JP5013074B2 - 半導体集積回路装置 - Google Patents
半導体集積回路装置 Download PDFInfo
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- JP5013074B2 JP5013074B2 JP2007085584A JP2007085584A JP5013074B2 JP 5013074 B2 JP5013074 B2 JP 5013074B2 JP 2007085584 A JP2007085584 A JP 2007085584A JP 2007085584 A JP2007085584 A JP 2007085584A JP 5013074 B2 JP5013074 B2 JP 5013074B2
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- 239000004065 semiconductor Substances 0.000 title claims description 41
- 230000015654 memory Effects 0.000 claims description 264
- 238000009966 trimming Methods 0.000 claims description 58
- 230000007704 transition Effects 0.000 claims description 25
- 230000004044 response Effects 0.000 claims description 15
- 230000001052 transient effect Effects 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 19
- 238000000034 method Methods 0.000 description 12
- 230000002093 peripheral effect Effects 0.000 description 12
- 230000008569 process Effects 0.000 description 11
- 239000013078 crystal Substances 0.000 description 7
- 230000006870 function Effects 0.000 description 6
- 238000010187 selection method Methods 0.000 description 6
- 150000004767 nitrides Chemical class 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 230000010355 oscillation Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- 238000007562 laser obscuration time method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000006386 memory function Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/10—Programming or data input circuits
- G11C16/20—Initialising; Data preset; Chip identification
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/24—Bit-line control circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/26—Sensing or reading circuits; Data output circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0207—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B43/00—EEPROM devices comprising charge-trapping gate insulators
- H10B43/10—EEPROM devices comprising charge-trapping gate insulators characterised by the top-view layout
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B43/00—EEPROM devices comprising charge-trapping gate insulators
- H10B43/30—EEPROM devices comprising charge-trapping gate insulators characterised by the memory core region
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Read Only Memory (AREA)
- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
- Non-Volatile Memory (AREA)
- Electronic Switches (AREA)
Description
50−1〜50−52 メモリセルブロック
50A−1〜50A−52 メモリセルブロック
51−1〜51−52 メモリセル
52−1〜52−52 データラッチ回路
53−1〜53−52 消去/書込み制御回路
54−1〜54−52 入出力制御回路
55−1〜55−52 Yスイッチ
64、64A パワーオンリセット回路
642 第1のCR動作回路
644 第1のDC動作回路
646、646A 第1の論理回路
66、66A パワーオンプリチャージ回路
662 第2のCR動作回路
664 第2のDC動作回路
666、666A 第2の論理回路
68 シリアルインタフェース回路
70 コントロールロジック回路
72 アドレス発生器及びYデコーダ
74 チャージポンプ及びレベル制御回路
76 トリミングメモリ
81 周辺回路領域
81−1 第1のウェル領域
81−2 第2のウェル領域
83 第3のウェル領域
85 共通のウェル領域
87 半導体基板
Claims (3)
- トリミング情報を記憶し、データ線プリチャージ完了後に前記トリミング情報の読出し動作をする不揮発性メモリと、電源投入に応答して動作を開始して前記不揮発性メモリの制御回路をリセットするパワーオンリセット回路とを有する半導体集積回路装置であって、
前記電源投入に応答して動作を開始し、データ線プリチャージ動作を行うパワーオンプリチャージ回路を有し、
前記パワーオンリセット回路は、前記電源投入から第1の所定時間が経過した時点で電圧レベルの切換りを示すリセット解除信号を出力する第1のCR動作回路を有し、
前記パワーオンプリチャージ回路は、前記電源投入から第2の所定時間が経過した時点で電圧レベルの切換りを示すプリチャージ完了信号を出力する第2のCR動作回路を有し、
前記第1の所定時間は前記第2の所定時間よりも長く、
前記パワーオンリセット回路は、前記電源投入に応答して、過渡時の電源電圧が第1の所定の電圧に達した段階で別のリセット解除信号を出力する第1のDC動作回路と、前記第1のCR動作回路の出力信号と前記第1のDC動作回路の出力信号とを論理演算して、リセット信号を出力する第1の論理回路とを更に有し、
前記パワーオンプリチャージ回路は、前記電源投入に応答して、前記過渡時の電源電圧が第2の所定の電圧に達した段階で別のプリチャージ完了信号を出力する第2のDC動作回路と、前記第2のCR動作回路の出力信号と前記第2のDC動作回路の出力信号とを論理演算して、データ線プリチャージ信号を出力する第2の論理回路とを更に有し、
前記第1の所定の電圧は前記第2の所定の電圧よりも高いことを特徴とする半導体集積回路装置。 - 前記第1のCR動作回路の時定数は、前記第2のCR動作回路の時定数よりも大きいことを特徴とする請求項1に記載の半導体集積回路装置。
- 前記第1のCR動作回路および前記第2のCR動作回路は同種の回路素子で構成されていることを特徴とする請求項1または2記載の半導体集積回路装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007085584A JP5013074B2 (ja) | 2007-03-28 | 2007-03-28 | 半導体集積回路装置 |
PCT/JP2008/054911 WO2008120568A1 (ja) | 2007-03-28 | 2008-03-17 | 半導体集積回路装置 |
US12/532,879 US8004904B2 (en) | 2007-03-28 | 2008-03-17 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007085584A JP5013074B2 (ja) | 2007-03-28 | 2007-03-28 | 半導体集積回路装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008243329A JP2008243329A (ja) | 2008-10-09 |
JP5013074B2 true JP5013074B2 (ja) | 2012-08-29 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007085584A Active JP5013074B2 (ja) | 2007-03-28 | 2007-03-28 | 半導体集積回路装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8004904B2 (ja) |
JP (1) | JP5013074B2 (ja) |
WO (1) | WO2008120568A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8134856B2 (en) * | 2008-11-05 | 2012-03-13 | Qualcomm Incorporated | Data protection scheme during power-up in spin transfer torque magnetoresistive random access memory |
US8881085B1 (en) | 2010-06-03 | 2014-11-04 | Xilinx, Inc. | Cell-level electrostatic discharge protection for an integrated circuit |
WO2012153697A1 (en) * | 2011-05-06 | 2012-11-15 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor memory device |
US8842482B1 (en) | 2012-06-29 | 2014-09-23 | Cypress Semiconductor Corporation | Programmable memory with skewed replica and redundant bits for reset control |
US9058853B2 (en) * | 2012-08-16 | 2015-06-16 | Xilinx, Inc. | Integrated circuit having improved radiation immunity |
US9462674B1 (en) | 2013-08-26 | 2016-10-04 | Xilinx, Inc. | Circuits for and methods of providing a charge device model ground path using substrate taps in an integrated circuit device |
US20180137927A1 (en) * | 2016-04-16 | 2018-05-17 | Chengdu Haicun Ip Technology Llc | Three-Dimensional Vertical One-Time-Programmable Memory Comprising No Separate Diode Layer |
CN113872580A (zh) * | 2021-10-11 | 2021-12-31 | 烽火通信科技股份有限公司 | 一种上电复位和掉电复位产生电路与电子设备 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3456303B2 (ja) * | 1995-05-19 | 2003-10-14 | 富士通株式会社 | 半導体集積回路 |
JP2002150789A (ja) * | 2000-11-09 | 2002-05-24 | Hitachi Ltd | 不揮発性半導体記憶装置 |
KR100420125B1 (ko) | 2002-02-02 | 2004-03-02 | 삼성전자주식회사 | 비휘발성 반도체 메모리 장치와 그것의 파워-업 독출 방법 |
KR100463201B1 (ko) * | 2002-05-28 | 2004-12-23 | 삼성전자주식회사 | 파워 검출 회로, 이를 이용한 플래시 메모리 장치, 그 플래시 메모리 장치의 파워-온 독출 신호 발생 방법 및 플래시 메모리 장치의 안정적인 파워-온 독출 방법 |
JP2005293659A (ja) * | 2004-03-31 | 2005-10-20 | Nec Electronics Corp | メモリ装置とリファレンス電流設定方法 |
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2007
- 2007-03-28 JP JP2007085584A patent/JP5013074B2/ja active Active
-
2008
- 2008-03-17 WO PCT/JP2008/054911 patent/WO2008120568A1/ja active Application Filing
- 2008-03-17 US US12/532,879 patent/US8004904B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
WO2008120568A1 (ja) | 2008-10-09 |
US20100085814A1 (en) | 2010-04-08 |
JP2008243329A (ja) | 2008-10-09 |
US8004904B2 (en) | 2011-08-23 |
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