JP5178060B2 - Grinding wheel manufacturing apparatus and manufacturing method - Google Patents

Grinding wheel manufacturing apparatus and manufacturing method Download PDF

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JP5178060B2
JP5178060B2 JP2007158686A JP2007158686A JP5178060B2 JP 5178060 B2 JP5178060 B2 JP 5178060B2 JP 2007158686 A JP2007158686 A JP 2007158686A JP 2007158686 A JP2007158686 A JP 2007158686A JP 5178060 B2 JP5178060 B2 JP 5178060B2
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JP2008307647A (en
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一裕 落合
洋平 南部
順一 池野
秀雄 澁谷
太刀夫 長谷川
康 宇都宮
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SAITAMA PREFECTURE
TANAKA ENGINEERING INC.
Saitama University NUC
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TANAKA ENGINEERING INC.
Saitama University NUC
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Description

本発明は、研削加工用の砥石の製造装置及び製造方法に関し、特に砥粒を分散懸濁させた溶液に電界を与えて該砥粒を電気泳動により電極上に堆積させる研削加工用砥石の製造装置及び製造方法に関する。   TECHNICAL FIELD The present invention relates to a grinding wheel manufacturing apparatus and manufacturing method, and more particularly to manufacturing a grinding wheel for applying an electric field to a solution in which abrasive grains are dispersed and suspended and depositing the abrasive grains on an electrode by electrophoresis. The present invention relates to an apparatus and a manufacturing method.

光学フィルターなどの光学部品は、水晶などの無機材料を切削加工した後にその切削表面を研磨加工して膜付けなどの所定の表面加工をして提供される。一般に、切削加工及び研磨加工は、加工液を用いて湿式で行われており、加工後に加工液の洗浄及び乾燥の工程が必要となる。   An optical component such as an optical filter is provided by performing a predetermined surface processing such as filming by polishing a cut surface after cutting an inorganic material such as quartz. Generally, the cutting process and the polishing process are performed in a wet manner using a processing liquid, and a process of washing and drying the processing liquid is required after the processing.

ところが、例えば特許文献１に開示の如く、メカノケミカル研削加工法によれば、切削加工及び研磨加工を一度の行程で、しかも乾式で行うことができるのである。この方法によれば、洗浄及び乾燥のための設備が不要となり、製造工程を大幅に減じることができる。ここでメカノケミカル研削加工法は、活性砥粒を含む砥石を用いて、砥石と被加工材との間のメカノケミカル反応により被加工材を研削加工する方法である。活性砥粒は、砥石と被加工材との摩擦熱により活性化して被加工材と化学反応を生じることで切削と研磨とを同時に行う効果を生ずるのである。   However, as disclosed in Patent Document 1, for example, according to the mechanochemical grinding method, cutting and polishing can be performed in a single stroke and in a dry manner. According to this method, facilities for cleaning and drying are not required, and the manufacturing process can be greatly reduced. Here, the mechanochemical grinding method is a method of grinding a workpiece by a mechanochemical reaction between the grindstone and the workpiece using a grindstone containing active abrasive grains. The activated abrasive is activated by frictional heat between the grindstone and the workpiece and causes a chemical reaction with the workpiece, thereby producing an effect of simultaneously performing cutting and polishing.

活性砥粒を含むメカノケミカル研削加工用の砥石の製造方法としては、例えば、特許文献２に開示の如き、電気泳動法を用いた方法が知られている。ＳｉＯ２やＣｅＯなどの活性砥粒を結合材とともに分散懸濁させた溶液中に一対の電極棒を浸漬し、これに通電して電界を与える。活性砥粒は、電気泳動現象により一方の電極側に引きつけられて、電極棒の表面に堆積するのである。一定時間の経過後に電極棒を溶液中から取り出して、長手方向に垂直な方向に切断してこれを乾燥させると、円柱状の砥石が得られるのである。 As a method for producing a mechanochemical grinding wheel containing active abrasive grains, for example, a method using electrophoresis as disclosed in Patent Document 2 is known. A pair of electrode bars are immersed in a solution in which active abrasive grains such as SiO 2 and CeO are dispersed and suspended together with a binder, and an electric field is applied to the pair of electrode bars. The active abrasive grains are attracted to one electrode side by the electrophoresis phenomenon and are deposited on the surface of the electrode rod. When the electrode rod is taken out of the solution after a certain period of time, cut in a direction perpendicular to the longitudinal direction and dried, a cylindrical grindstone is obtained.

ところで、比較的大なる表面を有する光学部品の研削加工では、円柱状ではなく、より大なる平滑面を有する平板状の砥石の使用が望まれる。例えば、特許文献３は、一対の対向する平板状電極を用いて、上記したと同様に、電気泳動現象を利用して、活性砥粒を含む平板状の砥石を製造する方法を開示している。また同時に、大なる平滑面を有する砥石では、研削粉が砥石と被加工材との間に滞留して加工効率を低下せしめてしまうため、砥石表面に線状や、溝状あるいは穴状の加工を施すことで、研削粉がこれにトラップされて、加工効率の低下が防止できることを開示している。
特開２００３−２６０６４２号公報 特開２００３−０７３６５６号公報 特開２００６−０４３７８２号公報 By the way, in grinding of an optical component having a relatively large surface, it is desired to use a plate-shaped grindstone having a larger smooth surface instead of a cylindrical shape. For example, Patent Document 3 discloses a method of manufacturing a plate-like grindstone including active abrasive grains using a pair of opposed plate-like electrodes and using the electrophoresis phenomenon as described above. . At the same time, in grinding stones with a large smooth surface, grinding powder stays between the grinding stone and the workpiece and reduces the machining efficiency. It is disclosed that grinding powder can be trapped by this so as to prevent a reduction in processing efficiency.
Japanese Patent Laid-Open No. 2003-260642 JP 2003-073656 A JP 2006-043782 A

特許文献３と同様に、比較的大なる表面を有する部品の研削加工では、ラップ盤の研削盤上にタイル状に平板状の砥石を敷き詰めて、これに被加工材を押しつける加工法が知られている。研削盤上にタイル状に砥石を敷き詰めることで、砥石と砥石との間の溝に研削粉がトラップされて、加工効率の低下が防止できるのである。   As in Patent Document 3, in grinding a part having a relatively large surface, a processing method is known in which a flat grindstone is laid down on a grinder of a lapping machine and a workpiece is pressed against the grindstone. ing. By laying the grindstone in a tile shape on the grinder, the grinding powder is trapped in the groove between the grindstone and the grindstone, and a reduction in processing efficiency can be prevented.

本発明は、このような平板状のメカノケミカル研削加工用砥石を製造するための製造装置及び製造方法の提供を目的とする。   An object of this invention is to provide the manufacturing apparatus and manufacturing method for manufacturing such a plate-shaped mechanochemical grinding wheel.

本発明による研削加工用砥石の製造装置は、砥粒を分散懸濁させた溶液に電界を与えて該砥粒を電極上に堆積させる研削加工用砥石の製造装置であって、前記電極のうちの被堆積側電極は板状体であって一定間隔で設けられた複数の貫通穴を有することを特徴とする。   A grinding wheel manufacturing apparatus according to the present invention is a grinding wheel manufacturing apparatus for applying an electric field to a solution in which abrasive grains are dispersed and suspended to deposit the abrasive grains on an electrode. The deposition-side electrode is a plate-like body and has a plurality of through holes provided at regular intervals.

本発明の装置によれば、電極のうちの被堆積側電極の表面上に均一に砥粒を含む層を堆積せしめることができて、しかも該堆積層を傷めることなく容易に電極から脱離することができるのである。故に、表面性状の優れた平板状の研削加工用砥石を作業性よく製造することができるのである。   According to the apparatus of the present invention, a layer containing abrasive grains can be uniformly deposited on the surface of the electrode on the deposition side of the electrode, and can be easily detached from the electrode without damaging the deposited layer. It can be done. Therefore, a flat grinding wheel with excellent surface properties can be manufactured with good workability.

さらに、本発明による研削加工用砥石の製造方法は、砥粒を分散懸濁させた溶液に電界を与えて該砥粒を電極上に堆積させる研削加工用砥石の製造方法である。一定間隔で設けられた複数の貫通穴を有する板状体からなる第１の電極を、これと対をなす板状体からなる第２の電極に対向するように前記溶液中に配置する電極配置ステップと、前記第１の電極が被堆積側電極となるように前記第１及び第２の電極に通電する通電ステップとを含むことを特徴とする。   Furthermore, the grinding wheel manufacturing method according to the present invention is a grinding wheel manufacturing method in which an electric field is applied to a solution in which abrasive grains are dispersed and suspended to deposit the abrasive grains on an electrode. An electrode arrangement in which a first electrode made of a plate-like body having a plurality of through-holes provided at regular intervals is arranged in the solution so as to face a second electrode made of a plate-like body that forms a pair with the first electrode. And an energization step of energizing the first and second electrodes so that the first electrode becomes a deposition side electrode.

本発明の方法によれば、上記したと同様に表面性状の優れた平板状の研削加工用砥石を作業性よく製造できるのである。   According to the method of the present invention, as described above, a flat grinding wheel having excellent surface properties can be manufactured with good workability.

本発明による１つの実施例である平板状の研削加工用砥石の製造装置及び製造方法は、砥粒を分散懸濁させた溶液に電界を与えて該砥粒を電気泳動により一対の電極のうちの被堆積側電極の被堆積表面上に堆積させる装置及び方法である。詳細には、被加工材とのメカノケミカル作用を生ずる活性砥粒をコロイド粒子として溶液中に分散懸濁させて、この溶液中に第１及び第２の板状電極を互いに略平行に、且つ、その主面が溶液の液面に対して略垂直になるように懸下する。ここで第１の電極である被堆積側電極は、一定間隔で複数の貫通穴を加工したパンチングメタルの如きからなる板状電極である。また被堆積側電極の被堆積表面には、得ようとする砥石の形状、例えば長方形に打ち抜かれた貫通窓を有する被導電性材料からなるマスク部材が与えられて、被堆積表面を分割するようにマスキングが施される。   According to one embodiment of the present invention, there is provided a flat grinding wheel manufacturing apparatus and manufacturing method, in which an electric field is applied to a solution in which abrasive grains are dispersed and suspended, and the abrasive grains are electrophoresed through a pair of electrodes. Apparatus and method for depositing on the deposition surface of the deposition side electrode. Specifically, active abrasive grains that cause a mechanochemical action with a workpiece are dispersed and suspended in a solution as colloidal particles, and the first and second plate electrodes are substantially parallel to each other in this solution, and The main surface is suspended so as to be substantially perpendicular to the liquid surface of the solution. Here, the deposition side electrode, which is the first electrode, is a plate-like electrode made of punched metal or the like in which a plurality of through holes are processed at regular intervals. Further, the surface of the deposition side electrode is provided with a mask member made of a conductive material having a shape of the grindstone to be obtained, for example, a rectangular punched through window so as to divide the deposition surface. Is masked.

上記した一対の電極に電源を接続してこの間に電界を与えると、被堆積側電極のマスク部材で覆われていない裸出部分に電気泳動により選択的に砥粒を均一に含む堆積物層が堆積形成される。特に、被堆積側電極の貫通穴により、通電中の堆積物層の電極からの剥離、堆積物層の表面ムラ及び割れが低減されて均一な堆積物層を得られるのである。通電後にマスク部材を被堆積側電極から脱離すると、貫通窓の形状にセグメントとなった堆積物層が電極上に残る。これを電極から脱離して平板ジグの間に挟んで乾燥させると、平板状の研削加工用砥石が得られるのである。   When a power source is connected to the pair of electrodes described above and an electric field is applied between them, a deposit layer that uniformly contains abrasive grains selectively by electrophoresis is formed on a bare portion of the electrode to be deposited that is not covered with the mask member. Deposited. In particular, the through-hole of the deposition-side electrode can reduce the peeling of the deposited layer from the electrode, the unevenness of the surface of the deposited layer, and the cracks, thereby obtaining a uniform deposited layer. When the mask member is detached from the deposition-side electrode after energization, a deposit layer segmented in the shape of the through window remains on the electrode. When this is detached from the electrode and sandwiched between flat plate jigs and dried, a flat grinding wheel for grinding is obtained.

上記実施例によれば、被堆積側電極の貫通穴により、堆積物層を傷めることなく容易に電極から脱離することができる。故に、表面性状の優れた平板状の研削加工用砥石を作業性よく製造することができるのである。また、堆積物層の片面には被堆積側電極の貫通穴を転写した突起ができるが、ラップ盤に装着する際に突起間に接着材を充填できて好ましいのである。   According to the said Example, it can detach | leave from an electrode easily, without damaging a deposit layer by the through-hole of a to-be-deposited electrode. Therefore, a flat grinding wheel with excellent surface properties can be manufactured with good workability. In addition, a projection formed by transferring the through hole of the deposition-side electrode can be formed on one surface of the deposit layer. However, it is preferable that an adhesive can be filled between the projections when being mounted on the lapping machine.

なお、被堆積側電極にマスキングを施さずに堆積を行って、被堆積側電極から堆積物層を脱離して、これを所定形状に切断した後に同様にジグの間に挟んで乾燥させても良い。かかる実施例によれば、切断面をシャープに形成することができて、端面の形状の良好な砥石を得ることができるのである。   It is also possible to perform deposition without masking the deposition-side electrode, remove the deposit layer from the deposition-side electrode, cut it into a predetermined shape, and dry it by sandwiching it between jigs. good. According to this embodiment, the cutting surface can be formed sharply, and a grindstone having a good end face shape can be obtained.

次に本発明による実施例である研削加工用砥石の製造装置について、図１乃至図５を参照しつつ詳細に説明する。   Next, a grinding wheel manufacturing apparatus according to an embodiment of the present invention will be described in detail with reference to FIGS.

図１に示すように、研削加工用砥石の製造装置１は、純水に砥粒（ＳｉＯ２：１６．７重量％）と結合材（アルギン酸ナトリウム：３重量％）とを混合して分散懸濁させた溶液を貯留するための溶液槽２を含む。なお、溶液は公知の砥粒及び結合材のいかなる組み合わせであってもよい。溶液槽２の上縁部には、一対の電極７ａ及び７ｂを懸下するための導電性の材料からなる２本の梁３ａ及び３ｂが互いに平行になるようにして取り付けられている。梁３ａには導電性材料からなるアーム５ａが固定されており、アーム５ａの下方端部には対向電極７ａを固定するための電極固定ジグ６ａが設けられている。一方、梁３ｂには、導電性のフック５ｂが着脱自在に吊下される。フック５ｂの下方端部には被堆積側電極７ｂを固定するための電極固定ジグ６ｂが固定されている。対向電極７ａ及び被堆積側電極７ｂは、溶液中で互いに対向しつつ且つ平行となるように電極固定ジグ６ａ及び６ｂに固定されている。ここで、対向電極７ａ及び被堆積側電極７ｂは、それぞれの主面が溶液槽２の溶液の液面に対して略垂直になるようして溶液内に懸下されていることが好ましい。梁３ａ及び３ｂは、それぞれ導線にて電源４に接続される。ＳｉＯ２及びアルギン酸ナトリウムからなる上記溶液の場合にあっては、陽極に砥粒が泳動して堆積物層１３が形成されるため（図７参照）、梁３ａを陰極に、梁３ｂを陽極になるように接続する。 As shown in FIG. 1, the grinding wheel manufacturing apparatus 1 is a dispersion suspension in which pure grains are mixed with abrasive grains (SiO 2 : 16.7 wt%) and a binder (sodium alginate: 3 wt%). A solution tank 2 for storing the turbid solution is included. The solution may be any combination of known abrasive grains and a binder. Two beams 3a and 3b made of a conductive material for suspending the pair of electrodes 7a and 7b are attached to the upper edge of the solution tank 2 so as to be parallel to each other. An arm 5a made of a conductive material is fixed to the beam 3a, and an electrode fixing jig 6a for fixing the counter electrode 7a is provided at the lower end of the arm 5a. On the other hand, a conductive hook 5b is detachably suspended from the beam 3b. An electrode fixing jig 6b for fixing the deposition-side electrode 7b is fixed to the lower end portion of the hook 5b. The counter electrode 7a and the deposition side electrode 7b are fixed to the electrode fixing jigs 6a and 6b so as to face each other in the solution and to be parallel to each other. Here, the counter electrode 7 a and the deposition-side electrode 7 b are preferably suspended in the solution so that their main surfaces are substantially perpendicular to the liquid level of the solution in the solution tank 2. The beams 3a and 3b are each connected to the power source 4 by a conducting wire. In the case of the above solution composed of SiO 2 and sodium alginate, the abrasive grains migrate to the anode to form the deposit layer 13 (see FIG. 7). Connect to be.

図２ａ乃至図２ｃに示すように、被堆積側電極７ｂは、一定間隔で複数の貫通穴８を形成した平板電極であって、厚さ１ｍｍの真鍮製のいわゆる「パンチングメタル」の如きからなる。複数の貫通穴８の配列は、例えば、図２ａや図２ｂに示すように、１つの貫通穴８’を中心とした同一円周上に等間隔に貫通穴８を配置した千鳥配列である。ここで図２ａでは、１つの貫通穴８’の周囲に中心角６０°毎に６つの貫通穴８を配した千鳥配列を示している。また図２ｂでは、１つの貫通穴８’の周囲に４つの貫通穴８を配した千鳥配列を示している。更に、例えば、図２ｃに示すように、周期的に一定間隔の複数の貫通穴８を形成した配列であっても良い。   As shown in FIGS. 2a to 2c, the deposition-side electrode 7b is a flat plate electrode in which a plurality of through holes 8 are formed at regular intervals, and is made of a so-called “punching metal” made of brass having a thickness of 1 mm. . The arrangement of the plurality of through-holes 8 is, for example, a staggered arrangement in which the through-holes 8 are arranged at equal intervals on the same circumference centered on one through-hole 8 ', as shown in FIGS. 2a and 2b. Here, FIG. 2 a shows a staggered arrangement in which six through holes 8 are arranged around a single through hole 8 ′ at every central angle of 60 °. FIG. 2b shows a staggered arrangement in which four through holes 8 are arranged around one through hole 8 '. Furthermore, for example, as shown in FIG. 2c, an arrangement in which a plurality of through-holes 8 are periodically formed at regular intervals may be used.

なお、貫通穴８の形状は、丸孔、角孔、長孔及び装飾用孔（十字型、扇型、ダイヤ型、亀甲型等）などであってもよい。なお、後述するように、被堆積側電極７ｂから脱離後の堆積物層１３の裏面には貫通穴８の形状を転写して形成される突起１２を生じる（図８及び図９参照）。ここで堆積時若しくは堆積後の堆積物層１３が収縮すると、突起１２及び貫通穴８を介して被堆積側電極７ｂには変形応力が付加されるのである。しかしながら貫通穴８は、一定間隔で被堆積側電極７ｂに設けられており、変形応力は被堆積側電極７ｂの面内に均一に分散付加されるので、被堆積側電極７ｂが反りあがったり、曲がったりすることが防止でき、さらに通電中の堆積物層１３の被堆積側電極７ｂからの剥離、堆積物層１３の表面ムラ及び割れが低減されて均一な堆積物層１３を得ることができるのである。   The shape of the through hole 8 may be a round hole, a square hole, a long hole, a decorative hole (cross shape, fan shape, diamond shape, turtle shell shape, etc.), and the like. As will be described later, a protrusion 12 formed by transferring the shape of the through hole 8 is formed on the back surface of the deposit layer 13 after being detached from the deposition-side electrode 7b (see FIGS. 8 and 9). Here, when the deposit layer 13 during or after deposition shrinks, deformation stress is applied to the deposition-side electrode 7b through the protrusions 12 and the through holes 8. However, the through holes 8 are provided in the deposition-side electrode 7b at regular intervals, and the deformation stress is evenly distributed and added in the plane of the deposition-side electrode 7b, so that the deposition-side electrode 7b is warped, Further, it is possible to prevent the bending of the deposited layer 13 from the deposition-side electrode 7b, the surface unevenness and the crack of the deposited layer 13, and the uniform deposited layer 13 can be obtained. It is.

更に、後述するように、堆積物層１３を被堆積側電極７ｂから脱離する際、突起１２が貫通穴８と干渉して脱離が困難となることがある。故に、抵抗を低減できる貫通穴８及び突起１２の断面形状が好ましい。特に、貫通穴８の断面形状が円形であると好適である。   Furthermore, as will be described later, when the deposit layer 13 is detached from the deposition-side electrode 7b, the protrusion 12 may interfere with the through hole 8 and may be difficult to remove. Therefore, the cross-sectional shape of the through hole 8 and the protrusion 12 that can reduce the resistance is preferable. In particular, the cross-sectional shape of the through hole 8 is preferably circular.

更に、図３及び図４に示すように、被堆積側電極７ｂは打ち抜き部分が脱落せずに部分的に接続して残存している「よろい抜き」と称される貫通穴８を形成した電極であってもよい。貫通穴８の形状を転写して形成される突起１２の高さを調整できて好ましいのである。   Further, as shown in FIGS. 3 and 4, the electrode 7b to be deposited is an electrode having a through hole 8 referred to as “blow-out”, in which the punched portion remains partially connected without falling off. It may be. This is preferable because the height of the protrusion 12 formed by transferring the shape of the through hole 8 can be adjusted.

以下では、図２ａに示すような、φ３の丸穴の貫通穴８をピッチ５ｍｍで配置した６０°千鳥配列の平板電極を被堆積側電極７ｂに用いた場合について説明する。   Hereinafter, a case will be described in which a 60 ° staggered flat plate electrode in which through-holes 8 of φ3 round holes are arranged at a pitch of 5 mm as shown in FIG.

図５に示すように、被堆積側電極７ｂには、表面側（対向電極７ａと対向する面側）に表マスク部材９を、裏面側（表面側の反対面側）には裏マスク部材１０を密着配置して、上端部近傍を電極固定ジグ６ｂにて挟んで固定する。表マスク部材９及び裏マスク部材１０はアクリル板の如き非導電性材料からなる。表マスク部材９は、得ようとする堆積物層１３の形状に切り取られた貫通窓１１を有している。ここでは、６ｍｍ厚さのアクリル板に１５ｍｍ角の正方形の貫通窓１１を６列×３段形成した表マスク部材９を用いた。   As shown in FIG. 5, the deposition-side electrode 7b has a front mask member 9 on the front surface side (surface side facing the counter electrode 7a) and a back mask member 10 on the back surface side (opposite surface side of the front surface side). Are placed in close contact, and the vicinity of the upper end is sandwiched and fixed by the electrode fixing jig 6b. The front mask member 9 and the back mask member 10 are made of a nonconductive material such as an acrylic plate. The front mask member 9 has a through window 11 cut out in the shape of the deposit layer 13 to be obtained. Here, the front mask member 9 was used in which a 15 mm square square through window 11 was formed in 6 rows × 3 stages on a 6 mm thick acrylic plate.

なお、研削加工用砥石の製造装置１には、溶液撹拌手段や、スイッチ及びタイマー等を備えているが、公知であるが故に詳述しない。   The grinding wheel manufacturing apparatus 1 includes a solution stirring means, a switch, a timer, and the like, but will not be described in detail because it is known.

次に、本発明による研削加工用砥石の製造方法について図１、図５乃至図９を用いて詳細に説明する。   Next, a method for manufacturing a grinding wheel according to the present invention will be described in detail with reference to FIGS. 1 and 5 to 9.

特に図１に示すように、溶液槽２内に砥粒（ＳｉＯ２：１６．７重量％）と結合材（アルギン酸ナトリウム：３重量％）とを純水に混合して分散懸濁させた溶液を調製した。対向電極７ａは、溶液槽２の溶液の液面に対して略垂直となるように梁３ａに固定した。 In particular, as shown in FIG. 1, a solution in which abrasive grains (SiO 2 : 16.7 wt%) and a binder (sodium alginate: 3 wt%) are mixed and dispersed in pure water in a solution tank 2. Was prepared. The counter electrode 7 a was fixed to the beam 3 a so as to be substantially perpendicular to the liquid level of the solution in the solution tank 2.

特に図５及び図６に示すように、被堆積側電極７ｂを表マスク部材９及び裏マスク部材１０で挟んで、フック５ｂの先端部に固定された電極固定ジグ６ｂに取り付けた。表マスク部材９を取り付けた側が対向電極７ａに対向するようにして、フック５ｂを梁３ｂに引っかける。このとき、被堆積側電極７ｂは、溶液の液面に対して略垂直である。つまり、対向電極７ａと被堆積側電極７ｂとは溶液中で互いに対向し、且つ、略平行となるのである。   In particular, as shown in FIGS. 5 and 6, the deposition-side electrode 7b was sandwiched between the front mask member 9 and the back mask member 10 and attached to the electrode fixing jig 6b fixed to the tip of the hook 5b. The hook 5b is hooked on the beam 3b so that the side to which the front mask member 9 is attached faces the counter electrode 7a. At this time, the deposition-side electrode 7b is substantially perpendicular to the liquid level of the solution. That is, the counter electrode 7a and the deposition-side electrode 7b face each other in the solution and are substantially parallel to each other.

梁３ａ及び３ｂをそれぞれ陰極及び陽極となるように通電すると、電気泳動により砥粒を含む堆積物層１３が被堆積側電極７ｂの表マスク部材９の貫通窓１１を介して被堆積表面上に堆積する。ここで、通電は電流値制御にて所定時間だけ行った。   When the beams 3a and 3b are energized so as to become a cathode and an anode, respectively, a deposit layer 13 containing abrasive grains is electrophoresed on the deposition surface through the through window 11 of the front mask member 9 of the deposition-side electrode 7b. accumulate. Here, energization was performed for a predetermined time by current value control.

通電終了後、フック５ｂを梁３ｂからはずして被堆積側電極７ｂを溶液槽２から引き上げた。図７に示すように、堆積物層１３が乾燥しないうちに、表マスク部材９及び裏マスク部材１０を被堆積側電極７ｂから分離した。   After the energization was completed, the hook 5b was removed from the beam 3b, and the deposition-side electrode 7b was pulled up from the solution tank 2. As shown in FIG. 7, before the deposit layer 13 was dried, the front mask member 9 and the back mask member 10 were separated from the deposition-side electrode 7b.

次に、図８に示すように、堆積物層１３を被堆積側電極７ｂから脱離した。堆積物層１３の被堆積側電極７ｂ側（裏側）には貫通穴８の形状を転写した突起１２が形成されている。   Next, as shown in FIG. 8, the deposit layer 13 was detached from the deposition-side electrode 7b. On the deposit side electrode 7 b side (back side) of the deposit layer 13, a projection 12 is formed by transferring the shape of the through hole 8.

被堆積側電極７ｂから脱離した堆積物層１３は、２枚の平板ジグの間に挟んで所定時間だけ乾燥させて図９の如き研削加工用砥石１４を得る。なお、乾燥すると堆積物層１３の外形寸法は１割程度収縮する。   The deposit layer 13 detached from the deposition-side electrode 7b is sandwiched between two flat plate jigs and dried for a predetermined time to obtain a grinding wheel 14 as shown in FIG. When dried, the outer dimension of the deposit layer 13 shrinks by about 10%.

以上、本実施例によれば、被堆積側電極７ｂの表面上に均一に砥粒を含む堆積物層１３を堆積せしめることができて、しかも堆積物層１３を傷めることなく容易に被堆積側電極７ｂから脱離することができるのである。故に、表面性状の優れた平板状の研削加工用砥石１４を作業性よく製造することができるのである。   As described above, according to the present embodiment, it is possible to deposit the deposit layer 13 including abrasive grains uniformly on the surface of the deposition-side electrode 7b, and to easily deposit the deposition layer 13 without damaging the deposition layer 13. It can be detached from the electrode 7b. Therefore, the flat grinding wheel 14 having excellent surface properties can be manufactured with good workability.

更に、表マスク部材９により堆積物層１３はタイル状に分割形成されて変形応力が緩和されるので、被堆積側電極７ｂから剥離したり、被堆積側電極７ｂを反りあげたり、曲げたりすることを防止できるのである。   Further, since the deposit layer 13 is divided and formed in a tile shape by the front mask member 9 and the deformation stress is relieved, it is peeled off from the deposition-side electrode 7b, and the deposition-side electrode 7b is warped or bent. This can be prevented.

更に、得られた砥石１４の裏面に突起１２を有するので、ラップ盤に装着する際に突起１２間に接着材を充填できて好ましいのである。   Furthermore, since the projections 12 are provided on the back surface of the obtained grindstone 14, it is preferable that an adhesive can be filled between the projections 12 when the lapping machine is mounted.

また、被堆積側電極７ｂは、梁３ｂにフック５ｂで着脱自在に取り付けられているので、被堆積側電極７ｂの交換の作業性に優れるのである。   Further, since the deposition-side electrode 7b is detachably attached to the beam 3b with a hook 5b, the workability of exchanging the deposition-side electrode 7b is excellent.

実施例１において、表マスク部材９を用いずに、被堆積側電極７ｂのほぼ全面に亘って大なる表面積を有する堆積物層１３を形成しても良い。この場合にあっても、貫通穴８が一定間隔で被堆積側電極７ｂに設けられているので、堆積物層１３が堆積時若しくは堆積後に収縮しても、被堆積側電極７ｂの面内に均一に応力が分散されるので、被堆積側電極７ｂが反りあがったり、曲がったりすることが防止できるのである。   In the first embodiment, the deposit layer 13 having a large surface area may be formed over almost the entire surface of the deposition-side electrode 7b without using the front mask member 9. Even in this case, since the through-holes 8 are provided in the deposition-side electrode 7b at regular intervals, even if the deposit layer 13 contracts during or after deposition, the through-holes 8 are within the plane of the deposition-side electrode 7b. Since the stress is evenly distributed, the deposition-side electrode 7b can be prevented from warping or bending.

上記した研削加工用砥石１４の製造方法については、堆積物層１３を形成するまでの行程は表マスク部材９を用いないこと以外実施例１と同様である。   About the manufacturing method of the above-mentioned grinding wheel 14 for grinding, the process until forming the deposit layer 13 is the same as that of Example 1 except not using the front mask member 9. FIG.

通電終了後、フック５ｂを梁３ｂからはずして被堆積側電極７ｂを溶液槽２から引き上げた。次に、図８に示すように、堆積物層１３を被堆積側電極７ｂから脱離した。堆積物層１３が乾燥しないうちに素早く、所定形状にこれを切断した。切断した堆積物層１３を２枚の平板ジグの間に挟んで所定時間だけ乾燥させて研削加工用砥石１４を得ることができるのである。   After the energization was completed, the hook 5b was removed from the beam 3b, and the deposition-side electrode 7b was pulled up from the solution tank 2. Next, as shown in FIG. 8, the deposit layer 13 was detached from the deposition-side electrode 7b. Before the deposit layer 13 was dried, it was quickly cut into a predetermined shape. The grindstone 14 can be obtained by sandwiching the cut deposit layer 13 between two flat plate jigs and drying it for a predetermined time.

本実施例によれば、砥石１４のエッジが良好に得られるのである。   According to this embodiment, the edge of the grindstone 14 can be obtained satisfactorily.

実施例１及び実施例２において、被堆積側電極７ｂを金属線材を網目状に織り上げた金網体としても良い。例えば、図１０に示すように、被堆積側電極７bは、直径０．３４ｍｍの真鍮線材からなる＃１６メッシュの平織り金網体である。   In the first and second embodiments, the deposition-side electrode 7b may be a wire mesh body in which metal wires are woven into a mesh shape. For example, as shown in FIG. 10, the electrode 7b to be deposited is a # 16 mesh plain woven wire mesh body made of a brass wire having a diameter of 0.34 mm.

本実施例によれば、通電中の堆積物層１３の被堆積側電極７ｂからの剥離が防止できて、表面ムラ及び表面割れの少ない均一な堆積物層１３を得ることができる。故に、表面性状の優れた砥石１４を製造することができるのである。   According to the present embodiment, it is possible to prevent the deposit layer 13 being energized from being peeled off from the deposition-side electrode 7b, and to obtain a uniform deposit layer 13 with less surface unevenness and surface cracks. Therefore, the grindstone 14 having excellent surface properties can be manufactured.

本発明による研削加工用砥石の製造装置の斜視図である。It is a perspective view of the manufacturing apparatus of the grindstone for grinding by this invention. 本発明による研削加工用砥石の製造装置の被堆積側電極の要部の部分正面図である。It is a partial front view of the principal part of the deposition side electrode of the manufacturing apparatus of the grindstone for grinding by this invention. 本発明による研削加工用砥石の製造装置の被堆積側電極の要部の部分正面図である。It is a partial front view of the principal part of the deposition side electrode of the manufacturing apparatus of the grindstone for grinding by this invention. 本発明による研削加工用砥石の製造装置の被堆積側電極の要部の部分正面図である。It is a partial front view of the principal part of the deposition side electrode of the manufacturing apparatus of the grindstone for grinding by this invention. 本発明による研削加工用砥石の製造装置の被堆積側電極の要部の部分正面図である。It is a partial front view of the principal part of the deposition side electrode of the manufacturing apparatus of the grindstone for grinding by this invention. 図３のＡ−Ａ線における断面図である。It is sectional drawing in the AA of FIG. 本発明による研削加工用砥石の製造装置の要部の分解斜視図である。It is a disassembled perspective view of the principal part of the manufacturing apparatus of the grindstone for grinding by this invention. 本発明による研削加工用砥石の製造装置の要部の分解斜視図である。It is a disassembled perspective view of the principal part of the manufacturing apparatus of the grindstone for grinding by this invention. 本発明による研削加工用砥石の製造装置の要部の分解斜視図である。It is a disassembled perspective view of the principal part of the manufacturing apparatus of the grindstone for grinding by this invention. 本発明による研削加工用砥石の製造方法により製造した堆積物の斜視図である。It is a perspective view of the deposit manufactured by the manufacturing method of the grindstone for grinding according to the present invention. 本発明による研削加工用砥石の製造装置により製造した砥石の斜視図である。It is a perspective view of the grindstone manufactured with the grindstone manufacturing apparatus by the present invention. 本発明による研削加工用砥石の製造装置の要部の部分斜視図である。It is a fragmentary perspective view of the principal part of the manufacturing apparatus of the grindstone for grinding by this invention.

符号の説明Explanation of symbols

２ 溶液槽
５ｂ フック
７ａ 対向電極
７ｂ 被堆積側電極
８ 貫通穴
９ 表マスク部材
１１ 貫通窓
１２ 突起
１３ 堆積物層
１４ 砥石 2 Solution tank 5b Hook 7a Counter electrode 7b Deposition side electrode 8 Through hole 9 Table mask member 11 Through window 12 Protrusion 13 Deposit layer 14 Grinding stone

Claims (14)

砥粒を分散懸濁させた溶液に電界を与えて該砥粒を対向する一対の電極のうちの一方の電極上に電気泳動させ堆積させた後に脱離させて得られる平板状の研削加工用砥石の製造装置であって、
前記電極のうちの被堆積側電極は板状体であって一定間隔で設けられた複数の貫通穴を有し対向する他方の前記電極と反対側の前記貫通穴の端部を開閉自在に閉塞することを特徴とする研削加工用砥石の製造装置。 For grinding a flat plate obtained by applying an electric field to a solution in which abrasive grains are dispersed and suspended, and then causing the abrasive grains to electrophoretize and deposit on one of a pair of electrodes facing each other and then desorbing . A whetstone manufacturing device,
The deposition side electrode is openably closed end portion of the through hole in the other of said electrode facing have a plurality of through-holes formed at regular intervals a plate-like body opposite of said electrode An apparatus for producing a grinding wheel for grinding, characterized in that: 前記貫通穴の断面形状は円形であることを特徴とする請求項１記載の製造装置。   The manufacturing apparatus according to claim 1, wherein the through hole has a circular cross-sectional shape. 前記電極は前記溶液の液面に対して略垂直に前記溶液中に懸下されることを特徴とする請求項１又は２記載の製造装置。   The manufacturing apparatus according to claim 1, wherein the electrode is suspended in the solution substantially perpendicularly to a liquid surface of the solution. 前記被堆積側電極は被堆積表面を分割するように少なくとも一部に非導電性材料を与えられていることを特徴とする請求項１乃至３のうちの１に記載の製造装置。   The manufacturing apparatus according to claim 1, wherein the deposition-side electrode is provided with a non-conductive material at least partially so as to divide the deposition surface. 前記被堆積表面には貫通窓を有する非導電性材料からなる板状体が密着配置されていることを特徴とする請求項４記載の製造装置。   The manufacturing apparatus according to claim 4, wherein a plate-like body made of a non-conductive material having a through window is disposed in close contact with the surface to be deposited. 前記貫通窓の断面形状は長方形であることを特徴とする請求項５記載の製造装置。   The manufacturing apparatus according to claim 5, wherein a cross-sectional shape of the through window is a rectangle. 砥粒を分散懸濁させた溶液に電界を与えて該砥粒を対向する一対の電極のうちの一方の電極上に電気泳動させ堆積させた後に脱離させて得られる平板状の研削加工用砥石の製造方法であって、
一定間隔で設けられた複数の貫通穴を有する板状体からなる第１の電極を、これと対をなす板状体からなる第２の電極と反対側の前記貫通穴の端部を開閉自在に閉塞し、前記第２の電極に対向するように前記溶液中に配置する電極配置ステップと、
前記第１の電極が被堆積側電極となるように前記第１及び第２の電極に通電する通電ステップとを含むことを特徴とする研削加工用砥石の製造方法。 For grinding a flat plate obtained by applying an electric field to a solution in which abrasive grains are dispersed and suspended, and then causing the abrasive grains to electrophoretize and deposit on one of a pair of electrodes facing each other and then desorbing . A method for manufacturing a grindstone, comprising:
The first electrode made of a plate-like body having a plurality of through-holes provided at regular intervals can be freely opened and closed at the end of the through-hole opposite to the second electrode made of a plate-like body that forms a pair with the first electrode. An electrode disposition step of disposing in the solution so as to face the second electrode ;
A method of manufacturing a grindstone for grinding, comprising: an energization step of energizing the first and second electrodes so that the first electrode becomes a deposition-side electrode. 前記貫通穴の断面形状は円形であることを特徴とする請求項７記載の製造方法。   The manufacturing method according to claim 7, wherein the through hole has a circular cross-sectional shape. 前記電極配置ステップは、前記第１及び第２の電極を前記溶液の液面に対して略垂直に前記溶液中に懸下するステップを含むことを特徴とする請求項７又は８記載の製造方法。   9. The manufacturing method according to claim 7, wherein the electrode arranging step includes a step of suspending the first and second electrodes in the solution substantially perpendicular to a liquid surface of the solution. . 前記電極配置ステップの前に、前記第１の電極の被堆積表面を分割するように少なくとも一部に非導電性材料からなるマスク材を与える電極加工ステップを含むことを特徴とする請求項７乃至９のうちの１に記載の製造方法。   8. The electrode processing step of providing a mask material made of a non-conductive material at least partially so as to divide the deposition surface of the first electrode before the electrode arranging step. 10. The production method according to 1 out of 9. 前記電極加工ステップは、前記被堆積表面に貫通窓を有する非導電性材料からなる板状体のマスク材を密着配置するステップであることを特徴とする請求項１０記載の製造方法。   The manufacturing method according to claim 10, wherein the electrode processing step is a step of closely arranging a plate-shaped mask material made of a non-conductive material having a through window on the surface to be deposited. 前記貫通窓の断面形状が長方形であることを特徴とする請求項１１記載の製造方法。   The manufacturing method according to claim 11, wherein a cross-sectional shape of the through window is a rectangle. 前記通電ステップの後に、前記第１の電極上に堆積した堆積物を脱離する脱離ステップと、
対向する２枚の平板間に前記堆積物を挟んでこれを乾燥せしめる乾燥ステップと、を含むことを特徴とする請求項７乃至１２のうちの１に記載の製造方法。 A desorption step of desorbing deposits deposited on the first electrode after the energization step;
The method according to claim 7, further comprising a drying step of sandwiching the deposit between two opposing flat plates and drying the deposit. 前記通電ステップの後に、
前記マスク材を前記堆積物から脱離するステップと、
前記第１の電極上に堆積した堆積物を脱離する脱離ステップと、
対向する２枚の平板間に前記堆積物を挟んでこれを乾燥せしめる乾燥ステップと、を含むことを特徴とする請求項１０乃至１２のうちの１に記載の製造方法。 After the energizing step,
Desorbing the mask material from the deposit;
A desorption step of desorbing a deposit deposited on the first electrode;
The manufacturing method according to claim 10, further comprising a drying step of sandwiching the deposit between two opposing flat plates and drying the deposit.
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US9399826B2 (en) 2014-05-15 2016-07-26 Samsung Electronics Co., Ltd. Thin film deposition apparatus and thin film deposition method using electric field
JP7246856B2 (en) 2018-02-16 2023-03-28 株式会社プロスパイラ REAR SUSPENSION DEVICE AND VEHICLE DRIVING METHOD

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Publication number Priority date Publication date Assignee Title
US9399826B2 (en) 2014-05-15 2016-07-26 Samsung Electronics Co., Ltd. Thin film deposition apparatus and thin film deposition method using electric field
JP7246856B2 (en) 2018-02-16 2023-03-28 株式会社プロスパイラ REAR SUSPENSION DEVICE AND VEHICLE DRIVING METHOD

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