JP5117270B2 - 配線基板、半導体装置、ならびに半導体装置の製造方法 - Google Patents
配線基板、半導体装置、ならびに半導体装置の製造方法 Download PDFInfo
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- JP5117270B2 JP5117270B2 JP2008116210A JP2008116210A JP5117270B2 JP 5117270 B2 JP5117270 B2 JP 5117270B2 JP 2008116210 A JP2008116210 A JP 2008116210A JP 2008116210 A JP2008116210 A JP 2008116210A JP 5117270 B2 JP5117270 B2 JP 5117270B2
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Description
半導体装置30は、図2に示すように、配線基板10の上面の半導体チップ搭載領域15上にシート状接着剤16を介して半導体チップ17が搭載され、半導体チップ17の電極パッド部(不図示)と配線基板10のワイヤボンド端子部(不図示)とが金属細線(ワイヤ)18で電気的に接続されている。そして、これら半導体チップ17および金属細線18を覆うように樹脂19により封止されている。また、配線基板10の上面とは反対側の面である下面には外部接続端子20が形成されている。
次に、配線基板10の平面構造について説明する。
以上説明した配線基板10は、上述の構成に限らず例えば以下のような構成であってもよい。図3は配線基板10の変更例である配線基板10aの平面構造を示しており、図4は配線基板10の他の変更例である配線基板10bの平面構造を示しており、図5は配線基板10のさらに他の変更例である配線基板10cの平面構造を示しており、図6は配線基板10のさらに他の変更例である配線基板10dの平面構造を示している。なお、配線基板10a〜10dは、配線基板10のダミー配線パターン6、溝状パターン12、もしくはその双方の形態を変更したものである。以下では、説明の便宜上、この変更部分についてのみ説明を行い、配線基板10の部材と同一の機能を有する部材には同一の部材番号を付し、その説明を省略する。
次に、半導体装置30の製造方法について説明する。図7は、半導体装置30の製造工程を示している。
8 配線パターン
9 ソルダーレジスト
10、10a、10b、10c、10d 配線基板
11b 貫通穴
12 溝状パターン
13 メタルパターン
15 半導体チップ搭載領域
16 シート状接着剤
17 半導体チップ
18 金属細線(ワイヤ)
19 樹脂
20 外部接続端子
30 半導体装置
Claims (13)
- 少なくとも1つの半導体チップを搭載するための半導体チップ搭載領域を有する面とは反対側の面に外部接続端子が設けられ、少なくとも上記半導体チップ搭載領域にソルダーレジストが塗布されている配線基板において、
上記半導体チップ搭載領域に上記配線基板を貫通する少なくとも1つの貫通穴が設けられ、上記半導体チップ搭載領域におけるソルダーレジストに上記貫通穴に通ずる溝状パターンが設けられ、かつ、上記半導体チップ搭載領域を有する面側の上記貫通穴周辺近傍にメタルパターンが設けられていることを特徴とする配線基板。 - 上記メタルパターンは、上記貫通穴の端部から0.5mm以内の領域に設けられていることを特徴とする請求項1に記載の配線基板。
- 上記溝状パターンは1つの上記貫通穴に対して複数の溝状パターンが形成され、
上記複数の溝状パターンは上記貫通穴を中心として互いに点対称となるようにそれぞれ形成されていることを特徴とする請求項1または2に記載の配線基板。 - 上記溝状パターンは、1つの上記貫通穴に対して複数の溝状パターンが形成され、
上記複数の溝状パターンは、上記貫通穴を中心とした円状の形状を有する第1溝状パターン部と、当該第1溝状パターン部と上記貫通穴とを接続する第2溝状パターン部とからなることを特徴とする請求項1または2に記載の配線基板。 - 上記溝状パターンは、上記貫通穴から伸びる螺旋状の形状を有するように形成されていることを特徴とする請求項1または2に記載の配線基板。
- 上記溝状パターンは直線状、ギザギザ状、もしくは曲線状の形状を有することを特徴とする請求項3〜5のいずれか一項に記載の配線基板。
- 上記半導体チップ搭載領域には、自身に含まれる配線パターンの末端が上記半導体チップ搭載領域内では開放されている形状のダミー配線パターンが設けられていることを特徴とする請求項1〜6のいずれか一項に記載の配線基板。
- 半導体チップ搭載領域に半導体チップが搭載され、かつ、上記半導体チップ搭載領域を有する面とは反対側の面に外部接続端子が形成されている請求項1〜7のいずれか一項に記載の配線基板を備えていることを特徴とする半導体装置。
- 上記半導体チップはシート状接着剤により上記配線基板へ搭載され、
上記半導体チップと上記配線基板とは導電性の金属細線により電気的に接続され、
上記半導体チップと上記金属細線とを覆うように樹脂が設けられて樹脂封止され、
上記半導体チップ搭載領域を有する面とは反対側の面に外部接続端子が設けられていることを特徴とする請求項8に記載の半導体装置。 - 少なくとも1つの半導体チップを搭載するための半導体チップ搭載領域を有する面とは反対側の面に外部接続端子が設けられる配線基板を備えている半導体装置の製造方法であって、
上記半導体チップ搭載領域に上記配線基板を貫通する少なくとも1つの貫通穴を形成する貫通穴形成工程と、
上記半導体チップ搭載領域を有する面側における上記貫通穴周辺近傍にメタルパターンを形成するメタルパターン形成工程と、
上記貫通穴および上記メタルパターンを形成した配線基板にソルダーレジストを塗布するレジスト塗布工程と、
上記貫通穴に塗布されたソルダーレジストを除去するレジスト除去工程と、
上記半導体チップ搭載領域におけるソルダーレジストに上記貫通穴に通ずる溝状パターンを形成する溝状パターン形成工程とを有することを特徴とする半導体装置の製造方法。 - 上記メタルパターン形成工程において、上記メタルパターンは上記貫通穴の端部から0.5mm以内の領域に形成することを特徴とする請求項10に記載の半導体装置の製造方法。
- 上記レジスト塗布工程前に、上記配線基板に、配線パターンの末端が上記半導体チップ搭載領域内では開放されている形状のダミー配線パターンを含む所望の配線パターンを形成する配線パターン形成工程をさらに有することを特徴とする請求項11に記載の半導体装置の製造方法。
- 上記配線基板の上記半導体チップ搭載領域にシート状接着剤を用いて半導体チップを搭載する半導体チップ搭載工程と、
上記半導体チップと上記配線基板とを導電性の金属細線を用いて電気的に接続する接続工程と、
上記半導体チップと上記金属細線とを覆うように樹脂を設けて樹脂封止する樹脂封止工程と、
上記半導体チップ搭載領域を有する面とは反対側の面に外部接続端子を形成する外部接続端子形成工程とをさらに有することを特徴とする請求項12に記載の半導体装置の製造方法。
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