JP5090739B2 - 薄膜の蒸着 - Google Patents
薄膜の蒸着 Download PDFInfo
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- JP5090739B2 JP5090739B2 JP2006530137A JP2006530137A JP5090739B2 JP 5090739 B2 JP5090739 B2 JP 5090739B2 JP 2006530137 A JP2006530137 A JP 2006530137A JP 2006530137 A JP2006530137 A JP 2006530137A JP 5090739 B2 JP5090739 B2 JP 5090739B2
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
- B05D1/283—Transferring monomolecular layers or solutions of molecules adapted for forming monomolecular layers from carrying elements
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
- B05D3/141—Plasma treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
- G02F1/133719—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films with coupling agent molecules, e.g. silane
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Composite Materials (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Liquid Crystal (AREA)
Description
i)基板をプラズマ処理する工程と、
ii)オルガノポリシロキサンポリマー、オルガノポリシロキサンオリゴマー、シロキサン樹脂及びポリシランの群から選択される1つ以上の化合物を含む液体コーティング材料をソフトリソグラフィック印刷法により基板表面に塗布して、基板表面上にパターン化皮膜を形成する工程と、
iii)必要な場合は、基板表面から残留液体コーティング材料を除去する工程と
を含み、基板表面上にパターン化薄膜を適用する方法であって、この方法は液体コーティング材料が硬化工程を経ることを必要としない、パターン化薄膜を適用する方法が提供される。
(式中、Bは、−R'''−(Si(R'')2−O)r−Si(R'')2−であり、且つR''は上記と同様であり、R'''は二価炭化水素基であり、rはゼロ、1〜6の間の整数であり、dは0又は整数、最も好ましくは、dは0、1又は2であり、XはR''と同一であるか、又は6個までの炭素原子を有するアルキル基を含有するアルコキシ基、エポキシ基、メタクリルオキシ基若しくはハライドのような加水分解性基であり得る)から選択されてもよい。好ましくは、オルガノポリシロキサンは、5〜20の重合度を有する塩素末端ポリジメチルシロキサンではなく、この場合、各末端ケイ素は1〜3個のSi−Cl結合を含有する。
上記の図1に関連して記載したような標準のソフトリソグラフィック印刷法により、本プロセスに用いるための平面(平坦)スタンプを調製した。本発明の一連の実施例では、スタンプは以下のように作製した:
シルガード(SYLGARD)(登録商標)184シリコーンエラストマー パートA及びBを10:1の比で混合し、真空下で脱気して、ペトリ皿中の平坦ケイ素ウェハ上に注いだ。シルガード(SYLGARD)(登録商標)184シリコーンエラストマーを65℃で2時間硬化させて、ケイ素ウェハから剥離して、1×2cmの長方形に切断した。ケイ素と接触していた側面をペンタン中のシロキサンの希釈溶液で拭いて、乾燥させた。
本実施例は、種々の異なる基板材料、即ちAu/Pdスパッタガラス微小スライド、炭素被覆ガラススライド、銅箔及びアルミニウム箔上へのマイクロコンタクトプリンティングにより、本発明に従うプロセスの融通性を示すよう意図された。
この実施例において、用いた基板は、酸化インジウムスズ(ITO)被覆プラスチックであった。PDMS(350mm2S−1)及び実施例1に記載した方法を用いて基板を処理した。表3の結果は、印刷及び非印刷領域間を明瞭に弁別する。トリメチルシリル末端封止メチル水素シロキサンのマイクロコンタクトプリンティングに関する印刷及び非印刷領域間の弁別も観察された。
実施例1に記載したのと同一の方法を用いて、高粘度PDMSをガラススライド上に印刷したが、この場合、12,500、30,000及び60,000mm2S−1の粘度を有するPDMSの試料を標準シルガード(SYLGARD)(登録商標)184平坦スタンプ上にインク処理し、次にガラス基板上に印刷した結果を、ガラス基板上への印刷後に比較した。表4aに見出される結果は、高粘度PDMS液体を用いた印刷皮膜はガラス基板に関して非常にポジティブな結果も生じたということを示す。
i)プラズマ処理スライド上への適用前に15分間、スタンプ上にインク処理する;
ii)プラズマ処理スライド上への適用前に1時間、スタンプ上にインク処理する;及び
iii)所望のプラズマ処理ガラス上のスタンピング前に平面ガラス上に3回スタンピングする。結果を表4bに示すが、全ての場合において、PDMSが首尾よくガラス基板上に転写されたことを示す。
ガラススライドを最初に酸素ガス(圧力0.2mbar(20Pa)、60秒処理)中でプラズマ処理(HarrickPDC−002プラズマクリーナー、低電力)した。プラズマ処理直後(5分以内)に、シリコーンを基板上に注いでそれを完全に被覆し、次に一晩放置した。試料をトルエン中で3回洗浄し、乾燥した後、接触角を測定した。いくつかの場合には、試料をトルエン中に一晩浸漬し、トルエンで再洗浄して、非反応シロキサンの完全除去を保証した。
架橋ビニル化フェニルシルセスキオキサン樹脂の形態のシロキサン樹脂の試料をガラススライド上に被覆し、実施例1に従ってプラズマ処理し、その後、選定領域でマイクロコンタクト印刷(実施例1に従って)して、プラズマ処理及びシリコーン樹脂上のシロキサン印刷の耐久性を調べた。表6に示した結果は、プラズマ処理され、次にPDMS350mm2S−1及びトリメチルシリル末端封止メチル水素シロキサンで特定区域においてマイクロコンタクト印刷された樹脂被覆スライドに関する接触角測定値を示す。接触角測定は、スライドのプラズマ処理後14日の期間にわたって実施して、各スライドの印刷及び非印刷領域の両方を測定した。
液晶配向を変更するための多数の方法は、シラン単一層の使用を含め既知であるが、これは、マイクロコンタクトプリンティング又は同様のソフトリソグラフィック法によりPDMSを利用するこのような変更の第1の例であると考えられる。
Claims (12)
- i)基板をプラズマ処理する工程と、
ii)オルガノポリシロキサンポリマー、オルガノポリシロキサンオリゴマー、シロキサン樹脂及びポリシランの群から選択される1つ以上の化合物を含む液体コーティング材料をソフトリソグラフィック印刷法により基板表面に塗布して、基板表面上にパターン化皮膜を形成する工程と、
iii)必要な場合は、基板表面から残留液体コーティング材料を除去する工程と
を含む、基板上にパターン化薄膜を適用する方法であって、
この方法は液体コーティング材料が硬化工程を経ることを必要とせず、
前記工程i)の前に、噴霧液及び/又は固体コーティング形成材料を大気圧プラズマ放電及び/又は該大気圧プラズマ放電から生じるイオン化/励起ガス流中に導入し、大気圧条件下で前記基板を噴霧コーティング形成材料に曝露することにより、前記基板が前処理されているパターン化薄膜を適用する方法。 - 前記工程(i)が、大気圧グロー放電源、誘電体バリア放電(DBD)源、低圧グロー放電又は後放電プラズマ源、コロナ放電源及び/又はマイクロ波放電源の群から選択される適切な放射源を利用して行われる請求項1に記載のパターン化薄膜を適用する方法。
- 被覆されるべき前記基板が、金属、金属箔、金属酸化物、ガラス、炭素質材料、セラミック、半導体材料、プラスチック、液晶、高分子ケイ素含有材料、セルロース系材料、積層体及び/又はフォトレジスト材料から選択される請求項1又は2に記載のパターン化薄膜を適用する方法。
- 前記液体オルガノポリシロキサンポリマー/オリゴマーが、適切な線状、分枝鎖状又は環状のオルガノポリシロキサン若しくはそのコポリマー、又は液体若しくはワックス形態の低分子量シリコーン樹脂である請求項1〜3のいずれか一項に記載のパターン化薄膜を適用する方法。
- 前記工程i)において、前記基板がプラズマ処理され、その後、オルガノポリシロキサンコーティング材料を任意の適切な塗布方法により該基板に塗布する請求項1〜4のいずれか一項に記載のパターン化薄膜を適用する方法。
- 前記塗布方法が、スクリーン印刷すること、オルガノポリシロキサンコーティング材料の浴中に浸漬すること、コーティング材料を噴霧すること、コーティング材料を塗布すること、又は該基板のコーティングをもたらすのに十分な所定時間の間、ガス状若しくはエアロゾル状のコーティング材料の雰囲気中に置くことから選択される請求項5に記載のパターン化薄膜を適用する方法。
- 前記ソフトリソグラフィック印刷法がマイクロコンタクトプリンティング(μCP)である請求項1〜6のいずれか一項に記載のパターン化薄膜を適用する方法。
- 適用後に、前記基板上の薄膜が少なくとも部分的にさらにプラズマ処理される及び/又は付加的コーティングが前記薄膜に対する第二層に適用される請求項1〜7のいずれか一項に記載のパターン化薄膜を適用する方法。
- 液晶の配向を変更する方法であって、液晶の配向が変更されるように請求項1〜8のいずれか一項に記載の基板表面に薄膜を適用することを含む液晶の配向を変更する方法。
- 請求項1〜8のいずれか一項に記載の方法で適用された薄膜を備える基板。
- 請求項1〜8のいずれか一項に記載の方法により得られる被覆基板。
- プロセス工程中に、予め被覆されないか、部分的に被覆されるか又は完全に被覆される基板に対する更なる物理的変化又は化学的変化を実質的に防止するか又は阻止するために、前記基板表面の一領域が遮蔽される請求項1〜8のいずれか一項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB0323295.6A GB0323295D0 (en) | 2003-10-04 | 2003-10-04 | Deposition of thin films |
GB0323295.6 | 2003-10-04 | ||
PCT/EP2004/011359 WO2005033189A1 (en) | 2003-10-04 | 2004-09-30 | Deposition of thin films |
Publications (2)
Publication Number | Publication Date |
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JP2007522914A JP2007522914A (ja) | 2007-08-16 |
JP5090739B2 true JP5090739B2 (ja) | 2012-12-05 |
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JP2006530137A Expired - Fee Related JP5090739B2 (ja) | 2003-10-04 | 2004-09-30 | 薄膜の蒸着 |
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Country | Link |
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US (1) | US20070166479A1 (ja) |
EP (1) | EP1668066A1 (ja) |
JP (1) | JP5090739B2 (ja) |
CN (1) | CN1863853B (ja) |
GB (1) | GB0323295D0 (ja) |
WO (1) | WO2005033189A1 (ja) |
Cited By (1)
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KR101913908B1 (ko) * | 2016-02-18 | 2018-10-31 | 한양대학교 에리카산학협력단 | 고분자 기판의 표면 개질 방법 및 이에 의하여 개질된 표면을 갖는 고분자 기판 |
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KR101913908B1 (ko) * | 2016-02-18 | 2018-10-31 | 한양대학교 에리카산학협력단 | 고분자 기판의 표면 개질 방법 및 이에 의하여 개질된 표면을 갖는 고분자 기판 |
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CN1863853A (zh) | 2006-11-15 |
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GB0323295D0 (en) | 2003-11-05 |
JP2007522914A (ja) | 2007-08-16 |
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