JP5019701B2 - 表示装置 - Google Patents
表示装置 Download PDFInfo
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- JP5019701B2 JP5019701B2 JP2004276821A JP2004276821A JP5019701B2 JP 5019701 B2 JP5019701 B2 JP 5019701B2 JP 2004276821 A JP2004276821 A JP 2004276821A JP 2004276821 A JP2004276821 A JP 2004276821A JP 5019701 B2 JP5019701 B2 JP 5019701B2
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- Prior art keywords
- light
- electrode
- resin
- present
- absorbing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011347 resin Substances 0.000 claims description 95
- 229920005989 resin Polymers 0.000 claims description 95
- 239000000463 material Substances 0.000 claims description 43
- 238000005192 partition Methods 0.000 claims description 42
- 239000000126 substance Substances 0.000 claims description 40
- 229920001721 polyimide Polymers 0.000 claims description 34
- 239000000049 pigment Substances 0.000 claims description 28
- 239000009719 polyimide resin Substances 0.000 claims description 25
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 24
- 239000002270 dispersing agent Substances 0.000 claims description 17
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 15
- 239000001301 oxygen Substances 0.000 claims description 15
- 229910052760 oxygen Inorganic materials 0.000 claims description 15
- 229910052719 titanium Inorganic materials 0.000 claims description 15
- 239000010936 titanium Substances 0.000 claims description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- 238000002834 transmittance Methods 0.000 claims description 12
- 150000001412 amines Chemical class 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 51
- 239000010408 film Substances 0.000 description 33
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 23
- 239000000203 mixture Substances 0.000 description 21
- 239000011229 interlayer Substances 0.000 description 11
- 239000002245 particle Substances 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 239000004642 Polyimide Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 8
- 230000006866 deterioration Effects 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000006185 dispersion Substances 0.000 description 6
- 230000031700 light absorption Effects 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000000872 buffer Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910021332 silicide Inorganic materials 0.000 description 3
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000005236 sound signal Effects 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000001237 Raman spectrum Methods 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000005499 laser crystallization Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
Images
Landscapes
- Optical Filters (AREA)
- Electroluminescent Light Sources (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Description
本発明の本発明の光吸収性シロキサン組成物および光吸収性ポリイミド組成物、並びに光吸収性樹脂について説明する。なお、本明細書中では、本発明の光吸収性シロキサン組成物と光吸収性ポリイミド組成物とをあわせて光吸収性樹脂用組成物という。
本発明の光吸収性樹脂を発光装置に用いた場合について、図1を用いて説明する。
本実施の形態では、本発明の光吸収性樹脂をカラーフィルター用ブラックマトリクスとして用いた場合について、図3を用いて説明する。
11 トランジスタ
12 発光素子
13 第1の電極
14 第2の電極
15 発光物質を含む層
16 第1層間絶縁膜
17 配線
18 隔壁
19 第2層間絶縁膜
Claims (4)
- 第1の電極と、
前記第1の電極に接する発光物質を含む層と、
前記発光物質を含む層に接する第2の電極とを有する画素を複数備え、
前記複数の画素のそれぞれにおいて、前記発光物質を含む層は、前記第1の電極の端部に接した隔壁によって分離されており、
前記隔壁は、窒素と酸素とチタンとを含む顔料と、アミン価が互いに異なる複数種の分散剤と、第1のポリイミド樹脂とを含む光透過率が3%以下の光吸収性樹脂と、第2のポリイミド樹脂との積層体であり、前記光吸収性樹脂の端部は前記第1の電極の端部を覆い、前記第2のポリイミド樹脂の端部は、前記第1の電極の端部を覆った前記光吸収性樹脂を覆い、前記光吸収性樹脂の端部は前記第1の電極の端部に接し、且つ前記第2のポリイミド樹脂の端部は前記第1の電極の端部に接し、
前記光吸収性樹脂は、300℃で1時間加熱した前後で、波長350nmから750nmにおける光透過率が3%以下を維持する
ことを特徴とする表示装置。 - 請求項1において、前記顔料はチタンブラックであることを特徴とする表示装置。
- 請求項1又は請求項2において、前記表示装置はパッシブ型であることを特徴とする表示装置。
- 請求項1又は請求項2において、前記第1の電極はトランジスタに接続されており、前記表示装置はアクティブ型であることを特徴とする表示装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004276821A JP5019701B2 (ja) | 2004-09-24 | 2004-09-24 | 表示装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004276821A JP5019701B2 (ja) | 2004-09-24 | 2004-09-24 | 表示装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2006089597A JP2006089597A (ja) | 2006-04-06 |
JP2006089597A5 JP2006089597A5 (ja) | 2007-11-08 |
JP5019701B2 true JP5019701B2 (ja) | 2012-09-05 |
Family
ID=36230881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004276821A Expired - Fee Related JP5019701B2 (ja) | 2004-09-24 | 2004-09-24 | 表示装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5019701B2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8722288B2 (en) | 2009-11-06 | 2014-05-13 | Hodogaya Chemical Co., Ltd. | Diphenylnaphthylamine derivatives |
US10229959B2 (en) | 2016-08-10 | 2019-03-12 | Joled Inc. | Organic el display panel and method of manufacturing organic el display panel |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5096230B2 (ja) * | 2008-05-29 | 2012-12-12 | エルジー ディスプレイ カンパニー リミテッド | 有機el表示装置およびその製造方法 |
JP2011108395A (ja) * | 2009-11-13 | 2011-06-02 | Hitachi Displays Ltd | 有機発光表示装置 |
WO2013047621A1 (ja) * | 2011-09-30 | 2013-04-04 | シャープ株式会社 | 表示装置及び表示装置の製造方法 |
US20220115446A1 (en) * | 2019-01-18 | 2022-04-14 | Semiconductor Energy Laboratory Co., Ltd. | Display Device, Display Module, and Electronic Device |
KR20200119946A (ko) | 2019-04-10 | 2020-10-21 | 삼성디스플레이 주식회사 | 표시 장치 |
WO2023190317A1 (ja) * | 2022-03-31 | 2023-10-05 | 東レ株式会社 | 表示装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH068406B2 (ja) * | 1985-11-21 | 1994-02-02 | 株式会社寺岡製作所 | 光不透過性粘着テ−プ若しくはシ−ト |
US5869929A (en) * | 1997-02-04 | 1999-02-09 | Idemitsu Kosan Co., Ltd. | Multicolor luminescent device |
JPH11191491A (ja) * | 1997-10-16 | 1999-07-13 | Toray Ind Inc | 有機電界発光装置 |
JP2002208475A (ja) * | 2001-01-11 | 2002-07-26 | Toray Ind Inc | 有機電界発光装置 |
JP4106250B2 (ja) * | 2002-08-02 | 2008-06-25 | 日本ビー・ケミカル株式会社 | 調色用顔料分散ペースト組成物およびその用途 |
JP2004127933A (ja) * | 2002-09-11 | 2004-04-22 | Semiconductor Energy Lab Co Ltd | 発光装置およびその作製方法 |
JP2004227944A (ja) * | 2003-01-23 | 2004-08-12 | Semiconductor Energy Lab Co Ltd | 表示装置の製造方法 |
-
2004
- 2004-09-24 JP JP2004276821A patent/JP5019701B2/ja not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8722288B2 (en) | 2009-11-06 | 2014-05-13 | Hodogaya Chemical Co., Ltd. | Diphenylnaphthylamine derivatives |
US10229959B2 (en) | 2016-08-10 | 2019-03-12 | Joled Inc. | Organic el display panel and method of manufacturing organic el display panel |
Also Published As
Publication number | Publication date |
---|---|
JP2006089597A (ja) | 2006-04-06 |
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