JP4876732B2 - エポキシ樹脂組成物、その硬化物及び光半導体装置 - Google Patents
エポキシ樹脂組成物、その硬化物及び光半導体装置 Download PDFInfo
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Description
(1)エポキシ樹脂、多価カルボン酸無水物及び樹枝状高分子を含むエポキシ樹脂組成物。
(2)多価カルボン酸無水物が、下記一般式(1)で表される化合物である項(1)記載のエポキシ樹脂組成物。
(4)樹枝状高分子が、エポキシ樹脂100重量部に対して1〜60重量部含まれる項(1)〜(3)のいずれかに記載のエポキシ樹脂組成物。
(5)項(1)〜(4)のいずれかに記載のエポキシ樹脂組成物を硬化させてなる硬化物。
(6)項(5)記載の硬化物で光半導体素子が封止されてなる光半導体装置。
本発明に用いる多価カルボン酸無水物は特に制限は無く、例えば無水コハク酸、無水マレイン酸、無水フタル酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、メチルエンドメチレンテトラヒドロ無水フタル酸、無水イタコン酸、ピロメリット酸無水物、ベンゾフェノンテトラカルボン酸無水物等が挙げられる。これらは二種類以上併用してもよい。
(実施例1)
トリメチロールプロパンを核とし、2,2−ビス(ヒドロキシメチル)プロピオン酸を付加させて得られる樹枝状高分子(BOLTORN P−500:Perstorp社製)40重量部に対して、エポキシ樹脂として3’,4’−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート(セロキサイド2021P:ダイセル化学工業株式会社製/エポキシ当量138(g/eq))100重量部、硬化促進剤としてテトラ−n−ブチルホスホニウム o,o−ジエチルホスホロジチオネート(ヒシコーリンPX−4ET:日本化学工業株式会社製)1重量部、安定剤として9,10−ジヒドロ−9−ホスファ−10−オキサフェナンスレン−9−オキシド(HCA:三光化学株式会社製)1重量部を加え、80℃に加熱して攪拌し、均一に溶解させた。
3’,4’−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート(セロキサイド2021P:ダイセル化学工業株式会社製/エポキシ当量138(g/eq))100重量部、硬化促進剤としてテトラ−n−ブチルホスホニウム o,o−ジエチルホスホロジチオネート(ヒシコーリンPX−4ET:日本化学工業株式会社製)1重量部、安定剤として9,10−ジヒドロ−9−ホスファ−10−オキサフェナンスレン−9−オキシド(HCA:三光化学株式会社製)1重量部を加え、80℃に加熱して攪拌し、均一に溶解させた。
以下、実施例1と同様にして硬化物(II)を得た。
・外観:目視により判定した。
・クラック:硬化物を−30℃で20時間放置した後、室温(25℃)で10時間放置し、クラック発生の有無を目視で確認した。
○:クラック無し
×:クラック有り
Claims (5)
- 少なくとも1個のジヒドロキシモノカルボン酸が、2,2−ビス(ヒドロキシメチル)プロピオン酸、2,2−ビス(ヒドロキシメチル)ブタン酸から選ばれる1以上の化合物である請求項1記載のエポキシ樹脂組成物。
- 樹枝状高分子が、エポキシ樹脂100重量部に対して1〜60重量部含まれる請求項1又は2に記載のエポキシ樹脂組成物。
- 請求項1〜3のいずれかに記載のエポキシ樹脂組成物を硬化させてなる硬化物。
- 請求項4記載の硬化物で光半導体素子が封止されてなる光半導体装置。
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JP2009102510A (ja) * | 2007-10-23 | 2009-05-14 | Hitachi Chem Co Ltd | エポキシ樹脂硬化剤、エポキシ樹脂組成物、その硬化物及び光半導体装置 |
CN102112516A (zh) * | 2008-07-29 | 2011-06-29 | 日立化成工业株式会社 | 环氧树脂固化剂、环氧树脂组合物、其固化物以及光半导体装置 |
JP2010278411A (ja) * | 2009-04-28 | 2010-12-09 | Hitachi Chem Co Ltd | 白色コート剤、これを用いた光半導体素子搭載用基板及び光半導体装置 |
CN103649216A (zh) * | 2011-09-06 | 2014-03-19 | 株式会社大赛璐 | 光半导体密封用树脂组合物和使用其的光半导体装置 |
CN108473665A (zh) * | 2016-01-20 | 2018-08-31 | 新日本理化株式会社 | 环氧树脂组合物 |
CN112375340B (zh) * | 2021-01-15 | 2021-03-26 | 武汉市三选科技有限公司 | 晶圆级封装密封用电路积层膜、其制备方法及应用 |
US11286386B1 (en) | 2021-01-15 | 2022-03-29 | Wuhan Choice Technology Co., Ltd. | Circuit build-up film for wafer-level packaging, and fabrication method and use thereof |
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JPH05226700A (ja) * | 1992-02-12 | 1993-09-03 | Hitachi Chem Co Ltd | 発光ダイオード封止用エポキシ樹脂組成物及び該組成物で封止された発光ダイオード |
JP4615645B2 (ja) * | 1998-10-27 | 2011-01-19 | 東レ・ダウコーニング株式会社 | 硬化性樹脂組成物 |
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