JP4789426B2 - 銀ペースト用ガラス組成物及びそれを用いた感光性銀ペースト及び電極パターン - Google Patents
銀ペースト用ガラス組成物及びそれを用いた感光性銀ペースト及び電極パターン Download PDFInfo
- Publication number
- JP4789426B2 JP4789426B2 JP2004129764A JP2004129764A JP4789426B2 JP 4789426 B2 JP4789426 B2 JP 4789426B2 JP 2004129764 A JP2004129764 A JP 2004129764A JP 2004129764 A JP2004129764 A JP 2004129764A JP 4789426 B2 JP4789426 B2 JP 4789426B2
- Authority
- JP
- Japan
- Prior art keywords
- mass
- silver paste
- glass composition
- photosensitive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 title claims description 61
- 239000011521 glass Substances 0.000 title claims description 59
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims description 57
- 229910052709 silver Inorganic materials 0.000 title claims description 44
- 239000004332 silver Substances 0.000 title claims description 44
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 8
- 238000010304 firing Methods 0.000 claims description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 7
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 5
- 229910052796 boron Inorganic materials 0.000 claims description 5
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 229920005989 resin Polymers 0.000 description 32
- 239000011347 resin Substances 0.000 description 32
- 239000000758 substrate Substances 0.000 description 25
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 23
- 238000000034 method Methods 0.000 description 23
- 238000013508 migration Methods 0.000 description 22
- 230000005012 migration Effects 0.000 description 22
- 239000002245 particle Substances 0.000 description 14
- 150000001875 compounds Chemical class 0.000 description 13
- 239000004020 conductor Substances 0.000 description 13
- 239000011230 binding agent Substances 0.000 description 12
- 239000000843 powder Substances 0.000 description 12
- 238000011161 development Methods 0.000 description 10
- 238000000576 coating method Methods 0.000 description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- 150000008065 acid anhydrides Chemical class 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000009826 distribution Methods 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 238000009413 insulation Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- -1 methacryloyl groups Chemical group 0.000 description 6
- 150000007519 polyprotic acids Polymers 0.000 description 6
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 238000007650 screen-printing Methods 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000000016 photochemical curing Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 230000001965 increasing effect Effects 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000004383 yellowing Methods 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- XKSUVRWJZCEYQQ-UHFFFAOYSA-N 1,1-dimethoxyethylbenzene Chemical compound COC(C)(OC)C1=CC=CC=C1 XKSUVRWJZCEYQQ-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- OTKCEEWUXHVZQI-UHFFFAOYSA-N 1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(=O)CC1=CC=CC=C1 OTKCEEWUXHVZQI-UHFFFAOYSA-N 0.000 description 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 1
- CERJZAHSUZVMCH-UHFFFAOYSA-N 2,2-dichloro-1-phenylethanone Chemical compound ClC(Cl)C(=O)C1=CC=CC=C1 CERJZAHSUZVMCH-UHFFFAOYSA-N 0.000 description 1
- GIMQKKFOOYOQGB-UHFFFAOYSA-N 2,2-diethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)(OCC)C(=O)C1=CC=CC=C1 GIMQKKFOOYOQGB-UHFFFAOYSA-N 0.000 description 1
- BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- HEQOJEGTZCTHCF-UHFFFAOYSA-N 2-amino-1-phenylethanone Chemical class NCC(=O)C1=CC=CC=C1 HEQOJEGTZCTHCF-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SNZYOYGFWBZAQY-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;2-methyloxirane Chemical compound CC1CO1.CCC(CO)(CO)CO SNZYOYGFWBZAQY-UHFFFAOYSA-N 0.000 description 1
- RSROEZYGRKHVMN-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;oxirane Chemical compound C1CO1.CCC(CO)(CO)CO RSROEZYGRKHVMN-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 102100028168 BET1 homolog Human genes 0.000 description 1
- ASUIPYBNVVERJG-UHFFFAOYSA-N CCC1=CC=CC(O[PH2]=O)=C1C(=O)C1=C(C)C=C(C)C=C1C Chemical compound CCC1=CC=CC(O[PH2]=O)=C1C(=O)C1=C(C)C=C(C)C=C1C ASUIPYBNVVERJG-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229920000896 Ethulose Polymers 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- 239000001859 Ethyl hydroxyethyl cellulose Substances 0.000 description 1
- 101000697381 Homo sapiens BET1 homolog Proteins 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- VJFCXDHFYISGTE-UHFFFAOYSA-N O=[Co](=O)=O Chemical compound O=[Co](=O)=O VJFCXDHFYISGTE-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- HKNIVEYDKFDZDL-UHFFFAOYSA-N anthracene-9,10-dione;1-chloroanthracene-9,10-dione Chemical class C1=CC=C2C(=O)C3=CC=CC=C3C(=O)C2=C1.O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl HKNIVEYDKFDZDL-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical compound [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- QPOIJJUKCPCQIV-UHFFFAOYSA-N diphenylmethanone Chemical class C=1C=CC=CC=1C(=O)C1=CC=CC=C1.C=1C=CC=CC=1C(=O)C1=CC=CC=C1 QPOIJJUKCPCQIV-UHFFFAOYSA-N 0.000 description 1
- MZRQZJOUYWKDNH-UHFFFAOYSA-N diphenylphosphoryl-(2,3,4-trimethylphenyl)methanone Chemical compound CC1=C(C)C(C)=CC=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 MZRQZJOUYWKDNH-UHFFFAOYSA-N 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 235000019326 ethyl hydroxyethyl cellulose Nutrition 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000007603 infrared drying Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001485 poly(butyl acrylate) polymer Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 150000007964 xanthones Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
- C03C8/04—Frit compositions, i.e. in a powdered or comminuted form containing zinc
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/22—Electrodes, e.g. special shape, material or configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Geochemistry & Mineralogy (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Glass Compositions (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Conductive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
但し、B2O3は10質量%以下である。
SiO2成分は銀ペーストにおけるマイグレーションに対する抑制効果を有し、式(I)を満たす限りその含有率は特に限定されるものではないが、8〜30質量%の範囲で配合することが好ましい。8質量%未満ではマイグレーション特性が低下し、一方30質量%を超えると軟化点が高くなりすぎ、例えば620℃以下の温度におけるガラス基板上への焼き付けが困難となる場合がある。
(2)(a)不飽和カルボン酸と(b)不飽和二重結合を有する化合物との共重合体に、エチレン性不飽和基をペンダントとして付加させることによって得られるカルボキシル基含有感光性樹脂;
(3)(c)エポキシ基と不飽和二重結合を有する化合物と(b)不飽和二重結合を有する化合物との共重合体に、(a′)飽和又は不飽和カルボン酸を反応させ、生成した2級の水酸基に(d)多塩基酸無水物を反応させて得られるカルボキシル基含有樹脂;
(4)(e)不飽和二重結合を有する酸無水物と(b)不飽和二重結合を有する化合物との共重合体に、(f)水酸基を有する化合物を反応させて得られるカルボキシル基含有樹脂;
(5)(e)不飽和二重結合を有する酸無水物と(b)不飽和二重結合を有する化合物との共重合体に、(f′)水酸基と不飽和二重結合を有する化合物を反応させて得られるカルボキシル基含有感光性樹脂;
(6)(g)エポキシ化合物と(h)不飽和モノカルボン酸とを反応させ、生成した2級の水酸基に(d)多塩基酸無水物を反応させて得られるカルボキシル基含有感光性樹脂;
(7)(b)不飽和二重結合を有する化合物とグリシジル(メタ)アクリレートとの共重合体のエポキシ基に、(i)1分子中に1つのカルボキシル基を有し、エチレン性不飽和結合を持たない有機酸を反応させ、生成した2級の水酸基に(d)多塩基酸無水物を反応させて得られるカルボキシル基含有樹脂;
(8)(j)水酸基含有ポリマーに(d)多塩基酸無水物を反応させて得られるカルボキシル基含有樹脂;
(9)(j)水酸基含有ポリマーに(d)多塩基酸無水物を反応させて得られるカルボキシル基含有樹脂に、(c)エポキシ基と不飽和二重結合を有する化合物をさらに反応させて得られるカルボキシル基含有感光性樹脂。
温度計、撹拌機、滴下ロート、及び還流冷却器を備えたフラスコに、溶媒としてジエチレングリコールモノエチルエーテルアセテート、触媒としてアゾビスイソブチロニトリルを入れ、窒素雰囲気下、80℃に加熱し、メタクリル酸及びメチルメタアクリレートを、メタクリル酸:0.4mol、メチルメタアクリレート:0.6molのモル比で混合したモノマーを約2時間かけて滴下し、さらに1時間撹拌後、温度を115℃まで上げて失活させ、樹脂溶液を得た。
上記のようにして得られた有機バインダーAを用い、ガラス組成物として表1に示すガラス粉末Aと共に以下に示す組成比にて配合し、攪拌機により攪拌後、3本ロールミルにより練肉してペースト化を行い、感光性銀ペースト(組成物例1(参考例))を作製した。更に、ガラス粉末Aに替えて表1に示すガラス粉末B〜Hを22〜55部の範囲で用いて組成物例2、比較組成物例1〜4を作成した。なお、これらガラス粉末A、B、E〜Hはレーザ回折散乱式粒度分布測定装置:LMS−30((株)セイシン企業製)で測定した平均粒子径が1.2〜3.4μmの範囲にあるものを使用した。
有機バインダーA 180.0部
トリメチロールプロパントリアクリレート 45.0部
2−ベンジル−2−ジメチルアミノ−1−
(4−モルフォリノフェニル)−ブタノン−1 10.0部
イソプロピルチオキサントン 1.0部
ジプロピレングリコールモノメチルエーテル 90.0部
銀粉A* 550.0部
ガラス粉末A 38.5部
リン酸エステル 2.0部
消泡剤(BYK-354:ビックケミー・ジャパン(株)) 1.0部
*平均粒子径(レーザ回折散乱式粒度分布測定装置:マイクロトラックHRAにて測定):2.0μm、比表面積(BET1点法により測定):0.42m2/gのものを使用した。
ガラス基板上に、評価用の各感光性銀ペーストを180メッシュのポリエステルスクリーンを用いて全面に塗布し、次いで、熱風循環式乾燥炉にて90℃で20分間乾燥して指触乾燥性の良好な塗膜を形成した。次に、光源としてメタルハライドランプを用い、ネガマスクを介して、乾燥塗膜上の積算光量が300mJ/cm2となるようにパターン露光した後、液温30℃の0.5質量%Na2CO3水溶液を用いて現像を行い、水洗した。次いで、このようにして塗膜パターンが形成された基板を、空気雰囲気下にて5℃/分で570℃まで昇温して570℃で30分間焼成し、導電体パターンを形成した試験片を作成した。
L/S=120/80μmのくし型パターンにて露光・現像しパターニングを行い、焼成まで実施し、そのパターンにUV硬化型の防湿剤を塗布・硬化して評価片を作成した。その後、65℃、95%RHの恒温高湿槽内にてDC80V印加しながら144時間処理し、処理後の絶縁抵抗値を測定して絶縁性の劣化を評価した。その絶縁抵抗値は、印加電圧500Vで1分後の測定値である。
絶縁性劣化の評価を実施した試験片の評価後のくし型電極間の銀デントライトの発生の有無を確認した。
Claims (3)
- ホウ素と、シリカと、Al2O3と、Pb2O3又はBi2O3とを必須成分とし、かつ、ホウ素がB2O3換算でガラス組成物中に2〜6質量%未満含まれ、SiO2がガラス組成物中に8〜30質量%含まれ、Al2O3がガラス組成物中0.5〜2.5質量%含まれ、Pb2O3又はBi2O3がガラス組成物中に各々40〜90質量%含まれる銀ペースト用ガラス組成物であって、その組成比に関し酸化物換算で下式(I)が成り立つことを特徴とする銀ペースト用ガラス組成物。
B2O3質量%+ZnO質量%(0質量%を含む)≦SiO2質量% (I) - 銀粉末、感光性有機成分、および請求項1に記載のガラス組成物を含有する感光性銀ペーストであって、該ガラス組成物の含有率が銀粉末100質量部に対して2〜15質量部の範囲である感光性銀ペースト。
- 請求項2に記載の感光性銀ペーストを焼成してなる電極パターン。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004129764A JP4789426B2 (ja) | 2004-04-26 | 2004-04-26 | 銀ペースト用ガラス組成物及びそれを用いた感光性銀ペースト及び電極パターン |
KR1020050034075A KR101113473B1 (ko) | 2004-04-26 | 2005-04-25 | 은페이스트용 유리 조성물, 이를 이용한 감광성 은페이스트, 전극 패턴 및 플라즈마 디스플레이 패널 |
CN2005100678025A CN1690852B (zh) | 2004-04-26 | 2005-04-26 | 银浆用玻璃组合物、使用该组合物的感光性银浆、电极图形和等离子体显示板 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004129764A JP4789426B2 (ja) | 2004-04-26 | 2004-04-26 | 銀ペースト用ガラス組成物及びそれを用いた感光性銀ペースト及び電極パターン |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005306699A JP2005306699A (ja) | 2005-11-04 |
JP4789426B2 true JP4789426B2 (ja) | 2011-10-12 |
Family
ID=35346368
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004129764A Expired - Lifetime JP4789426B2 (ja) | 2004-04-26 | 2004-04-26 | 銀ペースト用ガラス組成物及びそれを用いた感光性銀ペースト及び電極パターン |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4789426B2 (ja) |
KR (1) | KR101113473B1 (ja) |
CN (1) | CN1690852B (ja) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20080081939A (ko) * | 2006-01-12 | 2008-09-10 | 도레이 가부시끼가이샤 | 감광성 조성물, 디스플레이 부재 및 그 제조 방법 |
JP4714634B2 (ja) * | 2006-04-25 | 2011-06-29 | シャープ株式会社 | 太陽電池電極用導電性ペースト |
EP2015367A4 (en) * | 2006-04-25 | 2011-10-05 | Sharp Kk | ELECTRO-CONDUCTIVE PASTE FOR A SOLAR BATTERY ELECTRODE |
JP4714633B2 (ja) * | 2006-04-25 | 2011-06-29 | シャープ株式会社 | 太陽電池電極用導電性ペースト |
US9173302B2 (en) | 2006-08-29 | 2015-10-27 | Hitachi Chemical Company, Ltd. | Conductive adhesive film and solar cell module |
KR100829667B1 (ko) | 2006-09-07 | 2008-05-16 | 엘지전자 주식회사 | 전극용 페이스트 조성물, 이를 이용하여 제조된 플라즈마디스플레이 패널의 상판구조 및 그 제조방법 |
CN101593570B (zh) * | 2008-05-29 | 2012-02-22 | 四川虹欧显示器件有限公司 | 黑色导电浆料和使用该浆料的等离子显示器 |
CN101728148B (zh) * | 2009-01-05 | 2011-09-14 | 四川虹欧显示器件有限公司 | 电极浆料及利用其制造的电极和它们的制造方法以及具有该电极的pdp显示屏 |
JP5532512B2 (ja) * | 2009-02-24 | 2014-06-25 | 日本電気硝子株式会社 | 電極形成用ガラス組成物および電極形成材料 |
KR20100109791A (ko) * | 2009-04-01 | 2010-10-11 | 주식회사 동진쎄미켐 | 저온소성 가능한 전극 또는 배선 형성용 페이스트 조성물 |
WO2010118212A1 (en) * | 2009-04-09 | 2010-10-14 | E. I. Du Pont De Nemours And Company | Glass compositions used in conductors for photovoltaic cells |
CN102103895B (zh) * | 2010-11-23 | 2012-02-29 | 湖南威能新材料科技有限公司 | 一种太阳能电池正面电极及栅线用银浆料及其制备方法和含该银浆料制备的太阳能电池 |
CN101984494B (zh) * | 2010-12-09 | 2012-05-23 | 东南大学 | 防沉降感光性银浆料及其制备方法 |
CN102097183B (zh) * | 2011-02-24 | 2012-05-30 | 苏州晶银新材料股份有限公司 | 一种晶体硅太阳能电池正面电极用导电浆料的制备工艺 |
CN102768464B (zh) * | 2011-05-04 | 2013-11-13 | 上海鑫力新材料科技有限公司 | 感光导电银浆及制备方法 |
KR101431509B1 (ko) * | 2011-12-21 | 2014-08-22 | 주식회사 동진쎄미켐 | 태양전지 전극형성용 페이스트 조성물 |
CN102584505A (zh) * | 2012-01-16 | 2012-07-18 | 南京理工大学 | 一种改善防潮性能的模块化无烟烟花药及其制备方法 |
CN102831958B (zh) * | 2012-08-24 | 2014-09-10 | 合肥中南光电有限公司 | 无铅环保型晶体硅太阳能电池正面银浆及其制备方法 |
JP6814237B2 (ja) * | 2018-03-23 | 2021-01-13 | 株式会社ノリタケカンパニーリミテド | 感光性組成物とその利用 |
CN109277723B (zh) * | 2018-10-06 | 2021-08-03 | 天津大学 | 一种高温环境下耐银电迁移的Ag-SiO2纳米焊膏的制备方法 |
CN111929989B (zh) * | 2020-08-28 | 2022-03-15 | 乾宇电子材料(深圳)有限公司 | 感光性树脂组合物及其制备方法、感光性有机载体及黄光浆料 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06223617A (ja) * | 1993-01-27 | 1994-08-12 | Sumitomo Metal Mining Co Ltd | 導電ペースト用組成物 |
JPH06295615A (ja) * | 1993-04-07 | 1994-10-21 | Sumitomo Metal Mining Co Ltd | 厚膜抵抗体組成物 |
JP3297531B2 (ja) * | 1994-06-27 | 2002-07-02 | 京セラ株式会社 | 導電性ペースト |
JPH08153415A (ja) * | 1994-11-29 | 1996-06-11 | Futaba Corp | 導電ペースト |
TW367504B (en) * | 1996-05-21 | 1999-08-21 | Du Pont | Photosensitive aqueous developable thick film composition employing vinylpyrrolidone polymer |
JP3520721B2 (ja) * | 1997-05-28 | 2004-04-19 | 東レ株式会社 | 感光性導電ペーストおよび電極の製造方法 |
JP2000232031A (ja) * | 1999-02-12 | 2000-08-22 | Murata Mfg Co Ltd | 導電ペーストおよびこれを用いた積層セラミックコンデンサ |
JP3534684B2 (ja) * | 2000-07-10 | 2004-06-07 | Tdk株式会社 | 導電ペーストおよび外部電極とその製造方法 |
JP2002352702A (ja) * | 2001-05-28 | 2002-12-06 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネルの製造方法 |
JP2003226549A (ja) * | 2001-11-30 | 2003-08-12 | Matsushita Electric Ind Co Ltd | 電極材料、誘電体材料、電極ペースト、誘電体ペーストおよびこれらを用いたプラズマディスプレイパネル |
-
2004
- 2004-04-26 JP JP2004129764A patent/JP4789426B2/ja not_active Expired - Lifetime
-
2005
- 2005-04-25 KR KR1020050034075A patent/KR101113473B1/ko active IP Right Grant
- 2005-04-26 CN CN2005100678025A patent/CN1690852B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN1690852A (zh) | 2005-11-02 |
JP2005306699A (ja) | 2005-11-04 |
KR101113473B1 (ko) | 2012-03-13 |
CN1690852B (zh) | 2012-01-18 |
KR20060045846A (ko) | 2006-05-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4789426B2 (ja) | 銀ペースト用ガラス組成物及びそれを用いた感光性銀ペースト及び電極パターン | |
JP4071171B2 (ja) | 感光性導電組成物およびプラズマディスプレイパネル | |
JP4834664B2 (ja) | 黒色ペースト組成物、及びそれを用いたブラックマトリックスパターンの形成方法、並びにそのブラックマトリックスパターン | |
JP5393402B2 (ja) | 感光性導電ペースト及びその製造方法 | |
JP2010062018A (ja) | 導電ペーストおよびそれを用いた電極 | |
KR100931139B1 (ko) | 내열성 흑색 안료 슬러리 및 이를 이용한 광경화성 조성물의 제조 방법 | |
JP2003131365A (ja) | 光硬化性組成物及びそれを用いて電極形成したプラズマディスプレイパネル | |
JP4411113B2 (ja) | 感光性導電ペースト及びそれを用いて形成した導電体パターン | |
JP2008108724A (ja) | 感光性導電ペースト及びその焼成物から形成された導電体パターン | |
JP5399193B2 (ja) | 感光性導電ペーストおよびその製造方法 | |
JP2015184631A (ja) | 感光性樹脂組成物、二層電極構造体、及びその製造方法並びにプラズマディスプレイパネル | |
JP2003100208A (ja) | 電極パターンの形成方法および該電極パターンを形成したプラズマディスプレイパネル | |
JP4214005B2 (ja) | 光硬化性樹脂組成物及びプラズマディスプレイパネル用前面基板 | |
JP2006278221A (ja) | 一括焼成用感光性黒色ペースト及び該ペーストを用いたpdp前面基板の製造方法 | |
JP3599733B2 (ja) | 感光性導電ペースト及びそれを用いて形成した導電体パターン | |
JP4278312B2 (ja) | 導電回路パターンの形成方法 | |
JP2003280181A (ja) | 感光性導電ペースト及びそれを用いて形成した導電体パターン | |
JP2004053628A (ja) | 光硬化性黒色組成物及びそれを用いて形成したバス電極 | |
JP2010009777A (ja) | 感光性導電ペーストおよびこれを用いた電極パターンの製造方法 | |
JP2010009778A (ja) | 感光性導電ペーストおよびこれを用いた電極パターンの製造方法 | |
KR101380471B1 (ko) | 감광성 도전 페이스트 및 그의 소성물로 형성된 도전체패턴 | |
JP2006030853A (ja) | 感光性ペースト及びそれを用いて形成した焼成物パターン | |
JP2004296755A (ja) | 光硬化性樹脂組成物及びそれを用いて形成した電磁波シールド部材 | |
KR100785539B1 (ko) | 감광성 페이스트 및 이것을 사용하여 얻어지는 소성물 패턴 | |
JP2009149461A (ja) | ペースト組成物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070410 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20091228 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100511 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100712 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101012 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101213 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20110621 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20110719 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140729 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4789426 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |