 90 to 120%. Further, it is preferable to perform growth under humidified conditions within the range of 110 to 120% relative humidity as the first growth step and growth under humidified conditions within the range of 90 to 105% relative humidity as the latter growth step. is there. Further, the first growth step is grown under humidified conditions within a range of 110 to 115% or 115 to 120%, and the latter growth step is humidified within a range of 90 to 100% or within a range of 95 to 105%. It is preferable to grow under conditions. Further, in the late growth process, after growing under humidified conditions within the range of 95-105% relative humidity, the relative humidity is further lowered stepwise under humidified conditions within the range of 90-100% relative humidity. You may grow. As another aspect of the first invention of the present invention, the fruiting body primordium formation in the sprouting step is performed under humidifying conditions within the range of 115 to 120% relative humidity, and the fruiting body primordium pre-growth step is performed at a relative humidity of 110 to 110%. It is preferable to perform growth under humidified conditions within a range of 120%, and to perform growth under humidified conditions within a range of 90 to 105% relative humidity in the late growth process. Further, the first growth step is grown under humidified conditions within a range of 110 to 115% or 115 to 120%, and the latter growth step is humidified within a range of 90 to 100% or within a range of 95 to 105%. It is preferable to grow under conditions. Further, in the late growth process, after growing under humidified conditions within the range of 95 to 105% relative humidity, the relative humidity is further lowered stepwise under conditions of 90 to 100% relative humidity. Also good. The germination step is preferably performed at 15 to 17 ° C. for 9 to 12 days, the early growth step is performed at 14 to 17 ° C. for 3 to 10 days, and the late growth step is preferably performed at 14 to 17 ° C. for 3 to 10 days. Furthermore, the CO 2 concentration of the sprouting process 1500ppm or less, it is preferable to carry out the CO 2 concentration of the year growth step and late growing process under ambient conditions of 1000-2000 ppm. Furthermore, it is preferable to maintain the culture medium pH of the culture medium for cultivating bacterial bed at the time of preparation at 6.6 to 8.0.

本発明により、ボリューム感のある半球形の良好な子実体形状を有し、傘のまとまりが良く製品化率の高く、保存性も良いハタケシメジ子実体を安定的に生産することのできるハタケシメジの菌床栽培方法が提供される。本発明は、商業的大規模の栽培において、特に有用である。   According to the present invention, a Hatake-shimeji fungus having a good hemispherical fruit body shape with a sense of volume, capable of stably producing a Hatake-shimeji fruit body having a good umbrella unity, a high productization rate, and good storage stability A floor cultivation method is provided. The present invention is particularly useful in commercial large scale cultivation.

以下、本発明を具体的に説明する。
本発明の菌床栽培方法に好適なハタケシメジの菌株の例としては、ハタケシメジK−3303株(FERM BP−4347)、ハタケシメジK−3304株(FERM BP−4348)、ハタケシメジK−3305株(FERM BP−4349)、ハタケシメジF−623株(FERM P−13165)、ハタケシメジF−1154株(FERM P−13166)、ハタケシメジF−1488株(FERM P−13167)、及びこれらの変異株等があるが、本発明で使用できる菌株はこれらの菌株に限られるものではない。
Hereinafter, the present invention will be specifically described.
Examples of Hatake shimeji strains suitable for the bed cultivation method of the present invention include Hatake shimeji K-3303 strain (FERM BP-4347), Hatake shimeji K-3304 strain (FERM BP-4348), Hatake shimeji K-3305 strain (FERM BP). -4349), Hatake-Shimeji F-623 strain (FERM P-13165), Hatake-Shimeji F-1154 strain (FERM P-13166), Hatake-Shimeji F-1488 strain (FERM P-13167), and mutants thereof. The strains that can be used in the present invention are not limited to these strains.

本願明細書において、相対湿度が100%を超える高加湿条件は、飽和水蒸気量以上に加湿を行い、水が霧として漂う状態を指す。本願明細書では、このような高加湿状態を数値化するために、測定に(株)鷺宮製作所製の装置(商品名:ヒューミアイ100)を用いた。該装置は、空気中の水分を加熱によって下げ、湿度センサーで検出後、加熱による低下分を補正する方法を用いている。このため、本装置が示す数値は、100%以下では、相対湿度と同じであるが、100%を超えると、空気中に含まれる水分量を水蒸気に換算して飽和水蒸気量との比で現した数値となる。すなわち、本発明において、相対湿度100%を超える高加湿条件下は、該装置により測定し、相対湿度100%に相当する表示数値100%を超える条件下を意味する。   In the specification of the present application, the high humidification condition in which the relative humidity exceeds 100% refers to a state where the water is humidified more than the saturated water vapor amount and the water drifts as fog. In the present specification, in order to quantify such a highly humidified state, an apparatus (trade name: Humiai 100) manufactured by Kashiwamiya Seisakusho Co., Ltd. was used for the measurement. The apparatus uses a method in which moisture in the air is lowered by heating, and after the detection by a humidity sensor, the decrease due to heating is corrected. For this reason, the numerical value indicated by this device is the same as the relative humidity below 100%, but if it exceeds 100%, the amount of water contained in the air is converted into water vapor and expressed as a ratio to the amount of saturated water vapor. It becomes the numerical value. That is, in the present invention, a highly humidified condition exceeding 100% relative humidity means a condition exceeding a display value of 100% corresponding to 100% relative humidity measured by the apparatus.

なお、加湿を行う方法は、超音波加湿器、蒸気式加湿器、噴霧式加湿器などの加湿器を用いるのが簡便である。これら加湿に用いる方法や加湿器は相対湿度を上記ヒューミアイ100の表示値として、90〜100%、95〜105%、110〜115%又は115〜120%の範囲内でそれぞれ制御することが可能な方法や装置であればよいが、これら範囲内での制御に限定されるものではなく、相対湿度90〜120%の範囲内で任意の加湿が制御可能であれば、用いる方法や装置に特に限定はない。   In addition, it is easy to use humidifiers, such as an ultrasonic humidifier, a steam-type humidifier, and a spray-type humidifier, as the method of humidifying. These humidification methods and humidifiers can control the relative humidity within the range of 90 to 100%, 95 to 105%, 110 to 115%, or 115 to 120% as the display value of the Humiai 100. Any method or apparatus may be used. However, the method and apparatus are not limited to these ranges, and the method and apparatus are not particularly limited as long as arbitrary humidification can be controlled within the range of 90 to 120% relative humidity. There is no.

本願明細書において「相対湿度を段階的に下げる」とは、例えば、ある相対湿度又は相対湿度の範囲を保った状態で一定期間子実体原基の生育を行い、その後、相対湿度又は相対湿度の範囲を下げ、当該相対湿度を下げた条件を保った状態で一定期間子実体原基の生育を行うことをいう。また、相対湿度を連続的に下げながら子実体原基の生育を行った場合においても、本願明細書で言う「相対湿度を段階的に下げる」に包含される。相対湿度を下げる条件の段階(回数)に特に限定はなく連続的に行ってもよいが、1〜2回が好適である。例えば、子実体原基の生育工程において、まず相対湿度110〜120%の範囲内の加湿条件下で生育を行い(前期生育工程)、次に前期生育工程の加湿条件より相対湿度を下げた条件、例えば相対湿度90〜105%の範囲内の加湿条件下で生育を行う(後期生育工程)。この場合、相対湿度を1段階下げたことを意味する。また、前期生育工程を相対湿度110〜120%の範囲内の加湿条件下で行い、後期生育工程において、まず相対湿度95〜105%の加湿条件下で生育を行った後、更に相対湿度を90〜100%に下げた加湿条件下で生育を行った場合、子実体原基の生育工程において、相対湿度を2段階下げたことを意味する。   In the present specification, “reducing relative humidity stepwise” means, for example, that the fruit body primordium is grown for a certain period of time while maintaining a certain relative humidity or relative humidity range, and then the relative humidity or relative humidity is increased. This refers to growing the fruiting body primordium for a certain period of time with the range lowered and the relative humidity lowered. Further, even when the fruiting body primordium is grown while continuously lowering the relative humidity, it is included in “reducing the relative humidity stepwise” in the present specification. The stage (number of times) for reducing the relative humidity is not particularly limited, and may be continuously performed, but is preferably 1 to 2 times. For example, in the growth process of the fruiting body primordium, the growth is first performed under humidified conditions within a range of 110 to 120% relative humidity (previous growth process), and then the relative humidity is lowered from the humidified conditions of the early growth process. For example, the growth is performed under humidified conditions in the range of 90 to 105% relative humidity (late growth process). In this case, it means that the relative humidity has been lowered by one step. In addition, the first growth step is performed under humidified conditions within a range of 110 to 120% relative humidity. In the latter growth step, first, growth is performed under humidified conditions with a relative humidity of 95 to 105%, and then the relative humidity is further increased to 90%. When grown under humidified conditions reduced to ˜100%, it means that the relative humidity was lowered by two stages in the growth process of the fruiting body primordium.

本発明のハタケシメジの菌床栽培方法としては、ビン栽培、袋栽培、箱栽培等を適用することができる。一例としてビン栽培による本発明のハタケシメジの菌床栽培方法について述べると、その方法とは培地調製、ビン詰め、殺菌、接種、培養、必要に応じて菌掻き、芽出し、生育、収穫の各工程からなる。次にこれらを具体的に説明するが、本発明はこれらに限定されるものではない。   As the fungus bed cultivation method of Hatake shimeji of the present invention, bottle cultivation, bag cultivation, box cultivation and the like can be applied. As an example, the fungus bed cultivation method of the Hatake shimeji mushroom of the present invention by bottle cultivation will be described. The method includes culture medium preparation, bottle filling, sterilization, inoculation, culture, if necessary, bacteria scraping, budding, growth, and harvesting. Become. Next, although these are demonstrated concretely, this invention is not limited to these.

培地調製とは、菌床栽培に用いる各種基材を計量、攪拌し、加水して菌床栽培に適した水湿潤状態になるように水分調整する工程をいう。ハタケシメジの菌床栽培用培養基(培地ともいう)の組成はハタケシメジ子実体の形成が良好な組成であればよく、例えば、鋸屑等の培地基材、腐葉土やバーク堆肥等の腐植性基材、及び米糠、フスマ等の栄養材の組合せや、鋸屑等の培地基材、米糠、フスマ等の栄養材、及び特開平5−192035号公報記載の発生率向上剤、すなわち下記(1)〜(4)からなる群から選択される1以上の材料(1)アルミニウム、(2)アルミニウム化合物、(3)アルカリ土類金属化合物、(4)オカラの組合せ、更には鋸屑等の培地基材、米糠等の栄養材、前出の特開平5−192035号公報記載の発生率向上剤、及び特開平7−303419号公報記載の菌廻り改善剤、すなわちクエン酸、リンゴ酸、アスコルビン酸、アルギン酸、イタコン酸、ケイ酸、コハク酸、マレイン酸、酒石酸、及び乳酸からなる群から選択される酸などを適宜培地に混合して使用することができる。なお、本発明に使用される鋸屑としては特に限定はなく、針葉樹や広葉樹由来の鋸屑が使用でき、例えばスギ鋸屑が使用できる。培地仕込み時のpHは、良好なハタケシメジ菌糸の培養を実施、培養日数を短縮化する観点から、6.6〜8.0に調整することが好ましい。   Medium preparation refers to a step of adjusting the moisture so that various substrates used for fungus bed cultivation are weighed, stirred, and added to a water-moist state suitable for fungus bed cultivation. The composition of the culture medium (also referred to as the medium) for the fungus bed cultivation of Hatake shimeji may be a composition with good formation of the fruit body of the bamboo shoot, such as a medium substrate such as sawdust, a humus substrate such as humus or bark compost, and Combinations of nutrients such as rice bran and bran, medium base materials such as sawdust, nutrients such as rice bran and bran, and the incidence rate improving agent described in JP-A-5-192035, that is, the following (1) to (4) One or more materials selected from the group consisting of: (1) aluminum, (2) aluminum compound, (3) alkaline earth metal compound, (4) combination of okara, further medium substrate such as sawdust, rice bran, etc. Nutrients, incidence improvers described in JP-A-5-192035, and fungus improvement agents described in JP-A-7-303419, namely citric acid, malic acid, ascorbic acid, alginic acid, itacone , Silicic acid, succinic acid, maleic acid, tartaric acid, and may be used by mixing an appropriate medium such as an acid selected from the group consisting of lactic acid. In addition, there is no limitation in particular as sawdust used for this invention, The sawdust derived from a conifer or a hardwood can be used, for example, a cedar sawdust can be used. It is preferable to adjust the pH at the time of preparation of the medium to 6.6 to 8.0 from the viewpoint of culturing good Hatake-shimeji mycelium and shortening the culture days.

ビン詰めとは、培地をビン容器に詰める工程である。通常、800〜1300mL容、好ましくは1100mL容の耐熱性広口培養ビンに、調製した培地を700〜900g、好ましくは約800g圧詰し、中央に1〜3cm程度の穴を開け、打栓する工程をいう。   Bottled is a process of filling a culture medium in a bottle container. Usually, 700 to 900 g, preferably about 800 g of the prepared medium is packed in a heat-resistant wide-mouth culture bottle having a volume of 800 to 1300 mL, preferably 1100 mL, and a hole of about 1 to 3 cm is formed in the center and plugged. Say.

殺菌とは、実質的に培地中のすべての微生物を死滅させる工程である。通常、常圧殺菌では95〜110℃、4〜12時間、高圧殺菌では101〜125℃、好ましくは120℃、30〜120分間行われる。   Sterilization is the process of killing virtually all microorganisms in the medium. Usually, normal pressure sterilization is performed at 95 to 110 ° C. for 4 to 12 hours, and high pressure sterilization is performed at 101 to 125 ° C., preferably 120 ° C. for 30 to 120 minutes.

接種とは、放冷された培地に種菌を植えつける工程である。種菌として液体種菌を使用する場合は、ハタケシメジ菌株をPGY等の液体培地で18〜28℃、好ましくは20〜25℃、3〜18日間、三角フラスコでの培養の場合、好ましくは10〜18日間、ジャーファーメンターでの培養の場合、好ましくは3〜6日間培養したものを用い、前記ビン詰めされた培地1ビン当り10〜50mLほどを無菌的に植えつける。また、種菌として固体種菌を使用する場合は、前記液体種菌接種済みの培養基を、18〜28℃、好ましくは20〜25℃で30〜90日間培養し、培養基全体にハタケシメジの菌糸が蔓延したものを固体種菌として用いることができ、前記ビン詰めされた培地1ビン当り20〜50gほど無菌的に植えつける。   Inoculation is a process of inoculating inoculum on a cooled medium. When a liquid inoculum is used as an inoculum, the Hatake shimeji strain is 18 to 28 ° C., preferably 20 to 25 ° C. for 3 to 18 days in a liquid medium such as PGY, and preferably 10 to 18 days for culturing in an Erlenmeyer flask. In the case of culturing with a jar fermenter, preferably one cultured for 3 to 6 days is used, and about 10 to 50 mL is aseptically planted per one bottle of the bottled medium. When a solid inoculum is used as an inoculum, the culture medium that has been inoculated with the liquid inoculum is cultured at 18 to 28 ° C., preferably 20 to 25 ° C. for 30 to 90 days. Can be used as a solid inoculum and is aseptically planted in an amount of 20 to 50 g per one bottle of the bottled medium.

培養とは、菌糸を生育、熟成させる工程である。通常、接種済みの菌床栽培用培養基を温度18〜28℃、湿度40〜80%において菌糸を蔓延させ、更に熟成をさせる。この工程は通常50〜120日間、好ましくは80日間前後行われる。菌掻きとは、培養基表面の種菌部分と培養基表面をかき取り、原基形成を促す工程で、通常菌掻き後は直ちにビン口まで水を入れ、直後〜5時間後に排水するが、この加水操作は省略することもできる。   Culture is a process of growing and aging mycelium. Usually, the inoculated culture medium for cultivating the mycelium is infested at a temperature of 18 to 28 ° C. and a humidity of 40 to 80%, and further matured. This step is usually performed for 50 to 120 days, preferably about 80 days. Bacteria scraping is a process of scraping off the inoculum part of the culture medium surface and the culture medium surface to promote primordial formation. Usually, after scraping the fungus, water is immediately put into the bottle mouth and drained immediately after 5 hours. Can be omitted.

芽出しとは、子実体原基を形成させる工程である。本発明の目的である半球形を主体とした、高品質な子実体を得るためには、温度10〜20℃、好ましくは15〜17℃、更に好適には15.5℃〜16.5℃、115〜120%の相対湿度下、照度1000ルクス以下、好適には10〜100ルクスで芽出しを行う。良好な芽出しを実施する観点からは、CO濃度は1500ppm以下にすることが好ましく、特に大規模栽培においては、CO濃度が1500ppmを超える環境となった場合、芽出し不良の危険率が高くなる。CO濃度は外気導入、例えば熱交換器と排気扉を併用することにより調節可能である。芽出しに要する日数としては、特に限定はないが、好適には9〜12日間が好ましい。また、高加湿で結露水が発生しやすいため、濡れを防ぐ目的で、菌床面を有孔ポリシートや波板等で覆ってもよく、また栽培ビンを倒立させて芽出しを実施してもよい。また、赤玉土や鹿沼土などの適当な覆土材を菌床面に添加してもよい。 Germination is the process of forming fruit body primordia. In order to obtain a high-quality fruit body mainly composed of a hemisphere, which is the object of the present invention, the temperature is 10 to 20 ° C, preferably 15 to 17 ° C, and more preferably 15.5 to 16.5 ° C. Sprouting at a relative humidity of 115 to 120% and an illuminance of 1000 lux or less, preferably 10 to 100 lux. From the viewpoint of carrying out good sprouting, the CO 2 concentration is preferably 1500 ppm or less, and especially in large-scale cultivation, when the CO 2 concentration exceeds 1500 ppm, the risk of budding failure increases. . The CO 2 concentration can be adjusted by introducing outside air, for example, by using a heat exchanger and an exhaust door together. The number of days required for germination is not particularly limited, but preferably 9 to 12 days. In addition, since dew condensation water is likely to occur due to high humidification, the fungus floor may be covered with a perforated polysheet or corrugated sheet for the purpose of preventing wetting. Good. Moreover, you may add an appropriate earth covering material, such as red jade soil and Kanuma soil, to the fungus floor.

生育とは、子実体原基から成熟子実体を形成させる工程である。本発明においては、相対湿度を90〜120%の範囲内で段階的に下げる環境下で実施される。例えば、前期生育工程と後期生育工程に分けて、後期生育工程では前期生育工程より相対湿度の範囲を下げた条件とすることにより、それぞれ異なった環境下で実施するのがよい。   Growth is the process of forming mature fruit bodies from the fruit body primordium. In this invention, it implements in the environment where relative humidity is reduced in steps within the range of 90 to 120%. For example, it is preferable to carry out in different environments by dividing the early growth process and the late growth process into conditions where the relative humidity range is lower than that in the early growth process.

前期生育工程は、温度10〜20℃、好ましくは14〜17℃、更に好適には14.5〜16.5℃、115〜120%、好ましくは115超〜120%の相対湿度下、照度200〜1000ルクスで3〜10日間、更に好ましくは5〜10日間、また更に好ましくは5〜7日間行われる。より形態の良いハタケシメジ子実体を得るためには、CO濃度を1000〜2000ppmに調節することが好ましく、特に大規模栽培においては、CO濃度が1000ppmより低い環境であった場合、茎の矮小化が発生する危険性が高くなり、また逆に2000ppmを超える環境であった場合、アバレや茎が徒長する危険性が高くなるため、いずれも製品化における歩留まり低下の原因となる。前期生育工程では結露水による濡れの影響を受けにくいので、被覆は施さない方が好ましい。 The pre-growth step is performed at a temperature of 10 to 20 ° C., preferably 14 to 17 ° C., more preferably 14.5 to 16.5 ° C., 115 to 120%, preferably over 115 to 120% relative humidity, and an illuminance of 200 It is performed at ˜1000 lux for 3 to 10 days, more preferably 5 to 10 days, and even more preferably 5 to 7 days. In order to obtain a more well-shaped Hatake shimeji fruiting body, it is preferable to adjust the CO 2 concentration to 1000 to 2000 ppm. Especially in large-scale cultivation, when the CO 2 concentration is lower than 1000 ppm, the stem is reduced. If the environment exceeds 2000 ppm, there is a higher risk of abalone and stem growth, and both cause a decrease in yield in commercialization. Since it is difficult to be affected by wetting with condensed water in the early growth process, it is preferable not to coat.

後期生育工程は、相対湿度95〜105%、温度10〜20℃、好ましくは14〜17℃、更に好適には14.5〜16.5℃、照度200〜1000ルクスで3〜10日間、更に好ましくは6〜10日間、また更に好ましくは6〜9日間行われる。このように後期生育工程の相対湿度を前期生育工程より下げた環境とすることで、よりボリューム感のある半球形の良好な子実体形状を有し、アバレの発生しにくい、かつ保存性の高いハタケシメジを得ることができる。更に、より形態の良好なハタケシメジ子実体を得るためには、前述の前期生育工程と同様にCO濃度を1000〜2000ppmに調節することが好ましい。また、後期生育工程では結露水による濡れの影響を受けにくいので、被覆は施さない方が好ましい。なお、前期生育工程から後期生育工程への移行時期については、生長した小子実体の傘の着色が始まったころを基準にして決定することもできる。 The late growth process comprises a relative humidity of 95 to 105%, a temperature of 10 to 20 ° C., preferably 14 to 17 ° C., more preferably 14.5 to 16.5 ° C., and an illuminance of 200 to 1000 lux for 3 to 10 days. Preferably it is performed for 6 to 10 days, and more preferably for 6 to 9 days. By making the relative humidity of the late growth process lower than that of the previous growth process in this way, it has a good fruit shape with a hemispherical shape with more volume, is less likely to generate abare, and has high storage stability Hatake shimeji can be obtained. Furthermore, in order to obtain a bamboo shoot image fruit body having a better form, it is preferable to adjust the CO 2 concentration to 1000 to 2000 ppm as in the above-mentioned early growth process. Moreover, since it is hard to receive the influence of the wetting by the dew condensation water in the latter stage growth process, it is preferable not to coat. In addition, the transition time from the early growth process to the late growth process can be determined based on the time when the umbrella of the grown child entity has started to be colored.

また、上記後期生育工程において、段階的に相対湿度を下げる工程としてもよい。例えば、後期生育工程1として相対湿度95〜105%、温度10〜20℃、好ましくは14〜17℃、更に好適には14.5〜16.5℃、照度200〜1000ルクスで3〜7日間生育を行う。その後、後期生育工程2として相対湿度90〜100%、温度10〜20℃、好ましくは14〜17℃、更に好適には14.5〜16.5℃、照度200〜1000ルクスで3〜7日間生育を行う。この場合、後期生育工程1と後期生育工程2の期間は、合計で3〜10日間とすることが好ましく、更に好ましくは6〜10日間、また更に好ましくは6〜9日とすることがよい。   Moreover, in the said late stage growth process, it is good also as a process of lowering relative humidity in steps. For example, as the late growth step 1, the relative humidity is 95 to 105%, the temperature is 10 to 20 ° C., preferably 14 to 17 ° C., more preferably 14.5 to 16.5 ° C., and the illuminance is 200 to 1000 lux for 3 to 7 days. Grows. Thereafter, as the late growth step 2, the relative humidity is 90 to 100%, the temperature is 10 to 20 ° C., preferably 14 to 17 ° C., more preferably 14.5 to 16.5 ° C., and the illuminance is 200 to 1000 lux for 3 to 7 days. Grows. In this case, the total period of the late growth step 1 and the late growth step 2 is preferably 3 to 10 days, more preferably 6 to 10 days, and even more preferably 6 to 9 days.

以上の工程により、傘の形状が半球形主体で、アバレの発生の少ない株状で、かつ保存性の良いハタケシメジ成熟子実体を得ることができ、収穫を行って栽培の全工程は終了する。なお、本発明をビン栽培方法により説明したが、本発明は上記ビン栽培に限定されるものではない。   Through the above-described steps, it is possible to obtain a bamboo shimeji maturity fruit body that has a hemispherical shape, is less likely to occur, and has good storage stability, and the entire cultivation process is completed after harvesting. In addition, although this invention was demonstrated by the bottle cultivation method, this invention is not limited to the said bottle cultivation.

以下に本発明によるハタケシメジの菌床栽培方法を、実施例をもって更に具体的に示すが、本発明は以下の実施例の範囲のみに限定されるものではない。   The fungus bed cultivation method for Hatake-shimeji mushroom according to the present invention will be described more specifically with reference to the following examples. However, the present invention is not limited to the scope of the following examples.

実施例
PGY液体培地(組成:グルコース2.0%、ペプトン0.2%、酵母エキス0.2%、KHPO0.05%、及びMgSO・7HO0.05%、pH6.0)100mLにハタケシメジK−3304(FERM BP−4348)を接種して、三角フラスコで25℃で14日間培養し液体種菌とした。一方、ポリプロピレン製の広口培養ビン(1100mL)に、1ビン当たりの培地組成が鋸屑(スギ材)134g、米糠130g、メタケイ酸アルミン酸マグネシウム〔富士化学工業(株)製、商品名ノイシリンFH〕2.6g、炭酸カルシウム〔ナカライテスク(株)製、試薬一級〕6.5g、クエン酸一水塩〔ナカライテスク(株)製、試薬一級〕3.9g、水分含量63%となるように各種基材を良く混合し湿潤状態にしたものを圧詰して、中央に直径1cm程度の穴を開け、打栓後118℃、90分間高圧蒸気殺菌を行い、放冷して固形培養基としたものを準備した。これに上記の液体種菌約30mLを接種し、温度25℃、湿度55%の条件の下、培養基に見掛け上菌糸が廻るまで約60日間培養し、固体種菌を作成した。
Examples PGY liquid medium (composition: glucose 2.0%, peptone 0.2%, yeast extract 0.2%, KH 2 PO 4 0.05%, MgSO 4 .7H 2 O 0.05%, pH 6.0) ) 100 mL was inoculated with Hatake Shimeji K-3304 (FERM BP-4348) and cultured in an Erlenmeyer flask at 25 ° C. for 14 days to obtain a liquid inoculum. On the other hand, in a wide-mouth culture bottle made of polypropylene (1100 mL), the medium composition per bottle was sawdust (cedar wood) 134 g, rice bran 130 g, magnesium aluminate metasilicate [manufactured by Fuji Chemical Industry Co., Ltd., trade name Neusilin FH 1 ] 2.6 g, calcium carbonate (manufactured by Nacalai Tesque Co., Ltd., reagent grade 1) 6.5 g, citric acid monohydrate (manufactured by Nacalai Tesque Co., Ltd., reagent grade 1) 3.9 g, various water content 63% Crushing material that has been mixed well and wetted with a base material, opened a hole with a diameter of about 1cm in the center, sterilized by high-pressure steam at 118 ° C for 90 minutes, and allowed to cool to form a solid culture medium Prepared. About 30 mL of the above liquid inoculum was inoculated and cultured under conditions of a temperature of 25 ° C. and a humidity of 55% for about 60 days until the apparent hyphae turned around on the culture medium to produce a solid inoculum.

次に、中央の穴を直径3cmにした以外は、上記の種菌作成時と同様にして、固形培養基を112個準備した。準備後培地のpHを測定したところ、7.9であった。培地pHは、100mLビーカーに培地約40mLを分取し、蒸留水で100mLにフィルアップ後、スターラーにて3分間攪拌、1分間静置した上澄について測定した。これに、上記固体種菌約35gを接種し、暗黒下で85日間培養・熟成させた。次に、菌掻きにより培養基の上部から約1cmほどの菌糸層を除いてから、水道水をビン口まで加え、その後ただちに排水し、芽出し工程に供した。芽出し工程は、照度50ルクス、温度16℃、加湿はヒューミアイ100〔(株)鷺宮製作所製〕の表示値として115〜120%の範囲内に制御し、炭酸ガス濃度は1000〜1500ppmの範囲に制御した。また、結露水を避けるため、ビンは倒置し、11日間培養を続け、子実体原基を形成させた。   Next, 112 solid culture media were prepared in the same manner as in the inoculum preparation except that the center hole had a diameter of 3 cm. After preparation, the pH of the medium was measured and found to be 7.9. The culture medium pH was measured on a supernatant obtained by collecting about 40 mL of medium in a 100 mL beaker, filling up to 100 mL with distilled water, stirring for 3 minutes with a stirrer, and standing for 1 minute. This was inoculated with about 35 g of the above solid inoculum, and cultured and matured in the dark for 85 days. Next, after removing the mycelium layer of about 1 cm from the upper part of the culture medium by scraping the fungus, tap water was added to the bottle mouth, and then immediately drained and subjected to a sprouting step. The sprouting process is controlled within the range of 115 to 120% as the display value of Humiai 100 (manufactured by Kakinomiya Seisakusho Co., Ltd.) and the carbon dioxide concentration is controlled within the range of 1000 to 1500 ppm. did. In order to avoid condensed water, the bottle was inverted and cultured for 11 days to form a fruiting body primordium.

原基が形成された培養基は、反転・正置し、照度500ルクス、温度16℃、炭酸ガス濃度は1000〜2000ppmの生育工程へ移行させた。なお、前期生育工程は1区分、後期生育工程は2つに区分し、それぞれの日数、湿度を表1のとおり設定した。各試験区16個づつの培養基を供し、それぞれの試験区で成熟子実体を得た。   The culture medium on which the primordium was formed was inverted and placed, and transferred to a growth process in which the illuminance was 500 lux, the temperature was 16 ° C., and the carbon dioxide concentration was 1000 to 2000 ppm. The early growth process was divided into 1 category and the late growth process was divided into 2 categories, and the number of days and humidity were set as shown in Table 1. 16 culture media were provided for each test group, and mature fruiting bodies were obtained in each test group.

Figure 0005189446
Figure 0005189446

収穫されたハタケシメジの成熟子実体について、一ビン当たりの収量、一ビン当りの直径1cm以上の傘の数、一ビン当りの傘の形の分布を測定した。また、得られた子実体について、所定量(120g)をPETトレイ(特開2006−240698号公報)に盛り、厚さ25μmの防曇OPPフイルム〔グンゼ(株)製シルファンKVW2タイプ〕でピロー包装したのち、専門のパネラー5名で目視による商品性評価を行った。商品性評価は、5を最高評価とする1〜5の5段階で、下記表2の評価基準により傘の大きさの揃い、子実体の茎の長さ、伸長方向の統一性〔特に、周縁部の子実体が横方向や下方向に伸長した形態(アバレ状態)の有無〕を総合評価し、5名の平均値を算出した。包装に用いた所定量の残余で、子実体水分の測定を行った。   For the harvested fruit bodies of Hatake shimeji, the yield per bottle, the number of umbrellas with a diameter of 1 cm or more per bottle, and the distribution of the shape of the umbrella per bottle were measured. In addition, a predetermined amount (120 g) of the fruit body thus obtained is put on a PET tray (Japanese Patent Laid-Open No. 2006-240698) and pillow-wrapped with a 25 μm thick anti-fog OPP film [Sylphan KVW2 type manufactured by Gunze Co., Ltd.] After that, visual evaluation was conducted by five specialized panelists. The merchantability evaluation has 5 levels of 1 to 5, with 5 being the highest rating, and the uniform size of the umbrella body, the length of the stem of the fruiting body, and the uniformity of the extension direction according to the evaluation criteria shown in Table 2 below. The presence / absence of the form (abare state) in which the fruiting body of each part extends in the horizontal direction or downward direction] was comprehensively evaluated, and the average value of five persons was calculated. The moisture content of the fruit body was measured with a predetermined amount of the residue used for packaging.

Figure 0005189446
Figure 0005189446

また、ピロー包装した商品については、25℃で加速保存試験を行った。加速保存試験結果の評価も目視によって行い、傘の陥没、水潤化、ぬめりの発生等を総合的に評価して、商品価値がなくなるまでの日数(保存可能日数)で表現した。以上の結果を表3に示す。表3は栽培した16個の栽培ビンから得られた結果の平均を示す。表3中、「傘のまとまり状態」とは、子実体の大きさや傘の伸長方向の統一性を元に評価した。特に周縁部の子実体が横方向や下方向に伸長した状態や、茎が徒長した子実体が発生していないかにより、きわめて良好、良好、やや良好、ややアバレ(子実体の伸長方向がやや不統一)で表示した。   Moreover, about the product which carried out pillow packaging, the accelerated storage test was done at 25 degreeC. The results of the accelerated storage test were also evaluated visually, comprehensively evaluated for the collapse of umbrellas, flooding, slime, etc., and expressed as the number of days until the commercial value disappeared (number of days that could be stored). The above results are shown in Table 3. Table 3 shows the average results obtained from the 16 cultivated bottles. In Table 3, “umbrella united state” was evaluated based on the uniformity of the size of the fruiting body and the direction of extension of the umbrella. It is extremely good, good, slightly good, slightly abare (particularly the direction of elongation of the fruiting body is slightly different depending on the state in which the fruiting body at the peripheral edge is stretched in the lateral direction or downward direction, or whether the fruiting body has an elongated stem. Displayed with (unmatched).

Figure 0005189446
Figure 0005189446

表3より明らかなように、本発明の方法により栽培されたハタケシメジの成熟子実体は、比較例と比べて、直径1cm以上の傘数に占める半球形の傘数の割合が高く、その結果ボリューム感に優れたものであり、また株の各子実体の伸長方向の統一のとれ、そのまとまりについても良好で商品性総合評価の高いものであった。また加速保存試験においても、本発明の方法で得られたハタケシメジの成熟子実体は良好な保存性を示した。なお、上記保存試験は25℃での加速試験であり、実際の商品流通、店頭での陳列は冷蔵で行われるため、本願実施例記載の保存日数が比較例に対して1日長いという結果は、実際の商品対応においては極めて顕著な差となることはいうまでもない。また、25℃で加速保存試験において比較例1とほぼ同等の保存日数であった実施例6について、20℃で同様の加速保存試験を行ったところ、比較例1が7日であったのに対し、実施例6は8日という結果が得られた。このことから実施例6においても、実際の商品対応において極めて顕著な差となることがわかった。   As is apparent from Table 3, the mature fruit body of Hatake shimeji grown by the method of the present invention has a higher proportion of hemispherical umbrellas in the number of umbrellas having a diameter of 1 cm or more than the comparative example. It was excellent in feeling, and it was possible to unify the growth direction of each fruiting body of the stock. In the accelerated storage test, the mature fruit body of Hatake shimeji obtained by the method of the present invention showed good storage stability. The above storage test is an accelerated test at 25 ° C., and the actual product distribution and display at the store are performed by refrigeration, so the result that the storage days described in the present embodiment is one day longer than the comparative example is Needless to say, there is a very significant difference in actual product handling. Further, when the same accelerated storage test was conducted at 20 ° C. for Example 6 which had a storage day substantially the same as that of Comparative Example 1 in the accelerated storage test at 25 ° C., Comparative Example 1 was 7 days. On the other hand, the result of Example 6 was 8 days. From this, it was found that also in Example 6, there was an extremely remarkable difference in actual product handling.

本発明により、ボリューム感のある半球形の良好な子実体形状を有し、かつ傘のまとまりが良く、製品化率が高く、かつ保存性が良いハタケシメジ子実体を安定的に生産することが可能なハタケシメジの菌床栽培方法が提供される。本発明の方法は、きのこの栽培、経営において極めて有用な方法であり、本発明の方法により得られたハタケシメジの子実体は、従来採用されてきた低温流通や店頭での冷蔵棚へ陳列等に施すことで、より一層長期間ハタケシメジの鮮度を維持することができることから、製品流通管理においても極めて有用である。   According to the present invention, it is possible to stably produce Hatake-Shimeji fruit bodies having a good hemispherical fruit body shape with a sense of volume, a good umbrella unity, a high productization rate, and good storage stability. Provided is a method for cultivating the fungus bed of Hatake Shimeji. The method of the present invention is a very useful method in the cultivation and management of mushrooms, and the fruit bodies of Hatake shimeji obtained by the method of the present invention can be used for low-temperature distribution or display at refrigerated shelves in stores, which have been conventionally employed. By applying, it is possible to maintain the freshness of Hatake-shimeji for a longer period of time, which is extremely useful in product distribution management.

Claims (8)

ハタケシメジの菌床栽培方法における子実体原基の生育工程において、前期生育工程として相対湿度110〜120%の範囲内の加湿条件下での生育、及び後期生育工程として相対湿度90〜105%の範囲内の加湿条件下での生育を行うことを特徴とするハタケシメジの菌床栽培方法。 In the growth process of the fruiting body primordium in the fungus bed cultivation method of Hatake shimeji, growth under humidified conditions within the range of 110 to 120% relative humidity as the first growth process, and range of 90 to 105% relative humidity as the second growth process A method for cultivating Hatake shimeji mushroom bed, characterized in that it grows under humidified conditions . 子実体原基の前期生育工程を相対湿度110〜115%の範囲内又は115〜120%の範囲内の加湿条件下での生育、後期生育工程を相対湿度90〜100%の範囲内又は95〜105%の範囲内の加湿条件下での生育を行う請求項記載のハタケシメジの菌床栽培方法。 The early stage growth process of the fruiting body primordium is grown under humidified conditions within a range of 110 to 115% relative humidity or 115 to 120%, and the late stage growth process is within a range of 90 to 100% relative humidity or 95 to claim 1 fungal bed cultivation method Hatakeshimeji according performing growth in humidified conditions in the range of 105%. 子実体原基の後期生育工程において、相対湿度95〜105%の範囲内の加湿条件下で生育を行った後、さらに相対湿度90〜100%の範囲内の加湿条件下で相対湿度を段階的に下げて生育を行なう請求項記載のハタケシメジの菌床栽培方法。 In the later stage of the fruiting body primordium, after growing under humidified conditions within the range of 95-105% relative humidity, the relative humidity is stepped under the humidified conditions within the range of 90-100% relative humidity. claim 1 fungal bed cultivation method Hatakeshimeji according performing growth lowered to. 3〜10日間の前期生育工程及び3〜10日間の後期生育工程を行う請求項1〜3のいずれか1項に記載のハタケシメジの菌床栽培方法。The method for cultivating Hatake shimeji mushroom bed according to any one of claims 1 to 3, wherein an early growth step for 3 to 10 days and a late growth step for 3 to 10 days are performed. 芽出し工程での子実体原基形成を相対湿度115〜120%の範囲内の加湿条件下、子実体原基の前期生育工程を相対湿度110〜120%の範囲内の加湿条件下での生育、及び後期生育工程を相対湿度90〜105%の範囲内の加湿条件下での生育を行う請求項記載のハタケシメジの菌床栽培方法。 The fruit body primordium formation in the sprouting process is grown under humidified conditions within a range of 115-120% relative humidity, and the fruit body primordium is grown under humidified conditions within a relative humidity of 110-120%, and fungal bed cultivation method of Hatakeshimeji of claim 1 wherein the late growth process performing growth in humidified conditions in a range of relative humidity from 90 to 105%. 子実体原基の前期生育工程を相対湿度110〜115%の範囲内又は115〜120%の範囲内の加湿条件下での生育、後期生育工程を相対湿度90〜100%の範囲内又は95〜105%の範囲内の加湿条件下での生育を行う請求項記載のハタケシメジの菌床栽培方法。 The early stage growth process of the fruiting body primordium is grown under humidified conditions within a range of 110 to 115% relative humidity or 115 to 120%, and the late stage growth process is within a range of 90 to 100% relative humidity or 95 to The method for cultivating a bamboo shoot of fungus shimeji mushroom according to claim 5 , wherein the growth is performed under humidified conditions within a range of 105%. 子実体原基の後期生育工程において、相対湿度95〜105%の範囲内の加湿条件下で生育を行った後、さらに相対湿度90〜100%の範囲内の加湿条件下で相対湿度を段階的に下げて生育を行なう請求項記載のハタケシメジの菌床栽培方法。 In the later stage of the fruiting body primordium, after growing under humidified conditions within the range of 95-105% relative humidity, the relative humidity is stepped under the humidified conditions within the range of 90-100% relative humidity. 6. The method for cultivating Hatake shimeji mushroom bed according to claim 5, wherein the growth is carried out at a reduced temperature. 9〜12日間の芽出し工程、3〜10日間の前期生育工程、及び3〜10日間の後期生育工程を行う請求項5〜7のいずれか1項に記載のハタケシメジの菌床栽培方法。The method for cultivating a bamboo scallop according to any one of claims 5 to 7, wherein a sprouting step for 9 to 12 days, an early growth step for 3 to 10 days, and a late growth step for 3 to 10 days are performed.
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